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JPS5139025A - - Google Patents

Info

Publication number
JPS5139025A
JPS5139025A JP49111171A JP11117174A JPS5139025A JP S5139025 A JPS5139025 A JP S5139025A JP 49111171 A JP49111171 A JP 49111171A JP 11117174 A JP11117174 A JP 11117174A JP S5139025 A JPS5139025 A JP S5139025A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49111171A
Inventor
Chiaki Osada
Eiichi Hasegawa
Masataka Murata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP49111171A priority Critical patent/JPS5139025A/ja
Priority to DE19752543009 priority patent/DE2543009A1/de
Priority to GB39851/75A priority patent/GB1510496A/en
Priority to US05/617,603 priority patent/US4058398A/en
Publication of JPS5139025A publication Critical patent/JPS5139025A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP49111171A 1974-09-27 1974-09-27 Pending JPS5139025A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP49111171A JPS5139025A (ja) 1974-09-27 1974-09-27
DE19752543009 DE2543009A1 (de) 1974-09-27 1975-09-26 Bildaufzeichnungsmaterial und verfahren zum herstellen von bildern unter anwendung desselben
GB39851/75A GB1510496A (en) 1974-09-27 1975-09-29 Image recording material having photopolymerizable layers and image-forming therewith
US05/617,603 US4058398A (en) 1974-09-27 1975-09-29 Image recording material and method for forming an image using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49111171A JPS5139025A (ja) 1974-09-27 1974-09-27

Publications (1)

Publication Number Publication Date
JPS5139025A true JPS5139025A (ja) 1976-04-01

Family

ID=14554270

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49111171A Pending JPS5139025A (ja) 1974-09-27 1974-09-27

Country Status (4)

Country Link
US (1) US4058398A (ja)
JP (1) JPS5139025A (ja)
DE (1) DE2543009A1 (ja)
GB (1) GB1510496A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59140446A (ja) * 1983-01-31 1984-08-11 Sekisui Chem Co Ltd 画像形成用材料

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928323B2 (ja) * 1976-08-12 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5928326B2 (ja) * 1976-12-02 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS53120905A (en) * 1977-03-29 1978-10-21 Dainippon Printing Co Ltd Method of producing lithographic printing plate
JPS5391803A (en) * 1977-01-18 1978-08-12 Dainippon Printing Co Ltd Method of producing lithographic printing plate
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
DE3333450A1 (de) * 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
US5776655A (en) * 1996-03-11 1998-07-07 Eastman Kodak Company Peel-developable lithographic printing plate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148516B2 (ja) * 1973-02-07 1976-12-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59140446A (ja) * 1983-01-31 1984-08-11 Sekisui Chem Co Ltd 画像形成用材料

Also Published As

Publication number Publication date
GB1510496A (en) 1978-05-10
DE2543009A1 (de) 1976-04-15
US4058398A (en) 1977-11-15

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