JPS6237367A - Iron loss decreasing device for grain oriented silicon steel sheet - Google Patents

Abstract

PURPOSE:To produce an extra-low iron loss grain oriented silicon steel sheet by subjecting the grain oriented silicon steel sheet from which the surface oxide is removed after a finish annealing treatment to mirror finishing then forming the nitride, carbide and oxide films of specific metals thereon by an ion plating method. CONSTITUTION:After the surface oxide of the grain oriented silicon steel sheet subjected to finish annealing is removed, the surface is finished to a specular surface by chemical or electrolytic polishing. Such substrate 10 is attached to a tension applying device 12 in such a manner that the substrate can be passed by the guide of guide rolls 13 for passing in a vacuum treatment chamber 1. The inside of the chamber 1 is evacuated to about 10<-4>-10<-6> Torr and thereafter Ti, Zr, V, Nb, Ta and other metals 5 in a A1 evaporating source 3 are melted and evaporated. Gas such as N2, CH4, O2 or NH3 is introduced into the chamber 1 and the nitride and carbide of the above-mentioned metals are deposited by evaporation on the substrate 10 as a negative electrode and an ionizing electrode 7 as an anode and in succession of Al, Ni, Cu and other metals are evaporated from a B1 evaporating source 6 so that the oxide of these metals is deposited thereon by evaporation.

Description

[Detailed Description of the Invention] (Industrial Application Field) Regarding ultra-low iron loss treatment of unidirectional silicon steel sheets, this specification describes the results of development research on adapting ion plating equipment to the above treatment. state.

Remarkable development efforts in recent years to improve the electrical and magnetic properties of grain-oriented silicon steel sheets, especially to meet the extreme demands of reducing iron loss, are gradually bearing fruit. A serious problem associated with its implementation is that when unidirectional silicon steel sheets are subjected to so-called warp annealing after processing and assembly, deterioration of properties will inevitably occur, resulting in It has been pointed out that the disadvantage of having restrictions on

Therefore, we would like to propose a device that is suitable for ultra-low iron loss treatment in order to open up a new method that can advantageously satisfy the above requirements, regardless of whether or not it undergoes a high-temperature thermal history such as strain relief annealing. That is.

As is well known, unidirectional silicon steel sheets have secondary recrystallized grains highly concentrated in the (110) [001), or Goss, orientation, and are used primarily as cores for transformers and other electrical equipment. Magnetic flux density (represented by Boo) of the product as an electric/magnetic property when used
It is important to increase the iron loss and lower the iron loss (represented by the value Wl/S).

This unidirectional silicon steel sheet is manufactured through a wide variety of complicated processes, but numerous inventions and improvements have been made so far, and today a product with a thickness of 0.30 mm has magnetic properties of B.
, Ql, 90T or more, Lt/so 1.05W/kg or less, and the magnetic properties of a product with a plate thickness of 0.23m are BIOl, 89
Unidirectional silicon steel sheets with ultra-low iron loss of T or more and 11r+7so0.90W/kg or less are being manufactured.

Particularly recently, there has been a marked increase in demand for power loss reduction features from an energy-saving perspective, and in Europe and the United States, when creating a transformer with low loss, the reduction in iron loss is converted into a monetary value and added to the transformer price.・The "evaluation" (iron loss evaluation) system is becoming widespread.

(Prior art) Under these circumstances, recently, the surface of a unidirectional silicon steel sheet after finish annealing is irradiated with a laser in a direction approximately perpendicular to the rolling direction to introduce local microstrain to subdivide the magnetic domains. (See Japanese Patent Publication No. 57-2252, Japanese Patent Publication No. 57-53419, Japanese Patent Publication No. 58-26405, and Japanese Patent Publication No. 58-26406).

This magnetic domain refining technology is effective for transformer materials for stacked iron cores that are not subjected to strain relief annealing. As the strain is released by annealing and the magnetic domain width becomes wider,
The drawback is that the laser irradiation effect is lost.

On the other hand, earlier in Japanese Patent Publication No. 52-24499, the surface of a unidirectional silicon steel plate after finish annealing was mirror-finished, or the mirror-finished surface was coated with metal plating or an insulating coating was applied thereon. A method of manufacturing an ultra-low core loss unidirectional silicon steel sheet by coating and baking has been proposed.

However, this method of improving iron loss through mirror finishing cannot be adopted from a process perspective, as it does not contribute enough to reducing iron loss despite the significant increase in cost. Due to problems with adhesion, it has not been adopted in current manufacturing processes. Japanese Patent Publication No. 56-4150 also proposes a method in which a steel plate surface is mirror-finished and then an oxide-based ceramic thin film is vapor-deposited. However, this method is also difficult to employ in actual manufacturing processes because the steel sheet and the ceramic layer separate when subjected to high-temperature annealing at 600° C. or higher.

(Problem to be Solved by the Invention) Therefore, the inventors have taken advantage of the above-mentioned effect of improving iron loss through mirror finishing, thereby eliminating the disadvantage of increased cost, especially from the viewpoint of the development of energy-saving materials today. We believe that it is important to overcome the problems of insulating layer adhesion and durability without deteriorating properties even during high-temperature treatment, and based on this basic understanding, we have developed a mirror finishing machine that is fundamental to steel plate processing. Upon re-examination, it was found that Ti, Zr, V, Nb, Ta, and Cr were added to the surface of the steel plate by applying ion plating to a unidirectional silicon steel plate finished in a mirror-like state with a centerline average roughness of 0.4 μm or less. , Mo
, Co, Ni, Mn, 81. It consists of at least one kind selected from nitrides and/or carbides of B and Si, and oxides of AI, Ni, Cu, W, Si, and 2N, and forms a finished surface through a mixed phase with the base iron. It has been found that by forming a strongly adhered tension coating, it is possible to advantageously reduce the core loss of a unidirectional silicon steel sheet.

The inventors have conducted research on the adhesion behavior of the above-mentioned tension coating, and have conducted exploratory research to obtain even further ultra-low iron loss. As a result, ■ mirror-finished steel sheets are exposed to ions at high temperatures of 300°C to 1100°C. Plating treatment allows effective use of elastic tension and ultra-low iron loss.
/nun' tensile force can be applied to further reduce the iron loss. ■By forming a tensile film of two or more types of nitrides and/or carbides and oxides with different coefficients of thermal expansion, the iron loss can be further reduced. It has become clear that iron loss can be obtained, and it has been discovered that by combining these, it is possible to achieve ultra-low iron loss in grain-oriented silicon steel sheets.

This invention proposes an apparatus suitable for ion plating treatment for producing ultra-low iron loss silicon steel sheets based on the above new experimental results.

(Means for Solving the Problems) This invention provides evaporation sources of two or more different substances in which a grain-oriented silicon steel sheet is subjected to continuous ion plating treatment to remove surface oxides and make it mirror-like after final annealing. This is an iron loss reducing device for a grain-oriented silicon steel sheet, comprising: a high-temperature heating device for the substrate; and a tensioning device.

FIG. 1 shows a schematic diagram of an ion plating apparatus.

In the figure, 1 is the vacuum processing chamber, 2 is the vacuum exhaust port, 3 is A, the evaporation source, 4 is the B1 evaporation source, 5 is the metal source for A1, 6 is the metal source for B1, 7 is the ionization electrode, and 8 is the gas introduction 9 is a shutter, 10 is a substrate (a unidirectional silicon steel plate that has a mirror finish after finish annealing and surface oxide removal), 11 is a heating heater, and 12 is a steel plate that can be wound into a coil shape. This is a tensioning device that can apply tension to.

(for production) Next, the ion plating process is performed in the following order.

First, a finish-annealed unidirectional silicon steel sheet is subjected to surface oxide removal, and then chemically polished or electrolytically polished to a mirror-like finish. It is attached to the tension applying device 12 so that the sheet can be passed under the guidance of the guide rolls 13. This equipment is characterized by being able to apply tensile force to the substrate, and the tension applied to the steel plate is 0.1 to 5 at the high temperature heating section.
．． 0kg/ff1I! It is adjustable within a range of 12.

After completing such a set, the vacuum pump is used to evacuate from the vacuum exhaust port 2 to 10-2 to 10-') with a rotary vacuum pump, and then the diffusion pump is used to evacuate 10-4. Evacuate to a high vacuum of 10 to 10-' Torr.

After achieving a sufficient degree of vacuum in this way, first,
Melt the A1 metal 5 in the extremely thin source 3. This metal can be melted using an electron beam, a hollow cathode, electrode heating, or the like, and any of these methods may be used in the present invention.

On the other hand, the substrate is heated to 300~1 using heater 11.
It is heated to the target temperature of 000°C to make it into a thermally expanded state.

A. After melting metal 5 and creating At metal vapor,
A small amount of gas (for example, N2, CH4,
02 and NH3 gas, etc.), the ionization electrode 7 is set to a high positive potential and the substrate 10 is set to a negative potential.Then, the shutter 9 is opened and various nitrides, carbides, or oxides are applied to the substrate 10 by opening the shutter 9. Perform ion plating. At this time, tension is added.

After the ion plating using the ^1 evaporation source 3 is completed, in this invention, the ion plating process of B can be added using the 8° metal 6 in the evaporation source 4.

(Effects of the Invention) The apparatus of the present invention makes it possible to effectively form a laminated ultra-thin tensile film of nitrides, carbides, or oxides with a small amount of nitride, carbide, or oxide having different coefficients of thermal expansion. It is possible to achieve low iron loss in steel sheets.

(Example) A finish annealed unidirectional silicon steel plate (0.20 mm thick) was pickled to remove surface oxides, and then the surface of the steel plate was electrolytically polished to a mirror-like state.

Then, using the ion plating device shown in Figure 1, T
A double tension coating of Al2O3 was formed on the iN coating.

In this case, Ti and B are used as the AI metal source 5, and AI is used as the metal source 6, and approximately 1.5 kg is applied by the tension applying device 12.
/mm" tension and the heater 11
In the case of forming a thin film of N (0.4 μm thick), at 700°C,
The substrate is heated and Al2O3 (0.3μ
In the case of forming a laminated thin film with a thickness of m), the substrate was heated to 850°C. The magnetic properties of the product treated with ion plating in this way were as follows.

B+o'1.92T, Lt7so:0.64
W/kg

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of the ion plating apparatus of the present invention.

Claims (1)

[Claims] 1. Two or more evaporation sources of different substances, a high-temperature heating device for the substrate, and a tensioning device, which continuously performs ion plating on a grain-oriented silicon steel sheet that removes surface oxides and makes it mirror-like after final annealing. An iron loss reduction device for grain-oriented silicon steel sheet, characterized by comprising: