JP5978621B2 - インク及び導電性パターンの形成方法 - Google Patents
インク及び導電性パターンの形成方法 Download PDFInfo
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- JP5978621B2 JP5978621B2 JP2011281950A JP2011281950A JP5978621B2 JP 5978621 B2 JP5978621 B2 JP 5978621B2 JP 2011281950 A JP2011281950 A JP 2011281950A JP 2011281950 A JP2011281950 A JP 2011281950A JP 5978621 B2 JP5978621 B2 JP 5978621B2
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- 238000000034 method Methods 0.000 title claims description 22
- 239000002923 metal particle Substances 0.000 claims description 47
- 239000000178 monomer Substances 0.000 claims description 31
- -1 phospho group Chemical group 0.000 claims description 17
- 239000002270 dispersing agent Substances 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 16
- 125000000524 functional group Chemical group 0.000 claims description 12
- 238000010304 firing Methods 0.000 claims description 11
- 229920000642 polymer Polymers 0.000 claims description 10
- 125000000623 heterocyclic group Chemical group 0.000 claims description 8
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 239000003381 stabilizer Substances 0.000 description 6
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- 238000007641 inkjet printing Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
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- 239000003960 organic solvent Substances 0.000 description 3
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- 230000003335 steric effect Effects 0.000 description 3
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- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
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- 238000000576 coating method Methods 0.000 description 2
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- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
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- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- YUTHQCGFZNYPIG-UHFFFAOYSA-N 1-[2-(2-methylprop-2-enoyloxy)ethyl]cyclohexane-1,2-dicarboxylic acid Chemical compound CC(=C)C(=O)OCCC1(C(O)=O)CCCCC1C(O)=O YUTHQCGFZNYPIG-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- UOZJCRSVUOQDNJ-UHFFFAOYSA-N 2-(dibutylamino)ethyl prop-2-enoate Chemical compound CCCCN(CCCC)CCOC(=O)C=C UOZJCRSVUOQDNJ-UHFFFAOYSA-N 0.000 description 1
- FXUGUYXCZSDFLG-UHFFFAOYSA-N 2-(ditert-butylamino)ethyl prop-2-enoate Chemical compound CC(C)(C)N(C(C)(C)C)CCOC(=O)C=C FXUGUYXCZSDFLG-UHFFFAOYSA-N 0.000 description 1
- NBWJDVCBDLXYOL-UHFFFAOYSA-N 2-(n-phenylanilino)ethyl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1N(CCOC(=O)C(=C)C)C1=CC=CC=C1 NBWJDVCBDLXYOL-UHFFFAOYSA-N 0.000 description 1
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 1
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 1
- UGCSBAYAYZNGRD-UHFFFAOYSA-N 2-anilinoethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC1=CC=CC=C1 UGCSBAYAYZNGRD-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- GTJOHISYCKPIMT-UHFFFAOYSA-N 2-methylundecane Chemical compound CCCCCCCCCC(C)C GTJOHISYCKPIMT-UHFFFAOYSA-N 0.000 description 1
- UWRZIZXBOLBCON-UHFFFAOYSA-N 2-phenylethenamine Chemical compound NC=CC1=CC=CC=C1 UWRZIZXBOLBCON-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- WNYWRRLHDUIGOL-UHFFFAOYSA-N 3-prop-2-enoyloxypropylphosphonic acid Chemical compound OP(O)(=O)CCCOC(=O)C=C WNYWRRLHDUIGOL-UHFFFAOYSA-N 0.000 description 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 description 1
- MAQAGRJURDEYDQ-UHFFFAOYSA-N 6-methylpyridine Chemical compound CC1=C=CC=C[N]1 MAQAGRJURDEYDQ-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- NJARUPUHDFFDKY-GMLUHMIMSA-N C(C(=C)C)(=O)OCC/C(/C(=O)O)=C/C(=O)O.C(C(=C)C)(=O)OCCC(C(=O)O)CC(=O)O Chemical compound C(C(=C)C)(=O)OCC/C(/C(=O)O)=C/C(=O)O.C(C(=C)C)(=O)OCCC(C(=O)O)CC(=O)O NJARUPUHDFFDKY-GMLUHMIMSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- SGVYKUFIHHTIFL-UHFFFAOYSA-N Isobutylhexyl Natural products CCCCCCCC(C)C SGVYKUFIHHTIFL-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N anhydrous trimellitic acid Natural products OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- CCDWGDHTPAJHOA-UHFFFAOYSA-N benzylsilicon Chemical compound [Si]CC1=CC=CC=C1 CCDWGDHTPAJHOA-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- VKPSKYDESGTTFR-UHFFFAOYSA-N isododecane Natural products CC(C)(C)CC(C)CC(C)(C)C VKPSKYDESGTTFR-UHFFFAOYSA-N 0.000 description 1
- 229940057995 liquid paraffin Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- DRLFMBDRBRZALE-UHFFFAOYSA-N melatonin Chemical compound COC1=CC=C2NC=C(CCNC(C)=O)C2=C1 DRLFMBDRBRZALE-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- XMGREXCXPFEQPM-UHFFFAOYSA-N n,n-dimethyl-2-(2-phenylethenoxy)ethanamine Chemical compound CN(C)CCOC=CC1=CC=CC=C1 XMGREXCXPFEQPM-UHFFFAOYSA-N 0.000 description 1
- SDYRIBONPHEWCT-UHFFFAOYSA-N n,n-dimethyl-2-phenylethenamine Chemical compound CN(C)C=CC1=CC=CC=C1 SDYRIBONPHEWCT-UHFFFAOYSA-N 0.000 description 1
- VXSULRYWTMNNON-UHFFFAOYSA-N n-(4-phenylbut-3-enyl)aniline Chemical compound C=1C=CC=CC=1NCCC=CC1=CC=CC=C1 VXSULRYWTMNNON-UHFFFAOYSA-N 0.000 description 1
- BUYFKEVRYFERNS-UHFFFAOYSA-N n-methyl-4-phenylbut-3-en-1-amine Chemical compound CNCCC=CC1=CC=CC=C1 BUYFKEVRYFERNS-UHFFFAOYSA-N 0.000 description 1
- CGIORIVBAHKXQZ-UHFFFAOYSA-N n-phenyl-n-(4-phenylbut-3-enyl)aniline Chemical compound C=1C=CC=CC=1C=CCCN(C=1C=CC=CC=1)C1=CC=CC=C1 CGIORIVBAHKXQZ-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 1
- 229920006294 polydialkylsiloxane Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- Inks, Pencil-Leads, Or Crayons (AREA)
- Conductive Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
本発明の金属粒子含有インクに含まれる金属粒子分散剤は、下記一般式(1)で示される単量体(モノマー)を重合した高分子化合物である。
金属粒子含有インクに使用される溶媒としては、一般式(I)で示した単量体に含まれるポリシロキサン部位との相溶性などの観点から、非極性の有機溶媒を使用することが好ましい。溶媒として非極性の有機溶媒を使用することにより、ポリシロキサン部位による、前述の立体効果が高くなり、分散液の分散安定性が高くなる。
金属粒子としては、特に限定されないが、インクの電気的特性などから、例えば、銅が使用される。
金属粒子を、金属粒子分散剤を用いて溶媒中に分散させる方法としては、特に限定されず、ホモジナイザー、ボールミル、サンドミル、アトライターなどの、従来の分散装置を用いて、分散することができる。
本発明に係る導電性パターンの形成方法は、本発明のインクを塗布する塗布工程と、インクを焼結することにより、導電性を発現させる焼結工程と、を有する。
実施例を挙げて、本発明をより詳細に説明するが、本発明は下記の実施例に限定されない。なお、実施例における、「部」は、「質量部」を指す。
<金属粒子分散剤の合成例>
表1に、各実施例において、使用した単量体を示す。表1における、単量体1、単量体2は、各々、前述の一般式(I)で示した単量体と、イオン性官能基及び/又は含窒素複素環基を有する単量体と、に対応する。
得られた金属粒子分散剤と、ナノ銅粒子(QSI−Nano Copper Powder;QuantumSphere社製)と、を溶媒に加え、予備分散として10分間超音波分散した。その後、高速ミキサー(フィルミックス;プライミクス社製)を用いて10分間分散した。分散後に得られたスラリーは、1μmのフィルターに通して粗大粒子を除去し、金属粒子含有インクを得た。
得られたインクをガラス基板上にスピンコートし、120℃のホットプレートで溶媒を蒸発させた。その後、窒素フローした電気炉で、300℃、1時間加熱することにより、焼成体を形成した。
得られたインクをPETフィルム上にスピンコートし、120℃のホットプレートで溶媒を蒸発させた。その後、キセノンランプを1時間照射することにより、焼成体を形成した。
Claims (4)
- 請求項1に記載のインクを基材に塗布する、塗布工程と、
前記インクに導電性を発現させるために、前記インクを焼成する、焼成工程と、を有する、導電性パターンの形成方法。 - 前記焼成工程は、前記インクを光焼成する工程を含む、請求項2に記載の導電性パターンの形成方法。
- 前記焼成工程は、前記インクを、無酸素雰囲気下で熱焼成する工程を含む、請求項2に記載の導電性パターンの形成方法。
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JP5978621B2 true JP5978621B2 (ja) | 2016-08-24 |
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US9972413B2 (en) | 2012-10-15 | 2018-05-15 | Dai Nippon Printing Co., Ltd. | Metal particle dispersion for electroconductive substrates, method for producing the same, and method for producing an electroconductive substrate |
JP2014177600A (ja) * | 2013-03-15 | 2014-09-25 | Ricoh Co Ltd | 分散剤及びその製造方法 |
US10293627B2 (en) | 2016-08-24 | 2019-05-21 | Ricoh Company, Ltd. | Printed matter, printing method, and printing device |
JP6984131B2 (ja) * | 2017-01-23 | 2021-12-17 | 株式会社リコー | 銅粒子含有インク、銅粒子含有インクの製造方法、導電性印刷物の印刷方法、及び導電性配線の形成方法 |
CN116874664A (zh) * | 2023-06-06 | 2023-10-13 | 北京马普新材料有限公司 | 用于纸制品处理的共聚物、处理方法及产品 |
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JP5202777B2 (ja) * | 2001-03-02 | 2013-06-05 | 株式会社リコー | 分散液 |
JP4345710B2 (ja) * | 2005-05-11 | 2009-10-14 | セイコーエプソン株式会社 | 膜パターンの形成方法 |
JP2007150258A (ja) * | 2005-10-27 | 2007-06-14 | Seiko Epson Corp | パターン形成方法、膜構造体、電気光学装置及び電子機器 |
JP2008263129A (ja) * | 2007-04-13 | 2008-10-30 | Asahi Glass Co Ltd | プリント配線板の製造方法 |
JP5201168B2 (ja) * | 2010-05-07 | 2013-06-05 | 株式会社リコー | 分散液 |
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