Nothing Special   »   [go: up one dir, main page]

JP7196011B2 - 直描式露光装置 - Google Patents

直描式露光装置 Download PDF

Info

Publication number
JP7196011B2
JP7196011B2 JP2019085440A JP2019085440A JP7196011B2 JP 7196011 B2 JP7196011 B2 JP 7196011B2 JP 2019085440 A JP2019085440 A JP 2019085440A JP 2019085440 A JP2019085440 A JP 2019085440A JP 7196011 B2 JP7196011 B2 JP 7196011B2
Authority
JP
Japan
Prior art keywords
exposure
work
workpiece
alignment
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2019085440A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020181132A (ja
Inventor
健二 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Original Assignee
Adtec Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd filed Critical Adtec Engineering Co Ltd
Priority to JP2019085440A priority Critical patent/JP7196011B2/ja
Priority to TW109108911A priority patent/TWI856074B/zh
Priority to KR1020200048639A priority patent/KR20200125485A/ko
Priority to CN202010331754.0A priority patent/CN111856886A/zh
Publication of JP2020181132A publication Critical patent/JP2020181132A/ja
Application granted granted Critical
Publication of JP7196011B2 publication Critical patent/JP7196011B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2019085440A 2019-04-26 2019-04-26 直描式露光装置 Active JP7196011B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019085440A JP7196011B2 (ja) 2019-04-26 2019-04-26 直描式露光装置
TW109108911A TWI856074B (zh) 2019-04-26 2020-03-18 直接描繪式曝光裝置
KR1020200048639A KR20200125485A (ko) 2019-04-26 2020-04-22 직접묘화식 노광 장치
CN202010331754.0A CN111856886A (zh) 2019-04-26 2020-04-24 直描式曝光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019085440A JP7196011B2 (ja) 2019-04-26 2019-04-26 直描式露光装置

Publications (2)

Publication Number Publication Date
JP2020181132A JP2020181132A (ja) 2020-11-05
JP7196011B2 true JP7196011B2 (ja) 2022-12-26

Family

ID=72985666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019085440A Active JP7196011B2 (ja) 2019-04-26 2019-04-26 直描式露光装置

Country Status (4)

Country Link
JP (1) JP7196011B2 (zh)
KR (1) KR20200125485A (zh)
CN (1) CN111856886A (zh)
TW (1) TWI856074B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113031405B (zh) * 2021-03-23 2022-10-25 合肥芯碁微电子装备股份有限公司 量产型双面激光直写光刻机及其控制方法
CN114615816B (zh) * 2022-04-12 2022-12-23 苏州天准科技股份有限公司 板材曝光设备

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001237521A (ja) 1999-12-17 2001-08-31 Matsushita Electric Ind Co Ltd 回路形成基板の製造方法およびその製造装置
JP2006098720A (ja) 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 描画装置
JP2008191303A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 描画装置及び方法
JP2008277551A (ja) 2007-04-27 2008-11-13 Tokyo Electron Ltd 塗布、現像装置及びその方法並びに記憶媒体
JP2012199553A (ja) 2012-04-03 2012-10-18 Fujifilm Corp 画像記録方法、および画像記録システム
JP2013166601A (ja) 2012-02-14 2013-08-29 Ihi Corp 搬送装置および搬送方法
US20140332347A1 (en) 2012-01-26 2014-11-13 Singulus Stangl Solar Gmbh Apparatus and method for treating plate-shaped process items

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4539479A (en) * 1983-02-28 1985-09-03 Sheets Ronald E Automatic apparatus and method for exposing, registering, and handling double-sided printed circuit boards
JP2006227277A (ja) * 2005-02-17 2006-08-31 Fuji Photo Film Co Ltd 画像形成方法及び画像形成装置
JP2006227278A (ja) * 2005-02-17 2006-08-31 Fuji Photo Film Co Ltd クランプ部材検出方法と画像形成方法及び画像形成装置
TWI408511B (zh) * 2009-04-24 2013-09-11 E Way Technology Co Ltd Exposure machine and its exposure method
JP7023601B2 (ja) * 2016-11-14 2022-02-22 株式会社アドテックエンジニアリング ダイレクトイメージング露光装置及びダイレクトイメージング露光方法
CN106483775B (zh) * 2016-12-20 2018-06-08 广东莱宝智能装备股份有限公司 曝光机
JP6925921B2 (ja) * 2017-09-26 2021-08-25 株式会社アドテックエンジニアリング 露光装置及び露光方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001237521A (ja) 1999-12-17 2001-08-31 Matsushita Electric Ind Co Ltd 回路形成基板の製造方法およびその製造装置
JP2006098720A (ja) 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 描画装置
JP2008191303A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 描画装置及び方法
JP2008277551A (ja) 2007-04-27 2008-11-13 Tokyo Electron Ltd 塗布、現像装置及びその方法並びに記憶媒体
US20140332347A1 (en) 2012-01-26 2014-11-13 Singulus Stangl Solar Gmbh Apparatus and method for treating plate-shaped process items
JP2013166601A (ja) 2012-02-14 2013-08-29 Ihi Corp 搬送装置および搬送方法
JP2012199553A (ja) 2012-04-03 2012-10-18 Fujifilm Corp 画像記録方法、および画像記録システム

Also Published As

Publication number Publication date
TW202043845A (zh) 2020-12-01
TWI856074B (zh) 2024-09-21
CN111856886A (zh) 2020-10-30
KR20200125485A (ko) 2020-11-04
JP2020181132A (ja) 2020-11-05

Similar Documents

Publication Publication Date Title
JP3757430B2 (ja) 基板の位置決め装置及び露光装置
JP4589198B2 (ja) ワーク搬送装置とそれを備えた画像形成装置並びにワーク搬送方法
JP2006098727A (ja) 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
JP2006098726A (ja) アライメント部の校正方法と、アライメント校正可能な描画装置と、搬送装置
CN109557768B (zh) 曝光装置以及曝光方法
TWI481971B (zh) 曝光方法及曝光裝置
CN111913363B (zh) 直描式曝光装置
JP7196011B2 (ja) 直描式露光装置
WO2007020761A1 (ja) ワーク固定装置及びその位置決め方法並びに画像形成装置
TWI391796B (zh) 曝光裝置及被曝光體
KR20160103927A (ko) 주변 노광 장치, 주변 노광 방법, 프로그램, 및 컴퓨터 기억 매체
JP2003091069A (ja) 蛇行修正機構を備えた帯状ワークの露光装置
JP2006098725A (ja) 描画位置の補正方法と、描画位置を補正可能な描画装置
KR20180037590A (ko) 보조 노광 장치 및 노광량 분포 취득 방법
JP2001117064A (ja) 搬送装置の位置合わせ機構および位置合わせ方法、ならびに基板処理装置
JP2006192520A (ja) クランプ装置及び画像形成装置並びにクランプ方法及び画像形成方法
JP2006195062A (ja) クランプ装置及び画像形成装置
JP5825268B2 (ja) 基板検査装置
JP2818074B2 (ja) 近接露光装置のプリアライメント装置
JP2006227278A (ja) クランプ部材検出方法と画像形成方法及び画像形成装置
JP2006058496A (ja) 基板測定装置及び基板搬送装置並びに基板測定装置を備えた画像形成装置と基板測定方法
JP2006237340A (ja) クランプ装置及び画像形成装置並びにクランプ位置決め方法
JP2006192521A (ja) クランプ装置及び画像形成装置
JP4738887B2 (ja) 露光装置
JP2006269952A (ja) 近接露光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220121

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20220810

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220920

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220921

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20221213

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20221214

R150 Certificate of patent or registration of utility model

Ref document number: 7196011

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150