JP6484853B2 - Reflector unit for exposure apparatus and exposure apparatus - Google Patents

Description

  The present invention relates to a reflection mirror unit for an exposure apparatus and an exposure apparatus, and more particularly, to a reflection mirror unit for an exposure apparatus that is used in an exposure apparatus for a semiconductor or a flat panel display and can control the deflection of the reflection mirror. And an exposure apparatus.

  Conventionally, when the work is distorted, the back surface of the flat mirror is supported by a plurality of support members and supported by a driving device so that the mask pattern can be accurately exposed and transferred in accordance with the exposed area of the work. A device that bends a plane mirror by driving a member has been devised (see, for example, Patent Document 1).

JP 2011-028122 A

  By the way, when the flat mirror is bent, it is necessary to make the flat mirror thin in order to increase the amount of bending. However, if the flat mirror is made thin, the influence of its own weight deflection becomes large, and it is difficult to ensure the performance of the light source. Moreover, although it can respond by increasing the number of support members in patent document 1, there exists a subject that weight increases while cost increases.

  The present invention has been made in view of the above-described problems, and its purpose is to reduce the influence of the deflection of the reflecting mirror even when a thin reflecting mirror is used so that the reflecting mirror can be bent. An object of the present invention is to provide a reflecting mirror unit for an exposure apparatus that can suppress and secure the performance of a light source.

The above object of the present invention can be achieved by the following constitution.
(1) a reflecting mirror that reflects exposure light from a light source;
A plurality of supporting members attached to the back surface of the reflecting mirror and supporting the reflecting mirror;
A plurality of drive devices for respectively driving the plurality of support members;
A reflecting mirror unit for an exposure apparatus that deforms the reflecting surface of the reflecting mirror by driving the support members by the driving devices.
A reflecting mirror for an exposure apparatus, wherein a holding member is provided that is attached to at least two of the supporting members and holds an intermediate pad attached to the back surface of the reflecting mirror at an intermediate position between the at least two supporting members. unit.
(2) The holding member is a single holding plate attached to the plurality of support members,
(1) The reflecting mirror unit for an exposure apparatus according to (1), wherein a distance between the holding plate and the intermediate pad held by the holding plate is adjustable.
(3) The reflecting mirror unit for an exposure apparatus according to claim 2, wherein the holding plate has a lightening portion at a portion other than a connection portion connecting the support member and the intermediate pad.
(4) Each of the plurality of support members includes a ball joint,
(2) or (3), wherein the holding plate is attached to the plurality of support members on the reflector side of the ball joint.
(5) Illumination optics including the workpiece support unit that supports the workpiece, the mask support unit that supports the mask, and the reflecting mirror unit according to any one of (1) to (4) that reflects exposure light from the light source. An exposure apparatus that irradiates the work with exposure light from the light source through the mask and transfers the pattern of the mask onto the work.

  According to the reflecting mirror unit for an exposure apparatus of the present invention, there is provided a holding member that is attached to at least two supporting members and holds an intermediate pad attached to the back surface of the reflecting mirror at an intermediate position between the at least two supporting members. Therefore, even when a thin reflecting mirror is employed so that the reflecting mirror can be bent, the influence of the deflection of the reflecting mirror by its own weight can be suppressed and the performance of the light source can be ensured.

It is a front view of the exposure apparatus which concerns on this invention. It is a figure which shows the illumination optical system and curvature correction amount detection system of exposure apparatus. (A) is a top view which shows the reflective-mirror unit for exposure apparatuses of an illumination optical system, (b) is sectional drawing along the III-III line of (a), (c) is (a). It is sectional drawing along line III'-III '. FIG. 4 is an enlarged view of a main part showing a reflecting mirror unit for an exposure apparatus in FIG. 3. (A) is a top view which shows the modification of the reflecting mirror unit for exposure apparatuses of an illumination optical system, (b) is sectional drawing along the VV line of (a), (c), It is sectional drawing along the V'-V 'line of (a). It is sectional drawing which shows the other modification of the reflecting mirror unit for exposure apparatuses of an illumination optical system. (A), (b) is sectional drawing which shows the further another modification of the reflective mirror unit for exposure apparatuses of an illumination optical system.

Hereinafter, an embodiment of an exposure apparatus according to the present invention will be described in detail with reference to the drawings. FIG. 1 shows an exposure apparatus according to the present invention.
As shown in FIG. 1, the proximity exposure apparatus PE uses a mask M smaller than a workpiece W as a material to be exposed, holds the mask M on a mask stage 1, and holds the workpiece W on a workpiece stage (work support unit) 2. The pattern of the mask M is irradiated by irradiating the mask M with light for pattern exposure from the illumination optical system 3 in a state where the mask M and the workpiece W are placed close to each other with a predetermined exposure gap. The exposure is transferred onto the workpiece W. Further, the work stage 2 is moved stepwise with respect to the mask M in the two axial directions of the X axis direction and the Y axis direction, and exposure transfer is performed for each step.

  In order to move the work stage 2 stepwise in the X-axis direction, an X-axis stage feed mechanism 5 for moving the X-axis feed base 5a stepwise in the X-axis direction is installed on the apparatus base 4. On the X-axis feed base 5a of the X-axis stage feed mechanism 5, a Y-axis stage feed mechanism 6 for moving the Y-axis feed base 6a stepwise in the Y-axis direction is installed in order to move the work stage 2 stepwise in the Y-axis direction. Has been. The work stage 2 is installed on the Y-axis feed base 6 a of the Y-axis stage feed mechanism 6. On the upper surface of the work stage 2, the work W is held in a state of being sucked by a work chuck or the like. Further, a substrate side displacement sensor 15 for measuring the lower surface height of the mask M is disposed on the side portion of the work stage 2. Therefore, the substrate side displacement sensor 15 can move in the X and Y axis directions together with the work stage 2.

  On the apparatus base 4, a plurality of (four in the embodiment shown in the figure) X-axis linear guide rails 51 are arranged in the X-axis direction, and each guide rail 51 has a lower surface of the X-axis feed base 5 a. A slider 52 fixed to the bridge is straddled. Thereby, the X-axis feed base 5 a is driven by the first linear motor 20 of the X-axis stage feed mechanism 5 and can reciprocate along the guide rail 51 in the X-axis direction. A plurality of guide rails 53 for Y-axis linear guides are arranged on the X-axis feed base 5a in the Y-axis direction. Each guide rail 53 has a slider 54 fixed to the lower surface of the Y-axis feed base 6a. Is straddled. Accordingly, the Y-axis feed base 6 a is driven by the second linear motor 21 of the Y-axis stage feed mechanism 6 and can reciprocate in the Y-axis direction along the guide rail 53.

  Between the Y-axis stage feed mechanism 6 and the work stage 2, since the work stage 2 is moved in the vertical direction, the vertical coarse motion device 7 having a relatively coarse positioning resolution but a large moving stroke and moving speed, and the vertical coarse motion Positioning with high resolution is possible compared with the apparatus 7, and a vertical fine movement apparatus 8 is provided for finely adjusting the gap between the opposing surfaces of the mask M and the work W to a predetermined amount by finely moving the work stage 2 up and down. .

  The vertical coarse movement device 7 moves the work stage 2 up and down with respect to the fine movement stage 6b by an appropriate drive mechanism provided on the fine movement stage 6b described later. The stage coarse movement shafts 14 fixed at four positions on the bottom surface of the work stage 2 are engaged with linear motion bearings 14a fixed to the fine movement stage 6b, and are guided in the vertical direction with respect to the fine movement stage 6b. In addition, it is desirable that the vertical coarse motion device 7 has high repeated positioning accuracy even if the resolution is low.

  The vertical fine movement device 8 includes a fixed base 9 fixed to the Y-axis feed base 6a, and a linear guide guide rail 10 attached to the fixed base 9 with its inner end inclined obliquely downward. A ball screw nut (not shown) is coupled to a slide body 12 that reciprocates along the guide rail 10 via a slider 11 straddling the guide rail 10, and an upper end surface of the slide body 12. Is in contact with the flange 12a fixed to the fine movement stage 6b so as to be slidable in the horizontal direction.

Then, when the screw shaft of the ball screw is rotationally driven by the motor 17 attached to the fixed base 9, the nut, the slider 11 and the slide body 12 are integrally moved along the guide rail 10 in an oblique direction. The flange 12a is finely moved up and down.
Note that the vertical fine movement device 8 may drive the slide body 12 by a linear motor instead of driving the slide body 12 by the motor 17 and the ball screw.

The vertical fine movement device 8 is installed on one end side (left end side in FIG. 1) in the Y-axis direction of the Z-axis feed base 6a and two on the other end side, for a total of three units, and each is independently driven and controlled. It has become so. As a result, the vertical fine movement device 8 increases the heights of the flanges 12a at the three locations based on the measurement results of the gap amounts between the mask M and the workpiece W at a plurality of locations by the gap sensor constituting the mask side displacement sensor 27 described later. Finely adjust the height and inclination of the work stage 2 by fine adjustment independently.
In addition, when the height of the work stage 2 can be sufficiently adjusted by the vertical fine movement device 8, the vertical coarse movement device 7 may be omitted.

  On the Y-axis feed base 6a, a bar mirror 19 facing the Y-axis laser interferometer 18 that detects the position of the work stage 2 in the Y direction, and an X-axis laser that detects the position of the work stage 2 in the X-axis direction. A bar mirror (both not shown) facing the interferometer is installed. The bar mirror 19 facing the Y-axis laser interferometer 18 is arranged along the X-axis direction on one side of the Y-axis feed base 6a, and the bar mirror facing the X-axis laser interferometer is located on the Y-axis feed base 6a. It is arranged along the Y-axis direction on one end side.

  The Y-axis laser interferometer 18 and the X-axis laser interferometer are arranged so as to always face the corresponding bar mirrors and supported by the apparatus base 4. Two Y-axis laser interferometers 18 are installed apart from each other in the X-axis direction. The two Y-axis laser interferometers 18 detect the position of the Y-axis feed base 6a and consequently the work stage 2 in the Y-axis direction and the yawing error via the bar mirror 19. In addition, the X-axis laser interferometer detects the position of the X-axis feed base 5a and eventually the work stage 2 in the X-axis direction via the opposing bar mirror.

  The mask stage 1 is inserted in a X, Y, θ direction (in the X, Y plane) by inserting a mask base frame 24 composed of a substantially rectangular frame body and a gap into a central opening of the mask base frame 24. The mask base frame 24 is held at a fixed position above the work stage 2 by a support column 4a protruding from the apparatus base 4.

  A frame-shaped mask holder (mask support portion) 26 is provided on the lower surface of the central opening of the mask frame 25. That is, a plurality of mask holder suction grooves connected to a vacuum suction device (not shown) are provided on the lower surface of the mask frame 25, and the mask holder 26 is sucked to the mask frame 25 through the plurality of mask holder suction grooves. Retained.

  A plurality of mask suction grooves (not shown) are provided on the lower surface of the mask holder 26 for sucking the peripheral portion of the mask M on which the mask pattern is not drawn. The mask M passes through the mask suction grooves. Then, it is detachably held on the lower surface of the mask holder 26 by a vacuum suction device (not shown).

  As shown in FIG. 2, the illumination optical system 3 of the exposure apparatus PE of this embodiment includes, for example, a high-pressure mercury lamp 61 that is a light source for ultraviolet irradiation, and a reflector that collects light emitted from the high-pressure mercury lamp 61. A multi-lamp unit 60 provided with 62, a plane mirror 63 for changing the direction of the optical path EL, an exposure control shutter unit 64 for controlling the opening and closing of the irradiation optical path, and a downstream side of the exposure control shutter unit 64. An optical integrator 65 that emits the light collected by the reflector 62 so as to have as uniform an illuminance distribution as possible in the irradiation region; a plane mirror 66 for changing the direction of the optical path EL emitted from the optical integrator 65; Collimation mirror 67 for irradiating light from high-pressure mercury lamp 61 as parallel light Comprises a plane mirror 68 for irradiating the the parallel light to the mask M, the. Note that a DUV cut filter, a polarization filter, and a band pass filter may be disposed between the optical integrator 65 and the exposure surface. Further, the light source may be a single lamp as a high-pressure mercury lamp, or may be constituted by an LED.

  When the exposure control shutter unit 64 is controlled to open during exposure, the light emitted from the multi-lamp unit 60 passes through the plane mirror 63, the optical integrator 65, the plane mirror 66, the collimation mirror 67, and the plane mirror 68. Then, the mask M held by the mask holder 26 and, consequently, the surface of the work W are irradiated as light for pattern exposure, and the exposure pattern of the mask M is exposed and transferred onto the work W.

  Here, as shown in FIG. 3, the plane mirror 68 is made of a glass material formed in a rectangular shape in front view. The flat mirror 68 is supported on the mirror deformation unit holding frame 71 by a plurality of mirror deformation units 70 provided on the back side of the flat mirror 68.

  Each mirror deformation unit 70 includes a pad 72 that is fixed to the back surface of the flat mirror 68 with an adhesive, a support member 73 that is fixed to the pad 72 at one end, and an actuator 74 that is a drive device that drives the support member 73. Is provided.

  The support member 73 is provided with a ball joint 76 as a bending mechanism that allows bending of ± 0 · 5 deg or more at a position close to the pad 72 with respect to the holding frame 71, and is opposite to the holding frame 71. An actuator 74 is attached to the other end.

  Further, a plurality of contact sensors 81 are attached to the back surface of each position of the flat mirror 68 that reflects the exposure light at the position of an alignment mark (not shown) on the mask side.

  Accordingly, the plane mirror 68 drives the support member 73 by the actuator 74 of each mirror deformation unit 70 while sensing the amount of displacement of the plane mirror 68 by the contact sensor 81, so that each support member 73 has a length. Due to the difference, the curvature of the plane mirror 68 can be locally corrected, and the declination angle of the plane mirror 68 can be corrected.

  At this time, each mirror deformation unit 70 is provided with a ball joint 76, so that the portion on the support side can be rotated three-dimensionally, and each pad 72 is placed on the surface of the plane mirror 68. Can be tilted along. For this reason, the adhesive peeling between each pad 72 and the plane mirror 68 is prevented, and the stress of the plane mirror 68 between the pads 72 having different movement amounts is suppressed, and the average fracture stress value is made of a small glass material. Even when the curvature of the plane mirror 68 is locally corrected, the plane mirror 68 can be bent on the order of 10 mm without damaging the plane mirror 68, and the curvature can be greatly changed.

  Further, on the back surface of the plane mirror 68, four supports arranged so as to form a quadrangle adjacent to each other in the middle position of the plurality of support members 73, specifically, in the direction of two orthogonal sides of the plane mirror 68, respectively. A plurality of intermediate pads 72a are fixed to each central position of each member 73 with an adhesive. In addition, a single holding plate 82 that holds the plurality of intermediate pads 72 a is attached to the plurality of support members 73 closer to the plane mirror 68 than the ball joint 76. That is, the holding plate 82 is attached to at least two support members 73 and holds the intermediate pad 72 a disposed at an intermediate position between at least the two support members 73.

  Each intermediate pad 72a is formed with a male threaded portion 83 on the opposite side of the plane mirror 68, and by fastening two nuts 84 located on both sides of the retaining plate 82 to the male threaded portion 83 from both sides, A height adjustment mechanism 85 that fixes the distance between the holding plate 82 and the intermediate pad 72a is configured while fixing the 82.

  The material of the holding plate 82 is arbitrary as long as it can follow the deformation of the plane mirror 68, and may be made of, for example, an aluminum material. Alternatively, the holding plate 82 may be made of a material having substantially the same longitudinal elastic modulus as that of the glass material constituting the flat mirror 68.

  Further, as shown in FIG. 4, the holding plate 82 has a plurality of circular holes 82 c that are fitted to the respective support members 73, while the male plate portions 83 are arranged so as to easily follow the bending of the plane mirror 68. It has a plurality of circular holes 82d with play. Further, the thickness of the holding plate 82 is set to be approximately half of the thickness of the flat mirror 68 in order to prevent wasteful consumption of the thrust force of the actuator 74 of the mirror deformation unit 70.

  That is, the plane mirror 68 of the present embodiment, a plurality of pads 72, a plurality of support members 73, a plurality of actuators 74, a mirror deformation unit 70 having a plurality of ball joints 76, a plurality of intermediate pads 72a, and a plurality of The height adjusting mechanism 85 and the holding plate 82 constitute a reflecting mirror unit for an exposure apparatus according to the present invention.

  Therefore, when the flat mirror 68 is made thin considering the flexibility of the mirror deformation unit 70, the intermediate portion between the support members 73 may be bent by its own weight, but the intermediate portion is held by the holding plate 82. As a result, the influence of the self-weight deflection can be suppressed and the performance of the light source can be ensured. In addition, by configuring the height adjustment mechanism 85 with the male screw portion 83 and the two nuts 84, the distance between the holding plate 82 and the intermediate pad 72a can be arbitrarily adjusted.

  Further, as shown in FIG. 3, the holding plate 82 has connection portions 82a extending around four support members 73 arranged at the four corners so as to form a quadrangle with the intermediate pad 72a as a center, and supporting A portion other than the connecting portion connecting the member 73 and the pad 72a is provided with a thinned portion 82b. That is, the holding plate 82 is formed in a mesh shape, and the weight is reduced.

  Returning to FIG. 2, in this embodiment, when the curvature of the plane mirror 68 is corrected, the curvature correction amount detection for determining whether or not the curvature correction of the plane mirror 68 corresponding to the strain amount of the workpiece W has been performed. A system 90 is provided. The curvature correction amount detection system 90 irradiates laser light L as light having directivity from the exposure surface side (in the vicinity of the mask in this embodiment) toward the plane mirror 68 from the plane mirror 68 in the optical path EL of the light beam of exposure light. A plurality of (four in the present embodiment) laser pointers 91, a reflector 92 disposed in the vicinity of the optical integrator 65 so as to be retractable from the optical path EL of the light beam of exposure light, and a plane mirror 68 Are provided between the camera 93 and an actuator 74 of the mirror deformation unit 70 of the plane mirror 68 as an imaging means for imaging the laser light L reflected on the reflection plate 92. The amount of displacement of the laser light L imaged when the curvature is corrected is detected, and the mirror is set so that the amount of displacement corresponds to the calculated strain amount. And a control unit 94 which controls the actuator 74 in the form unit 70, a.

  The laser pointer 91 is attached to, for example, an upper part of a CCD camera (not shown) for detecting alignment, and moves in synchronization with the CCD camera moving forward and backward to a position where the alignment mark on the mask side can be visually recognized.

  Since the reflecting plate 92 is disposed in the vicinity of the integrator that is the most condensed light by being reflected by the collimation mirror 67, the four laser pointers reflected by the plane mirror 68, the collimation mirror 67, and the plane mirror 66. The laser beam L from 91 can be captured by the reflector 92 having a relatively small area. Further, the reflector 92 is disposed so as to be retractable from the optical path EL of the light beam by a driving mechanism (not shown) when the mask M is irradiated with the light beam of the exposure light from the light source during normal exposure. Furthermore, the reflection plate 92 is a reflective surface having a low reflectance, so that the visibility of the laser light L with the camera 93 can be improved.

  The camera 93 is disposed at a position away from the light path EL of the light beam from the light source so as not to affect the light beam of the exposure light.

  Further, the control unit 94 detects the position of the laser light L imaged by the camera 93 as a displacement amount before and after the curvature correction, and determines whether the displacement amount corresponds to the strain amount of the workpiece W. After confirmation, a control signal is given to the actuator 74 of the mirror deformation unit 70 of the plane mirror 68.

  As described above, according to the reflecting mirror unit for an exposure apparatus of the present embodiment, it is attached to the plurality of support members 73 and attached to the back surface of the plane mirror 68 at each intermediate position of the plurality of support members 73. A holding plate 82 that holds the plurality of intermediate pads 72a is provided. Thereby, even if it is a case where the thin plane mirror 68 is employ | adopted so that the plane mirror 68 can be bent, the influence of the self-weight bending of the plane mirror 68 can be suppressed, and the performance of a light source can be ensured.

  Further, the holding plate 82 is a single member attached to all the supporting members 73, and the distance between the holding plate 82 and the intermediate pad 72a held by the holding plate 82 is configured to be adjustable. It is possible to adjust to an arbitrary deflection amount with a simple configuration and at an intermediate position between the two support members 73.

  Further, since the holding plate 82 has the lightening portion 82b in a portion other than the connection portion 82a connecting the support member 73 and the pad 72a, the weight of the reflecting mirror unit can be reduced.

  Further, each of the plurality of support members 73 includes a ball joint 76, and the holding plate 82 is attached to the plurality of support members 73 closer to the plane mirror 68 than the ball joint 76, and thus the thrust of the actuator 74 is affected. Further, the holding plate 82 can be deformed along the deformation of the plane mirror 68.

In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably.
For example, as in the modification shown in FIG. 5, a plurality of intermediate pads 72 a are arranged for each intermediate position of two support members 73 adjacent in the direction of one side of the plane mirror 68, and a single holding plate 82 is formed between these The pad 72a may be held. Accordingly, the holding plate 82 is formed with a substantially rectangular cutout portion 82b in a region surrounded by a rectangular shape by the two support members 73 and the two intermediate pads 72a arranged in a direction orthogonal to the one side.

  Further, the holding plate 82 of the present embodiment is attached to all the supporting members 73 and holds the intermediate pads 72a provided at intermediate positions between the two predetermined supporting members 73, respectively. However, the holding plate 82 of the present invention is not limited to this, and is attached to at least two support members 73, and an intermediate pad 72 a attached to the back surface of the plane mirror 68 at an intermediate position between the at least two support members 73. May be held. That is, each intermediate pad 72a may be held using a plurality of holding plates 82.

Further, as in another modification shown in FIG. 6, the holding member may be provided with an elastic member 88 such as a spring at a connection portion connecting the support member 73 and the intermediate pad 72 a.
In the above embodiment, the peripheral edge of the plane mirror 68 is supported by the support member 73, and the intermediate pad 72 a is provided at an intermediate position between the two support members 73, but the peripheral edge of the plane mirror 68 is supported. When located outside the member 73, a pad may be separately provided on the peripheral edge of the plane mirror 68 and held by the holding plate 82.

In the above embodiment, the distance between the holding plate 82 and the intermediate pad 72a is adjusted by tightening the two nuts 84 from both sides of the holding plate 82 with respect to the bolt having the male screw portion 83 attached to the intermediate pad 72a. It is done in
On the other hand, as in the modification shown in FIGS. 7A and 7B, the nut 84 may be screwed into the male threaded portion 83 of the bolt only on the side of the holding plate 82 that is separated from the intermediate pad 72a. In this case, since the nut 84 is not provided on the intermediate pad 72a side of the holding plate 82, the distance can be adjusted more easily, and the occurrence of stress concentration when the holding plate 82 is bent is suppressed. be able to. Therefore, the holding accuracy when the flat mirror 68 is bent can be increased, and the performance of the light source can be ensured.

  Further, the male threaded portion 83 of the bolt may be inserted with play in the circular hole 82d of the holding plate 82 as shown in FIG. 7 (a), or as shown in FIG. 7 (b). The holding plate 82 may be screwed into a female screw hole 82e formed instead of the circular hole 82d. The male screw 83 is screwed into the female screw hole 82e of the holding plate 82, so that the holding plate 82 is not displaced even when the plane mirror 68 is bent, and when the plane mirror 68 is bent. The holding accuracy can be further increased, and the performance of the light source can be ensured.

  Furthermore, the reflecting mirror of the present invention is not limited to the flat mirror 68, and may be a convex mirror or a concave mirror.

1 Mask stage (mask support part)
2 Work stage (work support part)
3 Illumination optics 61 High-pressure mercury lamp (light source)
68 Flat mirror
72 Pad 72a Intermediate pad 73 Support member 74 Actuator (drive device)
76 Ball joint 82 Holding plate 82b Thickening part 85 Height adjustment mechanism M Mask PE Proximity exposure device W Workpiece

Claims (5)

A reflecting mirror that reflects exposure light from the light source;
A plurality of supporting members attached to the back surface of the reflecting mirror and supporting the reflecting mirror;
A plurality of drive devices for respectively driving the plurality of support members;
A reflecting mirror unit for an exposure apparatus that deforms the reflecting surface of the reflecting mirror by driving the support members by the driving devices.
A reflecting mirror for an exposure apparatus, wherein a holding member is provided that is attached to at least two of the supporting members and holds an intermediate pad attached to the back surface of the reflecting mirror at an intermediate position between the at least two supporting members. unit. The holding member is a single holding plate attached to the plurality of support members,
2. The reflecting mirror unit for an exposure apparatus according to claim 1, wherein a distance between the holding plate and the intermediate pad held by the holding plate is adjustable.   3. The reflecting mirror unit for an exposure apparatus according to claim 2, wherein the holding plate has a thinned portion at a portion other than a connecting portion connecting the support member and the intermediate pad. Each of the plurality of support members includes a ball joint,
4. The reflecting mirror unit for an exposure apparatus according to claim 2, wherein the holding plate is attached to the plurality of supporting members on the reflecting mirror side with respect to the ball joint. A work support unit that supports a work, a mask support unit that supports a mask, and an illumination optical system that includes the reflecting mirror unit according to claim 1 that reflects exposure light from a light source. An exposure apparatus that irradiates the work with exposure light from the light source through the mask and transfers the pattern of the mask onto the work.

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