JP2013542549A - コーナキューブによる照射制御 - Google Patents
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
- G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
- G02B5/124—Reflex reflectors cube corner, trihedral or triple reflector type plural reflecting elements forming part of a unitary plate or sheet
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C15/00—Details
- F24C15/22—Reflectors for radiation heaters
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C7/00—Stoves or ranges heated by electric energy
- F24C7/04—Stoves or ranges heated by electric energy with heat radiated directly from the heating element
- F24C7/046—Ranges
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/32—Casings
- F27B9/34—Arrangements of linings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D1/00—Casings; Linings; Walls; Roofs
- F27D1/0003—Linings or walls
- F27D1/0036—Linings or walls comprising means for supporting electric resistances in the furnace
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
- F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
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- Combustion & Propulsion (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electric Stoves And Ranges (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
- Radiation-Therapy Devices (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Control Of Resistance Heating (AREA)
- Optical Elements Other Than Lenses (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
【選択図】図7
Description
Claims (15)
- 目標物を照射処理または照射加工するためのシステムであって、
照射を発生させるように機能する照射源を備え、
該照射源は、目標物に向けて照射を方向づけるように構成されており、前記目標物は前記向けられた照射の一部を吸収し、
照射のために目標物が配置される照射ゾーンをさらに備え、該照射ゾーンは、少なくとも部分的に、近接コーナキューブ・リフレクタ部材により画成されており、前記コーナキューブ・リフレクタ部材は、コーナキューブ・リフレクタのアレイを有して、照射を反射することにより前記目標物に戻すように機能し、その照射は、前記目標物から反射されたか、前記目標物から後方散乱されたか、または前記目標物を通過したか、その少なくとも1つによるものである、システム。 - 当該システムは調理用オーブンであり、前記目標物は食品または有機物である、請求項1に記載のシステム。
- 当該システムは、ボトル成形システム内に組み込まれており、前記目標物はプラスチックボトルのプリフォームである、請求項1および2のいずれかに記載のシステム。
- 前記コーナキューブ・リフレクタ部材は、少なくとも1つのアパーチャを有し、これを通して、照射を、前記目標物に向けて前記コーナキューブ・リフレクタ部材を通して方向づけることができる、請求項1ないし3のいずれか1つに記載のシステム。
- 前記コーナキューブ・リフレクタ部材は、前記照射ゾーンのエンクロージャの一部を構成している、請求項1ないし4のいずれか1つに記載のシステム。
- 前記コーナキューブ・リフレクタ部材は、前記照射ゾーンの内面のほぼ全てを覆っているが、ただし、前記コーナキューブ・リフレクタ部材は、照射源を覆っていない、請求項1ないし5のいずれか1つに記載のシステム。
- 前記コーナキューブ・リフレクタ部材は、迷放射線を前記目標物に向け直すことが必要になる可能性のある領域の少なくとも一部に戦略的に位置付けられるように、配置されている、請求項1ないし6のいずれか1つに記載のシステム。
- 前記コーナキューブ・リフレクタ部材は、プリフォームの長軸を円周状に取り囲んでいるが、高速生産を図るため、プリフォームを前記照射室に出し入れするためのアクセスを確保している、請求項1ないし7のいずれか1つに記載のシステム。
- 前記アクセスは、前記照射室を通る線形または弓形のいずれかの移動パスを確保することを含む、請求項11に記載のシステム。
- 前記コーナキューブ部材は、前記プリフォームを取り囲んで、プリフォームが照射される時間の少なくとも一部の間の照射室を形成している、請求項1に記載のシステム。
- 前記コーナキューブ部材は、前面または後面の少なくとも一方にコーティングされており、波長の少なくとも85%を反射する、請求項1ないし10のいずれか1つに記載のシステム。
- 前記コーナキューブ・アレイの取り込み角は±45°である、請求項1ないし11のいずれか1つに記載のシステム。
- 目標物を照射処理または照射加工するための方法であって、
照射ゾーンにおいて、照射源を用いて、照射の少なくとも一部を吸収する目標物に照射することと、
前記目標物から反射されたか、前記目標物から散乱されたか、または前記目標物を透過したか、そのいずれかである照射を、前記照射ゾーンを少なくとも部分的に画成する近接コーナキューブ・アレイ・リフレクタ部材を用いて、前記目標物に戻すように反射することと、を含む方法。 - 前記照射は、前記目標物の加熱、乾燥、硬化、脱水のうち、少なくとも1つを目的とするものである、請求項20に記載の方法。
- 照射手筈は調理用オーブン内で実現されるものであって、前記目標物は食品または有機物であることと、
照射手筈はボトル成形システム内で実現されるものであって、前記目標物はプラスチックボトルのプリフォームであることと、
この2つのうちの少なくとも一方である、請求項13および14のいずれかに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33251210P | 2010-05-07 | 2010-05-07 | |
US61/332,512 | 2010-05-07 | ||
PCT/US2011/035569 WO2011140472A2 (en) | 2010-05-07 | 2011-05-06 | Corner-cube irradiation control |
Publications (1)
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JP2013542549A true JP2013542549A (ja) | 2013-11-21 |
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Application Number | Title | Priority Date | Filing Date |
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JP2013509299A Pending JP2013542549A (ja) | 2010-05-07 | 2011-05-06 | コーナキューブによる照射制御 |
Country Status (8)
Country | Link |
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US (2) | US11774648B2 (ja) |
EP (1) | EP2567393B1 (ja) |
JP (1) | JP2013542549A (ja) |
CN (1) | CN103430276B (ja) |
BR (1) | BR112012028574A2 (ja) |
CA (1) | CA2798454A1 (ja) |
RU (1) | RU2012151908A (ja) |
WO (1) | WO2011140472A2 (ja) |
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JP2013542549A (ja) * | 2010-05-07 | 2013-11-21 | プレスコ アイピー エルエルシー | コーナキューブによる照射制御 |
US8929724B1 (en) * | 2011-02-07 | 2015-01-06 | J.C. Penney Purchasing Corporation, Inc. | High efficiency oven and method of use |
GB201114048D0 (en) * | 2011-08-16 | 2011-09-28 | Intrinsiq Materials Ltd | Curing system |
FR2982790B1 (fr) * | 2011-11-21 | 2014-03-14 | Sidel Participations | Unite de traitement thermique d'ebauches de recipients a double paroi rayonnante en quinconce |
US9271338B2 (en) | 2012-03-14 | 2016-02-23 | Microwave Materials Technologies, Inc. | Pressurized heating system with enhanced pressure locks |
US9320201B2 (en) * | 2013-12-20 | 2016-04-26 | Elwha Llc | Reflective articles and methods for increasing photosynthesis |
FR3018724B1 (fr) * | 2014-03-19 | 2016-12-09 | Sidel Participations | Unite de traitement d'ebauches equipee d'une section de confinement optique a parois convergentes |
DE102015224800A1 (de) * | 2015-12-10 | 2017-06-14 | BSH Hausgeräte GmbH | Muffel und Haushaltsgargerät |
ES2934983T3 (es) | 2016-03-22 | 2023-02-28 | Nkb Properties Man Llc | Sistema y procedimiento de almacenamiento de datos en movimiento |
US11032879B2 (en) | 2017-03-15 | 2021-06-08 | 915 Labs, Inc. | Energy control elements for improved microwave heating of packaged articles |
JP2020511755A (ja) | 2017-03-15 | 2020-04-16 | 915 ラボ、エルエルシー | マルチパスマイクロ波加熱システム |
JP7418212B2 (ja) | 2017-04-17 | 2024-01-19 | 915 ラボ、エルエルシー | 相乗的パッケージング、キャリアおよび放射部構成を使用したマイクロ波支援滅菌および低温殺菌システム |
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CA3095203C (en) | 2018-08-10 | 2022-04-12 | Lyteloop Technologies, Llc | System and method for extending path length of a wave signal using angle multiplexing |
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Also Published As
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WO2011140472A2 (en) | 2011-11-10 |
US20240027662A1 (en) | 2024-01-25 |
RU2012151908A (ru) | 2014-06-20 |
EP2567393A2 (en) | 2013-03-13 |
CA2798454A1 (en) | 2011-11-10 |
CN103430276B (zh) | 2017-03-29 |
US11774648B2 (en) | 2023-10-03 |
EP2567393A4 (en) | 2015-03-25 |
EP2567393B1 (en) | 2018-02-14 |
WO2011140472A3 (en) | 2014-03-20 |
US20120063752A1 (en) | 2012-03-15 |
CN103430276A (zh) | 2013-12-04 |
BR112012028574A2 (pt) | 2019-09-24 |
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