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PL3914757T4 - Sposób elektrolitycznego osadzania stopu cynkowo-niklowego z zastosowaniem membranowego systemu anodowego - Google Patents

Sposób elektrolitycznego osadzania stopu cynkowo-niklowego z zastosowaniem membranowego systemu anodowego

Info

Publication number
PL3914757T4
PL3914757T4 PL20701062.0T PL20701062T PL3914757T4 PL 3914757 T4 PL3914757 T4 PL 3914757T4 PL 20701062 T PL20701062 T PL 20701062T PL 3914757 T4 PL3914757 T4 PL 3914757T4
Authority
PL
Poland
Prior art keywords
nickel alloy
anode system
electrolytic zinc
alloy deposition
membrane anode
Prior art date
Application number
PL20701062.0T
Other languages
English (en)
Other versions
PL3914757T3 (pl
Inventor
Steven LEONHARD
Thomas Freese
Original Assignee
Atotech Deutschland GmbH & Co. KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH & Co. KG filed Critical Atotech Deutschland GmbH & Co. KG
Publication of PL3914757T3 publication Critical patent/PL3914757T3/pl
Publication of PL3914757T4 publication Critical patent/PL3914757T4/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
PL20701062.0T 2019-01-24 2020-01-22 Sposób elektrolitycznego osadzania stopu cynkowo-niklowego z zastosowaniem membranowego systemu anodowego PL3914757T4 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19153419 2019-01-24
PCT/EP2020/051482 WO2020152208A1 (en) 2019-01-24 2020-01-22 Membrane anode system for electrolytic zinc-nickel alloy deposition

Publications (2)

Publication Number Publication Date
PL3914757T3 PL3914757T3 (pl) 2023-08-07
PL3914757T4 true PL3914757T4 (pl) 2023-08-21

Family

ID=65228408

Family Applications (1)

Application Number Title Priority Date Filing Date
PL20701062.0T PL3914757T4 (pl) 2019-01-24 2020-01-22 Sposób elektrolitycznego osadzania stopu cynkowo-niklowego z zastosowaniem membranowego systemu anodowego

Country Status (12)

Country Link
US (1) US20220119978A1 (pl)
EP (2) EP4219801A1 (pl)
JP (1) JP2022518053A (pl)
KR (1) KR20210118419A (pl)
CN (1) CN113383118A (pl)
BR (1) BR112021013239A2 (pl)
CA (1) CA3127517A1 (pl)
ES (1) ES2952069T3 (pl)
MX (1) MX2021008925A (pl)
PL (1) PL3914757T4 (pl)
TW (1) TWI841670B (pl)
WO (1) WO2020152208A1 (pl)

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5816082A (ja) 1981-07-21 1983-01-29 Permelec Electrode Ltd イオン交換膜を用いる電解装置及びその製造方法
JPS5893893A (ja) * 1981-11-30 1983-06-03 Tokuyama Soda Co Ltd 連続メツキ装置
US5047128A (en) * 1990-01-02 1991-09-10 Shipley Company Inc. Electrodialysis cell for removal of excess electrolytes formed during electrodeposition of photoresists coatings
DE4003516C2 (de) * 1990-02-06 1994-06-23 Heraeus Elektrochemie Elektrodenelement für elektrolytische Zwecke und dessen Verwendung
DE4015141A1 (de) * 1990-05-11 1991-11-14 Lpw Anlagen Gmbh Verfahren zum betreiben einer galvanotechnischen anlage
JPH04176893A (ja) * 1990-11-08 1992-06-24 Kawasaki Steel Corp Ｓｎ―Ｎｉ合金めっき方法
JPH08232081A (ja) * 1995-02-27 1996-09-10 Toto Ltd 水栓金具
JPH11343598A (ja) * 1998-05-29 1999-12-14 Toyo Kohan Co Ltd 不溶性陽極に付設した陽極室、それを用いためっき方法及びめっき装置
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US20060163072A1 (en) * 2000-03-21 2006-07-27 Semitool, Inc. Electrolytic process using anion permeable barrier
ATE306572T1 (de) * 2000-06-15 2005-10-15 Taskem Inc Zink-nickel-elektroplattierung
US20040026255A1 (en) * 2002-08-06 2004-02-12 Applied Materials, Inc Insoluble anode loop in copper electrodeposition cell for interconnect formation
US8377283B2 (en) * 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
DE10261493A1 (de) 2002-12-23 2004-07-08 METAKEM Gesellschaft für Schichtchemie der Metalle mbH Anode zur Galvanisierung
US7442286B2 (en) * 2004-02-26 2008-10-28 Atotech Deutschland Gmbh Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys
DE502005007138D1 (de) * 2005-04-26 2009-06-04 Atotech Deutschland Gmbh Alkalisches Galvanikbad mit einer Filtrationsmembran
JP4738910B2 (ja) * 2005-06-21 2011-08-03 日本表面化学株式会社 亜鉛−ニッケル合金めっき方法
US20110089045A1 (en) 2008-04-11 2011-04-21 Francois Cardarelli Electrochemical process for the recovery of metallic iron and sulfuric acid values from iron-rich sulfate wastes, mining residues and pickling liquors
DE102010044551A1 (de) * 2010-09-07 2012-03-08 Coventya Gmbh Anode sowie deren Verwendung in einem alkalischen Galvanikbad
DE102010055143B4 (de) 2010-12-18 2022-12-01 Umicore Galvanotechnik Gmbh Direktkontakt-Membrananode für die Verwendung in Elektrolysezellen
US20160024683A1 (en) * 2013-03-21 2016-01-28 Atotech Deutschland Gmbh Apparatus and method for electrolytic deposition of metal layers on workpieces
DE102014001799B3 (de) * 2014-02-11 2015-02-05 Eisenmann Ag Anlage zur Beschichtung von Gegenständen
CN104073862A (zh) * 2014-07-11 2014-10-01 张钰 一种用于碱性锌镍合金电镀的不溶性阳极装置
DE202015002289U1 (de) 2015-03-25 2015-05-06 Hartmut Trenkner Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
US10227707B2 (en) * 2015-07-17 2019-03-12 Applied Materials, Inc. Inert anode electroplating processor and replenisher
KR101622528B1 (ko) * 2015-07-22 2016-05-18 딥솔 가부시키가이샤 아연 합금 도금 방법

Also Published As

Publication number Publication date
WO2020152208A1 (en) 2020-07-30
TW202035800A (zh) 2020-10-01
CN113383118A (zh) 2021-09-10
EP4219801A1 (en) 2023-08-02
EP3914757A1 (en) 2021-12-01
KR20210118419A (ko) 2021-09-30
ES2952069T3 (es) 2023-10-26
CA3127517A1 (en) 2020-07-30
PL3914757T3 (pl) 2023-08-07
EP3914757B1 (en) 2023-04-05
MX2021008925A (es) 2021-08-24
BR112021013239A2 (pt) 2021-09-14
TWI841670B (zh) 2024-05-11
JP2022518053A (ja) 2022-03-11
US20220119978A1 (en) 2022-04-21

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