JPS5449082A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5449082A JPS5449082A JP11596277A JP11596277A JPS5449082A JP S5449082 A JPS5449082 A JP S5449082A JP 11596277 A JP11596277 A JP 11596277A JP 11596277 A JP11596277 A JP 11596277A JP S5449082 A JPS5449082 A JP S5449082A
- Authority
- JP
- Japan
- Prior art keywords
- layers
- type
- layer
- poly
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 10
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 2
- 108091006146 Channels Proteins 0.000 abstract 1
- 108010075750 P-Type Calcium Channels Proteins 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000002950 deficient Effects 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000002356 single layer Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To manufacture an inverter logic element of an IG type which has no connection problem in case of high integration, by forming both active element part and passive element parts of polycrystal layers. CONSTITUTION:On the p--type Si substrate, p-type channel stopper 2 and SiO2 3 are formed, and on layer 3, p-type poly Si layer 15 is formed. Parts of layer 15 which become source 4, drain 5 and drain wiring part 10 are made into n-type layers through selective diffusion. On p-channel 16 between layers 4 anf 5, gate oxidized film 6 and gate concuctor 7 of poly Si are formed overlapping with layers 4 and 5. Further, n--type diffusion layers are selectively formed at the parts of drain load resistor 9, thereby obtaining a desired resistance value. Next, surface oxidized film 11 and electrodes 12 to 14 are porvided. In this constitution, since both the electrode layers and channel of an active element and the resistance and wiring 10 of a passive element are provided into single-layer poly Si, no defective connection between layers occurs and a highly-integrated and highly reliable device can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11596277A JPS5449082A (en) | 1977-09-26 | 1977-09-26 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11596277A JPS5449082A (en) | 1977-09-26 | 1977-09-26 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5449082A true JPS5449082A (en) | 1979-04-18 |
Family
ID=14675434
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11596277A Pending JPS5449082A (en) | 1977-09-26 | 1977-09-26 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5449082A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5529108A (en) * | 1978-08-23 | 1980-03-01 | Hitachi Ltd | Semiconductor resistance element |
JPS5897877A (en) * | 1981-11-26 | 1983-06-10 | シ−メンス・アクチエンゲゼルシヤフト | Thin film mos phototransistor, method of producing same and driving method |
WO1990005995A1 (en) * | 1988-11-22 | 1990-05-31 | Seiko Epson Corporation | Semiconductor device |
US5428242A (en) * | 1988-11-22 | 1995-06-27 | Seiko Epson Corporation | Semiconductor devices with shielding for resistance elements |
US6255695B1 (en) * | 1996-09-20 | 2001-07-03 | Semiconductor Energy Laboratory Co., Ltd. | TFT CMOS logic circuit having source/drain electrodes of differing spacing from the gate electrode for decreasing wiring capacitance and power consumption |
-
1977
- 1977-09-26 JP JP11596277A patent/JPS5449082A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5529108A (en) * | 1978-08-23 | 1980-03-01 | Hitachi Ltd | Semiconductor resistance element |
JPS5897877A (en) * | 1981-11-26 | 1983-06-10 | シ−メンス・アクチエンゲゼルシヤフト | Thin film mos phototransistor, method of producing same and driving method |
WO1990005995A1 (en) * | 1988-11-22 | 1990-05-31 | Seiko Epson Corporation | Semiconductor device |
GB2232530A (en) * | 1988-11-22 | 1990-12-12 | Seiko Epson Corp | Semiconductor device |
GB2232530B (en) * | 1988-11-22 | 1993-09-22 | Seiko Epson Corp | A high precision semiconductor resistor device |
US5428242A (en) * | 1988-11-22 | 1995-06-27 | Seiko Epson Corporation | Semiconductor devices with shielding for resistance elements |
US6255695B1 (en) * | 1996-09-20 | 2001-07-03 | Semiconductor Energy Laboratory Co., Ltd. | TFT CMOS logic circuit having source/drain electrodes of differing spacing from the gate electrode for decreasing wiring capacitance and power consumption |
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