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SG11202009378RA - Co anode, and co electroplating method using co anode - Google Patents

Co anode, and co electroplating method using co anode

Info

Publication number
SG11202009378RA
SG11202009378RA SG11202009378RA SG11202009378RA SG11202009378RA SG 11202009378R A SG11202009378R A SG 11202009378RA SG 11202009378R A SG11202009378R A SG 11202009378RA SG 11202009378R A SG11202009378R A SG 11202009378RA SG 11202009378R A SG11202009378R A SG 11202009378RA
Authority
SG
Singapore
Prior art keywords
anode
electroplating method
electroplating
Prior art date
Application number
SG11202009378RA
Inventor
Shuhei Murata
Yoshimasa Koido
Takayuki Asano
Kengo Kaminaga
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11202009378RA publication Critical patent/SG11202009378RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
SG11202009378RA 2018-03-28 2018-10-03 Co anode, and co electroplating method using co anode SG11202009378RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018063008A JP6960363B2 (en) 2018-03-28 2018-03-28 Co-anode, electric Co-plating method using Co-anode and evaluation method of Co-anode
PCT/JP2018/037118 WO2019187250A1 (en) 2018-03-28 2018-10-03 Co anode, and co electroplating method using co anode

Publications (1)

Publication Number Publication Date
SG11202009378RA true SG11202009378RA (en) 2020-10-29

Family

ID=68060989

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202009378RA SG11202009378RA (en) 2018-03-28 2018-10-03 Co anode, and co electroplating method using co anode

Country Status (7)

Country Link
US (1) US20210010149A1 (en)
JP (1) JP6960363B2 (en)
KR (1) KR102435667B1 (en)
CN (1) CN111971423A (en)
SG (1) SG11202009378RA (en)
TW (1) TWI683040B (en)
WO (1) WO2019187250A1 (en)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3416993A1 (en) * 1984-05-09 1985-11-21 Gerhard Collardin GmbH, 5000 Köln ELECTROLYTE CONTAINING AQUEOUS, ACID, NICKEL AND COBALT ION FOR THE GALVANIC DEPOSITION OF HARD, TEMPERATURE-RESISTANT, WHITE GLOSSY ALLOY
JPS62278293A (en) * 1986-05-26 1987-12-03 C Uyemura & Co Ltd Production of electronic parts
DE19609439A1 (en) * 1995-03-14 1996-09-19 Japan Energy Corp Prodn. of pure cobalt@ for sputtering targets for electronics use
JP3151194B2 (en) * 1999-03-19 2001-04-03 株式会社ジャパンエナジー Cobalt purification method
EP1288339B1 (en) * 2000-05-22 2010-08-18 Nippon Mining & Metals Co., Ltd. Method of producing a higher-purity metal
JP4076751B2 (en) 2001-10-22 2008-04-16 日鉱金属株式会社 Electro-copper plating method, phosphor-containing copper anode for electrolytic copper plating, and semiconductor wafer plated with these and having less particle adhesion
US20050000821A1 (en) * 2001-11-16 2005-01-06 White Tamara L Anodes for electroplating operations, and methods of forming materials over semiconductor substrates
JP3611545B2 (en) * 2001-12-20 2005-01-19 株式会社荏原製作所 Plating equipment
CN1297364C (en) * 2005-05-18 2007-01-31 北京科技大学 Precipitation reduction method of preparing nano-cobalt powder
US7897265B2 (en) * 2006-01-26 2011-03-01 Hamilton Sundstrand Corporation Low cost, environmentally favorable, chromium plate replacement coating for improved wear performance
EP2213772B1 (en) 2007-11-01 2016-08-17 JX Nippon Mining & Metals Corporation Phosphorus-containing copper anode
JP5544527B2 (en) * 2009-03-02 2014-07-09 国立大学法人信州大学 Composite plating film, method for forming the same, and electrolytic plating solution
JP4884561B1 (en) * 2011-04-19 2012-02-29 Ｊｘ日鉱日石金属株式会社 Indium target and manufacturing method thereof
JP5281186B1 (en) * 2012-10-25 2013-09-04 Ｊｘ日鉱日石金属株式会社 Indium target and manufacturing method thereof
WO2015083406A1 (en) * 2013-12-02 2015-06-11 Jx日鉱日石金属株式会社 High purity cobalt chloride and manufacturing method therefor
CN103966627B (en) * 2014-04-30 2017-01-11 兰州金川新材料科技股份有限公司 Method for reducing content of impurity Fe in high-purity cobalt
JP6457093B2 (en) * 2016-03-09 2019-01-23 Ｊｘ金属株式会社 High purity tin and method for producing the same

Also Published As

Publication number Publication date
US20210010149A1 (en) 2021-01-14
TW201942423A (en) 2019-11-01
JP2019173104A (en) 2019-10-10
TWI683040B (en) 2020-01-21
KR20200128097A (en) 2020-11-11
JP6960363B2 (en) 2021-11-05
CN111971423A (en) 2020-11-20
WO2019187250A1 (en) 2019-10-03
KR102435667B1 (en) 2022-08-25

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