JPH10152372A - Barium titanate-based semiconductor porcelain and its production - Google Patents
Barium titanate-based semiconductor porcelain and its productionInfo
- Publication number
- JPH10152372A JPH10152372A JP8311650A JP31165096A JPH10152372A JP H10152372 A JPH10152372 A JP H10152372A JP 8311650 A JP8311650 A JP 8311650A JP 31165096 A JP31165096 A JP 31165096A JP H10152372 A JPH10152372 A JP H10152372A
- Authority
- JP
- Japan
- Prior art keywords
- barium titanate
- based semiconductor
- average grain
- grain diameter
- crystal grains
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Thermistors And Varistors (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は特定の温度で抵抗値
が急激に増大するチタン酸バリウム系半導体磁器及びそ
の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barium titanate-based semiconductor porcelain whose resistance value sharply increases at a specific temperature and a method of manufacturing the same.
【0002】[0002]
【従来の技術】チタン酸バリウムに希土類元素を微量添
加すると半導体化し、そのキュリー点付近の温度で正の
抵抗温度特性(Positive Temperature Coefficient:P
TC特性)を示すことは従来より広く知られている。そ
のPTC特性を利用して、過電流保護用素子、温度制御
用素子、モータ起動用素子、ヒータ用といったさまざま
な用途に応用されてきている。2. Description of the Related Art Barium titanate is converted into a semiconductor by adding a small amount of a rare earth element, and has a positive resistance temperature coefficient (Positive Temperature Coefficient: P) near its Curie point.
(TC characteristic) has been widely known. Utilizing the PTC characteristics, it has been applied to various uses such as an overcurrent protection element, a temperature control element, a motor starting element, and a heater.
【0003】ところで、チタン酸バリウム系半導体磁器
の焼結体の結晶粒子はその特性面から均一であることが
望ましいが、実際、一般的な結晶粒子は不均一である場
合が多く、組成面あるいはプロセス面から均一な結晶粒
子を求めての開発・改良を行っている。It is desirable that the crystal grains of the sintered body of the barium titanate-based semiconductor porcelain be uniform in view of its characteristics. However, in general, general crystal grains are often inhomogeneous, We are developing and improving uniform crystal grains from the process aspect.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、結晶粒
子径が大きくなると抵抗温度係数が劣化し、破壊電圧が
低下する傾向があり、一方結晶粒子径が小さくなると抵
抗値が上昇し絶縁体化する傾向がある。従って抵抗値の
上昇を抑え、破壊電圧を向上させることは困難であっ
た。However, as the crystal grain size increases, the temperature coefficient of resistance tends to deteriorate, and the breakdown voltage tends to decrease. On the other hand, when the crystal grain size decreases, the resistance increases and the insulator tends to be formed. There is. Therefore, it has been difficult to suppress an increase in the resistance value and improve the breakdown voltage.
【0005】本発明は上記問題を解決するために、平均
粒子径の大きな結晶粒子(例えば20〜30μm)と、
小さな結晶粒子(例えば1.0〜5.0μm)の2つの
異なる結晶粒子径を形成させることにより、正の抵抗温
度係数を示すチタン酸バリウム系半導体磁器の特性を向
上させることを目的とするものである。[0005] In order to solve the above-mentioned problems, the present invention provides crystal grains having a large average particle diameter (for example, 20 to 30 µm).
An object of the present invention is to improve the characteristics of barium titanate-based semiconductor ceramics exhibiting a positive temperature coefficient of resistance by forming two different crystal particle diameters of small crystal particles (for example, 1.0 to 5.0 μm). It is.
【0006】[0006]
【課題を解決するための手段】上記課題を解決するため
に、本発明の請求項1の発明は、小さな平均粒子径を与
える組成系として、半導体化元素としてYを含むチタン
酸バリウムにBi2O3を添加してなる系と、大きな平均
粒子径を与える組成系として、半導体化元素としてYを
含むチタン酸バリウムにLi2CO3を添加してなる系と
が混在する組成物を形成させるものであって、抵抗値の
上昇を抑え、かつ破壊電圧の向上するチタン酸バリウム
系半導体磁器を得ることができる。In order to solve the above problems SUMMARY OF THE INVENTION The invention of Claim 1 of the present invention, a composition system to provide a small average particle diameter, Bi 2 barium titanate containing Y as a semiconductive dopant A composition in which a system obtained by adding O 3 and a system obtained by adding Li 2 CO 3 to barium titanate containing Y as a semiconductor element as a composition system giving a large average particle size is formed. Thus, a barium titanate-based semiconductor porcelain can be obtained which suppresses a rise in resistance value and improves a breakdown voltage.
【0007】[0007]
【発明の実施の形態】本発明の請求項1の発明は、小さ
な平均粒子径を与える組成系として、半導体化元素とし
てYを含むチタン酸バリウムにBi2O3を添加してなる
系と、大きな平均粒子径を与える組成系として、半導体
化元素としてYを含むチタン酸バリウムにLi2CO3を
添加してなる系とが混在する組成物を形成させるもので
あって、抵抗値の上昇を抑え、かつ破壊電圧の向上する
チタン酸バリウム系半導体磁器を得ることができる。BEST MODE FOR CARRYING OUT THE INVENTION The invention according to claim 1 of the present invention provides a composition system which gives a small average particle size, a system obtained by adding Bi 2 O 3 to barium titanate containing Y as a semiconducting element, As a composition system giving a large average particle diameter, a composition in which a system obtained by adding Li 2 CO 3 to barium titanate containing Y as a semiconducting element is formed to form a mixed composition, and the resistance value increases. It is possible to obtain a barium titanate-based semiconductor porcelain which suppresses and improves the breakdown voltage.
【0008】なお、大きな結晶粒子の平均粒子径は20
〜30μmで小さな結晶粒子の平均粒子径は1.0〜
5.0μmであることが、特性の向上のために望まし
い。その理由は以下に示す通りである。 (1)大きな結晶粒子径の平均粒子径が30μmより大
きくなると、大きな粒子同士の接触が多くなり、破壊電
圧及び抵抗値の低下が見られる。 (2)小さな結晶粒子径の平均粒子径が1.0μmより
小さくなると粒子が明確な粒子形態を示さなくなり、そ
れに伴い抵抗値が上昇し絶縁体化する傾向が認められ
る。The average particle size of the large crystal particles is 20
The average particle size of the small crystal particles is 1.0 to 30 μm.
5.0 μm is desirable for improving the characteristics. The reason is as follows. (1) When the average particle diameter of the large crystal particle diameter is larger than 30 μm, the contact between the large particles increases, and the breakdown voltage and the resistance value decrease. (2) When the average particle diameter of the small crystal particle diameter is smaller than 1.0 μm, the particles do not show a clear particle morphology, and accordingly, the resistance value increases and the tendency to form an insulator is recognized.
【0009】また請求項2の製造方法においては、半導
体化元素としてYを含むチタン酸バリウムにBi2O3を
添加したものと、半導体化元素としてYを含むチタン酸
バリウムにLi2CO3を添加したものの少なくとも一方
を仮焼し、その後混合して本焼成するものであり、大小
2つの異なる粒子径をもつ焼結体を得ることができ、そ
の結果として抵抗値の上昇を抑え、なおかつ破壊電圧の
向上が達成される。Further, in the manufacturing method of the present invention, Bi 2 O 3 is added to barium titanate containing Y as a semiconducting element, and Li 2 CO 3 is added to barium titanate containing Y as a semiconducting element. At least one of the added materials is calcined, then mixed and subjected to main firing, so that a sintered body having two different particle sizes, large and small, can be obtained. An improvement in voltage is achieved.
【0010】[0010]
【実施例】以下、本発明の実施例を説明する。Embodiments of the present invention will be described below.
【0011】(実施例1)炭酸バリウム(BaCO3)
1.0mol、酸化チタン(TiO2) 1.01m
ol、イットリア(Y2O3) 0.0024mol、二
酸化ケイ素(SiO 2) 0.024mol、硝酸マン
ガン(Mn(NO3)2) 0.0003mol、酸化ビ
スマス(Bi2O3) 0.0003〜0.001mol
を秤量し、ボールミルにより20時間湿式混合する。次
にこれらを乾燥し仮成形した後、大気中1100℃で2
時間仮焼する(以下これをBi−仮焼粉と記す。)。Example 1 Barium carbonate (BaCO)Three)
1.0 mol, titanium oxide (TiOTwo) 1.01m
ol, yttria (YTwoOThree) 0.0024 mol, 2
Silicon oxide (SiO Two) 0.024 mol, man nitrate
Gun (Mn (NOThree)Two) 0.0003mol, Bi oxide
Smas (BiTwoOThree) 0.0003-0.001mol
Are weighed and wet-mixed by a ball mill for 20 hours. Next
These are dried and temporarily molded, and then dried at 1100 ° C in air for 2 hours.
Calcination for a period of time (hereinafter referred to as Bi-calcination powder).
【0012】一方、BaCO3 1.0mol、TiO2
1.01mol、Y2O3 0.0024mol、Si
O2 0.024mol、Mn(NO3)2 0.000
3mol、Li2CO3 0.001〜0.003mol
を秤量し、Bi−仮焼粉と同様に混合・乾燥・仮焼する
(以下これをLi−仮焼粉と記す。)。On the other hand, 1.0 mol of BaCO 3 and TiO 2
1.01mol, Y 2 O 3 0.0024mol, Si
O 2 0.024 mol, Mn (NO 3 ) 2 0.000
3 mol, Li 2 CO 3 0.001 to 0.003 mol
Are weighed and mixed, dried and calcined in the same manner as Bi-calcined powder (hereinafter referred to as Li-calcined powder).
【0013】次に、上記で得られたBi−仮焼粉とLi
−仮焼粉を同時にボールミルにより20時間湿式混合・
粉砕した後、乾燥・造粒・成形する。さらにこの成形体
を大気中1350℃で1時間焼成しチタン酸バリウム系
半導体磁器を得る。この焼結体にニッケルメッキ処理を
した後、銀ペーストを550℃にて10分間焼きつけ電
極とした。Next, the Bi-calcined powder obtained above and Li
-Simultaneous wet mixing of calcined powder by ball mill for 20 hours
After pulverizing, drying, granulating and molding. Further, this compact is fired in the atmosphere at 1350 ° C. for 1 hour to obtain a barium titanate-based semiconductor porcelain. After this sintered body was subjected to nickel plating, a silver paste was baked at 550 ° C. for 10 minutes to form an electrode.
【0014】このようにして得られたチタン酸バリウム
系半導体磁器についての組成を(表1)1〜8に、又、
比抵抗(ρ25)、破壊電圧、及び抵抗温度係数(α)を
測定した結果を(表2)1〜8に示した。尚(表1)に
おいて、BaCO3、TiO2、Y2O3、SiO2、Mn
(NO3)2を含む組成を基本組成として、この基本組成
にBiを添加した系を組成系1、Liを添加した系を組
成系2としてそれぞれの添加量を示した。The compositions of the barium titanate-based semiconductor ceramic thus obtained are shown in Tables 1 to 8 below.
The results of measuring the specific resistance (ρ 25 ), the breakdown voltage, and the temperature coefficient of resistance (α) are shown in Tables 1 to 8. In Table 1 below, BaCO 3 , TiO 2 , Y 2 O 3 , SiO 2 , Mn
The composition containing (NO 3 ) 2 was defined as the basic composition, and the system was prepared by adding Bi to the basic composition, and the system was prepared by adding Li to the system 2.
【0015】[0015]
【表1】 [Table 1]
【0016】[0016]
【表2】 [Table 2]
【0017】(実施例2)BaCO3 1.0mol、
TiO2 1.01mol、Y2O3 0.0024mo
l、SiO2 0.024mol、Mn(NO3)2
0.0003mol、Li2CO3 0.001〜0.0
03molを秤量し、さらに、(実施例1)で得られた
Bi−仮焼粉を添加し、ボールミルにより20時間湿式
混合する。以下(実施例1)と同様な方法で試料を作製
する。このようにして得られたチタン酸バリウム系半導
体磁器について、組成を(表1)の試料番号9〜16、
特性を測定したものを(表2)の試料番号9〜16に示
した。Example 2 1.0 mol of BaCO 3 ,
TiO 2 1.01mol, Y 2 O 3 0.0024mo
1, 0.024 mol of SiO 2 , Mn (NO 3 ) 2
0.0003mol, Li 2 CO 3 0.001~0.0
03 mol is weighed, and the Bi-calcined powder obtained in (Example 1) is further added thereto, and wet-mixed by a ball mill for 20 hours. A sample is prepared in the same manner as described below (Example 1). With respect to the barium titanate-based semiconductor porcelain thus obtained, the composition was set to the sample numbers 9 to 16 in (Table 1),
What measured the characteristic was shown to the sample numbers 9-16 of (Table 2).
【0018】(比較例1)比較例として上記実施例にお
けるBi2O3の添加量を0.0003mol以下と0.
001mol以上、又、Li2CO3の添加量を0.00
1mol以下と0.003mol以上とした試料を(実
施例1)と同様に作製し、その特性を評価する。(表
1)の試料番号17〜20にその組成を、(表2)の試
料番号17〜20に特性値を示した。Comparative Example 1 As a comparative example, the additive amount of Bi 2 O 3 in the above embodiment was 0.0003 mol or less and 0.1%.
001 mol or more, and the added amount of Li 2 CO 3 is 0.00
Samples of 1 mol or less and 0.003 mol or more were prepared in the same manner as in (Example 1), and the characteristics were evaluated. The composition was shown in Sample Nos. 17 to 20 of (Table 1), and the characteristic values were shown in Sample Nos. 17 to 20 of (Table 2).
【0019】(比較例2)(表1)の試料番号21〜2
4の組成になるようにBi2O3及びLi2CO3を基本組
成に対して、はじめから添加し、ボールミルにより20
時間湿式混合する。その後の試料作製工程は(実施例
1)と同様にする。この様にして得られた素子の特性を
測定したものを(表2)の試料番号21〜24に示し
た。(Comparative Example 2) Sample Nos. 21 and 2 in (Table 1)
Bi 2 O 3 and Li 2 CO 3 were added from the beginning to the basic composition so that the composition became 4.
Wet mix for hours. Subsequent sample preparation steps are the same as in (Example 1). The characteristics of the device thus obtained were measured, and the results are shown in Sample Nos. 21 to 24 of (Table 2).
【0020】以下、上記実施例及び比較例により本発明
を説明する。 (1)実施例1(試料番号1〜8)と比較例1(試料番
号17〜20)より、Bi2O3及びLi2CO3の添加量
がそれぞれ0.0003〜0.001mol、0.00
1〜0.003mol以外の範囲であると粒子径の差が
なく、比抵抗が増加し破壊電圧が150V前後と低く特
性の向上が認められなかった。 (2)実施例1及び実施例2(試料番号1〜16)と比
較例2(試料番号21〜24よりBi2O3を含む組成系
(表1)の組成系1とLi2CO3を含む組成系(表1)
の組成系2をそれぞれ別々に混合した後、少なくとも一
方を仮焼した方が平均粒子径が大きいもの(20〜30
μm)と小さいもの(1.0〜5.0μm)が形成でき
ることにより特性の向上が達成される。尚(表1)の試
料番号9〜16の実施例2において組成系1が仮焼無し
で組成系2が仮焼有の場合についても同様に特性の向上
が認められた。又、Li2CO3の他酸化リチウムLi2
Oを用いた場合でも本発明と同様の効果が得られた。Hereinafter, the present invention will be described with reference to the above Examples and Comparative Examples. (1) According to Example 1 (Sample Nos. 1 to 8) and Comparative Example 1 (Sample Nos. 17 to 20), the added amounts of Bi 2 O 3 and Li 2 CO 3 were 0.0003 to 0.001 mol, respectively. 00
When the amount is outside the range of 1 to 0.003 mol, there is no difference in particle diameter, the specific resistance increases, the breakdown voltage is as low as about 150 V, and no improvement in characteristics is observed. (2) Example 1 and Example 2 (Sample Nos. 1 to 16) and Comparative Example 2 (Sample Nos. 21 to 24, composition system 1 containing Bi 2 O 3 (Table 1) and Li 2 CO 3 were used. Composition system (Table 1)
After each of the composition systems 2 is separately mixed, at least one of them is calcined to have a larger average particle diameter (20 to 30).
μm) and a smaller one (1.0 to 5.0 μm) can be formed, thereby improving the characteristics. In addition, in Examples 2 of Sample Nos. 9 to 16 in (Table 1), similarly, in the case where the composition system 1 was not calcined and the composition system 2 was calcined, the improvement of the characteristics was similarly observed. Li 2 CO 3 and lithium oxide Li 2
Even when O was used, the same effect as the present invention was obtained.
【0021】このように、半導体化元素としてYを含む
チタン酸バリウムに0.0003〜0.001molの
Bi2O3を添加してなる組成物と、半導体化元素として
Yを含むチタン酸バリウムに0.001〜0.003m
olのLiを添加してなる組成物を、それぞれ別々に混
合し少なくとも一方を仮焼した後両者を同時に混合し、
最終焼結させた場合、平均粒子径が大きな粒子(20〜
30μm)と小さな粒子(1.0〜5.0μm)が形成
されることにより、抵抗値の上昇が抑えられた。破壊電
圧の高いチタン酸バリウム系半導体磁器を得ることがで
きる。As described above, a composition obtained by adding 0.0003 to 0.001 mol of Bi 2 O 3 to barium titanate containing Y as a semiconducting element, and a composition obtained by adding barium titanate containing Y as a semiconducting element, 0.001-0.003m
ol of the composition obtained by adding Li, and separately mixing and calcining at least one, and then simultaneously mixing both,
In the case of final sintering, particles having a large average particle diameter (20 to
30 μm) and small particles (1.0 to 5.0 μm) were formed, thereby suppressing an increase in resistance value. A barium titanate-based semiconductor porcelain having a high breakdown voltage can be obtained.
【0022】[0022]
【発明の効果】以上のごとく、本発明によればチタン酸
バリウム系半導体磁器材料において、平均粒子径の大き
な結晶粒子(20〜30μm)と小さな結晶粒子(1.
0〜5.0μm)の2つの異なる結晶粒子を有する焼結
体を形成させることにより、抵抗値の上昇が抑えられ、
さらに破壊電圧が向上した正の抵抗温度係数を示すチタ
ン酸バリウム系半導体磁器を得ることができる。As described above, according to the present invention, in the barium titanate-based semiconductor ceramic material, crystal grains having a large average particle diameter (20 to 30 μm) and small crystal grains (1.
By forming a sintered body having two different crystal grains (0 to 5.0 μm), an increase in resistance is suppressed,
Further, a barium titanate-based semiconductor ceramic exhibiting a positive temperature coefficient of resistance with improved breakdown voltage can be obtained.
Claims (2)
リウムに0.0003〜0.001molのBi2O3を
添加してなる平均粒子径が1.0〜5.0μmのチタン
酸バリウム系半導体磁器材料よりなる結晶粒子と、半導
体化元素としてYを含むチタン酸バリウムに0.001
〜0.003molのLi2CO3を添加してなる平均粒
子径が20〜30μmのチタン酸バリウム系半導体磁器
材料よりなる結晶粒子が混在したチタン酸バリウム系半
導体磁器。1. A barium titanate-based semiconductor having an average particle diameter of 1.0 to 5.0 μm obtained by adding 0.0003 to 0.001 mol of Bi 2 O 3 to barium titanate containing Y as a semiconductor element. Crystal grains made of a porcelain material and barium titanate containing Y as a semiconducting element
Li 2 CO 3 added to the crystal grains having an average particle size of from barium titanate-based semiconductor ceramic material 20~30μm comprising the barium titanate-based semiconductor ceramic mix of ~0.003Mol.
リウムに0.0003〜0.001molのBi2O3を
添加してなる組成物と、半導体化元素としてYを含むチ
タン酸バリウムに0.001〜0.003molのLi
2CO3を添加してなる組成物の少なくとも一方を仮焼し
た後、両者を混合し最終焼結させるチタン酸バリウム系
半導体磁器の製造方法。2. A composition comprising 0.0003 to 0.001 mol of Bi 2 O 3 added to barium titanate containing Y as a semiconducting element, and 0.1% to 0.2 wt% of barium titanate containing Y as a semiconducting element. 001 to 0.003 mol of Li
2 A method for producing a barium titanate-based semiconductor porcelain, in which at least one of the compositions to which CO 3 is added is calcined, then the two are mixed and finally sintered.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8311650A JPH10152372A (en) | 1996-11-22 | 1996-11-22 | Barium titanate-based semiconductor porcelain and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8311650A JPH10152372A (en) | 1996-11-22 | 1996-11-22 | Barium titanate-based semiconductor porcelain and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10152372A true JPH10152372A (en) | 1998-06-09 |
Family
ID=18019843
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8311650A Pending JPH10152372A (en) | 1996-11-22 | 1996-11-22 | Barium titanate-based semiconductor porcelain and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10152372A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110210815A1 (en) * | 2008-12-12 | 2011-09-01 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US20110215895A1 (en) * | 2008-12-12 | 2011-09-08 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US20110215894A1 (en) * | 2008-12-12 | 2011-09-08 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US8350662B2 (en) | 2008-12-12 | 2013-01-08 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
-
1996
- 1996-11-22 JP JP8311650A patent/JPH10152372A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110210815A1 (en) * | 2008-12-12 | 2011-09-01 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US20110215895A1 (en) * | 2008-12-12 | 2011-09-08 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US20110215894A1 (en) * | 2008-12-12 | 2011-09-08 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US8228161B2 (en) * | 2008-12-12 | 2012-07-24 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US8284013B2 (en) * | 2008-12-12 | 2012-10-09 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US8289125B2 (en) | 2008-12-12 | 2012-10-16 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
US8350662B2 (en) | 2008-12-12 | 2013-01-08 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3039513B2 (en) | Barium titanate powder, semiconductor ceramic, and semiconductor ceramic element | |
JPH10152372A (en) | Barium titanate-based semiconductor porcelain and its production | |
KR100312605B1 (en) | Semiconducting ceramic and semiconducting ceramic electronic element | |
JP3166787B2 (en) | Barium titanate-based semiconductor porcelain composition | |
JP3111630B2 (en) | Barium titanate-based semiconductor porcelain and method of manufacturing the same | |
WO2004110952A1 (en) | Barium titanate based semiconductor porcelain composition | |
JP3598177B2 (en) | Voltage non-linear resistor porcelain | |
KR20000068889A (en) | Barium titanate-base semiconductor ceramic | |
JPH10218660A (en) | Barium titanate/based semiconductor porcelain material and production of semiconductor porcelain by using the same | |
JPS5916303A (en) | Method of producing semiconductor porcelain material | |
JPH07335404A (en) | Manufacture of positive temperature coefficient thermistor | |
JP2000003803A (en) | Positive temperature coefficient thermistor and production method thereof | |
JPH05234711A (en) | Manufacture of barium titanate semiconductor ceramic | |
JPH0383855A (en) | Production of barium titanate-based semiconductor porcelain | |
JPH10212161A (en) | Thermistor material having positive characteristic and its production | |
JP2000286104A (en) | Manufacture of positive temperature coefficient thermistor | |
JPH1092605A (en) | Manufacture of positive temperature thermistor | |
JP4800956B2 (en) | Barium titanate semiconductor porcelain composition | |
JPH03103357A (en) | Preparation of ptc ceramic | |
JPH08213206A (en) | Positive characteristic thermistor and manufacture thereof | |
JPH1070009A (en) | Positive temperature coefficient thermistor and manufacture thereof | |
JPH05198408A (en) | Manufacture of semiconductor ceramic varistor | |
JPH09330805A (en) | Positive characteristic thermistor and manufacture thereof | |
JPH1070008A (en) | Manufacture of positive temperature coefficient thermistor | |
JPH11116326A (en) | Thermistor with positive characteristic and its production |