JP5754165B2 - ベンゾフルオランテン系高分子化合物 - Google Patents
ベンゾフルオランテン系高分子化合物 Download PDFInfo
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- JP5754165B2 JP5754165B2 JP2011038136A JP2011038136A JP5754165B2 JP 5754165 B2 JP5754165 B2 JP 5754165B2 JP 2011038136 A JP2011038136 A JP 2011038136A JP 2011038136 A JP2011038136 A JP 2011038136A JP 5754165 B2 JP5754165 B2 JP 5754165B2
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- aromatic heterocyclic
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- 229920000642 polymer Polymers 0.000 title claims description 164
- KHNYNFUTFKJLDD-UHFFFAOYSA-N Benzo[j]fluoranthene Chemical compound C1=CC(C=2C3=CC=CC=C3C=CC=22)=C3C2=CC=CC3=C1 KHNYNFUTFKJLDD-UHFFFAOYSA-N 0.000 title description 3
- 150000001875 compounds Chemical class 0.000 claims description 247
- 125000003118 aryl group Chemical group 0.000 claims description 98
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 95
- 125000001424 substituent group Chemical group 0.000 claims description 94
- 125000000217 alkyl group Chemical group 0.000 claims description 90
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 71
- 239000000463 material Substances 0.000 claims description 61
- 238000000034 method Methods 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 46
- 230000005525 hole transport Effects 0.000 claims description 32
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 27
- 239000010409 thin film Substances 0.000 claims description 26
- 239000002904 solvent Substances 0.000 claims description 23
- 125000000732 arylene group Chemical group 0.000 claims description 13
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 125000001153 fluoro group Chemical group F* 0.000 claims description 12
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 11
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 11
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 10
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 10
- 229910052740 iodine Inorganic materials 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000000623 heterocyclic group Chemical group 0.000 claims description 9
- 150000001768 cations Chemical class 0.000 claims description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052792 caesium Inorganic materials 0.000 claims description 4
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052744 lithium Inorganic materials 0.000 claims description 4
- 239000011591 potassium Substances 0.000 claims description 4
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 229910052701 rubidium Inorganic materials 0.000 claims description 4
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 125000005649 substituted arylene group Chemical group 0.000 claims description 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 229920000547 conjugated polymer Polymers 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 170
- -1 2-ethylhexyl Chemical group 0.000 description 138
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 105
- 239000000243 solution Substances 0.000 description 95
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 51
- 238000006243 chemical reaction Methods 0.000 description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 37
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 35
- 238000002347 injection Methods 0.000 description 33
- 239000007924 injection Substances 0.000 description 33
- 125000004432 carbon atom Chemical group C* 0.000 description 28
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 26
- 230000015572 biosynthetic process Effects 0.000 description 26
- 238000006116 polymerization reaction Methods 0.000 description 25
- 238000003786 synthesis reaction Methods 0.000 description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 23
- 239000010408 film Substances 0.000 description 23
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 22
- 229910052799 carbon Inorganic materials 0.000 description 22
- 239000012044 organic layer Substances 0.000 description 20
- 239000002244 precipitate Substances 0.000 description 20
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 238000001914 filtration Methods 0.000 description 16
- 239000003960 organic solvent Substances 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 15
- 239000003054 catalyst Substances 0.000 description 15
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 14
- 239000008096 xylene Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 12
- 239000002184 metal Chemical class 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 229910052786 argon Inorganic materials 0.000 description 11
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 11
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 229940126062 Compound A Drugs 0.000 description 9
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 9
- 239000004793 Polystyrene Substances 0.000 description 9
- 238000006069 Suzuki reaction reaction Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 229920002223 polystyrene Polymers 0.000 description 9
- 238000010898 silica gel chromatography Methods 0.000 description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
- 229920001940 conductive polymer Polymers 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000012300 argon atmosphere Substances 0.000 description 7
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- 230000000379 polymerizing effect Effects 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 239000003446 ligand Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 6
- 229920005596 polymer binder Polymers 0.000 description 6
- 239000002491 polymer binding agent Substances 0.000 description 6
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 5
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 5
- 229910052723 transition metal Inorganic materials 0.000 description 5
- 150000003624 transition metals Chemical class 0.000 description 5
- SZUVGFMDDVSKSI-WIFOCOSTSA-N (1s,2s,3s,5r)-1-(carboxymethyl)-3,5-bis[(4-phenoxyphenyl)methyl-propylcarbamoyl]cyclopentane-1,2-dicarboxylic acid Chemical compound O=C([C@@H]1[C@@H]([C@](CC(O)=O)([C@H](C(=O)N(CCC)CC=2C=CC(OC=3C=CC=CC=3)=CC=2)C1)C(O)=O)C(O)=O)N(CCC)CC(C=C1)=CC=C1OC1=CC=CC=C1 SZUVGFMDDVSKSI-WIFOCOSTSA-N 0.000 description 4
- 0 Cc1c(*)c(*)c(C2C(*)=C(*)C(C)=C(*)C2C2(*)*)c2c1* Chemical compound Cc1c(*)c(*)c(C2C(*)=C(*)C(C)=C(*)C2C2(*)*)c2c1* 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- 150000004982 aromatic amines Chemical class 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 238000007611 bar coating method Methods 0.000 description 4
- YNHIGQDRGKUECZ-UHFFFAOYSA-L bis(triphenylphosphine)palladium(ii) dichloride Chemical compound [Cl-].[Cl-].[Pd+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-L 0.000 description 4
- 229940126543 compound 14 Drugs 0.000 description 4
- JNGZXGGOCLZBFB-IVCQMTBJSA-N compound E Chemical compound N([C@@H](C)C(=O)N[C@@H]1C(N(C)C2=CC=CC=C2C(C=2C=CC=CC=2)=N1)=O)C(=O)CC1=CC(F)=CC(F)=C1 JNGZXGGOCLZBFB-IVCQMTBJSA-N 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229910001512 metal fluoride Inorganic materials 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920000767 polyaniline Polymers 0.000 description 4
- 229920000123 polythiophene Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 239000011135 tin Substances 0.000 description 4
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 4
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 3
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 3
- UNILWMWFPHPYOR-KXEYIPSPSA-M 1-[6-[2-[3-[3-[3-[2-[2-[3-[[2-[2-[[(2r)-1-[[2-[[(2r)-1-[3-[2-[2-[3-[[2-(2-amino-2-oxoethoxy)acetyl]amino]propoxy]ethoxy]ethoxy]propylamino]-3-hydroxy-1-oxopropan-2-yl]amino]-2-oxoethyl]amino]-3-[(2r)-2,3-di(hexadecanoyloxy)propyl]sulfanyl-1-oxopropan-2-yl Chemical compound O=C1C(SCCC(=O)NCCCOCCOCCOCCCNC(=O)COCC(=O)N[C@@H](CSC[C@@H](COC(=O)CCCCCCCCCCCCCCC)OC(=O)CCCCCCCCCCCCCCC)C(=O)NCC(=O)N[C@H](CO)C(=O)NCCCOCCOCCOCCCNC(=O)COCC(N)=O)CC(=O)N1CCNC(=O)CCCCCN\1C2=CC=C(S([O-])(=O)=O)C=C2CC/1=C/C=C/C=C/C1=[N+](CC)C2=CC=C(S([O-])(=O)=O)C=C2C1 UNILWMWFPHPYOR-KXEYIPSPSA-M 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 235000002597 Solanum melongena Nutrition 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229940125797 compound 12 Drugs 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000007756 gravure coating Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000005842 heteroatom Chemical group 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 238000007641 inkjet printing Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
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- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
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- FHKSXSQHXQEMOK-UHFFFAOYSA-N hexane-1,2-diol Chemical compound CCCCC(O)CO FHKSXSQHXQEMOK-UHFFFAOYSA-N 0.000 description 1
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- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
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- FRACPXUHUTXLCX-BELIEFIBSA-N tert-butyl N-{1-[(1S)-1-{[(1R,2S)-1-(benzylcarbamoyl)-1-hydroxy-3-[(3S)-2-oxopyrrolidin-3-yl]propan-2-yl]carbamoyl}-2-cyclopropylethyl]-2-oxopyridin-3-yl}carbamate Chemical compound CC(C)(C)OC(=O)NC1=CC=CN(C1=O)[C@@H](CC2CC2)C(=O)N[C@@H](C[C@@H]3CCNC3=O)[C@H](C(=O)NCC4=CC=CC=C4)O FRACPXUHUTXLCX-BELIEFIBSA-N 0.000 description 1
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- 238000002834 transmittance Methods 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
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- IIOSDXGZLBPOHD-UHFFFAOYSA-N tris(2-methoxyphenyl)phosphane Chemical compound COC1=CC=CC=C1P(C=1C(=CC=CC=1)OC)C1=CC=CC=C1OC IIOSDXGZLBPOHD-UHFFFAOYSA-N 0.000 description 1
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- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
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- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C07C13/62—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with more than three condensed rings
- C07C13/66—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with more than three condensed rings the condensed ring system contains only four rings
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Description
で表される化合物における水素原子を1個取り除いてなる基を示す。aaは、1以上の整数である。]
塩素原子、臭素原子、ヨウ素原子、−O−S(=O)2R27(R27は、アルキル基、又は、アルキル基、アルコキシ基、ニトロ基、フッ素原子若しくはシアノ基で置換されていてもよいアリール基を示す。)で表される基。
−B(OR28)2(R28は、水素原子又はアルキル基を示す。2個存在するR28は、同一であっても異なっていてもよく、互いに結合して環を形成していてもよい。)で表される基、−BF4 -Q1(Q1は、リチウム、ナトリウム、カリウム、ルビジウム又はセシウムの1価の陽イオンを示す。)で表される基、−MgY1(Y1は、塩素原子、臭素原子又はヨウ素原子を示す。)で表される基、−ZnY2(Y2は、塩素原子、臭素原子又はヨウ素原子を示す。)で表される基、−Sn(R29)3(R29は、水素原子又はアルキル基を示す。3個存在するR29は、同一であっても異なっていてもよく、互いに結合して環を形成していてもよい。)で表される基。
[第1構成単位]
本発明に係る高分子化合物は、前記一般式(1)で表される構成単位(以下、「第1構成単位」と言う。)を含む。この第1構成単位は、高分子化合物中に、一種のみ含まれていても二種以上含まれていてもよい。
前記芳香族炭化水素基の炭素数は、通常、6〜60であり、好ましくは6〜48であり、より好ましくは6〜20であり、更に好ましくは6〜14である。前記芳香族炭化水素基は、(2+aa)価の芳香族炭化水素基であり、3価又は4価の芳香族炭化水素基が好ましく、3価の芳香族炭化水素基がより好ましい。
前記芳香族複素環基の炭素数は、通常、3〜60であり、好ましくは3〜20である。前記芳香族複素環基は、(2+aa)価の芳香族複素環基であり、3価又は4価の芳香族複素環基が好ましく、3価の芳香族複素環基がより好ましい。
本発明に係る高分子化合物は、発光効率及び耐久性が優れるので、下記一般式(5)で表される構成単位(以下、「第2構成単位」と言う。)を含むことが好ましい。
本発明に係る高分子化合物は、耐久性が優れるので、下記一般式(6):
で表される構成単位(以下、「第3構成単位」と言う。)を含むことが好ましい。
本発明に係る高分子化合物は、該高分子化合物を用いて得られる発光素子の発光効率及び耐久性が優れるので、下記一般式(7):
で表される構成単位(以下、「第4構成単位」と言う。)を含むことが好ましい。
前記一般式(1)で表される第1構成単位と、
前記一般式(5)で表される第2構成単位
とを含む高分子化合物が好ましい。
前記一般式(1)で表される第1構成単位と、
前記一般式(5)で表される第2構成単位と、
前記一般式(6)で表される第3構成単位及び前記一般式(7)で表される第4構成単位からなる群より選ばれる少なくとも一種の構成単位
とを含む高分子化合物が好ましく、
前記一般式(1)で表される第1構成単位と、
前記一般式(5)で表される第2構成単位と、
前記一般式(7)で表される第4構成単位
とを含む高分子化合物がより好ましい。
本発明に係る高分子化合物は、該高分子化合物を用いて得られる発光素子の発光効率が優れるので、前記第1構成単位の含有量が、前記第1構成単位、前記第2構成単位、前記第3構成単位及び前記第4構成単位の総含有量に対して、0.01〜90モル%であることが好ましく、0.1〜50モル%であることがより好ましく、0.1〜20モル%であることが更に好ましく、0.5〜10モル%であることが特に好ましい。
本発明に係る高分子化合物は、如何なる方法で製造してもよいが、以下、好ましい実施態様について説明する。
前記一般式(1M)におけるZ1及びZ2がいずれも前記置換基A群から選ばれる基である場合、Z3及びZ4の少なくとも一方は前記置換基B群から選ばれる基であり、
前記一般式(1M)におけるZ1及びZ2がいずれも前記置換基B群から選ばれる基である場合、Z3及びZ4の少なくとも一方は前記置換基A群から選ばれる基である。
で示される経路が挙げられる。
本発明に係る高分子組成物は、本発明に係る高分子化合物と、正孔輸送材料、電子輸送材料及び発光材料からなる群から選ばれる少なくとも一種の材料とを含有する。
本発明に係る高分子化合物は、有機溶媒に溶解又は分散させて、溶液としてもよい。この溶液又は分散液は、インク、液状組成物等と呼ばれる。前記溶液は、高分子化合物の他に、正孔輸送材料、電子輸送材料及び発光材料からなる群から選ばれる少なくとも一種の材料を含有していてもよい。
本発明に係る有機薄膜は、本発明に係る高分子化合物又は本発明に係る高分子組成物を含有する。本発明に係る有機薄膜は、上述のように前記溶液から容易に製造することができる。
本発明に係る有機薄膜を用いることで、有機半導体素子を作製することも可能である。該有機半導体素子としては、有機薄膜太陽電池、電界効果型有機トランジスタが例示される。具体的には、SiO2等の絶縁膜とゲート電極とを形成したSi基板上に前記有機薄膜を形成し、Au等でソース電極とドレイン電極を形成することにより、電界効果型有機トランジスタとすることができる。
本発明に係る発光素子は、前記有機薄膜を備える。好ましい実施形態では、本発明に係る発光素子は、陽極と、陰極と、該陽極及び該陰極の間に存在する前記高分子化合物を含有する層とを有する。ここで、前記高分子化合物を含有する層は前記有機薄膜からなる層であることが好ましく、当該層は発光層として機能することが好ましい。以下、前記高分子化合物を含有する層が、発光層として機能する場合を、好ましい一実施形態として例示する。
(a)陽極/発光層/陰極
(b)陽極/正孔輸送層/発光層/陰極
(c)陽極/発光層/電子輸送層/陰極
(d)陽極/正孔輸送層/発光層/電子輸送層/陰極
(e)陽極/電荷注入層/発光層/陰極
(f)陽極/発光層/電荷注入層/陰極
(g)陽極/電荷注入層/発光層/電荷注入層/陰極
(h)陽極/電荷注入層/正孔輸送層/発光層/陰極
(i)陽極/正孔輸送層/発光層/電荷注入層/陰極
(j)陽極/電荷注入層/正孔輸送層/発光層/電荷注入層/陰極
(k)陽極/電荷注入層/発光層/電荷輸送層/陰極
(l)陽極/発光層/電子輸送層/電荷注入層/陰極
(m)陽極/電荷注入層/発光層/電子輸送層/電荷注入層/陰極
(n)陽極/電荷注入層/正孔輸送層/発光層/電荷輸送層/陰極
(o)陽極/正孔輸送層/発光層/電子輸送層/電荷注入層/陰極
(p)陽極/電荷注入層/正孔輸送層/発光層/電子輸送層/電荷注入層/陰極
(q)陽極/絶縁層/発光層/陰極
(r)陽極/発光層/絶縁層/陰極
(s)陽極/絶縁層/発光層/絶縁層/陰極
(t)陽極/絶縁層/正孔輸送層/発光層/陰極
(u)陽極/正孔輸送層/発光層/絶縁層/陰極
(v)陽極/絶縁層/正孔輸送層/発光層/絶縁層/陰極
(w)陽極/絶縁層/発光層/電子輸送層/陰極
(x)陽極/発光層/電子輸送層/絶縁層/陰極
(y)陽極/絶縁層/発光層/電子輸送層/絶縁層/陰極
(z)陽極/絶縁層/正孔輸送層/発光層/電子輸送層/陰極
(aa)陽極/正孔輸送層/発光層/電子輸送層/絶縁層/陰極
(ab)陽極/絶縁層/正孔輸送層/発光層/電子輸送層/絶縁層/陰極
測定する高分子化合物を、約0.05重量%の濃度になるようにテトラヒドロフラン(THF)に溶解させ、GPCに10μL注入した。GPCの移動相としてテトラヒドロフランを用い、2.0ml/分の流速で流した。カラムとして、PLgel MIXED−B(ポリマーラボラトリーズ製)を用いた。検出器には示差屈折率検出器(島津製作所製、商品名:RID−10A)を用いた。
{化合物2の合成}
300mlのナスフラスコに化合物1を23.5g入れ、メタノール(232ml)に溶解させた後、フラスコ内の気体を窒素で置換した。得られた溶液を80℃で6時間加熱した。その後、放冷して得られた溶液を、濃縮し、酢酸エチル(100ml)及び水(100ml)を加えて分液した。更に、水層を酢酸エチル(100ml)で抽出した。次いで、有機層を飽和食塩水(100ml)で洗浄した後、有機層を無水硫酸ナトリウムで乾燥させ、ろ過し、濃縮することで、淡黄色オイルとして化合物2を20.3g得た。
LC−MS(APCI、positive): [M+H]+ 823
LC−MS(API−ES(ESI−KCl)、positive): [M+K]+ 1121
LC−MS(APCI、negative): [M−H]- 1065
LC−MS(API−ES(ESI−KCl)、positive): [M+K]+ 1217
{化合物11の合成}
LC−MS(APCI、positive): [M+H]+ 946
LC−MS(APCI、positive): [M−OH]+ 1187
LC−MS(APCI、positive): [M]+ 1302
{高分子化合物Aの合成}
アルゴン雰囲気下、下記式:
高分子化合物Aのポリスチレン換算数平均分子量は8.5×104であり、ポリスチレン換算重量平均分子量は2.39×105であった。
{高分子化合物Bの合成}
アルゴン雰囲気下、下記式:
高分子化合物Bのポリスチレン換算数平均分子量は1.02×105であり、ポリスチレン換算重量平均分子量は3.02×105であった。
{高分子化合物Cの合成}
アルゴン雰囲気下、下記式:
高分子化合物Cのポリスチレン換算数平均分子量は7.8×104であり、ポリスチレン換算重量平均分子量は2.55×105であった。
{高分子化合物Eの合成}
不活性雰囲気下、下記式:
高分子化合物Eのポリスチレン換算数平均分子量は4.4×104であり、ポリスチレン換算重量平均分子量は1.24×105であった。
{有機EL素子Aの作製・評価}
スパッタ法により45nmの厚さでITO膜を付けたガラス基板に、ポリチオフェンスルホン酸のエチレングリコールモノブチルエーテル/水(3/2(体積比))溶液(シグマアルドリッチ社、商品名:Plexcore OC 1200)を用いてスピンコートにより50nmの厚さで成膜し、ホットプレート上、170℃で15分間乾燥させた。
次に、高分子化合物Eを0.7重量%のキシレン溶液の状態でスピンコートして、約20nmの厚さに成膜した。その後、ホットプレート上で180℃、60分間加熱し、膜Aを得た。
その後、高分子化合物Aをキシレン溶媒中に1.3重量%の濃度で溶解させ、さらに膜A上にスピンコートにより2000rpmの回転速度で成膜し、膜Bを得た。膜Bの厚さは約60nmであった。膜Bを窒素ガス雰囲気下130℃で10分間乾燥させた後、陰極としてフッ化ナトリウムを約3nm、次いでアルミニウムを約80nm真空蒸着して、有機EL素子Aを作製した。なお、真空蒸着の際は、真空度が、1×10-4Pa以下に到達した後に金属の蒸着を開始した。
有機EL素子Aに電圧を印加したところ、この素子から高分子化合物Aに由来する470nmにピークを有するEL発光が得られた。有機EL素子Aは2.9Vから発光が開始し、5.2Vで1000cd/m2の発光を示し、最大発光効率は6.9cd/Aであった。
{有機EL素子Bの作製・評価}
実施例6において、高分子化合物Aをキシレン溶媒中に1.3重量%の濃度で溶解させる代わりに、高分子化合物Bをキシレン溶媒中に1.2重量%の濃度で溶解させ、かつ、スピンコートの回転速度を2000rpmから1600rpmに代えた以外は、実施例6と同様にして、有機EL素子Bを作製した。有機EL素子Bに電圧を印加したところ、高分子化合物Bに由来する475nmにピークを有するEL発光が得られた。有機EL素子Bは2.7Vから発光が開始し、4.4Vで1000cd/m2の発光を示し、最大発光効率は7.6cd/Aであった。
{有機EL素子Cの作製・評価}
実施例6において、高分子化合物Aをキシレン溶媒中に1.3重量%の濃度で溶解させる代わりに、高分子化合物Cをキシレン溶媒中に1.2重量%の濃度で溶解させ、かつ、スピンコートの回転速度を2000rpmから1500rpmに代えた以外は、実施例6と同様にして、有機EL素子Cを作製した。有機EL素子Cに電圧を印加したところ、高分子化合物Cに由来する480nmにピークを有するEL発光が得られた。有機EL素子Cは2.8Vから発光が開始し、4.6Vで1000cd/m2の発光を示し、最大発光効率は7.0cd/Aであった。
{高分子化合物Dの合成}
アルゴン雰囲気下、下記式:
高分子化合物Dのポリスチレン換算の数平均分子量は2.8×104であり、ポリスチレン換算の重量平均分子量は6.1×104であった。
実施例6において、高分子化合物Aをキシレン溶媒中に1.3重量%の濃度で溶解させる代わりに、高分子化合物Dをキシレン溶媒中に1.5重量%の濃度で溶解させ、かつ、スピンコートの回転速度を2000rpmから1400rpmに代えた以外は、実施例6と同様にして、有機EL素子Dを作製した。有機EL素子Dに電圧を印加したところ、高分子化合物Dに由来する450nmにピークを有するEL発光が得られた。有機EL素子Dは3.3Vから発光が開始し、5.3Vで1000cd/m2の発光を示し、最大発光効率は2.0cd/Aであった。
{高分子化合物Fの合成}
アルゴン雰囲気下、下記式:
高分子化合物Fのポリスチレン換算の数平均分子量は1.7×104であり、ポリスチレン換算の重量平均分子量は3.2×104であった。
実施例6において、高分子化合物Aをキシレン溶媒中に1.3重量%の濃度で溶解させる代わりに、高分子化合物Fをキシレン溶媒中に2.1重量%の濃度で溶解させ、かつ、スピンコートの回転速度を2000rpmから3810rpmに代えた以外は、実施例6と同様にして、有機EL素子Fを作製した。有機EL素子Fに電圧を印加したところ、高分子化合物Fに由来する495nmにピークを有するEL発光が得られた。有機EL素子Fは2.9Vから発光が開始し、4.3Vで1000cd/m2の発光を示し、最大発光効率は4.5cd/Aであった。
Claims (15)
- 下記一般式(4)で表される構成単位を含む高分子化合物。
R15は、水素原子、アルキル基、アリール基、1価の芳香族複素環基、−O−RAで表される基、又は、E’で表される基を示し、これらの基は置換基を有していてもよい。R16、R17、R18、R19、R20及びR21はそれぞれ独立に、水素原子、アルキル基、アリール基、1価の芳香族複素環基、又は、−O−RAで表される基を示し、これらの基は置換基を有していてもよい。RAは、アルキル基、アリール基、又は、1価の芳香族複素環基を示し、これらの基は置換基を有していてもよい。RAが複数存在する場合、それらは、同一であっても異なっていてもよい。R17とR18、及び、R19とR20は、互いに結合して、環を形成してもよい。
E’は、下記一般式(2’):
で表される化合物における水素原子を1個取り除いてなる基を示す。] - 前記E’が、下記一般式(3)で表される化合物における水素原子を1個取り除いてなる基である、請求項1に記載の高分子化合物。
- 前記一般式(4)で表される第1構成単位と、
前記一般式(5)で表される第2構成単位と、
下記一般式(6)で表される第3構成単位(但し、前記一般式(1)で表される構成単位、前記一般式(4)で表される構成単位及び前記一般式(5)で表される構成単位とは異なる。)及び下記一般式(7)で表される第4構成単位からなる群より選ばれる少なくとも一種の構成単位
とを含む請求項3に記載の高分子化合物。
- 共役系高分子化合物である、請求項1〜4のいずれか一項に記載の高分子化合物。
- 前記第1構成単位の含有量が、前記第1構成単位、前記第2構成単位、前記第3構成単位及び前記第4構成単位の総含有量に対して、0.1〜50モル%である、請求項3〜5のいずれか一項に記載の高分子化合物。
- 前記第1構成単位、前記第2構成単位、前記第3構成単位及び前記第4構成単位の総含有量が、前記高分子化合物の総量に対して、80〜100重量%である、請求項3〜6のいずれか一項に記載の高分子化合物。
- 下記一般式(4M)で表される化合物。
R15は、水素原子、アルキル基、アリール基、1価の芳香族複素環基、−O−RAで表される基、又は、E’で表される基を示し、これらの基は置換基を有していてもよい。R16、R17、R18、R19、R20及びR21はそれぞれ独立に、水素原子、アルキル基、アリール基、1価の芳香族複素環基、又は、−O−RAで表される基を示し、これらの基は置換基を有していてもよい。RAは、アルキル基、アリール基、又は、1価の芳香族複素環基を示し、これらの基は置換基を有していてもよい。RAが複数存在する場合、それらは、同一であっても異なっていてもよい。R17とR18、及び、R19とR20は、互いに結合して、環を形成してもよい。
E’は、下記一般式(2’):
で表される化合物における水素原子を1個取り除いてなる基を示す。
Z1及びZ2はそれぞれ独立に、置換基A群及び置換基B群からなる群から選ばれるいずれかの基を示す。]
<置換基A群>
塩素原子、臭素原子、ヨウ素原子、−O−S(=O)2R27(R27は、アルキル基、又は、アルキル基、アルコキシ基、ニトロ基、フッ素原子若しくはシアノ基で置換されていてもよいアリール基を示す。)で表される基。
<置換基B群>
−B(OR28)2(R28は、水素原子又はアルキル基を示す。2個存在するR28は、同一であっても異なっていてもよく、互いに結合して環を形成していてもよい。)で表される基、−BF4 −Q1(Q1は、リチウム、ナトリウム、カリウム、ルビジウム又はセシウムの1価の陽イオンを示す。)で表される基、−MgY1(Y1は、塩素原子、臭素原子又はヨウ素原子を示す。)で表される基、−ZnY2(Y2は、塩素原子、臭素原子又はヨウ素原子を示す。)で表される基、−Sn(R29)3(R29は、水素原子又はアルキル基を示す。3個存在するR29は、同一であっても異なっていてもよく、互いに結合して環を形成していてもよい。)で表される基。 - 請求項3〜7のいずれか一項に記載の高分子化合物の製造方法であって、下記一般式(4M)で表される化合物と、下記一般式(5M)で示される化合物とを重合する工程を含む、高分子化合物の製造方法。
R15は、水素原子、アルキル基、アリール基、1価の芳香族複素環基、−O−RAで表される基、又は、E’で表される基を示し、これらの基は置換基を有していてもよい。R16、R17、R18、R19、R20及びR21はそれぞれ独立に、水素原子、アルキル基、アリール基、1価の芳香族複素環基、又は、−O−RAで表される基を示し、これらの基は置換基を有していてもよい。RAは、アルキル基、アリール基、又は、1価の芳香族複素環基を示し、これらの基は置換基を有していてもよい。RAが複数存在する場合、それらは、同一であっても異なっていてもよい。R17とR18、及び、R19とR20は、互いに結合して、環を形成してもよい。
E’は、下記一般式(2’):
で表される化合物における水素原子を1個取り除いてなる基を示す。
Z1及びZ2はそれぞれ独立に、置換基A群及び置換基B群からなる群から選ばれるいずれかの基を示す。]
<置換基A群>
塩素原子、臭素原子、ヨウ素原子、−O−S(=O)2R27(R27は、アルキル基、又は、アルキル基、アルコキシ基、ニトロ基、フッ素原子若しくはシアノ基で置換されていてもよいアリール基を示す。)で表される基。
<置換基B群>
−B(OR28)2(R28は、水素原子又はアルキル基を示す。2個存在するR28は、同一であっても異なっていてもよく、互いに結合して環を形成していてもよい。)で表される基、−BF4 −Q1(Q1は、リチウム、ナトリウム、カリウム、ルビジウム又はセシウムの1価の陽イオンを示す。)で表される基、−MgY1(Y1は、塩素原子、臭素原子又はヨウ素原子を示す。)で表される基、−ZnY2(Y2は、塩素原子、臭素原子又はヨウ素原子を示す。)で表される基、−Sn(R29)3(R29は、水素原子又はアルキル基を示す。3個存在するR29は、同一であっても異なっていてもよく、互いに結合して環を形成していてもよい。)で表される基。
R22及びR23はそれぞれ独立に、アルキル基、アリール基、又は、1価の芳香族複素環基を示し、これらの基は置換基を有していてもよい。但し、R22及びR23は、前記Eで表される基および前記E’で表される基とは異なる。
Z3及びZ4はそれぞれ独立に、前記置換基A群及び前記置換基B群からなる群から選ばれるいずれかの基を示す。] - 請求項1〜7のいずれか一項に記載の高分子化合物と、正孔輸送材料、電子輸送材料及び発光材料からなる群から選ばれる少なくとも一種の材料とを含有する、高分子組成物。
- 請求項1〜7のいずれか一項に記載の高分子化合物と溶媒とを含有する溶液。
- 請求項1〜7のいずれか一項に記載の高分子化合物、又は、請求項11に記載の高分子組成物を含有する有機薄膜。
- 請求項12に記載の有機薄膜を備える発光素子。
- 請求項13に記載の発光素子を備える面状光源。
- 請求項13に記載の発光素子を備える表示装置。
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