JPH0933927A - Substrate for liquid crystal and method for washing after rubbing treatment of substrate for color filter - Google Patents
Substrate for liquid crystal and method for washing after rubbing treatment of substrate for color filterInfo
- Publication number
- JPH0933927A JPH0933927A JP20669295A JP20669295A JPH0933927A JP H0933927 A JPH0933927 A JP H0933927A JP 20669295 A JP20669295 A JP 20669295A JP 20669295 A JP20669295 A JP 20669295A JP H0933927 A JPH0933927 A JP H0933927A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning
- washing
- liquid crystal
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、液晶用基板及びカ
ラーフィルター用基板のラビング処理後の洗浄方法、詳
しくは液晶用表示基板の製造工程における表示基板側及
びカラーフィルター側基板の配向膜形成プロセスにおい
て、これら基板の表面にポリイミドなどの高分子膜を塗
布し、その膜面をラビング処理した後に、この基板表面
を洗浄する方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning method for rubbing a liquid crystal substrate and a color filter substrate, and more specifically, a process for forming an alignment film on a display substrate side and a color filter side substrate in a manufacturing process of a liquid crystal display substrate. In the above, the present invention relates to a method of coating a polymer film such as polyimide on the surface of these substrates, rubbing the film surface, and then cleaning the surface of the substrate.
【0002】[0002]
【従来の技術】液晶用表示基板のラビング処理後の洗浄
方法としては、例えば特開平7−64091のように洗
浄開始前に純水を基板表面全体に層状に流動化させ、全
体を覆うようにして処理を行い、洗浄むらを抑御する方
法が存在している。2. Description of the Related Art As a cleaning method after rubbing a liquid crystal display substrate, pure water is fluidized into a layer on the entire surface of the substrate before the cleaning is started as in JP-A-7-64091 so as to cover the entire surface. There is a method of controlling the uneven cleaning by performing the treatment by the above method.
【0003】[0003]
【発明が解決しようとする課題】ところが、洗浄開始前
に基板表面を純水にて均一に覆うようにしても、洗浄時
のむらが消えずにそのまま残り、この結果、配向膜の配
向性能が変化し、製造されたLCDの表示品質に悪影響
を及ぼすことがあり、程度によっては不良となってしま
う事もしばしば起こった。これは、視野角の広い特性を
持った配向膜や、光の透過性の良い配向膜を使用した場
合に起こりやすく、それは配向膜表面の水による加水分
解が原因であると考えられる。この発明は、以上のよう
な問題点を解決するためになされたものであり、液晶用
基板やカラーフィルター基板のラビング処理後、水や純
水などの処理液を使用してラビング処理後の基板表面を
洗浄する場合に、基板の表面における洗浄むらの発生を
防止できる洗浄方法を提供せんとするものである。However, even if the surface of the substrate is uniformly covered with pure water before the start of cleaning, the unevenness during cleaning remains as it is, and as a result, the alignment performance of the alignment film changes. However, the display quality of the manufactured LCD may be adversely affected, and the LCD often becomes defective depending on the degree. This is likely to occur when an alignment film having a wide viewing angle or an alignment film having good light transmittance is used, which is considered to be caused by hydrolysis of water on the surface of the alignment film. The present invention has been made to solve the above problems, and after rubbing a liquid crystal substrate or a color filter substrate, the substrate after the rubbing treatment using a treatment liquid such as water or pure water An object of the present invention is to provide a cleaning method capable of preventing uneven cleaning on the surface of a substrate when cleaning the surface.
【0004】[0004]
【課題を解決するための手段】液晶用あるいはカラーフ
ィルター用基板の表面に形成させた高分子膜の膜面をラ
ビング処理した後に、その基板の表面を洗浄する際に、
超音波や高圧の純水を噴出して洗浄を行う前に、基板表
面をイソプロピルアルコール(CH3 CH(OH)CH
3 )又はイソプロピルアルコールの水溶液を該基板表面
に流動させ、該基板表面全体を覆うようにすることによ
り、その後の水又は純水による洗浄の際に洗浄むらを発
生させない様にしたものである。[Means for Solving the Problems] When the surface of a polymer film formed on the surface of a liquid crystal or color filter substrate is rubbed and then the surface of the substrate is washed,
Before cleaning by jetting ultrasonic waves or high-pressure pure water, clean the substrate surface with isopropyl alcohol (CH 3 CH (OH) CH
3 ) Alternatively, an aqueous solution of isopropyl alcohol is caused to flow over the surface of the substrate so as to cover the entire surface of the substrate so that uneven cleaning is not generated during subsequent cleaning with water or pure water.
【0005】[0005]
【発明の実施の形態】図面に基づいてこの発明の好適な
実施態様を説明する。図1はこの発明に係る洗浄方法を
実施する為の洗浄装置の一例の説明図、図2はその要部
の斜視図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an explanatory view of an example of a cleaning apparatus for carrying out the cleaning method according to the present invention, and FIG. 2 is a perspective view of the main part thereof.
【0006】この洗浄装置は前段処理室4、超音波洗浄
室9、液切り室14が順次連設されて構成されている。
又、これら各室間には基板1を搬送する為の搬送用ロー
ラー3が一列に配設されており、これら搬送用ローラー
3群により基板搬送路が構成されている。又、前段処理
室4の搬送用ローラー3の上方にはスプレー管2が配設
されている。このスプレー管2は、図2に示す通り、多
数のノズル17を有する円筒状の管であり、このノズル
17からは基板1に向ってイソプロピルアルコール(C
H3 CH(OH)CH3 )あるいはこのイソプロピルア
ルコールの水溶液15がシャワー状に噴射される様にな
っている。なお、図中5はイソプロピルアルコールある
いはその水溶液を蓄えるタンク、7はこれら液体を揚水
加圧する為のポンプである。なお、イソプロピルアルコ
ールの水溶液の場合には、イソプロピルアルコールを1
0vol%以上含んでいることが望ましい。This cleaning apparatus is composed of a pretreatment chamber 4, an ultrasonic cleaning chamber 9 and a draining chamber 14 which are successively connected.
Further, transfer rollers 3 for transferring the substrate 1 are arranged in a line between these chambers, and a group of these transfer rollers 3 constitutes a substrate transfer path. A spray pipe 2 is arranged above the transfer roller 3 in the pretreatment chamber 4. As shown in FIG. 2, the spray pipe 2 is a cylindrical pipe having a large number of nozzles 17, and the isopropyl alcohol (C
H 3 CH (OH) CH 3 ) or an aqueous solution 15 of this isopropyl alcohol is sprayed in a shower shape. In the figure, 5 is a tank for storing isopropyl alcohol or its aqueous solution, and 7 is a pump for pumping the liquid. If the solution is isopropyl alcohol, add 1
It is desirable to contain 0 vol% or more.
【0007】この様に、イソプロピルアルコールあるい
はその水溶液15が基板1に噴射されると、基板1の表
面は図2に示す様に、これら液体によって覆われ、その
ままの状態で搬送用ローラー3によって超音波洗浄室9
に搬送され、超音波洗浄される。図中10は超音波洗浄
の際用いられる純水16を蓄える純水用タンク、11は
この純水16を揚水加圧する為のポンプであり、純水1
6はこのポンプ11によって搬送用ローラー3の上方に
位置せしめられて超音波振動子8に供給される様になっ
ている。When the isopropyl alcohol or its aqueous solution 15 is sprayed onto the substrate 1 in this manner, the surface of the substrate 1 is covered with these liquids as shown in FIG. Sonic cleaning room 9
And is ultrasonically cleaned. In the figure, 10 is a pure water tank for storing pure water 16 used in ultrasonic cleaning, and 11 is a pump for pumping and pressurizing the pure water 16.
The pump 6 is positioned above the transport roller 3 by the pump 11 and supplied to the ultrasonic transducer 8.
【0008】この超音波洗浄室9において超音波洗浄が
行われた基板1は、水切り室14に搬送され、搬送用ロ
ーラー3の上下に設けられたエアーナイフ12,13に
よって液切りが行われ、次工程へと搬送される。The substrate 1 that has been ultrasonically cleaned in the ultrasonic cleaning chamber 9 is transferred to the draining chamber 14 and drained by air knives 12 and 13 provided above and below the transfer roller 3. It is transported to the next process.
【0009】本発明においては、ラビング処理後の基板
1は、その表面が水又は純水によってぬれる前に、あら
かじめその表面全体がイソプロピルアルコールあるいは
その水溶液によって被覆されてしまう為、次工程で水又
は純水によってぬらされることによって起こる加水分解
反応を防止することができる。従って、洗浄によるむら
も起きず、ラビング処理によって付着した汚れのみを除
去することができるのである。図3はこの実施例及び比
較例の実験結果を示したものである。In the present invention, the substrate 1 after the rubbing treatment is coated with isopropyl alcohol or its aqueous solution on the entire surface before the surface is wet with water or pure water. It is possible to prevent a hydrolysis reaction caused by being wet with pure water. Therefore, it is possible to remove only stains attached by the rubbing process without causing unevenness due to cleaning. FIG. 3 shows the experimental results of this example and comparative example.
【0010】[0010]
【発明の効果】この発明は上述の通り、液晶基板及びカ
ラーフィルター基板のラビング処理後の洗浄において、
水又は純水による洗浄むらの発生を防止し、品質の向上
を図り、不良品の発生を防止できる極めて実用的な効果
を有する。As described above, the present invention provides a method for cleaning liquid crystal substrates and color filter substrates after rubbing treatment.
It has an extremely practical effect of preventing uneven cleaning due to water or pure water, improving quality, and preventing defective products.
【0011】[0011]
【図1】この発明に係る洗浄方法を実施する為の洗浄装
置の説明図。FIG. 1 is an explanatory view of a cleaning device for carrying out a cleaning method according to the present invention.
【図2】その要部の斜視図。FIG. 2 is a perspective view of a main part thereof.
【図3】この発明に係る方法及び比較例の実施結果を表
にした説明図。FIG. 3 is an explanatory diagram tabulating the results of implementation of the method according to the present invention and a comparative example.
1 基板 2 スプレー管 3 搬送用ローラー 4 前段処理室 5 タンク 7 ポンプ 8 超音波振動子 9 超音波洗浄室 10 純水用タンク 11 ポンプ 12 エアーナイフ 13 エアーナイフ 14 液切り室 15 イソプロピルアルコールあるいはその水溶
液 16 純水 17 ノズル1 Substrate 2 Spray Pipe 3 Transport Roller 4 Pretreatment Chamber 5 Tank 7 Pump 8 Ultrasonic Transducer 9 Ultrasonic Cleaning Chamber 10 Pure Water Tank 11 Pump 12 Air Knife 13 Air Knife 14 Draining Chamber 15 Isopropyl Alcohol or Its Aqueous Solution 16 pure water 17 nozzles
Claims (1)
の表面に形成させた高分子膜の膜面をラビング処理した
後に、その基板の表面を洗浄する洗浄方法において、超
音波や高圧の純水を噴出して洗浄を行う前に、基板表面
をイソプロピルアルコール(CH3 CH(OH)CH
3 )又はイソプロピルアルコールの水溶液を該基板表面
に流動させ、該基板表面全体を覆うようにすることを特
徴とする液晶用基板及びカラーフィルター用基板のラビ
ング処理後の洗浄方法。1. In a cleaning method of rubbing a film surface of a polymer film formed on a surface of a substrate for liquid crystal or a color filter and then cleaning the surface of the substrate, ultrasonic waves or high-pressure pure water is jetted. Before cleaning the substrate surface with isopropyl alcohol (CH 3 CH (OH) CH
3 ) A cleaning method after rubbing a liquid crystal substrate and a color filter substrate, wherein an aqueous solution of isopropyl alcohol is caused to flow over the substrate surface so as to cover the entire substrate surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20669295A JP3040938B2 (en) | 1995-07-21 | 1995-07-21 | Cleaning method after rubbing treatment of liquid crystal substrate and color filter substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20669295A JP3040938B2 (en) | 1995-07-21 | 1995-07-21 | Cleaning method after rubbing treatment of liquid crystal substrate and color filter substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0933927A true JPH0933927A (en) | 1997-02-07 |
JP3040938B2 JP3040938B2 (en) | 2000-05-15 |
Family
ID=16527538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20669295A Expired - Fee Related JP3040938B2 (en) | 1995-07-21 | 1995-07-21 | Cleaning method after rubbing treatment of liquid crystal substrate and color filter substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3040938B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100529564B1 (en) * | 1998-11-12 | 2006-01-27 | 삼성전자주식회사 | Liquid Crystal Display Manufacturing Method |
CN104148328A (en) * | 2013-08-27 | 2014-11-19 | 奥星衡迅生命科技(上海)有限公司 | Method for cleaning pharmaceutical tablet mold |
JP2020013127A (en) * | 2018-07-19 | 2020-01-23 | シャープ株式会社 | Manufacturing method of lcd substrate |
-
1995
- 1995-07-21 JP JP20669295A patent/JP3040938B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100529564B1 (en) * | 1998-11-12 | 2006-01-27 | 삼성전자주식회사 | Liquid Crystal Display Manufacturing Method |
CN104148328A (en) * | 2013-08-27 | 2014-11-19 | 奥星衡迅生命科技(上海)有限公司 | Method for cleaning pharmaceutical tablet mold |
JP2020013127A (en) * | 2018-07-19 | 2020-01-23 | シャープ株式会社 | Manufacturing method of lcd substrate |
CN110737118A (en) * | 2018-07-19 | 2020-01-31 | 夏普株式会社 | Method for manufacturing liquid crystal substrate |
Also Published As
Publication number | Publication date |
---|---|
JP3040938B2 (en) | 2000-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2727481B2 (en) | Cleaning method for glass substrate for liquid crystal element | |
KR100323502B1 (en) | Method of manufacturing liquid crystal display panel and washing machine used for the same | |
JP3525261B2 (en) | Method and apparatus for rubbing alignment film of liquid crystal display element | |
JPH0933927A (en) | Substrate for liquid crystal and method for washing after rubbing treatment of substrate for color filter | |
CN107159602A (en) | Substrate cleaning apparatus | |
JP2006055775A (en) | Die coater-used coating method, and photo-lithographic pellicle produced by the method | |
JP3437702B2 (en) | Substrate processing equipment | |
JP2729723B2 (en) | Method and apparatus for cleaning substrate after rubbing treatment | |
JP2003112131A (en) | Apparatus and method for cleaning substrate | |
JP2504916B2 (en) | Substrate cleaning equipment | |
JPH01140727A (en) | Cleaning of substrate | |
JPH09179312A (en) | Developing device for substrate | |
JP3198504B2 (en) | Manufacturing method of liquid crystal display device | |
KR20060133340A (en) | Washing apparatus of ink jet head, and ink jet printing system using the same | |
JPH0777677A (en) | Washing method and washing device for substrate after rubbing treatment | |
JP3040055B2 (en) | Method of developing photosensitive resin | |
JPH0764091A (en) | Method for cleaning square substrate after rubbing treatment and device therefor | |
JPH10242047A (en) | Treatment liquid treating method and continuously treating apparatus of substrate | |
JPH0919667A (en) | Ultrasonic washing device | |
US6625836B1 (en) | Apparatus and method for cleaning substrate | |
JP3196228B2 (en) | Membrane cleaning method and membrane cleaning device for membrane separation device | |
JP2002043266A (en) | Substrate processing apparatus and method, liquid cutting mist-knife | |
JP2001284310A (en) | Apparatus and method for treating substrate | |
JPH07120739A (en) | Method for washing transparent substrate | |
JP2002350805A (en) | Device and method for cleaning transparent substrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090303 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100303 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100303 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110303 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110303 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120303 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120303 Year of fee payment: 12 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130303 Year of fee payment: 13 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130303 Year of fee payment: 13 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130303 Year of fee payment: 13 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |