KR20190124049A - 기판 처리 장치 - Google Patents
기판 처리 장치 Download PDFInfo
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- KR20190124049A KR20190124049A KR1020180048114A KR20180048114A KR20190124049A KR 20190124049 A KR20190124049 A KR 20190124049A KR 1020180048114 A KR1020180048114 A KR 1020180048114A KR 20180048114 A KR20180048114 A KR 20180048114A KR 20190124049 A KR20190124049 A KR 20190124049A
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- substrate
- floating stage
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- transfer
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- 239000000758 substrate Substances 0.000 title claims abstract description 154
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000007788 liquid Substances 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 13
- 238000003825 pressing Methods 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 208000027418 Wounds and injury Diseases 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 208000014674 injury Diseases 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
도 2는 예시적인 실시예들에 따른 기판 처리 장치에 구비되는 파지부를 설명하기 위한 개략적인 도면이다.
도 3은 예시적인 실시예들에 따른 기판 처리 장치에 구비되는 파지부를 설명하기 위한 개략적인 도면이다.
15, 37 : 진공홀 17 : 이송부
19 : 가이드 레일 20 : 기판
21 : 파지부 23 : 구동부
25 : 토출부 31, 41 : 제2 분사부
33 : 제1 분사부 35 : 핀 구조물
100 기판 처리 장치
Claims (6)
- 기판을 부상시킨 상태에서 공정의 수행이 이루어지는 부상 스테이지; 및
상기 부상 스테이지에서 부상되는 상기 기판을 상기 부상 스테이지를 따라 이송시키는 이송부를 포함하고,
상기 이송부는
상기 부상 스테이지의 양쪽 단부 쪽에 구비되는 가이드 레일;
상기 기판의 양쪽 단부를 파지한 상태에서 상기 가이드 레일을 따라 이송하는 파지부; 및
상기 파지부를 상부 및 하부 그리고 좌측 및 우측으로 구동시킬 수 있는 구동부를 포함하는 것을 특징으로 하는 기판 처리 장치. - 제1 항에 있어서,
상기 부상 스테이지에는 상기 기판을 부상시킬 수 있도록 상기 기판 이면을 향하여 에어를 분사하는 에어홀들 및 진공으로 흡입하는 진공홀들이 형성되는 것을 특징으로 하는 기판 처리 장치. - 제1 항에 있어서,
상기 파지부는 상기 기판의 상부 및 하부에서 파지하도록 구비되는 것을 특징으로 하는 기판 처리 장치. - 제3 항에 있어서,
상기 파지부는 상기 기판의 하부에서는 진공 흡착으로 상기 기판을 파지하고, 상기 기판의 상부에서는 상기 기판에 접촉하는 핀 구조물을 사용하여 상기 기판을 누름으로써 상기 기판을 파지하는 것을 특징으로 하는 기판 처리 장치. - 제3 항에 있어서,
상기 파지부는 상기 기판의 하부에서는 진공 흡착으로 상기 기판을 파지하고, 상기 기판의 상부에서는 상기 기판을 누를 수 있도록 상기 기판을 향하여 에어를 분사함으로써 상기 기판을 파지하는 것을 특징으로 하는 기판 처리 장치. - 제1 항에 있어서,
상기 부상 스테이지 상부에서 상기 기판으로 약액을 토출하는 토출부를 더 포함하는 것을 특징으로 하는 기판 처리 장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180048114A KR102134271B1 (ko) | 2018-04-25 | 2018-04-25 | 기판 처리 장치 |
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KR1020180048114A KR102134271B1 (ko) | 2018-04-25 | 2018-04-25 | 기판 처리 장치 |
Related Child Applications (1)
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KR1020200029605A Division KR102134274B1 (ko) | 2020-03-10 | 2020-03-10 | 기판 처리 장치 |
Publications (2)
Publication Number | Publication Date |
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KR20190124049A true KR20190124049A (ko) | 2019-11-04 |
KR102134271B1 KR102134271B1 (ko) | 2020-07-15 |
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KR1020180048114A KR102134271B1 (ko) | 2018-04-25 | 2018-04-25 | 기판 처리 장치 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005223119A (ja) * | 2004-02-05 | 2005-08-18 | Tokyo Electron Ltd | 塗布膜形成装置および塗布膜形成方法 |
JP2005236092A (ja) * | 2004-02-20 | 2005-09-02 | Tokyo Electron Ltd | 塗布膜形成装置 |
JP2009098052A (ja) * | 2007-10-18 | 2009-05-07 | Toppan Printing Co Ltd | 基板搬送装置用基板把持機構 |
JP2012195533A (ja) * | 2011-03-18 | 2012-10-11 | Tokyo Electron Ltd | 基板搬送装置及び基板搬送方法 |
KR20140084738A (ko) * | 2012-12-27 | 2014-07-07 | 세메스 주식회사 | 기판 처리 장치 |
-
2018
- 2018-04-25 KR KR1020180048114A patent/KR102134271B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005223119A (ja) * | 2004-02-05 | 2005-08-18 | Tokyo Electron Ltd | 塗布膜形成装置および塗布膜形成方法 |
JP2005236092A (ja) * | 2004-02-20 | 2005-09-02 | Tokyo Electron Ltd | 塗布膜形成装置 |
JP2009098052A (ja) * | 2007-10-18 | 2009-05-07 | Toppan Printing Co Ltd | 基板搬送装置用基板把持機構 |
JP2012195533A (ja) * | 2011-03-18 | 2012-10-11 | Tokyo Electron Ltd | 基板搬送装置及び基板搬送方法 |
KR20140084738A (ko) * | 2012-12-27 | 2014-07-07 | 세메스 주식회사 | 기판 처리 장치 |
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