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JPH11274720A - Manufacture of multilayer-laminated board - Google Patents

Manufacture of multilayer-laminated board

Info

Publication number
JPH11274720A
JPH11274720A JP8000698A JP8000698A JPH11274720A JP H11274720 A JPH11274720 A JP H11274720A JP 8000698 A JP8000698 A JP 8000698A JP 8000698 A JP8000698 A JP 8000698A JP H11274720 A JPH11274720 A JP H11274720A
Authority
JP
Japan
Prior art keywords
circuit
thickness
circuit board
metal foil
insulating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8000698A
Other languages
Japanese (ja)
Inventor
Daizo Baba
大三 馬場
Manabu Mizutani
学 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP8000698A priority Critical patent/JPH11274720A/en
Publication of JPH11274720A publication Critical patent/JPH11274720A/en
Withdrawn legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a manufacture of a multilayer-laminated board that can provide a highly reliable multilayer-laminated board without having void as well as set the insulation characteristics of the insulating layer, etc., as required. SOLUTION: A metal foil 4 is stacked on a circuit board 2 having circuits 1 on the surface via an insulating material 3, then heated all together under pressure to laminate the circuit board 2 and the metal foil 4 in this manufacture of a multilayer-laminated board. Thickness adjusters 5 that are generally as thick as the circuits 1 are provided in spaces where a circle of 10 mm or longer in diameter can fit between circuits 1 on the surface of the circuit board 2. Consequently, the thickness of the insulating layer formed with the insulating material 3 is made generally uniform so that characteristics such as insulating performance, etc., can be generally uniform. The insulating material 3 reaches every part between the circuits 1 or between the circuits 1 and the thickness adjusters 5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、計算器や通信機な
どの電子電気機器に使用される多層プリント配線板を形
成するのに用いられる多層積層板の製造方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer laminate used for forming a multilayer printed wiring board used for electronic equipment such as a calculator and a communication device.

【0002】[0002]

【従来の技術】従来より、多層積層板を形成するにあた
っては、内部や表面に回路を有する回路板の表面に絶縁
材料を介して金属箔を重ね合わせ、これを加熱加圧して
絶縁材料を硬化させると共に硬化した絶縁材料で回路板
と金属箔を一体に接着するようにしている。このように
形成される多層積層板は、回路板が内層回路板(コア
材)となって回路板の回路が内層回路になると共に硬化
した絶縁材料が絶縁層となり、この絶縁層を介して最外
層に金属箔を有するような構造となっており、最外層の
金属箔にエッチングなどの処理を施して外層回路を形成
したり、スルーホールやビアホール及びスルーホールめ
っきやバイアホールめっきを施したりすることによっ
て、多層積層板から多層プリント配線板が形成されるの
である。上記絶縁材料としては、プリプレグ(ガラス基
材入り絶縁シート)が用いられており、この場合、プリ
プレグを回路板に重ね合わせた後、プリプレグの表面に
金属箔を重ね合わせるようにして、回路板の表面に絶縁
材料を介して金属箔を重ね合わせるようにしている。
2. Description of the Related Art Conventionally, in forming a multilayer laminate, a metal foil is laminated via an insulating material on the surface of a circuit board having a circuit inside or on a surface, and the insulating material is cured by heating and pressing. At the same time, the circuit board and the metal foil are integrally bonded with a cured insulating material. In the multilayer laminate thus formed, the circuit board becomes an inner layer circuit board (core material), the circuit of the circuit board becomes an inner layer circuit, and the cured insulating material becomes an insulating layer. It has a structure that has a metal foil on the outer layer.The outermost metal foil is subjected to processing such as etching to form an outer layer circuit, or through-holes, via holes, through-hole plating, and via-hole plating. Thus, a multilayer printed wiring board is formed from the multilayer laminate. As the insulating material, a prepreg (insulating sheet containing a glass substrate) is used. In this case, after the prepreg is laminated on the circuit board, a metal foil is laminated on the surface of the prepreg, and the A metal foil is laminated on the surface via an insulating material.

【0003】また最近では、ビルトアップ工法という多
層積層板の製造方法が提案されている。ビルドアップ工
法は図3(a)〜(d)のようにして行なわれる。まず
図3(a)のように、回路板2の表面に絶縁材料3を介
して金属箔を重ね合わせ、これを加熱加圧して絶縁材料
3の樹脂を硬化させると共に硬化した絶縁材料3で回路
板2と金属箔4を一体に接着する。この時、硬化した絶
縁材料3が絶縁層8となる。次に図3(b)に示すよう
に、金属箔4にエッチング等の回路形成処理を施して絶
縁層8の表面に回路9を形成する。次に図3(c)に示
すように、レーザ加工等により所定の箇所にビアホール
15を形成する。次に図3(d)に示すように、ビアホ
ール15の内面及び回路1、9の表面にめっき層16を
形成する。このようにしてビルドアップ工法により多層
積層板が製造されるのである。尚、図3(d)の後、さ
らに多層化したい場合は、図3(a)〜(d)の工程を
繰り返し行なうようにする。
Recently, a method of manufacturing a multilayer laminate called a build-up method has been proposed. The build-up method is performed as shown in FIGS. First, as shown in FIG. 3A, a metal foil is superimposed on the surface of the circuit board 2 via an insulating material 3 and is heated and pressurized to cure the resin of the insulating material 3 and to cure the circuit by the cured insulating material 3. The plate 2 and the metal foil 4 are integrally bonded. At this time, the cured insulating material 3 becomes the insulating layer 8. Next, as shown in FIG. 3B, a circuit 9 is formed on the surface of the insulating layer 8 by performing a circuit forming process such as etching on the metal foil 4. Next, as shown in FIG. 3C, via holes 15 are formed at predetermined locations by laser processing or the like. Next, as shown in FIG. 3D, a plating layer 16 is formed on the inner surface of the via hole 15 and the surfaces of the circuits 1 and 9. Thus, the multilayer laminate is manufactured by the build-up method. If it is desired to further increase the number of layers after FIG. 3D, the steps of FIGS. 3A to 3D are repeated.

【0004】図3(a)に示すように、回路板2の表面
に絶縁材料3を介して金属箔を重ね合わせる方法として
は、Bステージ状態にまで硬化させた樹脂フィルム(プ
リプレグのような基材のないフィルム)を回路板2の表
面に配置し、樹脂フィルムの表面に金属箔4を配置する
方法がある。また他の方法としては、金属箔4の片面に
樹脂ワニスを塗布し、樹脂ワニスを乾燥して樹脂をBス
テージ状態にまで硬化させることによって、金属箔に絶
縁材料3を設けた樹脂付き金属箔4を形成し、この樹脂
付き金属箔を回路板2の表面に重ね合わせるように配置
する方法がある。
As shown in FIG. 3A, as a method of laminating a metal foil on the surface of a circuit board 2 with an insulating material 3 interposed therebetween, a resin film (base such as prepreg) cured to a B-stage state is used. There is a method of arranging a film without a material on the surface of the circuit board 2 and arranging the metal foil 4 on the surface of the resin film. Another method is to apply a resin varnish to one side of the metal foil 4, dry the resin varnish, and cure the resin to a B-stage state, thereby forming a metal foil with an insulating material 3 on the metal foil. 4 is formed, and this resin-attached metal foil is disposed so as to overlap the surface of the circuit board 2.

【0005】しかし上記ビルドアップ工法による多層積
層板の製造方法では、回路板2の表面に回路1が存在す
る部分と回路1が存在していない部分とがあって、回路
板2の表面が凹凸で不均一であるために、回路板2に金
属箔4を一体化する際の加熱加圧において、回路1が存
在していない部分(凹の部分)に絶縁材料3が多く流れ
ることになって、この部分における絶縁層8の厚みが大
きくなると共に回路1が存在している部分(凸の部分)
の絶縁層8の厚みが小さくなり、従って、絶縁層8の厚
みが不均一になって絶縁性能などの特性が不均一にな
り、信頼性の高い多層積層板を形成することができない
という問題があった。また絶縁材料3の流れが不十分な
場合は、回路1が存在していない部分にかすれやボイド
が発生する恐れがあった。
However, in the method of manufacturing a multilayer laminate by the above-described build-up method, there are portions where the circuit 1 exists on the surface of the circuit board 2 and portions where the circuit 1 does not exist. Therefore, when the metal foil 4 is integrated with the circuit board 2, a large amount of the insulating material 3 flows in a portion (concave portion) where the circuit 1 does not exist when the metal foil 4 is integrated with the circuit board 2. In this portion, the thickness of the insulating layer 8 is increased, and the portion where the circuit 1 is present (convex portion)
The thickness of the insulating layer 8 becomes small, the thickness of the insulating layer 8 becomes uneven, and the characteristics such as the insulating performance become uneven, so that a reliable multilayer laminate cannot be formed. there were. If the flow of the insulating material 3 is insufficient, there is a possibility that blurring or voids may occur in a portion where the circuit 1 does not exist.

【0006】そこで図4に示すように、二種類の絶縁材
料3a、3bを用いて多層積層板を製造することが行な
われている。この方法では、金属箔4の片面にCステー
ジ状態の絶縁材料3bを重ね合わせ、次にCステージ状
態の絶縁材料3bの表面にBステージ状態の絶縁材料3
aを重ね合わせて樹脂付き金属箔を形成し、次にBステ
ージ状態の絶縁材料3aを回路板2の表面に接触させて
樹脂付き金属箔を回路板2に重ね合わせ、この後、重ね
合わせたものを加熱加圧成形するようにしている。この
方法で形成された多層積層板は、Bステージ状態の絶縁
材料3aの硬化物とCステージ状態の絶縁材料3bの硬
化物とで絶縁層8が形成されている。またBステージ状
態の絶縁材料3aは上記加熱加圧成形により回路1と回
路1の間に一部が埋め込まれて厚みが変わるが、Cステ
ージ状態の絶縁材料3bは上記加熱加圧成形した後でも
厚みはほとんど変わらない。従って、この多層積層板
は、Cステージ状態の絶縁材料3bの硬化物で絶縁層8
の厚みを確保し、Bステージ状態の絶縁材料3aの硬化
物で回路板2の回路1への絶縁層8の埋め込み性(密着
性)を確保するように形成されており、Cステージ状態
の絶縁材料3bの硬化物で絶縁層8の厚みを確保するこ
とによって、図3(a)乃至(d)に示すものよりも絶
縁層8の厚みの不均一さを低減するようにしている。
Therefore, as shown in FIG. 4, a multilayer laminate is manufactured using two types of insulating materials 3a and 3b. In this method, the insulating material 3b in the C-stage is superimposed on one surface of the metal foil 4, and then the insulating material 3b in the B-stage is placed on the surface of the insulating material 3b in the C-stage.
a is superposed to form a metal foil with resin, and then the insulating material 3a in the B-stage state is brought into contact with the surface of the circuit board 2 to superimpose the metal foil with resin on the circuit board 2, and then superposed. The product is heated and pressed. In the multilayer laminate formed by this method, an insulating layer 8 is formed of a cured product of the insulating material 3a in the B-stage state and a cured product of the insulating material 3b in the C-stage state. Also, the insulating material 3a in the B-stage state is partially embedded between the circuits 1 by the above-mentioned heat and pressure molding to change its thickness, but the insulating material 3b in the C-stage state is formed even after the above-mentioned heat and pressure molding. The thickness is almost unchanged. Therefore, this multilayer laminate is made of a cured product of the insulating material 3b in the C-stage state, and
Is formed so as to secure the embedding (adhesion) of the insulating layer 8 into the circuit 1 of the circuit board 2 with the cured material of the insulating material 3a in the B-stage state. By securing the thickness of the insulating layer 8 with the cured product of the material 3b, the non-uniformity of the thickness of the insulating layer 8 is reduced as compared with those shown in FIGS.

【0007】しかし上記のように二種類の絶縁材料を用
いて多層積層板を製造する場合であっても、回路板2の
回路1と回路1の間に大きな回路不形成部分(回路が形
成されていない部分)10が存在すると、Bステージ状
態の絶縁材料3aが回路不形成部分10の隅々まで行き
渡りにくくなり、この結果、回路不形成部分10にボイ
ドが発生して多層積層板の信頼性が低くなるという問題
があった。しかもB、Cステージ状態の絶縁材料3aの
接着性や取扱性や成形性を最適にしようとすると、B、
Cステージ状態の絶縁材料3a、3bを形成するための
樹脂の種類がかなり制限されてしまい、絶縁層8の絶縁
特性などを自由に設定することが難しいという問題があ
った。
However, even when a multilayer laminate is manufactured using two kinds of insulating materials as described above, a large non-circuit-forming portion (a circuit is formed between the circuits 1 of the circuit board 2). The non-existing portion 10 makes it difficult for the insulating material 3a in the B-stage state to spread to every corner of the non-circuit-forming portion 10, and as a result, voids are generated in the non-circuit-forming portion 10 and the reliability of the multilayer laminate is increased. There was a problem that it became low. In addition, if it is attempted to optimize the adhesiveness, handleability, and moldability of the insulating material 3a in the B and C stage states, B, C
The type of resin for forming the insulating materials 3a and 3b in the C-stage state is considerably limited, and there is a problem that it is difficult to freely set the insulating characteristics and the like of the insulating layer 8.

【0008】[0008]

【発明が解決しようとする課題】そこで本発明は、ボイ
ドの発生がなくて信頼性の高い多層積層板を得ることが
でき、また絶縁層の絶縁特性などを自由に設定すること
ができる多層積層板の製造方法を提供することを目的と
するものである。
SUMMARY OF THE INVENTION Accordingly, the present invention is to provide a multilayer laminate having high reliability without voids and capable of freely setting the insulation characteristics of the insulating layer. It is an object of the present invention to provide a method for manufacturing a plate.

【0009】[0009]

【課題を解決するための手段】本発明の請求項1に記載
の発明は、表面に回路1を有する回路板2に絶縁材料3
を介して金属箔4を重ね合わせ、これを加熱加圧して回
路板2と金属箔4を一体に積層する多層積層板の製造方
法であって、回路板2の表面の回路1と回路1の間の直
径10mm以上の円が入るような大きさの部分に、回路
1と略同等の厚みを有する厚み補助部5を設けて成るこ
とを特徴とするものである。
According to the first aspect of the present invention, an insulating material is provided on a circuit board having a circuit on its surface.
A method for producing a multilayer laminate in which a metal foil 4 is overlapped via a substrate and heated and pressurized to laminate the circuit board 2 and the metal foil 4 integrally, wherein the circuit 1 on the surface of the circuit board 2 and the circuit 1 A thickness auxiliary portion 5 having a thickness substantially equal to that of the circuit 1 is provided in a portion having a size such that a circle having a diameter of 10 mm or more can be inserted therebetween.

【0010】また本発明の請求項2に記載の発明は、請
求項1の構成に加えて、回路板2の表面の回路1と回路
1の間の直径10mm以上の円が入るような大きさの部
分に、回路1と導通されてない無導通回路7を形成し、
この無導通回路7を厚み補助部5として形成することを
特徴とするものである。また本発明の請求項3に記載の
発明は、請求項1又は2の構成に加えて、回路板2の表
面の回路1と回路1の間の直径10mm以上の円が入る
ような大きさの部分に、樹脂材料を塗布して硬化させて
厚み補助部5を形成することを特徴とするものである。
According to a second aspect of the present invention, in addition to the configuration of the first aspect, the size of the circuit board 2 is such that a circle having a diameter of 10 mm or more between the circuits 1 on the surface of the circuit board 2 is inserted. A non-conducting circuit 7 not connected to the circuit 1 is formed in
The non-conducting circuit 7 is formed as a thickness auxiliary portion 5. According to a third aspect of the present invention, in addition to the configuration of the first or second aspect, the size of the circuit board 2 is such that a circle having a diameter of 10 mm or more between the circuits 1 on the surface of the circuit board 2 is inserted. The thickness assisting portion 5 is formed by applying a resin material to the portion and curing the resin material.

【0011】また本発明の請求項4に記載の発明は、請
求項3の構成に加えて、フィラーを含有させた樹脂材料
を用いることを特徴とするものである。
According to a fourth aspect of the present invention, in addition to the constitution of the third aspect, a resin material containing a filler is used.

【0012】[0012]

【発明の実施の形態】以下、本発明の実施の形態を説明
する。本発明で用いる回路板2は、例えば、両面銅張り
積層板の表面の金属箔(銅箔など)にエッチングなどの
回路形成処理を施して表面に回路1を形成すると共に回
路板2の表面において回路1と回路1の間(複数の回路
1で囲まれる部分)の回路不形成部10に厚み補助部5
を設けて形成されるものである。厚み補助部5は回路1
と略同等の厚みを有するものであり、図2に示すよう
に、直径10mm以上の円が入る大きさの回路不形成部
10の部分に厚み補助部5を形成するようにする。特
に、多層積層板に形成した後、打抜き等の加工により除
去される部分において、厚み補助部5を形成するのが好
ましく、このことで、厚み補助部5を多層積層板の加工
時に同時に除去することができ、加工性が向上するもの
である。また回路1の端部と厚み補助部5の端部の間の
寸法が10mm以下、より好ましくは5mm以下となる
ような大きさに厚み補助部5を形成するのが好ましい。
この回路1の端部と厚み補助部5の端部の間の寸法は小
さいほど好ましい。
Embodiments of the present invention will be described below. For example, the circuit board 2 used in the present invention forms a circuit 1 on the surface by performing a circuit forming process such as etching on a metal foil (copper foil or the like) on the surface of the double-sided copper-clad laminate, and forms the circuit 1 on the surface. The thickness assisting portion 5 is provided in the circuit non-forming portion 10 between the circuits 1 (a portion surrounded by the plurality of circuits 1).
Are formed. The thickness auxiliary part 5 is the circuit 1
As shown in FIG. 2, the thickness assisting portion 5 is formed in a portion of the circuit non-forming portion 10 having a size that can accommodate a circle having a diameter of 10 mm or more. In particular, it is preferable to form the thickness assisting portion 5 in a portion that is removed by a process such as punching after forming the multilayer laminate, whereby the thickness assisting portion 5 is removed at the same time as the multilayer laminate is processed. And workability is improved. In addition, it is preferable that the thickness assisting portion 5 is formed in such a size that the dimension between the end of the circuit 1 and the end of the thickness assisting portion 5 is 10 mm or less, more preferably 5 mm or less.
It is preferable that the dimension between the end of the circuit 1 and the end of the thickness assisting portion 5 is as small as possible.

【0013】尚、回路1と回路1の間は回路板2の種類
などによって異なるものであり、円の直径の上限は特に
設定されないが、通常、回路1と回路1の間は200m
m程度であるので、直径10〜200mmの円が入る大
きさの回路不形成部10の部分に厚み補助部5を形成す
る。もちろん直径200mm以上の円が入る大きさの回
路不形成部10の部分に厚み補助部5を形成してもよ
い。
The difference between the circuits 1 depends on the type of the circuit board 2 and the like. The upper limit of the diameter of the circle is not particularly set.
Since the thickness is about m, the thickness assisting portion 5 is formed in the portion of the circuit non-forming portion 10 having a size that can accommodate a circle having a diameter of 10 to 200 mm. Of course, the thickness assisting portion 5 may be formed in a portion of the circuit non-forming portion 10 having a size that can accommodate a circle having a diameter of 200 mm or more.

【0014】厚み補助部5を形成するにあたっては、二
つの方法を採用することができる。その一つは、回路板
2の回路形成工程において、回路1と導通していない無
導通回路部7を金属箔の一部から形成し、このベタ面の
金属箔の無導通回路部7を厚み補助部5として形成する
ようにする。一般的に回路板2の回路1の形成は次のよ
うにして行なわれる。まず両面銅張り積層板の表面の金
属箔にドライフィルム(エッチングレジストフィルム)
を配置すると共にドライフィルムの表面に所望の回路パ
ターンを有するマスクを配置する。次に、露光によりマ
スクで覆われていない部分のドライフィルムを硬化させ
る。次にマスクを除去した後、ドライフィルムのマスク
で覆われていた未硬化の部分を現像により除去して金属
箔を露出させる。この後、金属箔の露出した部分にエッ
チング液を供給するなどしてエッチング処理を施し、不
要部分の金属箔を除去する。このようにしてドライフィ
ルムで覆われてエッチング処理されなかった部分の金属
箔が回路1として回路板2の表面に残存するのである。
In forming the thickness assisting portion 5, two methods can be adopted. One of them is to form a non-conductive circuit portion 7 that is not electrically connected to the circuit 1 from a part of the metal foil in a circuit forming step of the circuit board 2, and to form the non-conductive circuit portion 7 of the solid metal foil with a thickness. The auxiliary part 5 is formed. Generally, the formation of the circuit 1 on the circuit board 2 is performed as follows. First, dry film (etching resist film) on metal foil on the surface of double-sided copper-clad laminate
And a mask having a desired circuit pattern on the surface of the dry film. Next, the portion of the dry film not covered with the mask is cured by exposure. Next, after removing the mask, the uncured portion covered with the mask of the dry film is removed by development to expose the metal foil. Thereafter, an etching solution is supplied to an exposed portion of the metal foil to perform an etching process, and an unnecessary portion of the metal foil is removed. In this way, the portion of the metal foil covered with the dry film and not subjected to the etching process remains on the surface of the circuit board 2 as the circuit 1.

【0015】そして本発明では、無導通回路部7として
形成したい部分の金属箔が残存するように、マスクの回
路パターンに無導通回路部パターンを追加して形成し、
このマスクを用いて回路1と無導通回路部7を形成する
ようにしている。そしてこのように回路1と無導通回路
部7を同時に形成するので、厚み補助部5を形成するた
めの工程を必要とせず、厚み補助部5を形成してもコス
トの上昇を抑えることができるものである。
In the present invention, a non-conductive circuit portion pattern is added to the circuit pattern of the mask so that a portion of the metal foil to be formed as the non-conductive circuit portion 7 remains,
The circuit 1 and the non-conductive circuit portion 7 are formed using this mask. Since the circuit 1 and the non-conductive circuit portion 7 are formed at the same time, a process for forming the thickness auxiliary portion 5 is not required, and even if the thickness auxiliary portion 5 is formed, an increase in cost can be suppressed. Things.

【0016】厚み補助部5を形成する他の方法として
は、上記と同様にして両面銅張り積層板に回路形成処理
を施して回路板2を形成した後、回路不形成部10の部
分に樹脂材料を塗布して乾燥硬化させるようにするもの
である。樹脂材料としては、エッチングレジスト材やソ
ルダーレジスト材、封止剤、穴埋め用樹脂などとして用
いられているものを使用することができる。また樹脂材
料の塗布方法としては、シルクスクリーン印刷などの印
刷を採用するのが簡単であり好ましい。また樹脂材料に
はフィラーを含有させておくのが好ましく、このことで
厚み補助部5の熱膨張率を小さくすることができ、多層
積層板の回路1や厚み補助部5の存在しない部分と厚み
補助部5が形成された部分との加熱時の熱膨張(熱変
形)の差を小さくすることができるものである。フィラ
ーとしてはアルミナ、酸化チタン、二酸化ケイ素(Si
2 )、BN(窒化硼素)、水酸化アルミニウムなどを
用いることができる。また上記のように打抜き等で除去
される部分に厚み補助部5を形成する場合には、銅粉や
鉄粉やカーボン粉末などの導電性材料を用いることも可
能である。
As another method of forming the thickness assisting portion 5, a circuit forming process is performed on the double-sided copper-clad laminate in the same manner as described above to form the circuit board 2, and then the resin on the portion of the circuit non-forming portion 10 is formed. The material is applied and dried and cured. As the resin material, those used as an etching resist material, a solder resist material, a sealant, a resin for filling holes, and the like can be used. As a method of applying the resin material, it is simple and preferable to employ printing such as silk screen printing. Further, it is preferable that the resin material contains a filler, so that the coefficient of thermal expansion of the thickness auxiliary portion 5 can be reduced, and the thickness of the portion of the multilayer laminated board where the circuit 1 or the thickness auxiliary portion 5 does not exist is different from the thickness. The difference in thermal expansion (thermal deformation) during heating from the portion where the auxiliary portion 5 is formed can be reduced. Alumina, titanium oxide, silicon dioxide (Si
O 2 ), BN (boron nitride), aluminum hydroxide and the like can be used. In the case where the auxiliary thickness portion 5 is formed in a portion to be removed by punching or the like as described above, it is also possible to use a conductive material such as copper powder, iron powder, or carbon powder.

【0017】そして上記のような回路板2を用いて多層
積層板を形成するにあたっては、次のようにして行な
う。まず図1(a)のように、回路板2の表面に絶縁材
料3を介して銅箔などの金属箔4を重ね合わせ、これを
加熱加圧して絶縁材料3の樹脂を硬化させると共に硬化
した絶縁材料3で回路板2と金属箔4を一体に接着す
る。この時、硬化した絶縁材料3が絶縁層8となる。ま
た回路板2の表面に絶縁材料3を介して金属箔4を重ね
合わせる方法としては、エポキシ樹脂などの樹脂を用い
て形成され、Bステージ状態にまで硬化させた樹脂フィ
ルム(プリプレグのような基材のないフィルム)を回路
板の表面に配置し、樹脂フィルムの表面に金属箔4を配
置する方法がある。
The formation of a multilayer laminate using the circuit board 2 as described above is performed as follows. First, as shown in FIG. 1A, a metal foil 4 such as a copper foil is overlapped on the surface of a circuit board 2 with an insulating material 3 interposed therebetween, and this is heated and pressed to harden and cure the resin of the insulating material 3. The circuit board 2 and the metal foil 4 are integrally bonded with the insulating material 3. At this time, the cured insulating material 3 becomes the insulating layer 8. As a method of laminating the metal foil 4 on the surface of the circuit board 2 with the insulating material 3 interposed therebetween, a resin film (based on a prepreg such as a prepreg) formed using a resin such as an epoxy resin and cured to a B-stage state is used. There is a method of arranging a film without material) on the surface of the circuit board and arranging the metal foil 4 on the surface of the resin film.

【0018】また他の方法としては、金属箔4の片面に
エポキシ樹脂などの樹脂を含む樹脂ワニスを塗布し、樹
脂ワニスを乾燥して樹脂をBステージ状態にまで硬化さ
せることによって、金属箔に絶縁材料を設けた樹脂付き
金属箔を形成し、この樹脂付き金属箔を回路板の表面に
重ね合わせるように配置する方法がある。また次に図1
(b)に示すように、金属箔4にエッチング等の回路形
成処理を施して絶縁層8の表面に回路9を形成する。次
に図1(c)に示すように、レーザ加工等により所定の
箇所にビアホール15を形成する。次に図1(d)に示
すように、ビアホール15の内面及び回路1、9の表面
にめっき層16を形成する。このようにしてビルドアッ
プ工法により多層積層板が製造されるのである。尚、図
1(d)の後、さらに多層化したい場合は、図1(a)
〜(d)の工程を繰り返し行なうようにする。
As another method, a resin varnish containing a resin such as an epoxy resin is applied to one surface of the metal foil 4, and the resin varnish is dried and the resin is cured to a B-stage state. There is a method in which a resin-coated metal foil provided with an insulating material is formed, and the resin-coated metal foil is disposed so as to overlap the surface of the circuit board. FIG. 1
As shown in FIG. 2B, a circuit 9 is formed on the surface of the insulating layer 8 by performing a circuit forming process such as etching on the metal foil 4. Next, as shown in FIG. 1C, via holes 15 are formed at predetermined locations by laser processing or the like. Next, as shown in FIG. 1D, a plating layer 16 is formed on the inner surface of the via hole 15 and the surfaces of the circuits 1 and 9. Thus, the multilayer laminate is manufactured by the build-up method. If it is desired to further increase the number of layers after FIG.
To (d) are repeated.

【0019】そして本発明では、回路板2の表面の回路
1と回路1の間の直径10mm以上の円が入る回路不形
成部分10に、回路1と略同等の厚みを有する厚み補助
部5を設けたので、回路板2に金属箔4を一体化する際
の加熱加圧において、厚み補助部5の存在によって回路
1が存在していない部分に絶縁材料3が多く流れないよ
うにすることができ、このために、絶縁材料3から形成
される絶縁層8の厚みが略均一になって絶縁性能などの
特性を略均一にすることができて、信頼性の高い多層積
層板を形成することができるものである。また厚み補助
部5を設けることによって、回路板2の回路1と回路1
の間に大きな空間(隙間)が存在しないようにすること
ができ、絶縁材料3が回路1と回路1の間あるいは回路
1と厚み補助部5の間の隅々まで行き渡ることになって
ボイドの発生がないようにすることができて、信頼性の
高い多層積層板を形成することができるものである。さ
らに絶縁材料3は任意のものを使用することができ、絶
縁材料3として各種のものを適宜選択して用いることに
よって、絶縁層8の絶縁特性などを自由に設計して設定
することができるものである。
In the present invention, the thickness assisting portion 5 having a thickness substantially equal to that of the circuit 1 is provided on the surface of the circuit board 2 on the surface of the circuit board 2 where the circuit 1 has a circle having a diameter of 10 mm or more. The thickness auxiliary portion 5 prevents the insulating material 3 from flowing much in a portion where the circuit 1 does not exist during the heating and pressing when the metal foil 4 is integrated with the circuit board 2. For this reason, the thickness of the insulating layer 8 formed from the insulating material 3 can be made substantially uniform, so that characteristics such as insulation performance can be made substantially uniform, and a highly reliable multilayer laminate can be formed. Can be done. Further, by providing the thickness assisting portion 5, the circuit 1 of the circuit board 2 and the circuit 1
A large space (gap) does not exist between them, and the insulating material 3 spreads to every corner between the circuit 1 and the circuit 1 or between the circuit 1 and the thickness auxiliary portion 5, so that the void It is possible to prevent the occurrence of such a problem and to form a highly reliable multilayer laminate. Further, any material can be used as the insulating material 3. By appropriately selecting and using various materials as the insulating material 3, the insulating characteristics of the insulating layer 8 can be freely designed and set. It is.

【0020】[0020]

【実施例】以下、本発明を実施例によって詳述する。 (実施例1)回路板2としては、厚みが20μmの銅箔
の回路1を有するもので、回路1と回路1の間の回路不
形成部10の大きさが50×50mmに形成されたもの
を用いた。この回路板2の回路不形成部10にレジスト
インキ(太洋インキ製造(株)のPSR−4000)を
45×45mmの大きさに印刷して塗布し、これを乾燥
させることによって、回路1と略同じ厚みを有する厚み
補助部5を形成した。次にこの回路板2に樹脂付き銅箔
を重ね合わせ、170℃で1〜1.5時間、30kg/
cm2 の圧力で加熱加圧し、真空成形により試験用の多
層積層板を形成した。樹脂付き銅箔としては樹脂(絶縁
材料3)の厚みが60μm、銅箔(金属箔4)の厚みが
18μmのものを用い、この樹脂としてはエポキシ樹脂
を用いた。
The present invention will be described below in detail with reference to examples. (Embodiment 1) A circuit board 2 having a copper foil circuit 1 having a thickness of 20 μm, in which the size of a circuit non-formed portion 10 between the circuits 1 is 50 × 50 mm Was used. A resist ink (PSR-4000 manufactured by Taiyo Ink Manufacturing Co., Ltd.) is printed and applied to the circuit non-formed portion 10 of the circuit board 2 to a size of 45 × 45 mm, and dried to obtain a circuit 1 and a circuit. The thickness auxiliary part 5 having substantially the same thickness was formed. Next, a resin-attached copper foil is superimposed on the circuit board 2 and is heated at 170 ° C. for 1 to 1.5 hours at 30 kg /
Heat and pressure were applied at a pressure of cm 2 , and a multilayer laminate for testing was formed by vacuum forming. As the resin-attached copper foil, a resin (insulating material 3) having a thickness of 60 μm and a copper foil (metal foil 4) having a thickness of 18 μm was used. As the resin, an epoxy resin was used.

【0021】(実施例2)回路板2としては、厚みが2
0μmの銅箔の回路1を有するもので、回路1と回路1
の間の回路不形成部10の大きさが50×50mmに形
成されたものを用いた。この回路板2の回路不形成部1
0には回路1の形成時と同時に形成された銅箔の厚み補
助部5(無導通回路部7)が設けられており、この厚み
補助部5は40×40mmの大きさに形成されている。
このような回路板2を用いて上記実施例1と同様にして
多層積層板を形成した。
(Embodiment 2) The circuit board 2 has a thickness of 2
It has a circuit 1 of a copper foil of 0 μm.
The size of the circuit non-formation portion 10 between 50 mm and 50 mm was used. Circuit non-forming portion 1 of this circuit board 2
0 is provided with a copper foil thickness auxiliary portion 5 (non-conductive circuit portion 7) formed simultaneously with the formation of the circuit 1, and this thickness auxiliary portion 5 is formed in a size of 40 × 40 mm. .
Using such a circuit board 2, a multilayer laminate was formed in the same manner as in Example 1 above.

【0022】(実施例3)回路板2としては、厚みが3
5μmの銅箔の回路1を有するもので、回路1と回路1
の間の回路不形成部10の大きさが50×50mmに形
成されたものを用いた。この回路板2の回路不形成部1
0に埋め込み用樹脂(山栄化学(株)製のPHP−90
0、エポキシ樹脂と無機フィラーを含有している)を4
5×45mmの大きさに印刷して塗布し、これを乾燥さ
せることによって、回路1と略同じ厚みを有する厚み補
助部5を形成した。このような回路板2を用いて上記実
施例1と同様にして多層積層板を形成した。
(Embodiment 3) The circuit board 2 has a thickness of 3
It has a circuit 1 of copper foil of 5 μm, and the circuit 1 and the circuit 1
The size of the circuit non-formation portion 10 between 50 mm and 50 mm was used. Circuit non-forming portion 1 of this circuit board 2
0 for embedding resin (PHP-90 manufactured by Yamaei Chemical Co., Ltd.)
0, containing epoxy resin and inorganic filler)
The thickness auxiliary portion 5 having substantially the same thickness as the circuit 1 was formed by printing and applying a size of 5 × 45 mm, followed by drying. Using such a circuit board 2, a multilayer laminate was formed in the same manner as in Example 1 above.

【0023】(比較例)回路板2としては、厚みが35
μmの銅箔の回路1を有するもので、回路1と回路1の
間の回路不形成部10の大きさが40×40mmに形成
されたものを用いた。このような回路板2を用いて上記
実施例1と同様にして多層積層板を形成した。
(Comparative Example) The circuit board 2 has a thickness of 35.
A circuit having a circuit 1 of a copper foil of μm and having a size of the circuit non-formed portion 10 between the circuits 1 of 40 × 40 mm was used. Using such a circuit board 2, a multilayer laminate was formed in the same manner as in Example 1 above.

【0024】上記のように作製される実施例1乃至3及
び比較例について、マイクロメータにより複数箇所の厚
みを測定し、その平均値、最大値、最小値を求めた。ま
た実施例1乃至3及び比較例について、ボイドの発生の
有無を観察した。尚、外観上、かすれや白化や膨れが発
生しているものにボイドが発生していると認定した。結
果を表1に示す。
With respect to the examples 1 to 3 and the comparative examples manufactured as described above, the thickness was measured at a plurality of places using a micrometer, and the average value, the maximum value, and the minimum value were obtained. In Examples 1 to 3 and Comparative Example, the occurrence of voids was observed. In addition, it was recognized that voids were generated in those in which fading, whitening and swelling had occurred in appearance. Table 1 shows the results.

【0025】[0025]

【表1】 [Table 1]

【0026】表1から判るように、実施例1乃至3では
厚みのばらつきが少なく、またボイドの発生も無かった
が、比較例では厚みの最大値と最小値の間に大きな差が
でき、またボイドも発生した。
As can be seen from Table 1, in Examples 1 to 3, there was little variation in thickness and there was no void, but in the comparative example, there was a large difference between the maximum value and the minimum value of the thickness. Voids also occurred.

【0027】[0027]

【発明の効果】上記のように本発明の請求項1に記載の
発明は、表面に回路を有する回路板に絶縁材料を介して
金属箔を重ね合わせ、これを加熱加圧して回路板と金属
箔を一体に積層する多層積層板の製造方法であって、回
路板の表面の回路と回路の間の直径10mm以上の円が
入るような大きさの部分に、回路と略同等の厚みを有す
る厚み補助部を設けたので、回路板に金属箔を一体化す
る際の加熱加圧において、厚み補助部の存在によって回
路が存在していない部分に絶縁材料が多く流れないよう
にすることができ、絶縁材料から形成される絶縁層の厚
みが略均一になって絶縁性能などの特性を略均一にする
ことができて、信頼性の高い多層積層板を形成すること
ができるものである。また厚み補助部を設けることによ
って、回路板の回路と回路の間に大きな空間が存在しな
いようにすることができ、絶縁材料が回路と回路の間あ
るいは回路と厚み補助部の間の隅々まで行き渡ることに
なってボイドの発生がないようにすることができて、信
頼性の高い多層積層板を形成することができるものであ
る。さらに絶縁材料は任意のものを使用することがで
き、絶縁材料として各種のものを適宜選択して用いるこ
とによって、絶縁特性などを自由に設定することができ
るものである。従って、この方法で形成される多層積層
板は、特性インピーダンスの安定性が必要な性能の高い
多層プリント配線板を製造するのに好適に用いることが
できるものである。
As described above, according to the first aspect of the present invention, a metal foil is superimposed on a circuit board having a circuit on the surface via an insulating material, and this is heated and pressed to form a circuit board and a metal. A method for manufacturing a multilayer laminate in which foils are integrally laminated, wherein a portion of a surface of a circuit board having a size such that a circle having a diameter of 10 mm or more between circuits is included, having a thickness substantially equal to that of the circuit. Since the thickness auxiliary portion is provided, it is possible to prevent a large amount of insulating material from flowing to a portion where a circuit does not exist due to the presence of the thickness auxiliary portion during heating and pressing when integrating the metal foil on the circuit board. In addition, the thickness of the insulating layer formed of an insulating material is substantially uniform, and characteristics such as insulating performance can be substantially uniform, so that a highly reliable multilayer laminate can be formed. In addition, by providing the thickness auxiliary portion, it is possible to prevent a large space from being present between the circuits on the circuit board, and the insulating material is provided between the circuit and the circuit or between the circuit and the thickness auxiliary portion. It is possible to prevent the occurrence of voids by spreading, and to form a highly reliable multilayer laminate. Further, an arbitrary insulating material can be used, and the insulating characteristics and the like can be freely set by appropriately selecting and using various insulating materials. Therefore, the multilayer laminate formed by this method can be suitably used for producing a multilayer printed wiring board having high performance which requires stability of characteristic impedance.

【0028】また本発明の請求項2に記載の発明は、回
路板の表面の回路と回路の間の直径10mm以上の円が
入るような大きさの部分に、回路と導通されてない無導
通回路部を形成し、この無導通回路部を厚み補助部とし
て形成したので、回路と無導通回路部を同時に形成する
ことができ、厚み補助部を形成するための工程を必要と
せず、厚み補助部を形成してもコストの上昇を抑えるこ
とができるものである。
According to a second aspect of the present invention, a non-conductive portion that is not electrically connected to a circuit is provided on a portion of a surface of a circuit board having a size such that a circle having a diameter of 10 mm or more is inserted between the circuits. Since the circuit portion is formed and the non-conductive circuit portion is formed as a thickness auxiliary portion, the circuit and the non-conductive circuit portion can be formed at the same time. Even if the portion is formed, an increase in cost can be suppressed.

【0029】また本発明の請求項3に記載の発明は、回
路板の表面の回路と回路の間の直径10mm以上の円が
入るような大きさの部分に、樹脂材料を塗布して硬化さ
せて厚み補助部を形成したので、厚み補助部を簡単に形
成することができるものである。また本発明の請求項4
に記載の発明は、フィラーを含有させた樹脂材料を用い
たので、厚み補助部の熱膨張率を小さくすることがで
き、回路や厚み補助部の存在しない部分と厚み補助部が
形成された部分との加熱時の熱膨張の差を小さくするこ
とができ、耐熱性の高い多層積層板を形成することがで
きるものである。
According to a third aspect of the present invention, a resin material is applied to a portion of a surface of a circuit board having a size such that a circle having a diameter of 10 mm or more between the circuits is formed and cured. Since the thickness assisting portion is formed by using the thickness assisting portion, the thickness assisting portion can be easily formed. Claim 4 of the present invention
The invention described in (1) uses a resin material containing a filler, so that the coefficient of thermal expansion of the thickness auxiliary portion can be reduced, and the portion where the circuit or the thickness auxiliary portion does not exist and the portion where the thickness auxiliary portion is formed And a difference in thermal expansion upon heating can be reduced, and a multilayer laminate having high heat resistance can be formed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態の一例を示し、(a)乃至
(d)は断面図である。
FIG. 1 illustrates an example of an embodiment of the present invention, and (a) to (d) are cross-sectional views.

【図2】同上の回路板を示す平面図である。FIG. 2 is a plan view showing the circuit board according to the first embodiment.

【図3】従来例を示し、(a)乃至(d)は断面図であ
る。
FIG. 3 shows a conventional example, and (a) to (d) are cross-sectional views.

【図4】他の従来例を示す断面図である。FIG. 4 is a sectional view showing another conventional example.

【符号の説明】[Explanation of symbols]

1 回路 2 回路板 3 絶縁材料 4 金属箔 5 厚み補助部 DESCRIPTION OF SYMBOLS 1 Circuit 2 Circuit board 3 Insulating material 4 Metal foil 5 Thickness auxiliary part

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 表面に回路を有する回路板に絶縁材料を
介して金属箔を重ね合わせ、これを加熱加圧して回路板
と金属箔を一体に積層する多層積層板の製造方法であっ
て、回路板の表面の回路と回路の間の直径10mm以上
の円が入るような大きさの部分に、回路と略同等の厚み
を有する厚み補助部を設けて成ることを特徴とする多層
積層板の製造方法。
1. A method for producing a multilayer laminate, comprising: laminating a metal foil on a circuit board having a circuit on the surface via an insulating material, heating and pressing the metal foil, and laminating the circuit board and the metal foil integrally. A multilayer laminated board characterized in that a thickness auxiliary portion having a thickness substantially equal to that of a circuit is provided in a portion of a surface of the circuit board having a size such that a circle having a diameter of 10 mm or more between the circuits is inserted. Production method.
【請求項2】 回路板の表面の回路と回路の間の直径1
0mm以上の円が入るような大きさの部分に、回路と導
通されてない無導通回路部を形成し、この無導通回路部
を厚み補助部として形成することを特徴とする請求項1
に記載の多層積層板の製造方法。
2. A circuit having a diameter of 1 between circuits on the surface of the circuit board.
2. A non-conductive circuit portion which is not electrically connected to a circuit is formed in a portion having a size such that a circle of 0 mm or more is inserted therein, and the non-conductive circuit portion is formed as a thickness auxiliary portion.
3. The method for producing a multilayer laminate according to item 1.
【請求項3】 回路板の表面の回路と回路の間の直径1
0mm以上の円が入るような大きさの部分に、樹脂材料
を塗布して硬化させて厚み補助部を形成することを特徴
とする請求項1又は2に記載の多層積層板の製造方法。
3. A circuit having a diameter of 1 between circuits on the surface of the circuit board.
The method for producing a multilayer laminate according to claim 1 or 2, wherein a resin material is applied to a portion having a size such that a circle of 0 mm or more is formed and cured to form a thickness auxiliary portion.
【請求項4】 フィラーを含有させた樹脂材料を用いる
ことを特徴とする請求項3に記載の多層積層板の製造方
法。
4. The method for producing a multilayer laminate according to claim 3, wherein a resin material containing a filler is used.
JP8000698A 1998-03-26 1998-03-26 Manufacture of multilayer-laminated board Withdrawn JPH11274720A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8000698A JPH11274720A (en) 1998-03-26 1998-03-26 Manufacture of multilayer-laminated board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8000698A JPH11274720A (en) 1998-03-26 1998-03-26 Manufacture of multilayer-laminated board

Publications (1)

Publication Number Publication Date
JPH11274720A true JPH11274720A (en) 1999-10-08

Family

ID=13706254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8000698A Withdrawn JPH11274720A (en) 1998-03-26 1998-03-26 Manufacture of multilayer-laminated board

Country Status (1)

Country Link
JP (1) JPH11274720A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308530A (en) * 2000-04-24 2001-11-02 Ibiden Co Ltd Laminated wiring board and its manufacturing method
JP2002271040A (en) * 2001-03-07 2002-09-20 Ibiden Co Ltd Method for manufacturing multilayer printed wiring board
US7095623B2 (en) 2002-05-27 2006-08-22 Hitachi, Ltd. Multilayer circuit board, process of manufacturing same, board for multilayer circuitry, and electronic apparatus
JP5678657B2 (en) * 2008-03-25 2015-03-04 味の素株式会社 Insulating resin sheet and method for producing multilayer printed wiring board using the insulating resin sheet

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001308530A (en) * 2000-04-24 2001-11-02 Ibiden Co Ltd Laminated wiring board and its manufacturing method
JP2002271040A (en) * 2001-03-07 2002-09-20 Ibiden Co Ltd Method for manufacturing multilayer printed wiring board
US7095623B2 (en) 2002-05-27 2006-08-22 Hitachi, Ltd. Multilayer circuit board, process of manufacturing same, board for multilayer circuitry, and electronic apparatus
US7170012B2 (en) 2002-05-27 2007-01-30 Hitachi, Ltd. Multilayer circuit board, process of manufacturing same, board for multilayer circuitry, and electronic apparatus
JP5678657B2 (en) * 2008-03-25 2015-03-04 味の素株式会社 Insulating resin sheet and method for producing multilayer printed wiring board using the insulating resin sheet

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Effective date: 20050607