JPH0537140A - Manufacture of printed wiring board - Google Patents
Manufacture of printed wiring boardInfo
- Publication number
- JPH0537140A JPH0537140A JP19390791A JP19390791A JPH0537140A JP H0537140 A JPH0537140 A JP H0537140A JP 19390791 A JP19390791 A JP 19390791A JP 19390791 A JP19390791 A JP 19390791A JP H0537140 A JPH0537140 A JP H0537140A
- Authority
- JP
- Japan
- Prior art keywords
- printed wiring
- photosensitive
- wiring board
- solder resist
- ink
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、パーソナルコンピュー
タやワードプロセッサなどの各種電子機器に使用される
プリント配線板の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed wiring board used in various electronic devices such as personal computers and word processors.
【0002】[0002]
【従来の技術】近年、各種電子機器に数多く使用されて
いるプリント配線板は、電子機器の小型・軽量化や多機
能化に伴い、配線の高密度化や電子部品の表面実装化が
著しく、絶縁基板上に形成される導体パターンや電子部
品が実装されるランドはますます狭ピッチ、細線化や小
形状化し、はんだ不要部分のはんだ付着の防止、導体パ
ターンの酸化に対する保護、絶縁性の維持やはんだ付け
性の向上などの目的でプリント配線板上に形成されるソ
ルダレジストやロードマップも高解像度、高位置精度が
要求されるようなり、その形成方法もスクリーン印刷法
からマスクフィルムによる写真現像法に代わりつつあ
る。2. Description of the Related Art In recent years, printed wiring boards, which are widely used in various electronic devices, have been remarkably increased in wiring density and surface mounted electronic components due to downsizing, weight reduction and multifunction of electronic devices. Conductor patterns formed on insulating boards and lands on which electronic components are mounted are becoming increasingly narrower in pitch, thinner and smaller in size, preventing solder from adhering to unnecessary parts, protecting conductor patterns against oxidation, and maintaining insulation. High resolution and high positional accuracy are required for the solder resist and roadmap formed on the printed wiring board for the purpose of improving the solderability and solderability. It is replacing the law.
【0003】以下に、従来のプリント配線板について説
明する。図3は従来のプリント配線板の写真現像法によ
るソルダレジストおよびロードマップ形成の製造過程を
示すものである。A conventional printed wiring board will be described below. FIG. 3 shows a manufacturing process of forming a solder resist and a roadmap by a conventional photo-developing method for a printed wiring board.
【0004】図3において、1は絶縁基板、2は導体パ
ターン、3aは感光性ソルダレジストインキ、3bはソ
ルダレジスト、4はソルダレジスト形成用マスクフィル
ム、5aは感光性ロードマップインキ、5bはロードマ
ップ、6はロードマップ形成用マスクフィルムである。In FIG. 3, 1 is an insulating substrate, 2 is a conductor pattern, 3a is a photosensitive solder resist ink, 3b is a solder resist, 4 is a solder resist forming mask film, 5a is a photosensitive roadmap ink, and 5b is a road. A map 6 is a mask film for forming a road map.
【0005】以上のように構成されたプリント配線板の
ソルダレジストおよびロードマップの形成について、以
下に説明する。The formation of the solder resist and the road map of the printed wiring board constructed as described above will be described below.
【0006】まず、所定の大きさに切断された銅張積層
板(図示せず)にスクリーン印刷法や写真現像法法など
によりエッチングレジストを形成した後、塩化第2銅な
どの溶液を用いてエッチングを行い、導体パターン2を
形成し、エッチングレジストを剥離する。First, an etching resist is formed on a copper clad laminate (not shown) cut into a predetermined size by a screen printing method or a photo developing method, and then a solution of cupric chloride or the like is used. The conductor pattern 2 is formed by etching, and the etching resist is peeled off.
【0007】図3(a)に示すように、絶縁基板1上に
導体パターン2が形成されたプリント配線板に感光性ソ
ルダレジストインキ3aを塗布し、熱風などにより指触
乾燥を行う。As shown in FIG. 3A, a photosensitive solder resist ink 3a is applied to a printed wiring board having a conductor pattern 2 formed on an insulating substrate 1 and dried by touching with hot air.
【0008】次に、図3(b)に示すように、ソルダレ
ジスト形成用マスクフィルム4を指触乾燥された感光性
ソルダレジストインキ3a面に密着させ、紫外線露光し
たのち、図3(c)のように、未露光部分を所定の現像
液で現像・除去し、ソルダレジスト3bを形成する。そ
の後、図3(d)に示すように、感光性ロードマップイ
ンキ5aをソルダレジスト3b上にロードマップ5b形
成に必要な部分よりやや大きな範囲に塗布し、同様に指
触乾燥を行い、図3(e)に示すように、ロードマップ
形成用マスクフィルム6を指触乾燥した感光性ロードマ
ップインキ5a面に密着させ、紫外線露光したのち、図
3(f)のように、未露光部を所定の現像液で現像・除
去する。Next, as shown in FIG. 3B, the solder resist forming mask film 4 is brought into close contact with the surface of the photosensitive solder resist ink 3a which has been touch-dried, and is exposed to ultraviolet rays. As described above, the unexposed portion is developed and removed with a predetermined developing solution to form the solder resist 3b. After that, as shown in FIG. 3 (d), the photosensitive roadmap ink 5a is applied on the solder resist 3b in an area slightly larger than the area required for forming the roadmap 5b, and similarly touch-drying is performed. As shown in (e), the mask film 6 for forming a roadmap is brought into close contact with the surface of the photosensitive roadmap ink 5a that has been dried by touching with the finger and exposed to ultraviolet rays. Then, as shown in FIG. Develop and remove with the developer.
【0009】その後、絶縁基板や導体パターンへの接着
性や硬度などを向上させるため熱風などで再度処理し、
ソルダレジスト3bとロードマップ5bをプリント配線
板上に形成する。After that, in order to improve the adhesion and hardness to the insulating substrate and the conductor pattern, it is treated again with hot air,
The solder resist 3b and the road map 5b are formed on the printed wiring board.
【0010】[0010]
【発明が解決しようとする課題】しかしながら、上記従
来の構成では、プリント配線板上に形成されたソルダレ
ジスト3bおよびロードマップ5bは高解像性を有する
ものの、感光性ソルダレジストインキ3aの塗布、指触
乾燥、ソルダレジスト形成用マスクフィルム4の位置合
わせ、露光、現像、そして感光性ロードマップインキ5
aの塗布、指触乾燥、ロードマップ形成用マスクフィル
ム6の位置合わせ、露光、現像と製造工程が煩雑で長時
間を有するため量産性に乏しく、またソルダレジスト3
bとロードマップ5bの形成工程が別となるため形成さ
れたソルダレジスト3bとロードマップ5bの相対位置
精度の維持が困難である。However, in the above conventional structure, although the solder resist 3b and the road map 5b formed on the printed wiring board have high resolution, the application of the photosensitive solder resist ink 3a, Touch-dry, alignment of mask film 4 for solder resist formation, exposure, development, and photosensitive roadmap ink 5
The mass production is poor because the manufacturing process such as the coating of a, the touch drying, the alignment of the mask film 6 for forming the roadmap, the exposure and the development is complicated and takes a long time, and the solder resist 3 is used.
It is difficult to maintain the relative positional accuracy of the formed solder resist 3b and the road map 5b because the steps of forming b and the road map 5b are different.
【0011】さらに、現像・形成後の表面に凹凸を有す
るソルダレジスト3b上に感光性ロードマップインキ5
aの塗布を行うため塗布された感光性ロードマップイン
キ5aとソルダレジスト3b表面、絶縁基板1や導体パ
ターン2表面との間が凹凸状態になる。このため露光時
のロードマップ形成用マスクフィルム6と十分な密着状
態が保持できず、マスクフィルム遮閉部分での紫外線の
回折現象を招き、現像・形成後のロードマップ5b形状
が設計状態であるマスクフィルムの形状を再現せず、著
しい場合は文字・記号などの判読ができず、ロードマッ
プ形成工程におけるプリント配線板製造の歩止りを悪化
させるという問題点を有していた。Further, the photosensitive roadmap ink 5 is formed on the solder resist 3b having an uneven surface after development and formation.
In order to apply a, the photosensitive roadmap ink 5a applied, the surface of the solder resist 3b, the surface of the insulating substrate 1 and the surface of the conductor pattern 2 become uneven. For this reason, a sufficient contact state with the roadmap forming mask film 6 at the time of exposure cannot be maintained, which causes a diffraction phenomenon of ultraviolet rays in the mask film shielding portion, and the shape of the roadmap 5b after development and formation is in a designed state. There was a problem that the shape of the mask film was not reproduced, and in a remarkable case, characters and symbols could not be read, and the production yield of the printed wiring board in the roadmap forming process was deteriorated.
【0012】本発明は上記従来の問題点を解決するもの
で、感光性ソルダレジストインキおよび感光性ロードマ
ップインキでのソルダレジストおよびロードマップ形成
工程におけるプリント配線板製造歩留りと生産性を著し
く向上させ、ソルダレジストとロードマップの相対位置
精度や形状の再現性の優れたプリント配線板を提供する
ことを目的とする。The present invention solves the above-mentioned problems of the prior art by remarkably improving the manufacturing yield and productivity of printed wiring boards in the process of forming a solder resist and a roadmap using a photosensitive solder resist ink and a photosensitive roadmap ink. An object of the present invention is to provide a printed wiring board having excellent relative positional accuracy between a solder resist and a road map and shape reproducibility.
【0013】[0013]
【課題を解決するための手段】この目的を達成するため
に本発明は、プリント配線板の導体パターンを形成する
工程と、プリント配線板上に高感度の感光性インキを塗
布、乾燥して第1の感光層を形成する工程と、この第1
の感光層上に感光性インキと同じ主成分で色調が異なり
かつ低感度の感光性のインキを塗布、乾燥して第2の感
光層を形成する工程と、第1、第2の感光層を所望の形
状で写真濃度差をつけたマスクフィルムで露光し、現像
することによりソルダレジストとロードマップを同時に
形成する工程とを有している。In order to achieve this object, the present invention provides a step of forming a conductor pattern of a printed wiring board, a high-sensitivity photosensitive ink applied on the printed wiring board, and a drying step. The step of forming the first photosensitive layer and the first step
Forming a second photosensitive layer by coating a photosensitive ink having the same main component as the photosensitive ink but different color tone and low sensitivity on the photosensitive layer and drying to form the first and second photosensitive layers. The method comprises exposing a mask film having a desired shape with a difference in photographic density and developing it to simultaneously form a solder resist and a road map.
【0014】[0014]
【作用】この構成によって、感光性ソルダレジストイン
キの塗布、指触乾燥、ソルダレジスト形成用マスクフィ
ルムの位置合わせ、露光、現像工程を省略することが可
能となり、また第1の感光性インキの塗布、指触乾燥、
第2の感光性インキの塗布、指触乾燥後、同時に1枚の
マスクフィルムで紫外線露光・現像するため、ソルダレ
ジストとロードマップとの位置関係を設計状態に維持す
ることができ、さらに、感光性ロードマップインキ塗布
後の感光性ロードマップインキと感光性ソルダレジスト
インキ、絶縁基板や導体パターン表面との間に著しい凹
凸状態の発生は抑制され、露光時のマスクフィルムとの
密着状態を保持することができ、マスクフィルム遮閉部
分での紫外線回折現象を招くこともほとんどなくなり、
現像・形成後のソルダレジストおよびロードマップ形状
はマスクフィルムの形状を精度よく再現することができ
る。With this configuration, it becomes possible to omit the steps of applying the photosensitive solder resist ink, drying the touch, aligning the solder resist forming mask film, exposing and developing, and applying the first photosensitive ink. , Touch dry,
After the second photosensitive ink is applied and dried by touching the finger, the mask film is exposed to ultraviolet light and developed at the same time. Therefore, the positional relationship between the solder resist and the road map can be maintained in the designed state. The formation of significant irregularities between the photosensitive roadmap ink after application and the photosensitive solder resist ink, the insulating substrate and the surface of the conductor pattern is suppressed, and the close contact with the mask film during exposure is maintained. It is possible to prevent the ultraviolet diffraction phenomenon at the mask film shielding part,
The shape of the mask film can be accurately reproduced with the solder resist and the roadmap shape after development and formation.
【0015】[0015]
【実施例】(実施例1)以下本発明の一実施例につい
て、図面を参照しながら説明する。(Embodiment 1) An embodiment of the present invention will be described below with reference to the drawings.
【0016】図1(a)、(b)、(c)、(d)は、
本発明の第1の実施例におけるプリント配線板の製造過
程を示すものである。図1において、11は絶縁基板、
12は導体パターン、13は高感度の感光性インキ、1
4は低感度の感光性インキ、15はマスクフィルム、1
6はソルダレジスト、17はロードマップである。1 (a), (b), (c) and (d),
1 shows a manufacturing process of a printed wiring board according to a first embodiment of the present invention. In FIG. 1, 11 is an insulating substrate,
12 is a conductor pattern, 13 is a highly sensitive photosensitive ink, 1
4 is a low-sensitivity photosensitive ink, 15 is a mask film, 1
6 is a solder resist and 17 is a road map.
【0017】以上のように構成されたプリント配線板の
ソルダレジストおよびロードマップ形成について、説明
する。The formation of the solder resist and the road map of the printed wiring board constructed as above will be described.
【0018】まず、通常のプリント配線板の製造に用い
られるソルダレジストおよびロードマップ形成用マスク
フィルムを作成する。このソルダレジスト形成用マスク
フィルムはネガパターンを、ロードマップ形成用マスク
フィルムはポジパターンをそれぞれ準備する。First, a solder resist and a roadmap forming mask film used for manufacturing a usual printed wiring board are prepared. A negative pattern is prepared for the solder resist forming mask film, and a positive pattern is prepared for the road map forming mask film.
【0019】次に、ポリエステルフィルムに感光層の塗
布された未露光のフィルムにまず、ソルダレジスト形成
用マスクフィルムのネガパターンを密着させ、通常の露
光条件にて露光し、ついでロードマップ形成用マスクフ
ィルムのポジパターンを同位置に密着させ、通常の露光
量の約1/3〜1/5の条件で露光し、通常条件にて現
像を行い、写真濃度差を有するマスクフィルム15を得
る。Next, a negative pattern of a mask film for forming a solder resist is first brought into close contact with an unexposed film having a photosensitive layer coated on a polyester film, exposed under normal exposure conditions, and then a mask for forming a road map. A positive pattern of the film is brought into close contact with the same position, exposed under a condition of about 1/3 to 1/5 of a normal exposure amount, and developed under a normal condition to obtain a mask film 15 having a photographic density difference.
【0020】その後、絶縁基板11上に導体パターン1
2を形成したプリント配線板上にアルカリ現像型の高感
度の感光性インキ13をスクリーン印刷、ロールコータ
やカーテンコータなどの手段を用いて塗布し、熱風循環
槽などで温度60〜85℃、時間15〜30分程度の条
件で指触乾燥を行う。After that, the conductor pattern 1 is formed on the insulating substrate 11.
The highly sensitive photosensitive ink 13 of alkali developing type is applied onto the printed wiring board on which the 2 is formed by means of screen printing, a roll coater or a curtain coater, and the temperature is 60 to 85 ° C. in a hot air circulation tank for a time. Dry by touch under the condition of about 15 to 30 minutes.
【0021】次に、図1(b)に示すように、低感度の
感光性インキ14を高感度の感光性インキ13と同様の
方法により低感度の感光性インキ上に塗布し、指触乾燥
を行い、その後、図1(c)に示すように、予め準備さ
れたマスクフィルム15を高感度の感光性インキ13面
に密着させ、露光量約900〜1100mJ/cm2 程度
の条件で紫外線露光する。ここで、紫外光線はマスクフ
ィルム作成時に露光量の多い部分、すなわちソルダレジ
スト形成部分では遮光され、低感度の感光性インキ14
は感光されず、高感度の感光性インキ13のみ感光し、
マスクフィルム作成時に露光量の少ないか、または未露
光部分すなわち、ロードマップ形成部分では低感度の感
光性インキ14および高感度の感光性インキ13のどち
らとも透過感光する。Next, as shown in FIG. 1 (b), the low-sensitivity photosensitive ink 14 is applied onto the low-sensitivity photosensitive ink 13 in the same manner as the high-sensitivity photosensitive ink 13 and dried by touch with a finger. Then, as shown in FIG. 1 (c), a mask film 15 prepared in advance is brought into close contact with the surface of the high-sensitivity photosensitive ink 13 and exposed to ultraviolet light under the condition of an exposure amount of about 900 to 1100 mJ / cm 2. To do. Here, the ultraviolet rays are shielded at a portion having a large exposure amount when the mask film is formed, that is, at a portion where the solder resist is formed, and the low-sensitivity photosensitive ink 14
Is not exposed, only the high-sensitivity photosensitive ink 13 is exposed,
When the mask film is formed, the exposure amount is small, or the unexposed portion, that is, the roadmap forming portion, is transparently exposed to both the low-sensitivity photosensitive ink 14 and the high-sensitivity photosensitive ink 13.
【0022】ついで、図1(d)に示すように、炭酸ナ
トリウムを主成分とする現像液で低感度の感光性インキ
14および高感度の感光性インキ13の未露光部分を同
時に現像・除去する。その後、熱風循環槽などで温度1
30〜160℃、時間30〜60分程度の条件で最終の
乾燥・硬化を行って、絶縁基板11、導体パターン12
とソルダレジスト16やロードマップ17との密着性を
安定化させる。Then, as shown in FIG. 1D, the unexposed portions of the low-sensitivity photosensitive ink 14 and the high-sensitivity photosensitive ink 13 are simultaneously developed and removed with a developer containing sodium carbonate as a main component. . After that, in a hot air circulation tank, etc.,
The final drying and curing is performed under the conditions of 30 to 160 ° C. and time of about 30 to 60 minutes to obtain the insulating substrate 11 and the conductor pattern 12.
To stabilize the adhesion between the solder resist 16 and the road map 17.
【0023】以上のような本発明の実施例では、従来の
感光性ソルダレジストの未露光部分の現像・除去後に感
光性ロードマップを塗布する方法と比較して、ソルダレ
ジストおよびロードマップ形成工程の所要時間は約半減
となり、また形成後のソルダレジストとロードマップの
相対位置関係は従来方法で最大約0.15mmあったも
のが設計値通りと格段に改善されると同時に、形成後の
ソルダレジストおよびロードマップのマスクフィルムに
対する再現率は60〜100%が90〜100%と向上
することができる。In the embodiment of the present invention as described above, compared with the conventional method of applying the photosensitive roadmap after developing and removing the unexposed portion of the photosensitive solder resist, the steps of forming the solder resist and the roadmap are performed. The required time is reduced to about half, and the relative positional relationship between the solder resist after formation and the roadmap was about 0.15 mm at maximum with the conventional method, but it was markedly improved as designed, and at the same time, the solder resist after formation was improved. The recall ratio of the road map to the mask film can be improved from 60 to 100% to 90 to 100%.
【0024】(実施例2)以下本発明の第2の実施例に
ついて図面を参照しながら説明する。図2は本発明の第
2の実施例を示すプリント配線板の製造過程の断面図で
ある。図2において、11は絶縁基板、12は導体パタ
ーン、13は高感度の感光性インキ、14は低感度の感
光性インキ、16はソルダレジスト、17はロードマッ
プで、以上は図1の構成と同様なものである。図1の構
成と異なるのは、マスクフィルム15の作成方法であ
り、通常のプリント配線板の製造に用いられるソルダレ
ジストおよびロードマップ形成用マスクフィルムを作成
し、ソルダレジスト形成用マスクフィルム、ロードマッ
プ形成用マスクフィルムにネガパターンを準備し、ポリ
エステルフィルムに感光層の塗布された未露光のフィル
ムに、まずソルダレジスト形成用マスクフィルムのネガ
パターンを密着させ、通常の露光条件にて露光し、つい
でロードマップ形成用マスクフィルムのネガパターンを
同位置に密着させ、通常の露光量の約1/3〜1/5の
条件で露光し、通常条件にて現像を行い、写真濃度差を
もたせた点である。(Second Embodiment) A second embodiment of the present invention will be described below with reference to the drawings. FIG. 2 is a cross-sectional view of the manufacturing process of a printed wiring board showing the second embodiment of the present invention. In FIG. 2, 11 is an insulating substrate, 12 is a conductor pattern, 13 is a high-sensitivity photosensitive ink, 14 is a low-sensitivity photosensitive ink, 16 is a solder resist, 17 is a roadmap, and the above is the configuration of FIG. It is similar. The difference from the configuration of FIG. 1 is a method of producing a mask film 15, which is used to produce a solder resist and a mask film for forming a roadmap, which are used in the production of a normal printed wiring board, and a mask film for forming a solder resist and a roadmap. Prepare a negative pattern on the mask film for formation, to the unexposed film coated with the photosensitive layer on the polyester film, first adhere the negative pattern of the mask film for solder resist formation, and expose under normal exposure conditions, then The negative pattern of the mask film for forming the roadmap is closely attached at the same position, exposed under the condition of about 1/3 to 1/5 of the normal exposure amount, and developed under the normal condition to give a difference in photographic density. Is.
【0025】上記のように構成されたプリント配線板の
ソルダレジストおよびロードマップ形成方法について説
明する。まず、図2(a)に示すように、実施例1と同
様の方法を用い、絶縁基板11上に導体パターン12を
形成したプリント配線板上にアルカリ現像型の高感度の
感光性インキ13をスクリーン印刷、ロールコータやカ
ーテンコータなどの手段を用いて塗布し、熱風循環槽な
どで温度60〜85℃、時間15〜30分程度の条件で
指触乾燥を行う。A solder resist and a road map forming method for the printed wiring board having the above-described structure will be described. First, as shown in FIG. 2 (a), using a method similar to that of Example 1, an alkaline developing type high-sensitivity photosensitive ink 13 was formed on a printed wiring board on which a conductor pattern 12 was formed on an insulating substrate 11. It is applied using a means such as screen printing, a roll coater or a curtain coater, and dried by touch with a hot air circulating tank under the conditions of a temperature of 60 to 85 ° C. and a time of about 15 to 30 minutes.
【0026】次に、図2(b)に示すように、低感度の
感光性インキ14を高感度の感光性インキ13と同様の
方法で塗布し、指触乾燥を行う。その後、図2(c)に
示すように写真濃度差をつけたマスクフィルム15を用
いて、低感度の感光インキ14面に密着させ、露光量約
900〜1100 mJ/cm2 程度で高感度の感光性イン
キと低感度の感光性インキを同時に紫外線露光し、図2
(d)に示すように、炭酸ナトリウムを主成分とする現
像液で低感度の感光性インキ14および高感度の感光性
インキ13の未露光部を現像・除去する。その後、熱風
循環槽などで温度130〜160℃、時間30〜60分
程度の条件で最終の硬化を行い、絶縁基板11やソルダ
レジスト16やロードマップ17との密着性を安定化さ
せる。Next, as shown in FIG. 2B, the low-sensitivity photosensitive ink 14 is applied in the same manner as the high-sensitivity photosensitive ink 13 and is dried by touch with a finger. Then, as shown in FIG. 2 (c), a mask film 15 having a photographic density difference was used to bring it into close contact with the surface of the low-sensitivity photosensitive ink 14 and to obtain high sensitivity at an exposure dose of about 900 to 1100 mJ / cm 2. The photosensitive ink and the low-sensitivity photosensitive ink are exposed to ultraviolet light at the same time.
As shown in (d), the unexposed portions of the low-sensitivity photosensitive ink 14 and the high-sensitivity photosensitive ink 13 are developed and removed with a developing solution containing sodium carbonate as a main component. After that, final curing is performed in a hot air circulation tank or the like at a temperature of 130 to 160 ° C. for a time of about 30 to 60 minutes to stabilize the adhesion to the insulating substrate 11, the solder resist 16, and the road map 17.
【0027】以上のようなにマスクフィルム15の作成
方法を上記のように替えることにより、プリント配線板
表面に高絶縁性を有し、被膜強度の優れた絶縁被膜の形
成ができる。By changing the method of forming the mask film 15 as described above, it is possible to form an insulating coating having a high insulating property and excellent coating strength on the surface of the printed wiring board.
【0028】なお、本発明の実施例において、プリント
配線板の構造は片面プリント配線板としたが、両面や多
層プリント配線板であってもよく、また高感度の感光性
インキ13および低感光性インキ14はアルカリ現像型
としたが、溶剤現像型としてもよいことは言うまでもな
い。In the embodiment of the present invention, the structure of the printed wiring board is a single-sided printed wiring board, but it may be a double-sided or multi-layered printed wiring board, and the photosensitive ink 13 having high sensitivity and low photosensitivity. Although the ink 14 is of the alkali development type, it goes without saying that it may be of the solvent development type.
【0029】[0029]
【発明の効果】以上のように本発明は、感度の異なる同
じ主成分の2種類の感光性インキを用い、かつ写真濃度
差をつけた1枚のマスクフィルムで同時に紫外線露光・
現像することにより、ソルダレジストおよびロードマッ
プ形成工程におけるプリント配線板製造歩留りと生産性
を著しく向上させ、ソルダレジストとロードマップの相
対位置精度や形状の再現性の優れたプリント配線板を実
現できるものである。INDUSTRIAL APPLICABILITY As described above, the present invention uses two kinds of photosensitive inks of the same main component having different sensitivities and simultaneously exposes them to ultraviolet rays simultaneously with one mask film having a photographic density difference.
By developing, it is possible to significantly improve the manufacturing yield and productivity of the printed wiring board in the solder resist and roadmap formation process, and realize a printed wiring board with excellent relative positional accuracy and shape reproducibility of the solder resist and roadmap. Is.
【図1】(a)〜(d)は本発明の第1の実施例におけ
るプリント配線板の製造方法における要部工程の断面図1A to 1D are cross-sectional views of a main part process in a method for manufacturing a printed wiring board according to a first embodiment of the present invention.
【図2】(a)〜(d)は本発明の第2の実施例におけ
るプリント配線板の製造方法における要部工程の断面図2A to 2D are cross-sectional views of a main part process in a method of manufacturing a printed wiring board according to a second embodiment of the present invention.
【図3】(a)〜(f)は従来のプリント配線板の製造
方法における要部工程の断面図3 (a) to (f) are cross-sectional views of a main process in a conventional method for manufacturing a printed wiring board.
11 絶縁基板 12 導体パターン 13 高感度の感光性インキ 14 低感度の感光性インキ 15 マスクフィルム 16 ソルダレジスト 17 ロードマップ 11 Insulating substrate 12 conductor pattern 13 Highly sensitive photosensitive ink 14 Low-sensitivity photosensitive ink 15 Mask film 16 Solder resist 17 Roadmap
Claims (2)
工程と、上記プリント配線板上に高感度の感光性インキ
を塗布、乾燥して第1の感光層を形成する工程と、この
第1の感光層上に前記感光性インキと同じ主成分で色調
が異なりかつ低感度の感光性インキを塗布、乾燥して第
2の感光層を形成する工程と、上記第1、第2の感光層
を所望の形状で写真濃度差をつけたマスクフィルムで露
光・現像することによりソルダレジストとロードマップ
を同時に形成する工程とを有するプリント配線板の製造
方法。1. A step of forming a conductor pattern of a printed wiring board, a step of applying a high-sensitivity photosensitive ink on the printed wiring board and drying to form a first photosensitive layer, and the first step. Forming a second photosensitive layer by coating on the photosensitive layer a photosensitive ink having the same main component as the photosensitive ink but having a different color tone and low sensitivity, and drying to form the second photosensitive layer; A method for manufacturing a printed wiring board, which comprises a step of simultaneously forming a solder resist and a road map by exposing and developing with a mask film having a desired shape and a difference in photographic density.
用いられ、かつ写真濃度差を設けたマスクフィルム。2. A mask film used for exposing and developing a plurality of photosensitive layers having different sensitivities and having a photographic density difference.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3193907A JP3019503B2 (en) | 1991-08-02 | 1991-08-02 | Manufacturing method of printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3193907A JP3019503B2 (en) | 1991-08-02 | 1991-08-02 | Manufacturing method of printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0537140A true JPH0537140A (en) | 1993-02-12 |
JP3019503B2 JP3019503B2 (en) | 2000-03-13 |
Family
ID=16315728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3193907A Expired - Fee Related JP3019503B2 (en) | 1991-08-02 | 1991-08-02 | Manufacturing method of printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3019503B2 (en) |
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JP2011077191A (en) * | 2009-09-29 | 2011-04-14 | Mitsubishi Paper Mills Ltd | Method of forming solder resist |
JP2011119522A (en) * | 2009-12-04 | 2011-06-16 | Sharp Corp | Printed wiring board and manufacturing method of the same |
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KR101802046B1 (en) * | 2013-02-28 | 2017-11-27 | 토카이 신에이 일렉트로닉스 인더스트리 가부시키가이샤 | Substrate manufacturing method, substrate, and mask film |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011077191A (en) * | 2009-09-29 | 2011-04-14 | Mitsubishi Paper Mills Ltd | Method of forming solder resist |
JP2011119522A (en) * | 2009-12-04 | 2011-06-16 | Sharp Corp | Printed wiring board and manufacturing method of the same |
KR101298103B1 (en) * | 2012-10-31 | 2013-08-20 | 홍석현 | Apparatus and method for manufacturing fine circuit pattern and fine circuit pattern manufactured thereby |
KR20150136115A (en) | 2013-03-29 | 2015-12-04 | 제온 코포레이션 | Fragrance composition and method for producing same |
JP5639697B1 (en) * | 2013-08-08 | 2014-12-10 | 東海神栄電子工業株式会社 | Circuit board manufacturing method capable of visually recognizing identification characters / symbols and pictures |
JP5643416B1 (en) * | 2013-12-24 | 2014-12-17 | 互応化学工業株式会社 | Manufacturing method of coated wiring board |
JP2015121653A (en) * | 2013-12-24 | 2015-07-02 | 互応化学工業株式会社 | Method for manufacturing coated wiring board |
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