KR20110106599A - Method for forming alignment layer and optical laminated body from the same - Google Patents

Abstract

The present invention relates to a method of forming an alignment layer pattern and an optical laminate manufactured therefrom, and more particularly, to a mask film for forming an alignment layer pattern on an alignment layer formed on one side of a transparent base film and the other side of the transparent base film. By including the step of adhering the mask film to the film, it is possible to compensate for the disadvantages of the conventional method which had to stop the whole process for position alignment, exposure, etc. of the photo mask, and excellent dimensional accuracy because the mask film is moved integrally with the base film. In addition, the present invention relates to a method for forming an alignment film pattern capable of removing a mask by a simple method after the retarder pattern is formed, and an optical laminate manufactured therefrom.

Description

Method for forming an alignment film pattern and an optical laminate manufactured therefrom {METHOD FOR FORMING ALIGNMENT LAYER AND OPTICAL LAMINATED BODY FROM THE SAME}

The present invention relates to a method for forming an alignment layer pattern and an optical laminate manufactured therefrom that can compensate for the disadvantages of the conventional method, in which the entire process has to be stopped for the alignment and exposure of the photo mask.

3D stereoscopic imaging techniques can be broadly classified into a binocular stereoscopic technique and an autostereoscopic technique. The binocular parallax method uses a parallax image of left and right eyes, and includes a glasses method and a glasses-free method.

In general, stereoscopic imaging techniques utilize a patterned retardation layer using liquid crystals. Usually, the patterned retardation layer using liquid crystal includes a substrate; An alignment layer coated on the substrate and subjected to surface alignment; And a liquid crystal coated on the alignment layer and aligned.

The liquid crystal is surface-aligned on the alignment film with a photoreactive liquid crystal, and then crosslinked and solidified by light irradiation such as ultraviolet rays to form a polymer liquid crystal film.

Orientation is a light that rubs the alignment layer using a roll wound with a soft fabric and irradiates the alignment layer with a rubbing orientation or polarized ultraviolet rays to set the surface alignment direction according to the rubbing direction, and sets the surface alignment direction according to the polarization direction. Orientation is used.

Since the rubbing orientation uses photolithography for the formation of the pattern, the process is very complicated, the cost of the material used is high, and the defect rate is high, which leads to poor productivity.

The light orientation is a non-contact orientation, with no ingress of dust at the source, so the productivity is excellent. However, if the dimensional accuracy is low when the photomask is positioned to form the pattern, a region in which the orientation is not well defined between the pattern and the pattern may be generated, thereby degrading the quality of the patterned retardation layer. In addition, when the alignment of the photomask is incorrect, the orientation of the mask border region may be incorrect.

Therefore, since the alignment of the photomask should be made with high dimensional accuracy, there is a problem that the manufacturing time required per unit of product in the alignment process is long, and an expensive mask alignment device is required. In addition, in order to maintain the dimensional accuracy of the aligned photomask, the light irradiation is performed in a state where the process is stopped, so there is a problem that the production process time is long and productivity is lowered.

The present invention is to provide a method of forming an alignment layer pattern capable of forming a pattern having excellent dimensional accuracy on the alignment layer without the alignment process of the conventional photomask.

In another aspect, the present invention is to provide a method of forming an alignment layer pattern is unnecessary to stop the entire process for the alignment and exposure of the photo mask.

In addition, the present invention is to provide a method for forming an alignment layer pattern that can remove the mask in a simple manner without damaging the base film and the alignment layer pattern after forming the alignment layer pattern.

In addition, the present invention is to provide an optical laminate produced by the method of forming the alignment layer pattern.

1. A method of forming an alignment film pattern comprising a mask film adhesion step of adhering a mask film for forming an alignment film pattern on an alignment film formed on one side of a transparent base film to the other side of the transparent base film.

2. The method of forming the alignment layer pattern according to the above 1, further comprising an exposure step of irradiating light from the side to which the mask film is adhered after the mask film adhesion step.

3. The method of forming the alignment layer pattern according to the above 2, further comprising a peeling step of peeling off the mask film after the exposure step.

4. In the above 1, the alignment film is a method of forming an alignment film pattern is formed before the mask film is adhered to the transparent base film.

5. In the above 1, the alignment layer is formed after the mask film is adhered to the transparent base film is a method of forming the alignment layer pattern.

6. In the above 5, the formation method of the alignment layer pattern including the exposure step of irradiating light from the side of the mask film is attached to the alignment film at the same time.

7. In the above 1, the mask film is a method of forming an alignment layer pattern is formed by forming a mask pattern including a material that can block light on the polarizer protective film.

8. In the above 7, wherein the mask film is formed by printing a pattern forming method of the alignment film pattern.

9. The method of forming the alignment layer pattern of 1 above, wherein the alignment layer includes a step of orienting the entire surface to be redirected in the exposing step.

10. The method of claim 9, wherein the alignment is performed by rubbing or photoalignment.

11. An optical laminate in which a mask film for forming an alignment film pattern on an alignment film formed on one side of the transparent base film is adhered to the other side of the transparent base film.

12. In the above 11, the mask film is to form a mask pattern comprising a material that can block the light on the polarizer protective film optical laminate.

13. The optical laminate according to the above 11, wherein the liquid crystal layer is laminated on the alignment layer pattern.

14. In the above 11, the alignment layer pattern is an optical laminated body consisting of regions of different orientation directions.

15. The optical laminate according to 13 above, wherein the liquid crystal layer is composed of regions of different alignment directions.

16. An optical laminate having a mask film having a pattern formed thereon comprising a material capable of blocking ultraviolet rays on one side of a transparent base film comprising a material capable of transmitting ultraviolet rays.

The formation method of the alignment film pattern of this invention is excellent in dimensional accuracy because a mask film is integrated with a base film.

The method of forming the alignment layer pattern of the present invention has no advantage of expensive equipment and time consuming for accurate alignment of the photomask since there is no conventional alignment process of the photomask.

The method of forming the alignment layer pattern of the present invention can compensate for the disadvantages of the conventional method which had to stop the whole process for the alignment of the photomask, the exposure, and the like, and is advantageous for improving the productivity.

The method of forming the alignment film pattern of the present invention is simple since the mask can be removed by a simple method such as peeling after the retarder pattern is formed.

The method of forming the alignment layer pattern of the present invention has an advantage in that the mask layer contacted without damaging the alignment layer or the pattern retarder layer can be easily removed without stopping.

1 (a) and (b) are perspective views showing an example of a cross section and a mask formation surface of the optical laminate according to the present invention;
2 (a), (b) and (c) show an example of a method of forming an alignment film pattern according to the present invention,
3A, 3B, 3C, 3D, 3E, and 3F illustrate an example of a pattern retarder forming method using the method of forming an alignment film pattern according to the present invention.

According to the present invention, a mask pattern is fixed to a film to form an alignment layer pattern having high dimensional accuracy without stopping the process of aligning the photomask and irradiating light, and the dimensional accuracy of the retarder pattern is generated even in the vibration generated during the process. The present invention relates to a method for forming an alignment film pattern which is maintained and of course, does not damage the alignment film pattern or pattern retarder layer formed upon removal of the mask pattern, and an optical laminate manufactured therefrom.

Hereinafter, the present invention will be described in detail.

The method of forming the alignment layer pattern of the present invention includes a mask film adhesion step of adhering a mask film for forming the alignment layer pattern on the alignment layer formed on one side of the transparent base film to the other side of the transparent base film.

In the alignment layer pattern, regions in different alignment directions are alternately arranged in a stripe shape on the alignment layer.

Although a transparent base film is not specifically limited, What is easy to form an oriented film can be used.

Specific examples thereof include polyester resins such as polyethylene terephthalate, polyethylene isophthalate, polyethylene naphthalate, and polybutylene terephthalate; Cellulose resins such as diacetyl cellulose and triacetyl cellulose; Polycarbonate resin; Acrylic resins such as polymethyl (meth) acrylate and polyethyl (meth) acrylate; Styrene resins such as polystyrene and acrylonitrile-styrene copolymers; Polyolefin resins such as polyethylene, polypropylene, cyclo-based or norbornene-structured polyolefins, ethylene-propylene copolymers; Vinyl chloride-based resins; Amide resins such as nylon and aromatic polyamides; Imide resin; Polyether sulfone resin; Sulfone resins; Polyether sulfone resin; Polyether ether ketone resins; Sulfided polyphenylene resins; Vinyl alcohol-based resins; Vinylidene chloride-based resins; Vinyl butyral resin; Allyl resins; Polyoxymethylene resin; Films selected from the group consisting of thermoplastic resins such as epoxy resins can be used, and films composed of blends of the thermoplastic resins can also be used. Moreover, you may use the film which consists of thermosetting resins, such as a (meth) acrylic-type, a urethane type, an acryl urethane type, an epoxy type, a silicone type, or an ultraviolet curable resin. In addition, the transparent base film can also be used by appropriately treating general methods, such as adding an additive so that the transparency of exposure light at the time of pattern exposure may be improved.

The content of the thermoplastic resin in the transparent base film is 50 to 100% by weight, preferably 50 to 99% by weight, more preferably 60 to 98% by weight, most preferably 70 to 97% by weight. If the content is less than 50% by weight, it may not sufficiently express the inherent high transparency of the thermoplastic resin.

The thickness of the transparent base film is not particularly limited, and may be usually 20 to 500 μm, preferably 20 to 300 μm.

The alignment film is formed on one side of the transparent base film.

The alignment layer may be a surface-oriented treatment of the entire surface to be selectively rearranged through the light alignment.

The alignment film is classified into an inorganic alignment film and an organic alignment film. However, the present invention preferably uses an organic alignment film.

The organic alignment film is formed using a composition for forming an alignment film containing polyimide or polyamic acid. The polyamic acid is a polymer obtained by reacting diamine and dianhydride, and the polyimide is obtained by imidating the polyamic acid, and their structure is not particularly limited.

It is important to maintain a suitable viscosity of the composition for forming an alignment film. When the viscosity is too high, it is difficult to form an alignment film having a uniform thickness because it does not easily flow even when pressure is applied. When the viscosity is too low, the spreadability is good, but it is difficult to control the thickness of the alignment film. For example, it is preferable that it is 8-13 cP.

Moreover, it is good to consider surface tension, solid content concentration, the volatility of a solvent, etc. In particular, since the concentration of the solid content affects the viscosity and the surface tension, it is better to adjust the thickness and the curing characteristics of the alignment film in consideration of the same.

If the concentration of the solid content is too high, the viscosity is high, the thickness of the alignment film is thick, if it is too low, the ratio of the solution is high, there is a problem that a stain occurs after drying the solution. For example, it is preferable that the concentration of solid content is 2 to 10% by weight.

The composition for forming an alignment film is preferably in the form of a solution in which solid content such as polyimide or polyamic acid is dissolved in a solvent. The solvent is not particularly limited as long as it can dissolve the solid content. Specifically, butyl cellosolve, gamma-butyrolactone, N-methyl-2-pyrrolidone, dipropylene glycol monomethyl ether, or the like may be used.

Such solvents are suitably mixed so as to form a uniform alignment film in consideration of solubility, viscosity, surface tension, and the like.

In addition to the composition for forming an alignment film, a crosslinking agent and a coupling agent may be further mixed to form an effective alignment film.

An oriented film is formed by apply | coating the composition for oriented film formation to one surface of a transparent base film, and carrying out an orientation process.

The application is not particularly limited as long as it is a method commonly used in the art. For example, the coating may be performed by flow casting the composition for forming the alignment layer, and by air knife, gravure, reverse roll, kiss roll, spray or blade, or the like. It can be laminated by directly applying in a suitable development method using the coating method of.

Although the orientation treatment is not particularly limited, polarized ultraviolet irradiation, ion beam or plasma beam irradiation, radiation irradiation, rubbing method, or the like can be used. For example, it is preferable to irradiate polarized ultraviolet rays.

In order to improve the coating efficiency of the composition for forming an alignment film, a drying process may be further performed.

Drying is not particularly limited and can be generally performed using a hot air dryer or a far infrared heater, and the drying treatment temperature is usually 30 to 100 ° C, preferably 50 to 80 ° C, and the drying time is usually 60 to 600 seconds, preferably Is preferably 120 to 600 seconds.

As illustrated in FIG. 2, the alignment layer of the present invention may be formed before (b) or after (a) the mask film is adhered to the transparent base film. In addition, the exposure step (c) of irradiating the exposure light from the side on which the mask film is adhered at the same time as forming the alignment film can be performed.

The mask film is adhered to one side of the transparent base film in order to form the alignment film pattern on the alignment film. Such a mask film is comprised by the pattern of the light shielding part which does not become oriented by exposure light, and the light transmission part oriented by exposure light.

The light blocking portion of the mask film may be formed by directly coating a pattern forming solution including a material capable of blocking exposure light on the transparent film or by printing on a transparent film with a stamper coated with a pattern forming solution. The shape of the stamper is not limited, and may be a roll shape or a plate shape.

In addition, the thickness of the light blocking part pattern may be appropriately adjusted in consideration of ease of pattern formation, light source blocking power, and the like.

Although a transparent film is not specifically limited, It is good to select suitably in consideration of the ease of pattern formation and the part in which a retarder pattern is located in a polarizing plate. For example, a polarizer protective film may be used.

Specifically, polyester-based resins such as polyethylene terephthalate, polyethylene isophthalate, polyethylene naphthalate, polybutylene terephthalate; Cellulose resins such as diacetyl cellulose and triacetyl cellulose; Polycarbonate resin; Acrylic resins such as polymethyl (meth) acrylate and polyethyl (meth) acrylate; Styrene resins such as polystyrene and acrylonitrile-styrene copolymers; Polyolefin resins such as polyethylene, polypropylene, cyclo-based or norbornene-structured polyolefins, ethylene-propylene copolymers; Vinyl chloride-based resins; Amide resins such as nylon and aromatic polyamides; Imide resin; Polyether sulfone resin; Sulfone resins; Polyether sulfone resin; Polyether ether ketone resins; Sulfided polyphenylene resins; Vinyl alcohol-based resins; Vinylidene chloride-based resins; Vinyl butyral resin; Allyl resins; Polyoxymethylene resin; Films selected from the group consisting of thermoplastic resins such as epoxy resins can be used, and films composed of blends of the thermoplastic resins can also be used. Moreover, you may use the film which consists of thermosetting resins, such as a (meth) acrylic-type, a urethane type, an acryl urethane type, an epoxy type, a silicone type, or an ultraviolet curable resin.

Coating and printing for forming the mask film is not particularly limited as long as it is a method commonly used in the art. For example, the coating may be applied to a solution for pattern formation by flow casting and by air knife, gravure, reverse roll, kiss roll, spray or blade, etc. Using a coating method of can be directly applied in a suitable development method, dried and laminated.

In order to improve coating and printing efficiency of the pattern forming solution, a drying process may be further performed.

The drying is not particularly limited and can be usually performed using a hot air dryer or a far infrared heater.

The mask film is adhered to the other side of the transparent base film having the alignment film formed on one side.

The adhesive may be formed of a conventional adhesive such as acrylic, silicone, polyester, polyurethane, polyether or rubber. The pressure-sensitive adhesive is preferably low in moisture absorption and excellent in heat resistance in consideration of quality and durability, such as peeling phenomenon due to moisture absorption, prevention of bubble generation and difference between coefficients of thermal expansion, and prevention of degradation of optical properties. It is also desirable to not require any high temperature treatment, such as curing or drying, or to require long term curing or drying in view of the optical properties.

In the above-described method, the mask film 10 for forming the alignment layer pattern on the alignment layer 30 formed on one surface of the transparent base film 20 as shown in FIG. 1 may have an adhesive layer 40 on the other side of the transparent base film. The optical laminated body adhered by) is formed.

In addition, the present invention may perform the step of selectively forming the orientation direction using a mask pattern on the non-oriented alignment film. An orientation direction can be formed by general processing methods, such as a rubbing method or optical orientation, and is not specifically limited.

In addition, on one side of the transparent base film including a material capable of transmitting ultraviolet rays to form an optical laminate having a mask film formed with a pattern formed of a material comprising a material capable of blocking ultraviolet rays.

The exposure step changes the alignment direction formed in the alignment film at the portion (light transmitting portion) through which light is transmitted through the mask film. That is, the portion where the light has passed through the mask film and reaches the alignment film is changed in the orientation direction, and the portion where the light has not reached maintains the original alignment direction.

Exposure light is performed using the light which can change the orientation direction of an oriented film. For example, when the alignment direction (optical axis) of the alignment film is 45 °, the exposure light can form an alignment direction of -45 °.

Such light is not particularly limited, but polarized ultraviolet light is preferably used. In addition, ion beams, plasma beams, and radiation may be used. For example, when using ultraviolet light polarized as exposure light, the light blocking portion of the mask film is formed using a pattern forming solution including a material capable of blocking ultraviolet light.

The present invention may further comprise the step of exfoliating the mask film after exposure.

Peeling is not particularly limited, but is preferably performed in a manner that can minimize the surface damage of the formed retarder pattern. For example, it can be removed by performing a contact method using a peeling tool or a non-contact method using a laser or the like.

After the peeling step, the liquid crystal layer may be laminated on the alignment layer pattern to form a pattern retarder.

In addition, the present invention may form a liquid crystal layer on the alignment layer pattern after the exposure step, and peel the mask film to form a pattern retarder.

3 illustrates a method of forming a pattern retarder using the method of forming an alignment layer pattern according to the present invention.

For example, the mask film adhesion step (S2); Forming an alignment film (S1); Alignment layer pattern exposure step (S3); Peeling step (S4); And it may be performed in the order of the liquid crystal layer forming step (S5).

Also as an example mask film adhesion step (S2); Forming an alignment film (S1); Alignment layer pattern exposure step (S3); Liquid crystal layer forming step (S5); And it may be performed in the order of the peeling step (S4).

Also as an example, an alignment film forming step (S1); Mask film adhesion step (S2); Alignment layer pattern exposure step (S3); Peeling step (S4); And it may be performed in the order of the liquid crystal layer forming step (S5).

Also as an example, an alignment film forming step (S1); Mask film adhesion step (S2); Alignment layer pattern exposure step (S3); Liquid crystal layer forming step (S5); And it may be performed in the order of the peeling step (S4).

Also as an example mask film adhesion step (S2); Forming an alignment film and exposing the alignment film pattern (S6); Peeling step (S4); And it may be performed in the order of the liquid crystal layer forming step (S5).

Also as an example mask film adhesion step (S2); Forming an alignment film and exposing the alignment film pattern (S6); Liquid crystal layer forming step (S5); And it may be performed in the order of the peeling step (S4).

Hereinafter, preferred examples are provided to aid the understanding of the present invention, but the following examples are merely for exemplifying the present invention, and it will be apparent to those skilled in the art that various changes and modifications can be made within the scope and spirit of the present invention. It is natural that such variations and modifications fall within the scope of the appended claims.

Example 1

A sunscreen was applied to one surface of the cellulose acetate-based film (TD60UL, Fuji) at pixel intervals and hot-air dried at 40 ° C. to prepare a mask film having a sunscreen and an ultraviolet light transmitting part.

The mask film was attached to one surface of a cycloolefin-based base film (Xeon, Aton, Okura Co., Ltd.) with a polyvinyl alcohol adhesive.

The alignment liquid is coated on the other side of the cycloolefin-based substrate film at a thickness of 100 nm, and hot-air dried at 40 ° C., and then irradiated with polarized ultraviolet light at a 45 ° polarization direction for 75 seconds at an output of 14 mW, and the alignment direction is 45 °. Formed.

The optical laminated body in which the mask film was adhered to one side of the cycloolefin base film and the alignment film was formed on the other side of the cycloolefin-based substrate film was subjected to an output of 14 mW with ultraviolet light polarized from the side to which the mask film was adhered as -45 ° polarization direction. The exposure process which irradiated for a second was performed, and the alignment film pattern was formed.

The mask film was peeled off from the optical laminated body in which the alignment film pattern was formed.

A 25 wt% (solid content) composition for forming a liquid crystal layer prepared by dissolving a reactive liquid crystal monomer in PGMEA (propylene glycol monomethyl ether acetate) was applied onto an alignment layer pattern so that the alignment directions were 45 ° and -45 °. A pattern retarder was formed.

As a result, a pattern retarder with high dimensional accuracy was formed, and it could be carried out continuously without stopping the process.

Example 2

In the same manner as in Example 1, the alignment film was formed on one side of the cycloolefin-based substrate film, and then the mask film was adhered to the other side to form a pattern retarder.

As a result, a pattern retarder with high dimensional accuracy was formed, and it could be carried out continuously without stopping the process.

Example 3

In the same manner as in Example 1, the mask film is adhered to one surface of the cycloolefin-based substrate film, and then the pattern retarder is formed by simultaneously performing the process of forming the alignment film on the other side and the process of exposing on the mask film. It was.

As a result, a pattern retarder with high dimensional accuracy was formed, and it could be carried out continuously without stopping the process.

Example 4

In the same manner as in Example 1, a sunscreen was applied to the stamper on the plate patterned at pixel intervals. The coated stamper was printed on one surface of the cellulose acetate-based film (TD60UL, Fuji), and hot-air dried at 40 ° C. to prepare a mask film having a UV blocking portion and a UV transmitting portion at predetermined intervals.

The pattern retarder was formed using the mask film prepared above.

As a result, a pattern retarder with high dimensional accuracy was formed, and it could be carried out continuously without stopping the process.

Example 5

The same procedure as in Example 1 was carried out on the alignment layer formed to dissolve the reactive liquid crystal monomer in PGMEA (propylene glycol monomethyl ether acetate) to apply a composition for forming a liquid crystal layer of 25% by weight (solid content) A pattern retarder in which the directions were arranged at 45 ° and -45 ° was formed.

Then, the mask film was peeled off from the optical laminated body in which the liquid crystal layer was formed on the orientation film pattern.

As a result, a pattern literer with high dimensional accuracy was formed, and it could be carried out continuously without stopping the process.

The present invention can produce a pattern retarder with higher accuracy than the conventional one by eliminating the mask alignment process during exposure, which is the most important in pattern retarder formation.

In addition, since the stop process for the exposure process of the alignment layer pattern is unnecessary, in the general pattern retarder film manufacturing such as a roll-to-roll or sheet-to-sheet method, precise exposure can be performed simultaneously with the movement of the film or the substrate. Productivity can be increased.

In addition, a highly accurate pattern retarder can be produced by attaching a mask in the exposure process of the alignment layer pattern, and then the mask can be removed without damaging the pattern retarder even after removing the mask.

10: mask film
11 light blocking part 12 light transmitting part
20: transparent base film 30: alignment film
40: adhesive

Claims (16)

A method of forming an alignment film pattern comprising a step of adhering a mask film for adhering a mask film for forming an alignment film pattern on an alignment film formed on one side of a transparent base film to the other side of the transparent base film.
The method of forming an alignment layer pattern according to claim 1, further comprising an exposure step of irradiating light from the side to which the mask film is adhered after the mask film adhesion step.
The method of claim 2, further comprising a peeling step of peeling off the mask film after the exposure step.
The method of claim 1, wherein the alignment film is formed before the mask film is adhered to the transparent base film.
The method of claim 1, wherein the alignment film is formed after the mask film is adhered to the transparent base film.
The method of forming an alignment film pattern according to claim 5, comprising an exposure step of irradiating light from the side on which the mask film is adhered simultaneously with the formation of the alignment film.
The method of claim 1, wherein the mask film is formed by forming a mask pattern including a material that blocks light on the polarizer protective film.
The method of claim 7, wherein the mask film is formed by printing a pattern.
The method of claim 1, wherein the alignment layer comprises the step of orienting the entire surface to be redirected during the exposure step.
The method of claim 9, wherein the alignment is performed in a rubbing or photoalignment manner.
An optical laminated body in which a mask film for forming an alignment film pattern on an alignment film formed on one side of the transparent base film is adhered to the other side of the transparent base film.
The optical laminate according to claim 11, wherein the mask film is formed by forming a mask pattern including a material capable of blocking light in the polarizer protective film.
The optical laminate according to claim 11, wherein a liquid crystal layer is laminated on the alignment film pattern.
The optical laminate according to claim 11, wherein the alignment layer patterns are formed of regions in different alignment directions.
The optical laminate according to claim 13, wherein the liquid crystal layer is composed of regions of different alignment directions.
An optical laminate having a mask film having a pattern formed thereon comprising a material capable of blocking ultraviolet rays on one surface of the transparent base film including a material capable of transmitting ultraviolet rays.

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