KR20160087908A - Novel bis(hydroxyphenyl)benzoxazole compound - Google Patents
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Abstract
본 발명은 에폭시 수지나 폴리벤즈옥사졸 수지 등의 수지원료, 또한 의약, 농약, 염료 및 전자재료 또는 이들의 중간체나 원료로서 유용한 신규한 비스(히드록시페닐)벤즈옥사졸 화합물의 제공을 과제로 한다.
상기 과제를 해결하기 위해, 본 발명은 하기 화학식 1
[화학식 1]
(화학식 중 R1은 탄소원자수 1~8의 알킬기, 탄소원자수 1~8의 알콕시기, 페닐기 또는 할로겐원자를 나타내고, R2는 수소원자, 탄소원자수 1~8의 알킬기, 탄소원자수 1~8의 알콕시기, 페닐기 또는 할로겐원자를 나타내며, A는 탄소원자수 5~10의 시클로알킬리덴기를 나타내고, n은 0 또는 1~4의 정수를 나타낸다.)
로 표시되는 비스(히드록시페닐)벤즈옥사졸 화합물을 제공한다.The present invention aims to provide a novel bis (hydroxyphenyl) benzoxazole compound which is useful as a resin material such as an epoxy resin or a polybenzoxazole resin, as well as medicines, agricultural chemicals, dyes and electronic materials, or intermediates or raw materials thereof do.
In order to solve the above-mentioned problems,
[Chemical Formula 1]
(Wherein R 1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, a phenyl group or a halogen atom, R 2 represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, An alkoxy group, a phenyl group or a halogen atom, A represents a cycloalkylidene group having 5 to 10 carbon atoms, and n represents 0 or an integer of 1 to 4.)
(Hydroxyphenyl) benzoxazole compound represented by the following formula (I).
Description
본 발명은 신규한 비스(히드록시페닐)벤즈옥사졸 화합물에 관한 것이다. 상세하게는 에폭시 수지 등의 수지원료, 또한 의약, 농약, 염료 및 전자재료 또는 이들의 중간체나 원료로서 유용한 비스(히드록시페닐)벤즈옥사졸 화합물에 관한 것이다. The present invention relates to novel bis (hydroxyphenyl) benzoxazole compounds. (Hydroxyphenyl) benzoxazole compound useful as a resin material such as an epoxy resin, a medicament, an agricultural chemical, a dye and an electronic material, or an intermediate or raw material thereof.
비스(히드록시페닐)벤즈옥사졸류는 에폭시 수지 등의 수지원료로서 사용한 경우, 인장강도, 굽힘강도, 충격강도, 내열성, 전기특성이 우수하기 때문에 원료로서 기대받고 있다.Bis (hydroxyphenyl) benzoxazoles are expected as raw materials because they are excellent in tensile strength, bending strength, impact strength, heat resistance and electrical characteristics when used as a resin raw material such as epoxy resin.
이러한 비스(히드록시페닐)벤즈옥사졸류로서 종래 2,2'-디(4-히드록시페닐)-6,6'-비벤즈옥사졸이나 2,2-헥사플루오로프로필리덴기를 갖는 2,2-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]헥사플루오로프로판 등이 알려져 있다(특허문헌 1, 특허문헌 2).As such bis (hydroxyphenyl) benzoxazoles, 2,2'-di (4-hydroxyphenyl) -6,6'-bibenzoxazole and 2,2-hexafluoropropylidene group -Bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] hexafluoropropane and the like are known (Patent Document 1, Patent Document 2).
여기서, 2,2'-디(4-히드록시페닐)-6,6'-비벤즈옥사졸은 고융점이며 또한 용제에 대한 용해성이 낮기 때문에 공업적으로 실시하는 경우에 있어서 작업성과 조작성에 문제가 있고, 또한 2,2-헥사플루오로프로필리덴기를 갖는 2,2-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]헥사플루오로프로판은 내열성이 충분하지는 않다. Here, since 2,2'-di (4-hydroxyphenyl) -6,6'-bibenzoxazole has a high melting point and a low solubility in solvents, it is problematic in terms of workability and operability when it is industrially carried out 2,2-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] hexafluoropropane having a 2,2-hexafluoropropylidene group is not sufficient in heat resistance.
따라서, 작업성과 조작성이 좋고, 또한 내열성도 우수한 신규한 화학구조를 갖는 비스(히드록시페닐)벤즈옥사졸 화합물의 개발이 강하게 요구되고 있다. Therefore, there is a strong demand for development of bis (hydroxyphenyl) benzoxazole compounds having a novel chemical structure with good workability, operability and excellent heat resistance.
본 발명은 에폭시 수지나 폴리벤즈옥사졸 수지 등의 수지원료, 또한 의약, 농약, 염료 및 전자재료 또는 이들의 중간체나 원료로서 유용한 신규한 비스(히드록시페닐)벤즈옥사졸 화합물을 제공한다.The present invention provides a novel bis (hydroxyphenyl) benzoxazole compound useful as a resin raw material such as an epoxy resin or a polybenzoxazole resin, as well as medicines, agricultural chemicals, dyes and electronic materials, or intermediates or raw materials for the same.
본 발명자들은 상기와 같은 비스(히드록시페닐)벤즈옥사졸 화합물의 문제점을 예의 검토한 결과, 비스(히드록시페닐)벤즈옥사졸 화합물의 중심 골격을 시클로알킬리덴기로 함으로써, 용제 용해성과 내열성 밸런스가 우수한 신규한 비스(히드록시페닐)벤즈옥사졸 화합물을 발견하고 본 발명을 완성하였다. The present inventors have intensively studied the problems of the bis (hydroxyphenyl) benzoxazole compound as described above. As a result, it has been found that by making the central skeleton of the bis (hydroxyphenyl) benzoxazole compound a cycloalkylidene group, a balance between solvent solubility and heat resistance And discovered a novel novel bis (hydroxyphenyl) benzoxazole compound and completed the present invention.
본 발명에 의하면, 하기 화학식 1로 표시되는 비스(히드록시페닐)벤즈옥사졸 화합물이 제공된다.According to the present invention, there is provided a bis (hydroxyphenyl) benzoxazole compound represented by the following general formula (1).
(화학식 중 R1은 탄소원자수 1~8의 알킬기, 탄소원자수 1~8의 알콕시기, 페닐기 또는 할로겐원자를 나타내고, R2는 수소원자, 탄소원자수 1~8의 알킬기, 탄소원자수 1~8의 알콕시기, 페닐기 또는 할로겐원자를 나타내며, A는 탄소원자수 5~10의 시클로알킬리덴기를 나타내고, n은 0 또는 1~4의 정수를 나타낸다.)(Wherein R 1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, a phenyl group or a halogen atom, R 2 represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, An alkoxy group, a phenyl group or a halogen atom, A represents a cycloalkylidene group having 5 to 10 carbon atoms, and n represents 0 or an integer of 1 to 4.)
본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물은 중심 골격에 시클로알킬리덴 골격을 갖고, 이러한 중심 골격이 지방족 고리 구조를 갖는 것으로부터 비교적 저융점으로 용제 용해성도 좋다. The bis (hydroxyphenyl) benzoxazole compound of the present invention has a cycloalkylidene skeleton in its central skeleton, and its central skeleton has an aliphatic cyclic structure, so that it has a relatively low melting point and is also excellent in solvent solubility.
또한 본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물을 원료로 하는 수지는 2,2-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]헥사플루오로프로판을 원료로 하는 수지보다도 내열성도 우수한 것을 기대할 수 있다. In addition, the resin containing the bis (hydroxyphenyl) benzoxazole compound of the present invention as a raw material is preferably a resin containing 2,2-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] hexafluoropropane as a raw material It can be expected that heat resistance is superior to resin.
아래에 본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물에 대해서 상세하게 설명한다. The bis (hydroxyphenyl) benzoxazole compound of the present invention will be described in detail below.
본 발명의 상기 화학식 1로 표시되는 비스(히드록시페닐)벤즈옥사졸 화합물에 있어서, 화학식 중 R1, R2로 나타내어지는 탄소원자수 1~8의 알킬기로서는 직쇄상, 분지쇄상 또는 환상의 알킬기이고, 바람직하게는 탄소원자수 1~4의 알킬기 또는 탄소원자수 5~8의 시클로알킬기이며, 보다 바람직하게는 탄소원자수 1~4의 직쇄상 또는 분지쇄상의 알킬기이다. In the bis (hydroxyphenyl) benzoxazole compound represented by Formula 1 of the present invention, the alkyl group having 1 to 8 carbon atoms represented by R 1 and R 2 in the formula is a linear, branched or cyclic alkyl group , Preferably an alkyl group having 1 to 4 carbon atoms or a cycloalkyl group having 5 to 8 carbon atoms, more preferably a linear or branched alkyl group having 1 to 4 carbon atoms.
이러한 알킬기로서 구체적으로는, 예를 들면 메틸기, 에틸기, 이소프로필기, t-부틸기, 이소부틸기, 시클로헥실기, 시클로펜틸기 등을 들 수 있다. Specific examples of such alkyl groups include methyl, ethyl, isopropyl, t-butyl, isobutyl, cyclohexyl, and cyclopentyl.
이러한 알킬기에는 본 발명의 효과를 방해하지 않는 범위에서 할로겐원자, 알콕시기, 페닐기 등이 치환되어 있어도 되나, 치환되어 있지 않은 쪽이 바람직하다. Such an alkyl group may be substituted with a halogen atom, an alkoxy group, a phenyl group or the like within the range not hindering the effect of the present invention, but is preferably not substituted.
또한 화학식 중 탄소원자수 1~8의 알콕시기로서는 직쇄상, 분지쇄상 또는 환상의 알콕시기이고, 바람직하게는 탄소원자수 1~4의 알콕시기 또는 탄소원자수 5~8의 시클로알콕시기이며, 보다 바람직하게는 탄소원자수 1~4의 직쇄상 또는 분지쇄상의 알콕시기이다. 이러한 알콕시기로서 구체적으로는, 예를 들면 메톡시기, 에톡시기, n-프로폭시기, 이소프로폭시기, n-부톡시기, 시클로펜틸옥시기, 시클로헥실옥시기 등을 들 수 있다. 이러한 알콕시기에는 본 발명의 효과를 방해하지 않는 범위에서 할로겐원자, 알콕시기, 페닐기 등이 치환되어 있어도 되나, 치환되어 있지 않은 쪽이 바람직하다. The alkoxy group having 1 to 8 carbon atoms in the formula is preferably a linear, branched or cyclic alkoxy group, preferably an alkoxy group having 1 to 4 carbon atoms or a cycloalkoxy group having 5 to 8 carbon atoms, Is a linear or branched alkoxy group having 1 to 4 carbon atoms. Specific examples of such alkoxy groups include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, cyclopentyloxy, cyclohexyloxy and the like. Such an alkoxy group may be substituted with a halogen atom, an alkoxy group, a phenyl group or the like within the range not hindering the effect of the present invention, but is preferably not substituted.
화학식 중 R1, R2로 나타내어지는 페닐기로서는 치환기가 없는 페닐기가 바람직하다. 그러나 페닐기에는 본 발명의 효과를 방해하지 않는 범위에서 메틸기 등의 알킬기, 메톡시기 등의 알콕시기, 할로겐원자 등이 치환되어 있어도 된다. The phenyl group represented by R 1 and R 2 in the formula is preferably a phenyl group having no substituent. However, the phenyl group may be substituted with an alkyl group such as a methyl group, an alkoxy group such as a methoxy group, a halogen atom or the like to the extent that the effect of the present invention is not impaired.
화학식 중 R1, R2로 나타내어지는 할로겐원자로서는 구체적으로는 불소원자, 염소원자, 브롬원자, 요오드원자를 들 수 있다.Specific examples of the halogen atom represented by R 1 and R 2 in the formula include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
상기 치환기 R1, R2에 있어서 바람직한 R1은 알킬기 또는 페닐기이고, 보다 바람직한 R1은 알킬기이며, 바람직한 R2는 알킬기, 페닐기 또는 수소원자이고, 보다 바람직한 R2는 수소원자이다. In the substituents R 1 and R 2 , preferable R 1 is an alkyl group or a phenyl group, more preferably R 1 is an alkyl group, and preferable R 2 is an alkyl group, a phenyl group or a hydrogen atom, and more preferably R 2 is a hydrogen atom.
또한 히드록시페닐기의 치환기 R1의 치환 수 n은 0 또는 1~4의 정수를 나타내며, 바람직하게는 0,1 또는 2이고, 보다 바람직하게는 0 또는 1이며, 특히 바람직하게는 0이다. R1의 치환 위치는 수산기에 대해 오르토 위치 또는 파라 위치가 바람직하고, 수산기의 치환 위치가 벤즈옥사졸 골격과의 결합 위치에 대해 파라 위치인 경우에는 R1의 치환 위치는 수산기에 대해 오르토 위치가 바람직하다. The substitution number n of the substituent R 1 of the hydroxyphenyl group represents 0 or an integer of 1 to 4, preferably 0, 1 or 2, more preferably 0 or 1, and particularly preferably 0. [ The substitution position of R 1 is preferably if the ortho position or para position to the hydroxyl group, and the substituted position of the hydroxyl group in the para position to the bonding site with the benzoxazole skeleton is a R 1 The substitution position is preferably ortho to the hydroxyl group.
히드록시페닐기의 수산기의 치환 위치에 대해서 벤즈옥사졸 골격과 결합한 위치에 대해 파라 위치, 메타 위치가 바람직하고, 특히 파라 위치가 바람직하다. The substitution position of the hydroxy group of the hydroxyphenyl group is preferably a para position or a meta position with respect to the position bonded to the benzoxazole skeleton, particularly preferably a para position.
상기 화학식 1에 있어서, 식 중 A는 탄소원자수 5~10의 시클로알킬리덴기를 나타낸다. In the above formula (1), A represents a cycloalkylidene group having 5 to 10 carbon atoms.
이러한 시클로알킬리덴기로서는 구체적으로는, 예를 들면 시클로펜탄-1,1-디일기, 시클로헥산-1,1-디일기, 시클로헵탄-1,1-디일기, 3,3,5-트리메틸시클로헥산-1,1-디일기 등을 들 수 있다.Specific examples of such cycloalkylidene groups include cyclopentane-1,1-diyl group, cyclohexane-1,1-diyl group, cycloheptane-1,1-diyl group, 3,3,5-trimethyl Cyclohexane-1,1-diyl group and the like.
보다 바람직하게는 내열성의 관점에서 3,3,5-트리메틸시클로헥산-1,1-디일기이다. More preferred is a 3,3,5-trimethylcyclohexane-1,1-diyl group from the viewpoint of heat resistance.
또한 이러한 시클로알칸 골격에는 알킬기가 치환되어 있어도 되고, 바람직하게는 메틸기이며, 바람직한 치환 수는 1~3이다. The cycloalkane skeleton may be substituted with an alkyl group, preferably a methyl group, and the preferred number of substituents is 1 to 3. [
이러한 본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물로서는 구체적으로는, 예를 들면Specific examples of the bis (hydroxyphenyl) benzoxazole compound of the present invention include, for example,
1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산,1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane,
1,1-비스[2-(3,5-디-tert-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산,Butyl-4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane, 1,1-bis [2- (3,5-
1-비스[2-(3-tert-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산,1-bis [2- (3-tert-butyl-4-hydroxyphenyl) -5- benzoxazolyl] -3,3,5-trimethylcyclohexane,
1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]시클로헥산,1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] cyclohexane,
1,1-비스[2-(3-tert-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]시클로헥산,1,1-bis [2- (3-tert-butyl-4-hydroxyphenyl) -5-benzoxazolyl] cyclohexane,
1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]시클로펜탄,1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] cyclopentane,
1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]시클로헵탄,1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] cycloheptane,
1,1-비스[2-(3-메틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산,Bis [2- (3-methyl-4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane,
1,1-비스[2-(4-히드록시페닐)-7-메틸-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산,1,1-bis [2- (4-hydroxyphenyl) -7-methyl-5-benzoxazolyl] -3,3,5-trimethylcyclohexane,
1,1-비스[2-(3-메틸-4-히드록시페닐)-5-벤즈옥사졸릴]시클로헥산,1,1-bis [2- (3-methyl-4-hydroxyphenyl) -5-benzoxazolyl] cyclohexane,
1,1-비스[2-(3-메틸-4-히드록시페닐)-5-벤즈옥사졸릴]시클로펜탄,Bis [2- (3-methyl-4-hydroxyphenyl) -5-benzoxazolyl] cyclopentane,
1,1-비스[2-(3-페닐-4-히드록시페닐)-5-벤즈옥사졸릴]시클로헥산 등을 들 수 있다.And 1,1-bis [2- (3-phenyl-4-hydroxyphenyl) -5-benzoxazolyl] cyclohexane.
상기와 같은 본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물은 그 제조방법에 대해서는 조금도 제한되지 않는다. 예를 들면 아래의 방법 등을 들 수 있다.The method for producing the bis (hydroxyphenyl) benzoxazole compound of the present invention as described above is not limited in any way. For example, the following method can be used.
(방법 1)(Method 1)
목적의 비스(히드록시페닐)벤즈옥사졸 화합물에 대응하는 하기 화학식 3의 비스아미노페놀류와 히드록시안식향산류를 원료로 하여 유기용매 중 가온하에서 축합 반응을 행하는 방법(일본국 특허공개 제2007-262204호 공보 등)을 들 수 있다. 당해 제조방법에 대해서, 예를 들면 비스아미노페놀류로서 1,1-비스(3-아미노-4-히드록시페닐)-3,3,5-트리메틸시클로헥산, 히드록시안식향산류로서 4-히드록시안식향산페닐에스테르를 원료로 한 경우에 대해서 기술한다. 그의 반응식은 예를 들면 하기 식으로 표시된다. A method in which a condensation reaction is carried out in an organic solvent at an elevated temperature using a bisaminophenol compound represented by the following formula (3) and a hydroxybenzoic acid compound corresponding to the target bis (hydroxyphenyl) benzoxazole compound as a raw material (Japanese Patent Application Laid-Open No. 2007-262204 And the like). As to the production method, for example, 1,1-bis (3-amino-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane as a bisaminophenol, 4-hydroxybenzoic acid Phenyl ester is used as a raw material. The reaction formula thereof is represented by the following formula, for example.
반응식(1)Reaction formula (1)
상기 반응에서 사용되는 히드록시안식향산류로서는, 예를 들면 하기 화학식 2로 표시되는 히드록시안식향산페닐에스테르류를 들 수 있다.Examples of the hydroxybenzoic acids used in the above reaction include hydroxybenzoic acid phenyl esters represented by the following formula (2).
(화학식 중 R1 및 n은 화학식 1의 그것과 동일하다.)(Wherein R < 1 > and n are the same as those in formula (1)).
또한 상기 반응 시 비스아미노페놀류와 히드록시안식향산페닐에스테르류의 원료 몰 비로서는, 통상 비스아미노페놀류 1 몰에 대해 히드록시안식향산페닐에스테르류를 통상 2~5 몰의 범위, 바람직하게는 2~3 몰의 범위이다. 반응 용매는 사용하는 쪽이 바람직하고, 예를 들면 N-메틸-2-피롤리돈 등의 N-알킬아미드 용매, 비페닐 등의 방향족 탄화수소류 또는 이들의 혼합용제를 들 수 있다. 용매의 사용량은 통상 비스아미노페놀류 1 중량부에 대해 1~20 중량부의 범위이다. 또한 반응 온도는 150~250℃의 범위, 반응 압력은 상압, 감압, 가압 중 어느 것이어도 되나, 부생하는 물이나 페놀류를 쉽게 제거하기 위해 감압으로 해도 된다. The molar ratio of the raw materials of the bisaminophenols and the hydroxybenzoic acid phenyl esters in the reaction is usually 2 to 5 moles, preferably 2 to 3 moles, of the hydroxybenzoic acid phenyl ester per mole of bisaminophenols, . The reaction solvent is preferably used, and examples thereof include N-alkylamide solvents such as N-methyl-2-pyrrolidone and the like, aromatic hydrocarbons such as biphenyl, and mixed solvents thereof. The amount of the solvent to be used is usually in the range of 1 to 20 parts by weight based on 1 part by weight of bisaminophenols. The reaction temperature may be in the range of 150 to 250 占 폚, and the reaction pressure may be atmospheric pressure, reduced pressure, or pressurized, but may be reduced to easily remove by-product water or phenols.
반응은 예를 들면 원료, 반응 용매를 반응 용기에 일괄하여 넣고 불활성 가스로 치환한 후, 150℃~180℃ 정도의 반응 온도까지 승온·교반하여, 계내를 감압하면서 부생하는 물이나 페놀류를 유출(溜出)시키면서 반응시킨다. 그 후, 추가로 계내를 200~250℃ 정도까지 승온하여 폐환탈수 반응을 완결시킨다. 반응 종료 후, 얻어진 반응 생성물로부터 공지의 정제방법을 사용하여 목적물을 조제물(粗製物) 내지 정제물로서 얻을 수 있다. For example, raw materials and reaction solvents are collectively charged into a reaction vessel, and the mixture is heated to a reaction temperature of about 150 ° C. to 180 ° C. After the system is depressurized, water and phenolics Distillation). Thereafter, the system is further heated to about 200 to 250 ° C to complete the cyclic dehydration reaction. After completion of the reaction, the desired product can be obtained from the obtained reaction product as a crude product or a purified product using a known purification method.
예를 들면 얻어진 반응액을 냉각하거나 또는 물을 첨가함으로써 석출 또는 재침전된 고체나 결정을 여과 분별하고, 이것을 추가로 물, 메탄올로 세정하고 건조하여 목적물을 얻을 수 있다. For example, a solid or a crystal precipitated or reprecipitated by cooling the obtained reaction solution or by adding water may be filtered off, washed with water and methanol, and dried to obtain the desired product.
상기 방법에 있어서 비스아미노페놀류는 하기 화학식 3으로 표시된다. In the above method, the bisaminophenols are represented by the following formula (3).
(화학식 중 R2, A는 화학식 1의 그것과 동일하다.)(R 2 in the formula, A is the same as that in formula (1)).
따라서, 이러한 비스아미노페놀류로서는, 본 발명의 비스(히드록시페닐벤즈옥사졸) 화합물에 대응하고, 구체적으로는, 예를 들면 1,1-비스(3-아미노-4-히드록시페닐)시클로헥산, 1,1-비스(3-아미노-5-메틸-4-히드록시페닐)시클로헥산, 1,1-비스(3-아미노-4-히드록시페닐)-3,3,5-트리메틸시클로헥산, 1,1-비스(3-아미노-4-히드록시페닐)시클로펜탄, 1,1-비스(3-아미노-4-히드록시페닐)시클로헵탄 등을 들 수 있다.Accordingly, such bisaminophenols correspond to the bis (hydroxyphenylbenzoxazole) compounds of the present invention, and specific examples thereof include 1,1-bis (3-amino-4-hydroxyphenyl) cyclohexane (3-amino-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane (1,1-bis , 1,1-bis (3-amino-4-hydroxyphenyl) cyclopentane, and 1,1-bis (3-amino-4-hydroxyphenyl) cycloheptane.
이러한 비스아미노페놀류는, 예를 들면 반응식(2)로 나타내는 바와 같이 대응하는 비스페놀 화합물을 질산 존재하에서 니트로화 하여 얻어진 비스(니트로페놀) 화합물의 니트로기를, 예를 들면 팔라듐카본이나 니켈 등의 수소화 촉매 존재하에서 수소 가스와 반응시키는 등의 공지의 환원 반응(일본국 특허공개 제2003-12611 공보, 일본국 특허공개 제2003-81925 공보 등) 처리함으로써 얻을 수 있다. These bisaminophenols can be obtained by, for example, nitration of the bis (nitrophenol) compound obtained by nitrating the corresponding bisphenol compound in the presence of nitric acid as shown in reaction formula (2), for example, a hydrogenation catalyst such as palladium carbon or nickel (Japanese Patent Application Laid-Open No. 2003-12611, Japanese Patent Application Laid-Open No. 2003-81925, etc.), for example, by reacting with hydrogen gas in the presence of a catalyst.
반응식(2)Reaction formula (2)
(화학식 중 R2, A는 화학식 1의 그것과 동일하다.)(R 2 in the formula, A is the same as that in formula (1)).
(방법 2)(Method 2)
본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물을 얻는 다른 방법으로서는, 목적의 비스(히드록시페닐)벤즈옥사졸 화합물에 대응하는 하기 화학식 4로 표시되는 비스니트로페놀류와 하기 화학식 5로 표시되는 메틸페놀류를 원료로 하여 유기용매 중, 바람직하게는 촉매 존재하 가온하에서 탈수축합 반응을 행하는 방법을 들 수 있다.As another method for obtaining the bis (hydroxyphenyl) benzoxazole compound of the present invention, bisnitrophenols represented by the following formula (4) corresponding to the aimed bis (hydroxyphenyl) benzoxazole compound and bis Methylphenol as a raw material and performing a dehydration condensation reaction in an organic solvent, preferably at a temperature in the presence of a catalyst.
예를 들면 비스(니트로페놀)류로서 1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산, 메틸페놀류로서 2,6-디-t-부틸-p-크레졸을 원료로 한 경우에 대해서 기술한다. 그 반응은 예를 들면 하기 반응식(3)으로 표시된다. (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane as a bis (nitrophenol), 2,6-di-t- The case where p-cresol is used as a raw material is described. The reaction is represented, for example, by the following reaction formula (3).
반응식(3)Reaction formula (3)
상기 방법에 있어서 비스니트로페놀류는 하기 화학식 4로 표시된다. In the above method, the bis-nitrophenols are represented by the following formula (4).
(화학식 중 R2, A는 화학식 1의 그것과 동일하다.)(R 2 in the formula, A is the same as that in formula (1)).
따라서, 이러한 비스니트로페놀류로서는 본 발명의 비스(히드록시페닐벤즈옥사졸) 화합물에 대응하고, 구체적으로는 1,1-비스(3-니트로-4-히드록시페닐)시클로헥산, 1,1-비스(3-니트로-5-메틸-4-히드록시페닐)시클로헥산, 1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산, 1,1-비스(3-니트로-4-히드록시페닐)시클로펜탄, 1,1-비스(3-니트로-4-히드록시페닐)시클로헵탄 등을 들 수 있다.Accordingly, such bisnitrophenols correspond to the bis (hydroxyphenylbenzoxazole) compound of the present invention, and specifically include 1,1-bis (3-nitro-4-hydroxyphenyl) cyclohexane, 1,1- Bis (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane, 1,1- Bis (3-nitro-4-hydroxyphenyl) cyclopentane, and 1,1-bis (3-nitro-4-hydroxyphenyl) cycloheptane.
이러한 비스니트로페놀류는, 예를 들면 상기 화학식 4로 표시되는 비스니트로페놀류에 대응하는 하기 화학식 6으로 표시되는 비스페놀류를, 예를 들면 실질적으로 다른 산이 존재하지 않는 조건하에서 50~80% 질산으로 5℃ 이하의 온도에서 니트로화 하는 등, 공지의 방법(WO01/81293호 공보, 일본국 특허공개 평11-106365호 공보 등)으로 니트로화 함으로써 얻을 수 있다. Such bis-nitrophenols can be prepared by, for example, treating bisphenols represented by the following formula (6) corresponding to the bis-nitrophenols represented by the above formula (4) with 5 to 80% nitric acid under conditions that substantially no other acid exists Or by nitration with a known method (WO01 / 81293, Japanese Patent Application Laid-Open No. 11-106365, etc.).
(화학식 중 R2, A는 화학식 2의 그것과 동일하다.)(R 2 in the formula, A is the same as that in formula (2)).
상기 방법에서의 원료의 메틸페놀류는 하기 화학식 5로 표시된다. The methyl phenols of the raw materials in the above method are represented by the following formula (5).
(화학식 중 R1, n은 화학식 1의 그것과 동일하다. )(Wherein R 1 and n are the same as those in formula (1)).
따라서, 이러한 메틸페놀류로서는 본 발명의 비스(히드록시페닐벤즈옥사졸) 화합물에 대응하고, 구체적으로는, 예를 들면 2,6-디-t-부틸-4-메틸페놀, 2,4-디메틸-6-t-부틸페놀, 2-t-부틸-4-메틸페놀, 2,4,6-트리메틸페놀, 2-메톡시-4-메틸페놀 등을 들 수 있다.Accordingly, such methylphenols correspond to the bis (hydroxyphenylbenzoxazole) compounds of the present invention, and specific examples thereof include 2,6-di-t-butyl-4-methylphenol, 2,4- -6-t-butylphenol, 2-t-butyl-4-methylphenol, 2,4,6-trimethylphenol and 2-methoxy-4-methylphenol.
상기 반응 시 비스니트로페놀류와 메틸페놀류의 원료 몰 비로서는, 통상 비스니트로페놀류 1 몰에 대해 메틸페놀류를 통상 2~10 몰의 범위, 바람직하게는 3~5 몰의 범위이다.The molar ratio of the starting materials of the bis-nitrophenols and the methyl phenols in the reaction is usually in the range of 2 to 10 moles, preferably 3 to 5 moles, per 1 mole of the bis-nitrophenols.
촉매는 사용하지 않아도 되나, 수율 향상을 위해서는 사용하는 쪽이 바람직하다. 촉매를 사용하는 경우, 촉매로서는 철(철분), 황 또는 황화나트륨 또는 이들의 혼합물이 바람직하고, 촉매량은 원료인 비스니트로페놀류 1 몰에 대해 통상 0.01~3 몰의 범위이고, 철의 경우는 0.1~0.3 몰의 범위가 바람직하며, 황의 경우는 1.5~2.5 몰의 범위가 바람직하고, 2 몰이 더욱 바람직하다.The catalyst is not required to be used but is preferably used for improving the yield. When the catalyst is used, the catalyst is preferably iron (iron powder), sulfur or sodium sulfide or a mixture thereof. The amount of the catalyst is usually in the range of 0.01 to 3 moles per 1 mole of the raw material bisnitrophenol, To 0.3 mol, and in the case of sulfur, it is preferably in the range of 1.5 to 2.5 mol, more preferably 2 mol.
반응 용매는 사용하는 쪽이 바람직하고, 예를 들면 o-디클로로벤젠 등의 할로겐화 방향족 화합물, 비페닐 등의 방향족 탄화수소 용매, 2,6-디메틸나프탈렌, 2,6-디이소부틸나프탈렌 등의 알킬나프탈렌류, N-메틸-2-피롤리돈 등의 아미드 용매, 테트라에틸렌글리콜디메틸에테르, 디에틸렌글리콜디부틸에테르 등의 폴리알킬렌글리콜에테르류 또는 이들의 혼합물을 들 수 있다. 용매 사용량은 비스니트로페놀류 1 중량부에 대해 바람직하게는 1~50 중량부의 범위, 보다 바람직하게는 10~40 중량부의 범위이다. The reaction solvent is preferably used, and for example, a halogenated aromatic compound such as o-dichlorobenzene, an aromatic hydrocarbon solvent such as biphenyl, an alkyl naphthalene such as 2,6-dimethyl naphthalene and 2,6- Amide solvents such as N-methyl-2-pyrrolidone, polyalkylene glycol ethers such as tetraethylene glycol dimethyl ether and diethylene glycol dibutyl ether, and mixtures thereof. The amount of the solvent to be used is preferably in the range of 1 to 50 parts by weight, more preferably 10 to 40 parts by weight, based on 1 part by weight of the bis (nitrophenols).
반응 온도로서는 바람직하게는 160℃~200℃의 범위, 보다 바람직하게는 170~190℃의 범위이다. 반응 압력은 상압, 가압, 감압 중 어느 것이어도 된다. 반응 용매의 상압에서의 비점이 반응 온도보다도 낮은 경우 등 온도를 높게 하기 위해 가압하여 조정해도 된다. The reaction temperature is preferably in the range of 160 占 폚 to 200 占 폚, and more preferably in the range of 170 to 190 占 폚. The reaction pressure may be atmospheric pressure, pressure or reduced pressure. And may be adjusted by pressurization to raise the temperature, for example, when the boiling point of the reaction solvent at normal pressure is lower than the reaction temperature.
반응은 예를 들면 반응 용기에 소정량의 비스니트로페놀류, 메틸페놀류, 촉매 및 반응 용매를 넣고 질소 기류하에서 교반하면서 소정의 반응 온도까지 승온하여 그 온도를 유지하면서 반응을 행한다. The reaction is carried out, for example, by adding a predetermined amount of a bis-nitrophenol, a methyl phenol, a catalyst and a reaction solvent to a reaction vessel, raising the reaction temperature to a predetermined reaction temperature while stirring under a nitrogen stream, and maintaining the temperature.
반응 종료 후, 얻어진 반응 혼합물로부터 통상의 방법에 따라 촉매 분리, 저비점분의 유출 분리, 정석 여과 등의 공지의 방법을 적절하게 사용함으로써 목적물인 비스(히드록시페닐)벤즈옥사졸류의 조제품을 얻을 수 있고, 이것을 추가로 필요에 따라 재차 정석 여과, 칼럼 분리 등의 방법으로 정제하면 고순도품을 얻을 수 있다. After the completion of the reaction, a known preparation of bis (hydroxyphenyl) benzoxazoles is obtained from the obtained reaction mixture according to a conventional method by appropriately using known methods such as catalyst separation, outflow separation of low boiling point fractions, and crystallization filtration If necessary, it is purified again by crystallization filtration, column separation or the like to obtain a high-purity product.
예를 들면 반응액을 그대로 냉각 또는 빈용매를 첨가하여 냉각함으로써, 결정이 석출되는 경우에는 그 결정을 여과 분별함으로써 조제 또는 고순도의 목적물을 얻을 수 있다. 또는 반응 종료 후, 반응 용매 등을 감압하에서 농축하고, 그의 잔사를 칼럼크로마토그래피 등으로 정제함으로써 고순도품을 얻는 것도 가능하다.For example, when the crystals precipitate by cooling the reaction liquid as it is or cooling it by adding a poor solvent, the crystals are separated by filtration to obtain a desired product with high purity. Alternatively, after completion of the reaction, the reaction solvent and the like are concentrated under reduced pressure, and the residue thereof is purified by column chromatography or the like to obtain a high-purity product.
(방법 3)(Method 3)
본 발명의 비스(히드록시페닐)벤즈옥사졸 화합물을 얻는 또 하나의 방법으로서는, 상기 화학식 1에 있어서 n이 1 이상이고 또한 치환기 R1의 하나 이상이 tert-부틸기 등의 3급 알킬기이거나 또는/및 치환기 R2가 t-부틸기 등의 3급 알킬기인 중간체로서의 비스(히드록시페닐)벤즈옥사졸 화합물을 얻고, 얻어진 중간체로서의 3급 알킬기가 치환된 비스(히드록시페닐)벤즈옥사졸로부터 산촉매 존재하 가온하에서 탈부틸하는 등의 공지의 방법(일본국 특허공개 평2-169530호 공보, 일본국 특허공개 평8-143494호 공보 등)에 따라 t-부틸기 등의 3급 알킬기를 탈리시키고, 수소원자로 치환하여 목적의 비스(히드록시페닐)벤즈옥사졸을 얻는 방법을 들 수 있다.As another method for obtaining the bis (hydroxyphenyl) benzoxazole compound of the present invention, n is 1 or more and at least one of the substituents R 1 is a tertiary alkyl group such as a tert-butyl group in the above formula (1) / And substituent R < 2 > (hydroxyphenyl) benzoxazole compound as an intermediate which is a tertiary alkyl group such as a t-butyl group and the like. The bis (hydroxyphenyl) benzoxazole compound in which the tertiary alkyl group is substituted as the intermediate is obtained, Butyl group or the like is cleaved and substituted with a hydrogen atom in accordance with a known method such as a method in which a tertiary alkyl group such as t-butyl is removed according to a known method (Japanese Patent Application Laid-open No. Hei 2-169530 and Japanese Unexamined Patent Publication No. 8-143494) To obtain a target bis (hydroxyphenyl) benzoxazole.
예를 들면 비스(니트로페놀)류로서 1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산, 메틸페놀류로서 2,6-디-t-부틸-p-크레졸을 원료로 하여, 상기 방법 2의 반응에 따라 얻어진 중간체로서의 1,1-비스[2-(3,5-디-tert-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산으로부터 t-부틸기를 탈리하여 목적의 1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산을 얻는 경우에 대해서 기술한다. (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane as a bis (nitrophenol), 2,6-di-t- bis [2- (3,5-di-tert-butyl-4-hydroxyphenyl) -5-benzoxazolyl] pyrimidine as an intermediate obtained by the reaction of the above- The t-butyl group was removed from -3,3,5-trimethylcyclohexane to obtain the desired 1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclo Hexane is obtained.
그 반응은 예를 들면 하기 반응식(4)로 표시된다. The reaction is represented by, for example, the following reaction formula (4).
반응식(4)Reaction formula (4)
상기 탈부틸화 반응 시 산촉매로서는 p-톨루엔설폰산, p-톨루엔설폰산무수물 등의 고비점의 산이 바람직하고, 촉매의 양으로서는 비스(히드록시페닐)벤즈옥사졸 화합물에 대해 바람직하게는 1~50 몰%의 범위, 보다 바람직하게는 10~30 몰%의 범위이다. 반응 시 통상 용매가 사용되는데, 바람직한 용매로서는 페놀, m-크레졸 등의 페놀류를 들 수 있다. 용매의 양은 특별히 제한은 없으나, 통상 비스(히드록시페닐)벤즈옥사졸 화합물 1 중량부에 대해 10~500 중량부 정도가 바람직하다. 반응 온도는 통상 200~250℃ 정도의 범위이다. In the de-butylation reaction, an acid having a high boiling point such as p-toluenesulfonic acid and p-toluenesulfonic acid anhydride is preferable, and as the amount of the catalyst, To 50 mol%, and more preferably from 10 to 30 mol%. In the reaction, a usual solvent is used, and preferred examples of the solvent include phenols such as phenol and m-cresol. The amount of the solvent is not particularly limited, but is usually about 10 to 500 parts by weight based on 1 part by weight of the bis (hydroxyphenyl) benzoxazole compound. The reaction temperature is usually in the range of about 200 to 250 ° C.
반응은 예를 들면 반응 용기에 소정량의 t-부틸치환―비스(히드록시페닐)벤즈옥사졸 화합물, 촉매 및 반응 용매를 넣고 질소 분위기하에서 교반하면서 소정의 반응 온도까지 승온하여 그 온도를 유지하면서 반응을 행한다. The reaction is carried out, for example, by adding a predetermined amount of t-butyl substituted-bis (hydroxyphenyl) benzoxazole compound, catalyst, and reaction solvent to a reaction vessel and heating to a predetermined reaction temperature while stirring in a nitrogen atmosphere, The reaction is carried out.
반응 종료 후, 반응 혼합물로부터 목적물을 얻는 데는 정석, 농축 등의 공지의 정제방법을 사용할 수 있다. 예를 들면 반응액에 용매나 물을 첨가하거나 또는 농축하고, 또는 그의 조합으로 정석하여 석출된 목적물의 결정을 여과 분별한다. 반응액에 상기 조작을 실시하기 전에 물과 분리되는 용매를 첨가한 후에 수세(水洗)함으로써 수용성의 불순물을 제거해도 된다. 또한 알칼리 수용액에 의한 중화처리나 수세 등에 의해 반응액으로부터 촉매를 제거하거나 농축으로 저비점물 등을 제거하는 처리를 한 후, 칼럼크로마토그래피로 정제하는 것도 가능하다.After completion of the reaction, a known purification method such as crystallization and concentration can be used to obtain the desired product from the reaction mixture. For example, a solvent or water is added to the reaction mixture, or the mixture is concentrated or the mixture is crystallized, and the precipitated crystals of the objective substance are separated by filtration. The water-soluble impurities may be removed by adding water to the reaction solution before the above operation is performed, followed by washing with water. It is also possible to remove the catalyst from the reaction solution by neutralization with an aqueous alkaline solution, washing with water, or the like, or purify it by column chromatography after treatment to remove low boiling point or the like by concentration.
실시예Example
(제조예)(Production example)
1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산의 합성Synthesis of 1,1-bis (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane
100 ㎖ 삼구 플라스크에 1,1-비스(4-히드록시페닐)-3,3,5-트리메틸시클로헥산 9.32 g(0.030 mol), 디클로로메탄 50 ㎖ 및 교반용 자석을 넣은 후 냉각하고, 반응 온도 0~5℃를 유지하면서 70% 질산 6.10 g(0.067 mol)을 3시간에 걸쳐서 적하하였다. 추가로 당해 온도를 유지하면서 3시간 반응을 행하였다. 반응 종료 후, 반응액을 여과하고, 여과 분별된 결정에 1% 탄산수소나트륨 수용액, 이어서 증류수를 부어서 잘 세정하였다. 건조 후, 순도 99.9%(고속 액체 크로마토그래피법)의 1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산 6.0 g을 얻었다. 9.32 g (0.030 mol) of 1,1-bis (4-hydroxyphenyl) -3,3,5-trimethylcyclohexane, 50 ml of dichloromethane and a magnet for stirring were placed in a 100 ml three-necked flask, 6.10 g (0.067 mol) of 70% nitric acid was added dropwise over 3 hours while maintaining the temperature at 0 to 5 占 폚. Further, the reaction was carried out for 3 hours while maintaining the temperature. After completion of the reaction, the reaction solution was filtered, and 1% aqueous solution of sodium hydrogencarbonate and then distilled water were poured into the filtered crystals and washed well. After drying, 6.0 g of 1,1-bis (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane having a purity of 99.9% (high performance liquid chromatography) was obtained.
(실시예 1)(Example 1)
1,1-비스[2-(3,5-디-t-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산의 합성Synthesis of 1,1-bis [2- (3,5-di-t-butyl-4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane
100 ㎖ 시험관에 1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산 600.5 ㎎(1.50 mmol), 2,6-디-tert-부틸-p-크레졸 1,322.3 ㎎(6.00 mmol), 황분말 96.2 ㎎(3.00 mmol), 철분 16.8 ㎎(0.30 mmol) 및 o-디클로로벤젠 8 ㎖를 넣은 후, 상온에서 시험관 내를 아르곤 치환하였다. To a 100 ml test tube were added 600.5 mg (1.50 mmol) of 1,1-bis (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane, 2,6- , 96.2 mg (3.00 mmol) of sulfur powder, 16.8 mg (0.30 mmol) of iron powder and 8 ml of o-dichlorobenzene were placed, and the inside of the tube was replaced with argon at room temperature.
그 후, 교반하면서 180℃로 승온하여 당해 온도에서 환류시키면서 48시간 반응을 행하였다. 반응 종료 후, 감압하에서 저비점물을 유출시켜서 농축 잔사를 실리카겔 칼럼크로마토그래피로 정제하여 1,1-비스[2-(3,5-디-t-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산 571.5 ㎎을 얻었다. 1,1-비스(3-니트로-4-히드록시페닐)-3,3,5-트리메틸시클로헥산에 대한 수율은 50%였다. Thereafter, the temperature was raised to 180 캜 while stirring, and the reaction was carried out for 48 hours while refluxing at the temperature. After the completion of the reaction, the low boiling point product was distilled off under reduced pressure, and the concentrated residue was purified by silica gel column chromatography to obtain 1,1-bis [2- (3,5-di-t- butyl-4-hydroxyphenyl) Oxazolyl] -3,3,5-trimethylcyclohexane (571.5 mg). The yield for 1,1-bis (3-nitro-4-hydroxyphenyl) -3,3,5-trimethylcyclohexane was 50%.
분자량(HRMS / MALDI-TOF):769.4964(M+H)+ Molecular weight (HRMS / MALDI-TOF): 769.4964 (M + H) +
1H NMR 동정결과(300 ㎒, 용매:CDCl3, 내부표준:테트라메틸실란) 1 H NMR identification result (300 MHz, solvent: CDCl 3 , internal standard: tetramethylsilane)
(실시예 2)(Example 2)
1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산의 합성Synthesis of 1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane
10 ㎖의 내압용 시험관에 실시예 1에서 합성한 1,1-비스[2-(3,5-디-t-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산 154.2 ㎎(0.20 mmol), 페놀 2.91 g 및 p-톨루엔설폰산무수물 8.4 ㎎(4.9×10-2 mmol)을 넣고 밀폐하여, 마이크로파 반응 장치로 교반하면서 210℃로 승온하여 당해 온도에서 4시간 반응을 행하였다. Bis [2- (3,5-di-t-butyl-4-hydroxyphenyl) -5-benzoxazolyl] -3,3,3- (4.9 × 10 -2 mmol) of p-toluenesulfonic anhydride were introduced, and the temperature was raised to 210 ° C. with stirring in a microwave reactor, and the temperature For 4 hours.
추가로 230℃로 승온 후 3시간 반응을 행한 다음, 250℃로 승온 후 5시간 반응을 행하였다. After further raising the temperature to 230 占 폚, the reaction was carried out for 3 hours, then the temperature was raised to 250 占 폚 and the reaction was carried out for 5 hours.
반응 후 실온까지 냉각하여 얻어진 반응 종료액을 물에 첨가하고, 추가로 알칼리 수용액을 첨가하여 pH 6 정도로 중화하고, 수층을 제거하였다. 얻어진 유층을 실리카겔 칼럼크로마토그래피로 정제하여 1,1-비스[2-(4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산 42.0 ㎎을 얻었다. 1,1-비스[2-(3,5-디-t-부틸-4-히드록시페닐)-5-벤즈옥사졸릴]-3,3,5-트리메틸시클로헥산에 대한 수율은 39%였다. After completion of the reaction, the reaction mixture was cooled to room temperature, and the resulting reaction solution was added to water. Further, an aqueous alkaline solution was added to neutralize the solution to a pH of about 6, and the aqueous layer was removed. The obtained oil layer was purified by silica gel column chromatography to obtain 42.0 mg of 1,1-bis [2- (4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane. The yield based on 1,1-bis [2- (3,5-di-t-butyl-4-hydroxyphenyl) -5-benzoxazolyl] -3,3,5-trimethylcyclohexane was 39%.
융점 344℃(시차 주사 열량 분석법)Melting point 344 占 폚 (differential scanning calorimetry)
분자량(HRMS/ MALDI-TOF):545.2461(M+H)+ Molecular weight (HRMS / MALDI-TOF): 545.2461 (M + H) +
1H NMR 동정결과(300㎒, 용매:THF-d8, 내부표준:테트라메틸실란) 1 H NMR identification result (300 MHz, solvent: THF-d 8 , internal standard: tetramethylsilane)
(비교예)(Comparative Example)
실시예와 같은 방법으로 합성한 2,2'-디(4-히드록시페닐)-5,5'-비벤즈옥사졸(비교예 화합물)과 실시예 2에서 얻어진 화합물을 각각 메탄올, 톨루엔, 메틸이소부틸케톤(MIBK)에 실온에서 용해시켜 포화용액을 만들었다. 포화용액의 상청액을 채취하여 고속 액체 크로마토그래피로 농도를 측정하였다. 각각의 측정결과를 하기 표에 나타낸다. 또한 비교예 화합물의 융점은 410℃(시차 주사 열량 분석법)였다. Di (4-hydroxyphenyl) -5,5'-bibenzoxazole (comparative compound) synthesized in the same manner as in Example and the compound obtained in Example 2 were dissolved in methanol, toluene, methyl Was dissolved in isobutyl ketone (MIBK) at room temperature to prepare a saturated solution. The supernatant of the saturated solution was collected and the concentration was measured by high performance liquid chromatography. The results of each measurement are shown in the following table. The melting point of the comparative compound was 410 占 폚 (differential scanning calorimetry).
상기의 결과로부터 명확한 바와 같이, 본 발명의 벤즈옥사졸 화합물은 메탄올, 톨루엔, MIBK의 각 용매에 대한 용해성이 비교예 화합물에 비해 매우 우수하다. As is clear from the above results, the benzoxazole compound of the present invention is much more excellent in solubility in methanol, toluene, and MIBK than the comparative compound.
Claims (1)
[화학식 1]
(화학식 중 R1은 탄소원자수 1~8의 알킬기, 탄소원자수 1~8의 알콕시기, 페닐기 또는 할로겐원자를 나타내고, R2는 수소원자, 탄소원자수 1~8의 알킬기, 탄소원자수 1~8의 알콕시기, 페닐기 또는 할로겐원자를 나타내며, A는 탄소원자수 5~10의 시클로알킬리덴기를 나타내고, n은 0 또는 1~4의 정수를 나타낸다.)
로 표시되는 비스(히드록시페닐)벤즈옥사졸 화합물.
(1)
[Chemical Formula 1]
(Wherein R 1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, a phenyl group or a halogen atom, R 2 represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, An alkoxy group, a phenyl group or a halogen atom, A represents a cycloalkylidene group having 5 to 10 carbon atoms, and n represents 0 or an integer of 1 to 4.)
(Hydroxyphenyl) benzoxazole compound represented by the formula (I).
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