JP6476417B2 - 抵抗器の製造方法 - Google Patents
抵抗器の製造方法 Download PDFInfo
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- JP6476417B2 JP6476417B2 JP2015530696A JP2015530696A JP6476417B2 JP 6476417 B2 JP6476417 B2 JP 6476417B2 JP 2015530696 A JP2015530696 A JP 2015530696A JP 2015530696 A JP2015530696 A JP 2015530696A JP 6476417 B2 JP6476417 B2 JP 6476417B2
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- resistor
- electrode
- electrodes
- insulating film
- strip
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- 238000004519 manufacturing process Methods 0.000 title claims description 43
- 230000001681 protective effect Effects 0.000 claims description 48
- 239000002184 metal Substances 0.000 claims description 36
- 229910052751 metal Inorganic materials 0.000 claims description 36
- 238000005520 cutting process Methods 0.000 claims description 26
- 239000000843 powder Substances 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 4
- 238000007747 plating Methods 0.000 description 29
- 238000000034 method Methods 0.000 description 22
- 239000010949 copper Substances 0.000 description 19
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 238000009966 trimming Methods 0.000 description 8
- 229910003336 CuNi Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 238000005253 cladding Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C1/00—Details
- H01C1/14—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/003—Apparatus or processes specially adapted for manufacturing resistors using lithography, e.g. photolithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
- H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/28—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/28—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals
- H01C17/281—Apparatus or processes specially adapted for manufacturing resistors adapted for applying terminals by thick film techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/003—Thick film resistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Details Of Resistors (AREA)
- Non-Adjustable Resistors (AREA)
Description
図1は本発明の実施の形態1における抵抗器の斜視図、図2は図1の2−2線断面図である。
以下、本発明の実施の形態2における抵抗器の製造方法について図面を参照しながら説明する。
以下、本発明の実施の形態3における抵抗器の製造方法について図面を参照しながら説明する。
11a シート状抵抗体
12 保護膜(絶縁膜)
12a 裏面絶縁膜
13 電極(帯状電極)
14 めっき層
15 個片状の抵抗体(抵抗体)
17 スリット
18 第1の絶縁膜
19 第2の絶縁膜
21 レジスト
22 隙間
22a 開口部
Claims (2)
- 金属で構成された抵抗体の上面に縦方向、横方向に一定間隔をあけて金属粉を含有するペーストを印刷して複数の電極を形成するステップと、
前記抵抗体の上面と前記複数の電極の上面とを覆うように保護膜を形成するステップと、前記複数の電極が露出するまで前記保護膜を研磨するステップと、
横方向に並ぶ前記電極の中央部を横方向に切断するとともに、隣り合う前記電極同士の間に位置する前記保護膜の中央部を縦方向に切断し、個片状にするステップと、を備えた、抵抗器の製造方法。 - 金属で構成されたシート状抵抗体の表面に間隔をあけて金属粉を含有するペーストを印刷して複数の帯状電極を形成するステップと、
前記シート状抵抗体に前記複数の帯状電極と交わるスリットを形成するステップと、
前記複数の帯状電極のうち隣り合う2つの間に第1の絶縁膜を形成するとともに前記スリットを埋めるように第2の絶縁膜を形成するステップと、
前記シート状抵抗体を前記スリットと前記複数の帯状電極において切断して個片状に分割するステップと、を備えた、
抵抗器の製造方法。
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013163884 | 2013-08-07 | ||
JP2013163884 | 2013-08-07 | ||
JP2013193812 | 2013-09-19 | ||
JP2013193812 | 2013-09-19 | ||
JP2014025364 | 2014-02-13 | ||
JP2014025364 | 2014-02-13 | ||
PCT/JP2014/004043 WO2015019590A1 (ja) | 2013-08-07 | 2014-08-01 | 抵抗器およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2015019590A1 JPWO2015019590A1 (ja) | 2017-03-02 |
JP6476417B2 true JP6476417B2 (ja) | 2019-03-06 |
Family
ID=52460946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015530696A Active JP6476417B2 (ja) | 2013-08-07 | 2014-08-01 | 抵抗器の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US9959957B2 (ja) |
JP (1) | JP6476417B2 (ja) |
CN (1) | CN105453192B (ja) |
WO (1) | WO2015019590A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7018251B2 (ja) * | 2015-05-21 | 2022-02-10 | ローム株式会社 | チップ抵抗器 |
US9552908B2 (en) * | 2015-06-16 | 2017-01-24 | National Cheng Kung University | Chip resistor device having terminal electrodes |
JP6688025B2 (ja) * | 2015-08-26 | 2020-04-28 | Koa株式会社 | チップ抵抗器およびチップ抵抗器の製造方法 |
JP6615637B2 (ja) * | 2016-02-25 | 2019-12-04 | Koa株式会社 | チップ抵抗器の製造方法 |
WO2018110288A1 (ja) * | 2016-12-16 | 2018-06-21 | パナソニックIpマネジメント株式会社 | チップ抵抗器およびその製造方法 |
WO2018216455A1 (ja) * | 2017-05-23 | 2018-11-29 | パナソニックIpマネジメント株式会社 | 金属板抵抗器およびその製造方法 |
EP3451352B1 (en) | 2017-08-28 | 2020-05-27 | Hochschule Für Angewandte Wissenschaften München | High-precision additive formation of electrical resistors |
JP7113202B2 (ja) * | 2017-11-07 | 2022-08-05 | パナソニックIpマネジメント株式会社 | チップ抵抗器およびその製造方法 |
CN110114843B (zh) * | 2017-12-01 | 2021-07-23 | 松下知识产权经营株式会社 | 金属板电阻器及其制造方法 |
CN109202546A (zh) * | 2018-09-29 | 2019-01-15 | 信利半导体有限公司 | 改善柔性基板切割毛刺的方法 |
CN110660551B (zh) * | 2019-09-20 | 2021-03-02 | 丽智电子(南通)有限公司 | 一种制作用于电子产品的合金板金属电阻的方法 |
JPWO2023100858A1 (ja) * | 2021-12-01 | 2023-06-08 | ||
WO2023205673A2 (en) * | 2022-04-19 | 2023-10-26 | Helion Energy, Inc. | High-energy particulate resistors |
CN115985601A (zh) * | 2022-10-28 | 2023-04-18 | 深圳顺络电子股份有限公司 | 一种热敏电阻及其制造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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US250635A (en) * | 1881-12-06 | Manufacture of glass building-blocks for sea-walls | ||
DE69022668T2 (de) * | 1989-06-16 | 1996-05-23 | Matsushita Electric Ind Co Ltd | Elektronische Verbindungen, Verfahren zur Bildung von Endverbindern dafür und Paste zur Ausbildung derselben. |
EP1219693B1 (en) * | 2000-02-29 | 2006-05-03 | Matsushita Electric Industrial Co., Ltd. | Conductive adhesive, apparatus for mounting electronic component, and method for mounting the same |
JP2002246206A (ja) * | 2001-02-13 | 2002-08-30 | Koa Corp | チップ抵抗器及びその製造方法 |
CN100421190C (zh) * | 2002-06-19 | 2008-09-24 | 罗姆股份有限公司 | 低电阻值片状电阻器及其制造方法 |
JP3860515B2 (ja) * | 2002-07-24 | 2006-12-20 | ローム株式会社 | チップ抵抗器 |
JP3848245B2 (ja) * | 2002-11-29 | 2006-11-22 | ローム株式会社 | チップ抵抗器 |
WO2004040592A1 (ja) | 2002-10-31 | 2004-05-13 | Rohm Co., Ltd. | チップ抵抗器、その製造方法およびその製造方法に用いられるフレーム |
JP3848247B2 (ja) * | 2002-12-05 | 2006-11-22 | ローム株式会社 | チップ抵抗器およびその製造方法 |
TWM250635U (en) * | 2003-04-14 | 2004-11-21 | Bau-Yu Yang | Cleaning set with waxing functions |
JP4057462B2 (ja) * | 2003-04-28 | 2008-03-05 | ローム株式会社 | チップ抵抗器およびその製造方法 |
JP4452196B2 (ja) * | 2004-05-20 | 2010-04-21 | コーア株式会社 | 金属板抵抗器 |
JP4735318B2 (ja) * | 2006-02-16 | 2011-07-27 | パナソニック株式会社 | 抵抗器およびその製造方法 |
JP2007220860A (ja) * | 2006-02-16 | 2007-08-30 | Matsushita Electric Ind Co Ltd | チップ形電子部品の製造方法 |
TWI430293B (zh) * | 2006-08-10 | 2014-03-11 | Kamaya Electric Co Ltd | Production method of corner plate type chip resistor and corner plate type chip resistor |
JP4460564B2 (ja) | 2006-11-20 | 2010-05-12 | ローム株式会社 | チップ抵抗器 |
JP4264463B2 (ja) * | 2007-08-30 | 2009-05-20 | 釜屋電機株式会社 | 金属板チップ抵抗器の製造方法及び製造装置 |
JP2009218552A (ja) * | 2007-12-17 | 2009-09-24 | Rohm Co Ltd | チップ抵抗器およびその製造方法 |
JP2010196105A (ja) * | 2009-02-24 | 2010-09-09 | Mitsui Mining & Smelting Co Ltd | 導電性ペースト用銅粉及び導電性ペースト |
JP5544824B2 (ja) * | 2009-10-29 | 2014-07-09 | コーア株式会社 | チップ抵抗器の製造方法 |
JP5882015B2 (ja) * | 2011-10-05 | 2016-03-09 | ローム株式会社 | 電子部品の電極構造 |
-
2014
- 2014-08-01 WO PCT/JP2014/004043 patent/WO2015019590A1/ja active Application Filing
- 2014-08-01 JP JP2015530696A patent/JP6476417B2/ja active Active
- 2014-08-01 CN CN201480043722.3A patent/CN105453192B/zh active Active
-
2016
- 2016-01-15 US US14/997,459 patent/US9959957B2/en active Active
-
2018
- 2018-03-26 US US15/935,326 patent/US10373744B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JPWO2015019590A1 (ja) | 2017-03-02 |
CN105453192A (zh) | 2016-03-30 |
US20160133362A1 (en) | 2016-05-12 |
US9959957B2 (en) | 2018-05-01 |
US20180211748A1 (en) | 2018-07-26 |
US10373744B2 (en) | 2019-08-06 |
CN105453192B (zh) | 2018-05-18 |
WO2015019590A1 (ja) | 2015-02-12 |
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