KR101682540B1 - Method for forming alignment layer and optical laminated body from the same - Google Patents

Abstract

The present invention relates to a method for forming an alignment film pattern and an optical laminate produced therefrom, and more particularly to a method for forming an alignment film pattern on an orientation film formed on one side of a transparent base film, It is possible to compensate for the disadvantages of the conventional method in which the entire process has to be stopped for alignment of the photomask, exposure, etc., and since the mask pattern is printed on the base film and moved together, The present invention relates to a method of forming an alignment film pattern which can clean a mask by a simple method after formation of an alignment film pattern and an optical laminate produced therefrom.

Description

TECHNICAL FIELD The present invention relates to a method of forming an alignment layer pattern and an optical laminate produced therefrom,

The present invention relates to a method of forming an alignment film pattern and an optical laminate manufactured therefrom, which can overcome the disadvantages of the conventional method in which the entire process has to be stopped for aligning and exposing the photomask.

Three-dimensional stereoscopic techniques can be broadly divided into stereoscopic and autostereoscopic techniques. The binocular parallax system uses a parallax image of right and left eyes, and there are a glasses system and a non-glasses system.

Generally, stereoscopic image technology utilizes a patterned retardation layer using liquid crystal. A patterned retardation layer using liquid crystals usually comprises a substrate; An alignment layer coated on the substrate and subjected to a surface alignment treatment; And a liquid crystal which is coated and oriented on the alignment film.

The liquid crystal is surface-aligned on the alignment film with a photoreactive liquid crystal, and is solidified by crosslinking by light irradiation such as ultraviolet rays to form a polymer liquid crystal film.

The orientation is achieved by rubbing the orientation film using a roll wound with a soft cloth and irradiating the orientation film with a rubbing orientation or polarized ultraviolet rays for setting the surface orientation direction along the rubbing direction and setting the surface orientation direction according to the polarization direction Orientation.

Since the rubbing orientation uses photolithography to form a pattern, the process is very complicated, the cost of the material used is high, and the defect rate is high, resulting in poor productivity.

The optical orientation is non-contact orientation, and there is no introduction of dust, so productivity is remarkably excellent. However, when the dimensional accuracy of the photomask for aligning a pattern is low, there is a region in which the orientation is not well defined between the pattern and the pattern, so that the quality of the patterned phase difference layer may be deteriorated. In addition, if the alignment of the photomask is wrong, the alignment of the mask border region may be erroneous.

Therefore, since the alignment of the photomask must be performed with high dimensional accuracy, a manufacturing time required for each product unit in the alignment process is long, and an expensive mask alignment device is required. In order to maintain the dimensional accuracy of the aligned photomask, the light irradiation is performed in a state where the process is stopped, so that the manufacturing process time is prolonged and the productivity is lowered.

The present invention provides a method of forming an alignment film pattern capable of forming a pattern having excellent dimensional accuracy on an alignment film without an alignment process of a conventional photomask.

It is another object of the present invention to provide a method of forming an alignment film pattern in which the step of stopping the entire process for aligning and exposing a photomask is unnecessary.

The present invention also provides a method of forming an alignment film pattern capable of removing a mask by a simple method after formation of an alignment film pattern.

The present invention also provides an optical laminate produced by the method of forming the alignment film pattern.

1. A method of forming an alignment film pattern comprising a mask printing step of printing a mask pattern for forming an alignment film pattern on an alignment film formed on one side of a transparent base film on the other side of the transparent base film.

2. The method for forming an alignment film pattern according to 1 above, further comprising an exposure step of irradiating light on the side of the mask pattern printed with the mask pattern after the mask printing step.

3. The method of forming an alignment film pattern according to 2 above, further comprising a cleaning step of cleaning the mask pattern after the exposure step.

4. The method for forming an alignment film pattern according to 1 above, wherein the alignment film formation is performed before the mask printing step.

5. The method for forming an alignment film pattern according to item 1, wherein the alignment film formation is performed after the mask printing step.

6. The method for forming an alignment film pattern according to item 1 above, comprising a pattern exposure step of irradiating light on a side of a mask pattern printed with a mask printing step.

7. The method for forming an alignment film pattern according to 2 above, wherein the mask pattern comprises a material capable of blocking light.

8. The method for forming an alignment film pattern according to 2 above, wherein the light is ultraviolet light.

9. The method of forming an alignment film pattern according to 8 above, wherein the mask pattern comprises a material capable of blocking ultraviolet rays.

10. The method for forming an alignment film pattern according to 1 above, comprising orienting the entire surface so that the alignment film can be reoriented in the pattern exposure step.

11. The method for forming an alignment film pattern according to item 10, wherein the alignment is performed in a rubbing or photo alignment manner.

12. An optical laminate in which a mask pattern for forming an alignment film pattern on an alignment film formed on one side of a transparent base film is printed on the other side of the transparent base film.

13. The optical laminate according to 12 above, wherein the mask pattern comprises a material capable of blocking ultraviolet rays.

14. The optical laminate according to 12 above, wherein the liquid crystal layer is laminated on the alignment film pattern.

15. The optical laminate according to 12 above, wherein the alignment film pattern is composed of regions in different alignment directions.

16. The optical laminate according to 14 above, wherein the liquid crystal layer comprises regions in different alignment directions.

17. An optical laminate printed with a mask pattern comprising a material capable of blocking ultraviolet rays on one side of a transparent base film comprising a material capable of transmitting ultraviolet rays.

The method of forming an alignment film pattern of the present invention is excellent in dimensional accuracy because the mask film is moved integrally with the base film.

The alignment film pattern forming method of the present invention does not require a conventional step of aligning the photomask, so there is no need for expensive equipment and precise time for precise alignment of the photomask.

The method of forming the alignment film pattern of the present invention can compensate for the disadvantages of the conventional method in which the entire process has to be stopped for aligning and exposing the photomask, and is advantageous for improving productivity.

The method of forming an alignment film pattern of the present invention is simple since the mask can be cleaned by a simple method after pattern formation.

1 (a) and 1 (b) are perspective views showing an example of a cross-section and a mask-formed surface of an optical laminate according to the present invention,
2 (a), (b) and (c) show an example of a method of forming an alignment film pattern according to the present invention,
3A, 3B, 3C, 3D, 3E and 3F show an example of a pattern retarder forming method using a method of forming an orientation film pattern according to the present invention.

The present invention relates to a method of forming an alignment film pattern in which dimensional accuracy of the alignment film pattern is formed without stopping the process in the step of aligning the photomast and the step of irradiating the exposure light and the dimension accuracy of the retarder pattern is maintained even in the vibration generated in the process And an optical laminate produced therefrom.

Hereinafter, the present invention will be described in detail.

The method of forming an alignment film pattern of the present invention includes a mask printing step of printing a mask pattern for forming an alignment film pattern on an orientation film formed on one side of a transparent base film on the other side of the transparent base film.

The alignment film pattern has regions of different alignment directions alternately arranged in stripes on the alignment film.

The transparent base film is not particularly limited, but an easy-to-form alignment film can be used.

Specific examples include polyester resins such as polyethylene terephthalate, polyethylene isophthalate, polyethylene naphthalate and polybutylene terephthalate; Cellulose-based resins such as diacetylcellulose and triacetylcellulose; Polycarbonate resin; Acrylic resins such as polymethyl (meth) acrylate and polyethyl (meth) acrylate; Styrene resins such as polystyrene and acrylonitrile-styrene copolymer; Polyolefin resins such as polyethylene, polypropylene, cycloolefins or polyolefins having a norbornene structure, and ethylene-propylene copolymers; Vinyl chloride resin; Amide resins such as nylon and aromatic polyamide; Imide resin; Polyether sulfone type resin; Sulfone based resin; Polyether sulfone type resin; Polyether ether ketone resin; A sulfided polyphenylene resin; Vinyl alcohol-based resin; Vinylidene chloride resins; Vinyl butyral resin; Allylate series resin; Polyoxymethylene type resin; A thermoplastic resin such as an epoxy resin, and the like. A film composed of the blend of the thermoplastic resin may also be used. Further, a film made of a thermosetting resin such as (meth) acrylic, urethane, acrylic urethane, epoxy, or silicone or a film made of an ultraviolet curable resin may also be used. The transparent base film may be appropriately treated by a general method such as adding an additive to increase the transmittance of the exposed light during pattern exposure.

The content of the thermoplastic resin in the transparent base film is preferably 50 to 100% by weight, preferably 50 to 99% by weight, more preferably 60 to 98% by weight, and most preferably 70 to 97% by weight. When the content is less than 50% by weight, the inherent high transparency of the thermoplastic resin may not be sufficiently exhibited.

The thickness of the transparent base film is not particularly limited, and may be generally 20 to 500 mu m, preferably 20 to 300 mu m.

An alignment film is formed on one surface of the transparent base film.

The orientation film may be one whose surface has been surface-oriented so that it can be selectively reoriented through the light orientation.

The alignment layer is divided into an inorganic alignment layer and an organic alignment layer. In the present invention, an organic alignment layer is preferably used.

The organic alignment film is formed using a composition for forming an alignment film containing a polyimide or polyamic acid. Polyamic acid is a polymer obtained by reacting a di-amine with a dianhydride, and a polyimide is obtained by imidizing a polyamic acid, and the structure thereof is not particularly limited.

It is important that the composition for forming an alignment film maintains an appropriate viscosity. If the viscosity is too high, it will not easily flow even under pressure, so it is difficult to form an oriented film having a uniform thickness. When the viscosity is too low, spreadability is good, but it is difficult to control the thickness of the orientation film. For example, 8 to 13 cP.

It is also preferable to consider the surface tension, the concentration of the solid content, and the volatility of the solvent. In particular, since the concentration of solid content affects the viscosity and the surface tension, it is preferable to control the thickness and the curing properties of the alignment film at the same time.

If the concentration of the solid is too high, the viscosity of the alignment layer becomes thick, and if the concentration of the solid is too high, the thickness of the alignment layer becomes too thick. For example, the solid content is preferably 2 to 10% by weight.

The composition for forming an alignment film is preferably a solution phase in which a solid content such as polyimide or polyamic acid is dissolved in a solvent. The solvent is not particularly limited as long as solubles can be dissolved, and specifically, butyl cellosolve, gamma-butyrolactone, N-methyl-2-pyrrolidone, dipropylene glycol monomethyl ether and the like can be used.

Such a solvent is appropriately mixed so as to form a uniform alignment film in consideration of solubility, viscosity, surface tension, and the like.

In addition, a crosslinking agent, a coupling agent, and the like may be further added to the composition for forming an alignment film in order to form an effective alignment film.

The orientation film is formed by applying a composition for forming an orientation film on one side of the transparent base film and subjecting the film to orientation treatment.

The application is not particularly limited as long as it is a method commonly used in the art. For example, the application may be carried out by applying the composition for forming an orientation film to a mold such as a fluid casting method and an air knife, a gravure, a reverse roll, a kiss roll, a spray or a blade By a suitable spreading method by using the coating method of the present invention.

The alignment treatment is not particularly limited, but polarized ultraviolet irradiation, ion beam or plasma beam irradiation at a predetermined angle, irradiation with radiation and rubbing method can be used. For example, it is preferable to irradiate polarized ultraviolet rays.

A drying process may be further performed to improve the coating efficiency of the composition for forming an alignment film.

The drying temperature is usually 30 to 100 DEG C, preferably 50 to 80 DEG C, the drying time is usually 60 to 600 seconds, and preferably, Is preferably 120 to 600 seconds.

As shown in Fig. 2, the alignment film of the present invention can be formed (a) after the mask pattern is printed on the transparent base film or before (b) before printing. In addition, an exposure step (c) for irradiating exposure light on the side where the mask pattern is printed can be performed simultaneously with the formation of the alignment film.

The mask pattern is printed on one side of the transparent substrate film to form an alignment film pattern on the alignment film. Such a mask pattern is composed of a light shielding portion which is not oriented by the exposure light and a light transmitting portion which is oriented by the exposure light.

The light shielding portion of the mask pattern is formed by printing using a solution for forming a pattern including a material capable of blocking exposure light.

The printing is not particularly limited as long as it is a method commonly used in the art. For example, it is preferable to use a stamper. The shape of the stamper is not limited and may be a roll shape or a plate shape.

Further, the thickness of the pattern can be appropriately adjusted in consideration of the ease of pattern formation and the light source blocking power.

A drying process may be further performed to improve the printing efficiency of the pattern forming solution.

The drying is not particularly limited, and can be carried out usually using a hot-air dryer or a far-infrared heater.

1, a mask pattern 10 for forming an orientation film pattern on an orientation film 30 formed on one side of a transparent base film 20 is formed on the other side of the transparent base film, Form a sieve.

In addition, the present invention can perform the step of forming the alignment direction selectively using the mask pattern on the alignment layer without alignment. The alignment direction can be formed by a general processing method such as rubbing method or photo alignment, and is not particularly limited.

The present invention also provides an optical laminate on which a mask pattern comprising a material capable of blocking ultraviolet light is printed on one side of a transparent substrate film comprising a material capable of transmitting ultraviolet rays.

The exposure step changes the alignment direction formed in the alignment film at the portion through which the light is transmitted (light transmitting portion) through the mask pattern. That is, the portion of the light transmitted through the mask pattern to reach the alignment layer changes the alignment direction, and the portion where light does not reach maintains the original alignment direction.

The exposure light is performed using light that can change the alignment direction of the alignment film. For example, if the alignment direction (optical axis) of the alignment layer is 45 °, the exposure light is made orthogonal so as to form an alignment direction of -45 °

Such light is not particularly limited, but it is preferable to use polarized ultraviolet rays. In addition, an ion beam, a plasma beam, and radiation can be used.

For example, when ultraviolet rays polarized by exposure light are used, the light shielding portion of the mask pattern is formed using a solution for forming a pattern including a material capable of blocking ultraviolet rays.

The present invention may further include cleaning the mask pattern after the exposure step.

Although the cleaning is not particularly limited, it is preferable to perform the cleaning by a method which can easily remove the pattern forming solution while minimizing the surface damage of the formed retarder pattern.

For example, it is preferable to use a solvent component capable of removing the pattern forming solution forming the light shielding portion of the mask pattern. Such a solvent may be sprayed onto the mask printing surface by a spraying method or a general cleaning method such as immersion in a solvent may be used.

After the cleaning step, the liquid crystal layer is laminated on the alignment film pattern to form the pattern retarder.

Further, the present invention can form a pattern retarder by forming a liquid crystal layer on an alignment film pattern after the exposure step, and cleaning the mask pattern.

3 shows a method of forming a pattern retarder using a method of forming an orientation film pattern according to the present invention.

A mask printing step S2; An alignment film forming step (S1); An alignment film pattern exposure step (S3); Cleaning step S4; And a liquid crystal layer forming step (S5).

For example, in the mask printing step S2; An alignment film forming step (S1); An alignment film pattern exposure step (S3); A liquid crystal layer forming step (S5); And a cleaning step S4.

An alignment film forming step (S1); Mask printing step S2; An alignment film pattern exposure step (S3); Cleaning step S4; And a liquid crystal layer forming step (S5).

An alignment film forming step (S1); Mask printing step S2; An alignment film pattern exposure step (S3); A liquid crystal layer forming step (S5); And a cleaning step S4.

For example, in the mask printing step S2; Alignment film formation and alignment film pattern exposure step (S6); Cleaning step S4; And a liquid crystal layer forming step (S5).

For example, in the mask printing step S2; Alignment film formation and alignment film pattern exposure step (S6); A liquid crystal layer forming step (S5); And a cleaning step S4.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention. Such variations and modifications are intended to be within the scope of the appended claims.

Example 1

The ultraviolet screening agent was applied to the stamper on the plate with the pattern formed at the pixel interval. Using a coated stamper, a mask was printed on one side of a cycloolefin-based substrate film (Zeon, Aton, Okura) and hot-air dried at 40 ° C to form a mask pattern having an ultraviolet shielding part.

The alignment liquid was applied to the other side of the cycloolefin based film so that the orientation liquid was maintained at a thickness of 100 nm, and the polarized ultraviolet light was irradiated with the polarized ultraviolet light at a power of 14 mW for 45 seconds in the direction of 45 ° polarization, Was formed.

The optical stacked body in which the mask pattern was printed on one side of the cycloolefin based film and the orientation film was formed on the other side was irradiated with the output of 14 mW for 75 seconds with the polarized ultraviolet light in the direction of -45 ° polarization from the side on which the mask pattern was printed To form an alignment film pattern.

A solvent for dissolving the ultraviolet screening agent was sprayed on the surface of the substrate film on which the mask pattern was printed, followed by drying to wash the mask pattern.

(Solid content) of a liquid crystal layer composition prepared by dissolving a reactive liquid crystal monomer in PGMEA (propylene glycol monomethyl ether acetate) was applied onto the alignment film pattern so that alignment directions of 45 ° and -45 ° were arranged Pattern retarder was formed.

As a result, a pattern litter having a high dimensional accuracy was formed, and it was possible to carry out the pattern litter continuously without stopping the process.

Example 2

A pattern retarder was formed in the same manner as in Example 1 except that an orientation film was formed on one side of the cycloolefin based film and then a mask pattern was printed on the other side.

As a result, a pattern litter having a high dimensional accuracy was formed, and it was possible to carry out the pattern litter continuously without stopping the process.

Example 3

The procedure of Example 1 was repeated except that the step of forming the alignment film on the other side of the cycloolefin based film on which the mask pattern was printed on one side and the step of exposing the side on which the mask pattern was printed were performed simultaneously, .

As a result, a pattern litter having a high dimensional accuracy was formed, and it was possible to carry out the pattern litter continuously without stopping the process.

Example 4

(Solid content) of liquid crystal layer composition prepared by dissolving the reactive liquid crystal monomer in PGMEA (propylene glycol monomethyl ether acetate) on the formed alignment film pattern was applied to the alignment layer pattern, A pattern retarder in which the directions of 45 DEG and -45 DEG were arranged was formed.

Thereafter, the solvent for dissolving the ultraviolet blocking agent was sprayed on the surface of the substrate film on which the mask pattern was printed, and dried to clean the mask pattern.

As a result, a pattern litter having a high dimensional accuracy was formed, and it was possible to carry out the pattern litter continuously without stopping the process.

The present invention can produce a pattern retarder with higher accuracy than the conventional one by removing the mask alignment process during the most important exposure in pattern retarder formation.

In addition, since a stopping step for an exposure process of an orientation film pattern is not required, precise exposure can be performed simultaneously with the movement of a film or a substrate in the production of a general pattern retarder film such as a roll-to-roll or sheet- Productivity can be increased.

In addition, the distance between the mask and the alignment layer can be minimized in the step of exposing the alignment film pattern, so that the pattern retarder with high accuracy can be produced, and the mask can be removed without stopping the mask.

10: mask pattern
11: light shielding part 12: light shielding part
20: transparent base film 30: alignment film

Claims (17)

As a method of forming an alignment film pattern of a roll-to-roll method,
A mask printing step of printing a mask pattern for forming an alignment film pattern on an orientation film formed on one side of the transparent base film, on the other side of the transparent base film; And
And an exposure step of irradiating light on the side of the mask pattern printed with the mask printing step or after the mask printing step,
Wherein the exposure step is performed while the transparent base film is continuously moved.
delete The method of forming an alignment film pattern according to claim 1, further comprising a cleaning step of cleaning the mask pattern after the exposure step.
The method of forming an alignment film pattern according to claim 1, wherein the alignment film is formed before the mask printing step.
The method of claim 1, wherein the step of exposing is performed after the mask printing step,
Wherein the orientation film is formed after the mask printing step and before the exposure step.
delete The method of forming an alignment film pattern according to claim 1, wherein the mask pattern comprises a material capable of blocking light.
The method according to claim 1, wherein the light is ultraviolet light.
The method of forming an alignment film pattern according to claim 8, wherein the mask pattern comprises a material capable of blocking ultraviolet rays.
The method of forming an alignment film pattern according to claim 1, comprising orienting the entire surface so that the alignment film can be reoriented in the exposure step.
11. The method according to claim 10, wherein the alignment is performed in a rubbing or photo alignment manner.
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