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KR840006638A - 아민 유도체의 제조방법 - Google Patents

아민 유도체의 제조방법 Download PDF

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KR840006638A
KR840006638A KR1019830005383A KR830005383A KR840006638A KR 840006638 A KR840006638 A KR 840006638A KR 1019830005383 A KR1019830005383 A KR 1019830005383A KR 830005383 A KR830005383 A KR 830005383A KR 840006638 A KR840006638 A KR 840006638A
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KR860001169B1 (ko
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시로 히라이 (외 8)
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원본미기재
도야마 가가꾸 고교 가부시기 가이샤
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Priority claimed from JP58205925A external-priority patent/JPH0660096B2/ja
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Abstract

내용 없음

Description

아민 유도체의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (41)

  1. (A) 다음 일반식(Ⅳ)의 화합물을 다음 일반식(Ⅴ)의 화합물 또는 이의 염과 반응시키거나, (B) 다음 일반식(Ⅱ)의 화합물 또는 이의 염을 다음 일반식(Ⅵ)의 화합물과 반응시키거나, (C) 다음 (Ⅱ) 일반식(Ⅶ)의 화합물 또는 이의 염과 반응시킨 다음, 필요시, 하이드록실 그룹을 보호시키거나, (D) 다음 일반식(Ⅷ)의 화합물을 다음 일반식(Ⅸ)의 화합물과 반응시키거나, (E) 다음 일반식(Ⅹ)의 화합물을 다음 일반식(XI)의 화합물과 반응시킨후, 필요시, 하이드록실 보호그룹을 제거시키거나, (F) 다음 일반식(XII)의 화합물을 다음 일반식(XIII)의 화합물과 촉매존재하에 반응시키거나, (G)다음 일반식 (X)의 화합물을 다음 일반식(Ⅶ)의 화합물 또는 이의 염 및 다음 일반식(XVI)의 화합물과 반응시킨후, 필요시, 하이드록실그룹을 보호시킴을 특징으로 하여 다음 일반식(Ⅰ)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, 각각의 R1및 R2는, 같거나 다를 수 있으며, 비치환 또는 치환된 이릴 또는 헤테로사이클릭그룹이며; p는 0,1,2 또는 3이고, X는 산소 또는 황원자이며; q는 2,3 또는 4이고; Z는 산소 또는 황원자, NR4(R4는 수소원자, 시아노그룹, 아이드록실그룹, 니트로그룹, 알킬그룹, 알케닐그룹, 알콕시그룹, 치환 또는 비치환된 아실그룹, 치환 또는 비치환 된 아릴그룹, 카마모일그룹, 설파모일그룹, 알콕시카보닐그룹, 알킬설포닐그룹, 치환 또는 비치환된 아릴설포닐그룹, 치환 또는 비치환된 아릴옥시그룹, 치환 또는 비치환된 아실아미노그룹, 알콕시카보닐아미노그룹, 또는 카복시알킬아미노 그룹이다),또는 CHR5(R5는 니트로그룹, 치환 또는 비치환된 아실그룹, 또는 비치환된 아릴그룹, 알킬설포닐그룹, 또는치환 또는 비치환된 아릴설포닐 그룹이다)이며; Y는 알킬렌 그룹이고, R3는 수소원자 또는 하이드록실 보호그룹이고; Q1은 제거가능한 그룹이고; Q2는 옥시 또는 티오 결합을 형성하는 그룹 또는 제거가능한 그룹이고, p가 0인 경우, Q2는 옥시 또는 티오 결합을 형성하는 그룹이고; Q3는 Q2가 옥시 또는 티오결합을 형성하는 그룹인 경우, 제거 가능한 그룹인 반면, Q2가 제거가능한 그룹인 경우, Q3는 옥시 또는 티오 결합을 형성하는 그룹이고, Q4는 제거가능한 그룹이고, R1a는 치환 또는 비치환된 헤테로사이클릭 그룹이고, R1b는 치환 또는 비치환된 헤테로사이클릭 그룹이고, P1은 1,2 또는 3이다.
  2. 제1항에 있어서, 다음 일반식(Ⅳ)의 화합물을 다음 일반식(Ⅴ)의 화합물 또는 이의 염과 반응시킴을 특징으로 하여 일반식(Ⅰ)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, R1,R2,R3,X,Y,Z,Q1,p 및 q는 제1항에서 정의된 바와 같다.
  3. 제2항에 있어서, 각 R1및 R2는 같거나 다를 수 있으며, 치환 또는 비치환 된 페닐, 인다닐, 티에닐, 푸릴, 피리딜, 티아졸릴 또는 이미다졸릴 그룹인 방법.
  4. 제3항에 있어서, R1및 R2는 각기 할로겐원자, 하이드록실그룹, 니트로그룹, 아미노그룹, 하이드록실알킬그룹, 시아노그룹, 알킬그룹, 알콕시그룹, 알킬티오그룹, 할로게노알킬그룹, 디알킬아미노그룹, 카바모일그룹, 아실옥시그룹, 알킬렌티옥시그룹, 디알킬아미노알킬그룹, 구아니디노그룹, 피페리디노알킬그룹 및 3-하이드록시-1-피페리디닐알킬그룹에서 선택된 하나이상의 치환체를 갖는 방법.
  5. 제2항 내지 제4항중 어느하나에 있어서, Z가 산소원자, 니트로메틸렌그룹, 알킬설포닐이미노그룹, 치환 또는 비치환된 아릴설포닐이미노그룹, 시아노이미노그룹, 또는 설파모일 이미노그룹인 방법.
  6. 제5항에 있어서, Z가 니트로메틸렌그룹인 방법.
  7. 제2항 내지 제4항중 어느하나에 있어서, R1이 5-디메틸아미노메틸-2-푸릴그룹인 방법.
  8. 제2항 내지 제4항중 어느하나에 있어서, R1이 5-디메틸아미노에틸-4-메틸-2-티에닐그룹인 방법.
  9. 제2항 내지 제4항중 어느하나에 있어서, R1이 3-피페리디노메틸페닐 그룹인 방법.
  10. 제2항 내지 제9항중 어느하나에 있어서, 반응을 -5°C 내지 200°C의 온도에서 수행하는 방법.
  11. 제1항에 있어서, 다음 일반식(Ⅱ)의 화합물 또는 이의 염을 다음 일반식(Ⅵ)의 화합물과 반응시킴을 특징으로 하여 다음 일반식(Ⅰ)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, R!,R2,R3,X,Y,Z,p,q 및 Q1은 제1항에서 정의된 바와 같다.
  12. 제11항에 있어서, Z가 니트로메틸렌 그룹인 방법.
  13. 제11항 또는 제12항에 있어서, R1이 5-디메틸아미노메틸-4-메틸-2-티에닐그룹인 방법.
  14. 제11항 내지 제13항중 어느하나에 있어서, 반응을 -5°C 내지 200°C에서 수행하는 방법.
  15. 제1항에 있어서, 다음 일반식(Ⅱ)의 화합물 또는 이의 염을 다음 일반식(Ⅶ)의 화합물 또는 이의염과 반응시킨 다음 필요시, 수득한 화합물의 하이드록실그룹을 보호시킴을 특징으로 하여 다음 일반식(Ⅰ)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서 R1,R2,R3,X,Y,Z,p 및 q는 제1항에서 정의된 바와 같다.
  16. 제15항에 있어서, Z가 니트로메틸렌그룹인 방법.
  17. 제15항 또는 제16항에 있어서, R1이 5-디메틸아미노메틸-4-메틸-2-티에닐그룹인 방법.
  18. 제15항 내지 17항중 어느하나에 있어서, R3가 수소원자인 방법.
  19. 제15항 내지 제18항중 어느하나에 있어서, 반응을 -5°C 내지 200°C의 온도에서 수행하는 방법.
  20. 제1항에 있어서, 다음 일반식(Ⅷ)의 화합물을 다음 일반식(Ⅸ)의 화합물과 반응시킴을 특징으로 하여 다음 일반식(Ⅰ)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, R1,R2,R3,X,Y,Z,p,q,Q2및 Q3는 제1항에서 정의된 바와같다.
  21. 제20항에 있어서, Z가 니트로메틸렌그룹인 방법.
  22. 제20항 또는 제21항에 있어서, R1이 5-디메틸아미노메틸-4-메틸-2-티에닐그룹인 방법.
  23. 제20항 내지 제22항중 어느하나에 있어서, Q2가 메르캅토그룹 또는 아미디노티오그룹이고, Q3가 할로겐원자인 방법.
  24. 제20항 내지 제23항중 어느하나에 있어서, 반응을 -20℃ 내지 -120℃의 온도에서 수행하는 방법.
  25. 제1항에 있어서, 다음 일반식(Ⅹ)의 화합물을 다음 일반식(XI)의 화합물과 반응시킨 후, 필요시 하이드록실-보호그룹을 제거시킴을 특징으로 하여 다음 일반식(Id)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, R1a,R2,R3,Y,Z 및 P1은 제1항에서 정의된 바와 같다.
  26. 제25항에 있어서, Z가 니트로메틸렌그룹인 방법.
  27. 제25항 또는 제26항에 있어서, R1이 5-디메틸아미노메틸-4-메틸-2-티에닐그룹인 방법.
  28. 제25항 내지 제27항중 어느하나에 있어서, R3가 하이드록실-보호그룹인 방법.
  29. 제28항에 있어서, R3가 3급-부틸디메틸실릴그룹인 방법.
  30. 제26항 내지 제29항중 어느하나에 있어서, 반응을 -10℃ 내지 15℃의 온도에서 수행하는 방법.
  31. 제1항에 있어서, 다음 일반식(XII)의 화합물을 다음 일반식(XIII)의 화합물과 촉매존재하에 반응시킴을 특징으로 하여 다음 일반식(Ic)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, R1b,R2,R3,X,Y,Z,q 및 Q4는 제1항에서 정의된 바와 같다.
  32. 제31항에 있어서, Z가 니트로메틸렌 그룹인 방법.
  33. 제31항 또는 제32항에 있어서, R1b가 5-디메틸아미노메틸-4-메틸-2-티에닐그룹인 방법.
  34. 제31항 내지 제33항중 어느하나에 있어서, 촉매가 루이스산 또는 이의 착화합물물인 방법.
  35. 제34항에 있어서, 루이스산 또는 이의 착화합물이 3불화붕소 또는 3불화붕소착 화합물인 방법.
  36. 제31항 내지 제35항중 어느하나에 있어서, Q4가 알콕시그룹인 방법.
  37. 제31항 내지 제36항중 어느하나에 있어서, 반응을 0℃ 내지 50℃의 온도에서 수행하는 방법.
  38. 제1항에 있어서, 다음 일반식(X)의 화합물을 다음 일반식(Ⅶ)의 화합물 또는 이의 염과 반응시킨후, 필요시, 하이드록실그룹을 보호시킴을 특징으로 하여 다음 일반식(Id)의 아민유도체 또는 이의 염을 제조하는 방법.
    상기 일반식에서, R1a,R2,R3,Y는 제1항에서 정의된 바와 같다.
  39. 제38항에 있어서, Z가 니트로메틸렌그룹인 방법.
  40. 제38항 또는 제39항에 있어서, R1a가 5-디메틸아미노메틸-4-메틸-2-티에닐그룹인 방법.
  41. 제38항 내지 제40항중 어느하나에 있어서, 반응을 -10℃ 내지 200℃의 온도에서 수행하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830005383A 1982-11-12 1983-11-12 아민 유도체의 제조방법 KR860001169B1 (ko)

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JP58205925A JPH0660096B2 (ja) 1983-11-04 1983-11-04 アミン誘導体またはその塩を含有する抗潰瘍剤
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