JP6121883B2 - Lift polishing machine - Google Patents

Description

  FIELD Embodiments described herein relate generally to a lifting and polishing apparatus configured to lift and play a game medium and an abrasive while stirring the game medium.

  One or more gaming machine islands will be installed in the game hall. The gaming machine island has a plurality of gaming machines having gaming boards. Each gaming machine is back-to-back, and is arranged in a horizontal direction along the game board. In gaming machines, pachinko balls, coins, medals, and other game media are used. For example, a pachinko ball is circulated in the gaming machine island so that it is supplied to each gaming machine, collected after being used in each gaming machine, and supplied to each gaming machine again.

  In game halls, anti-odor measures have been a challenge for some time. As a deodorizing measure, there is a game machine provided with an aroma generating device (for example, Patent Document 1).

  In other words, the cylinder is disposed below the prize ball discharge basket of the gaming machine. A through hole is provided in the prize ball discharge bowl. The cylinder has a nozzle and contains a fragrance. The nozzle of the cylinder is directed to the through hole. When the fragrance is ejected from the nozzle in the open state, it is configured to reach the player through the through hole. Thereby, a deodorizing effect can be aimed at.

JP 7-171246 A

  However, in the conventional technique described in the above publication, since it is necessary to define a dedicated space for installing the fragrance generating device, it becomes a factor of increasing the size of the gaming machine. Furthermore, the man-hour for manufacturing the fragrance generating device increases, and the man-hour for installing the fragrance generating device in the dedicated space increases. As a result, there is a problem that an effective deodorizing effect cannot be achieved.

  This embodiment solves the above-described problem, and an object thereof is to provide a lifting and polishing apparatus capable of achieving an efficient deodorization effect.

In order to solve the above-described problem, a lift polishing apparatus according to an embodiment is a lift polishing apparatus used in an amusement machine island in which a plurality of gaming machines are arranged, and wets the polishing material with a liquid to which a scent component is added. together with a liquid supply means which is capable of changing incense Ri components, a cylindrical body erected on Yu technique machine island, and Ken Migakuzai was found dampening game media used in each of the Yu technique machine by transferring upward in a state where the mixing inside the cylindrical body, Yu technique medium, Ken Migakuzai, and a transfer means for discharging the separated dirt components from Yu technique medium from the top of the cylinder, exhaust issued game media, possess a separating means for separating Ken Migakuzai, and dirty is a component respectively, and return passage leading to the means feed moves through the liquid-supplying means Ken Migakuzai from separation means, Furthermore, the liquid supply means includes a plurality of tanks in which liquids having different scent components are stored. By one or more may be used are exchanged, characterized in that changeable configured aroma components.
Furthermore, the lift polishing apparatus according to the embodiment is a lift polishing apparatus used in a gaming machine island in which a plurality of gaming machines are arranged. The lift polishing apparatus wets the abrasive with the liquid to which the scent component is added and changes the scent component. In a state where the liquid supply means configured to be possible, the cylinder standing on the gaming machine island, the game medium used in each of the gaming machines and the wet abrasive material are mixed inside the cylinder By transporting upward, the game medium, the abrasive, and the transfer means for discharging the dirt component separated from the game medium from the upper part of the cylinder, and the discharged game medium, the abrasive, and the dirt component are separated from each other. And a return passage that guides the abrasive material from the separation means to the transfer means via the liquid supply means, and the liquid supply means includes a plurality of tanks in which liquids having different scent components are stored. Have multiple tanks By one or more may be used is switched in, to be capable of changing the fragrant component, and wherein.
Further, the lift polishing apparatus according to the embodiment includes a liquid supply means for moistening the abrasive with the liquid added with the scent component in the lift polishing apparatus used in the gaming machine island in which a plurality of gaming machines are arranged, and a game By transporting the cylinder body standing on the machine island, the game medium used in each of the gaming machines, and the wet abrasive material in the state of mixing inside the cylinder body, the game medium and polishing Material, and transfer means for discharging the dirt component separated from the game medium from the upper portion of the cylinder, separation means for separating the discharged game medium, abrasive material, and dirt component, respectively, and the abrasive material from the separation means A return passage that leads to the transfer means via the liquid supply means, and the liquid supply means wets the abrasive by bringing the inside of the return passage into a humidified state.

  When the abrasive is mixed with the game medium by moistening the abrasive with the liquid to which the scent has been added, the scent is transferred to the game medium, and the game medium is supplied to each gaming machine from the lift polishing apparatus Since the scent away from the game medium spreads around the gaming machine island, an effective deodorizing effect can be achieved.

The figure which shows an example of the game machine island which concerns on 1st Embodiment of this invention. The perspective view of a lifting polishing apparatus. The front view of a lifting polishing apparatus. The block diagram of the humidifying means. The conceptual diagram which shows the other example of a liquid supply means. The conceptual diagram which shows the other example of a liquid supply means. The conceptual diagram which shows the other example of a liquid supply means. The conceptual diagram of the liquid supply means which concerns on 2nd Embodiment. The conceptual diagram which shows the other example of a liquid supply means. The conceptual diagram which shows the other example of a liquid supply means. The conceptual diagram of the liquid supply means which concerns on 3rd Embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<First Embodiment>
FIG. 1 shows an example of a gaming machine island 1 according to the first embodiment of the present invention.
As shown in FIG. 1, the gaming machine island 1 has a frame 100 constructed on the floor of the gaming hall, a plurality of gaming machines 200, and a gaming medium circulation mechanism. A large number of gaming machines 200 are back-to-back, arranged side by side along the front and back surfaces, and housed in the frame 100. Hereinafter, the gaming machine 200 may be referred to as a “pachinko machine”, and the gaming medium may be referred to as a “game ball” or a “pachinko ball”. In the following description, the direction in which the gaming machines 200 are arranged side by side is referred to as “longitudinal direction”. The horizontal direction orthogonal to the longitudinal direction is referred to as the “short direction”.

  The game medium circulation mechanism includes a lower tank 7, an out ball throwing rod 8, an out ball guiding rod 8 a, an island ball 9, and a lifting and polishing device 10.

  The lower tank 7 is provided in the lower space of the gaming machine island 1. A game medium (referred to as “out ball”) used in the gaming machine 200 is thrown into the lower tank 7 through the out ball throwing bar 8. The out ball thrown into the lower tank 7 is conveyed to the center of the gaming machine island 1 through the out ball guide bar 8a. The island top 9 is provided in the upper space of the gaming machine island 1.

FIG. 2 is a perspective view of the lift polishing apparatus 10, and FIG. 3 is a front view of the lift polishing apparatus 10.
As shown in FIGS. 1 to 3, the lifting and polishing apparatus 10 includes a main body 2, an island tank 3, a humidifying unit 11, a cylindrical body 30, a transferring unit 40, a separating unit 50, and a return passage 60.

(Main unit 2)
The main body 2 includes a base 4 that is fixed at a predetermined position in the game arcade, and a column 5 that is erected on the base 4. The island tank 3 is provided above the support 5. An abrasive stock 54 described later has the function of the support 5. Separating means 50 and a motor 42 are provided at the upper end of the column.

(Game media)
The game medium is lifted together with the abrasive by the transfer means 40. The lifted game medium is separated from the abrasive by the separating means 50 and supplied to each gaming machine 200 through the island top 9. The game media used in each gaming machine 200 is stored in the lower tank 7 from the out-ball throwing basket 8 and transferred from the lower tank 7 through the out-ball guide basket 8a through the inlet (described later) of the cylindrical body 30. Guided to means 40.

(Abrasive)
The abrasive is separated from the game medium by the separating means 50. The separated abrasive is guided to the transfer means 40 by the return passage 60 and is transported together with the game medium by the transfer means 40. Thus, the abrasive is repeatedly used in the same manner as the game medium.

(Shimakami tank 3)
The island tank 3 temporarily stores the game medium when the game medium fills the island bowl 9. An overflow passage (not shown) for guiding the game medium overflowing from the island tank 3 to the transfer means 40 is connected to the island tank 3.

(Humidifying means 11)
FIG. 4 is a configuration block diagram of the humidifying means 11. As shown in FIG. 4, the humidifying unit 11 includes a control unit 13, an input unit 16, and a liquid supply unit 20.
The humidifying means 11 is configured to wet the abrasive with a liquid (for example, alkaline electrolyzed water described later) and add a scent component to the liquid. Furthermore, it is comprised so that the scent component added to a liquid may be changed based on operation by the input means 16.

  The configuration for moistening the abrasive is configured so that dirt is not attached to the abrasive in the cylindrical body 30. The main reason that dirt adheres to the abrasive is that the abrasive in the cylindrical body 30 dries and easily generates static electricity. As means for preventing dirt from adhering to the abrasive by making it difficult to generate static electricity, for example, 1) means for moistening the abrasive with liquid (here, water) before polishing the game medium; 2) game medium Means for moistening the abrasive with liquid when polishing; 3) means for moistening the transfer means 40 with liquid. The means 3) may be referred to as means for indirectly moistening the abrasive with a liquid. The configuration for adding the scent component to the liquid and the configuration for changing the scent component to be added to the liquid will be described later.

  Hereinafter, means for moistening the abrasive with the liquid before polishing the game medium will be described, means for moistening the abrasive with the liquid when the game medium is being polished, and means for moistening the transfer means 40 with the liquid Will be described later. In addition, when the humidity in the cylinder 30 is low and static electricity is likely to be generated, the polishing material used for polishing is moistened or further moistened in order to make it difficult to generate static electricity. On the other hand, when the humidity in the cylindrical body 30 is high and static electricity hardly occurs, it is not necessary to further wet the abrasive used for polishing, and the current wet state is maintained or the abrasive is moistened. Is configured to temporarily stop.

(Liquid spray)
Next, a configuration for effectively moistening the abrasive will be described with reference to FIGS.
The humidifying means 11 wets the abrasive with the liquid by continuously or intermittently supplying the liquid to the abrasive before being transferred by the transfer means 40 based on the humidity in the cylinder 30. Thus, the inside of the cylindrical body 30 is humidified, and the humidity in the cylindrical body 30 is configured to be kept in a predetermined range. Note that the humidifying means 11 may be configured in any way as long as the abrasive is moistened with liquid before the game medium is polished (immediately before the game medium is guided to the transfer means 40). If the humidifying means 11 is arranged immediately before being guided to the transfer means 40, the abrasive can be effectively moistened with the liquid. If the humidifying means 11 is arranged at a position somewhat away from the immediately preceding position, the humidifying means 11 can be arranged in an effective empty space. In order to wet almost all of the abrasive passing through the return passage 60 with the liquid, the range in which the liquid is sprayed may be configured to be a predetermined region (full width and predetermined length) of the return passage 60. For example, what is necessary is just to comprise so that the range which sprays a liquid may be extended to the predetermined area | region of the return channel | path 60. FIG. At this time, since it is possible to wet almost all of the abrasive in the predetermined region by one spraying, the liquid may be sprayed intermittently. Further, for example, when the range in which the liquid is sprayed is narrow with respect to the entire width of the return passage 60, the spraying direction may be changed along the width direction. Thereby, liquid can be poured not only on the abrasive passing through the central portion of the return passage 60 but also on the abrasive passing through the end of the return passage 60. Further, for example, when the range in which the liquid is sprayed is narrower than the predetermined length of the return passage 60, the abrasive flows along the length direction in the range in which the liquid is sprayed. , Can moisten the flowing abrasive. In the return passage 60, when the abrasives overlap vertically, the sprayed liquid enters the gap between the abrasives, and the lower abrasive can be moistened.

(Alkaline electrolyzed water)
As the liquid to be sprayed, alkaline electrolyzed water having a pH value of 8 to 12 is desirably used. Alkaline electrolyzed water that wets the abrasive material penetrates into the gap between the dirt and the abrasive material due to its osmotic force, so that the dirt is surrounded and the dirt component does not adhere to the abrasive material (permeation and peeling effect). . In addition, lipids in the soil are decomposed to be soaped (soap effect). Furthermore, when the alkaline electrolyzed water touches the game medium, the game medium is sterilized (bactericidal effect). Further, the game medium is not rusted by the alkaline electrolyzed water (rust prevention effect). In addition, since the effect will increase when the pH value of alkaline electrolyzed water is increased, alkaline electrolyzed water having a pH value corresponding to the degree of contamination may be used. In alkaline electrolyzed water having a pH value of less than 8, there is a tendency that the respective effects cannot be sufficiently obtained. In alkaline electrolyzed water having a pH value exceeding 12, although the respective effects are enhanced, it is necessary to add sodium peroxide or hydrogen peroxide solution, which further increases the manufacturing cost.

(Humidity adjustment in the cylinder 30)
Next, the structure which adjusts the humidity in the cylinder 30 is demonstrated with reference to FIG. 3 and FIG.
The predetermined range in which the humidity in the cylinder 30 is maintained is preferably, for example, 50% to 60%. The reason for this range is that when the humidity is less than 50%, the effect of preventing the dirt component from adhering to the abrasive becomes low, and the effect of suppressing the generation of static electricity becomes low. Further, when the humidity exceeds 60%, the dirt component tends to adhere to the game medium due to the wetness of the game medium or the abrasive, making it difficult to separate the dirt component. For example, humidity sensors 12 (see FIG. 4) are arranged at a plurality of locations over the entire length of the cylindrical body 30, for example, at a start end (lower end), an intermediate portion, and a terminal end (upper end). The humidity sensor 12 outputs a signal corresponding to the humidity in the cylindrical body 30. Based on the signal output from the humidity sensor 12, the control means 13 controls the amount of liquid per hour supplied by the liquid supply means 20, for example, so as to adjust the humidity in the cylinder 30. At this time, the control means 13 controls the liquid supply means 20 so as to finely adjust the humidity in the cylindrical body 30 based on the output signal of each humidity sensor 12.

(Liquid supply means 20)
As shown in FIGS. 2 and 3, the liquid supply means 20 is disposed in the middle of the return passage 60. The liquid supply means 20 is configured to wet the abrasive passing through the return passage 60 with the liquid. Any configuration may be used as long as substantially all of the abrasive passing through the return passage 60 is wetted by the liquid.

  As an example, 1) by spraying a liquid on the abrasive in the return passage 60; 2) by dropping a liquid on the abrasive in the return passage 60; 3) to make the inside of the return passage 60 in a humidified state. Therefore, there is a configuration in which the abrasive is moistened.

  Furthermore, liquids to which scent components having different concentrations and types are added are used. The liquid is stored in a plurality of tanks 23. A) One or more of the plurality of tanks 23 are switched and used; B) One or more of the plurality of tanks 23 are replaced and used to change the scent component. .

  A combination of any one of configurations 1) to 3) for moistening the above abrasive and any one of configurations A) and B) for changing the scent component is provided in the liquid supply means 20. .

  First, the liquid supply means 20 in which the configuration 1) for moistening the abrasive and the configuration A) for changing the scent component will be described.

  As shown in FIG. 4, the means for spraying the liquid on the abrasive in the return passage 60 includes, for example, a nozzle 21, a pump 22, a plurality of tanks (liquid tanks) 23, a liquid amount sensor 24, a liquid amount adjusting means 25, And a switch 26. The pump 22 supplies the liquid in the tank 23 to the nozzle 21 at a high pressure. The liquid amount sensor 24 outputs a signal corresponding to the liquid in the tank 23. An informing means for informing the amount of liquid in the tank 23 may be provided based on the output signal. The liquid amount adjusting means 25 is configured to adjust the amount of liquid according to the amount of abrasive flowing through the return passage 60, for example. As a means for adjusting the amount of the liquid, for example, there is one configured so that the diameter of the nozzle 21 can be adjusted, or one configured so that the pressure of the liquid supplied to the nozzle 21 by a pump can be adjusted. Adjustment of the diameter of the nozzle 21 and the pressure of the liquid is controlled by the control means 13. A sensor (not shown) for detecting the amount of abrasive flowing in the return passage 60 may be provided, and the diameter of the nozzle 21 and the like may be automatically adjusted based on a signal output from the sensor. These adjustments may be made manually. The quantity of game media used for the gaming machine island 1 can be predicted according to business hours and business days. Therefore, since the amount of abrasive can also be predicted, the nozzle diameter and the like may be manually adjusted according to business hours and business days.

  Next, a configuration in which the abrasive is moistened with a liquid and a scent component is added to the liquid will be described with reference to FIG.

(Multiple tanks 23)
The plurality of tanks 23 store liquids having different scent components. Here, the “fragrance component” refers to a fragrance and a perfume (including a solid). The scent component may be referred to as “perfume” or simply “scent”. In addition, “liquids having different scent components” refer to liquids having different types and / or concentrations of scent components. Furthermore, “concentration” refers to the ratio of the amount of the scent component to the amount of liquid.

  In the following description, liquids A and B in which scent components are added to alkaline electrolyzed water and have different scent component concentrations will be described as representative liquids having different scent components (see FIG. 4). Here, the liquid A has a relatively weak stimulus, and the liquid B has a relatively strong stimulus. In addition, “0”% is included in the “concentration” of the scent component of the liquid A, which is relatively weak in irritation.

  Each tank 23 is connected to an intake port of the pump 22 via a liquid amount adjusting means 25 and a switch 26. A nozzle 21 is connected to an outlet of the pump 22. The pump 22 supplies the liquid in the tank 23 to the nozzle 21 at a high pressure. Wet the abrasive with liquid. The liquid amount sensor 24 outputs a signal corresponding to the amount of liquid in the tank 23.

  The tank 23 in which the liquid A is stored and the tank 23 in which the liquid B is stored are configured to be selectively used according to the operation by the input unit 16. The liquids A and B may be stored in the tank 23 as liquids having different types of scent components, and these tanks 23 may be configured to be used properly according to the operation by the input means 16. Since this configuration is the same as the above configuration, description thereof is omitted.

  Further, two or more tanks 23 for storing liquids having different concentrations of scent components and two or more tanks 23 having different types of scent components may be provided and used separately.

  Next, a configuration in which the tank 23 is switched based on an operation by the input unit 16 will be described.

  The control means 13 receives the operation by the input means 16 and controls the switch 26 so as to switch between the tank 23 in which the liquid A is stored and the tank 23 in which the liquid B is stored.

  The liquid in the tank 23 used in this way is sprayed from the nozzle 21 via the liquid amount adjusting means 25, the switch 26, and the pump 22. When the tank 23 is switched and used by the control means 13, liquids having different scent components are sprayed from the nozzle 21 onto the abrasive.

  Hereinafter, what controls the switch 26 when the tank 23 is switched will be described. However, the tank 23 itself may be replaced. Another embodiment for exchanging the tank 23 itself will be described later. Moreover, although what controls the switch 26 is demonstrated when changing the density | concentration of a component, it may be made to change the density | concentration of a fragrance component by changing the quantity of the perfume added to the liquid in the tank 23. Good. Other embodiments for changing the amount of perfume added to the liquid will be described later.

(Deodorization effect)
As described above, the control unit 13 receives the operation by the input unit 16 and controls the switch 26 to switch from the tank 23 in which the liquid A is stored to the tank 23 in which the liquid B is stored. Thereby, the liquid scent component is changed. By changing the scent component of the liquid, the abrasive is moistened by the relatively strong liquid sprayed on the abrasive. The abrasive and the game medium are mixed by the lift polishing apparatus 10, stirred, and transferred to the upper portion of the cylindrical body 30. At this time, the scent component of the abrasive is transferred to the game medium, and the game medium to which the scent component has been transferred is supplied to each gaming machine 200 via the island top bowl 9. For example, when the game medium passes through the island top 9, a scent away from the game medium spreads around the gaming machine island 1 and the neighboring gaming machine island 1, so that an efficient deodorizing effect is achieved. Furthermore, since the scent is changed according to the gaming state in the gaming machine 200, a more efficient deodorizing effect can be achieved. At this time, in the gaming machine island 1 adjacent to the gaming machine island 1, the liquid scent component is changed, and the gaming medium to which the scent component has been transferred is supplied to each gaming machine 200 via the island upper bowl 9. A fragrance spreads around the adjacent gaming machine island 1 to achieve an efficient deodorizing effect.

  In order to change the scent component, the control means 13 controls the switch 26 so that the tank 23 is switched and used. However, the control means 13 is, for example, a tank in which the liquid A having a relatively weak stimulus is stored. The switch 26 may be controlled so as to use both the tank 23 and the tank 23 in which the liquid B having a relatively strong stimulus is stored. Thereby, it becomes possible to spray a liquid with moderate irritation to the abrasive.

In the above, the humidification means 11 which has a deodorizing effect was demonstrated.
Next, the lifting and polishing apparatus 10 incorporating the humidifying means 11 provided to prevent dirt from adhering to the abrasive in the cylindrical body 30 will be described with reference to the drawings.

(Cylinder 30)
As shown in FIGS. 2 and 3, the cylinder 30 is erected on the gaming machine island 1. The cylindrical body 30 is provided between a lower end portion having a cylindrical shaft extending substantially horizontally, an upper end portion having a cylindrical shaft extending substantially upward, and a curved cylinder provided between the lower end portion and the upper end portion. And an intermediate portion having a shaft.
An inflow port is provided at the lower end of the cylindrical body 30. A discharge port is provided at the upper end of the cylindrical body 30. An out sphere guide rod 8 a through which the out sphere flows down is connected to the inlet of the cylindrical body 30. As described above, a dirt component is attached to the out ball used in the gaming machine 200.

(Transfer means 40)
As shown in FIGS. 2 and 3, the transfer means 40 is disposed in the cylinder 30. The transfer means 40 is, for example, a spiral body that is arranged so as to follow the axis of the cylinder axis. The transfer means 40 is rotated by a motor 42.

  The transfer means 40 moves away from the out sphere, the abrasive, and the out sphere by transferring the abrasive and the out sphere moistened by the liquid supply means 20 in a mixed state inside the cylindrical body 30. The dirt component including the dirt is discharged from the discharge port of the cylindrical body 30. When the out sphere is transferred upward, the abrasive ball wetted by the liquid containing the scent component and the out sphere rub against each other, so that the scent component moves from the abrasive to the out sphere.

  When the transfer means 40 is rotated by the motor 42, the abrasive and the out ball are mixed and washed while rotating. At that time, the dirt component adhering to the out sphere is separated by the abrasive, and the separated dirt component tends to adhere to the abrasive.

  Due to frictional heat or the like generated when the abrasive and the out-sphere are mixed, the humidity inside the cylindrical body 30 is reduced, and moisture of the abrasive is lost until the abrasive is discharged from the discharge port. However, even if the moisture is lost, the liquid supply means 20 moistens the liquid so that a minimum amount of water remains in the abrasive, so that the dirt component does not adhere to the abrasive. That is, the dirt component is discharged from the discharge port in a state separated from the out ball and the abrasive.

(Separation means 50)
Next, the separating means 50 will be described with reference to FIGS.
The separation means 50 is configured to separate the discharged game medium, the abrasive, and the dirt component. The separation means 50 may be any means as long as it can separate the game medium, the abrasive, and the dirt component. The game medium, the abrasive, and the dirt component are separated based on their size and weight being different from each other.

  For example, as shown in FIGS. 2 and 3, the separating means 50 includes a scissors piece 51, a separating means 52, a separating passage 53, an abrasive stock 54, and a collecting hose 55. The spider child 51 is disposed so as to face the discharge port of the cylindrical body 30.

  The scissors child 51 has a plurality of rails arranged with a gap of a predetermined width. The plurality of rails are configured to guide the game medium along the rails and to drop the abrasive and dirt components from the gaps.

  The sorting means 52 is configured to separate the falling abrasive and dirt components. As an example of the sorting means 52, the dirt component and the abrasive are separated by collecting the dirt component based on the fact that the dirt component is extremely lighter than the abrasive. The dust collection of the dirt component is performed by sucking only the dirt component out of the falling abrasive and the dirt component, and is performed by blowing only the dirt component. FIG. 2 shows a sorting means 52 of the type that sucks dirt components.

  As shown in FIG. 2, the abrasive and the dirt component separated from the game medium by the scissors 51 are guided to the inlet of the separation passage 53 (the upper end of the separation passage 53 in FIG. 2). A dust collection nozzle 56 is disposed between the separation passage 53 and the separation means 52. A collection hose 55 is connected to the dust collection nozzle 56. The dirt component is sucked into the collecting hose 55 and only the abrasive is guided to the abrasive stock 54.

  The game medium separated from the abrasive and the dirt component is sent to the gaming machine 200 and used for the game. At this time, the scent component transferred from the abrasive during the lift polishing is attached to the game medium. The abrasive separated from the game medium and the dirt component is guided to the transfer means 40 and used for polishing the out sphere. The dirt component separated from the game medium and the abrasive is collected by the separating means 52, stored in the dust collector 57 (only the number is shown in FIG. 2), and not sent to the gaming machine 200 or the cylinder 30. To be done.

(Return passage 60)
Next, the return passage 60 will be described with reference to FIGS.
As shown in FIGS. 2 and 3, the return passage 60 is disposed to be inclined downward. The upper end opening of the return passage 60 communicates with the abrasive stock 54. The lower end of the return passage 60 is opened facing the transfer means 40. Note that the return passage 60 may include the separation passage 53 and the abrasive stock 54.

The liquid supply means 20 is provided in the middle portion of the return passage 60. The return passage 60 is configured to guide the abrasive from the separating unit 50 to the transfer unit 40 via the liquid supply unit 20.
By passing through the liquid supply means 20, the liquid can be always moistened by the abrasive guided to the transfer means 40, and the out sphere can be polished by the moistened abrasive.

  The return passage 60 guides the abrasive to the starting end of the transfer means 40. As a result, it is possible to polish the game medium with the abrasive material for a long section from the start end portion to the end portion of the transfer means, and it is possible to improve the polishing ability of the lift polishing apparatus 10.

  Note that the position where the abrasive is guided is not limited to the starting end portion of the transfer means 40, but may be any other portion of the section from the start end portion to the end portion of the transfer means 40. Thereby, it is possible to increase the degree of freedom when designing the return passage 60, the liquid supply means 20, and the like.

  Further, the return passage 60 may guide the abrasive to the starting end portion of the transfer means 40 and the other portion (for example, the intermediate portion). Through the wet abrasive material not only at the beginning but also to other parts, penetration, peeling effect, soap effect, bactericidal effect, as described in the description of the alkaline electrolyzed water used as the sprayed liquid, and It becomes possible to enhance the rust prevention effect.

  As described above, according to the lift polishing apparatus 10 in which the liquid supply means 20 is incorporated, it is possible to prevent dirt from adhering to the abrasive in the cylindrical body 30.

[Another example of the liquid supply unit 20]
In the above embodiment, the liquid supply unit 20 configured to wet the abrasive by spraying the liquid has been described, but the present invention is not limited thereto.

  Next, another example of the liquid supply means 20 in which the configuration 2) for moistening the abrasive and the configuration A) for changing the scent component will be described with reference to FIG. The liquid supply means 20 is configured to wet the abrasive by dropping the liquid onto the abrasive in the return passage 60.

  FIG. 5 is a conceptual diagram showing another example of the liquid supply means 20. As shown in FIG. 5, the liquid supply unit 20 includes a tank 23, a liquid level sensor 24, a liquid level adjustment unit 25, and a switch 26. The liquid amount adjusting means 25 adjusts the amount of liquid dropped. The switch 26 opens / closes the flow path to allow / prohibit liquid from dripping.

  In order to wet almost all of the polishing material passing through the return passage 60 with the liquid, the range in which the liquid is dropped is configured to be a predetermined region (full width and predetermined length) of the return passage 60. Using alkaline electrolyzed water as the liquid to be used is the same as in the above-described embodiment in which the liquid is sprayed.

  Furthermore, another example of the liquid supply means 20 in which the configuration 3) for moistening the abrasive and the configuration A) for changing the scent component will be described with reference to FIG. Another example of the liquid supply means 20 is configured to moisten the abrasive by bringing the inside of the return passage 60 into a humidified state.

  FIG. 6 is a conceptual diagram showing another example of the liquid supply means 20. As shown in FIG. 6, the liquid supply means 20 includes a tank 23, a liquid amount sensor 24, a fan 27, and an ultrasonic generator 28. The liquid supply means 20 pulverizes the liquid finely by the ultrasonic vibration of the ultrasonic generator 28 and blows it out by the fan 27. The wall (bottom wall and side wall) of the return passage 60 is provided with a fine hole (not shown) for allowing the blown liquid particles to pass through. As the liquid supply means 20, a heater (not shown) may be provided instead of the ultrasonic generator 28, and water vapor generated by heating the liquid may be blown out by the fan 27.

  The inside of the return passage 60 is humidified so that the entire abrasive material passing through the return passage 60 is moistened with the liquid, the alkaline electrolyzed water is used as the liquid when the humidified state is created, and the humidified state is further changed. Providing the liquid amount adjusting means 25 for adjustment is the same as in the above-described embodiment in which the liquid is sprayed.

  In the above embodiment and modifications, the means for moistening the abrasive with the liquid before polishing the game medium has been described.

  Next, an example of means for moistening the abrasive with liquid when the game medium is being polished will be described with reference to FIG.

  FIG. 7 is a conceptual diagram showing another example of the liquid supply means 20. As shown in FIG. 7, the liquid supply means 20 is configured to humidify the inside of the cylindrical body 30 by spraying the liquid inside the cylindrical body 30. By spraying the liquid inside the cylinder 30, the humidity inside the cylinder 30 can be raised and the abrasive in the cylinder 30 can be moistened with the liquid. As a result, it is possible to prevent the dirt component from adhering to the abrasive.

  Further, when the humidity in the cylindrical body 30 is reduced due to frictional heat or the like when the game medium and the abrasive are mixed, static electricity is easily generated, and the abrasive and the dirt component are charged, and the abrasive is contaminated with the dirt component. However, by spraying the liquid into the cylindrical body 30, the humidity in the cylindrical body 30 can be prevented from decreasing, and the generation of static electricity can be suppressed.

  FIG. 7 shows the liquid supply means 20 arranged at the starting end (lower end) and the intermediate portion of the cylindrical body 30. A humidity sensor 12 that outputs a signal corresponding to the humidity in the cylinder 30 is disposed upstream of the liquid supply means 20. In FIG. 7, the liquid supply means 20 is arranged one by one at the start end and the intermediate part of the cylinder 30, but a plurality (for example, at a predetermined interval in the circumferential direction of the cylinder 30). It may be arranged.

  The use of alkaline electrolyzed water as the liquid to be sprayed and the provision of the liquid amount adjusting means 25 for adjusting the amount of liquid to be sprayed are the same as in the above embodiment.

  Note that the liquid supply means 20 that wets the abrasive with the liquid when the game medium is being polished is not limited to the one that sprays the liquid, but may be one that drops the liquid.

  In the modification shown in FIG. 7, as the humidifying means 11, the means for directly moistening the abrasive with the liquid when the game medium is being polished has been described. However, the means for indirectly moistening the abrasive with the liquid is used. There may be.

  Next, as an example of the means for indirectly moistening the abrasive with the liquid, a means for moistening the transfer means 40 with the liquid will be described. For example, the transfer means 40 has water retention. Thereby, it becomes possible to wet the transfer means 40 with a liquid. For example, in the transfer means 40, the surface (conveyance surface) that comes into contact with the abrasive during lifting has water retention. When the transport surface is moistened with a liquid, the abrasive can be indirectly moistened with the liquid because the abrasive comes into contact with the transport surface at the time of lifting. Further, by moistening the transfer means 40 with a liquid, the inside of the cylindrical body 30 can be humidified, and it becomes difficult to generate static electricity.

  The use of alkaline electrolyzed water as the liquid for moistening the transfer means 40 and the provision of the liquid amount adjusting means 25 for adjusting the amount of the liquid are the same as in the above embodiment.

  In the above embodiment, the liquid supply means 20 for moistening the abrasive with liquid before polishing the game medium is shown. Further, in the modification shown in FIG. 7, the liquid supply means 20 for moistening the abrasive with the liquid when the game medium is being polished is shown. These liquid supply means 20 may be provided alone or in combination. Thereby, it becomes possible to wet the abrasive with the liquid in a more appropriate time and place.

Second Embodiment
Next, a second embodiment will be described with reference to FIG. FIG. 8 is a conceptual diagram of the liquid supply means 20. Since the basic configuration of the lifting and polishing apparatus 10 according to the second embodiment is the same as that of the first embodiment, the configuration is omitted and the configuration different from the first embodiment will be mainly described.
2nd Embodiment demonstrates the liquid supply means 20 with which the structure 1) which wets an abrasive | polishing material, and the structure B) which changes a scent component are combined.

  As shown in FIG. 8, the liquid supply means 20 includes a nozzle 21, a pump 22, a tank 23, and a storage unit 23a. An outlet and an opening / closing valve 29 are provided at the bottom of the tank 23. The on-off valve 29 is configured to open and close the outlet. The on-off valve 29 is urged in a direction to close the outlet. The direction in which the on-off valve 29 is urged is the downward direction in FIG.

The storage unit 23 a is configured to store the tank 23. A convex portion 23b is provided at the bottom of the storage portion 23a. When the tank 23 is stored in the storage portion 23a, the convex portion 23b is configured to push the on-off valve 29 upward against the urging force to open the outlet. The storage part 23a and the pump 22 are communicated. The liquid in the tank 23 flows out from the opened outlet and is sprayed from the nozzle 21 via the storage portion 23 a and the pump 22.
That is, when the tank 23 is stored, the storage unit 23a pushes the opening / closing valve 29 upward against the urging force to open the outlet so that the opening / closing valve 29 is opened. The opening / closing valve 29 is moved downward by an urging force away from the outlet, so that the outlet is closed.

In the above configuration, the scent component is changed as follows.
For example, the clerk takes out the used tank 23 from the storage unit 23a. At this time, the on-off valve 29 moves downward by the urging force and closes the outlet. Instead, when a new tank 23 is stored in the storage portion 23a, the convex portion 23b pushes the on-off valve 29 upward against the urging force to open the outlet. When the liquid in the tank 23 is sprayed from the nozzle 21 via the storage portion 23a and the pump 22, the new liquid in the tank 23 can be used for scenting the abrasive.
In addition, the some storage part 23a may be provided and it may be comprised so that the tank 23 in which the liquid from which a fragrance component differs is replaced | exchanged in each storage part 23a.

[Another example of the liquid supply unit 20]
In the said 3rd Embodiment, although the liquid supply means 20 comprised so that an abrasive could be moistened by spraying a liquid was demonstrated, it is not restricted to this.

  Next, another example of the liquid supply means 20 in which the configuration 2) for moistening the abrasive and the configuration B) for changing the scent component will be described with reference to FIG. The liquid supply means 20 is configured to wet the abrasive by dropping the liquid onto the abrasive in the return passage 60.

  FIG. 9 is a conceptual diagram showing another example of the liquid supply means 20. As shown in FIG. 9, the liquid supply means 20 includes a tank 23, a liquid amount sensor 24, a liquid amount adjustment means 25, and a switch 26. The liquid amount adjusting means 25 adjusts the amount of liquid dropped. The switch 26 opens / closes the flow path to allow / prohibit liquid from dripping.

  In order to wet almost all of the polishing material passing through the return passage 60 with the liquid, the range in which the liquid is dropped is configured to be a predetermined region (full width and predetermined length) of the return passage 60. Using alkaline electrolyzed water as the liquid to be used is the same as in the above-described embodiment in which the liquid is sprayed.

  Furthermore, another example of the liquid supply means 20 in which the configuration 3) for moistening the abrasive and the configuration B) for changing the scent component will be described with reference to FIG. Another example of the liquid supply means 20 is configured to moisten the abrasive by bringing the inside of the return passage 60 into a humidified state.

  FIG. 10 is a conceptual diagram showing another example of the liquid supply means 20. As shown in FIG. 10, the liquid supply means 20 includes a tank 23, a liquid amount sensor 24, a fan 27, and an ultrasonic generator 28. The liquid supply means 20 pulverizes the liquid finely by the ultrasonic vibration of the ultrasonic generator 28 and blows it out by the fan 27. The wall (bottom wall and side wall) of the return passage 60 is provided with a fine hole (not shown) for allowing the blown liquid particles to pass through. As the liquid supply means 20, a heater (not shown) may be provided instead of the ultrasonic generator 28, and water vapor generated by heating the liquid may be blown out by the fan 27.

  The inside of the return passage 60 is humidified so that the entire abrasive material passing through the return passage 60 is moistened with the liquid, the alkaline electrolyzed water is used as the liquid when the humidified state is created, and the humidified state is further changed. Providing the liquid amount adjusting means 25 for adjustment is the same as in the above-described embodiment in which the liquid is sprayed.

<Third Embodiment>
In the above-described embodiment, the scent component is changed by switching or replacing the plurality of tanks 23. However, the scent component can be changed by changing the perfume added to the liquid in the tank 23. It can be changed.
Next, a third embodiment for changing the amount of perfume added to the liquid in the tank 23 when changing the concentration of the scent component will be described with reference to FIG. FIG. 11 is a conceptual diagram of the liquid supply means 20.

  Since the basic configuration of the lift polishing apparatus 10 according to the third embodiment is the same as that of the first embodiment, the configuration is omitted, and the configuration different from the first embodiment will be mainly described.

  As shown in FIG. 11, the liquid supply means 20 includes a liquid amount adjusting means 25a, a switch 26a, a cartridge 23c, and a fitting portion 23d.

  The bottom part of the fitting part 23d has a hollow needle. When the cartridge 23c is fitted into the fitting portion 23d, the hollow needle is inserted into the cartridge 23c, communicates with the inside of the cartridge 23c, and the perfume stored therein is discharged to the outside. The hollow needle communicates with the liquid amount adjusting means 25a and further communicates with the switch 26a.

In the above configuration, the scent component is changed as follows.
The control means 13 receives the operation by the input means 16 and controls the liquid amount adjusting means 25a so as to change the flow rate of the perfume. Thereby, the quantity of the perfume added to the liquid in the tank 23 is changed, and the concentration of the scent component is changed. The liquid amount adjusting means 25a may be adjusted manually. For example, the staff may adjust the flow rate of the perfume by manually operating the liquid amount adjusting means 25a.

  In addition, the kind and / or density | concentration of a scent component are prepared by preparing the several cartridge 23c in which the liquid from which the kind and / or density | concentration of a scent component differ is stored, and inserting arbitrary cartridges 23c in the fitting part 23d. May be configured to be changeable.

  In the above embodiment, the lifting and polishing apparatus according to the present invention is applied to an apparatus that lifts and polishes pachinko balls as game media. However, the present invention is applied to an apparatus that lifts and polishes coins, medals, and other game media. You may apply.

DESCRIPTION OF SYMBOLS 1 Game machine island 2 Main body 3 Island upper tank 4 Base 5 Support | pillar 7 Lower tank 8 Out ball throwing rod 8a Out ball guidance rod 9 Shimakami rod 10 Lifting polisher 11 Humidification means 12 Humidity sensor 13 Control means 16 Input means 20 Liquid supply means 21 Nozzle 22 Pump 23 Tank 24 Liquid level sensor 25 Liquid level adjustment means 26 Switch 27 Fan 28 Ultrasonic generator 29 On-off valve 30 Cylindrical body 40 Transfer means 42 Motor 50 Separation means 51 Saddle 53 Separation passage 54 Abrasive material stock 55 Collection hose 56 Dust collection nozzle 57 Dust collection device 60 Return path 100 Frame 200 Game machine

Claims (3)

In the lifting and polishing apparatus used in the gaming machine island where a plurality of gaming machines are arranged,
A liquid supply means configured to wet the abrasive with the liquid to which the scent component is added and to change the scent component;
A cylinder standing on the gaming machine island;
By transporting the gaming medium used in each of the gaming machines and the wetted abrasive material upward in a mixed state inside the cylindrical body, the gaming medium, the abrasive material, and the Transfer means for discharging the dirt component separated from the game medium from the upper part of the cylinder;
Separating means for separating the discharged game medium, the abrasive, and the dirt component, respectively;
Have a, a return passage leading to said transfer means via said liquid supply means said abrasive from said separation means,
The liquid supply means is configured to change the scent component by using one or more of a plurality of tanks in which liquids having different scent components are stored. Polishing equipment. In the lifting and polishing apparatus used in the gaming machine island where a plurality of gaming machines are arranged,
A liquid supply means configured to wet the abrasive with the liquid to which the scent component is added and to change the scent component;
A cylinder standing on the gaming machine island;
By transporting the gaming medium used in each of the gaming machines and the wetted abrasive material upward in a mixed state inside the cylindrical body, the gaming medium, the abrasive material, and the Transfer means for discharging the dirt component separated from the game medium from the upper part of the cylinder;
Separating means for separating the discharged game medium, the abrasive, and the dirt component, respectively;
A return path for guiding the abrasive from the separation means to the transfer means via the liquid supply means,
The liquid supply means includes a plurality of tanks in which liquids having different scent components are stored, and is configured to be able to change the scent components by using one or more of the plurality of tanks by switching. A lift polishing apparatus characterized by that . In the lifting and polishing apparatus used in the gaming machine island where a plurality of gaming machines are arranged,
A liquid supply means for moistening the abrasive with the liquid to which the scent component is added;
A cylinder standing on the gaming machine island;
By transporting the gaming medium used in each of the gaming machines and the wetted abrasive material upward in a mixed state inside the cylindrical body, the gaming medium, the abrasive material, and the Transfer means for discharging the dirt component separated from the game medium from the upper part of the cylinder;
Separating means for separating the discharged game medium, the abrasive, and the dirt component, respectively;
A return path for guiding the abrasive from the separation means to the transfer means via the liquid supply means,
The pumping polishing apparatus according to claim 1, wherein the liquid supply means wets the abrasive by bringing the inside of the return passage into a humidified state.

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