JPS5594474A - Ion plating apparatus for tube inside using laser beam - Google Patents
Ion plating apparatus for tube inside using laser beamInfo
- Publication number
- JPS5594474A JPS5594474A JP239979A JP239979A JPS5594474A JP S5594474 A JPS5594474 A JP S5594474A JP 239979 A JP239979 A JP 239979A JP 239979 A JP239979 A JP 239979A JP S5594474 A JPS5594474 A JP S5594474A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- plated
- laser
- condenser
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To enable the inside of a long-size tube to be plated by attaching a laser generator to the tube provided with a condenser, gas exhaust and feed means, etc. and constituting them so that the tube inside can be plated. CONSTITUTION:Tube 12 to be plated is hermetically sealed with flange 10 and laser beam window 3, and vacuum pump 15, condenser 6 holder 7 which doubles as a gas feed pipe, etc. are attached to tube 12. High voltage cable 13 is connected to tube 12 and used as a cathode, and plating metal 8 as an anode is held in tube with holder 9. Laser beams from laser generator 1 are centered at metal 8 through window 2 and condenser 6, whereby metal 8 is melted, evaporated, and ionized by glow discharge to ion-plate the inside of tube 12. Since a heat source unit can be placed far away by making use of laser, the inside of long-size tube 12 is enabled to be ion- plated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP239979A JPS5594474A (en) | 1979-01-12 | 1979-01-12 | Ion plating apparatus for tube inside using laser beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP239979A JPS5594474A (en) | 1979-01-12 | 1979-01-12 | Ion plating apparatus for tube inside using laser beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5594474A true JPS5594474A (en) | 1980-07-17 |
Family
ID=11528155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP239979A Pending JPS5594474A (en) | 1979-01-12 | 1979-01-12 | Ion plating apparatus for tube inside using laser beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5594474A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739169A (en) * | 1980-08-19 | 1982-03-04 | Sekisui Chem Co Ltd | Preparation of thin film vapor deposited object |
JPS57198260A (en) * | 1981-05-29 | 1982-12-04 | Hitachi Ltd | Method and device for metallic vapor deposition on inside surface of vacuum vessel |
JPS6393858A (en) * | 1986-10-06 | 1988-04-25 | Ishikawajima Harima Heavy Ind Co Ltd | Sputtering device |
WO1995021948A1 (en) * | 1994-02-09 | 1995-08-17 | The Coca-Cola Company | Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance |
GB2517436A (en) * | 2013-08-19 | 2015-02-25 | Pct Protective Coating Technologies Ltd | Coating or sealing an internal surface of a workpiece |
-
1979
- 1979-01-12 JP JP239979A patent/JPS5594474A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739169A (en) * | 1980-08-19 | 1982-03-04 | Sekisui Chem Co Ltd | Preparation of thin film vapor deposited object |
JPS57198260A (en) * | 1981-05-29 | 1982-12-04 | Hitachi Ltd | Method and device for metallic vapor deposition on inside surface of vacuum vessel |
JPS6393858A (en) * | 1986-10-06 | 1988-04-25 | Ishikawajima Harima Heavy Ind Co Ltd | Sputtering device |
WO1995021948A1 (en) * | 1994-02-09 | 1995-08-17 | The Coca-Cola Company | Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance |
US5565248A (en) * | 1994-02-09 | 1996-10-15 | The Coca-Cola Company | Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance |
GB2517436A (en) * | 2013-08-19 | 2015-02-25 | Pct Protective Coating Technologies Ltd | Coating or sealing an internal surface of a workpiece |
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