JP7519522B2 - Resist composition and method for producing resist pattern - Google Patents

Description

The present invention relates to a carboxylate for use as an acid generator used in semiconductor microfabrication, an acid generator containing the carboxylate, a resist composition, and a method for producing a resist pattern.

Patent Document 1 describes a salt represented by the following formula:

JP 2018-43952 A

An object of the present invention is to provide a salt that can produce a resist pattern with better CD uniformity (CDU) than a resist pattern formed from a resist composition containing the above salt.

［式（Ｉ）中、
Ｒ^１は、フッ素原子又は炭素数１～６のペルフルオロアルキル基を表す。
ｎｎ１は、１～５のいずれかの整数を表し、ｎｎ１が２以上のとき、複数のＲ^１は互い
に同一であっても異なってもよい。
Ｒ^２は、フッ素原子を有してもよい炭素数１～８のアルキル基を表し、該アルキル基に
含まれる－ＣＨ₂－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ｎｎ２は、０～５のいずれかの整数を表し、ｎｎ２が２以上のとき、複数のＲ^２は互い
に同一であっても異なってもよい。
Ｒ^３は、ハロゲン原子又は炭素数１～６のアルキル基を表し、該アルキル基に含まれる
－ＣＨ₂－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ｎｎ３は、０～５のいずれかの整数を表し、ｎｎ３が２以上のとき、複数のＲ^３は互い
に同一であっても異なってもよい。］
［２］Ｒ^１が、フッ素原子又は炭素数１～３のペルフルオロアルキル基である［１］に
記載のカルボン酸塩。
［３］ｎｎ２は、１～５のいずれかの整数である［１］又は［２］記載のカルボン酸塩
。
［４］ｎｎ３が１である［１］～［３］のいずれかに記載のカルボン酸塩。
［５］［１］～［４］のいずれかに記載のカルボン酸塩を含有するカルボン酸発生剤。
［６］［５］記載の酸発生剤と、スルホン酸発生剤と、酸不安定基を有する樹脂とを含
有するレジスト組成物。
［７］スルホン酸発生剤が、式（Ｂ１）で表される塩を含む［６］記載のレジスト組成
物。

［式（Ｂ１）中、
Ｑ^b1及びＱ^b2は、それぞれ独立に、フッ素原子又は炭素数１～６のペルフルオロアルキ
ル基を表す。
Ｌ^b1は、炭素数１～２４の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含
まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該２価の飽和炭化
水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基で置換されていてもよい。
Ｙは、置換基を有していてもよいメチル基又は置換基を有していてもよい炭素数３～１
８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－
Ｓ（Ｏ）_２－又は－ＣＯ－に置き換わっていてもよい。
Ｚ^＋は、有機カチオンを表す。］
［８］酸不安定基を有する構造単位が、式（ａ１－１）で表される構造単位及び式（ａ
１－２）で表される構造単位の少なくとも１種を含む［６］又は［７］記載のレジスト組
成物。

［式（ａ１－１）及び式（ａ１－２）中、
Ｌ^a1及びＬ^a2は、それぞれ独立に、－Ｏ－又は＊－Ｏ－（ＣＨ_２）_k1－ＣＯ－Ｏ－を表
し、ｋ１は１～７の整数を表し、＊は－ＣＯ－との結合部位を表す。
Ｒ^a4及びＲ^a5は、それぞれ独立に、水素原子又はメチル基を表す。
Ｒ^a6及びＲ^a7は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～１８の脂環
式炭化水素基又はこれらを組合せた基を表す。
ｍ１は、０～１４のいずれかの整数を表す。
ｎ１は、０～１０のいずれかの整数を表す。
ｎ１’は、０～３のいずれかの整数を表す。］
［９］（１）［６］～［８］のいずれかに記載のレジスト組成物を基板上に塗布する工
程、
（２）塗布後の組成物を乾燥させて組成物層を形成する工程、
（３）組成物層に露光する工程、
（４）露光後の組成物層を加熱する工程、及び
（５）加熱後の組成物層を現像する工程を含むレジストパターンの製造方法。 The present invention includes the following inventions.
[1] A carboxylate represented by formula (I).

[In formula (I),
^R1 represents a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
nn1 represents an integer of 1 to 5, and when nn1 is 2 or more, the multiple R ^1s may be the same or different.
R ² represents an alkyl group having 1 to 8 carbon atoms which may have a fluorine atom, and --CH ₂ -- contained in the alkyl group may be replaced by --O-- or --CO--.
nn2 represents an integer of 0 to 5, and when nn2 is 2 or more, the multiple R ² 's may be the same or different.
R ³ represents a halogen atom or an alkyl group having 1 to 6 carbon atoms, and --CH ₂ -- contained in the alkyl group may be replaced by --O-- or --CO--.
nn3 represents an integer of 0 to 5, and when nn3 is 2 or more, the multiple R ^3s may be the same or different.
[2] The carboxylate according to [1], wherein R ¹ is a fluorine atom or a perfluoroalkyl group having 1 to 3 carbon atoms.
[3] The carboxylate according to [1] or [2], wherein nn2 is an integer of 1 to 5.
[4] The carboxylate according to any one of [1] to [3], wherein nn3 is 1.
[5] A carboxylic acid generator comprising the carboxylate according to any one of [1] to [4].
[6] A resist composition comprising the acid generator according to [5], a sulfonic acid generator, and a resin having an acid labile group.
[7] The resist composition according to [6], wherein the sulfonic acid generator contains a salt represented by formula (B1):

[In formula (B1),
Q ^b1 and Q ^b2 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, in which -CH ₂ - may be replaced by -O- or -CO-, and in which a hydrogen atom may be replaced by a fluorine atom or a hydroxyl group.
Y is a methyl group which may have a substituent or a substituted group having 3 to 1 carbon atoms.
The —CH ₂ — contained in the alicyclic hydrocarbon group represents an —O—, —
It may be replaced by S(O) ₂ -- or --CO--.
Z ⁺ represents an organic cation.
[8] The structural unit having an acid labile group is a structural unit represented by formula (a1-1) and a structural unit represented by formula (a
The resist composition according to [6] or [7], which contains at least one type of structural unit represented by the following formula (1-2):

[In formula (a1-1) and formula (a1-2),
L ^a1 and L ^a2 each independently represent --O-- or *-O--(CH ₂ ) _k1 --CO--O--, where k1 represents an integer of 1 to 7, and * represents a bonding site with --CO--.
R ^a4 and R ^a5 each independently represent a hydrogen atom or a methyl group.
R ^a6 and R ^a7 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a combination thereof.
m1 represents an integer of 0 to 14.
n1 represents an integer of 0 to 10.
n1′ represents an integer of 0 to 3.
[9] (1) A step of applying the resist composition according to any one of [6] to [8] onto a substrate;
(2) A step of drying the applied composition to form a composition layer;
(3) exposing the composition layer to light;
(4) a step of heating the composition layer after exposure; and (5) a step of developing the composition layer after heating.

By using a resist composition using the salt of the present invention, good CD uniformity (CDU) can be obtained.
) to produce a resist pattern.

In this specification, the term "(meth)acrylic monomer" refers to a monomer having the formula "CH ₂ ═CH—CO—"
and monomers having the structure "CH ₂ ═C(CH ₃ )—CO—". Similarly, "(meth)acrylate" and "(meth)acrylic acid" respectively mean "at least one selected from the group consisting of acrylate and methacrylate" and "at least one selected from the group consisting of acrylic acid and methacrylic acid". "CH ₂ ═C(CH ₃ )—CO—" or "CH ₂ ═CH—C
When a structural unit having "O-" is exemplified, structural units having both groups are also exemplified. Furthermore, in the groups described in this specification, those which can have both a straight-chain structure and a branched structure may have either. The term "combined group" refers to a group in which two or more of the exemplified groups are bonded together, and the valence of these groups may be appropriately changed depending on the bond form. When stereoisomers exist, all stereoisomers are included.
In this specification, the term "solids content of a resist composition" refers to the sum of the components excluding the solvent (E), which will be described later, from the total amount of the resist composition.

<Carboxylic Acid Salt Represented by Formula (I)>
The present invention relates to a carboxylate represented by formula (I) (hereinafter, may be referred to as "carboxylate (I)").
In the carboxylate (I), the negatively charged side is sometimes referred to as the "anion (I)" and the positively charged side is sometimes referred to as the "cation (I)".

Examples of the perfluoroalkyl group for R ¹ include a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group, a perfluoropentyl group, and a perfluorohexyl group.
R ¹ is preferably a fluorine atom or a perfluoroalkyl group having 1 to 3 carbon atoms;
More preferably, it is a fluorine atom or a trifluoromethyl group.
It is preferred that nn1 is 1, 2 or 5.

Examples of the alkyl group of ^R2 and ^R3 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, etc. The number of carbon atoms of the alkyl group is preferably 1 to 4, and more preferably 1 to 3.
When --CH ₂ -- contained in the alkyl group represented by R ² and R ³ is replaced by --O-- or --CO--, the number of carbon atoms before replacement is regarded as the total number of carbon atoms in the alkyl group.
In addition, the alkyl groups represented by ^R2 and ^{R3 each} have a structure in which —CH ₂ — contained in the alkyl group is —O
- or -CO- is replaced by a hydroxy group (-CH ₂ - contained in a methyl group is replaced by -
O-), a carboxy group (the --CH ₂ --CH ₂ -- contained in an ethyl group is replaced with --
an alkoxy group having 1 to 5 carbon atoms (an alkyl group having 2 to 6 carbon atoms in which -CH ₂ - is replaced with -O-), an alkoxycarbonyl group having 2 to 5 carbon atoms (an alkyl group having 3 to 6 carbon atoms in which -CH ₂ -CH ₂ - is replaced with -O-CO-)
a group in which -CH ₂ - contained in an alkyl group having 2 to 6 carbon atoms is replaced by -CO-; an alkylcarbonyl group having 2 to 6 carbon atoms (a group in which -CH ₂ -CH ₂ - contained in an alkyl group having 3 to 6 carbon atoms is replaced by -CO-);
O- substituted group).
Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, and a pentyloxy group. Examples of the alkoxycarbonyl group include a methoxycarbonyl group,
Examples of the alkylcarbonyl group include an acetyl group, a propionyl group, and a butyryl group. Examples of the alkylcarbonyloxy group include an acetyloxy group, a propionyloxy group, and a butyryloxy group.

R ² is preferably an alkyl group having 1 to 3 carbon atoms (the —CH ₂ — contained in the alkyl group).
may be replaced by -O- or -CO-; or an alkoxy group having 1 to 7 carbon atoms which may have a fluorine atom, more preferably a methyl group, a methoxy group, or a fluorinated alkoxy group having 1 to 7 carbon atoms.
It is preferred that nn2 is 1 or 3.
When nn2 is 1, the substitution position of ^R2 is preferably the para position relative to the iodine atom, and when nn2 is 3, the substitution positions of ^R2 preferably include the ortho position and the para position relative to the iodine atom.

Examples of the halogen atom for ^R3 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
^R3 is preferably a halogen atom, a hydroxyl group or an alkoxy group having 1 to 5 carbon atoms.
It is preferable that nn3 is 1.

Examples of the cation (I) include the following cations. Among them, the cations represented by the formula (I-
c-1) ~ Formula (I-c-4), Formula (I-c-7), Formula (I-c-8), Formula (I-c-11)
), and a cation represented by formula (I-c-12) is preferred.

Examples of the anion (I) include the following anions. Among them, the anion represented by the formula (Ia
Preferred are the anions represented by formulae (Ia-1) to (Ia-3), (Ia-7) and (Ia-8).

Examples of the carboxylate (I) include salts shown in Table 1. For example, in Table 1, the carboxylate (I-1) is a salt consisting of an anion represented by formula (Ia-1) and a cation represented by formula (I-c-1), and is the salt shown below.

Among them, the carboxylate (I) includes carboxylate (I-1) to carboxylate (I-3).
, carboxylate (I-7) to carboxylate (I-12), carboxylate (I-15) to carboxylate (I-19), carboxylate (I-23) to carboxylate (I-27), carboxylate (I-31), carboxylate (I-32), carboxylate (I-49) to carboxylate (I-51), carboxylate (I-55) to carboxylate (I-59), carboxylate (I-81) to carboxylate (I-83), carboxylate (I-87) to carboxylate (I-92), carboxylate (I-95) to carboxylate (I-99), carboxylate (I-103) to carboxylate (I-107), carboxylate (I-111), and carboxylate (I-112) are preferred.

（式中、全ての符号は、それぞれ前記と同じ意味を表す。）
この反応における酸としては、トリフルオロメタンスルホン酸等が挙げられる。
この反応における溶媒としては、クロロホルム、アセトニトリル等が挙げられる。
反応温度は通常０℃～８０℃であり、反応時間は通常０．５時間～２４時間である。 <Method for producing carboxylate (I)>
The carboxylate (I) can be produced, for example, by reacting a compound represented by formula (I-a) with a compound represented by formula (I-c) in a solvent in the presence of an acid, and then reacting the resulting mixture with a compound represented by formula (I-b), followed by treatment with an aqueous sodium hydrogen sulfate solution.

(In the formula, all symbols have the same meaning as defined above.)
The acid in this reaction includes trifluoromethanesulfonic acid and the like.
Solvents for this reaction include chloroform, acetonitrile, and the like.
The reaction temperature is usually 0° C. to 80° C., and the reaction time is usually 0.5 hours to 24 hours.

Examples of the compound represented by formula (Ia) include compounds represented by the following formula, and are readily available on the market.

Examples of the compound represented by formula (Ib) include compounds represented by the following formula, and are readily available on the market.

Examples of the compound represented by formula (Ic) include compounds represented by the following formula, and are readily available on the market.

<Carboxylic Acid Generator>
The carboxylate (I) of the present invention can act as a carboxylic acid generator in the resist composition. When the carboxylate (I) is used as a carboxylic acid generator in the resist composition, two or more types of the carboxylate (I) may be contained.
The acid generator of the present invention may further contain a sulfonic acid generator (hereinafter, sometimes referred to as "acid generator (B)") known in the resist field other than the carboxylate (I), as described below. The acid generator (B) may be used alone or in combination of two or more kinds.

<Resist Composition>
The resist composition contains a carboxylic acid generator containing the carboxylate (I) of the present invention, a sulfonic acid generator, and a resin having an acid labile group (hereinafter, sometimes referred to as "resin (A)"). The "acid labile group" refers to a group that has a leaving group and that is eliminated by contact with an acid to form a hydrophilic group (e.g., a hydroxy group or a carboxy group).
The resist composition of the present invention may contain, as a carboxylic acid generator other than the carboxylate (I), a carboxylic acid generator known in the resist field.
The resist composition preferably contains a quencher (hereinafter sometimes referred to as "quencher (C)") and/or a solvent (hereinafter sometimes referred to as "solvent (E)").

<Acid Generator (B)>
The acid generator (B) may be either nonionic or ionic. Examples of nonionic acid generators include sulfonate esters (e.g., 2-nitrobenzyl ester, aromatic sulfonate, oxime sulfonate, N-sulfonyloxyimide, sulfonyloxyketone, diazonaphthoquinone 4-sulfonate), sulfones (e.g., disulfone, ketosulfone, sulfonyldiazomethane), and the like. Examples of ionic acid generators include onium salts containing onium cations (e.g., diazonium salts, phosphonium salts, sulfonium salts, iodonium salts). Examples of the anions of the onium salts include sulfonate anion, sulfonylimide anion, sulfonylmethide anion, and the like.

Examples of the acid generator (B) include those described in JP-A-63-26653 and JP-A-55-164824.
Japanese Patent Application Laid-Open Nos. 62-69263, 63-146038, 63-163452, 62-153853, 63-146029, U.S. Pat. No. 3,779,
Compounds that generate an acid when exposed to radiation, such as those described in US Pat. No. 778, US Pat. No. 3,849,137, German Patent No. 3914407, and European Patent No. 126,712, can be used. Compounds produced by known methods can also be used. The acid generator (B) can be used in combination of two or more kinds.

［式（Ｂ１）中、
Ｑ^b1及びＱ^b2は、それぞれ独立に、フッ素原子又は炭素数１～６のペルフルオロアルキ
ル基を表す。
Ｌ^b1は、炭素数１～２４の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含
まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該２価の飽和炭化
水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基で置換されていてもよい。
Ｙは、置換基を有していてもよいメチル基又は置換基を有していてもよい炭素数３～１
８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－
Ｓ（Ｏ）_２－又は－ＣＯ－に置き換わっていてもよい。
Ｚ１^＋は、有機カチオンを表す。］ The acid generator (B) is preferably a fluorine-containing acid generator, more preferably represented by the formula (B1):
(hereinafter, may be referred to as "acid generator (B1)").

[In formula (B1),
Q ^b1 and Q ^b2 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, in which -CH ₂ - may be replaced by -O- or -CO-, and in which a hydrogen atom may be replaced by a fluorine atom or a hydroxyl group.
Y is a methyl group which may have a substituent or a substituted group having 3 to 1 carbon atoms.
The —CH ₂ — contained in the alicyclic hydrocarbon group represents an —O—, —
It may be replaced by S(O) ₂ -- or --CO--.
Z1 ⁺ represents an organic cation.

Examples of the perfluoroalkyl group represented by Q ^b1 and Q ^b2 include a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group, a perfluoropentyl group, and a perfluorohexyl group.
It is preferable that Q ^b1 and Q ^b2 each independently represent a fluorine atom or a trifluoromethyl group, and it is more preferable that both represent a fluorine atom.

Examples of the divalent saturated hydrocarbon group for L ^b1 include a linear alkanediyl group, a branched alkanediyl group, and a monocyclic or polycyclic divalent alicyclic saturated hydrocarbon group, and may be a group formed by combining two or more of these groups.
Specifically, methylene group, ethylene group, propane-1,3-diyl group, butane-1,4
-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1
,7-diyl group, octane-1,8-diyl group, nonane-1,9-diyl group, decane-1
, 10-diyl group, undecane-1,11-diyl group, dodecane-1,12-diyl group,
Tridecane-1,13-diyl group, tetradecane-1,14-diyl group, pentadecane-
1,15-diyl group, hexadecane-1,16-diyl group and heptadecane-1,17-
linear alkanediyl groups such as a diyl group;
Ethane-1,1-diyl group, propane-1,1-diyl group, propane-1,2-diyl group, propane-2,2-diyl group, pentane-2,4-diyl group, 2-methylpropane-
branched alkanediyl groups such as a 1,3-diyl group, a 2-methylpropane-1,2-diyl group, a pentane-1,4-diyl group, and a 2-methylbutane-1,4-diyl group;
monocyclic divalent alicyclic saturated hydrocarbon groups such as cycloalkanediyl groups, such as cyclobutane-1,3-diyl group, cyclopentane-1,3-diyl group, cyclohexane-1,4-diyl group, and cyclooctane-1,5-diyl group;
Norbornane-1,4-diyl group, norbornane-2,5-diyl group, adamantane-
Examples of the alkyl group include polycyclic divalent alicyclic saturated hydrocarbon groups such as 1,5-diyl group and adamantane-2,6-diyl group.

Examples of the divalent saturated hydrocarbon group represented by L ^b1 in which --CH ₂ -- is replaced by --O-- or --CO-- include groups represented by any of formulas (b1-1) to (b1-3). In the groups represented by formulas (b1-1) to (b1-3) and specific examples thereof represented by formulas (b1-4) to (b1-11), * and ** represent bonding sites, and * represents the bonding site to -Y.

［式（ｂ１－１）中、
Ｌ^b2は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b3は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭
化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^b2とＬ^b3との炭素数合計は、２２以下である。
式（ｂ１－２）中、
Ｌ^b4は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b5は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭
化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^b4とＬ^b5との炭素数合計は、２２以下である。
式（ｂ１－３）中、
Ｌ^b6は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
Ｌ^b7は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭
化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^b6とＬ^b7との炭素数合計は、２３以下である。］

[In formula (b1-1),
L ^b2 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b3 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxyl group, The --CH ₂ -- contained in the hydrocarbon group may be replaced by --O-- or --CO--.
However, the total number of carbon atoms in L ^b2 and L ^b3 is 22 or less.
In formula (b1-2),
L ^b4 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxyl group, The --CH ₂ -- contained in the hydrocarbon group may be replaced by --O-- or --CO--.
However, the total number of carbon atoms in L ^b4 and L ^b5 is 22 or less.
In formula (b1-3),
L ^b6 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
L ^b7 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxyl group, The --CH ₂ -- contained in the hydrocarbon group may be replaced by --O-- or --CO--.
However, the total number of carbon atoms in L ^b6 and L ^b7 is 23 or less.

In the groups represented by formulae (b1-1) to (b1-3), when --CH ₂ -- contained in the saturated hydrocarbon group is replaced with --O-- or --CO--, the number of carbon atoms before replacement is regarded as the number of carbon atoms of the saturated hydrocarbon group.
As the divalent saturated hydrocarbon group, the same divalent saturated hydrocarbon groups as those represented by L ^b1 can be mentioned.
L ^b2 is preferably a single bond.
L ^b3 is preferably a divalent saturated hydrocarbon group having 1 to 4 carbon atoms.
L ^b4 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms, and a hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b6 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 4 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b7 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group,
The --CH ₂ -- contained in the divalent saturated hydrocarbon group may be replaced by --O-- or --CO--.
The divalent saturated hydrocarbon group represented by L ¹ in which --CH ₂ -- is replaced by --O-- or --CO-- is preferably a group represented by formula (b1-1) or formula (b1-3).

［式（ｂ１－４）中、
Ｌ^b8は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
式（ｂ１－５）中、
Ｌ^b9は、炭素数１～２０の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含
まれる－ＣＨ_２－は－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ｌ^b10は、単結合又は炭素数１～１９の２価の飽和炭化水素基を表し、該２価の飽和炭
化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b9及びＬ^b10の合計炭素数は２０以下である。
式（ｂ１－６）中、
Ｌ^b11は、炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^b12は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該２価の飽和炭
化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b11及びＬ^b12の合計炭素数は２１以下である。
式（ｂ１－７）中、
Ｌ^b13は、炭素数１～１９の２価の飽和炭化水素基を表す。
Ｌ^b14は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該２価の飽和炭
化水素基に含まれる－ＣＨ_２－は－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ｌ^b15は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該２価の飽和炭
化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b13～Ｌ^b15の合計炭素数は１９以下である。
式（ｂ１－８）中、
Ｌ^b16は、炭素数１～１８の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に
含まれる－ＣＨ_２－は－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ｌ^b17は、炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^b18は、単結合又は炭素数１～１７の２価の飽和炭化水素基を表し、該２価の飽和炭
化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b16～Ｌ^b18の合計炭素数は１９以下である。］
Ｌ^b8は、好ましくは炭素数１～４の２価の飽和炭化水素基である。
Ｌ^b9は、好ましくは炭素数１～８の２価の飽和炭化水素基である。
Ｌ^b10は、好ましくは単結合又は炭素数１～１９の２価の飽和炭化水素基であり、より
好ましくは単結合又は炭素数１～８の２価の飽和炭化水素基である。
Ｌ^b11は、好ましくは炭素数１～８の２価の飽和炭化水素基である。
Ｌ^b12は、好ましくは単結合又は炭素数１～８の２価の飽和炭化水素基である。
Ｌ^b13は、好ましくは炭素数１～１２の２価の飽和炭化水素基である。
Ｌ^b14は、好ましくは単結合又は炭素数１～６の２価の飽和炭化水素基である。
Ｌ^b15は、好ましくは単結合又は炭素数１～１８の２価の飽和炭化水素基であり、より
好ましくは単結合又は炭素数１～８の２価の飽和炭化水素基である。
Ｌ^b16は、好ましくは炭素数１～１２の２価の飽和炭化水素基である。
Ｌ^b17は、好ましくは炭素数１～６の２価の飽和炭化水素基である。
Ｌ^b18は、好ましくは単結合又は炭素数１～１７の２価の飽和炭化水素基であり、より
好ましくは単結合又は炭素数１～４の２価の飽和炭化水素基である。 Examples of the group represented by formula (b1-1) include groups represented by formulas (b1-4) to (b1-8).

[In formula (b1-4),
L ^b8 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
In formula (b1-5),
L ^b9 represents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and --CH ₂ -- contained in the divalent saturated hydrocarbon group may be replaced by --O-- or --CO--.
L ^b10 represents a single bond or a divalent saturated hydrocarbon group having 1 to 19 carbon atoms, and a hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total number of carbon atoms of L ^b9 and L ^b10 is 20 or less.
In formula (b1-6),
L ^b11 represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b12 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total number of carbon atoms of L ^b11 and L ^b12 is 21 or less.
In formula (b1-7),
L ^b13 represents a divalent saturated hydrocarbon group having 1 to 19 carbon atoms.
L ^b14 represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and --CH ₂ -- contained in the divalent saturated hydrocarbon group may be replaced by --O-- or --CO--.
L ^b15 represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and a hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total number of carbon atoms of L ^b13 to L ^b15 is 19 or less.
In formula (b1-8),
L ^b16 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and --CH ₂ -- contained in the divalent saturated hydrocarbon group may be replaced by --O-- or --CO--.
L ^b17 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b18 represents a single bond or a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and a hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total number of carbon atoms of L ^b16 to L ^b18 is 19 or less.]
L ^b8 is preferably a divalent saturated hydrocarbon group having 1 to 4 carbon atoms.
L ^b9 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b10 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 19 carbon atoms, and more preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b11 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b12 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b13 is preferably a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
L ^b14 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 6 carbon atoms.
L ^b15 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and more preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b16 is preferably a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
L ^b17 is preferably a divalent saturated hydrocarbon group having 1 to 6 carbon atoms.
L ^b18 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and more preferably a single bond or a divalent saturated hydrocarbon group having 1 to 4 carbon atoms.

式（ｂ１－９）中、
Ｌ^b19は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素
基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b20は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素
基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に
置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ₂－は、－Ｏ－
又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素
原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b19及びＬ^b20の合計炭素数は２３以下である。
式（ｂ１－１０）中、
Ｌ^b21は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該飽和炭化水素
基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b22は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^b23は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該飽和炭化水素
基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に
置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ₂－は、－Ｏ－
又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素
原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b21、Ｌ^b22及びＬ^b23の合計炭素数は２１以下である。
式（ｂ１－１１）中、
Ｌ^b24は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該飽和炭化水素
基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b25は、炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^b26は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該飽和炭化水素
基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアルキルカルボニルオキシ基に
置換されていてもよい。該アルキルカルボニルオキシ基に含まれる－ＣＨ₂－は、－Ｏ－
又は－ＣＯ－に置き換わっていてもよく、該アルキルカルボニルオキシ基に含まれる水素
原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b24、Ｌ^b25及びＬ^b26の合計炭素数は２１以下である。 Examples of the group represented by formula (b1-3) include groups represented by formulas (b1-9) to (b1-11).

In formula (b1-9),
L ^b19 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b20 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, a hydroxyl group or an alkylcarbonyloxy group. The --CH ₂ -- contained in the alkylcarbonyloxy group is --O--
Or, a hydrogen atom contained in the alkylcarbonyloxy group may be substituted by —CO—, and a hydrogen atom contained in the alkylcarbonyloxy group may be substituted by a hydroxy group.
However, the total number of carbon atoms of L ^b19 and L ^b20 is 23 or less.
In formula (b1-10),
L ^b21 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b22 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b23 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, a hydroxyl group or an alkylcarbonyloxy group. The --CH ₂ -- contained in the alkylcarbonyloxy group is --O--
Or, a hydrogen atom contained in the alkylcarbonyloxy group may be substituted by —CO—, and a hydrogen atom contained in the alkylcarbonyloxy group may be substituted by a hydroxy group.
However, the total number of carbon atoms of L ^b21 , L ^b22 and L ^b23 is 21 or less.
In formula (b1-11),
L ^b24 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b25 represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b26 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, a hydroxyl group or an alkylcarbonyloxy group. The --CH ₂ -- contained in the alkylcarbonyloxy group is --O--
Or, a hydrogen atom contained in the alkylcarbonyloxy group may be substituted by —CO—, and a hydrogen atom contained in the alkylcarbonyloxy group may be substituted by a hydroxy group.
However, the total number of carbon atoms of L ^b24 , L ^b25 and L ^b26 is 21 or less.

In addition, in the groups represented by formulae (b1-9) to (b1-11), when a hydrogen atom contained in the saturated hydrocarbon group is substituted with an alkylcarbonyloxy group,
The number of carbon atoms before substitution is regarded as the number of carbon atoms of the saturated hydrocarbon group.

Examples of the alkylcarbonyloxy group include an acetyloxy group, a propionyloxy group, a butyryloxy group, a cyclohexylcarbonyloxy group, and an adamantylcarbonyloxy group.

Examples of the group represented by formula (b1-4) include the following.

Examples of the group represented by formula (b1-5) include the following.

Examples of the group represented by formula (b1-6) include the following.

Examples of the group represented by formula (b1-7) include the following.

Examples of the group represented by formula (b1-8) include the following.

Examples of the group represented by formula (b1-2) include the following.

Examples of the group represented by formula (b1-9) include the following.

Examples of the group represented by formula (b1-10) include the following.

Examples of the group represented by formula (b1-11) include the following.

Ｙで表される脂環式炭化水素基としては、好ましくは式（Ｙ１）～式（Ｙ２０）、式（
Ｙ２６）、式（Ｙ２７）、式（Ｙ３０）、式（Ｙ３１）、式（Ｙ３９）又は式（Ｙ４０）
のいずれかで表される基であり、より好ましくは式（Ｙ１１）、式（Ｙ１５）、式（Ｙ１
６）、式（Ｙ２０）、式（Ｙ２６）、式（Ｙ２７）、式（Ｙ３０）、式（Ｙ３１）、式（
Ｙ３９）又は式（Ｙ４０）で表される基であり、さらに好ましくは式（Ｙ１１）、式（Ｙ
１５）、式（Ｙ２０）、式（Ｙ３０）、式（Ｙ３９）又は式（Ｙ４０）で表される基であ
る。
Ｙで表される脂環式炭化水素基が式（Ｙ２８）～式（Ｙ３５）等のスピロ環である場合
には、２つの酸素原子間のアルカンジイル基は、１以上のフッ素原子を有することが好ま
しい。また、ケタール構造に含まれるアルカンジイル基のうち、酸素原子に隣接するメチ
レン基には、フッ素原子が置換されていないのが好ましい。 The alicyclic hydrocarbon group represented by Y includes those represented by the formulae (Y1) to (Y11), (Y36) to (Y38)
Examples of the group include a group represented by the formula (Y38).
The —CH ₂ — contained in the alicyclic hydrocarbon group represented by Y is —O—, —S(O) ₂ — or —
When it is replaced by CO-, the number may be 1 or may be 2 or more. Examples of such a group include groups represented by formulae (Y12) to (Y35) and formulae (Y39) to (Y41).

The alicyclic hydrocarbon group represented by Y is preferably one represented by the formula (Y1) to the formula (Y20),
Y26), formula (Y27), formula (Y30), formula (Y31), formula (Y39) or formula (Y40).
More preferably, it is a group represented by any one of formulas (Y11), (Y15), and (Y1
6), formula (Y20), formula (Y26), formula (Y27), formula (Y30), formula (Y31), formula (
Y39) or (Y40), and more preferably a group represented by formula (Y11), formula (Y
15), a group represented by the formula (Y20), the formula (Y30), the formula (Y39) or the formula (Y40).
When the alicyclic hydrocarbon group represented by Y is a spiro ring such as those of formulae (Y28) to (Y35), the alkanediyl group between the two oxygen atoms preferably has one or more fluorine atoms. Furthermore, among the alkanediyl groups contained in the ketal structure, it is preferable that the methylene group adjacent to the oxygen atom is not substituted with a fluorine atom.

The substituent of the methyl group represented by Y is a halogen atom, a hydroxyl group, a C3-C1
6 alicyclic hydrocarbon group, an aromatic hydrocarbon group having 6 to 18 carbon atoms, a glycidyloxy group, -(
a —(CH ₂ ) _ja —CO—O—R ^b1 group or a —(CH ₂ ) _ja —O—CO—R ^b1 group, wherein R ^b1 is
represents an alkyl group having 1 to 16 carbon atoms, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or a combination thereof. ja represents an integer of 0 to 4. -CH ₂ - contained in the alkyl group having 1 to 16 carbon atoms and the alicyclic hydrocarbon group having 3 to 16 carbon atoms may be replaced by -O-, -S(O) ₂ - or -CO-.
Examples of the substituent of the alicyclic hydrocarbon group represented by Y include a halogen atom, a hydroxy group, an alkyl group having 1 to 12 carbon atoms which may be substituted by a hydroxy group, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, an aralkyl group having 7 to 21 carbon atoms, an alkylcarbonyl group having 2 to 4 carbon atoms, a glycidyloxy group, a -(CH ₂ ) _ja -CO-O-R ^b1 group, or a -(CH ₂ ) _ja -O-CO-R ^b1 group (wherein R
^b1 is an alkyl group having 1 to 16 carbon atoms, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, or a
represents an aromatic hydrocarbon group of SEQ ID NO:18 or a combination thereof. ja represents an integer of 0 to 4. The -CH ₂ - contained in the alkyl group having 1 to 16 carbon atoms and the alicyclic hydrocarbon group having 3 to 16 carbon atoms may be replaced by -O-, -S(O) ₂ - or -CO-.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Examples of the alicyclic hydrocarbon group include a cyclopentyl group, a cyclohexyl group, a methylcyclohexyl group, a dimethylcyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, and an adamantyl group.
Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, an anthryl group, a p-methylphenyl group, a p-tert-butylphenyl group, a p-adamantylphenyl group; a tolyl group, a xylyl group, a cumenyl group, a mesityl group, a biphenyl group, a phenanthryl group, a 2,6
-diethylphenyl group, 2-methyl-6-ethylphenyl and other aryl groups.
Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, a hexyl group, a heptyl group, a 2-ethylhexyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, and a dodecyl group.
Examples of the alkyl group substituted with a hydroxy group include hydroxyalkyl groups such as a hydroxymethyl group and a hydroxyethyl group.
Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, a decyloxy group, and a dodecyloxy group.
Examples of the aralkyl group include a benzyl group, a phenethyl group, a phenylpropyl group, a naphthylmethyl group, and a naphthylethyl group.
Examples of the alkylcarbonyl group include an acetyl group, a propionyl group, and a butyryl group.

Examples of Y include the following.

Y is preferably an alicyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent, more preferably an adamantyl group which may have a substituent, in which -CH ₂ - constituting the alicyclic hydrocarbon group or the adamantyl group may be replaced by -CO-, -S(O) ₂ - or -CO-, and further preferably an adamantyl group, a hydroxyadamantyl group, an oxoadamantyl group or a group represented by the following:

The anion in the salt represented by formula (B1) is selected from the group consisting of the anions represented by formulae (B1-A-1) to (B1-
Anions represented by the formula (B1-A-1) to (B1-A-4) and the formula (B1-A-55) (hereinafter, they may be referred to as "anion (B1-A-1)" depending on the formula number) are preferred, and anions represented by the formula (B1-A-1) to (B1-A-4) and the formula (B1-A-56) are preferred.
-A-9), Formula (B1-A-10), Formula (B1-A-24) to Formula (B1-A-33), Formula (B1-A-36) to Formula (B1-A-40), Formula (B1-A-47) to Formula (B1-A-5)
5) is more preferable.

Here, R ⁱ² to R ⁱ⁷ are each independently, for example, an alkyl group having 1 to 4 carbon atoms, preferably a methyl group or an ethyl group. ^{R i8} is, for example, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 5 to 12 carbon atoms, or a group formed by combining these, more preferably a methyl group, an ethyl group, a cyclohexyl group, or an adamantyl group. L ^A41 is a single bond or an alkanediyl group having 1 to 4 carbon atoms.
Q ^b1 and Q ^b2 have the same meanings as above.
Specific examples of the sulfonate anion in the salt represented by formula (B1) include those described in JP-A-2003-231112.
Examples of the anions include those described in Japanese Patent Publication No. 10-204646.

The anion in the salt represented by formula (B1) is preferably a compound represented by formula (B1a-1) to formula (B1a-2).
B1a-34) are examples of anions.

Among them, the compounds represented by formula (B1a-1) to formula (B1a-3) and the compounds represented by formula (B1a-7) to formula (B1a-
16), formula (B1a-18), formula (B1a-19), formula (B1a-22) to formula (B1a-
34) is preferably an anion represented by any one of the following:

The organic cation of Z1 ⁺ may be an organic onium cation, an organic sulfonium cation,
Examples of the cation include an organic iodonium cation, an organic ammonium cation, a benzothiazolium cation, and an organic phosphonium cation. Among these, an organic sulfonium cation and an organic iodonium cation are preferred, and an arylsulfonium cation is more preferred. Specific examples include cations represented by any one of formulas (b2-1) to (b2-4) (hereinafter, sometimes referred to as "cation (b2-1)" depending on the formula number).

式（ｂ２－１）～式（ｂ２－４）において、
Ｒ^b4～Ｒ^b6は、それぞれ独立に、炭素数１～３０の脂肪族炭化水素基、炭素数３～３６
の脂環式炭化水素基又は炭素数６～３６の芳香族炭化水素基を表し、該脂肪族炭化水素基
に含まれる水素原子は、ヒドロキシ基、炭素数１～１２のアルコキシ基、炭素数３～１２
の脂環式炭化水素基又は炭素数６～１８の芳香族炭化水素基で置換されていてもよく、該
脂環式炭化水素基に含まれる水素原子は、ハロゲン原子、炭素数１～１８の脂肪族炭化水
素基、炭素数２～４のアルキルカルボニル基又はグリシジルオキシ基で置換されていても
よく、該芳香族炭化水素基に含まれる水素原子は、ハロゲン原子、ヒドロキシ基又は炭素
数１～１２のアルコキシ基で置換されていてもよい。
Ｒ^b4とＲ^b5とは、互いに結合してそれらが結合する硫黄原子と一緒になって環を形成し
てもよく、該環に含まれる－ＣＨ₂－は、－Ｏ－、－Ｓ－又は－ＣＯ－に置き換わっても
よい。
Ｒ^b7及びＲ^b8は、それぞれ独立に、ヒドロキシ基、炭素数１～１２の脂肪族炭化水素基
又は炭素数１～１２のアルコキシ基を表す。
ｍ２及びｎ２は、それぞれ独立に０～５のいずれかの整数を表す。
ｍ２が２以上のとき、複数のＲ^b7は同一でも異なってもよく、ｎ２が２以上のとき、複
数のＲ^b8は同一でも異なってもよい。
Ｒ^b9及びＲ^b10は、それぞれ独立に、炭素数１～３６の脂肪族炭化水素基又は炭素数３
～３６の脂環式炭化水素基を表す。
Ｒ^b9とＲ^b10とは、互いに結合してそれらが結合する硫黄原子と一緒になって環を形成
してもよく、該環に含まれる－ＣＨ₂－は、－Ｏ－、－Ｓ－又は－ＣＯ－に置き換わって
もよい。
Ｒ^b11は、水素原子、炭素数１～３６の脂肪族炭化水素基、炭素数３～３６の脂環式炭
化水素基又は炭素数６～１８の芳香族炭化水素基を表す。
Ｒ^b12は、炭素数１～１２の脂肪族炭化水素基、炭素数３～１８の脂環式炭化水素基又
は炭素数６～１８の芳香族炭化水素基を表し、該脂肪族炭化水素に含まれる水素原子は、
炭素数６～１８の芳香族炭化水素基で置換されていてもよく、該芳香族炭化水素基に含ま
れる水素原子は、炭素数１～１２のアルコキシ基又は炭素数１～１２のアルキルカルボニ
ルオキシ基で置換されていてもよい。
Ｒ^b11とＲ^b12とは、互いに結合してそれらが結合する－ＣＨ－ＣＯ－を含めて環を形成
していてもよく、該環に含まれる－ＣＨ₂－は、－Ｏ－、－Ｓ－又は－ＣＯ－に置き換わ
ってもよい。
Ｒ^b13～Ｒ^b18は、それぞれ独立に、ヒドロキシ基、炭素数１～１２の脂肪族炭化水素基
又は炭素数１～１２のアルコキシ基を表す。
Ｌ^b31は、硫黄原子又は酸素原子を表す。
ｏ２、ｐ２、ｓ２、及びｔ２は、それぞれ独立に、０～５のいずれかの整数を表す。
ｑ２及びｒ２は、それぞれ独立に、０～４のいずれかの整数を表す。
ｕ２は０又は１を表す。
ｏ２が２以上のとき、複数のＲ^b13は同一又は相異なり、ｐ２が２以上のとき、複数の
Ｒ^b14は同一又は相異なり、ｑ２が２以上のとき、複数のＲ^b15は同一又は相異なり、ｒ２
が２以上のとき、複数のＲ^b16は同一又は相異なり、ｓ２が２以上のとき、複数のＲ^b17は
同一又は相異なり、ｔ２が２以上のとき、複数のＲ^b18は同一又は相異なる。

In formulas (b2-1) to (b2-4),
R ^b4 to R ^b6 each independently represent an aliphatic hydrocarbon group having 1 to 30 carbon atoms,
or an aromatic hydrocarbon group having 6 to 36 carbon atoms, and the hydrogen atom contained in the aliphatic hydrocarbon group is selected from the group consisting of a hydroxy group, an alkoxy group having 1 to 12 carbon atoms, and an aromatic hydrocarbon group having 3 to 12 carbon atoms.
or an aromatic hydrocarbon group having 6 to 18 carbon atoms, a hydrogen atom contained in the alicyclic hydrocarbon group may be substituted with a halogen atom, an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an alkylcarbonyl group having 2 to 4 carbon atoms or a glycidyloxy group, and a hydrogen atom contained in the aromatic hydrocarbon group may be substituted with a halogen atom, a hydroxy group or an alkoxy group having 1 to 12 carbon atoms.
R ^b4 and R ^b5 may be bonded to each other to form a ring together with the sulfur atom to which they are bonded, and --CH ₂ -- contained in the ring may be replaced by --O--, --S-- or --CO--.
R ^b7 and R ^b8 each independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
m2 and n2 each independently represent an integer of 0 to 5.
When m2 is 2 or more, multiple R ^b7s may be the same or different, and when n2 is 2 or more, multiple R ^b8s may be the same or different.
R ^b9 and R ^b10 each independently represent an aliphatic hydrocarbon group having 1 to 36 carbon atoms or a substituted or unsubstituted aryl group having 3 carbon atoms.
represents an alicyclic hydrocarbon group of 1 to 36;
R ^b9 and R ^b10 may be bonded to each other to form a ring together with the sulfur atom to which they are bonded, and --CH ₂ -- contained in the ring may be replaced by --O--, --S-- or --CO--.
R ^b11 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 36 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms.
R ^b12 represents an aliphatic hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms, and a hydrogen atom contained in the aliphatic hydrocarbon group is
It may be substituted with an aromatic hydrocarbon group having 6 to 18 carbon atoms, and a hydrogen atom contained in the aromatic hydrocarbon group may be substituted with an alkoxy group having 1 to 12 carbon atoms or an alkylcarbonyloxy group having 1 to 12 carbon atoms.
R ^b11 and R ^b12 may be bonded to each other to form a ring including the --CH--CO-- to which they are bonded, and --CH ₂ -- contained in the ring may be replaced by --O--, --S-- or --CO--.
R ^b13 to R ^b18 each independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
L ^b31 represents a sulfur atom or an oxygen atom.
o2, p2, s2, and t2 each independently represent an integer of 0 to 5.
q2 and r2 each independently represent an integer of 0 to 4.
u2 represents 0 or 1.
When o2 is 2 or more, a plurality of R ^b13 are the same or different; when p2 is 2 or more, a plurality of R ^b14 are the same or different; when q2 is 2 or more, a plurality of R ^b15 are the same or different;
When s2 is 2 or more, multiple R ^b16 are the same or different; when s2 is 2 or more, multiple R ^b17 are the same or different; when t2 is 2 or more, multiple R ^b18 are the same or different.

特に、Ｒ^b9～Ｒ^b12の脂環式炭化水素基は、好ましくは炭素数３～１８、より好ましく
は炭素数４～１２である。 Examples of the aliphatic hydrocarbon group include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, pentyl, hexyl, octyl and 2-ethylhexyl. In particular, the aliphatic hydrocarbon groups of R ^b9 to R ^b12 preferably have 1 to 12 carbon atoms.
The alicyclic hydrocarbon group may be either monocyclic or polycyclic, and examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, and cyclodecyl groups. Examples of the polycyclic alicyclic hydrocarbon group include decahydronaphthyl, adamantyl, and norbornyl groups, as well as the following groups:

In particular, the alicyclic hydrocarbon groups of R ^b9 to R ^b12 preferably have 3 to 18 carbon atoms, and more preferably have 4 to 12 carbon atoms.

Examples of the alicyclic hydrocarbon group in which a hydrogen atom is substituted with an aliphatic hydrocarbon group include a methylcyclohexyl group, a dimethylcyclohexyl group, a 2-methyladamantan-2-yl group, a 2-ethyladamantan-2-yl group, a 2-isopropyladamantan-2-yl group, a methylnorbornyl group, an isobornyl group, etc. In the alicyclic hydrocarbon group in which a hydrogen atom is substituted with an aliphatic hydrocarbon group, the total number of carbon atoms in the alicyclic hydrocarbon group and the aliphatic hydrocarbon group is preferably 20 or less.

Examples of the aromatic hydrocarbon group include aryl groups such as a phenyl group, a biphenyl group, a naphthyl group, and a phenanthryl group. The aromatic hydrocarbon group may have a chain hydrocarbon group or an alicyclic hydrocarbon group, and examples of the aromatic hydrocarbon group include aromatic hydrocarbon groups having a chain hydrocarbon group (such as a tolyl group, a xylyl group, a cumenyl group, a mesityl group, a p-ethylphenyl group, a p-tert-butylphenyl group, a 2,6-diethylphenyl group, and a 2-methyl-6-ethylphenyl group) and aromatic hydrocarbon groups having an alicyclic hydrocarbon group (such as a p-adamantylphenyl group and a p-cyclohexylphenyl group).
In addition, when the aromatic hydrocarbon group has an aliphatic hydrocarbon group or an alicyclic hydrocarbon group,
Aliphatic hydrocarbon groups having 1 to 18 carbon atoms and alicyclic hydrocarbon groups having 3 to 18 carbon atoms are preferred.
An example of the aromatic hydrocarbon group in which a hydrogen atom is substituted with an alkoxy group is a p-methoxyphenyl group.
Examples of the aliphatic hydrocarbon group in which a hydrogen atom has been substituted with an aromatic hydrocarbon group include aralkyl groups such as a benzyl group, a phenethyl group, a phenylpropyl group, a trityl group, a naphthylmethyl group, and a naphthylethyl group.

Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, a decyloxy group, and a dodecyloxy group.
Examples of the alkylcarbonyl group include an acetyl group, a propionyl group, and a butyryl group.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Examples of the alkylcarbonyloxy group include a methylcarbonyloxy group, an ethylcarbonyloxy group, a propylcarbonyloxy group, an isopropylcarbonyloxy group, a butylcarbonyloxy group, a sec-butylcarbonyloxy group, a tert-butylcarbonyloxy group, a pentylcarbonyloxy group, a hexylcarbonyloxy group, an octylcarbonyloxy group, and a 2-ethylhexylcarbonyloxy group.

The ring formed by R ^b4 and R ^b5 bonding to each other together with the sulfur atom to which they are bonded may be any of monocyclic, polycyclic, aromatic, non-aromatic, saturated and unsaturated rings. Examples of this ring include rings having 3 to 18 carbon atoms, and preferably rings having 4 to 18 carbon atoms. Examples of the ring containing a sulfur atom include 3- to 12-membered rings, and preferably 3- to 7-membered rings, and examples of such rings include the following rings. * represents a bonding site.

The ring formed by R ^b9 and R ^b10 together may be any of monocyclic, polycyclic, aromatic, non-aromatic, saturated and unsaturated rings. This ring may be a 3- to 12-membered ring, preferably a 3- to 7-membered ring. Examples of the ring include a thiolane-1-ium ring (tetrahydrothiophenium ring), a thian-1-ium ring, and a 1,4-oxathiane-4-ium ring.
The ring formed by R ^b11 and R ^b12 together may be any of monocyclic, polycyclic, aromatic, non-aromatic, saturated and unsaturated rings. This ring may be a 3- to 12-membered ring, preferably a 3- to 7-membered ring. Examples of the ring include an oxocycloheptane ring, an oxocyclohexane ring, an oxonorbornane ring, and an oxoadamantane ring.

Among the cations (b2-1) to (b2-4), the cation (b2
-1).
Examples of the cation (b2-1) include the following cations.

Examples of the cation (b2-2) include the following cations.

Examples of the cation (b2-3) include the following cations.

Examples of the cation (b2-4) include the following cations.

The acid generator (B) is a combination of the above-mentioned anion and the above-mentioned organic cation, which can be combined in any desired manner. The acid generator (B) is preferably represented by the formula (B1a-1) to
Formula (B1a-3), Formula (B1a-7) to Formula (B1a-16), Formula (B1a-18), Formula (
and a combination of an anion represented by any one of formulas (B1a-19), (B1a-22) to (B1a-34) and a cation (b2-1) or (b2-3).

As the acid generator (B), preferred are those represented by formulas (B1-1) to (B1-48), and among them, those containing an arylsulfonium cation are preferred.
Formula (B1-1) to Formula (B1-3), Formula (B1-5) to Formula (B1-7), Formula (B1-11)
~Formula (B1-14), Formula (B1-20) ~Formula (B1-26), Formula (B1-29), Formula (B
Those represented by formulas (B1-31) to (B1-48) are particularly preferred.

In the resist composition of the present invention, the content of the acid generator (B) is preferably from 1 part by mass to 40 parts by mass, more preferably from 3 parts by mass to 30 parts by mass, based on 100 parts by mass of the resin (A).
The amount is preferably 5 parts by weight or less, and more preferably from 10 to 35 parts by weight. The resist composition of the present invention may contain one type of acid generator (B) alone, or may contain multiple types.

In the resist composition of the present invention, the content of the carboxylate (I) is preferably from 0.1% by mass to 35% by mass, and more preferably from 0.5% by mass to 30% by mass, based on the solid content of the resist composition.
% by mass or less is more preferable, and 1% by mass or more and 25% by mass or less is even more preferable.

<Resin (A)>
Resin (A) has a structural unit having an acid labile group (hereinafter, may be referred to as "structural unit (a1)"). Resin (A) preferably further contains a structural unit other than the structural unit (a1). The structural unit other than the structural unit (a1) may be a structural unit not having an acid labile group (
hereinafter, may be referred to as “structural unit (s)”), structural units other than the structural unit (a1) and the structural unit (s) (for example, a structural unit having a halogen atom described later (hereinafter, may be referred to as “structural unit (a4)”)
"), a structural unit having a non-leaving hydrocarbon group described below (hereinafter referred to as a "structural unit (
a5)) and other structural units derived from monomers known in the art.

［式（１）中、Ｒ^a1、Ｒ^a2Ｒ^a3は、それぞれ独立に、炭素数１～８のアルキル基、炭素
数３～２０の脂環式炭化水素基又はこれらを組み合わせた基を表すか、Ｒ^a1及びＲ^a2は互
いに結合してそれらが結合する炭素原子とともに炭素数３～２０の脂環式炭化水素基を形
成する。
ｍａ及びｎａは、それぞれ独立して、０又は１を表し、ｍａ及びｎａの少なくとも一方
は１を表す。
＊は結合部位を表す。］

［式（２）中、Ｒ^a1’及びＲ^a2’は、それぞれ独立に、水素原子又は炭素数１～１２の
炭化水素基を表し、Ｒ^a3’は、炭素数１～２０の炭化水素基を表すか、Ｒ^a2’及びＲ^a3’
は互いに結合してそれらが結合する炭素原子及びＸとともに炭素数３～２０の複素環基を
形成し、該炭化水素基及び該複素環基に含まれる－ＣＨ_２－は、－Ｏ－又は－Ｓ－で置き
換わってもよい。
Ｘは、酸素原子又は硫黄原子を表す。
ｎａ’は、０又は１を表す。
＊は結合部位を表す。］ <Structural Unit (a1)>
The structural unit (a1) is derived from a monomer having an acid labile group (hereinafter, may be referred to as "monomer (a1)").
The acid labile group contained in the resin (A) is preferably a group represented by formula (1) (hereinafter also referred to as group (1)) and/or a group represented by formula (2) (hereinafter also referred to as group (2)).

[In formula (1), R ^a1 , R ^a2 and R ^a3 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a combination thereof, or R ^a1 and R ^a2 are bonded to each other to form an alicyclic hydrocarbon group having 3 to 20 carbon atoms together with the carbon atom to which they are bonded.
ma and na each independently represent 0 or 1, and at least one of ma and na represents 1.
* indicates a binding site.]

[In formula (2), R ^a1' and R ^a2' each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R ^a3' represents a hydrocarbon group having 1 to 20 carbon atoms, or R ^a2' and R ^a3'
are bonded to each other to form, together with the carbon atom to which they are bonded and X, a heterocyclic group having 3 to 20 carbon atoms, and -CH ₂ - contained in the hydrocarbon group and the heterocyclic group may be replaced by -O- or -S-.
X represents an oxygen atom or a sulfur atom.
na′ represents 0 or 1.
* indicates a binding site.]

アルキル基と脂環式炭化水素基とを組み合わせた基としては、例えば、メチルシクロヘ
キシル基、ジメチルシクロへキシル基、メチルノルボルニル基、シクロヘキシルメチル基
、アダマンチルメチル基、アダマンチルジメチル基、ノルボルニルエチル基等が挙げられ
る。
好ましくは、ｍａは０であり、ｎａは１である。
Ｒ^a1及びＲ^a2が互いに結合して脂環式炭化水素基を形成する場合の－Ｃ（Ｒ^a1）（Ｒ^a2
）（Ｒ^a3）としては、下記の基が挙げられる。脂環式炭化水素基は、好ましくは炭素数３
～１２である。＊は－Ｏ－との結合部位を表す。

The alkyl group represented by R ^a1 , R ^a2 and R ^a3 is a methyl group, an ethyl group, a propyl group,
Examples of the alkyl group include a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group.
The alicyclic hydrocarbon group in R ^a1 , R ^a2 and R ^a3 may be either monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group and a cyclooctyl group. Examples of the polycyclic alicyclic hydrocarbon group include a decahydronaphthyl group, an adamantyl group, a norbornyl group and the following groups (
The alicyclic hydrocarbon group of ^{R a1} , R ^a2 and R ^a3 preferably has 3 to 16 carbon atoms.

Examples of the group formed by combining an alkyl group with an alicyclic hydrocarbon group include a methylcyclohexyl group, a dimethylcyclohexyl group, a methylnorbornyl group, a cyclohexylmethyl group, an adamantylmethyl group, an adamantyldimethyl group, and a norbornylethyl group.
Preferably, ma is 0 and na is 1.
When R ^a1 and R ^a2 are bonded to each other to form an alicyclic hydrocarbon group, —C(R ^a1 )(R ^a2
The alicyclic hydrocarbon group (R ^a3 ) is preferably a group having 3 carbon atoms.
1 to 12. * represents the bonding site with --O--.

Ｒ^a1’及びＲ^a2’のうち、少なくとも１つは水素原子であることが好ましい。
ｎａ’は、好ましくは０である。 Examples of the hydrocarbon group in R ^a1' , R ^a2' and R ^a3' include an alkyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group and a group formed by combining these groups.
Examples of the alkyl group and alicyclic hydrocarbon group include the same groups as those exemplified for R ^a1 , R ^a2 and R ^a3 .
Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, an anthryl group, a biphenyl group,
Examples of the aryl group include a phenanthryl group and the like.
Examples of the combined groups include groups in which the above-mentioned alkyl groups and alicyclic hydrocarbon groups are combined (for example, cycloalkylalkyl groups), aralkyl groups such as a benzyl group, and aromatic hydrocarbon groups having an alkyl group (p-methylphenyl group, p-tert-butylphenyl group, tolyl group, xylyl group, cumenyl group, mesityl group, 2,6-diethylphenyl group, 2-methyl-
6-ethylphenyl group, etc.), aromatic hydrocarbon groups having an alicyclic hydrocarbon group (p-cyclohexylphenyl group, p-adamantylphenyl group, etc.), and aryl-cyclohexyl groups such as phenylcyclohexyl group.
When R ^a2' and R ^a3' are bonded to each other to form a divalent heterocyclic group together with the carbon atom to which they are bonded and X, -C(R ^a1' )(R ^a3' )-X-R ^a2' includes the following groups: * represents a bonding site.

At least one of R ^a1' and R ^a2' is preferably a hydrogen atom.
na′ is preferably 0.

Examples of the group (1) include the following groups.
In formula (1), R ^a1 , R ^a2 and R ^a3 are alkyl groups, ma=0, and na=1.
The group is preferably a tert-butoxycarbonyl group.
A group in which R ^a1 and R ^a2 together with the carbon atom to which they are bonded form an adamantyl group, R ^a3 is an alkyl group, ma=0, and na=1 in the formula (1).
A group represented by formula (1), in which R ^a1 and R ^a2 each independently represent an alkyl group, R ^a3 represents an adamantyl group, ma=0, and na=1.
Specific examples of the group (1) include the following groups: * represents a binding site.

Specific examples of the group (2) include the following groups: * represents a bonding site.

The monomer (a1) is preferably a monomer having an acid labile group and an ethylenically unsaturated bond, more preferably a (meth)acrylic monomer having an acid labile group.

Of the (meth)acrylic monomers having an acid labile group, those having 5 to 20 carbon atoms are preferred.
By using a resin (A) that has a structural unit derived from a monomer (a1) that has a bulky structure such as an alicyclic hydrocarbon group, in a resist composition, the resolution of the resist pattern can be improved.

［式（ａ１－０）、式（ａ１－１）及び式（ａ１－２）中、
Ｌ^a01、Ｌ^a1及びＬ^a2は、それぞれ独立に、－Ｏ－又は^＊－Ｏ－（ＣＨ_２）_k1－ＣＯ－
Ｏ－を表し、ｋ１は１～７のいずれかの整数を表し、＊は－ＣＯ－との結合部位を表す。
Ｒ^a01、Ｒ^a4及びＲ^a5は、それぞれ独立に、水素原子又はメチル基を表す。
Ｒ^a02、Ｒ^a03及びＲ^a04は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～
１８の脂環式炭化水素基又はこれらを組み合わせた基を表す。
Ｒ^a6及びＲ^a7は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～１８の脂環
式炭化水素基又はこれらを組合せることにより形成される基を表す。
ｍ１は０～１４のいずれかの整数を表す。
ｎ１は０～１０のいずれかの整数を表す。
ｎ１’は０～３のいずれかの整数を表す。］ As a structural unit derived from a (meth)acrylic monomer having a group (1),
0) (hereinafter, may be referred to as structural unit (a1-0)),
-1) (hereinafter, may be referred to as structural unit (a1-1)) and a structural unit represented by the formula (
a1-2) (hereinafter, sometimes referred to as structural unit (a1-2)). Preferably, it is at least one structural unit selected from the group consisting of the structural unit (a1-1) and the structural unit (a1-2). These may be used alone or in combination of two or more.

[In formula (a1-0), formula (a1-1) and formula (a1-2),
L ^a01 , L ^a1 and L ^a2 each independently represent -O- or ^* -O-(CH ₂ ) _k1 -CO-
k1 represents an integer of 1 to 7, and * represents a bonding site with —CO—.
R ^a01 , R ^a4 and R ^a5 each independently represent a hydrogen atom or a methyl group.
R ^a02 , R ^a03 and R ^a04 each independently represent an alkyl group having 1 to 8 carbon atoms,
18 represents an alicyclic hydrocarbon group or a combination thereof.
R ^a6 and R ^a7 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group formed by combining these.
m1 represents an integer of 0 to 14.
n1 represents an integer of 0 to 10.
n1' represents an integer of 0 to 3.

R ^a01 , R ^a4 and R ^a5 are preferably a methyl group.
L ^a01 , L ^a1 and L ^a2 are preferably an oxygen atom or *-O-(CH ₂ ) _k01 -CO-O-
(wherein k01 is preferably an integer of 1 to 4, more preferably 1), and is more preferably an oxygen atom.
Examples of the alkyl group, alicyclic hydrocarbon group and combination of these groups in R ^a02 , R ^a03 , R ^a04 , R ^a6 and R ^a7 include the same groups as those exemplified for R ^a1 , R ^a2 and R ^a3 in formula (1).
The number of carbon atoms in the alkyl group for R ^a02 , R ^a03 , and R ^a04 is preferably 1 to 6.
More preferably, it is a methyl group or an ethyl group, and even more preferably, it is a methyl group.
The alkyl group in R ^a6 and R ^a7 preferably has 1 to 6 carbon atoms, is more preferably a methyl group, an ethyl group, or an isopropyl group, and is even more preferably an ethyl group or an isopropyl group.
The number of carbon atoms in the alicyclic hydrocarbon group of R ^a02 , R ^a03 and R ^a04 is preferably 5 to 12,
More preferably, it is 5 to 10.
In the group in which an alkyl group and an alicyclic hydrocarbon group are combined, the total number of carbon atoms in the combination of the alkyl group and the alicyclic hydrocarbon group is preferably 18 or less.
R ^a02 and R ^a03 are preferably an alkyl group having 1 to 6 carbon atoms, more preferably a methyl group or an ethyl group.
R ^a04 is preferably an alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 5 to 12 carbon atoms, and more preferably a methyl group, an ethyl group, a cyclohexyl group or an adamantyl group.
R ^a6 and R ^a7 are preferably an alkyl group having 1 to 6 carbon atoms, more preferably a methyl group, an ethyl group or an isopropyl group, and even more preferably an ethyl group or an isopropyl group.
m1 is preferably an integer of 0 to 3, and more preferably 0 or 1.
n1 is preferably an integer of 0 to 3, and more preferably 0 or 1.
n1' is preferably 0 or 1.

Examples of the structural unit (a1-0) include those represented by the formulae (a1-0-1) to (a1-0-12):
and structural units in which a methyl group corresponding to R ^a01 in the structural unit (a1-0) is replaced with a hydrogen atom.
-10) is preferred.

Examples of the structural unit (a1-1) include structural units derived from monomers described in JP-A-2010-204646. Among them, the structural units represented by the formulae (a1-1-1) to (a1
-1-4) and a structural unit in which the methyl group corresponding to R ^a4 in the structural unit (a1-1) is replaced with a hydrogen atom, and
a1-1-4) is more preferable.

Examples of the structural unit (a1-2) include structural units represented by any one of formulas (a1-2-1) to (a1-2-6) and structural units in which a methyl group corresponding to R ^a5 in the structural unit (a1-2) is replaced with a hydrogen atom, and structural units represented by formulas (a1-2-2), (a1-2-5) and (a1-2-6) are preferred.

When the resin (A) contains the structural unit (a1-0), the content thereof is usually 5 to 60 mol %, preferably 5 to 50 mol %, and more preferably 10 to 40 mol %, based on all structural units in the resin (A).
When resin (A) contains the structural unit (a1-1) and/or the structural unit (a1-2), the total content thereof is usually 10 to 95 mol %, preferably 15 to 90 mol %, more preferably 20 to 85 mol %, even more preferably 25 to 80 mol %, and still more preferably 30 to 75 mol %, based on all structural units in resin (A).

［式（ａ１－４）中、
Ｒ^a32は、水素原子、ハロゲン原子、又は、ハロゲン原子を有してもよい炭素数１～６
のアルキル基を表す。
Ｒ^a33は、ハロゲン原子、ヒドロキシ基、炭素数１～６のアルキル基、炭素数１～６の
アルコキシ基、炭素数２～４のアルキルカルボニル基、炭素数２～４のアルキルカルボニ
ルオキシ基、アクリロイルオキシ基又はメタクリロイルオキシ基を表す。
ｌａは０～４のいずれかの整数を表す。ｌａが２以上である場合、複数のＲ^a33は互い
に同一であっても異なってもよい。
Ｒ^a34及びＲ^a35はそれぞれ独立に、水素原子又は炭素数１～１２の炭化水素基を表し、
Ｒ^a36は、炭素数１～２０の炭化水素基を表すか、Ｒ^a35及びＲ^a36は互いに結合してそれ
らが結合する－Ｃ－Ｏ－とともに炭素数２～２０の２価の炭化水素基を形成し、該炭化水
素基及び該２価の炭化水素基に含まれる－ＣＨ₂－は、－Ｏ－又は－Ｓ－で置き換わって
もよい。］ An example of the structural unit (a1) having a group (2) is a structural unit represented by formula (a1-4) (hereinafter, sometimes referred to as "structural unit (a1-4)").

[In formula (a1-4),
R ^a32 is a hydrogen atom, a halogen atom, or a C1-6 alkyl group which may have a halogen atom.
represents an alkyl group represented by the formula:
R ^a33 represents a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylcarbonyl group having 2 to 4 carbon atoms, an alkylcarbonyloxy group having 2 to 4 carbon atoms, an acryloyloxy group or a methacryloyloxy group.
la represents an integer of 0 to 4. When la is 2 or more, multiple R ^a33 may be the same or different.
R ^a34 and R ^a35 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms;
R ^a36 represents a hydrocarbon group having 1 to 20 carbon atoms, or R ^a35 and R ^a36 are bonded to each other to form a divalent hydrocarbon group having 2 to 20 carbon atoms together with the -C-O- to which they are bonded, and the -CH ₂ - contained in the hydrocarbon group and the divalent hydrocarbon group may be replaced by -O- or -S-.]

Examples of the alkyl group in R ^a32 and R ^a33 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, a hexyl group, etc. The alkyl group is preferably an alkyl group having 1 to 4 carbon atoms, more preferably a methyl group or an ethyl group, and even more preferably a methyl group.
Examples of the halogen atom in R ^a32 and R ^a33 include a fluorine atom, a chlorine atom, and a bromine atom.
Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom include a trifluoromethyl group, a difluoromethyl group, a methyl group, a perfluoroethyl group, a 2,2,2-trifluoroethyl group, a 1,1,2,2-tetrafluoroethyl group, an ethyl group, a perfluoropropyl group, a 2,2,3,3,3-pentafluoropropyl group, a propyl group, a perfluorobutyl group, a 1,1,2,2,3,3,4,4-octafluorobutyl group, a butyl group, a perfluoropentyl group, a 2,2,3,3,4,4,5,5,5-nonafluoropentyl group, a pentyl group, a hexyl group, and a perfluorohexyl group.
Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, and a hexyloxy group. Among these, an alkoxy group having 1 to 4 carbon atoms is preferred, a methoxy group or an ethoxy group is more preferred, and a methoxy group is even more preferred.
Alkylcarbonyl groups include acetyl, propionyl and butyryl groups.
Examples of the alkylcarbonyloxy group include an acetyloxy group, a propionyloxy group, and a butyryloxy group.
The hydrocarbon group in R ^a34 , R ^a35 and R ^a36 includes an alkyl group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group, and includes the same groups as R ^a1' and R ^a2' in formula (2). In particular, R ^a36 includes an alkyl group having 1 to 18 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or a group formed by combining these.

In formula (a1-4), R ^a32 is preferably a hydrogen atom.
R ^a33 is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably a methoxy group or an ethoxy group, and even more preferably a methoxy group.
As la, 0 or 1 is preferable, and 0 is more preferable.
R ^a34 is preferably a hydrogen atom.
R ^a35 is preferably an alkyl group or an alicyclic hydrocarbon group having 1 to 12 carbon atoms, and more preferably a methyl group or an ethyl group.
The hydrocarbon group of R ^a36 is preferably an alkyl group having 1 to 18 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or a group formed by combining these, and more preferably an alkyl group having 1 to 18 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or a group formed by combining these.
The alkyl group and the alicyclic hydrocarbon group for R ^a36 are preferably unsubstituted. The aromatic hydrocarbon group for R ^a36 is preferably an aromatic ring having an aryloxy group having 6 to 10 carbon atoms.

The --OC(R ^a34 )(R ^a35 )--O--R ^a36 in the structural unit (a1-4) is eliminated on contact with an acid (eg, p-toluenesulfonic acid) to form a hydroxy group.

Examples of the structural unit (a1-4) include structural units derived from monomers described in JP-A-2010-204646.
and structural units in which the hydrogen atom corresponding to R ^a32 is replaced with a methyl group. More preferably, the structural units are represented by the formulas (a1-4-1) to (a1-4-
Examples of the structural units include those represented by formula (a1-4-10).

When resin (A) has the structural unit (a1-4), the content thereof is preferably 10 to 95 mol %, more preferably 15 to 90 mol %, even more preferably 20 to 85 mol %, even more preferably 20 to 70 mol %, and particularly preferably 20 to 60 mol %, based on the total of all structural units in resin (A).

式（ａ１－５）中、
Ｒ^a8は、ハロゲン原子を有してもよい炭素数１～６のアルキル基、水素原子又はハロゲ
ン原子を表す。
Ｚ^a1は、単結合又は＊－（ＣＨ₂）_h3－ＣＯ－Ｌ⁵⁴－を表し、ｈ３は１～４のいずれか
の整数を表し、＊は、Ｌ⁵¹との結合部位を表す。
Ｌ⁵¹、Ｌ⁵²、Ｌ⁵³及びＬ⁵⁴は、それぞれ独立に、－Ｏ－又は－Ｓ－を表す。
ｓ１は、１～３のいずれかの整数を表す。
ｓ１’は、０～３のいずれかの整数を表す。 The structural unit derived from a (meth)acrylic monomer having the group (2) is represented by the formula (a1
-5) (hereinafter, may be referred to as “structural unit (a1-5)”).

In formula (a1-5),
R ^a8 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.
Z ^a1 represents a single bond or *-(CH ₂ ) _h3 -CO-L ⁵⁴ -, h3 represents an integer of 1 to 4, and * represents the bonding site to L ⁵¹ .
L ⁵¹ , L ⁵² , L ⁵³ and L ⁵⁴ each independently represent --O-- or --S--.
s1 represents an integer of 1 to 3.
s1′ represents an integer of 0 to 3.

Examples of the halogen atom include a fluorine atom and a chlorine atom, with a fluorine atom being preferred.
Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom include a methyl group, an ethyl group,
Examples of such groups include propyl, butyl, pentyl, hexyl, heptyl, octyl, fluoromethyl and trifluoromethyl groups.
In formula (a1-5), R ^a8 is preferably a hydrogen atom, a methyl group or a trifluoromethyl group.
L ⁵¹ is preferably an oxygen atom.
It is preferable that one of L ⁵² and L ⁵³ is —O— and the other is —S—.
It is preferable that s1 is 1.
s1' is preferably an integer of 0 to 2.
Z ^a1 is preferably a single bond or *--CH ₂ --CO--O--.

Examples of the structural unit (a1-5) include structural units derived from monomers described in JP-A-2010-61117.
4), and the structural units represented by the formula (a1-5-1) or the formula (a1-5-2) are preferred.
) is more preferred.

When the resin (A) has the structural unit (a1-5), the content thereof is preferably from 1 to 50 mol %, more preferably from 3 to 45 mol %, and even more preferably from 5 to 40 mol %, based on the total structural units of the resin (A).
% by mole is more preferred, and 5 to 30 mol % is even more preferred.

Further, examples of the structural unit (a1) include the following structural units.

When the resin (A) contains the structural units (a1-3-1) to (a1-3-7) described above, the content thereof is preferably 10 to 95 mol %, more preferably 15 to 95 mol %, based on the total structural units of the resin (A).
Up to 90 mol % is more preferable, 20 to 85 mol % is even more preferable, 20 to 70 mol % is even more preferable, and 20 to 60 mol % is particularly preferable.

<Structural unit (s)>
The structural unit (s) is derived from a monomer having no acid labile group (hereinafter, may be referred to as "monomer (s)"). As the monomer from which the structural unit (s) is derived, a monomer having no acid labile group known in the resist field can be used.
The structural unit (s) preferably has a hydroxy group or a lactone ring. By using a resin having a structural unit having a hydroxy group and no acid labile group (hereinafter sometimes referred to as "structural unit (a2)") and/or a structural unit having a lactone ring and no acid labile group (hereinafter sometimes referred to as "structural unit (a3)") in the resist composition of the present invention, the resolution of the resist pattern and adhesion to the substrate can be improved.

<Structural unit (a2)>
The hydroxy group contained in the structural unit (a2) may be an alcoholic hydroxy group or a phenolic hydroxy group.
When a resist pattern is produced from the resist composition of the present invention, the exposure light source is KrF
When a high-energy ray such as an excimer laser (248 nm), an electron beam, or EUV (extreme ultraviolet light) is used, the structural unit (a2) may be a structural unit having a phenolic hydroxy group (
In addition, when an ArF excimer laser (193 nm) or the like is used, it is preferable to use a structural unit (a2) having an alcoholic hydroxyl group as the structural unit (a2).
) is preferable, and it is more preferable to use the structural unit (a2-1) described below.
As a2), one type may be contained alone, or two or more types may be contained.

［式（ａ２－Ａ）中、
Ｒ^a50は、水素原子、ハロゲン原子又はハロゲン原子を有してもよい炭素数１～６のア
ルキル基を表す。
Ｒ^a51は、ハロゲン原子、ヒドロキシ基、炭素数１～６のアルキル基、炭素数１～６の
アルコキシ基、炭素数２～４のアルキルカルボニル基、炭素数２～４のアルキルカルボニ
ルオキシ基、アクリロイルオキシ基又はメタクリロイルオキシ基を表す。
Ａ^a50は、単結合又は＊－Ｘ^a51－（Ａ^a52－Ｘ^a52）_nｂ－を表し、＊は－Ｒ^a50が結合す
る炭素原子との結合部位を表す。
Ａ^a52は、炭素数１～６のアルカンジイル基を表す。
Ｘ^a51及びＸ^a52は、それぞれ独立に、－Ｏ－、－ＣＯ－Ｏ－又は－Ｏ－ＣＯ－を表す。
ｎｂは、０又は１を表す。
ｍｂは０～４のいずれかの整数を表す。ｍｂが２以上のいずれかの整数である場合、複
数のＲ^a51は互いに同一であっても異なってもよい。］ The structural unit (a2) having a phenolic hydroxy group is represented by the formula (a2)
-A) (hereinafter, may be referred to as “structural unit (a2-A)”).

[In formula (a2-A),
R ^a50 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom.
R ^a51 represents a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylcarbonyl group having 2 to 4 carbon atoms, an alkylcarbonyloxy group having 2 to 4 carbon atoms, an acryloyloxy group or a methacryloyloxy group.
A ^a50 represents a single bond or *-X ^a51 -(A ^a52 -X ^a52 ) _nb -, where * represents the bonding site with the carbon atom to which -R ^a50 is bonded.
A ^a52 represents an alkanediyl group having 1 to 6 carbon atoms.
X ^a51 and X ^a52 each independently represent —O—, —CO—O— or —O—CO—.
nb represents 0 or 1.
and mb represents an integer of 0 to 4. When mb is an integer of 2 or more, multiple R ^a51 may be the same or different.

Examples of the halogen atom in R ^a50 include a fluorine atom, a chlorine atom, and a bromine atom.
Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom for R ^a50 include a trifluoromethyl group, a difluoromethyl group, a methyl group, a perfluoroethyl group, a 2,2,2
-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group, ethyl group, perfluoropropyl group, 2,2,3,3,3-pentafluoropropyl group, propyl group, perfluorobutyl group, 1,1,2,2,3,3,4,4-octafluorobutyl group, butyl group, perfluoropentyl group, 2,2,3,3,4,4,5,5,5-nonafluoropentyl group, pentyl group, hexyl group and perfluorohexyl group.
R ^a50 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, and even more preferably a hydrogen atom or a methyl group.
Examples of the alkyl group for R ^a51 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, and a hexyl group.
Examples of the alkoxy group for R ^a51 include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a sec-butoxy group, and a tert-butoxy group.
An alkoxy group having 1 to 4 carbon atoms is preferred, a methoxy group or an ethoxy group is more preferred, and a methoxy group is even more preferred.
Examples of the alkylcarbonyl group for R ^a51 include an acetyl group, a propionyl group, and a butyryl group.
The alkylcarbonyloxy group for R ^a51 includes an acetyloxy group, a propionyloxy group, and a butyryloxy group.
R ^a51 is preferably a methyl group.

*-X ^a51 -(A ^a52 -X ^a52 ) _nb - is *-O-, *-CO-O-, *-O-C
O-, *-CO-O-A ^a52 -CO-O-, *-O-CO-A ^a52 -O-, *-O-A ^a52
-CO-O-, *-CO-O-A ^a52 -O-CO-, *-O-CO-A ^a52 -O-CO-,
Among these, *-CO-O-, *-CO-O-A ^a52 -CO-O- or *-
O--A ^a52 --CO--O-- is preferred.

Examples of the alkanediyl group include a methylene group, an ethylene group, and a propane-1,3-diyl group.
Propane-1,2-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, butane-1,3-diyl group, 2-methylpropane-1,
Examples of the alkyl group include a 3-diyl group, a 2-methylpropane-1,2-diyl group, a pentane-1,4-diyl group, and a 2-methylbutane-1,4-diyl group.
A ^a52 is preferably a methylene group or an ethylene group.

A ^a50 is preferably a single bond, *-CO-O- or *-CO-O-A ^a52 -CO-O-, more preferably a single bond, *-CO-O- or *-CO-O-CH ₂ -CO-O-, further preferably a single bond or *-CO-O-.

mb is preferably 0, 1 or 2, more preferably 0 or 1, and particularly preferably 0.
The hydroxy group is preferably bonded to the o- or p-position of the benzene ring, and more preferably to the p-position.

Examples of the structural unit (a2-A) include those described in JP-A-2010-204634 and JP-A-2012-
Examples of the structural units include those derived from monomers described in US Pat. No. 5,12577.

Examples of the structural unit (a2-A) include structural units represented by formulae (a2-2-1) to (a2-2-6) and structural units in which a methyl group corresponding to R ^a50 in the structural unit (a2-A) is replaced with a hydrogen atom in the structural units represented by formulae (a2-2-1) to (a2-2-6).
A structural unit represented by formula (a2-2-3), a structural unit represented by formula (a2-2-6), a structural unit represented by formula (a2-2-1), a structural unit represented by formula (a2-2-3) or a structural unit represented by formula (a2-2-4)
In the structural unit represented by (a2-2-6), a methyl group corresponding to R ^a50 in the structural unit (a2-A) is preferably replaced with a hydrogen atom.

When the structural unit (a2-A) is contained in the resin (A), the content of the structural unit (a2-A) is preferably 5 to 80 mol %, more preferably 10 to 70 mol %, based on the total structural units.
% by mole, more preferably 15 to 65 mol %, and even more preferably 20 to 65 mol %.
65 mol %.
The structural unit (a2-A) can be incorporated into the resin (A) by, for example, polymerizing the structural unit (a1-4) and then treating with an acid such as p-toluenesulfonic acid. Alternatively, the structural unit (a2-A) can be incorporated into the resin (A) by polymerizing the structural unit (a1-4) and then treating with an alkali such as tetramethylammonium hydroxide.

式（ａ２－１）中、
Ｌ^a3は、－Ｏ－又は＊－Ｏ－（ＣＨ₂）_k2－ＣＯ－Ｏ－を表し、
ｋ２は１～７のいずれかの整数を表す。＊は－ＣＯ－との結合部位を表す。
Ｒ^a14は、水素原子又はメチル基を表す。
Ｒ^a15及びＲ^a16は、それぞれ独立に、水素原子、メチル基又はヒドロキシ基を表す。
ｏ１は、０～１０のいずれかの整数を表す。 As the structural unit (a2) having an alcoholic hydroxy group, the structural unit represented by the formula (
a2-1) (hereinafter, may be referred to as “structural unit (a2-1)”).

In formula (a2-1),
L ^a3 represents —O— or *—O—(CH ₂ ) _k2 —CO—O—;
k2 represents an integer of 1 to 7. * represents a bonding site with —CO—.
R ^a14 represents a hydrogen atom or a methyl group.
R ^a15 and R ^a16 each independently represent a hydrogen atom, a methyl group or a hydroxy group.
o1 represents an integer of 0 to 10.

In formula (a2-1), L ^a3 is preferably —O—, —O—(CH ₂ ) _f1 —CO—O—
(wherein f1 represents an integer of 1 to 4), and more preferably —O—.
R ^a14 is preferably a methyl group.
R ^a15 is preferably a hydrogen atom.
R ^a16 is preferably a hydrogen atom or a hydroxy group.
o1 is preferably an integer of 0 to 3, and more preferably 0 or 1.

Examples of the structural unit (a2-1) include structural units derived from monomers described in JP-A-2010-204646.
), and the structural unit represented by any one of the formulas (a2-1-1) to (a2-1-4) is preferred.
A structural unit represented by any one of the formulas (a2-1-1) or (a2-1-
The structural unit represented by 3) is more preferred.

When the resin (A) contains the structural unit (a2-1), the content thereof is usually 1 to 45 mol %, preferably 1 to 40 mol %, more preferably 1 to 35 mol %, even more preferably 2 to 20 mol %, and still more preferably 2 to 10 mol %, based on all structural units of the resin (A).

<Structural unit (a3)>
The lactone ring of the structural unit (a3) may be a monocyclic ring such as a β-propiolactone ring, a γ-butyrolactone ring, or a δ-valerolactone ring, or may be a condensed ring of a monocyclic lactone ring with another ring.
-Bridged ring containing a butyrolactone ring structure (for example, a structural unit represented by the following formula (a3-2))
Examples include:

［式（ａ３－１）、式（ａ３－２）、式（ａ３－３）及び式（ａ３－４）中、
Ｌ^a4、Ｌ^a5及びＬ^a6は、それぞれ独立に、－Ｏ－又は＊－Ｏ－（ＣＨ_２）_k3－ＣＯ－Ｏ
－（ｋ３は１～７のいずれかの整数を表す。）で表される基を表す。
Ｌ^a7は、－Ｏ－、＊－Ｏ－Ｌ^a8－Ｏ－、＊－Ｏ－Ｌ^a8－ＣＯ－Ｏ－、＊－Ｏ－Ｌ^a8－Ｃ
Ｏ－Ｏ－Ｌ^a9－ＣＯ－Ｏ－又は＊－Ｏ－Ｌ^a8－Ｏ－ＣＯ－Ｌ^a9－Ｏ－を表す。
Ｌ^a8及びＬ^a9は、それぞれ独立に、炭素数１～６のアルカンジイル基を表す。
＊はカルボニル基との結合部位を表す。
Ｒ^a18、Ｒ^a19及びＲ^a20は、それぞれ独立に、水素原子又はメチル基を表す。
Ｒ^a24は、ハロゲン原子を有してもよい炭素数１～６のアルキル基、水素原子又はハロ
ゲン原子を表す。
Ｘ^a3は、－ＣＨ_２－又は酸素原子を表す。
Ｒ^a21は炭素数１～４の脂肪族炭化水素基を表す。
Ｒ^a22、Ｒ^a23及びＲ^a25は、それぞれ独立に、カルボキシ基、シアノ基又は炭素数１～
４の脂肪族炭化水素基を表す。
ｐ１は０～５のいずれかの整数を表す。
ｑ１は、０～３のいずれかの整数を表す。
ｒ１は、０～３のいずれかの整数を表す。
ｗ１は、０～８のいずれかの整数を表す。
ｐ１、ｑ１、ｒ１及び／又はｗ１が２以上のとき、複数のＲ^a21、Ｒ^a22、Ｒ^a23及び／
又はＲ^a25は互いに同一であってもよく、異なっていてもよい。］ The structural unit (a3) is preferably represented by the formula (a3-1), the formula (a3-2), or the formula (a3-3):
or a structural unit represented by formula (a3-4).
Two or more types may be contained.

[In formula (a3-1), formula (a3-2), formula (a3-3) and formula (a3-4),
L ^a4 , L ^a5 and L ^a6 each independently represent —O— or *—O—(CH ₂ ) _k3 —CO—O
-(k3 represents an integer of 1 to 7).
L ^a7 is -O-, *-OL ^a8 -O-, *-OL ^a8 -CO-O-, *-OL ^a8 -C
It represents O--O--L ^a9 -CO--O-- or *--O--L ^a8 -O--CO--L ^a9 -O--.
L ^a8 and L ^a9 each independently represent an alkanediyl group having 1 to 6 carbon atoms.
* indicates the bonding site with the carbonyl group.
R ^a18 , R ^a19 and R ^a20 each independently represent a hydrogen atom or a methyl group.
R ^a24 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.
X ^a3 represents —CH ₂ — or an oxygen atom.
R ^a21 represents an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
R ^a22 , R ^a23 and R ^a25 each independently represent a carboxy group, a cyano group, or a C 1 to
4 represents an aliphatic hydrocarbon group.
p1 represents an integer of 0 to 5.
q1 represents an integer of 0 to 3.
r1 represents an integer of 0 to 3.
w1 represents an integer of 0 to 8.
When p1, q1, r1 and/or w1 is 2 or more, a plurality of R ^a21 , R ^a22 , R ^a23 and/or
Or, R ^a25 may be the same or different.

Examples of the aliphatic hydrocarbon group for R ^a21 , R ^a22 , R ^a23 and R ^a25 include alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group and a tert-butyl group.
The halogen atom for R ^a24 includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkyl group for ^R include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, and a hexyl group. Preferably, the alkyl group has 1 to 4 carbon atoms, and more preferably, a methyl group or an ethyl group.
Examples of the alkyl group having a halogen atom for R ^a24 include a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group, a perfluoropentyl group, a perfluorohexyl group, a trichloromethyl group, a tribromomethyl group, and a triiodomethyl group.
The alkanediyl group in L ^a8 and L ^a9 includes a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group, a butane-1,3-diyl group, a 2-
Examples include a methylpropane-1,3-diyl group, a 2-methylpropane-1,2-diyl group, a pentane-1,4-diyl group, and a 2-methylbutane-1,4-diyl group.

In formulae (a3-1) to (a3-3), L ^a4 to L ^a6 each independently represent preferably —O— or *-O-(CH ₂ ) _k3 -CO-O-, where k3 is an integer from 1 to 4, more preferably —O— and *-O-CH ₂ -CO-O-, and even more preferably an oxygen atom.
R ^a18 to R ^a21 are preferably methyl groups.
R ^a22 and R ^a23 each independently represent preferably a carboxy group, a cyano group, or a methyl group.
p1, q1 and r1 each independently represent an integer of preferably 0 to 2;
More preferably, it is 0 or 1.

（式中、Ｒ^a24、Ｌ^a7は、上記と同じ意味を表す。） In formula (a3-4), R ^a24 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, and even more preferably a hydrogen atom or a methyl group.
R ^a25 is preferably a carboxy group, a cyano group or a methyl group.
L ^a7 is preferably —O— or *-OL ^a8 —CO—O—, and more preferably —O
-, -O-CH ₂ -CO-O- or -O-C ₂ H ₄ -CO-O-.
w1 is preferably an integer of 0 to 2, and more preferably 0 or 1.
In particular, the formula (a3-4) is preferably the formula (a3-4)'.

(In the formula, R ^a24 and L ^a7 have the same meanings as above.)

Examples of the structural unit (a3) include monomers described in JP-A-2010-204646, monomers described in JP-A-2000-122294, and monomers described in JP-A-2012-41274.
Examples of the structural unit (a3) include structural units derived from monomers described in the above publication.
, Formula (a3-3-1), Formula (a3-3-2) and Formula (a3-4-1) to Formula (a3-4-1)
2), and in the structural unit, the structural unit represented by any one of formulas (a3-1) to (a3-2)
In a3-4), preferred are structural units in which the methyl groups corresponding to R ^a18 , R ^a19 , R ^a20 and R ^a24 are replaced by hydrogen atoms.

When the resin (A) contains the structural unit (a3), the total content thereof is usually 5 to 70 mol %, preferably 10 to 65 mol %, and more preferably 10 to 60 mol %, based on all structural units in the resin (A).
Furthermore, the content of the structural unit (a3-1), the structural unit (a3-2), the structural unit (a3-3) or the structural unit (a3-4) is preferably 5 to 60 mol %, more preferably 5 to 50 mol %, and even more preferably 10 to 50 mol %, based on the total structural units of the resin (A).

［式（ａ４）中、
Ｒ⁴¹は、水素原子又はメチル基を表す。
Ｒ⁴²は、炭素数１～２４のフッ素原子を有する飽和炭化水素基を表し、該飽和炭化水素
基に含まれる－ＣＨ₂－は、－Ｏ－又は－ＣＯに置き換わっていてもよい。］
Ｒ⁴²で表される飽和炭化水素基は、鎖式炭化水素基及び単環又は多環の脂環式炭化水素
基、並びに、これらを組み合わせることにより形成される基等が挙げられる。 <Structural unit (a4)>
Examples of the structural unit (a4) include the following structural units.

[In formula (a4),
^R41 represents a hydrogen atom or a methyl group.
R ⁴² represents a saturated hydrocarbon group having 1 to 24 carbon atoms and containing a fluorine atom, and --CH ₂ -- contained in the saturated hydrocarbon group may be replaced by --O-- or --CO.]
Examples of the saturated hydrocarbon group represented by R ⁴² include chain hydrocarbon groups, monocyclic or polycyclic alicyclic hydrocarbon groups, and groups formed by combining these groups.

組み合わせにより形成される基としては、１以上のアルキル基又は１以上のアルカンジ
イル基と、１以上の脂環式炭化水素基とを組み合わせることにより形成される基が挙げら
れ、－アルカンジイル基－脂環式炭化水素基、－脂環式炭化水素基－アルキル基、－アル
カンジイル基－脂環式炭化水素基－アルキル基等が挙げられる。 Examples of the chain hydrocarbon group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group,
Examples of the monocyclic or polycyclic alicyclic hydrocarbon group include cycloalkyl groups such as cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl groups; decahydronaphthyl, adamantyl, and norbornyl groups; and the following groups (* indicates a bonding site):

Examples of groups formed by combination include groups formed by combining one or more alkyl groups or one or more alkanediyl groups with one or more alicyclic hydrocarbon groups, such as -alkanediyl group-alicyclic hydrocarbon group, -alicyclic hydrocarbon group-alkyl group, and -alkanediyl group-alicyclic hydrocarbon group-alkyl group.

［式（ａ４－０）中、
Ｒ⁵は、水素原子又はメチル基を表す。
Ｌ^4ａは、単結合又は炭素数１～４の２価の脂肪族飽和炭化水素基を表す。
Ｌ^3ａは、炭素数１～８のペルフルオロアルカンジイル基又は炭素数３～１２のペルフ
ルオロシクロアルカンジイル基を表す。
Ｒ⁶は、水素原子又はフッ素原子を表す。］ The structural unit (a4) may be any of the structural units represented by the formula (a4-0), (a4-1), (a4-2), and (a4-3).
Examples of structural units include those represented by at least one selected from the group consisting of formula (a4-3) and formula (a4-4):

[In formula (a4-0),
^R5 represents a hydrogen atom or a methyl group.
L ^4a represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 4 carbon atoms.
^L3a represents a perfluoroalkanediyl group having 1 to 8 carbon atoms or a perfluorocycloalkanediyl group having 3 to 12 carbon atoms.
^R6 represents a hydrogen atom or a fluorine atom.

The divalent aliphatic saturated hydrocarbon group in ^L4a includes a methylene group, an ethylene group, a linear alkanediyl group such as a propane-1,3-diyl group or a butane-1,4-diyl group, an ethane-1,1-diyl group, a propane-1,2-diyl group, a butane-1,3-diyl group, a 2-
Examples of the branched alkanediyl groups include methylpropane-1,3-diyl and 2-methylpropane-1,2-diyl groups.

The perfluoroalkanediyl group in ^L3a includes a difluoromethylene group, a perfluoroethylene group, a perfluoropropane-1,1-diyl group, a perfluoropropane-1,3-diyl group, a perfluoropropane-1,2-diyl group, a perfluoropropane-2,2-diyl group, a perfluorobutane-1,4-diyl group, a perfluorobutane-2,3-diyl group, a perfluorobutane-3,4-diyl group, a perfluorobutane-4,5-diyl group, a perfluorobutane-5,6-diyl group, a perfluorobutane-6,7-diyl group, a perfluorobutane-7,8-diyl group, a perfluorobutane-8,9-diyl group, a perfluorobutane-9,10-diyl group, a perfluorobutane-10,11-diyl group, a perfluorobutane-11,12-diyl group, a perfluorobutane-12,2-diyl group, a perfluorobutane-13,14-diyl group, a perfluorobutane-14,15-diyl group, a perfluorobutane-16,16-diyl group, a perfluorobutane-17,18-diyl group, a perfluorobutane-19,20-diyl group, a perfluorobutane-21,22-diyl group, a perfluorobutane-23,23-diyl group, a perfluorobutane-24,24-diyl group, a perfluorobutane-25,26-diyl group, a perfluorobutane-27,27-diyl group, a perfluorobutane-28,28-diyl group, a perfluorobutane-29,29-diyl group, a perfluorobutane-21,22-diyl group, a perfluorobutane-23,23-diyl group, a perfluorobutane-24,24-diyl group, a perfluorobutane-25,25-diyl group
,2-diyl group, perfluorobutane-1,2-diyl group, perfluoropentane-1,
5-diyl group, perfluoropentane-2,2-diyl group, perfluoropentane-3,
3-diyl group, perfluorohexane-1,6-diyl group, perfluorohexane-2,
2-diyl group, perfluorohexane-3,3-diyl group, perfluoroheptane-1,
7-diyl group, perfluoroheptane-2,2-diyl group, perfluoroheptane-3,
4-diyl group, perfluoroheptane-4,4-diyl group, perfluorooctane-1,
8-diyl group, perfluorooctane-2,2-diyl group, perfluorooctane-3,
3-diyl group, perfluorooctane-4,4-diyl group, and the like.
Examples of the perfluorocycloalkanediyl group in ^L3a include a perfluorocyclohexanediyl group, a perfluorocyclopentanediyl group, a perfluorocycloheptanediyl group, and a perfluoroadamantanediyl group.

L ^4a is preferably a single bond, a methylene group or an ethylene group, and more preferably a single bond or a methylene group.
L ^3a is preferably a perfluoroalkanediyl group having 1 to 6 carbon atoms, and more preferably a perfluoroalkanediyl group having 1 to 3 carbon atoms.

The structural unit (a4-0) may be any of the structural units shown below and the structural units (
a4-0) structural unit in which the methyl group corresponding to ^R5 is replaced with a hydrogen atom.

［式（ａ４－１）中、
Ｒ^a41は、水素原子又はメチル基を表す。
Ｒ^a42は、置換基を有していてもよい炭素数１～２０の飽和炭化水素基を表し、該飽和
炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ａ^a41は、置換基を有していてもよい炭素数１～６のアルカンジイル基又は式（ａ－ｇ
１）で表される基を表す。ただし、Ａ^a41及びＲ^a42のうち少なくとも１つは、置換基とし
てハロゲン原子（好ましくはフッ素原子）を有する。

〔式（ａ－ｇ１）中、
ｓは０又は１を表す。
Ａ^a42及びＡ^a44は、それぞれ独立に、置換基を有していてもよい炭素数１～５の２価の
飽和炭化水素基を表す。
Ａ^a43は、単結合又は置換基を有していてもよい炭素数１～５の２価の脂肪族炭化水素
基を表す。
Ｘ^a41及びＸ^a42は、それぞれ独立に、－Ｏ－、－ＣＯ－、－ＣＯ－Ｏ－又は－Ｏ－ＣＯ
－を表す。
ただし、Ａ^a42、Ａ^a43、Ａ^a44、Ｘ^a41及びＸ^a42の炭素数の合計は７以下である。〕
＊は結合部位であり、右側の＊が－Ｏ－ＣＯ－Ｒ^a42との結合部位である。］

[In formula (a4-1),
R ^a41 represents a hydrogen atom or a methyl group.
R ^a42 represents a saturated hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and --CH ₂ -- contained in the saturated hydrocarbon group is replaced by --O-- or --CO--. This is also fine.
A ^a41 is a C 1 to C 6 alkanediyl group which may have a substituent or a group represented by the formula (a-g
1), provided that at least one of A ^a41 and R ^a42 has a halogen atom (preferably a fluorine atom) as a substituent.

[In formula (a-g1),
s represents 0 or 1.
A ^a42 and A ^a44 each independently represent a divalent saturated hydrocarbon group having 1 to 5 carbon atoms which may have a substituent.
A ^a43 represents a single bond or a divalent aliphatic hydrocarbon group having 1 to 5 carbon atoms which may have a substituent.
X ^a41 and X ^a42 each independently represent -O-, -CO-, -CO-O- or -O-CO
Represents -.
However, the total number of carbon atoms of A ^a42 , A ^a43 , A ^a44 , X ^a41 and X ^a42 is 7 or less.
* indicates a binding site, and the * on the right side is the binding site with -O-CO-R ^a42 .]

Examples of the saturated hydrocarbon group for R ^a42 include linear saturated hydrocarbon groups, monocyclic or polycyclic alicyclic saturated hydrocarbon groups, and groups formed by combining these.

組み合わせにより形成される基としては、１以上のアルキル基又は１以上のアルカンジ
イル基と、１以上の脂環式飽和炭炭化水素基とを組み合わせることにより形成される基が
挙げられ、－アルカンジイル基－脂環式飽和炭炭化水素基、－脂環式飽和炭炭化水素基－
アルキル基、－アルカンジイル基－脂環式飽和炭炭化水素基－アルキル基等が挙げられる
。 Examples of the chain saturated hydrocarbon group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, a dodecyl group, a pentadecyl group,
Examples include hexadecyl, heptadecyl and octadecyl groups.
Examples of the monocyclic or polycyclic alicyclic saturated hydrocarbon group include cycloalkyl groups such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group; and polycyclic alicyclic hydrocarbon groups such as a decahydronaphthyl group, an adamantyl group, a norbornyl group, and the following groups (* represents a bonding site):

Examples of the group formed by the combination include a group formed by combining one or more alkyl groups or one or more alkanediyl groups with one or more alicyclic saturated hydrocarbon groups, such as -alkanediyl group-alicyclic saturated hydrocarbon group, -alicyclic saturated hydrocarbon group-
Examples of the alkyl group include an alkyl group, an alkanediyl group, an alicyclic saturated hydrocarbon group, and an alkyl group.

［式（ａ－ｇ３）中、
Ｘ^a43は、酸素原子、カルボニル基、＊－Ｏ－ＣＯ－又は＊－ＣＯ－Ｏ－を表す（＊は
Ｒ^a42との結合部位を表す。）。
Ａ^a45は、ハロゲン原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す
。
＊は結合部位を表す。］
ただし、Ｒ^a42－Ｘ^a43－Ａ^a45において、Ｒ^a42がハロゲン原子を有しない場合は、Ａ^a4
5は、少なくとも１つのハロゲン原子を有する炭素数１～１７の脂肪族炭化水素基を表す
。 Examples of the substituent that R ^a42 may have include at least one selected from the group consisting of a halogen atom and a group represented by formula (a-g3). Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is preferable.

[In formula (a-g3),
X ^a43 represents an oxygen atom, a carbonyl group, *-O-CO- or *-CO-O- (* represents the bonding site to R ^a42 ).
A ^a45 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
* indicates a binding site.]
However, in R ^a42 -X ^a43 -A ^a45 , when R ^a42 does not have a halogen atom, A ^a4
5 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms and containing at least one halogen atom.

組み合わせにより形成される基としては、１以上のアルキル基又は１以上のアルカンジ
イル基と、１以上の脂環式炭化水素基とを組み合わせることにより形成される基が挙げら
れ、－アルカンジイル基－脂環式炭化水素基、－脂環式炭化水素基－アルキル基、－アル
カンジイル基－脂環式炭化水素基－アルキル基等が挙げられる。 Examples of the aliphatic hydrocarbon group for A ^a45 include alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, dodecyl, pentadecyl, hexadecyl, heptadecyl, and octadecyl groups; monocyclic alicyclic hydrocarbon groups such as cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl groups; and polycyclic alicyclic hydrocarbon groups such as decahydronaphthyl, adamantyl, norbornyl, and the following groups (* represents a bonding site):

Examples of groups formed by combination include groups formed by combining one or more alkyl groups or one or more alkanediyl groups with one or more alicyclic hydrocarbon groups, such as -alkanediyl group-alicyclic hydrocarbon group, -alicyclic hydrocarbon group-alkyl group, and -alkanediyl group-alicyclic hydrocarbon group-alkyl group.

R ^a42 is preferably an aliphatic hydrocarbon group which may have a halogen atom, and more preferably an aliphatic hydrocarbon group having an alkyl group having a halogen atom and/or a group represented by formula (a-g3).
When R ^a42 is an aliphatic hydrocarbon group having a halogen atom, it is preferably an aliphatic hydrocarbon group having a fluorine atom, more preferably a perfluoroalkyl group or a perfluorocycloalkyl group, still more preferably a perfluoroalkyl group having 1 to 6 carbon atoms, and particularly preferably a perfluoroalkyl group having 1 to 3 carbon atoms. Examples of perfluoroalkyl groups include a perfluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluorobutyl group, a perfluoropentyl group, a perfluorohexyl group, a perfluoroheptyl group, and a perfluorooctyl group. Examples of perfluorocycloalkyl groups include a perfluorocyclohexyl group.
When R ^a42 is an aliphatic hydrocarbon group having a group represented by formula (a-g3),
The total number of carbon atoms in R ^a42 , including the number of carbon atoms in the group represented by formula (-g3), is preferably 15 or less, and more preferably 12 or less. When R a42 has a group represented by formula (a-g3) as a substituent, the number thereof is preferably 1.

［式（ａ－ｇ２）中、
Ａ^a46は、ハロゲン原子を有していてもよい炭素数１～１７の２価の脂肪族炭化水素基
を表す。
Ｘ^a44は、＊－Ｏ－ＣＯ－又は＊－ＣＯ－Ｏ－を表す（＊はＡ^a46との結合部位を表す。
）。
Ａ^a47は、ハロゲン原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す
。
ただし、Ａ^a46、Ａ^a47及びＸ^a44の炭素数の合計は１８以下であり、Ａ^a46及びＡ^a47の
うち、少なくとも一方は、少なくとも１つのハロゲン原子を有する。
＊はカルボニル基との結合部位を表す。］ When R ^a42 is an aliphatic hydrocarbon having a group represented by formula (a-g3), R ^a42 is more preferably a group represented by formula (a-g2).

[In formula (a-g2),
A ^a46 represents a divalent aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
X ^a44 represents *-O-CO- or *-CO-O- (* represents the bonding site with A ^a46 .
).
A ^a47 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
However, the total number of carbon atoms of A ^a46 , A ^a47 and X ^a44 is 18 or less, and at least one of A ^a46 and A ^a47 has at least one halogen atom.
* indicates the bonding site with the carbonyl group.

The aliphatic hydrocarbon group of A ^a46 preferably has 1 to 6 carbon atoms, and more preferably has 1 to 3 carbon atoms.
The aliphatic hydrocarbon group of A ^a47 preferably has 4 to 15 carbon atoms, more preferably 5 to 12 carbon atoms.
A ^a47 is more preferably a cyclohexyl group or an adamantyl group.

A preferred structure of the group represented by formula (a-g2) is the following structure (* indicates the bonding site with the carbonyl group).

The alkanediyl group in A ^a41 is a methylene group, an ethylene group, a propane-1,
3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1
linear alkanediyl groups such as propane-1,2-diyl group, butane-1,6-diyl group, etc.
,3-diyl group, 2-methylpropane-1,2-diyl group, 1-methylbutane-1,4-
and branched alkanediyl groups such as diyl group and 2-methylbutane-1,4-diyl group.
The substituent in the alkanediyl group represented by A ^a41 is a hydroxy group or an alkanediyl group having 1 to 10 carbon atoms.
6 alkoxy groups and the like.
A ^a41 is preferably an alkanediyl group having 1 to 4 carbon atoms, more preferably an alkanediyl group having 2 to 4 carbon atoms, and even more preferably an ethylene group.

Examples of the divalent saturated hydrocarbon group represented by A ^a42 , A ^a43 , and A ^a44 in the group represented by formula (a-g1) include a linear or branched alkanediyl group, a monocyclic divalent alicyclic hydrocarbon group, and a group formed by combining an alkanediyl group and a divalent alicyclic hydrocarbon group. Specific examples include a methylene group, an ethylene group, a propane-1,3-diyl group,
Propane-1,2-diyl group, butane-1,4-diyl group, 1-methylpropane-1,3
-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2-diyl group, and the like.
Examples of the substituent on the divalent saturated hydrocarbon group represented by A ^a42 , A ^a43 and A ^a44 include a hydroxy group and an alkoxy group having 1 to 6 carbon atoms.
It is preferred that s is 0.

In the group represented by formula (a-g2), examples of the group in which X ^a42 is -O-, -CO-, -CO-O- or -O-CO- include the following groups. In the following examples, * and ** each represent a bonding site, and ** is the bonding site with -O-CO-R ^a42 .

Examples of the structural unit represented by formula (a4-1) include the structural units shown below and structural units in which a methyl group corresponding to R ^a41 in the structural unit represented by formula (a4-1) in the following structural units is replaced with a hydrogen atom.

［式（ａ４－２）中、
Ｒ^f5は、水素原子又はメチル基を表す。
Ｌ⁴⁴は、炭素数１～６のアルカンジイル基を表し、該アルカンジイル基に含まれる－Ｃ
Ｈ₂－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ｒ^f6は、炭素数１～２０のフッ素原子を有する飽和炭化水素基を表す。
ただし、Ｌ⁴⁴及びＲ^f6の合計炭素数の上限は２１である。］ The structural unit represented by formula (a4-1) is preferably a structural unit represented by formula (a4-2).

[In formula (a4-2),
R ^f5 represents a hydrogen atom or a methyl group.
L ⁴⁴ represents an alkanediyl group having 1 to 6 carbon atoms,
H ₂ -- may be replaced by --O-- or --CO--.
R ^f6 represents a saturated hydrocarbon group having 1 to 20 carbon atoms and containing a fluorine atom.
However, the upper limit of the total number of carbon atoms of L ⁴⁴ and R ^f6 is 21.

Examples of the alkanediyl group having 1 to 6 carbon atoms for L ⁴⁴ include the same groups as those exemplified as the alkanediyl group for L ^4a .
Examples of the saturated hydrocarbon group of R ^f6 include the same groups as those exemplified for R ^a42 .
As the alkanediyl group having 1 to 6 carbon atoms for L ⁴⁴ , an alkanediyl group having 2 to 4 carbon atoms is preferable, and an ethylene group is more preferable.

Examples of the structural unit represented by formula (a4-2) include those represented by formulas (a4-1-1) to (a4
The structural unit represented by formula (a4-2) also includes a structural unit in which a methyl group corresponding to R ^f5 in the structural unit (a4-2) is replaced with a hydrogen atom.

［式（ａ４－３）中、
Ｒ^f7は、水素原子又はメチル基を表す。
Ｌ⁵は、炭素数１～６のアルカンジイル基を表す。
Ａ^f13は、フッ素原子を有していてもよい炭素数１～１８の２価の飽和炭化水素基を表
す。
Ｘ^f12は、＊－Ｏ－ＣＯ－又は＊－ＣＯ－Ｏ－を表す（＊はＡ^f13との結合部位を表す。
）。
Ａ^f14は、フッ素原子を有していてもよい炭素数１～１７の飽和炭化水素基を表す。
但し、Ａ^f13及びＡ^f14の少なくとも１つは、フッ素原子を有し、Ｌ⁵、Ａ^f13及びＡ^f14
の合計炭素数の上限は２０である。］ Examples of the structural unit (a4) include a structural unit represented by formula (a4-3).

[In formula (a4-3),
R ^f7 represents a hydrogen atom or a methyl group.
^L5 represents an alkanediyl group having 1 to 6 carbon atoms.
A ^f13 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms which may have a fluorine atom.
X ^f12 represents *-O-CO- or *-CO-O- (* represents the bonding site with A ^f13 .
).
A ^f14 represents a saturated hydrocarbon group having 1 to 17 carbon atoms which may have a fluorine atom.
However, at least one of A ^f13 and A ^f14 has a fluorine atom, and L ⁵ , A ^f13 and A ^f14
The upper limit of the total number of carbon atoms is 20.

Examples of the alkanediyl group in L ⁵ include the same groups as those exemplified as the alkanediyl group in the divalent saturated hydrocarbon group in L ⁴ .

The divalent saturated hydrocarbon group for A ^f13 which may have a fluorine atom is preferably a divalent aliphatic saturated hydrocarbon group which may have a fluorine atom and a divalent alicyclic saturated hydrocarbon group which may have a fluorine atom, and more preferably a perfluoroalkanediyl group.
Examples of the divalent aliphatic hydrocarbon group which may have a fluorine atom include alkanediyl groups such as a methylene group, an ethylene group, a propanediyl group, a butanediyl group, and a pentanediyl group;
Examples of the alkyl group include perfluoroalkanediyl groups such as a difluoromethylene group, a perfluoroethylene group, a perfluoropropanediyl group, a perfluorobutanediyl group, and a perfluoropentanediyl group.
The divalent alicyclic hydrocarbon group which may have a fluorine atom may be either monocyclic or polycyclic. Examples of the monocyclic group include a cyclohexanediyl group and a perfluorocyclohexanediyl group. Examples of the polycyclic group include an adamantanediyl group, a norbornanediyl group, and a perfluoroadamantanediyl group.

Examples of the saturated hydrocarbon group and the saturated hydrocarbon group which may have a fluorine atom of A ^f14 include the same groups as those exemplified for R ^a42 . Among them, a trifluoromethyl group, a difluoromethyl group, a methyl group, a perfluoroethyl group, a 2,2,2-trifluoroethyl group, a 1,1
, 2,2-tetrafluoroethyl group, ethyl group, perfluoropropyl group, 2,2,3,
3,3-pentafluoropropyl group, propyl group, perfluorobutyl group, 1,1,2,
2,3,3,4,4-octafluorobutyl group, butyl group, perfluoropentyl group, 2
, 2,3,3,4,4,5,5,5-nonafluoropentyl group, pentyl group, hexyl group, perfluorohexyl group, heptyl group, perfluoroheptyl group, octyl group, perfluorooctyl group, and other fluorinated alkyl groups; cyclopropylmethyl group, cyclopropyl group, cyclobutylmethyl group, cyclopentyl group, cyclohexyl group, perfluorocyclohexyl group, adamantyl group, adamantylmethyl group, adamantyldimethyl group, norbornyl group, norbornylmethyl group, perfluoroadamantyl group, perfluoroadamantylmethyl group, and the like are preferred.

In formula (a4-3), L ⁵ is preferably an ethylene group.
The divalent saturated hydrocarbon group of A ^f13 is a divalent chain hydrocarbon group having 1 to 6 carbon atoms and a
A group containing a divalent alicyclic hydrocarbon group having from 1 to 12 carbon atoms is preferred, and a divalent chain hydrocarbon group having from 2 to 3 carbon atoms is more preferred.
The saturated hydrocarbon group of A ^f14 is preferably a group containing a chain hydrocarbon group having 3 to 12 carbon atoms and an alicyclic hydrocarbon group having 3 to 12 carbon atoms, and more preferably a chain hydrocarbon group having 3 to 10 carbon atoms and an alicyclic hydrocarbon group having 3 to 1 carbon atoms.
More ^preferred is a group containing an alicyclic hydrocarbon group having 3 to 12 carbon atoms, and more preferred is a cyclopropylmethyl group, a cyclopentyl group, a cyclohexyl group, a norbornyl group, or an adamantyl group.

Examples of the structural unit represented by formula (a4-3) include the structural units represented by formulae (a4-1'-1) to (a
4-1'-11) are included. A structural unit in which the methyl group corresponding to ^Rf7 in the structural unit (a4-3) is replaced with a hydrogen atom is also included as a structural unit represented by formula (a4-3).

［式（ａ４－４）中、
Ｒ^f21は、水素原子又はメチル基を表す。
Ａ^f21は、－（ＣＨ₂）_j1－、－（ＣＨ₂）_j2－Ｏ－（ＣＨ₂）_j3－又は－（ＣＨ₂）_j4－
ＣＯ－Ｏ－（ＣＨ₂）_j5－を表す。
ｊ１～ｊ５は、それぞれ独立に、１～６のいずれかの整数を表す。
Ｒ^f22は、フッ素原子を有する炭素数１～１０の飽和炭化水素基を表す。］ The structural unit (a4) also includes a structural unit represented by formula (a4-4).

[In formula (a4-4),
R ^f21 represents a hydrogen atom or a methyl group.
A ^f21 is --(CH ₂ ) _j1 --, --(CH ₂ ) _j2 --O--(CH ₂ ) _j3 --, or --(CH ₂ ) _j4 --.
It represents CO—O—(CH ₂ ) _j5 —.
j1 to j5 each independently represent an integer of 1 to 6.
R ^f22 represents a saturated hydrocarbon group having 1 to 10 carbon atoms and containing a fluorine atom.]

Examples of the saturated hydrocarbon group represented by R ^f22 include the same as the saturated hydrocarbon group represented by R ^a42 .
R ^f22 is preferably an alkyl group having 1 to 10 carbon atoms and having a fluorine atom, or an alicyclic hydrocarbon group having 1 to 10 carbon atoms and having a fluorine atom, more preferably an alkyl group having 1 to 10 carbon atoms and having a fluorine atom, and still more preferably an alkyl group having 1 to 6 carbon atoms and having a fluorine atom.

In formula (a4-4), A ^f21 is preferably --(CH ₂ ) _j1 --, more preferably an ethylene group or a methylene group, and even more preferably a methylene group.

Examples of the structural unit represented by formula (a4-4) include the following structural units and structural units represented by the following formula in which a methyl group corresponding to R ^f21 in the structural unit (a4-4) is replaced with a hydrogen atom.

When the resin (A) has the structural unit (a4), the content thereof is preferably from 1 to 20 mol %, more preferably from 2 to 15 mol %, and even more preferably from 3 to 10 mol %, based on all structural units in the resin (A).

［式（ａ５－１）中、
Ｒ⁵¹は、水素原子又はメチル基を表す。
Ｒ⁵²は、炭素数３～１８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる水
素原子は炭素数１～８の脂肪族炭化水素基で置換されていてもよい。
Ｌ⁵⁵は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該飽和炭化水素基
に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。］ <Structural unit (a5)>
The non-leaving hydrocarbon group contained in the structural unit (a5) may be a group having a linear, branched or cyclic hydrocarbon group. Among these, the structural unit (a5) is preferably a group having an alicyclic hydrocarbon group.
An example of the structural unit (a5) is a structural unit represented by formula (a5-1).

[In formula (a5-1),
^R51 represents a hydrogen atom or a methyl group.
R ⁵² represents an alicyclic hydrocarbon group having 3 to 18 carbon atoms, and a hydrogen atom contained in the alicyclic hydrocarbon group may be substituted with an aliphatic hydrocarbon group having 1 to 8 carbon atoms.
L ⁵⁵ represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and --CH ₂ -- contained in the saturated hydrocarbon group may be replaced with --O-- or --CO--.]

The alicyclic hydrocarbon group in ^R52 may be either monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group. Examples of the polycyclic alicyclic hydrocarbon group include an adamantyl group, a norbornyl group, and the like.
Examples of the aliphatic hydrocarbon group having 1 to 8 carbon atoms include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, pentyl, hexyl, octyl, and 2-ethylhexyl.
An example of the alicyclic hydrocarbon group having a substituent is a 3-methyladamantyl group.
R ⁵² is preferably an unsubstituted alicyclic hydrocarbon group having 3 to 18 carbon atoms, and more preferably an adamantyl group, a norbornyl group or a cyclohexyl group.

The divalent saturated hydrocarbon group for L ⁵⁵ includes a divalent chain saturated hydrocarbon group and a divalent alicyclic saturated hydrocarbon group, and is preferably a divalent chain saturated hydrocarbon group.
Examples of the divalent chain saturated hydrocarbon group include alkanediyl groups such as a methylene group, an ethylene group, a propanediyl group, a butanediyl group, and a pentanediyl group.
The divalent alicyclic saturated hydrocarbon group may be either monocyclic or polycyclic. Examples of the monocyclic alicyclic saturated hydrocarbon group include cycloalkanediyl groups such as cyclopentanediyl and cyclohexanediyl. Examples of the polycyclic divalent alicyclic saturated hydrocarbon group include adamantanediyl and norbornanediyl.

式（Ｌ１－１）中、
Ｘ^x1は、＊－Ｏ－ＣＯ－又は＊－ＣＯ－Ｏ－を表す（＊はＬ^X1との結合部位を表す。）
。
Ｌ^x1は、炭素数１～１６の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x2は、単結合又は炭素数１～１５の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x1及びＬ^x2の合計炭素数は、１６以下である。
式（Ｌ１－２）中、
Ｌ^x3は、炭素数１～１７の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x4は、単結合又は炭素数１～１６の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x3及びＬ^x4の合計炭素数は、１７以下である。
式（Ｌ１－３）中、
Ｌ^x5は、炭素数１～１５の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x6及びＬ^x7は、それぞれ独立に、単結合又は炭素数１～１４の２価の脂肪族飽和炭化
水素基を表す。
ただし、Ｌ^x5、Ｌ^x6及びＬ^x7の合計炭素数は、１５以下である。
式（Ｌ１－４）中、
Ｌ^x8及びＬ^x9は、単結合又は炭素数１～１２の２価の脂肪族飽和炭化水素基を表す。
Ｗ^x1は、炭素数３～１５の２価の脂環式飽和炭化水素基を表す。
ただし、Ｌ^x8、Ｌ^x9及びＷ^x1の合計炭素数は、１５以下である。 Examples of the divalent saturated hydrocarbon group represented by L ⁵⁵ in which --CH ₂ -- is replaced by --O-- or --CO-- include groups represented by formulae (L1-1) to (L1-4). In the following formulae, * and ** each represent a bonding site, and * represents a bonding site with an oxygen atom.

In formula (L1-1),
X ^x1 represents *-O-CO- or *-CO-O- (* represents the bonding site with L ^x1 ).
.
L ^x1 represents a divalent aliphatic saturated hydrocarbon group having 1 to 16 carbon atoms.
L ^x2 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 15 carbon atoms.
However, the total number of carbon atoms of L ^x1 and L ^x2 is 16 or less.
In formula (L1-2),
L ^x3 represents a divalent aliphatic saturated hydrocarbon group having 1 to 17 carbon atoms.
L ^x4 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 16 carbon atoms.
However, the total number of carbon atoms of L ^x3 and L ^x4 is 17 or less.
In formula (L1-3),
L ^x5 represents a divalent aliphatic saturated hydrocarbon group having 1 to 15 carbon atoms.
L ^x6 and L ^x7 each independently represent a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 14 carbon atoms.
However, the total number of carbon atoms of L ^x5 , L ^x6 and L ^x7 is 15 or less.
In formula (L1-4),
L ^x8 and L ^x9 each represent a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms.
W ^x1 represents a divalent alicyclic saturated hydrocarbon group having 3 to 15 carbon atoms.
However, the total number of carbon atoms of L ^x8 , L ^x9 and W ^x1 is 15 or less.

L ^x1 is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, more preferably
It is a methylene group or an ethylene group.
L ^x2 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, more preferably a single bond.
L ^x3 is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x4 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x5 is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, more preferably
It is a methylene group or an ethylene group.
L ^x6 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, more preferably a methylene group or an ethylene group.
L ^x7 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x8 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, more preferably a single bond or a methylene group.
L ^x9 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms, more preferably a single bond or a methylene group.
W ^x1 is preferably a divalent alicyclic saturated hydrocarbon group having 3 to 10 carbon atoms, more preferably a cyclohexanediyl group or an adamantanediyl group.

Examples of the group represented by formula (L1-1) include the divalent groups shown below.

Examples of the group represented by formula (L1-2) include the divalent groups shown below.

Examples of the group represented by formula (L1-3) include the divalent groups shown below.

Examples of the group represented by formula (L1-4) include the divalent groups shown below.

L ⁵⁵ is preferably a single bond or a group represented by the formula (L1-1).

The structural unit (a5-1) may be any of the structural units shown below and the structural units (
a5-1) is a structural unit in which the methyl group corresponding to R ⁵¹ in the above formula (a5-1) is replaced with a hydrogen atom.
When the resin (A) has the structural unit (a5), the content thereof is preferably from 1 to 30 mol %, more preferably from 2 to 20 mol %, and even more preferably from 3 to 15 mol %, based on all structural units in the resin (A).

<Structural Unit (II)>
Resin (A) may further contain a structural unit that decomposes upon exposure to generate an acid (hereinafter, may be referred to as "structural unit (II)"). Specific examples of the structural unit (II) include the structural units described in JP2016-79235A. Preferably, the structural unit is a structural unit having a sulfonate group or carboxylate group and an organic cation in a side chain, or a structural unit having a sulfonio group and an organic anion in a side chain.

［式（ＩＩ－２－Ａ’）中、
Ｘ^III3は、炭素数１～１８の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれ
る－ＣＨ_２－は、－Ｏ－、－Ｓ－又は－ＣＯ－に置き換わっていてもよく、該飽和炭化水
素基に含まれる水素原子は、ハロゲン原子、ハロゲン原子を有していてもよい炭素数１～
６のアルキル基又はヒドロキシ基で置き換わっていてもよい。
Ａ^x1は、炭素数１～８のアルカンジイル基を表し、該アルカンジイル基に含まれる水素
原子は、フッ素原子又は炭素数１～６のペルフルオロアルキル基で置換されていてもよい
。
ＲＡ^－は、スルホナート基又はカルボキシレート基を表す。
Ｒ^III3は、水素原子、ハロゲン原子又はハロゲン原子を有していてもよい炭素数１～６
のアルキル基を表す。
ＺＡ^＋は、有機カチオンを表す。］ The structural unit having a sulfonate group or a carboxylate group in the side chain is represented by the formula (II-2
-A') is preferred.

[In formula (II-2-A'),
X ^III3 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, in which -CH ₂ - contained in the saturated hydrocarbon group may be replaced by -O-, -S- or -CO-, and a hydrogen atom contained in the saturated hydrocarbon group may be replaced by a halogen atom or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms which may have a halogen atom.
6 may be substituted with an alkyl or hydroxy group.
A ^x1 represents an alkanediyl group having 1 to 8 carbon atoms, and a hydrogen atom contained in the alkanediyl group may be substituted by a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
^RA- represents a sulfonate group or a carboxylate group.
R ^III3 is a hydrogen atom, a halogen atom, or a C1-6 group which may have a halogen atom.
represents an alkyl group represented by the formula:
ZA ⁺ represents an organic cation.

Examples of the halogen atom represented by R ^III3 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom and which is represented by R ^III3 include the same as the alkyl group having 1 to 6 carbon atoms which may have a halogen atom and which is represented by R ^a8 .
The alkanediyl group having 1 to 8 carbon atoms represented by A ^x1 includes a methylene group, an ethylene group,
Examples of such groups include a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group, an ethane-1,1-diyl group, a propane-1,1-diyl group, a propane-1,2-diyl group, a propane-2,2-diyl group, a pentane-2,4-diyl group, a 2-methylpropane-1,3-diyl group, a 2-methylpropane-1,2-diyl group, a pentane-1,4-diyl group, and a 2-methylbutane-1,4-diyl group.
Examples of the perfluoroalkyl group having 1 to 6 carbon atoms which may be substituted by A ^x1 include a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group, a perfluoropentyl group, and a perfluorohexyl group.
Examples of the divalent saturated hydrocarbon group having 1 to 18 carbon atoms represented by ^XIII3 include linear or branched alkanediyl groups, and monocyclic or polycyclic divalent alicyclic saturated hydrocarbon groups, and combinations of these may also be used.
Specifically, a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,
2-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1
,6-diyl group, heptane-1,7-diyl group, octane-1,8-diyl group, nonane-
linear alkanediyl groups such as 1,9-diyl group, decane-1,10-diyl group, undecane-1,11-diyl group, and dodecane-1,12-diyl group; butane-1,3-diyl group,
Examples of the divalent alkyl group include branched alkanediyl groups such as a 2-methylpropane-1,3-diyl group, a 2-methylpropane-1,2-diyl group, a pentane-1,4-diyl group, and a 2-methylbutane-1,4-diyl group; cycloalkanediyl groups such as a cyclobutane-1,3-diyl group, a cyclopentane-1,3-diyl group, a cyclohexane-1,4-diyl group, and a cyclooctane-1,5-diyl group; and divalent polycyclic alicyclic saturated hydrocarbon groups such as a norbornane-1,4-diyl group, a norbornane-2,5-diyl group, an adamantane-1,5-diyl group, and an adamantane-2,6-diyl group.
Examples of saturated hydrocarbon groups in which -CH ₂ - is replaced by -O-, -S- or -CO- include divalent groups represented by formulae (X1) to (X53), where the number of carbon atoms before -CH ₂ - in the saturated hydrocarbon group is replaced by -O-, -S- or -CO- is 17 or less. In the following formulae, * and ** represent binding sites,
* indicates the binding site for ^Ax1 .

^X3 represents a divalent saturated hydrocarbon group having 1 to 16 carbon atoms.
^X4 represents a divalent saturated hydrocarbon group having 1 to 15 carbon atoms.
^X5 represents a divalent saturated hydrocarbon group having 1 to 13 carbon atoms.
^X6 represents a divalent saturated hydrocarbon group having 1 to 14 carbon atoms.
^X7 represents a trivalent saturated hydrocarbon group having 1 to 14 carbon atoms.
^X8 represents a divalent saturated hydrocarbon group having 1 to 13 carbon atoms.

In formula (II-2-A'), ZA ⁺ can be the same as the cation Z1 ⁺ in the acid generator (B1).

［式（ＩＩ－２－Ａ）中、Ｒ^III3、Ｘ^III3及びＺＡ^＋は、上記と同じ意味を表す。
ｚ２Ａは、０～６のいずれかの整数を表す。
Ｒ^III2及びＲ^III4は、それぞれ独立して、水素原子、フッ素原子又は炭素数１～６のペ
ルフルオロアルキル基を表し、ｚが２以上のとき、複数のＲ^III2及びＲ^III4は互いに同一
であってもよいし、異なっていてもよい。
Ｑ^ａ及びＱ^ｂは、それぞれ独立して、フッ素原子又は炭素数１～６のペルフルオロアル
キル基を表す。］
Ｒ^III2、Ｒ^III4、Ｑ^ａ及びＱ^ｂで表される炭素数１～６のペルフルオロアルキル基とし
ては、前述のＱ^b1で表される炭素数１～６のペルフルオロアルキル基と同じものが挙げら
れる。 The structural unit represented by formula (II-2-A') is preferably a structural unit represented by formula (II-2-A).

In formula (II-2-A), R ^III3 , X ^III3 and ZA ⁺ are as defined above.
z2A represents an integer of 0 to 6.
R ^III2 and R ^III4 each independently represent a hydrogen atom, a fluorine atom, or a perfluoroalkyl group having 1 to 6 carbon atoms, and when z is 2 or greater, a plurality of R ^III2's and R ^III4 's may be the same as or different from each other.
Q ^a and Q ^b each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
Examples of the perfluoroalkyl group having 1 to 6 carbon atoms represented by R ^III2 , R ^III4 , Q ^a and Q ^b include the same perfluoroalkyl groups having 1 to 6 carbon atoms represented by Q ^b1 described above.

［式（ＩＩ－２－Ａ－１）中、
Ｒ^III2、Ｒ^III3、Ｒ^III4、Ｑ^a、Ｑ^b及びＺＡ^＋は、上記と同じ意味を表す。
Ｒ^III5は、炭素数１～１２の飽和炭化水素基を表す。
ｚ２Ａ１は、０～６のいずれかの整数を表す。
Ｘ^I2は、炭素数１～１１の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる
－ＣＨ_２－は、－Ｏ－、－Ｓ－又は－ＣＯ－に置き換わっていてもよく、該飽和炭化水素
基に含まれる水素原子は、ハロゲン原子又はヒドロキシ基で置換されていてもよい。］
Ｒ^III5で表される炭素数１～１２の飽和炭化水素基としては、メチル基、エチル基、プ
ロピル基、イソプロピル基、ブチル基、ｓｅｃ－ブチル基、ｔｅｒｔ－ブチル基、ペンチ
ル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基及びド
デシル基等の直鎖又は分岐のアルキル基が挙げられる。
Ｘ^I2で表される２価の飽和炭化水素基としては、Ｘ^III3で表される２価の飽和炭化水素
基と同様のものが挙げられる。 The structural unit represented by formula (II-2-A) is preferably a structural unit represented by formula (II-2-A-1).

[In formula (II-2-A-1),
R ^III2 , R ^III3 , R ^III4 , Q ^a , Q ^b and ZA ⁺ have the same meanings as above.
R ^III5 represents a saturated hydrocarbon group having 1 to 12 carbon atoms.
z2A1 represents an integer of 0 to 6.
^X represents a divalent saturated hydrocarbon group having 1 to 11 carbon atoms, -CH ₂ - contained in the saturated hydrocarbon group may be replaced by -O-, -S- or -CO-, and a hydrogen atom contained in the saturated hydrocarbon group may be replaced by a halogen atom or a hydroxyl group.]
Examples of the saturated hydrocarbon group having 1 to 12 carbon atoms represented by R ^III5 include linear or branched alkyl groups such as a methyl group, ethyl group, propyl group, isopropyl group, butyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, and dodecyl group.
Examples of the divalent saturated hydrocarbon group represented by X ^I2 include the same as the divalent saturated hydrocarbon group represented by X ^III3 .

［式（ＩＩ－２－Ａ－２）中、Ｒ^III3、Ｒ^III5及びＺＡ^＋は、上記と同じ意味を表す。
ｍ及びｎは、互いに独立に、１又は２を表す。］ As the structural unit represented by formula (II-2-A-1), a structural unit represented by formula (II-2-A-2) is more preferable.

In formula (II-2-A-2), R ^III3 , R ^III5 and ZA ⁺ are as defined above.
m and n each independently represent 1 or 2.

Examples of the structural unit represented by formula (II-2-A') include the following structural units and structural units described in WO 2012/050015: ZA ⁺ represents an organic cation.

［式（ＩＩ－１－１）中、
Ａ^II1は、単結合又は２価の連結基を表す。
Ｒ^II1は、炭素数６～１８の２価の芳香族炭化水素基を表す。
Ｒ^II2及びＲ^II3は、それぞれ独立して、炭素数１～１８の炭化水素基を表し、Ｒ^II2及
びＲ^II3は互いに結合してそれらが結合する硫黄原子とともに環を形成していてもよい。
Ｒ^II4は、水素原子、ハロゲン原子又はハロゲン原子を有していてもよい炭素数１～６
のアルキル基を表す。
Ａ^－は、有機アニオンを表す。］
Ｒ^II1で表される炭素数６～１８の２価の芳香族炭化水素基としては、フェニレン基及
びナフチレン基等が挙げられる。
Ｒ^II2及びＲ^II3で表される炭化水素基としては、アルキル基、脂環式炭化水素基、芳香
族炭化水素基及びこれらを組み合わせることにより形成される基等が挙げられる。
アルキル基及び脂環式炭化水素基は、上記と同様のものが挙げられる。
芳香族炭化水素基としては、フェニル基、ナフチル基、アントリル基、ビフェニル基、
フェナントリル基等のアリール基が挙げられる。
組み合わせた基としては、上述したアルキル基と脂環式炭化水素基とを組み合わせた基
（例えばシクロアルキルアルキル基）、ベンジル基等のアラルキル基、アルキル基を有す
る芳香族炭化水素基（ｐ－メチルフェニル基、ｐ－ｔｅｒｔ－ブチルフェニル基、トリル
基、キシリル基、クメニル基、メシチル基、２，６－ジエチルフェニル基、２－メチル－
６－エチルフェニル基等）、脂環式炭化水素基を有する芳香族炭化水素基（ｐ－シクロヘ
キシルフェニル基、ｐ－アダマンチルフェニル基等）、フェニルシクロヘキシル基等のア
リール－シクロアルキル基等が挙げられる。
Ｒ^II4で表されるハロゲン原子としては、フッ素原子、塩素原子、臭素原子及びヨウ素
原子等が挙げられる。
Ｒ^II4で表されるハロゲン原子を有していてもよい炭素数１～６のアルキル基としては
、Ｒ^a8で表されるハロゲン原子を有していてもよい炭素数１～６のアルキル基と同じもの
が挙げられる。
Ａ^II1で表される２価の連結基としては、例えば、炭素数１～１８の２価の飽和炭化水
素基が挙げられ、該２価の飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－Ｓ－又は
－ＣＯ－で置き換わっていてもよい。具体的には、Ｘ^III3で表される炭素数１～１８の２
価の飽和炭化水素基と同じものが挙げられる。 The structural unit having a sulfonio group and an organic anion on the side chain is preferably a structural unit represented by formula (II-1-1).

[In formula (II-1-1),
A ^II1 represents a single bond or a divalent linking group.
R ^II1 represents a divalent aromatic hydrocarbon group having 6 to 18 carbon atoms.
R ^II2 and R ^II3 each independently represent a hydrocarbon group having 1 to 18 carbon atoms, and R ^II2 and R ^II3 may be bonded to each other to form a ring together with the sulfur atom to which they are bonded.
R ^II4 is a hydrogen atom, a halogen atom, or a C1-6 alkyl group which may have a halogen atom.
represents an alkyl group represented by the formula:
A ⁻ represents an organic anion.
Examples of the divalent aromatic hydrocarbon group having 6 to 18 carbon atoms represented by R ^II1 include a phenylene group and a naphthylene group.
Examples of the hydrocarbon group represented by R ^II2 and R ^II3 include an alkyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a group formed by combining these groups.
Examples of the alkyl group and the alicyclic hydrocarbon group include the same as those mentioned above.
Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, an anthryl group, a biphenyl group,
Examples of the aryl group include a phenanthryl group.
Examples of the combined groups include groups in which the above-mentioned alkyl groups and alicyclic hydrocarbon groups are combined (for example, cycloalkylalkyl groups), aralkyl groups such as a benzyl group, and aromatic hydrocarbon groups having an alkyl group (p-methylphenyl group, p-tert-butylphenyl group, tolyl group, xylyl group, cumenyl group, mesityl group, 2,6-diethylphenyl group, 2-methyl-
6-ethylphenyl group, etc.), aromatic hydrocarbon groups having an alicyclic hydrocarbon group (p-cyclohexylphenyl group, p-adamantylphenyl group, etc.), and aryl-cycloalkyl groups such as phenylcyclohexyl group.
Examples of the halogen atom represented by ^RII4 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom and which is represented by R ^II4 include the same as the alkyl group having 1 to 6 carbon atoms which may have a halogen atom and which is represented by R ^a8 .
Examples of the divalent linking group represented by A ^II1 include a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and the -CH ₂ - contained in the ^divalent saturated hydrocarbon group may be replaced by -O-, -S- or -CO-.
Examples of the alkyl group include the same alkyl- and aryl-valent saturated hydrocarbon groups as those of the alkyl group.

Examples of the structural unit containing a cation in formula (II-1-1) include structural units represented below.

Examples of the organic anion represented by ^A- include a sulfonate anion, a sulfonylimide anion, a sulfonylmethide anion, a carboxylate anion, etc. The organic anion represented by ^A- is preferably a sulfonate anion, and the sulfonate anion is more preferably an anion contained in the salt represented by the above formula (B1).

Examples of the sulfonylimide anion represented by A ¹ - include the following.

Examples of sulfonylmethide anions include the following:

Examples of carboxylate anions include the following:

Examples of the structural unit represented by formula (II-1-1) include structural units represented below.

When the resin (A) contains the structural unit (II), the content of the structural unit (II) is preferably 1 to 20 mol %, more preferably 2 to 5 mol %, based on the total structural units of the resin (A).
It is preferably 15 mol %, and more preferably 3 to 10 mol %.

The resin (A) may have structural units other than the above-mentioned structural units, and examples of such structural units include structural units well known in the art.

The resin (A) is preferably a resin composed of the structural unit (a1) and the structural unit (s), that is, a copolymer of the monomer (a1) and the monomer (s).
The structural unit (a1) is preferably at least one selected from the group consisting of the structural unit (a1-0), the structural unit (a1-1) and the structural unit (a1-2) (preferably the structural unit having a cyclohexyl group and a cyclopentyl group), more preferably at least two, and even more preferably at least two selected from the group consisting of the structural unit (a1-1) and the structural unit (a1-2).
The structural unit (s) is preferably at least one selected from the group consisting of structural units (a2) and structural units (a3). The structural unit (a2) is preferably a structural unit represented by formula (a2-1) or a structural unit represented by formula (a2-A). The structural unit (a3) is preferably a structural unit represented by formula (a3-1), a structural unit represented by formula (a3-2), or a structural unit represented by formula (a3-3).
a3-4) is at least one selected from the group consisting of structural units represented by the following formula (1):

Each structural unit constituting the resin (A) may be used alone or in combination of two or more, and can be produced by a known polymerization method (e.g., radical polymerization method) using a monomer that derives these structural units. The content of each structural unit in the resin (A) can be adjusted by the amount of the monomer used in the polymerization.
The weight average molecular weight of the resin (A) is preferably 2,000 or more (more preferably 2.5
00 or more, more preferably 3,000 or more), 50,000 or less (more preferably 30
In the present specification, the weight average molecular weight is a value determined by gel permeation chromatography under the conditions described in the Examples.

<Resins other than resin (A)>
The resist composition of the present invention may contain a resin other than the resin (A) in combination.
Examples of resins other than resin (A) include resins containing the structural unit (a4) or the structural unit (a5) (hereinafter, sometimes referred to as resin (X)).

As the resin (X), a resin containing the structural unit (a4) is particularly preferred.
In the resin (X), the content of the structural unit (a4) is preferably 30 mol % or more, more preferably 40 mol % or more, and even more preferably 45 mol % or more, based on the total amount of all structural units in the resin (X).
Examples of structural units that the resin (X) may further have include the structural unit (a1), the structural unit (a2), the structural unit (a3), and structural units derived from other known monomers. Among these, the resin (X) is preferably a resin consisting only of the structural unit (a4) and/or the structural unit (a5).

Each structural unit constituting the resin (X) may be used alone or in combination of two or more kinds.
The resin (X) can be produced by a known polymerization method (for example, radical polymerization method) using monomers that derive these structural units. The content of each structural unit in the resin (X) can be adjusted by the amount of the monomer used in the polymerization.
The weight average molecular weight of each of the resins (X) is preferably 6,000 or more (more preferably 7,000 or more) and 80,000 or less (more preferably 60,000 or less). The method for measuring the weight average molecular weight of the resin (X) is the same as that for the resin (A).
When the resist composition contains resin (X), the content thereof is preferably 1 to 60 parts by mass, more preferably 1 to 50 parts by mass, even more preferably 1 to 40 parts by mass, particularly preferably 1 to 30 parts by mass, and particularly preferably 1 to 8 parts by mass, relative to 100 parts by mass of resin (A).

The content of the resin (A) in the resist composition is 8 to 100% based on the solid content of the resist composition.
Preferably, the content is 0% by mass or more and 99% by mass or less, more preferably 90% by mass or more and 99% by mass or less. When a resin other than the resin (A) is contained, the total content of the resin (A) and the resin other than the resin (A) is preferably 80% by mass or more and 99% by mass or less, more preferably 90% by mass or more and 99% by mass or less, based on the solid content of the resist composition. The solid content of the resist composition and the resin content therewith can be measured by a known analytical means such as liquid chromatography or gas chromatography.

<Solvent (E)>
The content of the solvent (E) in the resist composition is usually from 90% by mass to 99.9% by mass, preferably from 92% by mass to 99% by mass, and more preferably from 94% by mass to 99% by mass. The content of the solvent (E) can be measured by a known analytical method such as liquid chromatography or gas chromatography.
Examples of the solvent (E) include glycol ether esters such as ethyl cellosolve acetate, methyl cellosolve acetate, and propylene glycol monomethyl ether acetate; glycol ethers such as propylene glycol monomethyl ether; esters such as ethyl lactate, butyl acetate, amyl acetate, and ethyl pyruvate; ketones such as acetone, methyl isobutyl ketone, 2-heptanone, and cyclohexanone; cyclic esters such as γ-butyrolactone; and the like. One type of solvent (E) may be used alone.
Two or more types may be used.

<Quencher (C)>
Examples of the quencher (C) include a basic nitrogen-containing organic compound and a salt that generates an acid having a weaker acidity than the acid generated from the acid generator (B). The content of the quencher (C) is preferably about 0.01 to 5 mass % based on the solid content of the resist composition.
The basic nitrogen-containing organic compound includes amines and ammonium salts. The amines include aliphatic amines and aromatic amines. The aliphatic amines include primary amines, secondary amines, and tertiary amines.
Examples of amines include 1-naphthylamine, 2-naphthylamine, aniline, diisopropylaniline, 2-, 3- or 4-methylaniline, 4-nitroaniline, N-methylaniline, N,N-dimethylaniline, diphenylamine, hexylamine, heptylamine, octylamine, nonylamine, decylamine, dibutylamine, dipentylamine,
Dihexylamine, diheptylamine, dioctylamine, dinonylamine, didecylamine, triethylamine, trimethylamine, tripropylamine, tributylamine,
Tripentylamine, trihexylamine, triheptylamine, trioctylamine,
Trinonylamine, tridecylamine, methyldibutylamine, methyldipentylamine, methyldihexylamine, methyldicyclohexylamine, methyldiheptylamine,
Methyldioctylamine, methyldinonylamine, methyldidecylamine, ethyldibutylamine, ethyldipentylamine, ethyldihexylamine, ethyldiheptylamine, ethyldioctylamine, ethyldinonylamine, ethyldidecylamine, dicyclohexylmethylamine, tris[2-(2-methoxyethoxy)ethyl]amine, triisopropanolamine, ethylenediamine, tetramethylenediamine, hexamethylenediamine, 4,4'-diamino-1,2-diphenylethane, 4,4'-diamino-3,3'
-dimethyldiphenylmethane, 4,4'-diamino-3,3'-diethyldiphenylmethane, 2,2'-methylenebisaniline, imidazole, 4-methylimidazole, pyridine, 4-methylpyridine, 1,2-di(2-pyridyl)ethane, 1,2-di(4-pyridyl)ethane, 1,2-di(2-pyridyl)ethene, 1,2-di(4-pyridyl)ethene,
1,3-di(4-pyridyl)propane, 1,2-di(4-pyridyloxy)ethane, di(
2-pyridyl) ketone, 4,4'-dipyridyl sulfide, 4,4'-dipyridyl disulfide, 2,2'-dipyridylamine, 2,2'-dipicolylamine, bipyridine and the like are listed, preferably aromatic amines such as diisopropylaniline and the like are listed, more preferably 2,6-diisopropylaniline.
Examples of the ammonium salt include tetramethylammonium hydroxide, tetraisopropylammonium hydroxide, tetrabutylammonium hydroxide, tetrahexylammonium hydroxide, tetraoctylammonium hydroxide, phenyltrimethylammonium hydroxide, 3-(trifluoromethyl)phenyltrimethylammonium hydroxide, tetra-n-butylammonium salicylate, and choline.

The acidity of a salt that generates an acid weaker than the acid generated from the acid generator (B) is
It is expressed by an acid dissociation constant (pKa). A salt that generates an acid weaker in acidity than the acid generated from the acid generator (B) is a salt having an acid dissociation constant of usually −3<pKa, preferably −1<pKa<7, and more preferably 0<pKa<5.
Examples of the salt that generates an acid having a weaker acidity than the acid generated from the acid generator (B) include a salt represented by the following formula, a salt represented by formula (D) described in JP-A-2015-147926 (hereinafter, referred to as "
Weak acid inner salt (D)" and JP2012-229206A, JP2012-6908A, JP2012-72109A, JP2011-3
Examples of the salt that generates an acid having a weaker acidity than the acid generated from the acid generator (B) include the salts described in JP-A-9502 and JP-A-2011-191745. A weak acid inner salt (D) is preferable as the salt that generates an acid having a weaker acidity than the acid generated from the acid generator (B).

Examples of the weak acid inner salt (D) include the following salts.

When the resist composition contains a quencher (C), the content of the quencher (C) is usually from 0.01 to 5 mass % in the solid content of the resist composition, and preferably from 0.01 to 5 mass %.
It is 3% by mass.

<Other Ingredients>
The resist composition of the present invention may contain components other than the above-mentioned components (hereinafter, sometimes referred to as "other components (F)") as necessary. There are no particular limitations on the other components (F), and additives known in the resist field, such as sensitizers, dissolution inhibitors, surfactants, stabilizers, dyes, etc., can be used.

Preparation of Resist Composition
The resist composition of the present invention comprises a carboxylate (I), a resin (A), an acid generator (B), and, if necessary, a resin other than the resin (A), a solvent (E), a quencher (C
) and other component (F). The order of mixing is arbitrary and is not particularly limited. The temperature during mixing can be appropriately selected from 10 to 40°C depending on the type of resin, etc., the solubility of the resin, etc. in the solvent (E), etc. The mixing time can be appropriately selected from 0.5 to 24 hours depending on the mixing temperature. The mixing means is also not particularly limited, and stirring and mixing can be used.
After mixing the components, it is preferable to filter the mixture using a filter having a pore size of about 0.003 to 0.2 μm.

<Method for Producing Resist Pattern>
The method for producing a resist pattern of the present invention comprises the steps of:
(1) applying the resist composition of the present invention onto a substrate;
(2) A step of drying the applied composition to form a composition layer;
(3) exposing the composition layer to light;
(4) a step of heating the composition layer after exposure, and (5) a step of developing the composition layer after heating.
The resist composition can be applied onto a substrate by a commonly used device such as a spin coater. The substrate can be an inorganic substrate such as a silicon wafer. Before applying the resist composition, the substrate may be cleaned, and an anti-reflective film or the like may be formed on the substrate.
The composition after coating is dried to remove the solvent and form a composition layer.
For example, drying can be performed by evaporating the solvent using a heating device such as a hot plate (so-called pre-baking), or by using a vacuum device. The heating temperature is preferably 50 to 200° C., and the heating time is preferably 10 to 180 seconds. The pressure during reduced pressure drying is preferably about 1 to 1.0×10 ⁵ Pa.
The obtained composition layer is usually exposed using an exposure machine. The exposure machine may be an immersion exposure machine. As the exposure light source, various types can be used, such as those that emit ultraviolet laser light such as KrF excimer laser (wavelength 248 nm), ArF excimer laser (wavelength 193 nm), and _F2 excimer laser (wavelength 157 nm), those that convert the wavelength of laser light from a solid laser light source (YAG or semiconductor laser, etc.) to emit harmonic laser light in the far ultraviolet or vacuum ultraviolet range, and those that irradiate electron beams or extreme ultraviolet light (EUV). In this specification, irradiation with these radiations may be collectively referred to as "exposure". During exposure, exposure is usually performed through a mask corresponding to the desired pattern. When the exposure light source is an electron beam, exposure may be performed by direct drawing without using a mask.
The composition layer after exposure is subjected to a heat treatment (so-called post-exposure bake) in order to promote the deprotection reaction of the acid labile groups. The heating temperature is usually about 50 to 200°C, preferably about 70 to 150°C.
The composition layer after heating is usually developed using a developing device with a developer. Examples of the developing method include a dip method, a paddle method, a spray method, and a dynamic dispense method. The developing temperature is preferably, for example, 5 to 60° C., and the developing time is, for example, 5 to 60° C.
By selecting the type of developer as follows, a positive resist pattern or a negative resist pattern can be produced.
When a positive resist pattern is produced from the resist composition of the present invention, an alkaline developer is used as the developer. The alkaline developer may be any of various alkaline aqueous solutions used in this field. Examples include aqueous solutions of tetramethylammonium hydroxide and (2-hydroxyethyl)trimethylammonium hydroxide (commonly known as choline).
The alkaline developer may contain a surfactant.
After development, the resist pattern is preferably washed with ultrapure water, and then water remaining on the substrate and the pattern is removed.
When producing a negative resist pattern from the resist composition of the present invention, a developer containing an organic solvent (hereinafter sometimes referred to as an "organic developer") is used as the developer.
Examples of the organic solvent contained in the organic developer include ketone solvents such as 2-hexanone and 2-heptanone; glycol ether ester solvents such as propylene glycol monomethyl ether acetate; ester solvents such as butyl acetate; glycol ether solvents such as propylene glycol monomethyl ether; amide solvents such as N,N-dimethylacetamide; and aromatic hydrocarbon solvents such as anisole.
In the organic developer, the content of the organic solvent is preferably 90% by mass or more and 100% by mass or less,
The content is more preferably from 95% by mass to 100% by mass, and further preferably consists essentially of an organic solvent.
Among them, the organic developer is preferably a developer containing butyl acetate and/or 2-heptanone. The total content of butyl acetate and 2-heptanone in the organic developer is 50% by mass.
The content is preferably from 90% by mass to 100% by mass, more preferably from 90% by mass to 100% by mass, and further preferably substantially composed of only butyl acetate and/or 2-heptanone.
The organic developer may contain a surfactant and may contain a small amount of water.
During development, the development may be stopped by replacing the organic developer with a different type of solvent.
It is preferable to wash the resist pattern after development with a rinse solution.
There are no particular limitations as long as the solvent does not dissolve the resist pattern, and a solution containing a general organic solvent can be used, with alcohol solvents or ester solvents being preferred.
After cleaning, it is preferable to remove any rinsing liquid remaining on the substrate and the pattern.

<Application>
The resist composition of the present invention is a resist composition for KrF excimer laser exposure, a resist composition for ArF excimer laser exposure, a resist composition for electron beam (EB) exposure, or a resist composition for EU
The resist composition is suitable as a resist composition for V exposure, in particular as a resist composition for electron beam (EB) exposure or EUV exposure, and is useful for semiconductor microfabrication.

The present invention will be described in more detail with reference to examples. In the examples, "%" and "parts" expressing the content or amount used are based on mass unless otherwise specified.
The weight average molecular weight is a value determined by gel permeation chromatography under the following analytical conditions:
Column: TSKgel Multipore HXL-M x 3+guardcolumn (Tosoh Corporation)
Eluent: Tetrahydrofuran Flow rate: 1.0 mL/min
Detector: RI detector Column temperature: 40℃
Injection volume: 100 μl
Molecular weight standard: Standard polystyrene (Tosoh Corporation)
The structure of the compound was determined by mass spectrometry (LC: Agilent 1100, MASS: Agilent
The molecular ion peak was measured using an LC/MSD spectrometer (manufactured by Ent) and confirmed. In the following examples, the value of the molecular ion peak is indicated by "MASS".

式（Ｉ－１－ａ）で表される化合物１．００部、式（Ｉ－１－ｂ）で表される化合物０
．７０部及びクロロホルム１０部を混合し、２３℃で３０分間攪拌した後、５℃まで冷却
した。得られた混合溶液に、５℃で、トリフルオロメタンスルホン酸０．９４部を１０分
かけて滴下し、さらに、２３℃で２時間攪拌した後、５℃まで冷却した。得られた混合溶
液に、５℃で、式（Ｉ－１－ｃ）で表される化合物０．４９部を添加し、さらに、２３℃
で１８時間攪拌した。得られた混合物に、５％硫酸水素ナトリウム水溶液１０部を加えて
２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン交
換水５部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この水洗
操作を３回繰り返した。得られた有機層に５％炭酸水素ナトリウム水溶液１０部を加えて
２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン交
換水５部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この水洗
操作を３回繰り返した。得られた有機層をろ過した後、ろ液を濃縮し、濃縮残渣に、ｎ－
ヘプタン１５部を加えて、２３℃で３０分間攪拌した後、ろ過することにより、式（Ｉ－
１）で表される塩０．６９部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ３９１．０
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ １５５．０ Example 1: Synthesis of a salt represented by formula (I-1)

1.00 part of the compound represented by formula (I-1-a), 0.0 part of the compound represented by formula (I-1-b)
0.70 parts of toluene and 10 parts of chloroform were mixed, stirred at 23°C for 30 minutes, and then cooled to 5°C. 0.94 parts of trifluoromethanesulfonic acid was added dropwise to the resulting mixed solution at 5°C over 10 minutes, and further stirred at 23°C for 2 hours, and then cooled to 5°C. 0.49 parts of the compound represented by formula (I-1-c) was added to the resulting mixed solution at 5°C, and further stirred at 23°C for 2 hours, and then cooled to 5°C.
The mixture was stirred at 23° C. for 18 hours. 10 parts of a 5% aqueous sodium hydrogen sulfate solution was added to the mixture obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. 5 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. This water-washing operation was repeated three times. 10 parts of a 5% aqueous sodium hydrogen carbonate solution was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. 5 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. This water-washing operation was repeated three times. The organic layer obtained was filtered, and the filtrate was concentrated, and the concentrated residue was concentrated to extract n-
15 parts of heptane was added, and the mixture was stirred at 23° C. for 30 minutes, and then filtered to obtain a product of the formula (I-
0.69 parts of the salt represented by formula 1) was obtained.
MASS (ESI (+) Spectrum): M ⁺ 391.0
MASS (ESI (-) Spectrum): M ^- 155.0

式（Ｉ－１－ａ）で表される化合物１．４０部、式（Ｉ－１－ｂ）で表される化合物２
．１５部及びクロロホルム２０部を混合し、２３℃で３０分間攪拌した後、５℃まで冷却
した。得られた混合溶液に、５℃で、トリフルオロメタンスルホン酸１．８８部を１０分
かけて滴下し、さらに、２３℃で２時間攪拌した後、５℃まで冷却した。得られた混合溶
液に、５℃で、式（Ｉ－４９－ｃ）で表される化合物０．８７部を添加し、さらに、２３
℃で１８時間攪拌した。得られた混合物に、５％硫酸水素ナトリウム水溶液２０部を加え
て２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン
交換水１０部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この
水洗操作を３回繰り返した。得られた有機層に５％炭酸水素ナトリウム水溶液２０部を加
えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオ
ン交換水１０部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。こ
の水洗操作を３回繰り返した。得られた有機層をろ過した後、ろ液を濃縮し、濃縮残渣に
、ｎ－ヘプタン１５部を加えて、２３℃で３０分間攪拌した後、ろ過することにより、式
（Ｉ－４９）で表される塩０．８８部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ３７９．０
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ １５５．０ Example 2: Synthesis of salt represented by formula (I-49)

1.40 parts of the compound represented by formula (I-1-a), 2 parts of the compound represented by formula (I-1-b)
15 parts of toluene and 20 parts of chloroform were mixed, stirred at 23°C for 30 minutes, and then cooled to 5°C. 1.88 parts of trifluoromethanesulfonic acid was added dropwise to the resulting mixed solution at 5°C over 10 minutes, and further stirred at 23°C for 2 hours, and then cooled to 5°C. 0.87 parts of the compound represented by formula (I-49-c) was added to the resulting mixed solution at 5°C, and further 23 parts of toluene were added dropwise to the resulting mixed solution at 5°C.
The mixture was stirred at 23°C for 18 hours. 20 parts of a 5% aqueous sodium hydrogen sulfate solution was added to the mixture obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. 10 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. This water-washing operation was repeated three times. 20 parts of a 5% aqueous sodium hydrogen carbonate solution was added to the organic layer obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. 10 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. This water-washing operation was repeated three times. The organic layer obtained was filtered, and the filtrate was concentrated, and 15 parts of n-heptane was added to the concentrated residue, and the mixture was stirred at 23°C for 30 minutes, and then filtered to obtain 0.88 parts of a salt represented by formula (I-49).
MASS (ESI (+) Spectrum): M ⁺ 379.0
MASS (ESI (-) Spectrum): M ^- 155.0

式（Ｉ－１－ａ）で表される化合物１．００部、式（Ｉ－７－ｂ）で表される化合物０
．８８部及びクロロホルム１０部を混合し、２３℃で３０分間攪拌した後、５℃まで冷却
した。得られた混合溶液に、５℃で、トリフルオロメタンスルホン酸０．９４部を１０分
かけて滴下し、さらに、２３℃で２時間攪拌した後、５℃まで冷却した。得られた混合溶
液に、５℃で、式（Ｉ－１－ｃ）で表される化合物０．４９部を添加し、さらに、２３℃
で１８時間攪拌した。得られた混合物に、５％硫酸水素ナトリウム水溶液１０部を加えて
２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン交
換水５部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この水洗
操作を３回繰り返した。得られた有機層に５％炭酸水素ナトリウム水溶液１０部を加えて
２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン交
換水５部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この水洗
操作を３回繰り返した。得られた有機層をろ過した後、ろ液を濃縮し、濃縮残渣に、ｎ－
ヘプタン１５部を加えて、２３℃で３０分間攪拌した後、ろ過することにより、式（Ｉ－
７）で表される塩０．４４部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ３９１．０
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ １９８．９ Example 3: Synthesis of salt represented by formula (I-7)

1.00 parts of the compound represented by formula (I-1-a), 0 parts of the compound represented by formula (I-7-b)
0.88 parts of toluene and 10 parts of chloroform were mixed, stirred at 23°C for 30 minutes, and then cooled to 5°C. 0.94 parts of trifluoromethanesulfonic acid was added dropwise to the resulting mixed solution at 5°C over 10 minutes, and further stirred at 23°C for 2 hours, and then cooled to 5°C. 0.49 parts of the compound represented by formula (I-1-c) was added to the resulting mixed solution at 5°C, and further stirred at 23°C for 2 hours, and then cooled to 5°C.
The mixture was stirred at 23° C. for 18 hours. 10 parts of a 5% aqueous sodium hydrogen sulfate solution was added to the mixture obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. 5 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. This water-washing operation was repeated three times. 10 parts of a 5% aqueous sodium hydrogen carbonate solution was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. 5 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. This water-washing operation was repeated three times. The organic layer obtained was filtered, and the filtrate was concentrated, and the concentrated residue was concentrated to extract n-
15 parts of heptane was added, and the mixture was stirred at 23° C. for 30 minutes, and then filtered to obtain a product of the formula (I-
7) was obtained.
MASS (ESI (+) Spectrum): M ⁺ 391.0
MASS (ESI (-) Spectrum): M ^- 198.9

式（Ｉ－１－ａ）で表される化合物１．００部、式（Ｉ－８－ｂ）で表される化合物０
．６３部及びクロロホルム１０部を混合し、２３℃で３０分間攪拌した後、５℃まで冷却
した。得られた混合溶液に、５℃で、トリフルオロメタンスルホン酸０．９４部を１０分
かけて滴下し、さらに、２３℃で２時間攪拌した後、５℃まで冷却した。得られた混合溶
液に、５℃で、式（Ｉ－１－ｃ）で表される化合物０．４９部を添加し、さらに、２３℃
で１８時間攪拌した。得られた混合物に、５％硫酸水素ナトリウム水溶液１０部を加えて
２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン交
換水５部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この水洗
操作を３回繰り返した。得られた有機層に５％炭酸水素ナトリウム水溶液１０部を加えて
２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオン交
換水５部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。この水洗
操作を３回繰り返した。得られた有機層をろ過した後、ろ液を濃縮し、濃縮残渣に、ｎ－
ヘプタン１５部を加えて、２３℃で３０分間攪拌した後、ろ過することにより、式（Ｉ－
８）で表される塩０．３１部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ３９１．０
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ １５５．０ Example 4: Synthesis of salt represented by formula (I-8)

1.00 parts of the compound represented by formula (I-1-a), 0 parts of the compound represented by formula (I-8-b)
0.63 parts of toluene and 10 parts of chloroform were mixed, stirred at 23°C for 30 minutes, and then cooled to 5°C. 0.94 parts of trifluoromethanesulfonic acid was added dropwise to the resulting mixed solution at 5°C over 10 minutes, and further stirred at 23°C for 2 hours, and then cooled to 5°C. 0.49 parts of the compound represented by formula (I-1-c) was added to the resulting mixed solution at 5°C, and further stirred at 23°C.
The mixture was stirred at 23° C. for 18 hours. 10 parts of a 5% aqueous sodium hydrogen sulfate solution was added to the mixture obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. 5 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. This water-washing operation was repeated three times. 10 parts of a 5% aqueous sodium hydrogen carbonate solution was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. 5 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23° C. for 30 minutes, followed by separation to extract the organic layer. This water-washing operation was repeated three times. The organic layer obtained was filtered, and the filtrate was concentrated, and the concentrated residue was concentrated to extract n-
15 parts of heptane was added, and the mixture was stirred at 23° C. for 30 minutes, and then filtered to obtain a product of the formula (I-
8) was obtained.
MASS (ESI (+) Spectrum): M ⁺ 391.0
MASS (ESI (-) Spectrum): M ^- 155.0

式（Ｉ－８１－ａ）で表される化合物１．５１部、式（Ｉ－１－ｂ）で表される化合物
２．１５部及びクロロホルム２０部を混合し、２３℃で３０分間攪拌した後、５℃まで冷
却した。得られた混合溶液に、５℃で、トリフルオロメタンスルホン酸１．８８部を１０
分かけて滴下し、さらに、２３℃で２時間攪拌した後、５℃まで冷却した。得られた混合
溶液に、５℃で、式（Ｉ－４９－ｃ）で表される化合物０．８７部を添加し、さらに、２
３℃で１８時間攪拌した。得られた混合物に、５％硫酸水素ナトリウム水溶液２０部を加
えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイオ
ン交換水１０部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。こ
の水洗操作を３回繰り返した。得られた有機層に５％炭酸水素ナトリウム水溶液２０部を
加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。得られた有機層にイ
オン交換水１０部を加えて２３℃で３０分間攪拌した後、分液して有機層を取り出した。
この水洗操作を３回繰り返した。得られた有機層をろ過した後、ろ液を濃縮し、濃縮残渣
に、ｎ－ヘプタン１５部を加えて、２３℃で３０分間攪拌した後、ろ過することにより、
式（Ｉ－８１）で表される塩０．６２部を得た。
ＭＡＳＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ４０１．０
ＭＡＳＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ １５５．０ Example 5: Synthesis of salt represented by formula (I-81)

1.51 parts of the compound represented by formula (I-81-a), 2.15 parts of the compound represented by formula (I-1-b), and 20 parts of chloroform were mixed and stirred at 23° C. for 30 minutes, and then cooled to 5° C. To the resulting mixed solution, 1.88 parts of trifluoromethanesulfonic acid was added at 5° C. for 10 minutes.
The mixture was then stirred at 23° C. for 2 hours and cooled to 5° C. To the resulting mixed solution was added 0.87 parts of the compound represented by formula (I-49-c) at 5° C., and then 2
The mixture was stirred at 3°C for 18 hours. 20 parts of a 5% aqueous sodium hydrogen sulfate solution was added to the mixture obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. 10 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. This water washing operation was repeated three times. 20 parts of a 5% aqueous sodium hydrogen carbonate solution was added to the organic layer obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out. 10 parts of ion-exchanged water was added to the organic layer obtained, and the mixture was stirred at 23°C for 30 minutes, and then the organic layer was separated and taken out.
This water washing operation was repeated three times. The obtained organic layer was filtered, the filtrate was concentrated, and 15 parts of n-heptane was added to the concentrated residue. The mixture was stirred at 23° C. for 30 minutes and then filtered to obtain a filtrate.
0.62 parts of the salt represented by the formula (I-81) was obtained.
MASS (ESI (+) Spectrum): M ⁺ 401.0
MASS (ESI (-) Spectrum): M ^- 155.0

以下、これらのモノマーを式番号に応じて「モノマー（ａ１－１－３）」等という。 Synthesis of Resin The compounds (monomers) used in the synthesis of the resin are shown below.

Hereinafter, these monomers will be referred to as "monomer (a1-1-3)" etc. according to their formula numbers.

Synthesis Example 1 [Synthesis of Resin A1]
As the monomers, monomer (a1-4-2), monomer (a1-1-3) and monomer (a1-2-6) were used, and the molar ratio of monomer (a1-4-2):monomer (a1-1) was
monomer (a1-2-6)) were mixed in a ratio of 38:24:38,
Further, 1.5 times by mass of methyl isobutyl ketone was mixed with the monomer mixture relative to the total mass of all monomers. Azobisisobutyronitrile was added as an initiator to the obtained mixture so that the amount was 7 mol % relative to the total molar number of all monomers.
Polymerization was carried out by heating at 40° C. for about 5 hours. Thereafter, an aqueous p-toluenesulfonic acid solution was added to the polymerization reaction liquid, and the mixture was stirred for 6 hours and then separated. The recovered organic layer was poured into a large amount of n-heptane to precipitate a resin, which was then filtered and recovered to obtain a resin having a weight average molecular weight of about 4.6×10
^Resin A1 (copolymer) having the following structural units was obtained in a yield of 74%.

<Preparation of Resist Composition>
As shown in Table 2, the following components were mixed and the resulting mixture was filtered through a fluororesin filter having a pore size of 0.2 μm to prepare a resist composition.

＜酸発生剤（Ｂ）＞
Ｂ１－４３：式（Ｂ１－４３）で表される塩（特開２０１６－４７８１５号公報の実施
例に従って合成）
＜クエンチャー（Ｃ）＞
Ｃ１：特開２０１１－３９５０２号公報記載の方法で合成

Ｄ１：（東京化成工業（株）製）

＜溶剤（Ｅ）＞
プロピレングリコールモノメチルエーテルアセテート ４００部
プロピレングリコールモノメチルエーテル １００部
γ－ブチロラクトン ５部 <Resin (A)>
A1: Resin A1
<Compound (I)>
I-1: Salt represented by formula (I-1) I-7: Salt represented by formula (I-7) I-8: Salt represented by formula (I-8) I-49: Salt represented by formula (I-49) I-81: Salt represented by formula (I-81) IX-1: Salt represented by formula (IX-1) (synthesized according to the examples in JP2018-43952A)

<Acid Generator (B)>
B1-43: Salt represented by formula (B1-43) (synthesized according to the examples in JP 2016-47815 A)
<Quencher (C)>
C1: Synthesized by the method described in JP-A-2011-39502

D1: (Tokyo Chemical Industry Co., Ltd.)

<Solvent (E)>
Propylene glycol monomethyl ether acetate 400 parts Propylene glycol monomethyl ether 100 parts γ-butyrolactone 5 parts

(Electron Beam Exposure Evaluation of Resist Composition)
A 6-inch silicon wafer was treated with hexamethyldisilazane on a direct hot plate at 90°C for 60 seconds. The resist composition was spin-coated onto this silicon wafer so that the film thickness of the composition layer became 0.04 µm. The wafer was then pre-baked on a direct hot plate for 60 seconds at the temperature shown in the "PB" column of Table 2 to form a composition layer. The composition layer formed on the wafer was then irradiated with an electron beam lithography machine (ELS-F1 manufactured by Elionix Co., Ltd.).
A contact hole pattern (hole pitch 40 nm/hole diameter 17 nm) was directly written by changing the exposure dose stepwise using a 1000 keV laser beam having an energy of 25 to 125 keV.
After exposure, post-exposure baking was performed on a hot plate at the temperature shown in the "PEB" column of Table 2 for 60 seconds, and then paddle development was performed for 60 seconds using a 2.38 mass % aqueous tetramethylammonium hydroxide solution to obtain a resist pattern.
In the resist pattern obtained after development, the exposure amount at which the diameter of a hole formed using the mask was 17 nm was defined as effective sensitivity.

<CD Uniformity (CDU) Evaluation>
In the effective sensitivity, the hole diameter of a pattern formed with a mask having a hole diameter of 17 nm was measured 24 times for each hole, and the average value was taken as the average hole diameter of one hole. The standard deviation was calculated as a population of 400 average hole diameters of a pattern formed with a mask having a hole diameter of 55 nm on the same wafer.
The results are shown in Table 3. The values in parentheses indicate standard deviation (nm).


Compared with the comparative compositions 1 and 2, the standard deviations of the compositions 1 to 12 are small, and the CD uniformity (C
The evaluation was favorable.

A resist composition containing the salt of the present invention can provide a resist pattern with excellent CD uniformity (CDU), and is therefore suitable for semiconductor microfabrication and extremely useful industrially.

Claims (7)

A resist composition comprising a carboxylic acid generator containing a carboxylate represented by formula (I), a sulfonic acid generator, and a resin containing a structural unit having an acid labile group, the structural unit being represented by formula (a1-2).

[In formula (I),
^R1 represents a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
nn1 represents an integer of 1 to 5, and when nn1 is 2 or more, the multiple R ^1s may be the same or different.
R ² represents an alkyl group having 1 to 8 carbon atoms which may have a fluorine atom, and --CH ₂ -- contained in the alkyl group may be replaced by --O-- or --CO--.
nn2 represents an integer of 0 to 5, and when nn2 is 2 or more, the multiple R ² 's may be the same or different.
^R3 represents a fluorine atom, a chlorine atom, an iodine atom or an alkyl group having 1 to 6 carbon atoms, in which _--CH2-- contained in the alkyl group may be replaced by --O-- or --CO--, provided that when nn3 is an integer of 2 or more, ^R3 is not a hydroxy group.
nn3 represents an integer of 0 to 5, and when nn3 is 2 or more, the multiple R ^3s may be the same or different.

[In formula (a1-2),
L ^a2 represents --O-- or *-O--(CH ₂ ) _k1 --CO--O--, where k1 represents an integer of 1 to 7, and * represents the bonding site with --CO--.
R ^a5 represents a hydrogen atom or a methyl group.
R ^a7 represents an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group formed by combining these.
n1 represents an integer of 0 to 10.
n1′ represents an integer of 0 to 3. 2. The resist composition according to claim 1, wherein R ¹ in formula (I) is a fluorine atom or a perfluoroalkyl group having 1 to 3 carbon atoms. The resist composition according to claim 1 or 2, wherein nn2 in formula (I) is an integer from 1 to 5. The resist composition according to any one of claims 1 to 3, wherein nn3 in formula (I) is 1. 5. The resist composition according to claim 1, wherein the sulfonic acid generator comprises a salt represented by formula (B1).

[In formula (B1),
Q ^b1 and Q ^b2 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, in which -CH ₂ - may be replaced by -O- or -CO-, and in which a hydrogen atom may be replaced by a fluorine atom or a hydroxyl group.
Y represents an optionally substituted methyl group or an optionally substituted alicyclic hydrocarbon group having 3 to 18 carbon atoms, and one -CH ₂ - contained in the alicyclic hydrocarbon group may be replaced by -O-, -S(O) ₂ - or -CO-.
Z ⁺ represents an organic cation. 6. The resist composition according to claim 1, wherein the structural unit having an acid labile group further comprises a structural unit represented by formula (a1-1).

[In formula (a1-1),
L ^a1 represents --O-- or *-O--(CH ₂ ) _k1 --CO--O--, where k1 represents an integer of 1 to 7, and * represents the bonding site with --CO--.
R ^a4 represents a hydrogen atom or a methyl group.
R ^a6 represents an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a combination thereof.
m1 represents an integer of 0 to 14. (1) A step of applying the resist composition according to any one of claims 1 to 6 onto a substrate;
(2) A step of drying the applied composition to form a composition layer;
(3) exposing the composition layer to light;
(4) a step of heating the composition layer after exposure; and (5) a step of developing the composition layer after heating.