JP5647738B2 - High-sensitivity carbazole oxime ester photoinitiator, process for its production and use - Google Patents
High-sensitivity carbazole oxime ester photoinitiator, process for its production and use Download PDFInfo
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- JP5647738B2 JP5647738B2 JP2013540220A JP2013540220A JP5647738B2 JP 5647738 B2 JP5647738 B2 JP 5647738B2 JP 2013540220 A JP2013540220 A JP 2013540220A JP 2013540220 A JP2013540220 A JP 2013540220A JP 5647738 B2 JP5647738 B2 JP 5647738B2
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- oxime ester
- carbazole
- ester photoinitiator
- carbazole oxime
- reaction
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- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 title claims description 48
- -1 carbazole oxime ester Chemical class 0.000 title claims description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000000034 method Methods 0.000 title description 4
- 239000000203 mixture Substances 0.000 claims description 18
- 125000001424 substituent group Chemical group 0.000 claims description 11
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 125000000623 heterocyclic group Chemical group 0.000 claims description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 238000005917 acylation reaction Methods 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 4
- 238000005886 esterification reaction Methods 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 238000006146 oximation reaction Methods 0.000 claims description 4
- 238000006467 substitution reaction Methods 0.000 claims description 4
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 125000004414 alkyl thio group Chemical group 0.000 claims description 2
- 125000002541 furyl group Chemical group 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000002252 acyl group Chemical group 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 206010034972 Photosensitivity reaction Diseases 0.000 description 18
- 230000036211 photosensitivity Effects 0.000 description 18
- 239000000047 product Substances 0.000 description 15
- 238000003756 stirring Methods 0.000 description 8
- 238000000016 photochemical curing Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- PLAZXGNBGZYJSA-UHFFFAOYSA-N 9-ethylcarbazole Chemical compound C1=CC=C2N(CC)C3=CC=CC=C3C2=C1 PLAZXGNBGZYJSA-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- 0 *[n]1c2ccccc2c2ccccc12 Chemical compound *[n]1c2ccccc2c2ccccc12 0.000 description 1
- XMHFFBHXZCEVLS-UHFFFAOYSA-N 1-cyclopentyl-3-[9-ethyl-6-(N-hydroxy-C-thiophen-2-ylcarbonimidoyl)carbazol-3-yl]propan-2-one Chemical compound CCN1C2=C(C=C(C=C2)CC(=O)CC3CCCC3)C4=C1C=CC(=C4)C(=NO)C5=CC=CS5 XMHFFBHXZCEVLS-UHFFFAOYSA-N 0.000 description 1
- PFSLCDNYNJTYDO-UHFFFAOYSA-N 2-cyclopentylpropanoyl chloride Chemical compound ClC(=O)C(C)C1CCCC1 PFSLCDNYNJTYDO-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- MKIHYKYUZSQWGX-UHFFFAOYSA-N C1(CCCC1)CCC(=O)C=1C=CC=2N(C3=CC=C(C=C3C2C1)C(C1=CC=CS1)=O)CC Chemical compound C1(CCCC1)CCC(=O)C=1C=CC=2N(C3=CC=C(C=C3C2C1)C(C1=CC=CS1)=O)CC MKIHYKYUZSQWGX-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- SEEVRZDUPHZSOX-WPWMEQJKSA-N [(e)-1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(\C)=N\OC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-WPWMEQJKSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid group Chemical group C(C1=CC=CC=C1)(=O)O WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- RDHPKYGYEGBMSE-UHFFFAOYSA-N bromoethane Chemical compound CCBr RDHPKYGYEGBMSE-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- QIQITDHWZYEEPA-UHFFFAOYSA-N thiophene-2-carbonyl chloride Chemical compound ClC(=O)C1=CC=CS1 QIQITDHWZYEEPA-UHFFFAOYSA-N 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/06—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/32—Compounds containing nitrogen bound to oxygen
- C08K5/33—Oximes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Indole Compounds (AREA)
- Ceramic Engineering (AREA)
- Engineering & Computer Science (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
Description
本発明は光開始剤技術分野に関し、特にカルバゾールオキシムエステル系光開始剤及びその製造方法並びに使用に関する。 The present invention relates to the technical field of photoinitiators, and more particularly to a carbazole oxime ester photoinitiator, a method for producing the same, and use thereof.
光硬化は単量体、オリゴマー又は重合体基質の光誘導下での硬化過程を指す。該技術は現代微電子技術に広く使われている。例えば、光硬化インク、液晶パネルの密封、感光性印刷版、フィルター及びフォトレジスト等。光硬化技術の核心は、光硬化可能な重合単量体及び適切の光開始剤である。一定波長の紫外/可視光、X線又はレーザの照射下で、光開始剤が活性基を産生し、重合可能の単量体における不飽和基を励起して重合反応を開始させ、材料の硬化を引き起こす。 Photocuring refers to the curing process under light induction of a monomer, oligomer or polymer substrate. The technology is widely used in modern microelectronic technology. For example, photocurable ink, liquid crystal panel sealing, photosensitive printing plate, filter, and photoresist. At the heart of photocuring technology is a photocurable polymerized monomer and a suitable photoinitiator. Under the irradiation of ultraviolet / visible light, X-rays or laser with a certain wavelength, the photoinitiator produces active groups, excites unsaturated groups in the polymerizable monomer to initiate the polymerization reaction, and cures the material cause.
光開始剤は光硬化組成物(感光性組成物)の感光特性を影響する最も主要な要因である。現在、光開始剤に関して多く報道されており、例えば、安息香誘導体、ベンジルケタール系、α、α−ジアルコキシアセトフェノン系、ベンゾフェノン/アミン系、ミヒラーケトン、チアゾロン/アミン系、芳香族ジアゾニウム塩、トリアゾキシド系、オキシムエステル系等があり、代表例が市販の Irgacure369、Darocure1173、OXE-1及び OXE-2である。然し、これらの光開始剤は、実際応用で、何れも感光度が低い(重合速度及び露光剤量が高い))、溶解性が悪い(透明度及びリソグラフィー残渣が多い)、貯蔵安定性が低い、短波長の敏感度が不足等の欠陥が多少存在し、感光性材料の性質を全体的に影響するため、高質のカラーフィルター及び新世代のLEDディスプレイの応用ニーズが満足できない。また、低感光度の光開始剤の使用により、実際生産における設備配置に対して規定外の要求が求められ、生成物の生産率に不利な影響を与える。 The photoinitiator is the most important factor affecting the photosensitivity of the photocuring composition (photosensitive composition). Currently, there are many reports on photoinitiators, such as benzoic derivatives, benzyl ketals, α, α-dialkoxyacetophenones, benzophenones / amines, Michler ketones, thiazolones / amines, aromatic diazonium salts, triazoxides, There are oxime ester type, and typical examples are commercially available Irgacure369, Darocure1173, OXE-1 and OXE-2. However, these photoinitiators are low in photosensitivity (high polymerization rate and high amount of exposure agent) in practical application, poor in solubility (high in transparency and lithography residue), and low in storage stability. There are some shortcomings such as lack of sensitivity at short wavelengths, which affect the properties of the photosensitive material as a whole, so the application needs of high quality color filters and new generation LED displays cannot be satisfied. In addition, the use of a photoinitiator with low photosensitivity demands an unspecified requirement for equipment layout in actual production, which adversely affects the product production rate.
現階段で、高感光度の光開始剤の研究が注目され、少量の報道も見られた。例えば、公開番号CN101508744Aにカルバゾールオキシムエステル系光開始剤が開示されており、OXE-2により優れた感光性を有し、当面のカラーフィルターの製作ニーズが一応満足できるが、電子科学技術の日進月歩の発展に伴い、光開始剤に対してより一層高いニーズが要求されるはずであり、現有の光開始剤が高質のカラーフィルター及び LEDの応用ニーズに徐々に満足できなくなる。より高い特性、特に、より高い感光特性の光開始剤の研究及び開発が重要な現実及び経済的意味を有する。 On the current staircase, research on photoinitiators with high photosensitivity attracted attention, and a small amount of news was also seen. For example, publication number CN101508744A discloses a carbazole oxime ester photoinitiator, which has excellent photosensitivity due to OXE-2 and can satisfy the production needs of color filters for the time being. With the development, higher needs for photoinitiators will be required, and existing photoinitiators will gradually become unsatisfied with the application needs of high quality color filters and LEDs. The research and development of photoinitiators with higher properties, in particular higher photosensitivity, have important real and economic implications.
本発明の目的は、優れた応用特性、特に非常高い感光度を有し、高質のカラーフィルター及OLEDディスプレイの製作ニーズを満足できる新規の光開始剤を提供することにある。 It is an object of the present invention to provide a novel photoinitiator that has excellent application characteristics, particularly very high photosensitivity, and can satisfy the production needs of high quality color filters and OLED displays.
上記技術効果を達成するために、本発明の技術案は、式(1)で表される構造を有するカルバゾールオキシムエステル系光開始剤に関する。
[但し、
R1は、
R 1 is
であり、
R2は、C1〜C20の直鎖状又は分岐状のアルキル基であり、
Arは、任意置換基を有する(即ち、置換基を有してもよい)S又はO含有複素環基、又は置換基にO、S、N原子が含まれる置換アリール基である。]
And
R 2 is a C 1 to C 20 linear or branched alkyl group,
Ar is an S- or O-containing heterocyclic group having an optional substituent (that is, which may have a substituent), or a substituted aryl group containing an O, S, or N atom in the substituent. ]
式(1)で表されるカルバゾールオキシムエステル系化合物において、R1置換基はn=2、m=3又は4であることが好ましい。 In the carbazole oxime ester compound represented by the formula (1), the R 1 substituent is preferably n = 2, m = 3 or 4.
R2は、好ましくはC1〜C5の直鎖状又は分岐状のアルキル基であり、より好ましくはメチル、エチル、n-プロピル、n-ブチルであり、特に好ましくはエチルである。 R 2 is preferably a C 1 to C 5 linear or branched alkyl group, more preferably methyl, ethyl, n-propyl, or n-butyl, and particularly preferably ethyl.
Arにおいて、前記任意置換基を有するS又はO含有複素環基は、好ましくは0〜2個の置換基、より好ましくは0〜2個のメチル又はエチルを有するものである。前記S又はO含有複素環基は、好ましくはフリル基又はチエニル基である。前記置換アリール基においてO、S、N 原子が含まれる置換基は、好ましくはアルキルチオ基、アルコキシ基、アルキルアミノ基、ピペラジニル基、又はモルホリニル基である。 In Ar, the S- or O-containing heterocyclic group having an optional substituent preferably has 0 to 2 substituents, more preferably 0 to 2 methyl or ethyl. The S or O-containing heterocyclic group is preferably a furyl group or a thienyl group. The substituent containing O, S, N atoms in the substituted aryl group is preferably an alkylthio group, an alkoxy group, an alkylamino group, a piperazinyl group, or a morpholinyl group.
具体的に、式(1)で表されるカルバゾールオキシムエステル系化合物において、Ar基は、好ましくは下記の構造から選ばれる。
本願発明は上記式(1)で表される構造を有するカルバゾールオキシムエステル系光開始剤の製造方法も提供する。該方法はカルバゾールを原料とし、以下のステップを含む。 The present invention also provides a method for producing a carbazole oxime ester photoinitiator having a structure represented by the above formula (1). The method uses carbazole as a raw material and includes the following steps.
(1) 置換反応:カルバゾールを有機溶剤に溶解し、臭化炭化水素であるR2‐Brと置換反応を行って、中間体 a(即ち、9‐R2基カルバゾール)を得る。その反応過程は、以下の通りである。
(2) アシル化反応:中間体a(9‐R2基カルバゾール)を有機溶剤に溶解し、塩化アルミニウムの触媒作用下で、アシル化反応を行って、中間体 b(即ち、3‐R1アシル‐6‐Ar アシル‐9‐R2基カルバゾール)を得る。その反応過程は以下の通りである。
(3) オキシム化反応:得られた中間体b(3‐R1アシル‐6‐Ar アシル‐9‐R2基カルバゾール)からオキシム化反応を経て、中間体c(即ち、1‐(6‐Arアシル‐9‐R2基カルバゾイル)‐1‐R1ケトンオキシム)を得る。その反応過程は以下の通りである。
(4) エステル化反応:得られた中間体c(1‐(6‐Arアシル‐9‐R2基カルバゾイル)‐1‐R1ケトンオキシム)と無水酢酸とのエステル化反応により、目標生成物(即ち、式(I)で表されるカルバゾールオキシムエステル系光開始剤)を得る。その反応過程は以下の通りである。
本発明の製造方法に使用される全ての原料は従来技術で知られた化合物であり、市販から入手又は知られた合成方法により製造される。 All the raw materials used in the production method of the present invention are compounds known in the prior art, and are obtained from commercial sources or produced by known synthesis methods.
式(1)で表される構造のカルバゾールオキシムエステル系化合物は、感光性(光硬化)組成物に光開始剤として使用されることができ、非常に優れた感光性を有する。ここで、感光性組成物における他の成分には特に限定せず、当分野の公知及び常用の成分(例えば、CN101059655Aに開示の内容を参照し、引用により参考になる)、例えば、光重合可能なアクリル酸系樹脂があってもよい。 The carbazole oxime ester compound having the structure represented by the formula (1) can be used as a photoinitiator in a photosensitive (photocuring) composition and has very excellent photosensitivity. Here, the other components in the photosensitive composition are not particularly limited, and known and commonly used components in the art (for example, refer to the contents disclosed in CN101059655A, which is referred to by reference), for example, photopolymerizable There may be an acrylic resin.
本発明の有益の技術効果は以下である。即ち、本発明において、式(1)で表されるカルバゾールオキシムエステル系光開始剤は、応用特性が優れており、特段の高い感光特性を有し、現段階で市販のIrgacure369、OXE-2等の光開始剤により優れ、且つCN101508744A に開示のカルバゾールオキシムエステル系光開始剤によりも優れている。感光性組成物に適用すると、光硬化特性が大きく向上でき、感光性組成物の応用分野、例えば、カラーフィルター製造の生産率を著しく向上させる。同時に、本発明の生産方法は、簡単であり、生産過程で汚染廃棄物が生じなく、生成物の純度が高く、工業化生産に適用できる。 The beneficial technical effects of the present invention are as follows. That is, in the present invention, the carbazole oxime ester photoinitiator represented by the formula (1) has excellent application characteristics, has particularly high photosensitive characteristics, and is commercially available at the present stage, such as Irgacure369 and OXE-2. This photoinitiator is superior to the carbazole oxime ester photoinitiator disclosed in CN101508744A. When applied to a photosensitive composition, the photocuring characteristics can be greatly improved, and the application field of the photosensitive composition, for example, the production rate of color filter production is significantly improved. At the same time, the production method of the present invention is simple, does not produce contaminated waste in the production process, has high product purity, and can be applied to industrial production.
製造実施例
実施例 1:
下式で表される 1-[6-(2-チエニルホルミル)-9-エチルカルバゾール-3-イル]-(3-シクロペンチルアセトン)-1-オキシムアセテートの製造
Production of 1- [6- (2-thienylformyl) -9-ethylcarbazol-3-yl]-(3-cyclopentylacetone) -1-oxime acetate represented by the following formula
ステップ1:9-エチルカルバゾールの製造
250mL四口フラスコに20gのカルバゾール、0.8gのテトラエチルアンモニウム臭化物、100mLトルエンを投入し、撹拌下で、70gの用時配合の50% NaOH水溶液を入れ、約30分をかけて15.6gのブロモエタンを滴下した後、加熱し、6時間還流反応させた。室温まで冷却し、水層を分離し、産物液層を水で3回洗浄し、無水MgSO4で乾燥してから、吸引ろ過した。溶剤を減圧濃縮で除去し、残留物を無水アルコールで再結晶し、白色針状結晶体33.5gを得た。収率が72.0%であり、相対純度が99.0%であった。 Add 20 g of carbazole, 0.8 g of tetraethylammonium bromide, and 100 mL of toluene to a 250 mL four-necked flask, and add 70 g of 50% NaOH aqueous solution with stirring, and stir 15.6 g of bromoethane over about 30 minutes. After dropping, the mixture was heated and refluxed for 6 hours. After cooling to room temperature, the aqueous layer was separated, and the product liquid layer was washed with water three times, dried over anhydrous MgSO 4 , and then suction filtered. The solvent was removed by concentration under reduced pressure, and the residue was recrystallized with anhydrous alcohol to obtain 33.5 g of white needle crystals. The yield was 72.0% and the relative purity was 99.0%.
ステップ2:3-(3-シクロペンチルプロパノイル)-6-(2-チエニルホルミル)-9-エチルカルバゾールの製造
500mlの四口フラスコに30gの9-エチルカルバゾール、21.6gのAlCl3(細かく粉砕)、150mlのジクロロメタンを投入し、撹拌しながら、保護のためにアルゴンガスを導入し、氷浴で冷却した。温度が0℃に下がった時点で、23.2gの2-チエニル蟻酸クロライドと21gのジクロロメタンとの混合液の滴下を開始し、温度を10℃以下に制御した。約1.5時間で滴下が完了し、引き続き2時間撹拌した。その後、フラスコに21.6g AlCl3(細かく粉砕)を加入してから、27.2gのシクロペンチルプロピオン酸クロライド と20gのジクロロメタンとの混合液を、温度を10℃以下に制御して、約1.5時間で滴下完了した。その後、温度を15℃まで昇温し、引き続き2時間撹拌し、産物を取出した。 A 500 ml four-necked flask was charged with 30 g of 9-ethylcarbazole, 21.6 g of AlCl 3 (finely pulverized) and 150 ml of dichloromethane, and while stirring, argon gas was introduced for protection and cooled in an ice bath. When the temperature dropped to 0 ° C., dropwise addition of a mixture of 23.2 g of 2-thienyl formic acid chloride and 21 g of dichloromethane was started, and the temperature was controlled to 10 ° C. or lower. The dropwise addition was completed in about 1.5 hours, followed by stirring for 2 hours. After that, 21.6 g AlCl 3 (finely pulverized) was added to the flask, and then a mixture of 27.2 g cyclopentylpropionic acid chloride and 20 g dichloromethane was added dropwise in about 1.5 hours while controlling the temperature to 10 ° C. or lower. Completed. Thereafter, the temperature was raised to 15 ° C., followed by stirring for 2 hours, and the product was taken out.
後処理 :
撹拌下で、産物を400gの氷と65mlの濃塩酸とを配合した希塩酸にゆっくり注ぎ、分液ロートで下層産物液を取出し、上層を50mlのジクロロメタンで抽出した。抽出液と産物液とを併合し、10gのNaHCO3 及び 200gの水を配合したNaHCO3 溶液で洗浄し、さらに、pH 値が中性になるまでに200mlの水で3回洗浄した。30gの無水 MgSO4 で乾燥して、水を除去してから、ジクロロメタンを回転蒸発させた。蒸発した後、回転蒸発瓶中の粗生成物が固体粉末状であり、200mlの常圧で蒸留された石油エーテルに入れ、吸引ろ過し、浅い黄色の粉末状固体を得た。70℃のオーブンで2時間乾燥して、生成物を46.2g得た。収率が70%であり、純度が94%を超えた。
Post-processing:
Under stirring, the product was slowly poured into dilute hydrochloric acid containing 400 g of ice and 65 ml of concentrated hydrochloric acid, the lower layer product liquid was taken out with a separatory funnel, and the upper layer was extracted with 50 ml of dichloromethane. The extract and the product liquid were combined, washed with a NaHCO 3 solution containing 10 g of NaHCO 3 and 200 g of water, and further washed three times with 200 ml of water until the pH value became neutral. After drying over 30 g anhydrous MgSO 4 to remove water, the dichloromethane was rotoevaporated. After evaporation, the crude product in the rotary evaporation bottle was in the form of a solid powder, put into petroleum ether distilled at 200 ml of atmospheric pressure, and suction filtered to obtain a pale yellow powdery solid. Drying in an oven at 70 ° C. for 2 hours yielded 46.2 g of product. The yield was 70% and the purity exceeded 94%.
ステップ3:1-[6-(2-チエニルホルミル)-9-エチルカルバゾール-3-イル]-(3-シクロペンチルアセトン)-1-オキシムの製造
500mlの四口フラスコに46.2gの上記第2ステップの生成物、11.2gのヒドロキシルアミン塩酸塩、16.4gの酢酸ナトリウム、150gのアルコール、50gの水を投入し、加熱・撹拌しながら5時間還流反応させた。
後処理 :
産物を大きいビーカーに注ぎ、1000mlの水を加入して撹拌し、一晩静置した。吸引ろ過して白色の粉末状固体を得た。該白色の粉末状固体を200mlのTHFに入れ、50gの無水 MgSO4で乾燥してから、吸引ろ過し、ろ過液を回転蒸発させ、回転蒸発瓶中で油状粘稠物が得られた。粘稠物を150mlの無水メタノールに入れ、撹拌しながら析出させた。得られたものを吸引ろ過し、白色粉末状の固体を得た。70℃で5時間乾燥し、生成物を38.6g得た。収率が81%であり、純度が95%を超えた。
Into a 500 ml four-necked flask is charged 46.2 g of the product of the second step, 11.2 g of hydroxylamine hydrochloride, 16.4 g of sodium acetate, 150 g of alcohol, 50 g of water, and refluxed for 5 hours while heating and stirring. Reacted.
Post-processing:
The product was poured into a large beaker, 1000 ml of water was added and stirred and left overnight. Suction filtration gave a white powdery solid. The white powdery solid was taken up in 200 ml THF, dried over 50 g anhydrous MgSO 4 , filtered with suction and the filtrate was rotoevaporated to give an oily viscous in a rotovap bottle. The viscous material was put into 150 ml of anhydrous methanol and precipitated while stirring. The resultant was suction filtered to obtain a white powdery solid. Drying at 70 ° C. for 5 hours gave 38.6 g of product. The yield was 81% and the purity exceeded 95%.
ステップ4:1-[6-(2-チエニルホルミル)-9-エチルカルバゾール-3-イル]-(3-シクロペンチルアセトン)-1-オキシムアセテートの製造
500mlの四口フラスコに32gの第3ステップの生成物、150mlのジクロロメタン、11gの無水酢酸を投入し、室温下で2時間撹拌した後、5%のNaHCO3水溶液でpH値が中性になるまでに調整した。分液ロートで分層してから、200mlの水で一回洗浄した。50gの無水 MgSO4 で乾燥し、溶剤を回転蒸発させ、粘稠状の液体を得た。再結晶により白色固体の生成物が得られた。ろ過・乾燥し、生成物を30.5g得た。収率が87%であり、純度が95%を超えた。
Step 4: Preparation of 1- [6- (2-thienylformyl) -9-ethylcarbazol-3-yl]-(3-cyclopentylacetone) -1-oxime acetate
A 500 ml four-necked flask was charged with 32 g of the third step product, 150 ml of dichloromethane, 11 g of acetic anhydride, stirred at room temperature for 2 hours, and then neutralized with 5% aqueous NaHCO 3 solution. Adjusted by. The layers were separated with a separatory funnel and then washed once with 200 ml of water. It was dried over 50 g of anhydrous MgSO 4 and the solvent was rotoevaporated to give a viscous liquid. Recrystallization gave a white solid product. Filtration and drying gave 30.5 g of the product. The yield was 87% and the purity exceeded 95%.
生成物の構造は1 H-NMRスペクトルで確認され、具体的な特徴結果が以下の通りである。 The structure of the product was confirmed by 1 H-NMR spectrum, and specific characteristic results are as follows.
1H-NMR(CDCl3 、500MHz):δ1.131--1.170(2H、m、-CH2 -)、1.468 1.497(3H、t、-CH3)、1.537--1.893(9H、m、シクロペンタン)、2.281(3H、s、-CH3)、2.955--2.987(2H、q、-CH2-)、4.401--4.444(2H、q、-CH2-)、7.285--8.542(9H、m、 ベンゼン環)。 1 H-NMR (CDCl 3 , 500 MHz): δ 1.131--1.170 (2H, m, —CH 2 —), 1.468 1.497 (3H, t, —CH 3 ), 1.537--1.893 (9H, m, cyclo pentane), 2.281 (3H, s, -CH 3), 2.955--2.987 (2H, q, -CH 2 -), 4.401--4.444 (2H, q, -CH 2 -), 7.285--8.542 (9H , M, benzene ring).
実施例2--12:
実施例1で示された方法を参照し、対応のアシル化剤、対応のアルデヒド又はケトンにより実施例2--12の化合物を製造した。目標化合物及びその1H-NMRのデータを表1に示す。
Referring to the method shown in Example 1, the compound of Example 2--12 was prepared with the corresponding acylating agent, the corresponding aldehyde or ketone. The target compound and its 1 H-NMR data are shown in Table 1.
感光特性のテスト
感光度のテスト方法は Step Tabletを使用するものである。Step Tabletは一枚のプラスチック板であり、又はマスク板と称される。外形はプラスチック尺のようであり、上に同じの間隔で矩形枠が印刷されている。Step Tabletの階調数は、矩形枠の数に等しい。これらの矩形枠に一定の光学濃度の増加分で無色透明から浅いグレイ、黒色までの色が印刷されていることにより、照射光量の量を調整する。色浅い部分は色深い部分により多くの光が透過される。階調数の前の数字と色とが対応している。数字が小さいほど階調数が小さく、色が浅いほど、透過される光量が多くなり、対応の光開始剤の感光度がより低い。数字が高いほど、階調数が高く、色が深くほど、透過される光量が小さくなり、対応の光開始剤の感光度がより高い。
Photosensitivity test The test method for photosensitivity uses Step Tablet. Step Tablet is a single plastic plate or is called a mask plate. The outer shape looks like a plastic scale, and rectangular frames are printed on it at the same interval. The number of gradations of Step Tablet is equal to the number of rectangular frames. These rectangular frames are printed with colors from colorless and transparent to shallow gray and black with a certain increase in optical density, thereby adjusting the amount of irradiation light. The lightly colored part transmits more light to the deeply colored part. The numbers before the number of gradations correspond to the colors. The smaller the number, the smaller the number of gradations and the shallower the color, the more light is transmitted and the lower the photosensitivity of the corresponding photoinitiator. The higher the number, the higher the number of gradations, the deeper the color, the smaller the amount of transmitted light, and the higher the photosensitivity of the corresponding photoinitiator.
具体的に、以下のステップに従って、式(I)で表される光開始剤の感光特性をテストした。 Specifically, the photosensitivity of the photoinitiator represented by formula (I) was tested according to the following steps.
(1)以下の組成を例として、光開始剤を含有する感光性組成物を配合した。 (1) Using the following composition as an example, a photosensitive composition containing a photoinitiator was blended.
アクリレート共重合体 200 質量部
(ベンジルメタクリレート/メタクリル酸/ヒドロキシエチルメタクリレート
(モル比: 70/10/20)共重合体(Mw:10000))
ジペンタエリスリトールヘキサアクリレート 100 質量部
光開始剤 5 質量部
ブタノン(溶剤) 900 質量部
上記組成物における光開始剤は本発明の式(I)で表されるカルバゾールオキシムエステル系化合物又は(対比として)従来技術で知られた光開始剤から選択される。
200 parts by mass of acrylate copolymer (benzyl methacrylate / methacrylic acid / hydroxyethyl methacrylate (molar ratio: 70/10/20) copolymer (Mw: 10000))
Dipentaerythritol hexaacrylate 100 parts by weight Photoinitiator 5 parts by weight
900 parts by weight of butanone (solvent) The photoinitiator in the above composition is selected from carbazole oxime ester compounds represented by the formula (I) of the present invention or (as contrast) photoinitiators known in the prior art.
(2)感光特性のテスト
上記配合物を黄光灯下で撹拌し、一定量をPETテンプレートの上に取り載せ、ロールコーターにより成膜し、90℃で2分乾燥させて、乾燥膜の厚さが2μmの塗膜を得た。上記厚さの塗膜を得るために、塗布過程は一回で完成されてもよく、何回に分けて行っても良い。
(2) Photosensitivity test The above blend was stirred under a yellow light, a fixed amount was placed on a PET template, formed into a film with a roll coater, and dried at 90 ° C for 2 minutes. A 2 μm coating film was obtained. In order to obtain a coating film having the above thickness, the coating process may be completed once, or may be performed several times.
その後、室温までに冷却し、階調数12のマスク板を付け、高圧水銀ランプを使用して、365nm、405nm及び436nm波長の紫外線の照射で塗膜を露光した。光パワーメーターによりテスト用の原版上の総放射線量が1000mJ/cm2と測定された。露光後、マスク板を取り、30℃で1%の炭酸ナトリウム水溶液を使用して露光された原版を現像した。開始剤体系の感光度特徴としては、現像後保留した(即ち、重合の)最高の階調数である。階調数が高いほど、テスト体系の敏感度が高いことを示す。結果は表 2に示す。
表 2において、PBG-304は、CN101508744Aに開示の光開始剤である1-(6-O-メチルベンゾイル-9-エチルカルバゾール-3-イル)-(3-シクロペンチルアセトン)-1-オキシムアセテートを示し、OXE-02は、1-(6-O-メチルベンゾイル-9-エチルカルバゾール-3-イル)-(3-エタノン)-1-オキシムアセテートを示し、Irgacure369は、2-フェニル-2-ジメチルアミノ-1-(-4-モルホリニルフェニル)-ブタノン-1を示す。 In Table 2, PBG-304 represents 1- (6-O-methylbenzoyl-9-ethylcarbazol-3-yl)-(3-cyclopentylacetone) -1-oxime acetate, a photoinitiator disclosed in CN101508744A. OXE-02 represents 1- (6-O-methylbenzoyl-9-ethylcarbazol-3-yl)-(3-ethanone) -1-oxime acetate; Irgacure369 represents 2-phenyl-2-dimethyl Amino-1-(-4-morpholinylphenyl) -butanone-1 is shown.
表2の実験結果により明らかのように、本発明に係る式(I)で表される光開示剤の階調数は、市販のIrgacure369及びOXE-2の光開始剤により高く 、且つCN101508744Aに開示のカルバゾールオキシムエステル系光開始剤によりも高い。即ち、本発明のカルバゾールオキシムエステル系の化合物は光開始剤として、その感光(光硬化)特性がより優れている。 As is apparent from the experimental results in Table 2, the number of gradations of the photodisclosure agent represented by the formula (I) according to the present invention is higher with the commercially available Irgacure369 and OXE-2 photoinitiators and is disclosed in CN101508744A Even higher than the carbazole oxime ester photoinitiators. That is, the carbazole oxime ester-based compound of the present invention is superior in photosensitivity (photocuring) characteristics as a photoinitiator.
上記により、本発明に係る式(I)で表されるカルバゾールオキシムエステル系光開始剤は、応用特性が優れ、非常に高い感光性を有し、現在市販可能のIrgacure369、OXE-2 等の光開始剤により優れており、且つCN101508744Aに開示のカルバゾールオキシムエステル系光開始剤によりも優れる。感光性組成物に適用すると、光硬化性質を大きく向上させ、高感光性組成物応用分野、例えば、カラーフィルターの生産率を著しく向上できる。一方、より高い感光特性は、より低い光開始剤濃度及び/又は露光剤量で、組成物体系のよい架橋硬化ができることを示す。例えば、カラーフィルターの製造において、本発明の光開始剤を含む感光性組成物を使用することにより、非常に低い露光剤の量でBMの製作が完成できる。 Based on the above, the carbazole oxime ester photoinitiator represented by the formula (I) according to the present invention has excellent application characteristics, extremely high photosensitivity, and light such as Irgacure369 and OXE-2 which are currently commercially available. It is superior to the initiator and also superior to the carbazole oxime ester photoinitiator disclosed in CN101508744A. When applied to a photosensitive composition, the photo-curing properties can be greatly improved, and the field of application of a highly photosensitive composition, for example, the production rate of a color filter can be significantly improved. On the other hand, higher photosensitivity indicates that the composition system can be cross-linked and cured with a lower photoinitiator concentration and / or exposure agent amount. For example, in the production of a color filter, by using the photosensitive composition containing the photoinitiator of the present invention, the production of BM can be completed with a very low amount of exposure agent.
Claims (11)
但し、
R1は、
であり、
R2は、C1〜C20の直鎖状又は分岐状のアルキル基であり、
Arは、置換基を有してもよいO含有複素環基、又はアルキルチオ基若しくはフェニルチオ基を置換基として有する置換アリール基である。 A carbazole oxime ester photoinitiator having a structure represented by the formula (1).
However,
R 1 is
And
R 2 is a C 1 to C 20 linear or branched alkyl group,
Ar is a substituted aryl group having not may have a substituent O-containing heterocyclic group, or an alkylthio group or phenylthio group.
(1) 置換反応:カルバゾールを有機溶剤に溶解し、臭化炭化水素であるR2‐Brと置換反応を行って、中間体 a(即ち、9‐R2カルバゾール)を得る。その反応過程は以下の通りである。
(2) アシル化反応:中間体aを有機溶剤に溶解し、塩化アルミニウムの触媒作用下で、アシル化反応を行って、中間体 b(即ち、3‐R1アシル‐6‐Ar アシル‐9‐R2カルバゾール)を得る。その反応過程は以下の通りである。
(3) オキシム化反応:得られた中間体bから、オキシム化反応を経て、中間体c(即ち、1‐(6‐Arアシル‐9‐R2カルバゾイル)‐1‐R1ケトンオキシム)を得る。その反応過程は以下の通りである。
(4) エステル化反応:得られた中間体cと無水酢酸とのエステル化反応により、目標生成物(即ち、式(I)で表されるカルバゾールオキシムエステル系光開始剤)を得る。その反応過程は以下の通りである。
(1) Substitution reaction: Dissolve carbazole in an organic solvent and perform substitution reaction with R 2 -Br, which is a brominated hydrocarbon, to obtain intermediate a (ie, 9-R 2 carbazole). The reaction process is as follows.
(2) Acylation reaction: Intermediate a is dissolved in an organic solvent and subjected to an acylation reaction under the action of aluminum chloride to produce intermediate b (ie 3-R 1 acyl-6-Ar acyl-9 -R 2 carbazole). The reaction process is as follows.
(3) the oximation reaction: From the obtained intermediate b, through oximation reaction, intermediate c (i.e., 1-(6-Ar acyl -9-R 2-carbazolyl) -1-R 1 ketoxime) a obtain. The reaction process is as follows.
(4) Esterification reaction: A target product (that is, a carbazole oxime ester photoinitiator represented by the formula (I)) is obtained by an esterification reaction between the obtained intermediate c and acetic anhydride. The reaction process is as follows.
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