JP5543336B2 - 高速スワップロボット付コンパクト基板搬送システム - Google Patents
高速スワップロボット付コンパクト基板搬送システム Download PDFInfo
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- JP5543336B2 JP5543336B2 JP2010509494A JP2010509494A JP5543336B2 JP 5543336 B2 JP5543336 B2 JP 5543336B2 JP 2010509494 A JP2010509494 A JP 2010509494A JP 2010509494 A JP2010509494 A JP 2010509494A JP 5543336 B2 JP5543336 B2 JP 5543336B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
- B25J9/043—Cylindrical coordinate type comprising an articulated arm double selective compliance articulated robot arms [SCARA]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
- B25J9/106—Programme-controlled manipulators characterised by positioning means for manipulator elements with articulated links
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
Claims (12)
- 基板処理システムであって、基板の収納および搬送用に少なくとも1つの基板容器を保持するように構成されるロードポートモジュールと、
基板処理チャンバと、
隔離された雰囲気をチャンバ内に保持することができ、前記基板処理チャンバと前記ロードポートモジュールとに結合するように構成された隔離可能な移送チャンバと、
前記移送チャンバ内に少なくとも部分的に取り付けられ、前記移送チャンバに固定される駆動部分と少なくとも1つの基板を支持するように構成される1つのSCARAアームとを有し、前記SCARAアームは、前記移送チャンバを通る直線経路に沿った連続的な直線動作で2方向に伸展して、前記少なくとも1つの基板にワンタッチするのみで、前記の少なくとも1つの基板の基板容器と前記処理チャンバとの間の搬送を行うように構成され、前記SCARAアームが互いに連続的に枢動可能に結合される第1アームリンクと、第2アームリンクと、少なくとも1つのエンドエフェクタと、を備え、前記第1および第2アームリンクは異なる長さを有する基板搬送機と、を備え、前記移送チャンバはスカラアームの長さに比してコンパクトであることを特徴とする基板処理システム。 - 前記ロードポートモジュールが1つだけのロードポートモジュールであり、前記基板処理チャンバが1つだけの基板処理チャンバであることを特徴とする請求項1に記載の基板処理システム。
- 前記基板容器と前記基板処理チャンバとの間で前記基板をワンタッチのみで搬送するときに、前記基板容器と基板移送チャンバとの間の第1の経路と前記移送チャンバと前記基板処理チャンバとの間の第2の経路とに沿って前記基板を移動し、前記第1および第2の経路が実質的に位置合わせされていることを特徴とする請求項1に記載の基板処理システム。
- 前記SCARAアームが基板を搬送するべく通過する隙間領域を前記SCARAアームが画定し、前記移送チャンバが前記隙間領域に実質的に相当する移送エリアを形成するように配置構成されることを特徴とする請求項1に記載の基板処理システム。
- 前記ロードポートモジュールが前記移送チャンバに直接結合され、前記移送チャンバが前記処理チャンバに直接結合されることを特徴とする請求項1に記載の基板処理システム。
- 前記処理チャンバと、移送チャンバと、ロードポートモジュールとが実質的に共通の中央線に沿って配列されることを特徴とする請求項1に記載の基板処理システム。
- 基板処理システムであって、
EFEM(equipment front end module)から基板を移送するために少なくとも1つの搬送経路を有するEFEMと、
前記EFEMに直結される少なくとも1つの基板移送モジュールと、
前記の少なくとも1つの基板移送モジュールのそれぞれに結合される少なくとも1つの基板処理モジュールと、を備え、
前記基板処理システムが1つのクラスタツールを画定し、前記EFEMと、前記の少なくとも1つの基板移送モジュールと、前記の少なくとも1つの基板処理モジュールとが、互いに隔離された雰囲気を有する前記クラスタツールの独立かつ並行した搬送経路を形成するように配置され、前記少なくとも1つの基板移送モジュールの各々は、基板移送モジュールの各々を通過する直線経路に沿った連続的な直線動作で2方向に伸展して、少なくとも1つの基板を前記基板移送モジュールの各々の外から処理チャンバの各々に、前記少なくとも少なくとも1つの基板にワンタッチするのみで搬送する基板搬送機を含み、前記基板移送モジュールの各々は、基板搬送機の各々の長さに比してコンパクトであることを特徴とする基板処理システム。 - 請求項7に記載の基板処理システムであって、前記の少なくとも1つの基板移送モジュールが、
前記EFEMとインターフェースで接続して、少なくとも1つの基板を保持するように構成される第1のチャンバと、
前記の少なくとも1つの基板処理モジュールとインターフェースで接続するように構成される第2のチャンバと、を含み
前記基板搬送機は、少なくとも部分的に前記第2チャンバ内に位置して、前記第1チャンバから少なくとも1つの基板処理モジュールに基板を移送するように構成されていることを特徴とする基板処理システム。 - 前記第1および第2のチャンバが互いからも、前記EFEMおよび前記の少なくとも1つの基板処理モジュールのそれぞれからも隔離可能であることを特徴とする請求項8に記載の基板処理システム。
- 前記第1チャンバが基板バッファとして構成され、着脱自在の弁インサートが前記バッファをロードロックに転換するために前記第1および第2のチャンバを隔離するように構成されていることを特徴とする請求項8に記載の基板処理システム。
- 前記第1および第2チャンバが1つのユニットとして隔離可能なチャンバを形成することを特徴とする請求項8に記載の基板処理モジュール。
- 前記基板移送モジュールが、基板バッファ、基板冷却装置、及び基板アライナのうちの少なくとも1つを含む、請求項7に記載の基板処理システム。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93891307P | 2007-05-18 | 2007-05-18 | |
US60/938,913 | 2007-05-18 | ||
US12/123,329 | 2008-05-19 | ||
US12/123,329 US8562271B2 (en) | 2007-05-18 | 2008-05-19 | Compact substrate transport system |
PCT/US2008/064144 WO2008144664A1 (en) | 2007-05-18 | 2008-05-19 | Compact substrate transport system with fast swap robot |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014023394A Division JP6630031B2 (ja) | 2007-05-18 | 2014-02-10 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
Publications (3)
Publication Number | Publication Date |
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JP2011504288A JP2011504288A (ja) | 2011-02-03 |
JP2011504288A5 JP2011504288A5 (ja) | 2014-04-03 |
JP5543336B2 true JP5543336B2 (ja) | 2014-07-09 |
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Application Number | Title | Priority Date | Filing Date |
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JP2010509494A Active JP5543336B2 (ja) | 2007-05-18 | 2008-05-19 | 高速スワップロボット付コンパクト基板搬送システム |
JP2014023394A Active JP6630031B2 (ja) | 2007-05-18 | 2014-02-10 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
JP2017027611A Active JP6480488B2 (ja) | 2007-05-18 | 2017-02-17 | 基板搬送方法 |
JP2019170796A Active JP6898403B2 (ja) | 2007-05-18 | 2019-09-19 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
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JP2014023394A Active JP6630031B2 (ja) | 2007-05-18 | 2014-02-10 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
JP2017027611A Active JP6480488B2 (ja) | 2007-05-18 | 2017-02-17 | 基板搬送方法 |
JP2019170796A Active JP6898403B2 (ja) | 2007-05-18 | 2019-09-19 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
Country Status (4)
Country | Link |
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US (2) | US8562271B2 (ja) |
JP (4) | JP5543336B2 (ja) |
KR (3) | KR20100031681A (ja) |
WO (1) | WO2008144664A1 (ja) |
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US6918731B2 (en) | 2001-07-02 | 2005-07-19 | Brooks Automation, Incorporated | Fast swap dual substrate transport for load lock |
US10086511B2 (en) * | 2003-11-10 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor manufacturing systems |
TWI574341B (zh) * | 2010-12-29 | 2017-03-11 | 歐瑞康先進科技股份有限公司 | 真空處理設備及製造方法 |
KR102371755B1 (ko) | 2011-09-16 | 2022-03-07 | 퍼시몬 테크놀로지스 코포레이션 | 패시브 회전자를 가진 로봇 구동 |
US9202733B2 (en) * | 2011-11-07 | 2015-12-01 | Persimmon Technologies Corporation | Robot system with independent arms |
KR101271794B1 (ko) * | 2011-12-01 | 2013-06-07 | 박호현 | 로드락 챔버 |
JP5885528B2 (ja) * | 2012-02-14 | 2016-03-15 | 株式会社安川電機 | 搬送装置 |
US10224232B2 (en) | 2013-01-18 | 2019-03-05 | Persimmon Technologies Corporation | Robot having two arms with unequal link lengths |
US9149936B2 (en) | 2013-01-18 | 2015-10-06 | Persimmon Technologies, Corp. | Robot having arm with unequal link lengths |
WO2014113364A1 (en) * | 2013-01-18 | 2014-07-24 | Persimmon Technologies, Corp. | Robot having arm with unequal link lengths |
TWI627696B (zh) | 2013-01-22 | 2018-06-21 | 布魯克斯自動機械公司 | 基材運送 |
TWI684229B (zh) | 2013-07-08 | 2020-02-01 | 美商布魯克斯自動機械公司 | 具有即時基板定心的處理裝置 |
KR102591049B1 (ko) | 2013-11-13 | 2023-10-18 | 브룩스 오토메이션 인코퍼레이티드 | 밀봉된 스위치드 릴럭턴스 모터 |
KR20230116962A (ko) | 2013-11-13 | 2023-08-04 | 브룩스 오토메이션 인코퍼레이티드 | 브러쉬리스 전기 기계 제어 방법 및 장치 |
WO2015073647A1 (en) | 2013-11-13 | 2015-05-21 | Brooks Automation, Inc. | Sealed robot drive |
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