JPS63138541A - Production of optical recording medium - Google Patents
Production of optical recording mediumInfo
- Publication number
- JPS63138541A JPS63138541A JP28358586A JP28358586A JPS63138541A JP S63138541 A JPS63138541 A JP S63138541A JP 28358586 A JP28358586 A JP 28358586A JP 28358586 A JP28358586 A JP 28358586A JP S63138541 A JPS63138541 A JP S63138541A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- pattern
- layer
- optical recording
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000000034 method Methods 0.000 claims abstract description 23
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 17
- 239000011159 matrix material Substances 0.000 abstract description 7
- 239000011521 glass Substances 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract 4
- 239000010410 layer Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000000748 compression moulding Methods 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000010076 replication Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 etc.) Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
(技術分野)
本発明は読み出し専用の光学的記録媒体の製造方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a method of manufacturing a read-only optical recording medium.
(従来技?#)
光学的記録は磁気的記録と比較して記録媒体と再生ヘッ
ドが非接触であり、且つ高密度の記録が可能であるなど
の利点がある。この光学的記録媒体としては読み出し専
用のものと追加書き込み可能なもの、消却再書き込み可
能なものが知られており1本発明にかかる読み出し専用
の光学的記録媒体としてはまず既に実用化されたコンパ
クトディスク(CD)や光学式のビデオディスク等が挙
げられる。これらの光学的記録媒体で採用されている方
式は媒体中に形成された凹凸構造に情報が記録され、情
報の記録密度を上げる為記録ビット(凹部又は凸部の最
小単位)は1μm前後の大きさにし、かつレーザ等の高
源を用いて再生光を該ビットと同程度の大きさに絞って
情報を読み出すことが行なわれているが、読み出し光の
ビームが微少なことは、再生の為シCオートフォーカス
、オ−トトラッキングの為の技術、さらに高価なレーザ
光線を使わねばならないという問題が生じる。(Prior Art?#) Optical recording has advantages over magnetic recording in that the recording medium and the reproducing head are not in contact with each other, and high-density recording is possible. As this optical recording medium, there are known read-only ones, additionally writable ones, and erasable and rewritable ones.The read-only optical recording medium according to the present invention is firstly a compact compact that has already been put into practical use. Examples include discs (CDs) and optical video discs. The method used in these optical recording media is that information is recorded on a concave-convex structure formed in the medium, and in order to increase the recording density of information, the recording bit (the smallest unit of concavity or convexity) is approximately 1 μm in size. The information is read by focusing the reproduction light to the same size as the bit using a high-speed source such as a laser, but the fact that the readout light beam is minute is that Problems arise in that techniques for autofocus and autotracking, as well as expensive laser beams, must be used.
一方、他の方式の光学的記録媒体として光学的に高い反
射率を有する部分と低い反射率を有する部分とをそれぞ
れ別の材料によって構成し、このMLによりパターンを
形成しデジタル情報を記録する光学的記録媒体が知られ
ている。この方式による濃淡パターンの形成方法は例え
ば特開昭60−66346号公報に開示されているよう
に、基板上に光学的低反射層と光学的高反射層をこの順
に積層し1表面にフォトレジストを塗布し、そこへ微細
な濃淡パターンをもつマスクを介して露光し、その後フ
ォトレジストを現像してレジストパターンを形成させ、
しかる後レジストパターンを利用してパターン状にエツ
チングを行なって光学的高反射層を除去させ光学的低反
射層を露出せしめることにより行なっている。この方式
は高価なレーザ光線を使用しなくてもよいが、上述の様
に製造工程の数が多く、各工程も容易に行なえるもので
はない。On the other hand, as an optical recording medium of another type, a part having a high optical reflectance and a part having a low reflectance are made of different materials, and a pattern is formed using this ML to record digital information. There are known recording media. A method for forming a light and shade pattern using this method is, for example, as disclosed in Japanese Patent Laid-Open No. 60-66346, in which an optical low reflection layer and an optical high reflection layer are laminated in this order on a substrate, and one surface is coated with a photoresist. The photoresist is coated, exposed to light through a mask with a fine shading pattern, and then the photoresist is developed to form a resist pattern.
Thereafter, etching is performed in a pattern using a resist pattern to remove the high optical reflection layer and expose the low optical reflection layer. Although this method does not require the use of expensive laser beams, it requires a large number of manufacturing steps as described above, and each step is not easy to perform.
レーザ光線を使用しなくてもよい別方式として情報の最
小単位である記録ピットを回折格子で構成する光学的記
録媒体が考えられるが、数十μmオーダーの回折格子部
と平滑部とを選択し1回折格子部に回折格子を形成させ
るのは容易なことではない。Another method that does not require the use of a laser beam is an optical recording medium in which the recording pit, which is the smallest unit of information, is composed of a diffraction grating, but it is possible to select an optical recording medium in which the recording pit, which is the smallest unit of information, is composed of a diffraction grating. It is not easy to form a diffraction grating in one diffraction grating section.
(発明の目的)
本発明は上記従来技術の問題点に鑑みなされたものであ
り、読み取り用の高価なレーザ光線を使用しなくてもよ
い。しかも簡便な方法により大量複製が行なわれる読み
出し専用の光学的記録媒体の製造方法をj提供すること
にある。(Object of the Invention) The present invention has been made in view of the problems of the prior art described above, and does not require the use of an expensive laser beam for reading. Moreover, it is an object of the present invention to provide a method for manufacturing a read-only optical recording medium that can be reproduced in large quantities using a simple method.
(発明の概要)
本発明は基材上にフォトレジストを塗布し、形成された
フォトレジスト層にレーザ光線を用いてホログラフィッ
クな露光をさせ回折格子の潜像を形成し1次いで微細な
濃淡パターンを有するマスクを用いて露光を行ない、そ
の後フォトレジストを現像させ記録パターンを得る。得
られた記録・ぐターンからスタンパを起こし、このスタ
ンパにより微細なパターン状に回折格子が設けられた光
学的記録媒体を複製させる光学的記録媒体の製造方法で
ある。(Summary of the Invention) The present invention involves applying a photoresist onto a base material, holographically exposing the formed photoresist layer using a laser beam to form a latent image of a diffraction grating, and then forming a fine shading pattern. After that, the photoresist is developed to obtain a recording pattern. This is a method for manufacturing an optical recording medium, in which a stamper is raised from the obtained recording pattern, and an optical recording medium having a diffraction grating provided in a fine pattern is reproduced using the stamper.
(発明の詳述) 以下本発明を図面に基づき詳細に説明する。(Detailed description of the invention) The present invention will be explained in detail below based on the drawings.
第1図から第5図までは記録パターンスタンパ母型製造
の段階を順に示したもので、第1図は光学的記録材料1
11の構成を説明するもので、基材(2)上にフォトレ
ジスト層(3)が積層されている。フォトレジストはポ
ジ型、ネガ型とも使用可能であるが、塗布がむらな(容
易に行なえ、しかも高解像力で露光の際の微細な情報記
録パターンを充分に解像しうるものを選び使用する。Figures 1 to 5 show the steps of manufacturing a recording pattern stamper mold in order, and Figure 1 shows the optical recording material 1.
11, in which a photoresist layer (3) is laminated on a base material (2). Both positive and negative type photoresists can be used, but those that are easy to apply and have high resolution that can sufficiently resolve fine information recording patterns during exposure are selected and used.
このようなフォトレジストとして、ポジ型ではシブレー
社製AZ−1350.東京応化工業■製0FPR−2−
800,5000,TSMR−8800、ネガ型では東
京応化工業■社製OMR−83,85,0NNR−20
,22,東洋曹達工業■社製CIP−200,300を
用いることができろ。基材(2)は用途に適した特性1
例えば表面の平滑性、耐性などを有し、後工程、フォト
レジストの現像やスタンパ成形工程において劣化や変形
などの影響を受けないものを選び使用する。As such a photoresist, AZ-1350 made by Sibley Co., Ltd. is a positive type photoresist. 0FPR-2- manufactured by Tokyo Ohka Kogyo ■
800, 5000, TSMR-8800, negative type OMR-83, 85, 0NNR-20 manufactured by Tokyo Ohka Kogyo ■
, 22, CIP-200 and 300 manufactured by Toyo Soda Kogyo ■ can be used. Base material (2) has characteristics 1 suitable for the application
For example, a material that has a smooth surface, durability, etc., and is not affected by deterioration or deformation in post-processes, photoresist development, and stamper molding steps is selected and used.
このような材料として、ガラス、樹@(アクリル。Examples of such materials include glass, wood (acrylic).
エポキシ、ナイロン等)、金属(鋼、ニッケル。epoxy, nylon, etc.), metals (steel, nickel, etc.).
AJ等)を使用することができる。AJ, etc.) can be used.
このような光学的記録材料に対して、レーザ露光装置を
用いてフォトレジスト層]3)にホログラフィックな露
光を行い1回折格子の潜像を形成させる(第2図)。使
用するレーザ光源としてはアルゴンレーザ(458nm
)、ヘリウム−カドミニウムレーザ(442nm)など
が挙げられる。ここで、単位長さ当りの回折格子の溝数
はレーザの波長とレーザ露光装置の設定条件を定めろこ
とにより任意に制御することができる。さらに溝の形状
が鋸歯状化された回折格子(ブレーズド型回折格子)も
レーザ露光装置の設定条件により形成することができる
。またレーザ光により直接回折格子を形成するため精度
の高い回折格子が得られる。For such an optical recording material, the photoresist layer [3) is holographically exposed using a laser exposure device to form a latent image of one diffraction grating (FIG. 2). The laser light source used is an argon laser (458 nm
), helium-cadmium laser (442 nm), and the like. Here, the number of grooves of the diffraction grating per unit length can be arbitrarily controlled by determining the wavelength of the laser and the setting conditions of the laser exposure device. Furthermore, a diffraction grating in which the grooves are serrated (a blazed diffraction grating) can also be formed depending on the setting conditions of the laser exposure apparatus. Furthermore, since the diffraction grating is directly formed using laser light, a highly accurate diffraction grating can be obtained.
この次に微細な濃淡パターン状に情報が記録されている
マスク(4)を介してフォトレジス)i+31ヲ露光さ
せた後(第3図)フォトレジストを現像し。Next, the photoresist (i+31) was exposed to light through a mask (4) on which information was recorded in a fine density pattern (FIG. 3), and then the photoresist was developed.
回折格子が形成されたレジストのパターンヲ形成させる
(第4図)。その後、フォトレジスト層(3)及び基材
(2)の表面に金属層(5)を形成させる。金属1*
(51は後工程の第4図の形態(母型)のスタンパを起
こす技術方法(例えば電鋳法)を適用する際て不都合で
ない金属を選び、それを真空蒸着又はスパッタリンダを
行なうことで形成される。金属層(6)がさらに光学的
に高い反射率を有する金属の場合には、この状態に読み
出し光を照射すると再生も可能となり、記録状態の確認
を行なうことができる。A resist pattern in which a diffraction grating is formed is formed (FIG. 4). Thereafter, a metal layer (5) is formed on the surfaces of the photoresist layer (3) and the base material (2). Metal 1*
(51 is formed by selecting a metal that is not inconvenient when applying a technical method (for example, electroforming) to create a stamper in the form (matrix) shown in Figure 4 in the subsequent process, and performing vacuum evaporation or sputtering. If the metal layer (6) is made of a metal that has a higher optical reflectance, irradiating this state with read light makes it possible to reproduce and confirm the recording state.
電鋳法などの技術により得られた母型からスタンパを起
こしく第6図〕、そして得られたスタンパ(6)により
光学的記録媒体の大量複製を行なう。A stamper is formed from a matrix obtained by a technique such as electroforming (Fig. 6), and the obtained stamper (6) is used to perform mass duplication of optical recording media.
複製方法としては射出成形法、圧縮成形法、紫外線硬化
樹脂を使った方法などが挙げられるが、複製品が良質で
効率よく製造できる方法を選んでから行なう。複製され
た基材(7)の表面には光学的に高い反射率を有する金
属を選び、真空蒸着又はスパツタリングにより金属層(
8)を形成させ(第7図)その上部には光学的に透明な
材料(9)で保護層を形成させる(第8図)。この場合
読み取り光は材料(9)の側から照射するが、逆に基材
(7)を光学的に透明な性質をも備えた材料を使い基材
(7)の側から読み出し光を照射する方式も可能である
。Replication methods include injection molding, compression molding, and methods using ultraviolet curing resin, but a method that produces high-quality and efficient replicas should be selected before proceeding. A metal with high optical reflectance is selected for the surface of the replicated base material (7), and a metal layer (
8) is formed (FIG. 7), and a protective layer made of an optically transparent material (9) is formed thereon (FIG. 8). In this case, the reading light is irradiated from the side of the material (9), but conversely, the base material (7) is made of a material that also has optically transparent properties, and the reading light is irradiated from the side of the base material (7). method is also possible.
また、その表面に光学的に高い反射率を有する金属薄膜
を設けた熱可塑性樹脂にスタンパ(7)で圧縮成形させ
光学的記録情報を転写させる方法も可能である。このよ
うにして得られた光学的記録媒体において1回折格子の
形状が正弦波形でその深さが0.16μmの場合、He
−Neレーザー(652,8mm)を入射角0°で照射
した時の回折効率は3乙係であり1反射率は平滑部10
0に対し1回折格子部54となり約60係のコントラス
トが確認されろ。読み取り光は前記レーザー光に限定さ
れるものではなく1例えば発光ダイオード等、特別な光
源を選ばずとも読み取りを可能とするものを提供するも
のである。It is also possible to transfer optically recorded information by compression molding a thermoplastic resin having a metal thin film having high optical reflectance on its surface using a stamper (7). In the optical recording medium obtained in this way, when the shape of one diffraction grating is a sinusoidal waveform and its depth is 0.16 μm, He
- When irradiated with Ne laser (652,8 mm) at an incident angle of 0°, the diffraction efficiency is 3 B, and the 1 reflectance is 10 in the smooth part.
0 to 1 diffraction grating portion 54, and a contrast of about 60 is confirmed. The reading light is not limited to the above-mentioned laser light, but it is also possible to use a light emitting diode or the like, which enables reading without the need for a special light source.
(実施例)
以下1本発明を実施例により説明するが1本発明は実施
例だけに限定されるものではない。縦6〜74m 、横
5〜6crILの表面が平滑なガラス板上にフォトレジ
スト(シプレー社製−AZ−1550)をスピナー塗布
し、乾燥後(90’C)−Arレーザー(458mm
)を用いてホログラフィックな露光をさせ1回折格子の
潜像を形成させ1次いで微細なパターンを有するマスク
を介して露光を行ない。(Examples) The present invention will be explained below with reference to Examples, but the present invention is not limited to the Examples. A photoresist (AZ-1550 manufactured by Shipley) was coated with a spinner on a glass plate with a smooth surface measuring 6 to 74 m long and 5 to 6 cr IL wide, and after drying (90'C) -Ar laser (458 mm)
) is used to perform holographic exposure to form a latent image of a diffraction grating, and then exposure is performed through a mask having a fine pattern.
その後フォトレジストを現像し、レジストパターンを形
成する。しかる後得られたレジストパターン上に金蒸着
を行ない導電性薄膜を形成した後。Thereafter, the photoresist is developed to form a resist pattern. Thereafter, gold vapor deposition was performed on the obtained resist pattern to form a conductive thin film.
これをスルファミン酸ニンケル浴を用いたニッケル電鋳
でニッケルスタンパを作成し、厚さ0.5順のポリ塩化
ビニルシート上にニッケルスタンパの形状を圧縮成形で
転写させ、得られた転写表面にアルミニウム蒸着を行な
い1回折格子の設けられている部分と設けられていない
部分、つまり平滑な部分とを顕微鏡で観察したところ両
者がはっきりと区別され、また発光ダイオードを読み取
り光としてCCDラインセンサーで読み取ったところ実
用に充分なS/N比が得られた。A nickel stamper was created using nickel electroforming using a sulfamic acid nickel bath, and the shape of the nickel stamper was transferred by compression molding onto a polyvinyl chloride sheet of 0.5 thickness, and the resulting transfer surface was coated with aluminum. After vapor deposition, when we observed with a microscope the area where the diffraction grating was provided and the area where it was not, that is, the smooth area, we could clearly distinguish between the two, and we also used the light emitting diode as reading light to read the data using a CCD line sensor. However, a practically sufficient S/N ratio was obtained.
(本発明の効果)
本発明により回折格子部と平滑部を選択的に形成が行な
え、しかもレーザ光学装置の組み換え方により精度の高
い種々の回折格子の形成も可能となり、しかも効率よく
光学的記録媒体の大量複製も行なうことができろ。(Effects of the present invention) According to the present invention, it is possible to selectively form the diffraction grating portion and the smooth portion, and it is also possible to form various highly accurate diffraction gratings by recombining the laser optical device. It should also be possible to perform mass duplication of media.
第1図乃至第5図は母型を製造する各工程を示す説明図
、第6図乃至第8図は大量複製の各工程を示す説明図で
ある。
(1)・・・光学的記録材料
(2)・・・基材
(3)・・・フォトレジスト
(4)・・・マスクFIGS. 1 to 5 are explanatory diagrams showing each process of manufacturing a matrix, and FIGS. 6 to 8 are explanatory diagrams showing each process of mass replication. (1)...Optical recording material (2)...Substrate (3)...Photoresist (4)...Mask
Claims (1)
され該凹凸パターンの凹部又は凸部の少なくとも一方に
回折格子が形成されている光学的記録媒体の製造方法に
於いて、基材上にフォトレジストを塗布し、形成された
フォトレジスト層にレーザ光線を用いてホログラフィッ
クな露光をさせ回折格子の潜像を形成し、次いで記録す
べき信号に対応する微細な濃淡パターンを有するマスク
を用いて露光を行ない、その後フォトレジストを現像し
て記録パターンを得、得られた記録パターンからスタン
パを起こし、このスタンパにより微細なパターン状に回
折格子が設けられた光学的記録媒体を複製することを特
徴とする光学的記録媒体の製造方法A method for manufacturing an optical recording medium in which a concavo-convex pattern is formed of a material having high optical reflectance and a diffraction grating is formed on at least one of the concave portions or convex portions of the concave-convex pattern, the method includes: A resist is applied, the formed photoresist layer is holographically exposed using a laser beam to form a latent image of a diffraction grating, and then a mask having a fine shading pattern corresponding to the signal to be recorded is used. It is characterized by exposing to light, then developing the photoresist to obtain a recording pattern, creating a stamper from the obtained recording pattern, and using this stamper to reproduce an optical recording medium in which a diffraction grating is provided in a fine pattern. Method for manufacturing an optical recording medium
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28358586A JPS63138541A (en) | 1986-11-28 | 1986-11-28 | Production of optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28358586A JPS63138541A (en) | 1986-11-28 | 1986-11-28 | Production of optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63138541A true JPS63138541A (en) | 1988-06-10 |
Family
ID=17667415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28358586A Pending JPS63138541A (en) | 1986-11-28 | 1986-11-28 | Production of optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63138541A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994010684A1 (en) * | 1992-10-27 | 1994-05-11 | Pmdc, Inc. | Optically readable information disc including visible ornamental hologram, and method of fabricating same |
FR2705487A1 (en) * | 1993-05-14 | 1994-11-25 | Hologram Ind Sarl | Process for manufacturing a die intended for pressing optically read disks |
US8053146B2 (en) * | 2005-02-10 | 2011-11-08 | Ovd Kinegram Ag | Multi-layer body including a diffractive relief structure and method for producing the same |
-
1986
- 1986-11-28 JP JP28358586A patent/JPS63138541A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994010684A1 (en) * | 1992-10-27 | 1994-05-11 | Pmdc, Inc. | Optically readable information disc including visible ornamental hologram, and method of fabricating same |
FR2705487A1 (en) * | 1993-05-14 | 1994-11-25 | Hologram Ind Sarl | Process for manufacturing a die intended for pressing optically read disks |
US8053146B2 (en) * | 2005-02-10 | 2011-11-08 | Ovd Kinegram Ag | Multi-layer body including a diffractive relief structure and method for producing the same |
US8450029B2 (en) | 2005-02-10 | 2013-05-28 | Ovd Kinegram Ag | Multi-layer body and process for the production of a multi-layer body |
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