JP6480488B2 - 基板搬送方法 - Google Patents
基板搬送方法 Download PDFInfo
- Publication number
- JP6480488B2 JP6480488B2 JP2017027611A JP2017027611A JP6480488B2 JP 6480488 B2 JP6480488 B2 JP 6480488B2 JP 2017027611 A JP2017027611 A JP 2017027611A JP 2017027611 A JP2017027611 A JP 2017027611A JP 6480488 B2 JP6480488 B2 JP 6480488B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- transfer
- arm
- transfer chamber
- module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000012546 transfer Methods 0.000 title claims description 311
- 239000000758 substrate Substances 0.000 title claims description 268
- 238000000034 method Methods 0.000 title claims description 49
- 238000012545 processing Methods 0.000 claims description 195
- 239000012636 effector Substances 0.000 claims description 98
- 239000000872 buffer Substances 0.000 claims description 47
- 230000001419 dependent effect Effects 0.000 claims description 3
- 230000032258 transport Effects 0.000 description 47
- 230000008569 process Effects 0.000 description 33
- 239000007789 gas Substances 0.000 description 14
- 210000000245 forearm Anatomy 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 230000009977 dual effect Effects 0.000 description 6
- 238000003860 storage Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 210000000707 wrist Anatomy 0.000 description 4
- 101150075681 SCL1 gene Proteins 0.000 description 2
- 239000007853 buffer solution Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 238000005273 aeration Methods 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000009699 differential effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 210000000323 shoulder joint Anatomy 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
- B25J9/043—Cylindrical coordinate type comprising an articulated arm double selective compliance articulated robot arms [SCARA]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/10—Programme-controlled manipulators characterised by positioning means for manipulator elements
- B25J9/106—Programme-controlled manipulators characterised by positioning means for manipulator elements with articulated links
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
Claims (7)
- 少なくとも1つの基板を、基板処理システムのロードポートに結合される基板容器から、前記基板処理システムの移送チャンバ内に位置する基板搬送アームを用いて取り上げるステップと、
前記少なくとも1つの基板を、前記基板搬送アームで前記基板容器から前記基板処理システムの処理モジュールに直接搬入するステップと、を含み、
前記基板搬送アームは、ちょうど3つの回転関節と、互いに直列に接続された第1のアームリンク、第2のアームリンク及びエンドエフェクタとを有する3リンクアームであり、前記第2のアームリンクの回転は、前記第1のアームリンクの回転に従属し、前記第1のアームリンク及び前記第2のアームリンクは長さが同一ではなく、前記第1のアームリンクの第1の端部が、前記3つの回転関節のうち第1の回転関節において駆動セクションに回転自在に結合され、前記第2のアームリンクの第1の端部が、前記3つの回転関節のうち第2の回転関節において前記第1のアームリンクの第2の端部に回転自在に結合され、前記エンドエフェクタの第1の端部が、前記3つの回転関節のうち第3の回転関節において前記第2のアームリンクの第2の端部に回転自在に結合され、
前記搬入するステップにおいて、前記基板搬送アームが、前記基板搬送アームのユニットとしての回転無しに前記移送チャンバを通過する略直線経路に沿った連続的な直線動作で2方向に伸展して、前記基板搬送アームが前記少なくとも1つの基板を前記略直線経路に沿った移送中に1度だけ取り扱い、
前記略直線経路は、前記移送チャンバを通って伸長しかつ前記移送チャンバの中心に近接した中心軸を有し、
前記エンドエフェクタが、前記略直線経路に沿った前記少なくとも1つの基板の移送中に、前記第3の回転関節の周りを回転され、前記第1のアームリンクの回転及び前記第2のアームリンクの回転とは別個に駆動されることを特徴とする方法。 - 前記移送チャンバが、前記ロードポートと処理モジュールとを結合し、前記方法がさらに、前記移送チャンバの雰囲気を隔離するステップをさらに含んでいることを特徴とする請求項1に記載の方法。
- 前記基板搬送アームが、高速スワップ搬送アームを備え、基板を実質的に連続的に処理するために、前記方法が、前記高速スワップ搬送アームで、処理済みの基板を前記処理モジュールから取り外すステップと、未処理の基板を前記処理モジュールに載置するステップと、をさらに含むことを特徴とする請求項1に記載の方法。
- 前記移送チャンバのバッファ部に少なくとも1つの基板を格納するステップをさらに含み、前記移送チャンバが、前記バッファ部と、前記基板搬送アームの少なくとも一部を収容する搬送部とを含むことを特徴とする請求項1に記載の方法。
- 前記移送チャンバの取り外し可能なバルブインサートを用いて、前記移送チャンバの前記バッファ部を、前記搬送部から隔離可能な雰囲気を有するロードロックに変換するステップをさらに含むことを特徴とする請求項4に記載の方法。
- 前記バッファ部および前記搬送部が、前記処理モジュールおよび前記ロードポートから選択的に隔離可能な単一の一体的なチャンバを形成することを特徴とする請求項4に記載の方法。
- 前記移送チャンバが、基板バッファ、基板冷却装置および基板アライナの少なくとも1つを含むことを特徴とする請求項1に記載の方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93891307P | 2007-05-18 | 2007-05-18 | |
US60/938,913 | 2007-05-18 | ||
US12/123,329 | 2008-05-19 | ||
US12/123,329 US8562271B2 (en) | 2007-05-18 | 2008-05-19 | Compact substrate transport system |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014023394A Division JP6630031B2 (ja) | 2007-05-18 | 2014-02-10 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017143270A JP2017143270A (ja) | 2017-08-17 |
JP6480488B2 true JP6480488B2 (ja) | 2019-03-13 |
Family
ID=40122195
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010509494A Active JP5543336B2 (ja) | 2007-05-18 | 2008-05-19 | 高速スワップロボット付コンパクト基板搬送システム |
JP2014023394A Active JP6630031B2 (ja) | 2007-05-18 | 2014-02-10 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
JP2017027611A Active JP6480488B2 (ja) | 2007-05-18 | 2017-02-17 | 基板搬送方法 |
JP2019170796A Active JP6898403B2 (ja) | 2007-05-18 | 2019-09-19 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010509494A Active JP5543336B2 (ja) | 2007-05-18 | 2008-05-19 | 高速スワップロボット付コンパクト基板搬送システム |
JP2014023394A Active JP6630031B2 (ja) | 2007-05-18 | 2014-02-10 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019170796A Active JP6898403B2 (ja) | 2007-05-18 | 2019-09-19 | 基板搬送システム、基板処理装置、及び基板搬送方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US8562271B2 (ja) |
JP (4) | JP5543336B2 (ja) |
KR (3) | KR20100031681A (ja) |
WO (1) | WO2008144664A1 (ja) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6918731B2 (en) | 2001-07-02 | 2005-07-19 | Brooks Automation, Incorporated | Fast swap dual substrate transport for load lock |
US10086511B2 (en) * | 2003-11-10 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor manufacturing systems |
TWI574341B (zh) * | 2010-12-29 | 2017-03-11 | 歐瑞康先進科技股份有限公司 | 真空處理設備及製造方法 |
KR102371755B1 (ko) | 2011-09-16 | 2022-03-07 | 퍼시몬 테크놀로지스 코포레이션 | 패시브 회전자를 가진 로봇 구동 |
US9202733B2 (en) * | 2011-11-07 | 2015-12-01 | Persimmon Technologies Corporation | Robot system with independent arms |
KR101271794B1 (ko) * | 2011-12-01 | 2013-06-07 | 박호현 | 로드락 챔버 |
JP5885528B2 (ja) * | 2012-02-14 | 2016-03-15 | 株式会社安川電機 | 搬送装置 |
US10224232B2 (en) | 2013-01-18 | 2019-03-05 | Persimmon Technologies Corporation | Robot having two arms with unequal link lengths |
US9149936B2 (en) | 2013-01-18 | 2015-10-06 | Persimmon Technologies, Corp. | Robot having arm with unequal link lengths |
WO2014113364A1 (en) * | 2013-01-18 | 2014-07-24 | Persimmon Technologies, Corp. | Robot having arm with unequal link lengths |
TWI627696B (zh) | 2013-01-22 | 2018-06-21 | 布魯克斯自動機械公司 | 基材運送 |
TWI684229B (zh) | 2013-07-08 | 2020-02-01 | 美商布魯克斯自動機械公司 | 具有即時基板定心的處理裝置 |
KR102591049B1 (ko) | 2013-11-13 | 2023-10-18 | 브룩스 오토메이션 인코퍼레이티드 | 밀봉된 스위치드 릴럭턴스 모터 |
KR20230116962A (ko) | 2013-11-13 | 2023-08-04 | 브룩스 오토메이션 인코퍼레이티드 | 브러쉬리스 전기 기계 제어 방법 및 장치 |
WO2015073647A1 (en) | 2013-11-13 | 2015-05-21 | Brooks Automation, Inc. | Sealed robot drive |
TWI695447B (zh) | 2013-11-13 | 2020-06-01 | 布魯克斯自動機械公司 | 運送設備 |
WO2015170972A1 (en) * | 2014-05-07 | 2015-11-12 | Mapper Lithography Ip B.V. | Enclosure for a target processing machine |
CN107408526B (zh) | 2015-03-12 | 2022-03-15 | 柿子技术公司 | 具有从动末端执行器运动的机器人 |
CN106298583B (zh) * | 2015-05-27 | 2019-12-03 | 中微半导体设备(上海)股份有限公司 | 处理腔、处理腔和真空锁组合以及基片处理系统 |
US9564350B1 (en) * | 2015-09-18 | 2017-02-07 | Globalfoundries Inc. | Method and apparatus for storing and transporting semiconductor wafers in a vacuum pod |
US9881820B2 (en) | 2015-10-22 | 2018-01-30 | Lam Research Corporation | Front opening ring pod |
US10062599B2 (en) | 2015-10-22 | 2018-08-28 | Lam Research Corporation | Automated replacement of consumable parts using interfacing chambers |
US10124492B2 (en) * | 2015-10-22 | 2018-11-13 | Lam Research Corporation | Automated replacement of consumable parts using end effectors interfacing with plasma processing system |
US20170115657A1 (en) | 2015-10-22 | 2017-04-27 | Lam Research Corporation | Systems for Removing and Replacing Consumable Parts from a Semiconductor Process Module in Situ |
JP7158133B2 (ja) * | 2017-03-03 | 2022-10-21 | アプライド マテリアルズ インコーポレイテッド | 雰囲気が制御された移送モジュール及び処理システム |
JP7251673B2 (ja) * | 2017-06-16 | 2023-04-04 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
JP6939335B2 (ja) * | 2017-09-27 | 2021-09-22 | Tdk株式会社 | ロードポート装置、ロードポート装置の駆動方法 |
TWI628133B (zh) * | 2017-11-03 | 2018-07-01 | 東台精機股份有限公司 | 雙向搬運臺車 |
US11380564B2 (en) | 2018-09-19 | 2022-07-05 | Applied Materials, Inc. | Processing system having a front opening unified pod (FOUP) load lock |
KR102108312B1 (ko) * | 2018-10-31 | 2020-05-12 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
US20200395232A1 (en) * | 2019-06-14 | 2020-12-17 | Brooks Automation, Inc. | Substrate process apparatus |
US11031269B2 (en) * | 2019-08-22 | 2021-06-08 | Kawasaki Jukogyo Kabushiki Kaisha | Substrate transport robot, substrate transport system, and substrate transport method |
US11823932B2 (en) * | 2020-08-26 | 2023-11-21 | Samsung Electronics Co., Ltd. | Substrate processing system and substrate processing apparatus |
KR102625679B1 (ko) * | 2021-11-05 | 2024-01-17 | 프리시스 주식회사 | 로드락모듈 및 이를 포함하는 기판처리시스템 |
Family Cites Families (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0590381A (ja) * | 1991-09-26 | 1993-04-09 | Tokyo Electron Ltd | 搬送装置 |
US5102280A (en) * | 1989-03-07 | 1992-04-07 | Ade Corporation | Robot prealigner |
IT1251017B (it) | 1991-05-21 | 1995-04-28 | Ugo Crippa | Meccanismo per compiere traiettorie prefissate assimilabili ad ellittiche |
JP3429786B2 (ja) * | 1991-05-29 | 2003-07-22 | 東京エレクトロン株式会社 | 半導体製造装置 |
JPH0536809A (ja) * | 1991-07-31 | 1993-02-12 | Mitsubishi Electric Corp | 半導体基板処理装置に於ける半導体基板搬送アーム |
US5334761A (en) * | 1992-08-28 | 1994-08-02 | Life Technologies, Inc. | Cationic lipids |
JPH0697258A (ja) * | 1992-09-17 | 1994-04-08 | Hitachi Ltd | 連続真空処理装置 |
JPH06285780A (ja) * | 1993-04-06 | 1994-10-11 | Kokusai Electric Co Ltd | 搬送用ロボット |
KR100267617B1 (ko) * | 1993-04-23 | 2000-10-16 | 히가시 데쓰로 | 진공처리장치 및 진공처리방법 |
JPH07142551A (ja) * | 1993-11-20 | 1995-06-02 | Tokyo Electron Ltd | 搬送アーム装置及びこれを用いた処理室集合装置 |
JP3554534B2 (ja) | 1995-12-12 | 2004-08-18 | 東京エレクトロン株式会社 | 半導体処理装置の基板支持機構及び基板交換方法、並びに半導体処理装置及び基板搬送装置 |
US5944857A (en) * | 1997-05-08 | 1999-08-31 | Tokyo Electron Limited | Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor |
US6491491B1 (en) * | 1997-10-30 | 2002-12-10 | Sankyo Seiki Mfg. Co., Ltd. | Articulated robot |
JPH11129175A (ja) * | 1997-10-30 | 1999-05-18 | Sankyo Seiki Mfg Co Ltd | 多関節ロボット |
US6042623A (en) * | 1998-01-12 | 2000-03-28 | Tokyo Electron Limited | Two-wafer loadlock wafer processing apparatus and loading and unloading method therefor |
US6375746B1 (en) * | 1998-07-10 | 2002-04-23 | Novellus Systems, Inc. | Wafer processing architecture including load locks |
US6431807B1 (en) * | 1998-07-10 | 2002-08-13 | Novellus Systems, Inc. | Wafer processing architecture including single-wafer load lock with cooling unit |
KR100283425B1 (ko) | 1998-09-24 | 2001-04-02 | 윤종용 | 반도체소자의금속배선형성공정및그시스템 |
US6960057B1 (en) * | 1998-09-30 | 2005-11-01 | Brooks Automation, Inc. | Substrate transport apparatus |
TW442891B (en) | 1998-11-17 | 2001-06-23 | Tokyo Electron Ltd | Vacuum processing system |
JP2000150618A (ja) * | 1998-11-17 | 2000-05-30 | Tokyo Electron Ltd | 真空処理システム |
JP4256551B2 (ja) * | 1998-12-25 | 2009-04-22 | 東京エレクトロン株式会社 | 真空処理システム |
JP4312965B2 (ja) * | 1999-01-12 | 2009-08-12 | 東京エレクトロン株式会社 | 真空処理装置 |
US6318945B1 (en) | 1999-07-28 | 2001-11-20 | Brooks Automation, Inc. | Substrate processing apparatus with vertically stacked load lock and substrate transport robot |
JP2001135704A (ja) * | 1999-11-09 | 2001-05-18 | Sharp Corp | 基板処理装置及び基板搬送用トレイの搬送制御方法 |
US6977014B1 (en) * | 2000-06-02 | 2005-12-20 | Novellus Systems, Inc. | Architecture for high throughput semiconductor processing applications |
KR100364656B1 (ko) * | 2000-06-22 | 2002-12-16 | 삼성전자 주식회사 | 실리사이드 증착을 위한 화학 기상 증착 방법 및 이를수행하기 위한 장치 |
JP4576694B2 (ja) * | 2000-10-11 | 2010-11-10 | 東京エレクトロン株式会社 | 被処理体の処理システムの搬送位置合わせ方法及び被処理体の処理システム |
JP2002158272A (ja) * | 2000-11-17 | 2002-05-31 | Tatsumo Kk | ダブルアーム基板搬送装置 |
JP2002164402A (ja) * | 2000-11-24 | 2002-06-07 | Meidensha Corp | 基板搬送用ロボット |
US6918731B2 (en) * | 2001-07-02 | 2005-07-19 | Brooks Automation, Incorporated | Fast swap dual substrate transport for load lock |
US20030014155A1 (en) | 2001-07-12 | 2003-01-16 | Applied Material, Inc. | High temperature substrate transfer robot |
JP3962609B2 (ja) * | 2002-03-05 | 2007-08-22 | 東京エレクトロン株式会社 | 搬送装置 |
US6932871B2 (en) | 2002-04-16 | 2005-08-23 | Applied Materials, Inc. | Multi-station deposition apparatus and method |
KR100483428B1 (ko) * | 2003-01-24 | 2005-04-14 | 삼성전자주식회사 | 기판 가공 장치 |
EP1609174B1 (en) | 2003-03-31 | 2011-11-30 | Lam Research Corporation | Chamber and method for wafer processing |
US7458763B2 (en) * | 2003-11-10 | 2008-12-02 | Blueshift Technologies, Inc. | Mid-entry load lock for semiconductor handling system |
JP4673548B2 (ja) * | 2003-11-12 | 2011-04-20 | 東京エレクトロン株式会社 | 基板処理装置及びその制御方法 |
JP4356480B2 (ja) * | 2004-03-03 | 2009-11-04 | 株式会社安川電機 | 搬送装置と半導体製造装置 |
JP2005259858A (ja) * | 2004-03-10 | 2005-09-22 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP4524132B2 (ja) * | 2004-03-30 | 2010-08-11 | 東京エレクトロン株式会社 | 真空処理装置 |
US8292563B2 (en) * | 2004-06-28 | 2012-10-23 | Brooks Automation, Inc. | Nonproductive wafer buffer module for substrate processing apparatus |
US20060011297A1 (en) * | 2004-07-15 | 2006-01-19 | Jusung Engineering Co., Ltd. | Semiconductor manufacturing apparatus |
JP4860219B2 (ja) * | 2005-02-14 | 2012-01-25 | 東京エレクトロン株式会社 | 基板の処理方法、電子デバイスの製造方法及びプログラム |
US7472581B2 (en) * | 2005-03-16 | 2009-01-06 | Tokyo Electron Limited | Vacuum apparatus |
JP4566798B2 (ja) * | 2005-03-30 | 2010-10-20 | 東京エレクトロン株式会社 | 基板位置決め装置,基板位置決め方法,プログラム |
JP4595053B2 (ja) * | 2005-04-11 | 2010-12-08 | 日本電産サンキョー株式会社 | 多関節型ロボット |
US7286890B2 (en) * | 2005-06-28 | 2007-10-23 | Tokyo Electron Limited | Transfer apparatus for target object |
US9248568B2 (en) * | 2005-07-11 | 2016-02-02 | Brooks Automation, Inc. | Unequal link SCARA arm |
US8573919B2 (en) * | 2005-07-11 | 2013-11-05 | Brooks Automation, Inc. | Substrate transport apparatus |
JP4933789B2 (ja) * | 2006-02-13 | 2012-05-16 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
TWI476855B (zh) | 2006-05-03 | 2015-03-11 | Gen Co Ltd | 基板傳輸設備、和使用該設備的高速基板處理系統 |
US7738987B2 (en) * | 2006-11-28 | 2010-06-15 | Tokyo Electron Limited | Device and method for controlling substrate processing apparatus |
-
2008
- 2008-05-19 JP JP2010509494A patent/JP5543336B2/ja active Active
- 2008-05-19 US US12/123,329 patent/US8562271B2/en active Active
- 2008-05-19 KR KR1020097026390A patent/KR20100031681A/ko active Search and Examination
- 2008-05-19 WO PCT/US2008/064144 patent/WO2008144664A1/en active Application Filing
- 2008-05-19 KR KR1020167013801A patent/KR101887110B1/ko active IP Right Grant
- 2008-05-19 KR KR20157004933A patent/KR20150038360A/ko active Search and Examination
-
2013
- 2013-10-21 US US14/058,436 patent/US9401294B2/en active Active
-
2014
- 2014-02-10 JP JP2014023394A patent/JP6630031B2/ja active Active
-
2017
- 2017-02-17 JP JP2017027611A patent/JP6480488B2/ja active Active
-
2019
- 2019-09-19 JP JP2019170796A patent/JP6898403B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2020010059A (ja) | 2020-01-16 |
WO2008144664A1 (en) | 2008-11-27 |
JP2014123758A (ja) | 2014-07-03 |
KR101887110B1 (ko) | 2018-08-09 |
JP6630031B2 (ja) | 2020-01-15 |
US9401294B2 (en) | 2016-07-26 |
US8562271B2 (en) | 2013-10-22 |
KR20150038360A (ko) | 2015-04-08 |
JP2011504288A (ja) | 2011-02-03 |
JP5543336B2 (ja) | 2014-07-09 |
KR20100031681A (ko) | 2010-03-24 |
US20140044504A1 (en) | 2014-02-13 |
JP6898403B2 (ja) | 2021-07-07 |
US20090003976A1 (en) | 2009-01-01 |
JP2017143270A (ja) | 2017-08-17 |
KR20160066555A (ko) | 2016-06-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6480488B2 (ja) | 基板搬送方法 | |
JP6843493B2 (ja) | 基板処理装置 | |
JP6594304B2 (ja) | 処理装置 | |
US7458763B2 (en) | Mid-entry load lock for semiconductor handling system | |
JP2023033330A (ja) | 基板処理装置及び基板搬送装置 | |
US7959403B2 (en) | Linear semiconductor processing facilities | |
JP2023088966A (ja) | 機械的スイッチ機構を利用する複数の可動アームを有する基板搬送装置 | |
KR102430107B1 (ko) | 기판 이송 장치 | |
US20140294551A1 (en) | Substrate transport apparatus with multiple movable arms utilizing a mechanical switch mechanism | |
US20230271792A1 (en) | Substrate processing apparatus | |
TWI474418B (zh) | 基板運送裝置、基板運送系統及運送基板之方法 | |
TWI813479B (zh) | 基材運送方法及設備 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170217 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180110 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180116 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180314 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180713 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190108 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190207 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6480488 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |