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JPS5999787A - Thick film printed circuit board - Google Patents

Thick film printed circuit board

Info

Publication number
JPS5999787A
JPS5999787A JP21027182A JP21027182A JPS5999787A JP S5999787 A JPS5999787 A JP S5999787A JP 21027182 A JP21027182 A JP 21027182A JP 21027182 A JP21027182 A JP 21027182A JP S5999787 A JPS5999787 A JP S5999787A
Authority
JP
Japan
Prior art keywords
wiring
thick film
connection pad
wiring connection
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21027182A
Other languages
Japanese (ja)
Inventor
坂村 利弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21027182A priority Critical patent/JPS5999787A/en
Publication of JPS5999787A publication Critical patent/JPS5999787A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (al  発明の技術分野 本発明は厚膜配線基板に係り、特にその印刷配線接続の
改造fε正を容易に□するような配線接続用のパッドの
形状に関する。・・ ′□ (bl  技術の背景       ・     ・:
 ′□近年印綿)1回路は半導体集格回路(■c)や大
規模半導体集積回路(・r、、5lt)め実用化に伴い
、□電子機器等あ急速な発雇と共に広A bE (m用
されて凶るが、]シ品の高密度実装が要求されるに従っ
てプリントB線基板は益々□複91G(ビし、高+青□
度化し、多□層化、してきている。
DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a thick film wiring board, and more particularly to the shape of a wiring connection pad that facilitates modification of the printed wiring connection. ′□ (bl Technology background ・ ・:
'□In recent years, with the practical application of semiconductor integrated circuits (■c) and large-scale semiconductor integrated circuits (・r,,5lt), □Electronic equipment and other areas have been rapidly hiring, and wide A bE ( However, as high-density packaging of B-line products is required, printed B-line boards are becoming more and more common.
It is becoming more frequent and multi-layered.

(C)、従来技術と問題点 ・         。(C), Prior art and problems.

従来の多層プリント配線基板は、銅張りしたガラス繊維
入エポキシ板よりなる積層板の銅、張を選択的にエツチ
ングして印刷回路を形成したプリント積層板を複数投積
層して形成している。
A conventional multilayer printed wiring board is formed by laminating a plurality of printed laminates each having a printed circuit formed by selectively etching the copper and cladding of a laminate made of a copper-clad glass fiber-containing epoxy board.

これに対し2苛酷な環境条件5例えば高温度であるとか
1機械的振動が激しいというような環境で使用、さ・れ
る電子機、器、2.例、えば自動車用の電子機・器に使
用するプリント板回路には一般の合成、樹脂プ・リント
積層板の代ね、す(こ1.セラミックや、鉄板にグルシ
ーズ処理し・た琺瑯板が基板として使用され。
On the other hand, electronic devices and appliances that are used under harsh environmental conditions, such as high temperatures and severe mechanical vibrations, 2. For example, printed board circuits used in automobile electronic equipment and appliances can be made of ceramic or enamel plates made of iron plates treated with glue instead of general synthetic or resin-printed laminates. used as a substrate.

その基板上に厚膜法で形成され単層あるいは多層の回路
、が配設されている。
A single layer or multilayer circuit formed by a thick film method is disposed on the substrate.

第1図は上記厚膜配線基板の一部の構造の一例を概念的
に示しだ部分断面を持つ斜視図である。
FIG. 1 is a partially cross-sectional perspective view conceptually showing an example of the structure of a part of the thick film wiring board.

セラミ・ツク基板1の表面上に厚膜法によって銅あるい
は銀パラディラム等の導電性ペーストで配線2が形成さ
れ、その先端に配線接続バッド3が接続されている。こ
れらの配線は上記の導電性ぺ−ストでセラミック基板上
に厚膜法に従ってスクリーン印刷された後、電気炉また
は窒素炉中で約900℃で焼付けられる。その後ガラス
粉末等を焼き付けて形成した絶縁層4で前記配線接続パ
ッド3を残して基板lの全面を被覆して、前記の配線や
同時に厚膜法で形成した図には示してない受動部品等を
保護する。
A wiring 2 is formed on the surface of a ceramic substrate 1 using a conductive paste such as copper or silver palladium by a thick film method, and a wiring connection pad 3 is connected to the tip of the wiring 2. These wirings are screen printed on a ceramic substrate using the above conductive paste according to the thick film method, and then baked at about 900 DEG C. in an electric or nitrogen furnace. Thereafter, an insulating layer 4 formed by baking glass powder or the like is used to cover the entire surface of the board 1, leaving the wiring connection pads 3, to cover the wiring and passive components (not shown in the figure) that are simultaneously formed using a thick film method. protect.

以上は表面層または単層の構造に就いて述べたものであ
るが、実装密度を上げるために多層プリント配線をする
必要のある場合には、予め基板1上に第2の配線5とさ
らにその上に第2の絶縁層6を形成する。このように多
層プリント配線を必要に応じて上へ上へと重ねて形成し
ていく方法をアディティブ(additive)法とい
う。眉間の配線接続は一般のプリント板回路のようなス
ルーホールメッキによらず、配線の形成の度に異なる層
に存在する回路配線間の必要な回路接続を行う。
The above has been described with respect to the surface layer or single layer structure, but if it is necessary to perform multilayer printed wiring to increase the packaging density, the second wiring 5 and its A second insulating layer 6 is formed thereon. This method of forming multilayer printed wiring in layers one on top of the other as required is called an additive method. Wiring connections between the eyebrows do not involve through-hole plating as is the case with general printed board circuits, but the necessary circuit connections are made between circuit wires on different layers each time the wires are formed.

電子部品9例えば抵抗チップ7を配線接続パッド3に接
続するには該抵抗チップ7の外部端子8と半田付りによ
り行う。9は抵抗体である。
The electronic component 9, for example, the resistor chip 7, is connected to the wiring connection pad 3 by soldering to the external terminal 8 of the resistor chip 7. 9 is a resistor.

他方、電子計算機等の電子機器の改良は絶えず行われ、
また使用者の要求の変更も激しいので。
On the other hand, electronic devices such as computers are constantly being improved.
Also, user requirements are changing rapidly.

前述の厚膜配線基板の回路配線接続を修正変更する場合
が屡発生する。この時、新に回路を追加接続する場合に
はポリウレタン被覆銅線10等で第1図に示すように、
−配線接続パッド3か電子部品の端子部8に半田付けし
て行う。この半田付は作業は面倒で信頼性も低下し勝ち
である。殊に内層に形成されている配線を切断しようと
する場合は不可能に近い困難性を伴っている。
It often happens that the circuit wiring connections of the above-mentioned thick film wiring board are modified or changed. At this time, when connecting a new circuit, use polyurethane-coated copper wire 10, etc., as shown in Figure 1.
- This is done by soldering to the wiring connection pad 3 or the terminal portion 8 of the electronic component. This soldering process is troublesome and reduces reliability. In particular, when trying to cut wiring formed in the inner layer, it is difficult to cut the wiring formed in the inner layer.

以上のような配線接続の改造を容易にするような何等か
の手段が従来より待望されていた。
There has been a long-awaited desire for some kind of means that would facilitate the modification of wiring connections as described above.

(d)  発明の目的 本発明は前述の点に鑑みなされたもので、厚膜配線基板
の表面層に形成さている配線接続パッドの形状を改良し
て該基板の配線接続の変更を容易にしようとするもので
ある。
(d) Purpose of the Invention The present invention has been made in view of the above-mentioned points.It is an object of the present invention to improve the shape of wiring connection pads formed on the surface layer of a thick film wiring board to facilitate changing the wiring connections of the board. That is.

tel  発明の構成 上記の発明の目的は、セラミックまたは琺瑯等無機物を
基板とする厚膜配線基板であって、該厚膜配線基板の所
定の配線接続パッドに半田被覆をされた第1の延長部と
、狭隘部を介して第2の延長部を設けて、それぞれ改造
配線接続用パッドおよび内層配線接続用パッドとするこ
とにより容易に達成される。
tel Structure of the Invention The object of the above invention is to provide a thick film wiring board having an inorganic material such as ceramic or enamel as a substrate, and a first extension portion coated with solder on a predetermined wiring connection pad of the thick film wiring board. This can be easily achieved by providing a second extension part through the narrow part to form a modified wiring connection pad and an inner layer wiring connection pad, respectively.

(fl  発明の実施例 以下本発明の実施例につき図面を参照して説明する。第
2図(al、 (blはそれぞれ本発明に基づき改良さ
れた構造の厚膜配線基板の一実施例を示す部分平面図お
よび部分断面図である。
(fl Embodiments of the Invention Examples of the present invention will be described below with reference to the drawings. FIGS. FIG. 2 is a partial plan view and a partial cross-sectional view.

図に見るように従来の配線接続パッド3を延長して改造
配線接続用パッド3aと内層配線接続用パッド3b形成
する。これは総ての配線接続パッド3に付設するのでは
なくて、予め配線接続の変更改造が予測されるパッド3
に付設するものである。
As shown in the figure, the conventional wiring connection pad 3 is extended to form a modified wiring connection pad 3a and an inner layer wiring connection pad 3b. This is not attached to all wiring connection pads 3, but to pads 3 where wiring connection changes or modifications are expected in advance.
It is attached to.

また第2図(alに見るように、内層配線接続用パッド
3bには容易に配線接続を切断し得るように元のパッド
3との連結部に切り欠けが設けられて、狭隘部3cが形
成されている。
In addition, as seen in FIG. 2 (al), a notch is provided in the inner layer wiring connection pad 3b at the connection part with the original pad 3 so that the wiring connection can be easily disconnected, and a narrow part 3c is formed. has been done.

また第2図(alに点線で示した絶縁層4は配線接続パ
ッド3と改造配線接続用パッド3aおよび内層配線接続
用パッド3bを被覆しないで残しているが。
Furthermore, the insulating layer 4 shown by dotted lines in FIG.

前記バンド3.3a、3bはソルダーペーストをその上
にスクリーン印刷し、加熱して半田被覆するか。
The bands 3.3a, 3b are covered with solder by screen printing a solder paste thereon and heating it.

または半田槽内へ基板を浸漬することによって半田被覆
して該バンドが保存中に酸化するのを防止すると共に、
改造配線接続をする時は、該パッド上に同様に半田メッ
キされた搭載部品の接続電極を載置して電気炉で加熱し
て所謂リフロー法で接続するのに便利にしである。
Alternatively, the board is coated with solder by dipping the board into a solder bath to prevent the band from oxidizing during storage, and
When making a modified wiring connection, it is convenient to place the connection electrode of the mounted component, which is similarly solder-plated, on the pad and heat it in an electric furnace to make the connection by the so-called reflow method.

(g+  発明の効果 以上の説明から明らかなように、厚膜配線基板の表面層
に配設された配線接続パッドを延長して本発明に基づく
改造配線接続用パッド3aおよび内層配線接続用パッド
3bを必要に応して付設しておけば、前記厚膜配線基板
を完成後、改造配線を要する場合、該改造配線作業が極
めて容易になり。
(g+ Effects of the Invention As is clear from the above explanation, the modified wiring connection pad 3a and the inner layer wiring connection pad 3b based on the present invention are obtained by extending the wiring connection pad provided on the surface layer of the thick film wiring board. If necessary, if modification wiring is required after completing the thick film wiring board, the modification wiring work becomes extremely easy.

配線切断も前記狭隘部3cを除去することにより簡単に
実施出来ると共に、仕上がりも美麗になり信頼性を向上
出来るという効果がある。
By removing the narrow portion 3c, wiring can be easily cut, and the finish is beautiful and reliability can be improved.

また改造配線を従来のように既に半田付けされた配線接
続パッドや部品の端子の上にはんだ付けで接続する時は
、既存の半田のために半田付は面が平坦でないので、半
田鏝チップで接続用配線を押さえると該配線が横に移動
し易く、改造配線作業を機械化することは難しいが5本
発明による改造配線接続用パッドと内層配線接続用パッ
ドは平坦であるので、改造配線作業の自動化は容易であ
るという利点がある。
In addition, when connecting modified wiring to wire connection pads or component terminals that have already been soldered, use a soldering iron tip because the soldering surface is not flat due to the existing solder. When the connection wiring is held down, the wiring tends to move laterally, making it difficult to mechanize the modification wiring work.5 However, since the modification wiring connection pad and the inner layer wiring connection pad according to the present invention are flat, the modification wiring work can be easily carried out. The advantage is that automation is easy.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の厚膜配線基板の一部の構造の一例を概念
的に示した部分断面を持つ斜視図、第2図は本発明に基
づき改良された構造の厚膜配線基板の一実施例を示すf
a)部分平面図および(b)部分断面図である。 図において、1はセラミック配線基板、2.5はプリン
ト配線、3は配線接続パッド、 3aは配線接続パッド
の狭隘部、4.6は絶縁層、7はチップ抵抗、8は外部
端子、9は抵抗体、10は改造配線用@線をそれぞれ示
す。 第2図
FIG. 1 is a perspective view with a partial cross section conceptually showing an example of the structure of a part of a conventional thick film wiring board, and FIG. 2 is an implementation of a thick film wiring board with an improved structure based on the present invention. f showing example
FIG. 3 is a) a partial plan view and (b) a partial cross-sectional view. In the figure, 1 is a ceramic wiring board, 2.5 is a printed wiring, 3 is a wiring connection pad, 3a is a narrow part of the wiring connection pad, 4.6 is an insulating layer, 7 is a chip resistor, 8 is an external terminal, and 9 is an external terminal. A resistor and 10 indicate @ wires for modified wiring, respectively. Figure 2

Claims (1)

【特許請求の範囲】 セラミツ・りまたは琺瑯等無機物を基板とする厚膜配線
基板であって、該厚膜配線基板の所定の配線接続バレド
に半田被覆をきれた第1の延長部と。 狭隘部を介して第:2・の延長部を設けたことを□特徴
とする厚膜配線基板。  ・ ′  □:
[Scope of Claims] A thick film wiring board having an inorganic material such as ceramic, enamel, or the like as a substrate, and a first extension portion in which a predetermined wiring connection bar of the thick film wiring board is coated with solder. □ A thick film wiring board characterized in that a second extension part is provided through the narrow part.・ ′ □:
JP21027182A 1982-11-29 1982-11-29 Thick film printed circuit board Pending JPS5999787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21027182A JPS5999787A (en) 1982-11-29 1982-11-29 Thick film printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21027182A JPS5999787A (en) 1982-11-29 1982-11-29 Thick film printed circuit board

Publications (1)

Publication Number Publication Date
JPS5999787A true JPS5999787A (en) 1984-06-08

Family

ID=16586623

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21027182A Pending JPS5999787A (en) 1982-11-29 1982-11-29 Thick film printed circuit board

Country Status (1)

Country Link
JP (1) JPS5999787A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61212096A (en) * 1985-03-18 1986-09-20 株式会社日立製作所 Multilayer interconnection board
JPH027596A (en) * 1988-06-27 1990-01-11 Fujitsu Ltd Wiring board with interlayered film element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61212096A (en) * 1985-03-18 1986-09-20 株式会社日立製作所 Multilayer interconnection board
JPH027596A (en) * 1988-06-27 1990-01-11 Fujitsu Ltd Wiring board with interlayered film element

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