JP2012102249A - Rubber composition and pneumatic tire using the same - Google Patents
Rubber composition and pneumatic tire using the same Download PDFInfo
- Publication number
- JP2012102249A JP2012102249A JP2010252338A JP2010252338A JP2012102249A JP 2012102249 A JP2012102249 A JP 2012102249A JP 2010252338 A JP2010252338 A JP 2010252338A JP 2010252338 A JP2010252338 A JP 2010252338A JP 2012102249 A JP2012102249 A JP 2012102249A
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- silicic acid
- integer
- rubber composition
- carbon atoms
- Prior art date
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- Granted
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- 229920001971 elastomer Polymers 0.000 title claims abstract description 78
- 239000005060 rubber Substances 0.000 title claims abstract description 78
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 74
- 239000011148 porous material Substances 0.000 claims abstract description 72
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 72
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims abstract description 33
- 238000001179 sorption measurement Methods 0.000 claims abstract description 13
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 72
- 229910052753 mercury Inorganic materials 0.000 claims description 72
- 125000004432 carbon atom Chemical group C* 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- -1 glycidoxy group Chemical group 0.000 claims description 19
- 125000002947 alkylene group Chemical group 0.000 claims description 15
- 239000006229 carbon black Substances 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 12
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 7
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 6
- 150000001993 dienes Chemical class 0.000 claims description 6
- 229920003051 synthetic elastomer Polymers 0.000 claims description 6
- 239000005061 synthetic rubber Substances 0.000 claims description 6
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 244000043261 Hevea brasiliensis Species 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000004450 alkenylene group Chemical group 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 229920003052 natural elastomer Polymers 0.000 claims description 4
- 229920001194 natural rubber Polymers 0.000 claims description 4
- 125000000732 arylene group Chemical group 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 claims description 2
- 238000013329 compounding Methods 0.000 claims description 2
- 238000009826 distribution Methods 0.000 claims description 2
- 125000003700 epoxy group Chemical group 0.000 claims description 2
- 238000005096 rolling process Methods 0.000 abstract description 24
- 239000000243 solution Substances 0.000 description 49
- 238000006243 chemical reaction Methods 0.000 description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 24
- 239000002245 particle Substances 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 22
- 239000011734 sodium Substances 0.000 description 20
- 150000003961 organosilicon compounds Chemical class 0.000 description 14
- 239000000377 silicon dioxide Substances 0.000 description 13
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 239000004115 Sodium Silicate Substances 0.000 description 12
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 12
- 229910052911 sodium silicate Inorganic materials 0.000 description 12
- 239000011256 inorganic filler Substances 0.000 description 10
- 229910003475 inorganic filler Inorganic materials 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 239000002002 slurry Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- 125000004122 cyclic group Chemical group 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 238000006386 neutralization reaction Methods 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 230000001747 exhibiting effect Effects 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 4
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 229920003048 styrene butadiene rubber Polymers 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 4
- 239000012855 volatile organic compound Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 239000011164 primary particle Substances 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000012763 reinforcing filler Substances 0.000 description 3
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- ZZMVLMVFYMGSMY-UHFFFAOYSA-N 4-n-(4-methylpentan-2-yl)-1-n-phenylbenzene-1,4-diamine Chemical compound C1=CC(NC(C)CC(C)C)=CC=C1NC1=CC=CC=C1 ZZMVLMVFYMGSMY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- AFZSMODLJJCVPP-UHFFFAOYSA-N dibenzothiazol-2-yl disulfide Chemical compound C1=CC=C2SC(SSC=3SC4=CC=CC=C4N=3)=NC2=C1 AFZSMODLJJCVPP-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001841 imino group Chemical group [H]N=* 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000013500 performance material Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 125000005624 silicic acid group Chemical class 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000012086 standard solution Substances 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 150000007970 thio esters Chemical group 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- BGPJLYIFDLICMR-UHFFFAOYSA-N 1,4,2,3-dioxadithiolan-5-one Chemical group O=C1OSSO1 BGPJLYIFDLICMR-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- HFGLXKZGFFRQAR-UHFFFAOYSA-N 3-(1,3-benzothiazol-2-yltetrasulfanyl)propyl-trimethoxysilane Chemical compound C1=CC=C2SC(SSSSCCC[Si](OC)(OC)OC)=NC2=C1 HFGLXKZGFFRQAR-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- YKBYBYAFEAREKR-UHFFFAOYSA-N 4-(3-dimethoxysilylbutyltetrasulfanyl)butan-2-yl-dimethoxysilane Chemical compound CO[SiH](OC)C(C)CCSSSSCCC(C)[SiH](OC)OC YKBYBYAFEAREKR-UHFFFAOYSA-N 0.000 description 1
- 229920001393 Crofelemer Polymers 0.000 description 1
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 description 1
- NVNLLIYOARQCIX-MSHCCFNRSA-N Nisin Chemical compound N1C(=O)[C@@H](CC(C)C)NC(=O)C(=C)NC(=O)[C@@H]([C@H](C)CC)NC(=O)[C@@H](NC(=O)C(=C/C)/NC(=O)[C@H](N)[C@H](C)CC)CSC[C@@H]1C(=O)N[C@@H]1C(=O)N2CCC[C@@H]2C(=O)NCC(=O)N[C@@H](C(=O)N[C@H](CCCCN)C(=O)N[C@@H]2C(NCC(=O)N[C@H](C)C(=O)N[C@H](CC(C)C)C(=O)N[C@H](CCSC)C(=O)NCC(=O)N[C@H](CS[C@@H]2C)C(=O)N[C@H](CC(N)=O)C(=O)N[C@H](CCSC)C(=O)N[C@H](CCCCN)C(=O)N[C@@H]2C(N[C@H](C)C(=O)N[C@@H]3C(=O)N[C@@H](C(N[C@H](CC=4NC=NC=4)C(=O)N[C@H](CS[C@@H]3C)C(=O)N[C@H](CO)C(=O)N[C@H]([C@H](C)CC)C(=O)N[C@H](CC=3NC=NC=3)C(=O)N[C@H](C(C)C)C(=O)NC(=C)C(=O)N[C@H](CCCCN)C(O)=O)=O)CS[C@@H]2C)=O)=O)CS[C@@H]1C NVNLLIYOARQCIX-MSHCCFNRSA-N 0.000 description 1
- 108010053775 Nisin Proteins 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- 150000004252 dithioacetals Chemical group 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 239000004309 nisin Substances 0.000 description 1
- 235000010297 nisin Nutrition 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 125000006410 propenylene group Chemical group 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- JPPLPDOXWBVPCW-UHFFFAOYSA-N s-(3-triethoxysilylpropyl) octanethioate Chemical compound CCCCCCCC(=O)SCCC[Si](OCC)(OCC)OCC JPPLPDOXWBVPCW-UHFFFAOYSA-N 0.000 description 1
- HBACTRZJLWXFBM-UHFFFAOYSA-N s-[[methyl(4-trimethoxysilylbutyl)carbamoyl]trisulfanyl] n-methyl-n-(4-trimethoxysilylbutyl)carbamothioate Chemical compound CO[Si](OC)(OC)CCCCN(C)C(=O)SSSSC(=O)N(C)CCCC[Si](OC)(OC)OC HBACTRZJLWXFBM-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- WPPOOQHRMXWIDW-UHFFFAOYSA-N thiirane-2,3-dione Chemical group O=C1SC1=O WPPOOQHRMXWIDW-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 125000005628 tolylene group Chemical group 0.000 description 1
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 description 1
- KLFNHRIZTXWZHT-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltrisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSCCC[Si](OCC)(OCC)OCC KLFNHRIZTXWZHT-UHFFFAOYSA-N 0.000 description 1
- NQRACKNXKKOCJY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSCCC[Si](OC)(OC)OC NQRACKNXKKOCJY-UHFFFAOYSA-N 0.000 description 1
- JTTSZDBCLAKKAY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CCCSSSSCCC[Si](OC)(OC)OC JTTSZDBCLAKKAY-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/80—Technologies aiming to reduce greenhouse gasses emissions common to all road transportation technologies
- Y02T10/86—Optimisation of rolling resistance, e.g. weight reduction
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- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、タイヤ用部材に適用した際、転がり抵抗と耐摩耗性との両立を充分に図ることのできるゴム組成物及びそれを用いた空気入りタイヤに関する。 The present invention relates to a rubber composition capable of sufficiently achieving both rolling resistance and wear resistance when applied to a tire member, and a pneumatic tire using the rubber composition.
一般に、空気入りタイヤは、複数の性能を同時に満たし得る高い性能を有することが要求される。なかでも、トレッドのようなタイヤ用部材には、タイヤの転がり抵抗と耐摩耗性を両立することが強く望まれるが、これらは二律背反の関係にあるため、従来より多くの試行錯誤が行われている。 Generally, a pneumatic tire is required to have high performance that can satisfy a plurality of performances simultaneously. In particular, tire members such as treads are strongly desired to have both tire rolling resistance and wear resistance. However, since these are in a trade-off relationship, more trial and error have been performed than before. Yes.
タイヤのトレッドに適用するゴム組成物においては、補強用充填剤の一つとして含水ケイ酸が用いられているが、一般に補強用充填剤の配合量を増加させると、タイヤの耐摩耗性はある程度向上できるものの転がり抵抗は低下するおそれがあり、また場合によっては、未加硫ゴムの粘度が必要以上に上昇して加工性が悪化するおそれもある。 In rubber compositions applied to tire treads, hydrous silicic acid is used as one of the reinforcing fillers. Generally, when the compounding amount of the reinforcing filler is increased, the wear resistance of the tires is to some extent. Although it can be improved, the rolling resistance may decrease, and in some cases, the viscosity of the unvulcanized rubber may increase more than necessary, and the processability may deteriorate.
こうしたなか、一次粒子を大粒径化した含水ケイ酸を使用することによって、ゴム成分への含水ケイ酸粒子の分散性を向上させ、タイヤにおける転がり抵抗の向上を図る技術が開発されている。その一方で、例えば特許文献1には、一次粒子を大粒径化した含水ケイ酸の使用が貯蔵弾性率の低下を引き起こし得る点に着目し、良好な分散性を保持しつつ、貯蔵弾性率と低発熱性との改善を図るべく、凝集力等が制御された含水ケイ酸を使用する技術も開示されている。 Under such circumstances, a technique has been developed that improves the dispersibility of the hydrous silicic acid particles in the rubber component and improves the rolling resistance of the tire by using hydrous silicic acid in which the primary particles are enlarged. On the other hand, Patent Document 1, for example, pays attention to the fact that the use of hydrous silicic acid with primary particles having a large particle size can cause a decrease in storage elastic modulus, while maintaining good dispersibility, and storage elastic modulus. In order to improve the low heat build-up, a technique using hydrous silicic acid with controlled cohesive force is also disclosed.
しかしながら、一次粒子を大粒径化した含水ケイ酸を使用した場合、タイヤの転がり抵抗の向上はある程度図れるものの、上述のように貯蔵弾性率が低下するおそれがあるばかりか、タイヤの耐摩耗性が低下するおそれもある。また、かかる含水ケイ酸の代わりに上述のような凝集力等が制御された含水ケイ酸を使用した場合であっても、タイヤの転がり抵抗と耐摩耗性との両立を図るという観点からすれば、依然として改善の余地がある。 However, when using hydrous silicic acid with larger primary particles, although the rolling resistance of the tire can be improved to some extent, not only the storage elastic modulus may be lowered as described above, but also the wear resistance of the tire. May decrease. Moreover, even if it is a case where the hydrous silicic acid whose cohesion force etc. were controlled instead of this hydrous silicic acid is used from a viewpoint of aiming at coexistence with the rolling resistance and abrasion resistance of a tire. There is still room for improvement.
一方、含水ケイ酸の粒子は、一般にその外表面に開口部を具えた多数の細孔を有しており、かかる細孔はゴム分子鎖の吸着に関与するが、細孔の形状も密接に関係して転がり抵抗や耐摩耗性の向上に寄与するものと推定されるため、こうした含水ケイ酸の細孔の形状に関する規定も望まれる。 On the other hand, hydrous silicic acid particles generally have a large number of pores with openings on the outer surface, and these pores are involved in the adsorption of rubber molecular chains. Since it is presumed that it contributes to the improvement of rolling resistance and wear resistance, it is also desirable to define the pore shape of such hydrous silicic acid.
そこで、本発明は、トレッドのようなタイヤ用部材に適用した際、転がり抵抗と耐摩耗性との両立を充分に図ることのできるゴム組成物を提供することを目的とする。 Then, an object of this invention is to provide the rubber composition which can fully aim at coexistence with rolling resistance and abrasion resistance, when it applies to the member for tires like a tread.
本発明者は、上記課題を解決すべく、粒子の外表面に開口部を具えた細孔の形状にも関与する特定の物性を有する含水ケイ酸を配合したゴム組成物を見出し、本発明を完成させるに至った。 In order to solve the above-mentioned problems, the present inventor has found a rubber composition containing a hydrous silicic acid having specific physical properties that are also involved in the shape of pores having openings on the outer surface of the particles. It came to complete.
すなわち、本発明のゴム組成物は、インクボトル状細孔指数(IB)が、
直径1.2×105nm〜6nmの範囲にある開口部を外表面に具えた細孔を有する含水ケイ酸に対し、水銀圧入法に基づく水銀ポロシメータを用いた測定において、圧力を1〜32000PSIまで上昇させた際に水銀圧入量の最大値を示す開口部の直径(M1)(nm)、及び圧力を32000PSI〜1PSIまで下降させた際に水銀排出量の最大値を示す開口部の直径(M2)(nm)により、下記式(X);
IB=M2−M1・・・(X)
で求められる値であって、
セチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)(m2/g)及び前記インクボトル状細孔指数(IB)が、下記式(I);
IB≦−0.36×CTAB+86.8 ・・・(I)
を満たす含水ケイ酸を、ゴム成分に配合してなることを特徴とする。
That is, the rubber composition of the present invention has an ink bottle-like pore index (IB) of
In a measurement using a mercury porosimeter based on the mercury intrusion method for hydrous silicic acid having pores having an opening on the outer surface having a diameter in the range of 1.2 × 10 5 nm to 6 nm, the pressure is 1 to 32,000 PSI. The diameter (M1) (nm) of the opening showing the maximum value of the mercury intrusion when the pressure is raised to 32,000 PSI and the diameter of the opening showing the maximum value of the mercury discharge when the pressure is lowered to 32000 PSI to 1 PSI ( M2) (nm), the following formula (X);
IB = M2-M1 (X)
Which is the value found in
Cetyltrimethylammonium bromide adsorption specific surface area (CTAB) (m 2 / g) and the ink bottle-like pore index (IB) are represented by the following formula (I):
IB ≦ −0.36 × CTAB + 86.8 (I)
Hydrous silicic acid satisfying the above is blended with the rubber component.
前記含水ケイ酸のセチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)は、50〜250m2/gであるのが望ましい。
また、前記ゴム成分が天然ゴム及び/又はジエン系合成ゴムからなり、かつ
前記ゴム成分100質量部に対し、前記含水ケイ酸を10〜150質量部の量で配合してなるものであってもよい。
前記含水ケイ酸100質量部に対し、さらにシランカップリング剤を1〜20質量部の量で配合してなるものであってもよい。
The hydrated silicic acid preferably has a cetyltrimethylammonium bromide adsorption specific surface area (CTAB) of 50 to 250 m 2 / g.
The rubber component may be a natural rubber and / or a diene synthetic rubber, and the hydrous silicic acid may be blended in an amount of 10 to 150 parts by mass with respect to 100 parts by mass of the rubber component. Good.
A silane coupling agent may be further blended in an amount of 1 to 20 parts by mass with respect to 100 parts by mass of the hydrous silicic acid.
また、前記シランカップリング剤は、下記式(IV);
AmB3−mSi−(CH2)a−Sb−(CH2)a−SiAmB3−m・・・(IV)
[式(IV)中、AはCnH2n+1O(nは1〜3の整数)又は塩素原子であり、Bは炭素数1〜3のアルキル基であり、mは1〜3の整数、aは1〜9の整数、bは1以上の整数である。但し、mが1の時、Bは互いに同一であっても異なっていてもよく、mが2又は3の時、Aは互いに同一であっても異なっていてもよい。]で表される化合物、下記式(V);
AmB3−mSi−(CH2)c−Y・・・(V)
[式(V)中、AはCnH2n+1O(nは1〜3の整数)又は塩素原子であり、Bは炭素数1〜3のアルキル基であり、Yはメルカプト基、ビニル基、アミノ基、グリシドキシ基又はエポキシ基であり、mは1〜3の整数、cは0〜9の整数である。但し、mが1の時、Bは互いに同一であっても異なっていてもよく、mが2又は3の時、Aは互いに同一であっても異なっていてもよい。]で表される化合物、下記式(VI);
AmB3−mSi−(CH2)a−Sb−Z・・・(VI)
[式(VI)中、AはCnH2n+1O(nは1〜3の整数)又は塩素原子であり、Bは炭素数1〜3のアルキル基であり、Zはベンゾチアゾリル基、N,N−ジメチルチオカルバモイル基又はメタクリロイル基であり、mは1〜3の整数、aは1〜9の整数、bは1以上の整数で分布を有していてもよい。但し、mが1の時、Bは互いに同一であっても異なっていてもよく、mが2又は3の時、Aは互いに同一であっても異なっていてもよい。]で表される化合物及び下記式(VII);
R1 xR2 yR3 zSi−R4−S−CO−R5・・・(VII)
[式(VII)中、R1は、R6O−、R6C(=O)O−、R6R7C=NO−、R6R7NO−、R6R7N−及び−(OSiR6R7)n(OSiR5R6R7)から選択され、かつ炭素数が1〜18であり(但し、R6及びR7は、それぞれ独立してアルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基及びアリール基から選択され、かつ炭素数が1〜18であり、nは0〜10である);
R2は、水素、又は炭素数1〜18のアルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基及びアリール基から選択され;
R3は、−[O(R8O)m]0.5−(但し、R8は、アルキレン基及びシクロアルキレン基から選択され、かつ炭素数が1〜18であり、mは1〜4である)であり;
x、y及びzは、x+y+2z=3、0≦x≦3、0≦y≦2、0≦z≦1の関係を満たし;
R4は、アルキレン基、シクロアルキレン基、シクロアルキルアルキレン基、アルケニレン基、アリーレン基及びアラルキレン基から選択され、かつ炭素数が1〜18であり;
R5は、アルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基、アリール基及びアラルキル基から選択され、かつ炭素数が1〜18である。]で表される化合物からなる群より選ばれる少なくとも1種であるのが望ましい。
The silane coupling agent has the following formula (IV):
A m B 3-m Si- ( CH 2) a -S b - (CH 2) a -SiA m B 3-m ··· (IV)
Wherein (IV), A is C n H 2n + 1 O ( n is an integer of 1 to 3) or a chlorine atom, B is an alkyl group having 1 to 3 carbon atoms, m is an integer of 1 to 3, a is an integer of 1 to 9, and b is an integer of 1 or more. However, when m is 1, B may be the same or different from each other, and when m is 2 or 3, A may be the same or different from each other. A compound represented by the following formula (V);
A m B 3-m Si— (CH 2 ) c —Y (V)
Wherein (V), A is C n H 2n + 1 O ( n is an integer of 1 to 3) or a chlorine atom, B is an alkyl group having 1 to 3 carbon atoms, Y is a mercapto group, a vinyl group, It is an amino group, a glycidoxy group or an epoxy group, m is an integer of 1 to 3, and c is an integer of 0 to 9. However, when m is 1, B may be the same or different from each other, and when m is 2 or 3, A may be the same or different from each other. A compound represented by the following formula (VI);
A m B 3-m Si- ( CH 2) a -S b -Z ··· (VI)
Wherein (VI), A is C n H 2n + 1 O ( n is an integer of 1 to 3) or a chlorine atom, B is an alkyl group having 1 to 3 carbon atoms, Z is a benzothiazolyl group, N, N -A dimethylthiocarbamoyl group or a methacryloyl group, m is an integer of 1 to 3, a is an integer of 1 to 9, and b is an integer of 1 or more and may have a distribution. However, when m is 1, B may be the same or different from each other, and when m is 2 or 3, A may be the same or different from each other. And a compound represented by the following formula (VII):
R 1 x R 2 y R 3 z Si-R 4 -S-CO-R 5 ··· (VII)
[In the formula (VII), R 1 represents R 6 O—, R 6 C (═O) O—, R 6 R 7 C═NO—, R 6 R 7 NO—, R 6 R 7 N— and — (OSiR 6 R 7 ) n (OSiR 5 R 6 R 7 ) and having 1 to 18 carbon atoms (provided that R 6 and R 7 are each independently an alkyl group, a cycloalkyl group, an alkenyl group) Selected from a group, a cycloalkenyl group and an aryl group, and having 1 to 18 carbon atoms and n being 0 to 10);
R 2 is selected from hydrogen or an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group, an alkenyl group, a cycloalkenyl group and an aryl group;
R 3 is — [O (R 8 O) m ] 0.5 — (where R 8 is selected from an alkylene group and a cycloalkylene group, has 1 to 18 carbon atoms, and m is 1 to 4). );
x, y and z satisfy the relationship x + y + 2z = 3, 0 ≦ x ≦ 3, 0 ≦ y ≦ 2, 0 ≦ z ≦ 1;
R 4 is selected from an alkylene group, a cycloalkylene group, a cycloalkylalkylene group, an alkenylene group, an arylene group, and an aralkylene group, and has 1 to 18 carbon atoms;
R 5 is selected from an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an aryl group, and an aralkyl group, and has 1 to 18 carbon atoms. It is desirable that it is at least one selected from the group consisting of compounds represented by the formula:
前記ゴム100質量部に対し、さらにカーボンブラックを80質量部以下の量で配合してなり、かつ前記含水ケイ酸と前記カーボンブラックとの総配合量が120質量部以下であってもよい。
本発明の空気入りタイヤは、上記ゴム組成物を、タイヤ用部材に適用したことを特徴とする。
Carbon black may be further blended in an amount of 80 parts by mass or less with respect to 100 parts by mass of the rubber, and the total amount of the hydrous silicic acid and the carbon black may be 120 parts by mass or less.
The pneumatic tire of the present invention is characterized in that the rubber composition is applied to a tire member.
本発明のゴム組成物によれば、粒子の外表面に開口部を具えた細孔の形状にも関与する特定の物性を有する含水ケイ酸が配合されてなるため、タイヤに用いた際に優れた転がり抵抗と耐摩耗性とを兼ね備えることができる。したがって、かかるゴム組成物をタイヤ用部材として用いることにより、高性能な空気入りタイヤを実現することが可能となる。 According to the rubber composition of the present invention, hydrous silicic acid having specific physical properties related to the shape of pores having openings on the outer surface of the particles is blended, so that it is excellent when used in a tire. It can have both rolling resistance and wear resistance. Therefore, a high-performance pneumatic tire can be realized by using such a rubber composition as a tire member.
以下、本発明について、必要に応じて図面を参照しつつ具体的に説明する。
本発明のゴム組成物は、インクボトル状細孔指数(IB)が、
直径1.2×105nm〜6nmの範囲にある開口部を外表面に具えた細孔を有する含水ケイ酸に対し、水銀圧入法に基づく水銀ポロシメータを用いた測定において、圧力を1〜32000PSIまで上昇させた際に水銀圧入量の最大値を示す開口部の直径(M1)(nm)、及び圧力を32000PSI〜1PSIまで下降させた際に水銀排出量の最大値を示す開口部の直径(M2)(nm)により、下記式(X);
IB=M2−M1・・・(X)
で求められる値であって、
セチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)(m2/g)及び前記インクボトル状細孔指数(IB)が、下記式(I);
IB≦−0.36×CTAB+86.8 ・・・(I)
を満たす含水ケイ酸を、ゴム成分に配合してなることを特徴とする。
Hereinafter, the present invention will be specifically described with reference to the drawings as necessary.
The rubber composition of the present invention has an ink bottle-like pore index (IB) of
In a measurement using a mercury porosimeter based on the mercury intrusion method for hydrous silicic acid having pores having an opening on the outer surface having a diameter in the range of 1.2 × 10 5 nm to 6 nm, the pressure is 1 to 32,000 PSI. The diameter (M1) (nm) of the opening showing the maximum value of the mercury intrusion when the pressure is raised to 32,000 PSI and the diameter of the opening showing the maximum value of the mercury discharge when the pressure is lowered to 32000 PSI to 1 PSI ( M2) (nm), the following formula (X);
IB = M2-M1 (X)
Which is the value found in
Cetyltrimethylammonium bromide adsorption specific surface area (CTAB) (m 2 / g) and the ink bottle-like pore index (IB) are represented by the following formula (I):
IB ≦ −0.36 × CTAB + 86.8 (I)
Hydrous silicic acid satisfying the above is blended with the rubber component.
本発明のゴム組成物のゴム成分としては、天然ゴム又はジエン系合成ゴムを単独で、或いは天然ゴムとジエン系合成ゴムを併用して用いることができる。かかるジエン系合成ゴムとしては、ポリイソプレンゴム(IR)、スチレン・ブタジエン共重合体ゴム(SBR)、ポリブタジエンゴム(BR)等が挙げられる。なかでも、スチレン・ブタジエン共重合体ゴム(SBR)が好ましい。なお、これらジエン系合成ゴムは、1種単独で用いてもよいし、2種以上のブレンドとして用いてもよい。 As the rubber component of the rubber composition of the present invention, natural rubber or diene synthetic rubber can be used alone, or natural rubber and diene synthetic rubber can be used in combination. Examples of the diene synthetic rubber include polyisoprene rubber (IR), styrene / butadiene copolymer rubber (SBR), and polybutadiene rubber (BR). Of these, styrene / butadiene copolymer rubber (SBR) is preferable. These diene synthetic rubbers may be used alone or in a blend of two or more.
本発明のゴム組成物は、上記ゴム成分に対し、セチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)(m2/g)及び水銀ポロシメータによって求められるインクボトル状細孔指数(IB)が、下記式(I);
IB≦−0.36×CTAB+86.8 ・・・(I)
を満たす含水ケイ酸を配合してなる。
In the rubber composition of the present invention, an ink bottle-like pore index (IB) determined by a cetyltrimethylammonium bromide adsorption specific surface area (CTAB) (m 2 / g) and a mercury porosimeter with respect to the rubber component is represented by the following formula ( I);
IB ≦ −0.36 × CTAB + 86.8 (I)
It contains hydrous silicic acid that satisfies
ここで、セチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)(m2/g)とは、ASTM D3765−92に準拠して測定された値を意味する。ただし、ASTM D3765−92はカーボンブラックのCTABを測定する方法であるため、本明細書では、標準品であるIRB#3(83.0m2/g)の代わりに、別途セチルトリメチルアンモニウムブロミド(以下、CE−TRABと略記する)標準液を調製し、これによって含水ケイ酸OT(ジ−2−エチルヘキシルスルホコハク酸ナトリウム)溶液の標定を行い、上記含水ケイ酸表面に対するCE−TRAB1分子当たりの吸着断面積を0.35nm2として、CE−TRABの吸着量から算出される比表面積(m2/g)をCTABの値とする。これは、カーボンブラックと含水ケイ酸とでは表面が異なるので、同一表面積でもCE−TRABの吸着量に違いがあると考えられるためである。 Here, the cetyltrimethylammonium bromide adsorption specific surface area (CTAB) (m 2 / g) means a value measured according to ASTM D3765-92. However, since ASTM D3765-92 is a method for measuring CTAB of carbon black, in this specification, cetyltrimethylammonium bromide (hereinafter referred to as the following) is used instead of IRB # 3 (83.0 m2 / g) which is a standard product. A standard solution (abbreviated as CE-TRAB) is prepared, and the aqueous silicate OT (sodium di-2-ethylhexylsulfosuccinate) solution is standardized, and the adsorption cross-sectional area per CE-TRAB molecule on the hydrated silicate surface. Is 0.35 nm 2 and the specific surface area (m 2 / g) calculated from the adsorption amount of CE-TRAB is taken as the value of CTAB. This is because carbon black and hydrous silicic acid have different surfaces, and it is considered that there is a difference in the amount of CE-TRAB adsorbed even with the same surface area.
また、インクボトル状細孔指数(IB)とは、直径1.2×105nm〜6nmの範囲にある開口部を外表面に具えた細孔を有する含水ケイ酸に対し、水銀圧入法に基づく水銀ポロシメータを用いた測定において、圧力を1〜32000PSIまで上昇させた際における水銀圧入量の最大値を示す開口部の直径(M1)(nm)、及び圧力を32000PSI〜1PSIまで下降させた際における水銀排出量の最大値を示す開口部の直径(M2)(nm)により、下記式(X);
IB=M2−M1・・・(X)
で求められる値を意味する。水銀圧入法に基づく水銀ポロシメータを用いた測定は、従来より細孔の形態を評価するのに多く採用される電子顕微鏡を用いた測定よりも簡便であり、かつ定量性に優れるので有用な方法である。
The ink bottle-like pore index (IB) is a mercury intrusion method for hydrous silicic acid having pores having an opening on the outer surface with a diameter in the range of 1.2 × 10 5 nm to 6 nm. In the measurement using the mercury porosimeter based on the above, the diameter (M1) (nm) of the opening showing the maximum value of the mercury intrusion when the pressure is raised to 1 to 32,000 PSI, and the pressure is lowered to 32000 PSI to 1 PSI From the diameter (M2) (nm) of the opening showing the maximum value of mercury emission in the following formula (X);
IB = M2-M1 (X)
Means the value obtained by. Measurement using a mercury porosimeter based on the mercury intrusion method is simpler than the measurement using an electron microscope, which has been widely used to evaluate pore morphology, and is a useful method because it has superior quantitativeness. is there.
一般に、含水ケイ酸の粒子は、その外表面に開口部を具えた凹状を呈した細孔を多数有している。図1に、含水ケイ酸の粒子における内心方向断面でのこれら細孔の形状を模した概略図を示す。粒子における内心方向断面でかかる凹状を呈した細孔は、様々な形状を呈しており、粒子の外表面における開口部の直径Maと粒子内部における細孔径(内径)Raとが略同一の形状、すなわち粒子の内心方向断面において略円筒状を呈する細孔Aもあれば、粒子内部における細孔径(内径)Rbよりも粒子の外表面における開口部の直径Mbの方が狭小である形状、すなわち粒子の内心方向断面においてインクボトル状を呈する細孔Bもある。しかしながら、粒子の内心方向断面においてインクボトル状を呈する細孔Bであると、粒子の外表面から内部へとゴム分子鎖が侵入しにくいため、含水ケイ酸をゴム成分に配合した際にゴム分子鎖を充分に吸着させることができず、転がり抵抗性が低下するおそれがあるとともに補強性が不充分となって耐摩耗性の向上を図るのが困難となるおそれがある。したがって、かかるインクボトル状を呈する細孔B数を低減し、粒子の内心方向断面において略円筒状を呈する細孔A数を増大させれば、ゴム分子鎖の侵入を効率的に促進することができ、転がり抵抗性を低下させることなく、充分な補強性を発揮して耐摩耗性の向上に寄与することが可能となる。 Generally, hydrous silicic acid particles have a large number of concave pores having openings on the outer surface thereof. FIG. 1 is a schematic view simulating the shape of these pores in the cross section in the inner center direction of the hydrous silicic acid particles. Pores exhibited a concave according nisin cross section in the particle are exhibited various shapes, and the pore diameter (inner diameter) R a in the inner diameter M a and particles of the opening in the outer surface of the particles of substantially the same If there is a pore A having a shape, that is, a substantially cylindrical shape in a cross section in the inner center direction of the particle, the diameter M b of the opening on the outer surface of the particle is narrower than the pore diameter (inner diameter) R b inside the particle. There are also pores B that have a shape, that is, an ink bottle shape in the cross section in the inner center direction of the particles. However, if the pore B is in the shape of an ink bottle in the cross section in the inner-center direction of the particle, the rubber molecule chain is less likely to enter from the outer surface of the particle to the inside. The chains cannot be sufficiently adsorbed, rolling resistance may be lowered, and reinforcing properties may be insufficient, and it may be difficult to improve wear resistance. Therefore, if the number of pores B exhibiting such an ink bottle shape is reduced and the number of pores A exhibiting a substantially cylindrical shape in the cross section in the inner center direction of the particle is increased, the penetration of rubber molecular chains can be efficiently promoted. It is possible to contribute to the improvement of the wear resistance by exhibiting sufficient reinforcement without reducing the rolling resistance.
上記観点から、本発明では、ゴム成分に配合する含水ケイ酸に関し、粒子の内心方向断面においてインクボトル状を呈する細孔B数を低減すべく、上記インクボトル状細孔指数(IB)を規定する。上述のように、水銀圧入法に基づく水銀ポロシメータを用いた測定において圧力を上昇させた際、略円筒状を呈する細孔Aは外表面の開口部が開放的であるために細孔内部に水銀が圧入されやすいが、インクボトル状を呈する細孔Bは外表面の開口部が閉鎖的であるために細孔内部に水銀が圧入されにくい。一方、圧力を下降させた際には、同様の理由により、略円筒状を呈する細孔Aは細孔内部から細孔外部へ水銀が排出されやすいが、インクボトル状を呈する細孔Bは細孔内部から細孔外部へ水銀がほとんど排出されない。 From the above viewpoint, in the present invention, the water-containing silicic acid to be blended with the rubber component defines the ink bottle-shaped pore index (IB) in order to reduce the number of pores B exhibiting an ink bottle shape in the cross section in the inner center direction of the particles. To do. As described above, when the pressure is increased in the measurement using the mercury porosimeter based on the mercury intrusion method, the substantially cylindrical pore A has an opening on the outer surface, so the mercury inside the pore. However, since the opening on the outer surface of the pore B having an ink bottle shape is closed, it is difficult for mercury to be injected into the pore. On the other hand, when the pressure is lowered, for the same reason, mercury is easily discharged from the inside of the pore to the outside of the pore, but the pore B having an ink bottle shape is thin. Mercury is hardly discharged from the inside of the pore to the outside of the pore.
したがって、図2に示すように、水銀圧入法に基づく水銀ポロシメータを用いた測定では、水銀の圧入排出曲線C−Dにヒステリシスが生じる。すなわち、比較的低圧力下では略円筒状を呈する細孔A内に徐々に水銀が圧入されるが、ある圧力に達した時点で、それまで水銀が侵入しにくかったインクボトル状を呈する細孔Bを含む、略円筒状を呈する細孔以外の細孔内にも一気に水銀が圧入され、急激に圧入量が増大して、縦軸を微分水銀圧入量(−dV/d(log d))、横軸を含水ケイ酸の細孔における開口部の直径M(nm)とした場合に圧入曲線Cを描くこととなる。一方、圧力を充分に上昇させた後に圧力を下降させていくと、比較的高圧力下では水銀が排出されにくい状態が継続するものの、ある圧力に達した時点で、細孔内に圧入されていた水銀が細孔外に一気に排出され、急激に排出量が増大して、縦軸を微分水銀排出量(−dV/d(log d))、横軸を含水ケイ酸の細孔における開口部の直径M(nm)とした場合に排出曲線Dを描くこととなる。一旦細孔内に圧入された水銀は、圧力の下降時には細孔外に排出されにくい傾向にあるため、圧力の下降時では上昇時における圧入量の増大を示す直径(M1)の位置よりも大きい値を示す直径(M2)の位置で排出量の増大が見られ、これらの直径の差(M2−M1)が図2のIBに相当する。特にインクボトル状を呈する細孔Bにおいては、圧入された水銀が排出されにくい傾向が顕著であり、圧力上昇時には細孔B内に水銀が圧入されるものの、圧力下降時には細孔B外に水銀がほとんど排出されない。 Therefore, as shown in FIG. 2, in the measurement using the mercury porosimeter based on the mercury intrusion method, hysteresis occurs in the mercury intrusion curve CD. That is, mercury is gradually injected into the pore A having a substantially cylindrical shape under a relatively low pressure, but when reaching a certain pressure, the pore having the shape of an ink bottle that has been difficult for mercury to invade until then. Mercury is also injected into pores other than those having a substantially cylindrical shape, including B, and the amount of intrusion increases rapidly, and the vertical axis indicates the differential mercury intrusion amount (−dV / d (log d)). When the horizontal axis is the diameter M (nm) of the opening in the pores of hydrous silicic acid, a press-fitting curve C is drawn. On the other hand, if the pressure is lowered after the pressure has been sufficiently increased, mercury remains difficult to be discharged at a relatively high pressure, but when it reaches a certain pressure, it is pressed into the pores. Mercury was discharged to the outside of the pores at once, and the discharge amount increased rapidly, the vertical axis was the differential mercury discharge amount (-dV / d (log d)), and the horizontal axis was the opening in the pores of hydrous silicic acid. The discharge curve D is drawn when the diameter is M (nm). Mercury once press-fitted into the pores tends to be difficult to be discharged out of the pores when the pressure is lowered, so that when the pressure is lowered, the mercury is larger than the position of the diameter (M1) indicating an increase in the amount of press-in when the pressure is raised. An increase in the discharge amount is observed at the position of the diameter (M2) showing the value, and the difference between these diameters (M2−M1) corresponds to IB in FIG. In particular, in the pore B having an ink bottle shape, the tendency that the injected mercury is difficult to be discharged is remarkable, and mercury is pressed into the pore B when the pressure is increased, but the mercury is outside the pore B when the pressure is decreased. Is hardly discharged.
こうした測定方法を採用し、細孔の性質に起因して描かれる水銀圧入排出曲線C−Dを活用して、上記式(X)に従い、水銀圧入法に基づく水銀ポロシメータを用いた測定において圧力を1〜32000PSIまで上昇させた際に水銀圧入量の最大値を示す開口部の直径(M1)(nm)と、圧力を32000PSI〜1PSIまで下降させた際における水銀排出量の最大値を示す開口部の直径(M2)(nm)との差IBを求めれば、係る値が見かけ上はこれらの直径の差(長さ:nm)を示すものの、実質的には含水ケイ酸に存在するインクボトル状を呈する細孔Bの存在割合を示す細孔指数を意味することとなる。すなわち、充分に狭小な開口部を有するインクボトル状を呈する細孔Bの占める存在割合が小さいほど、水銀圧入量と水銀排出量とがほぼ同量に近づき、水銀圧入量の最大値を示す開口部の直径(M1)と水銀排出量の最大値を示す開口部の直径(M2)との差が短縮してIB値が小さくなる。一方、インクボトル状を呈する細孔Bの占める存在割合が大きいほど、水銀圧入量よりも水銀排出量が減少し、水銀圧入量の最大値を示す開口部の直径(M1)と水銀排出量の最大値を示す開口部の直径(M2)との差が拡大してIB値が大きくなる。 Employing such a measurement method, utilizing the mercury intrusion curve CD drawn due to the nature of the pores, the pressure is measured in the measurement using the mercury porosimeter based on the mercury intrusion method according to the above formula (X). The diameter (M1) (nm) of the opening that shows the maximum value of mercury intrusion when raised to 1-32000 PSI and the opening that shows the maximum value of mercury discharge when the pressure is lowered to 32000 PSI to 1 PSI When the difference IB from the diameter (M2) (nm) of the ink is obtained, such a value apparently shows a difference between these diameters (length: nm), but is substantially in the form of an ink bottle present in the hydrous silicic acid. It means the pore index indicating the abundance ratio of the pores B exhibiting. In other words, the smaller the proportion of the pores B having a sufficiently narrow opening that occupy the ink bottle shape, the closer the mercury intrusion amount and the mercury discharge amount are to the same amount, and the opening showing the maximum value of the mercury intrusion amount. The difference between the diameter (M1) of the portion and the diameter (M2) of the opening showing the maximum value of the mercury discharge amount is shortened, and the IB value is reduced. On the other hand, the larger the proportion of the ink bottle-shaped pores B, the smaller the mercury discharge amount than the mercury intrusion amount. The maximum diameter of the mercury intrusion amount (M1) and the mercury discharge amount The difference with the diameter (M2) of the opening showing the maximum value increases, and the IB value increases.
こうしたIBは、上記CTABの値によっても変動し得る性質を有しており、CTABが増大するにつれ、IB値が低下する傾向にある。したがって、本願で用いる含水ケイ酸は、下記式(I);
IB≦−0.36×CTAB+86.8 ・・・(I)
を満たす。IB及びCTABが上記式(I)を満たす含水ケイ酸であると、狭小な開口部を有するインクボトル状を呈する細孔B数が有効に低減され、略円筒状を呈する細孔Aが占める存在割合が増大するため、ゴム分子鎖を充分に侵入させて吸着させることができ、充分な補強性を発揮して、タイヤにおける転がり抵抗を低下させることなく耐摩耗性の向上を図ることが可能となる。
Such an IB has a property that can vary depending on the value of the CTAB, and the IB value tends to decrease as the CTAB increases. Accordingly, the hydrous silicic acid used in the present application is represented by the following formula (I):
IB ≦ −0.36 × CTAB + 86.8 (I)
Meet. When IB and CTAB are hydrous silicic acids satisfying the above formula (I), the number of pores B having an ink bottle shape having a narrow opening is effectively reduced, and the presence of pores A having a substantially cylindrical shape is occupied Since the ratio increases, it is possible to sufficiently penetrate and adsorb rubber molecular chains, exhibit sufficient reinforcement, and improve wear resistance without reducing rolling resistance in the tire. Become.
上記含水ケイ酸は、セチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)が好ましくは50〜250m2/g、より好ましくは90〜220m2/gであるのが望ましい。CTABが50m2/g未満であると、得られるタイヤの耐摩耗性が著しく低下するおそれがある。一方、250m2/gを超えると、含水ケイ酸がゴム成分中で良好に分散できず、ゴムの加工性が著しく低下するおそれがあり、ひいては耐摩耗性等の物性が低下する傾向にある。 The hydrated silicic acid preferably has a cetyltrimethylammonium bromide adsorption specific surface area (CTAB) of preferably 50 to 250 m 2 / g, more preferably 90 to 220 m 2 / g. If the CTAB is less than 50 m 2 / g, the wear resistance of the resulting tire may be significantly reduced. On the other hand, if it exceeds 250 m 2 / g, the hydrous silicic acid cannot be dispersed well in the rubber component, the processability of the rubber may be remarkably lowered, and the physical properties such as wear resistance tend to be lowered.
上記含水ケイ酸の配合量は、上記ゴム成分100質量部に対して、好ましくは10〜150質量部、より好ましくは30〜100質量部の量であるのが望ましい。含水ケイ酸の配合量が10質量部未満であると、ゴム組成物の低発熱性が損なわれるおそれがあり、150質量部を超えると、ゴムの加工性が低下するとともに得られるタイヤの耐摩耗性をも低下するおそれがある。 The amount of the hydrated silicic acid is preferably 10 to 150 parts by mass, more preferably 30 to 100 parts by mass with respect to 100 parts by mass of the rubber component. If the amount of hydrous silicic acid is less than 10 parts by mass, the low heat build-up of the rubber composition may be impaired, and if it exceeds 150 parts by mass, the processability of the rubber is reduced and the resulting tire has wear resistance. There is also a risk of reducing the nature.
本発明のゴム組成物は、上記含水ケイ酸100質量部に対し、さらにシランカップリング剤を1〜20質量部、好ましくは3〜16質量部、より好ましくは5〜12質量部の量で配合されてなるのが望ましい。シランカップリング剤を含水ケイ酸100質量部に対して1質量部以上の量で配合することで、含水ケイ酸配合の効果をさらに向上させ、ゴム組成物の低発熱性及び貯蔵弾性率等の物性をさらに向上させることができる一方、20質量部を超えた量で配合しても、低発熱性及び貯蔵弾性率等をさらに向上させることができず、コスト高となるおそれがある。 The rubber composition of the present invention is further compounded in an amount of 1 to 20 parts by weight, preferably 3 to 16 parts by weight, more preferably 5 to 12 parts by weight with respect to 100 parts by weight of the above-mentioned hydrous silicic acid. It is desirable to be made. By blending the silane coupling agent in an amount of 1 part by mass or more with respect to 100 parts by mass of hydrous silicic acid, the effect of hydrous silicic acid blending is further improved, such as low exothermic property and storage modulus of the rubber composition While the physical properties can be further improved, even if blended in an amount exceeding 20 parts by mass, the low heat build-up, storage elastic modulus and the like cannot be further improved, and the cost may increase.
上記シランカップリング剤としては、下記式(IV);
AmB3−mSi−(CH2)a−Sb−(CH2)a−SiAmB3−m・・・(IV)
[式(IV)中、A、B、m、a、及びbは上記で定義した通りである]で表される化合物、下記式(V);
AmB3−mSi−(CH2)c−Y・・・(V)
[式(V)中、A、B、Y、m、及びcは上記で定義した通りである]で表される化合物、下記式(VI);
AmB3−mSi−(CH2)a−Sb−Z・・・(VI)
[式(VI)中、A、B、Z、m、a、及びbは上記で定義した通りである]で表される化合物、及び下記式(VII);
R1 xR2 yR3 zSi−R4−S−CO−R5・・・(VII)
[式(VII)中、R1、R2、R3、R4、R5、x、y及びzは上記で定義した通りである]で表される化合物が好ましく、これらシランカップリング剤は、1種単独で用いてもよく、2種以上を混合して用いてもよい。
As said silane coupling agent, following formula (IV);
A m B 3-m Si- ( CH 2) a -S b - (CH 2) a -SiA m B 3-m ··· (IV)
[In the formula (IV), A, B, m, a, and b are as defined above], a compound represented by the following formula (V);
A m B 3-m Si— (CH 2 ) c —Y (V)
[In the formula (V), A, B, Y, m, and c are as defined above], a compound represented by the following formula (VI);
A m B 3-m Si- ( CH 2) a -S b -Z ··· (VI)
[In the formula (VI), A, B, Z, m, a, and b are as defined above], and the following formula (VII);
R 1 x R 2 y R 3 z Si-R 4 -S-CO-R 5 ··· (VII)
[Wherein R 1 , R 2 , R 3 , R 4 , R 5 , x, y and z are as defined above] are preferred, and these silane coupling agents are 1 type may be used independently and 2 or more types may be mixed and used for it.
上記式(IV)で表される化合物としては、ビス(3-トリエトキシシリルプロピル)テトラスルフィド、ビス(3-トリメトキシシリルプロピル)テトラスルフィド、ビス(3-メチルジメトキシシリルプロピル)テトラスルフィド、ビス(3-トリエトキシシリルエチル)テトラスルフィド、ビス(3-トリエトキシシリルプロピル)ジスルフィド、ビス(3-トリメトキシシリルプロピル)ジスルフィド,ビス(3-トリエトキシシリルプロピル)トリスルフィド等が挙げられる。 The compounds represented by the above formula (IV) include bis (3-triethoxysilylpropyl) tetrasulfide, bis (3-trimethoxysilylpropyl) tetrasulfide, bis (3-methyldimethoxysilylpropyl) tetrasulfide, bis (3-Triethoxysilylethyl) tetrasulfide, bis (3-triethoxysilylpropyl) disulfide, bis (3-trimethoxysilylpropyl) disulfide, bis (3-triethoxysilylpropyl) trisulfide and the like can be mentioned.
また、上記式(V)で表される化合物としては、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシラン、ビニルトリエトキシシラン、ビニルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-アミノプロピルトリメトキシシラン、3-メルカプトプロピルメチルジメトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン等が挙げられる。これらの市販品としては、例えば、エボニック・デグッサ社製の商品名「VP Si363」が挙げられる。 Examples of the compound represented by the formula (V) include 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, vinyltriethoxysilane, vinyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3 -Aminopropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane and the like. Examples of these commercially available products include trade name “VP Si363” manufactured by Evonik Degussa.
さらに、上記式(VI)で表される化合物としては、3-トリメトキシシリルプロピル-N,N-ジメチルカルバモイルテトラスルフィド、3-トリメトキシシリルプロピルベンゾチアゾリルテトラスルフィド、3-トリメトキシシリルプロピルメタクリロイルモノスルフィド等が挙げられる。 Further, the compound represented by the above formula (VI) includes 3-trimethoxysilylpropyl-N, N-dimethylcarbamoyl tetrasulfide, 3-trimethoxysilylpropylbenzothiazolyl tetrasulfide, 3-trimethoxysilylpropyl. And methacryloyl monosulfide.
また、上記式(VII)で表される化合物については、式(VII)中、R2、R5、R6及びR7において、アルキル基は、直鎖状でも分岐状でもよく、該アルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基等が挙げられる。また、アルケニル基も、直鎖状でも分岐状でもよく、該アルケニル基としては、ビニル基、アリル基、メタニル基等が挙げられる。さらに、シクロアルキル基としては、シクロヘキシル基、エチルシクロヘキシル基等が、シクロアルケニル基としては、シクロヘキセニル基、エチルシクロヘキセニル基等が、アリール基としては、フェニル基、トリル基等が挙げられる。またさらに、R5において、アラルキル基としては、フェネチル基等が挙げられる。 In the compound represented by the formula (VII), in the formula (VII), in R 2 , R 5 , R 6 and R 7 , the alkyl group may be linear or branched. Examples thereof include a methyl group, an ethyl group, a propyl group, and an isopropyl group. The alkenyl group may be linear or branched, and examples of the alkenyl group include a vinyl group, an allyl group, and a methanyl group. Furthermore, examples of the cycloalkyl group include a cyclohexyl group and an ethylcyclohexyl group, examples of the cycloalkenyl group include a cyclohexenyl group and an ethylcyclohexenyl group, and examples of the aryl group include a phenyl group and a tolyl group. Furthermore, in R 5 , examples of the aralkyl group include a phenethyl group.
上記式(VII)中、R4及びR8において、アルキレン基は、直鎖状でも分岐状でもよく、該アルキレン基としては、メチレン基、エチレン基、トリメチレン基、プロピレン基等が挙げられる。また、シクロアルキレン基としては、シクロヘキシレン基等が挙げられる。またさらに、R4において、アルケニレン基は、直鎖状でも分岐状でもよく、該アルケニレン基としては、ビニレン基、プロペニレン基等が挙げられる。また、シクロアルキルアルキレン基としては、シクロヘキシルメチレン基等が、アリーレン基としては、フェニレン基等が、アラルキレン基としては、キシリレン基等が挙げられる。 In the above formula (VII), in R 4 and R 8 , the alkylene group may be linear or branched, and examples of the alkylene group include a methylene group, an ethylene group, a trimethylene group, and a propylene group. Examples of the cycloalkylene group include a cyclohexylene group. Furthermore, in R 4 , the alkenylene group may be linear or branched, and examples of the alkenylene group include a vinylene group and a propenylene group. Examples of the cycloalkylalkylene group include a cyclohexylmethylene group, examples of the arylene group include a phenylene group, and examples of the aralkylene group include a xylylene group.
また、上記式(VII)中、R3において、−[O(R8O)m]0.5−基としては、1,2-エタンジオキシ基、1,3-プロパンジオキシ基、1,4-ブタンジオキシ基、1,5-ペンタンジオキシ基、1,6-ヘキサンジオキシ基等が挙げられる。
上記式(VII)で表される化合物は、特表2001−505225号に記載の方法と同様に合成することができ、また、モメンティブ・パフォーマンス・マテリアルズ社製の商品名「NXT」(式(VII)のR1=C2H5O、R4=C3H6、R5=C7H15、x=3、y=0、z=0:3−オクタノイルチオ−プロピルトリエトキシシラン)等の市販品を利用することもできる。
なかでも、上記式(IV)、(V)、(VI)又は(VII)で表される化合物のうち、上記式(V)で表される化合物、又は上記式(VII)で表される化合物が好ましい。
In the above formula (VII), in R 3 , the — [O (R 8 O) m ] 0.5 — group is a 1,2-ethanedioxy group, 1,3-propanedioxy group, or 1,4-butanedioxy group. Group, 1,5-pentanedioxy group, 1,6-hexanedioxy group and the like.
The compound represented by the above formula (VII) can be synthesized in the same manner as the method described in JP-T-2001-505225. Also, the product name “NXT” (formula (Made by Momentive Performance Materials) R 1 = C 2 H 5 O of VII), R 4 = C 3 H 6, R 5 = C 7 H 15, x = 3, y = 0, z = 0: 3- octanoylthio - propyltriethoxysilane), etc. It is also possible to use commercially available products.
Among them, among the compounds represented by the above formula (IV), (V), (VI) or (VII), the compound represented by the above formula (V) or the compound represented by the above formula (VII) Is preferred.
また、前記シランカップリング剤として、分子内に、窒素原子(N)及びケイ索原子(Si)を含む環状構造と、一つ以上の硫黄原子(S)とを有し、且つ立体障害の小さな基が一つ以上ケイ素原子(Si)に結合している部位を有する有機ケイ素化合物を用いることができる。この有機ケイ素化合物は、窒素原子(N)とケイ素原子(Si)とを含む環状構造を有し、該環状構造は、ケイ素−酸素結合(Si−O)を含む場合であっても、安定である。そのため、ケイ素−酸素結合(Si−O)が加水分解してアルコール成分が発生することがなく、使用中の揮発性有機化合物(VOC)ガスを低減できる。 In addition, the silane coupling agent has a cyclic structure containing a nitrogen atom (N) and a silicic atom (Si) in the molecule and one or more sulfur atoms (S), and has a small steric hindrance. An organosilicon compound having a site in which one or more groups are bonded to a silicon atom (Si) can be used. This organosilicon compound has a cyclic structure containing a nitrogen atom (N) and a silicon atom (Si), and the cyclic structure is stable even when it contains a silicon-oxygen bond (Si-O). is there. Therefore, the silicon-oxygen bond (Si-O) is not hydrolyzed to generate an alcohol component, and the volatile organic compound (VOC) gas in use can be reduced.
前記有機ケイ素化合物は、シリカ等の無機充填剤の表面との親和性が高いアミノ基、イミノ基、置換アミノ基、置換イミノ基等の含窒素官能基を含むため、窒素原子の非共有電子対が、有機ケイ棄化合物と無機充填剤の反応に関与でき、カップリング反応の速度が速い。しかし、窒素原子(N)とケイ素原子(Si)とを含む環状構造が二環性の構造の場合、ケイ素原子(Si)周辺の立体障害が大きいため、無機充填剤との反応性が低く、カップリング効率が大幡に低下してしまう。本発明で使用する有機ケイ素化合物は、立体障害の小さな基が一つ以上ケイ素原子に結合している部位を有するため、シリカ等の無機充填剤との反応性が高い。そのため、従来のシランカップリング剤に代えて、この有機ケイ素化合物を無機充填剤配合ゴム組成物に添加することで、カップリング効率が向上し、その結果として、ゴム組成物のヒステリシスロスを大幅に低下させつつ、耐摩耗性を大幅に向上させることが可能となる。また、本発明の有機ケイ素化合物は、添加効率が高いため、少量でも高い効果が得られ、配合コストの低減にも寄与する。 Since the organosilicon compound contains a nitrogen-containing functional group such as an amino group, an imino group, a substituted amino group, or a substituted imino group that has a high affinity with the surface of an inorganic filler such as silica, a lone pair of nitrogen atoms However, it can participate in the reaction between the organic silicic compound and the inorganic filler, and the coupling reaction rate is fast. However, when the cyclic structure containing a nitrogen atom (N) and a silicon atom (Si) is a bicyclic structure, since the steric hindrance around the silicon atom (Si) is large, the reactivity with the inorganic filler is low, Coupling efficiency is greatly reduced. Since the organosilicon compound used in the present invention has a site where one or more groups having small steric hindrance are bonded to a silicon atom, the organosilicon compound has high reactivity with an inorganic filler such as silica. Therefore, in place of the conventional silane coupling agent, by adding this organosilicon compound to the inorganic filler-containing rubber composition, the coupling efficiency is improved, and as a result, the hysteresis loss of the rubber composition is greatly increased. It is possible to greatly improve the wear resistance while lowering. In addition, since the organosilicon compound of the present invention has high addition efficiency, a high effect can be obtained even in a small amount, and it contributes to reduction of the blending cost.
前記立体障害の小さな基としては、水素原子(−H)、メチル基(−CH3)及びヒドロキシル基(−OH)等が好ましい。水素原子、メチル基又はヒドロキシル基がケイ素原子(Si)に結合している場合、有機ケイ素化合物と無機充填剤との反応性が特に高く、カップリング効率を大幅に向上させることができる。また、前記有機ケイ素化合物は、ケイ素−酸素結合(Si−O)を1〜6個有することが好ましい。有機ケイ素化合物がケイ素−酸素結合(Si−O)を1〜6個有する場合、シリカ等の無機充填剤との反応性が高く、カップリング効率が更に向上するためである。 The group having a small steric hindrance is preferably a hydrogen atom (—H), a methyl group (—CH 3 ), a hydroxyl group (—OH), or the like. When a hydrogen atom, a methyl group or a hydroxyl group is bonded to a silicon atom (Si), the reactivity between the organosilicon compound and the inorganic filler is particularly high, and the coupling efficiency can be greatly improved. The organosilicon compound preferably has 1 to 6 silicon-oxygen bonds (Si-O). This is because when the organosilicon compound has 1 to 6 silicon-oxygen bonds (Si—O), the reactivity with an inorganic filler such as silica is high, and the coupling efficiency is further improved.
本発明で使用する有機ケイ素化合物として、具体的には、下記一般式(XI)で表わされる化合物が好ましい。該有機ケイ素化合物は、一種単独で用いてもよいし、二種以上を組み合わせて用いてもよい。 Specifically, the organic silicon compound used in the present invention is preferably a compound represented by the following general formula (XI). These organosilicon compounds may be used alone or in combination of two or more.
一般式(XI)において、Aは、硫黄原子(S)を含み且つゴム成分と反応する基である。式(XI)で表わされる有機ケイ素化合物は、環状構通部分がシリカ等の無機充填剤と反応するため、分子内に更にゴム成分と反応する基を有することで、ゴム成分と無機充填剤とのカップリング能力を有することとなる。ここで、硫黄原子(S)を含み且つゴム成分と反応する基は、ポリサルファイド基、チオエステル基、チオール基、ジチオカーボネート基、ジチオアセタール基、ヘミチオアセタール基、ビニルチオ基、α−チオカルボニル基、β−チオカルボニル基、S−CO−CH2−O部分、S−CO−CO部分(チオジケトン基)、及びS−CH2−Si部分からなる群から選択される少なくとも一種を含むことが好ましく、ポリサルファイド基及びチオエステル基の少なくとも一方を含むことが特に好ましい。 In general formula (XI), A is a group containing a sulfur atom (S) and reacting with the rubber component. In the organosilicon compound represented by the formula (XI), since the cyclic portion reacts with an inorganic filler such as silica, the rubber component and the inorganic filler The coupling ability is as follows. Here, the group containing a sulfur atom (S) and reacting with the rubber component is a polysulfide group, a thioester group, a thiol group, a dithiocarbonate group, a dithioacetal group, a hemithioacetal group, a vinylthio group, an α-thiocarbonyl group, It preferably contains at least one selected from the group consisting of β-thiocarbonyl group, S—CO—CH 2 —O moiety, S—CO—CO moiety (thiodiketone group), and S—CH 2 —Si moiety, It is particularly preferable that at least one of a polysulfide group and a thioester group is included.
一般式(XI)において、R1及びR2はそれぞれ独立して−M−C1H2l−で表され、ここで、Mは−O−又は−CH2であり、lは0〜10である。但し、R1及びR2の一つ以上は、Mが−O−である。−ClH2l−は、lが0〜10であるため、単結合又は炭素数1〜10のアルキレン基であり、ここで、炭素数1〜10のアルキレン基としては、メチレン基、エチレン基、トリメチレン基、プロピレン基等が挙げられ、該アルキレン基杜、直鎖状でも分岐状でもよい。 In General Formula (XI), R 1 and R 2 are each independently represented by —M—C 1 H 2l —, where M is —O— or —CH 2 , and l is 0 to 10 is there. However, in one or more of R 1 and R 2 , M is —O—. -C l H 2l -is a single bond or an alkylene group having 1 to 10 carbon atoms, since l is 0 to 10, wherein the alkylene group having 1 to 10 carbon atoms is a methylene group or an ethylene group , Trimethylene group, propylene group and the like, and the alkylene group may be linear or branched.
一般式(XI)において、R3は、水素原子、メチル基又はヒドロキシル基である。該R3は、立体障害が小さいため、ゴム成分と無機充填剤とのカップリング反応の向上に大きく寄与する。 In general formula (XI), R 3 is a hydrogen atom, a methyl group or a hydroxyl group. Since R 3 has small steric hindrance, it greatly contributes to the improvement of the coupling reaction between the rubber component and the inorganic filler.
−般式(XI)において、R4は−CnH2n+1で、nは0〜20である。
−CnH2n+1は、nが0〜20であるため、水素又は炭素数1〜20のアルキル基である。ここで、炭素数1〜20のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基ペンチル基、へキシル基、オクチル基、デシル基、ウンデシル墓、ドデシル基、ノナデシル基、エイコシル基等が挙げられ、該アルキル基は、直鎖状でも、分岐状でもよい。
- In general formula (XI), R 4 is -C n H 2n + 1, n is 0 to 20.
-C n H 2n + 1 is, for n is 0 to 20, hydrogen or an alkyl group having 1 to 20 carbon atoms. Here, as the alkyl group having 1 to 20 carbon atoms, methyl group, ethyl group, propyl group, butyl group pentyl group, hexyl group, octyl group, decyl group, undecyl grave, dodecyl group, nonadecyl group, eicosyl group, etc. The alkyl group may be linear or branched.
上記一般式(XI)中のAは、下記一般式(XII)、(XIII)又は(XIV)で表わされことが好ましい。
式(XIII)中のR7は下記一般式(XVII)又は(XVIII)、
式(XII)及び(XIII)中のxは1〜10であり、
式(XIV)中のR8、R9及びR10はそれぞれ独立して−M−CpH2p−(ここで、Mは−O−又は−CH2であり、pは0〜20である)、R11はH,OH又はメチル基である]
で表わされることが好ましい。式(XII)及び式(XIII)中のxは1〜10であるが、好ましくは2〜4である。
R 7 in formula (XIII) is the following general formula (XVII) or (XVIII),
X in the formulas (XII) and (XIII) is 1 to 10,
R 8, R 9 and R 10 in formula (XIV) are each independently -M-C p H 2p - (wherein, M is -O- or -CH 2, p is 0 to 20 R 11 is H, OH or a methyl group]
It is preferable to be represented by X in the formulas (XII) and (XIII) is 1 to 10, preferably 2 to 4.
上記式(XV)及び(XVI)において、Mは−O−又は−CH2−であり、l及びmは0〜10である。また、上記式(V)おいて、X及びYはそれぞれ独立して−O−、−NR4−又は−CH2−であり、R12は−OR4、−NR4R5又は−R4であり、ここで、R4は−CnH2n+1で、R6はCqH2q+1である。更に、上記式(XVI)において、R13は、−NR4−、−NR4−NR4−又は−N=N−であり、ここで、R4は−CnH2n+1である。
−CnH2n+1については、上述の通りであり、−CmH2m−は、mが0〜10であるため、単結合又は炭素教1〜10のアルキレン基である。ここで、炭素数1〜10のアルキレン基としては、メチレン基、エチレン基、トリメチレン基、プロピレン基等が挙げられ、該アルキレン基臆、直鏡状でも分岐状でもよい。
また、−CqH2q+1は、qが0〜10であるため、水素又は炭素数1〜10のアルキル基である。ここで、炭素数1〜10のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、デシル基等が挙げられ、該アルキル基は直鎖状でも、分岐状でもよい。
In the above formulas (XV) and (XVI), M is —O— or —CH 2 —, and l and m are 0 to 10. In the formula (V), X and Y are each independently —O—, —NR 4 — or —CH 2 —, and R 12 is —OR 4 , —NR 4 R 5 or —R 4. Where R 4 is —C n H 2n + 1 and R 6 is C q H 2q + 1 . Further, in the above formula (XVI), R 13 is —NR 4 —, —NR 4 —NR 4 —, or —N═N—, wherein R 4 is —C n H 2n + 1 .
The -C n H 2n + 1, are as described above, -C m H 2m -, since m is 0-10, a single bond or an alkylene group having a carbon teaching 1-10. Here, examples of the alkylene group having 1 to 10 carbon atoms include a methylene group, an ethylene group, a trimethylene group, a propylene group, and the like, and the alkylene group may have a straight mirror shape or a branched shape.
Further, -C q H 2q + 1, since q is 0, is hydrogen or an alkyl group having 1 to 10 carbon atoms. Here, examples of the alkyl group having 1 to 10 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group. The chain may be branched or branched.
上記式(XIII)中のR7は、上記一般式(XVII)又は式(XVIII)、或いは−ClH2l−R16で表わされ、特には−ClH2l+1で表わされることが好ましい。但し、M、X、Y、R12、R14、l及びmは上記と同義である。ここで、R15は−NR4R5、−NR4N4R5、−N=NR4又は−M-CmH2m+1或いは炭素6〜20の芳香族炭化水素基であり、R4、R5、M、l及びmは上記と同義である。
なお、−ClH2l-については、上述の通りであり、また、−CmH2m+1は、mが0〜10であるため水素又は炭素数1〜10のアルキル基であり、炭素数1〜10のアルキル基としてメチル基、エチル基、プロビル基、プチル基、ペンチル基、へキシル基、へプチル基、オクチル基、デシル基等が挙げられ、該アルキル基は直鎖状でも、分岐状でもよい。また、炭素数6〜20の芳香族炭化水素基としてはフェニル基、トリル基、キシリル基、クメニル基、ナフチレン基、トリレン基等のアリール基、ベンジル基、フェネチル基等のアラルキル基が挙げられる。
R 7 in the above formula (XIII) is represented by the above general formula (XVII) or (XVIII), or —C 1 H 2l —R 16 , particularly represented by —C 1 H 2l + 1 Is preferred. However, M, X, Y, R 12 , R 14 , l and m are as defined above. Here, R 15 is —NR 4 R 5 , —NR 4 N 4 R 5 , —N═NR 4 or —M—C m H 2m + 1, or an aromatic hydrocarbon group having 6 to 20 carbon atoms, R 4 , R 5 , M, l and m are as defined above.
Incidentally, -C l H 2l - For are as described above, also, -C m H 2m + 1 is, m is hydrogen or an alkyl group having 1 to 10 carbon atoms because it is 0-10, carbon atoms 1 -10 alkyl groups include a methyl group, an ethyl group, a provir group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a decyl group. The alkyl group may be linear or branched. But you can. Examples of the aromatic hydrocarbon group having 6 to 20 carbon atoms include aryl groups such as phenyl group, tolyl group, xylyl group, cumenyl group, naphthylene group and tolylene group, and aralkyl groups such as benzyl group and phenethyl group.
また、式(XIV)中の−CpH2p+1−は、pが0〜20であるため、単結合又は炭素数1〜20のアルキレン基である。ここで、炭素数1〜20のアルキレン基としては、メチレン基、エチレン基、トリメチレン基、プロピレン基、デカメチレン寒、エイコサメチレン基等が挙げられ、該アルキレン基は直鎖状でも分岐状でもよい。 Further, -C in the formula (XIV) p H 2p + 1 - , since p is 0 to 20, a single bond or an alkylene group with 1 to 20 carbon atoms. Here, examples of the alkylene group having 1 to 20 carbon atoms include methylene group, ethylene group, trimethylene group, propylene group, decamethylene cold, eicosamethylene group and the like, and the alkylene group may be linear or branched. .
上記式(XI)の化合物において、Mは−O−(酸素)であることが好ましい。この場合、Mが−CH2−である化合物と比べてシリカ等の無機充項剤との反応性が高い。 In the compound of the above formula (XI), M is preferably —O— (oxygen). In this case, M is -CH 2 - are highly reactive with inorganic Takashiko such as silica as compared to compounds wherein.
また、式(XI)において、R1及びR2はそれぞれ独立して−O−ClH2l−で表わされることが好ましく、R3は水素原子、メチル基又はヒドロキシル基であり、上記R6は−O−ClH2l−で表わされることが好ましく、上記R7は、−O−ClH2l−で表わされる直鎖状若しくは分岐鎖状のアルキル基、又は炭素数6〜20の芳香族炭化水素基であることが好ましい。 In Formula (XI), R 1 and R 2 are preferably each independently represented by —O—C 1 H 2l —, R 3 is a hydrogen atom, a methyl group or a hydroxyl group, and R 6 Is preferably represented by —O—C 1 H 2l —, and R 7 is a linear or branched alkyl group represented by —O—C 1 H 2l —, or a group having 6 to 20 carbon atoms. An aromatic hydrocarbon group is preferred.
前記有機ケイ素化合物、例えば、(ClH2l+1O)2R9Si−A[式中、l、R3及びAは上記と同義である]で表わされる化合物に対し、N−メチルジエタノールアミン、N−エチルジエタノールアミン等のアミン化合物を加え、さらに触媒としてp−トルエンスルホン酸、塩酸等の酸や、チタンテトラn−ブトキシド等のチタンアルコシドを添加し、加熱して、2つのClH2l+1O−を−R1−NR4−R2−で表わされる二価の基で置換することで合成できる。 The compound represented by the organosilicon compound, for example, (C 1 H 21 + 1 O) 2 R 9 Si-A [wherein l, R 3 and A are as defined above], N-methyldiethanolamine, N - an amine compound such as ethyl diethanolamine was added, further p- toluenesulfonic acid as a catalyst, and an acid such as hydrochloric acid, was added titanium alcoholates Sid such as titanium tetra-n- butoxide and heated, two C l H 2l + 1 O It can be synthesized by substituting — with a divalent group represented by —R 1 —NR 4 —R 2 —.
前記有機ケイ素化合物は、窒素原子(N)とケイ素原子(Si)とを含む環状構造を有し、該環状構造は、ケイ素−酸素結合(Si−O)を含む場合であっても、安定である。そのため、ケイ素−酸素結合(Si−O)が加水分解してアルコール成分が発生することがなく、使用中の揮発性有機化合物(VOC)ガスを低減できる点で有効である。 The organosilicon compound has a cyclic structure including a nitrogen atom (N) and a silicon atom (Si), and the cyclic structure is stable even when it includes a silicon-oxygen bond (Si-O). is there. Therefore, the silicon-oxygen bond (Si-O) is not hydrolyzed to generate an alcohol component, which is effective in that the volatile organic compound (VOC) gas in use can be reduced.
本発明のゴム組成物には、さらに補強用充填剤としてカーボンブラックを配合してもよく、該カーボンブラックの配合量は、上記ゴム成分100質量部に対して80質量部以下、好ましくは60質量部以下の量であるのが望ましい。カーボンブラックの配合量が上記ゴム成分100質量部に対して80質量部を超えると、ゴム組成物の低発熱性が悪化するおそれがある。また、この場合、該カーボンブラックと上記含水ケイ酸との総配合量は、上記ゴム成分100質量部に対して120質量部以下、好ましくは100質量部以下の量であるのが望ましい。カーボンブラックと含水ケイ酸との総配合量を上記ゴム成分100質量部に対して120質量部以下とすることで、ゴム組成物の低発熱性を実現して転がり抵抗性を充分に向上させることができる。 The rubber composition of the present invention may further contain carbon black as a reinforcing filler, and the amount of the carbon black is 80 parts by mass or less, preferably 60 parts by mass with respect to 100 parts by mass of the rubber component. It is desirable that the amount be no more than parts. If the blending amount of carbon black exceeds 80 parts by mass with respect to 100 parts by mass of the rubber component, the low heat buildup of the rubber composition may be deteriorated. In this case, the total amount of the carbon black and the hydrous silicic acid is desirably 120 parts by mass or less, preferably 100 parts by mass or less with respect to 100 parts by mass of the rubber component. By making the total blending amount of carbon black and hydrous silicic acid 120 parts by mass or less with respect to 100 parts by mass of the rubber component, low heat build-up of the rubber composition is realized and rolling resistance is sufficiently improved. Can do.
本発明のゴム組成物には、通常のゴム組成物に配合する添加剤を本発明の効果を損なわない程度に配合することができ、例えば、ゴム工業で通常使用されている老化防止剤、加硫促進剤、硫黄、酸化亜鉛、ステアリン酸、オゾン劣化防止剤等の添加剤を適宜配合することができる。なお、本発明のゴム組成物は、ロール等の開放式混練機や、バンバリーミキサー等の密閉式混練機等を用いて混練りすることによって得られ、成形加工後に加硫を行い、各種ゴム製品に適用可能である。 In the rubber composition of the present invention, an additive compounded in a normal rubber composition can be blended to such an extent that the effects of the present invention are not impaired. For example, an anti-aging agent or additive commonly used in the rubber industry is added. Additives such as a sulfur accelerator, sulfur, zinc oxide, stearic acid, and an ozone deterioration preventing agent can be appropriately blended. The rubber composition of the present invention is obtained by kneading using an open kneader such as a roll or a closed kneader such as a Banbury mixer, and vulcanized after molding to produce various rubber products. It is applicable to.
本発明の空気入りタイヤは、上記ゴム組成物をタイヤ用部材のいずれかに適用したことを特徴とする。かかるタイヤ用部材のなかでもトレッドが特に好ましく、上記ゴム組成物をトレッドに用いたタイヤは、該ゴム組成物が転がり抵抗が低く、また耐摩耗性にも優れる。なお、本発明のタイヤに充填する気体としては、通常の又は酸素分圧を変えた空気、又は窒素等の不活性ガスが挙げられる。 The pneumatic tire of the present invention is characterized in that the rubber composition is applied to any of the tire members. Among such tire members, a tread is particularly preferable. In a tire using the rubber composition as a tread, the rubber composition has low rolling resistance and excellent wear resistance. In addition, as gas with which the tire of this invention is filled, normal or air which changed oxygen partial pressure, or inert gas, such as nitrogen, is mentioned.
以下、本発明について、実施例に基づき具体的に説明するが、本発明はこれら実施例に限定されるものではない。
なお、含水ケイ酸の物性は、下記の方法で評価した。
EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to these Examples.
The physical properties of hydrous silicic acid were evaluated by the following methods.
《インクボトル状細孔指数(IB)の測定》
水銀ポロシメータ POREMASTER-33(Quantachrome社製)を用いて、上述したように、水銀圧入法に基づき、まず圧力を1〜32000PSIまで上昇させて、含水ケイ酸の外表面において開口部の直径1.2×105nm〜6nmである細孔について水銀圧入量を測定し、図2に示したように圧入量のピークに位置する直径(M1)を求めた。次に、圧力を32000PSI〜1PSIまで下降させて、水銀を細孔内から排出した。このときの排出曲線から得られた排出量のピークに位置する直径(M2)を求めた。これらM1及びM2の値から上記式(X)によりIBを算出した。
<Measurement of ink bottle-like pore index (IB)>
Using the mercury porosimeter POREMASTER-33 (manufactured by Quantachrome), as described above, based on the mercury intrusion method, the pressure was first increased to 1 to 32,000 PSI, and the diameter of the opening 1.2 × 10 6 on the outer surface of the hydrous silicic acid The amount of mercury intrusion was measured for pores of 5 nm to 6 nm, and the diameter (M1) located at the peak of the amount of indentation was determined as shown in FIG. Next, the pressure was lowered to 32000 PSI to 1 PSI, and mercury was discharged from the pores. The diameter (M2) located at the peak of the discharge amount obtained from the discharge curve at this time was determined. IB was calculated from the values of M1 and M2 by the above formula (X).
《CTABの測定》
ASTM D3765−92記載の方法に準拠して実施した。この際、上述したように、カーボンブラックの標準品であるIRB#3(83.0m2/g)を使用せず、別途セチルトリメチルアンモニウムブロミド(以下、CE−TRABと略記する)標準液を調製し、これによって含水ケイ酸OT(ジ−2−エチルヘキシルスルホコハク酸ナトリウム)溶液の標定を行い、含水ケイ酸表面に対するCE−TRAB1分子当たりの吸着断面積を0.35nm2として、CE−TRABの吸着量から比表面積(m2/g)を算出した。
<< Measurement of CTAB >>
This was carried out in accordance with the method described in ASTM D3765-92. At this time, as described above, a standard solution of cetyltrimethylammonium bromide (hereinafter abbreviated as CE-TRAB) was prepared without using IRB # 3 (83.0 m 2 / g) which is a standard product of carbon black. Thus, the hydrated silicic acid OT (sodium di-2-ethylhexylsulfosuccinate) solution was standardized, and the adsorption cross-section per CE-TRAB molecule on the hydrous silicic acid surface was 0.35 nm 2 to adsorb CE-TRAB. The specific surface area (m 2 / g) was calculated from the amount.
[製造例1:含水ケイ酸Aの製造]
撹拌機を備えた180リットルのジャケット付きステンレス反応槽に、水65リットルとケイ酸ナトリウム水溶液(SiO2 160g/リットル、SiO2/Na2Oモル比3.3)1.25リットルを入れ、96℃に加熱した。生成した溶液中のNa2O濃度は0.015mol/リットルであった。
[Production Example 1: Production of hydrous silicate A]
In a 180 liter jacketed stainless steel reaction vessel equipped with a stirrer, 65 liters of water and 1.25 liters of a sodium silicate aqueous solution (SiO 2 160 g / liter, SiO 2 / Na 2 O molar ratio 3.3) were placed. Heated to ° C. The concentration of Na 2 O in the resulting solution was 0.015 mol / liter.
この溶液の温度を96℃に維持しながら、上記と同様のケイ酸ナトリウム水溶液を流量750ミリリットル/分で、硫酸(18mol/リットル)を流量33ミリリットル/分で同時に滴下した。流量を調整しつつ、反応溶液中のNa2O濃度を0.005〜0.035mol/リットルの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、30分目に粘度が上昇してゲル状溶液となった。さらに、添加を続けて100分で反応を停止した。生じた溶液中のシリカ濃度は85g/リットルであった。引き続いて、上記と同様の硫酸を溶液のpHが3になるまで添加してケイ酸スラリーを得た。得られたケイ酸スラリーをフィルタープレスで濾過、水洗を行って湿潤ケーキを得た。次いで湿潤ケーキを乳化装置を用いてスラリーとして、噴霧式乾燥機で乾燥し、湿式法含水ケイ酸Aを得た。 While maintaining the temperature of this solution at 96 ° C., a sodium silicate aqueous solution similar to the above was simultaneously added dropwise at a flow rate of 750 ml / min and sulfuric acid (18 mol / liter) at a flow rate of 33 ml / min. While adjusting the flow rate, the neutralization reaction was performed while maintaining the Na 2 O concentration in the reaction solution in the range of 0.005 to 0.035 mol / liter. The reaction solution started to become cloudy from the middle of the reaction, and the viscosity increased to a gel solution at 30 minutes. Further, the addition was continued and the reaction was stopped after 100 minutes. The silica concentration in the resulting solution was 85 g / liter. Subsequently, the same sulfuric acid as described above was added until the pH of the solution became 3, to obtain a silicic acid slurry. The obtained silicic acid slurry was filtered with a filter press and washed with water to obtain a wet cake. Subsequently, the wet cake was made into a slurry using an emulsifying device and dried with a spray dryer to obtain a wet method hydrous silicic acid A.
[製造例2:含水ケイ酸Bの製造]
製造例1と同じステンレス反応槽に、水89リットルとケイ酸ナトリウム水溶液(SiO2 160g/リットル、SiO2/Na2Oモル比3.3)1.70リットルを入れ、75℃に加熱した。生成した溶液中のNa2O濃度は0.015mol/リットルであった。
[Production Example 2: Production of hydrous silicate B]
In the same stainless steel reaction tank as in Production Example 1, 89 liters of water and 1.70 liters of an aqueous sodium silicate solution (SiO 2 160 g / liter, SiO 2 / Na 2 O molar ratio 3.3) were placed and heated to 75 ° C. The concentration of Na 2 O in the resulting solution was 0.015 mol / liter.
この溶液の温度を75℃に維持しながら、上記と同様のケイ酸ナトリウム水溶液を流量520ミリリットル/分で、硫酸(18mol/リットル)を流量23ミリリットル/分で同時に滴下した。流量を調整しつつ、反応溶液中のNa2O濃度を0.005〜0.035mol/リットルの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、46分目に粘度が上昇してゲル状溶液となった。さらに、添加を続けて100分で反応を停止した。生じた溶液中のシリカ濃度は60g/リットルであった。引き続いて、上記と同様の硫酸を溶液のpHが3になるまで添加してケイ酸スラリーを得た。その後、製造例1と同様にして湿式法含水ケイ酸Bを得た。 While maintaining the temperature of this solution at 75 ° C., the same sodium silicate aqueous solution as described above was simultaneously added dropwise at a flow rate of 520 ml / min and sulfuric acid (18 mol / liter) at a flow rate of 23 ml / min. While adjusting the flow rate, the neutralization reaction was performed while maintaining the Na 2 O concentration in the reaction solution in the range of 0.005 to 0.035 mol / liter. From the middle of the reaction, the reaction solution started to become cloudy, and the viscosity increased to a gel solution at 46 minutes. Further, the addition was continued and the reaction was stopped after 100 minutes. The silica concentration in the resulting solution was 60 g / liter. Subsequently, the same sulfuric acid as described above was added until the pH of the solution became 3, to obtain a silicic acid slurry. Thereafter, a wet method hydrous silicic acid B was obtained in the same manner as in Production Example 1.
[製造例3:含水ケイ酸Cの製造]
製造例1と同じステンレス反応槽に、水65リットルとケイ酸ナトリウム水溶液(SiO2 160g/リットル、SiO2/Na2Oモル比3.3)1.25リットルを入れ、85℃に加熱した。生成した溶液中のNa2O濃度は0.015mol/リットルであった。
[Production Example 3: Production of hydrous silicate C]
In the same stainless steel reactor as in Production Example 1, 65 liters of water and 1.25 liters of an aqueous sodium silicate solution (SiO 2 160 g / liter, SiO 2 / Na 2 O molar ratio 3.3) were placed and heated to 85 ° C. The concentration of Na 2 O in the resulting solution was 0.015 mol / liter.
この溶液の温度を85℃に維持しながら、上記と同様のケイ酸ナトリウム水溶液を流量750ミリリットル/分で、硫酸(18mol/リットル)を流量33ミリリットル/分で同時に滴下した。流量を調整しつつ、反応溶液中のNa2O濃度を0.005〜0.035mol/リットルの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、31分目に粘度が上昇してゲル状溶液となった。さらに、添加を続けて100分で反応を停止した。生じた溶液中のシリカ濃度は85g/リットルであった。引き続いて、上記と同様の硫酸を溶液のpHが3になるまで添加してケイ酸スラリーを得た。その後、製造例1と同様にして湿式法含水ケイ酸Cを得た。 While maintaining the temperature of this solution at 85 ° C., an aqueous sodium silicate solution similar to the above was simultaneously added dropwise at a flow rate of 750 ml / min and sulfuric acid (18 mol / liter) at a flow rate of 33 ml / min. While adjusting the flow rate, the neutralization reaction was performed while maintaining the Na 2 O concentration in the reaction solution in the range of 0.005 to 0.035 mol / liter. From the middle of the reaction, the reaction solution started to become cloudy, and the viscosity increased to a gel solution at 31 minutes. Further, the addition was continued and the reaction was stopped after 100 minutes. The silica concentration in the resulting solution was 85 g / liter. Subsequently, the same sulfuric acid as described above was added until the pH of the solution became 3, to obtain a silicic acid slurry. Thereafter, a wet method hydrous silicic acid C was obtained in the same manner as in Production Example 1.
[製造例4:含水ケイ酸Dの製造]
製造例1と同じステンレス反応槽に、水65リットルとケイ酸ナトリウム水溶液(SiO2 160g/リットル、SiO2/Na2Oモル比3.3)1.25リットルを入れ、80℃に加熱した。生成した溶液中のNa2O濃度は0.015mol/リットルであった。
[Production Example 4: Production of hydrous silicic acid D]
In the same stainless steel reaction vessel as in Production Example 1, 65 liters of water and 1.25 liters of a sodium silicate aqueous solution (SiO 2 160 g / liter, SiO 2 / Na 2 O molar ratio 3.3) were placed and heated to 80 ° C. The concentration of Na 2 O in the resulting solution was 0.015 mol / liter.
この溶液の温度を80℃に維持しながら、上記と同様のケイ酸ナトリウム水溶液を流量750ミリリットル/分で、硫酸(18mol/リットル)を流量33ミリリットル/分で同時に滴下した。流量を調整しつつ、反応溶液中のNa2O濃度を0.005〜0.035mol/リットルの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、31分目に粘度が上昇してゲル状溶液となった。さらに、添加を続けて100分で反応を停止した。生じた溶液中のシリカ濃度は85g/リットルであった。引き続いて、上記と同様の硫酸を溶液のpHが3になるまで添加してケイ酸スラリーを得た。その後、製造例1と同様にして湿式法含水ケイ酸Dを得た。 While maintaining the temperature of this solution at 80 ° C., a sodium silicate aqueous solution similar to the above was simultaneously added dropwise at a flow rate of 750 ml / min and sulfuric acid (18 mol / liter) at a flow rate of 33 ml / min. While adjusting the flow rate, the neutralization reaction was performed while maintaining the Na 2 O concentration in the reaction solution in the range of 0.005 to 0.035 mol / liter. From the middle of the reaction, the reaction solution started to become cloudy, and the viscosity increased to a gel solution at 31 minutes. Further, the addition was continued and the reaction was stopped after 100 minutes. The silica concentration in the resulting solution was 85 g / liter. Subsequently, the same sulfuric acid as described above was added until the pH of the solution became 3, to obtain a silicic acid slurry. Thereafter, wet method hydrous silicic acid D was obtained in the same manner as in Production Example 1.
[製造例5:含水ケイ酸Eの製造]
製造例1と同じステンレス反応槽に、水89リットルとケイ酸ナトリウム水溶液(SiO2 160g/リットル、SiO2/Na2Oモル比3.3)1.70リットルを入れ、85℃に加熱した。生成した溶液中のNa2O濃度は0.015mol/リットルであった。
[Production Example 5: Production of hydrous silicic acid E]
In the same stainless steel reaction tank as in Production Example 1, 89 liters of water and 1.70 liters of an aqueous sodium silicate solution (SiO 2 160 g / liter, SiO 2 / Na 2 O molar ratio 3.3) were placed and heated to 85 ° C. The concentration of Na 2 O in the resulting solution was 0.015 mol / liter.
この溶液の温度を85℃に維持しながら、上記と同様のケイ酸ナトリウム水溶液を流量520ミリリットル/分で、硫酸(18mol/リットル)を流量23ミリリットル/分で同時に滴下した。流量を調整しつつ、反応溶液中のNa2O濃度を0.005〜0.035mol/リットルの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、45分目に粘度が上昇してゲル状溶液となった。さらに、添加を続けて100分で反応を停止した。生じた溶液中のシリカ濃度は60g/リットルであった。引き続いて、上記と同様の硫酸を溶液のpHが3になるまで添加してケイ酸スラリーを得た。その後、製造例1と同様にして湿式法含水ケイ酸Eを得た。 While maintaining the temperature of this solution at 85 ° C., a sodium silicate aqueous solution similar to the above was simultaneously added dropwise at a flow rate of 520 ml / min and sulfuric acid (18 mol / liter) at a flow rate of 23 ml / min. While adjusting the flow rate, the neutralization reaction was performed while maintaining the Na 2 O concentration in the reaction solution in the range of 0.005 to 0.035 mol / liter. From the middle of the reaction, the reaction solution began to become cloudy and increased in viscosity at 45 minutes to become a gel-like solution. Further, the addition was continued and the reaction was stopped after 100 minutes. The silica concentration in the resulting solution was 60 g / liter. Subsequently, the same sulfuric acid as described above was added until the pH of the solution became 3, to obtain a silicic acid slurry. Thereafter, wet method hydrous silicic acid E was obtained in the same manner as in Production Example 1.
[製造例6:含水ケイ酸Fの製造]
製造例1と同じステンレス反応槽に、水89リットルとケイ酸ナトリウム水溶液(SiO2 160g/リットル、SiO2/Na2Oモル比3.3)1.70リットルを入れ、80℃に加熱した。生成した溶液中のNa2O濃度は0.015mol/リットルであった。
[Production Example 6: Production of hydrous silicic acid F]
In the same stainless steel reaction vessel as in Production Example 1, 89 liters of water and 1.70 liters of an aqueous sodium silicate solution (SiO 2 160 g / liter, SiO 2 / Na 2 O molar ratio 3.3) were placed and heated to 80 ° C. The concentration of Na 2 O in the resulting solution was 0.015 mol / liter.
この溶液の温度を80℃に維持しながら、上記と同様のケイ酸ナトリウム水溶液を流量520ミリリットル/分で、硫酸(18mol/リットル)を流量23ミリリットル/分で同時に滴下した。流量を調整しつつ、反応溶液中のNa2O濃度を0.005〜0.035mol/リットルの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、45分目に粘度が上昇してゲル状溶液となった。さらに、添加を続けて100分で反応を停止した。生じた溶液中のシリカ濃度は60g/リットルであった。引き続いて、上記と同様の硫酸を溶液のpHが3になるまで添加してケイ酸スラリーを得た。その後、製造例1と同様にして湿式法含水ケイ酸Fを得た。 While maintaining the temperature of this solution at 80 ° C., the same sodium silicate aqueous solution as described above was simultaneously added dropwise at a flow rate of 520 ml / min and sulfuric acid (18 mol / liter) at a flow rate of 23 ml / min. While adjusting the flow rate, the neutralization reaction was performed while maintaining the Na 2 O concentration in the reaction solution in the range of 0.005 to 0.035 mol / liter. From the middle of the reaction, the reaction solution began to become cloudy and increased in viscosity at 45 minutes to become a gel-like solution. Further, the addition was continued and the reaction was stopped after 100 minutes. The silica concentration in the resulting solution was 60 g / liter. Subsequently, the same sulfuric acid as described above was added until the pH of the solution became 3, to obtain a silicic acid slurry. Thereafter, wet method hydrous silicic acid F was obtained in the same manner as in Production Example 1.
[比較例1〜4、実施例1〜6]
表1に示す配合処方により各々表2〜3に示す含水ケイ酸を用いたゴム組成物を常法に従って調製し、さらにかかる該ゴム組成物をトレッドゴムに適用した、サイズ:195/65R15のタイヤを常法に従って試作して、耐摩耗性及び転がり抵抗を下記の方法により評価した。結果を表2〜3に示す。
[Comparative Examples 1-4, Examples 1-6]
Tires having a size of 195 / 65R15, in which rubber compositions using the hydrous silicic acids shown in Tables 2 to 3 were prepared according to the conventional methods according to the formulation shown in Table 1, and further applied to tread rubbers. Were prototyped according to conventional methods, and wear resistance and rolling resistance were evaluated by the following methods. The results are shown in Tables 2-3.
[比較例5、実施例7〜9]
表4に示す配合処方により各々表5に示す含水ケイ酸を用いたゴム組成物を常法に従って調製し、さらにかかる該ゴム組成物をトレッドゴムに適用した、サイズ:195/65R15のタイヤを常法に従って試作して、耐摩耗性及び転がり抵抗を下記の方法により評価した。結果を表5に示す。
[Comparative Example 5, Examples 7-9]
A rubber composition using the hydrous silicic acid shown in Table 5 according to the formulation shown in Table 4 was prepared according to a conventional method, and a tire having a size of 195 / 65R15 was applied to the tread rubber. A prototype was prepared according to the method, and the wear resistance and rolling resistance were evaluated by the following methods. The results are shown in Table 5.
《耐摩耗性》
供試タイヤを車両に装着して2万km走行した後の残溝量を測定し、表2〜3では比較例1の残溝量を100とし、表5では比較例5の残溝量を100として指数表示した。指数値が大きい程、耐摩耗性に優れることを示す。
《Abrasion resistance》
The remaining groove amount after running the test tire on the vehicle and running 20,000 km is measured. In Tables 2 and 3, the remaining groove amount in Comparative Example 1 is set to 100, and in Table 5, the remaining groove amount in Comparative Example 5 is measured. The index is shown as 100. It shows that it is excellent in abrasion resistance, so that an index value is large.
《転がり抵抗》
供試タイヤに対し、室内の一軸転がり抵抗測定ドラム試験機により、80km/hでの転がり抵抗を測定し、表2〜3では比較例1の転がり抵抗を100とし、表5では比較例5の転がり抵抗を100として指数表示した。指数値が大きい程、転がり抵抗が小さいことを示す。
《Rolling resistance》
For the test tire, the rolling resistance at 80 km / h was measured with an indoor uniaxial rolling resistance measuring drum tester. In Tables 2 to 3, the rolling resistance of Comparative Example 1 was set to 100, and in Table 5 to Comparative Example 5 The rolling resistance was set to 100 and indicated as an index. It shows that rolling resistance is so small that an index value is large.
※1:#1500、JSR社製
※2:登録商標シーストKH(N339)、東海カーボン社製
※3:表2〜3に示す含水ケイ酸
※4:NXT(登録商標)、モメンティブ・パフォーマンス・マテリアルズ社製
※5:N−(1,3−ジメチルブチル)−N’−フェニル−p−フェニレンジアミン、ノラック6C、大内新興化学工業製
※6:ジフェニルグアニジン、ノクセラーD、大内新興化学工業製
※7:ベンゾチアジルジスルフィド、ノクセラーDM−P、大内新興化学工業製
※8:N−t−ブチル−2−ベンゾチアジルスルフェンアミド、ノクセラーNS−P、大内新興化学工業製
* 1: # 1500, manufactured by JSR
* 2: Registered trademark Seast KH (N339), manufactured by Tokai Carbon Co., Ltd. * 3: Hydrous silicic acid shown in Tables 2-3 * 4: NXT (registered trademark), manufactured by Momentive Performance Materials * 5: N- ( 1,3-Dimethylbutyl) -N'-phenyl-p-phenylenediamine, Nolac 6C, manufactured by Ouchi Shinsei Chemical Industry * 6: Diphenylguanidine, Noxeller D, manufactured by Ouchi Shinsei Chemical Industry * 7: Benzothiazyl disulfide, Noxeller DM-P, manufactured by Ouchi Shinsei Chemical Industry * 8: Nt-butyl-2-benzothiazylsulfenamide, Noxeller NS-P, manufactured by Ouchi Shinsei Chemical Industry
※9:Nipsil AQ、東ソー・シリカ社製
※10:VN2、デグッサ社製
※11:Ultrasil7000GR、デグッサ社製
※12:TOKUSIL255G、OSC社製
* 9: Nipsil AQ, manufactured by Tosoh Silica * 10: VN2, manufactured by Degussa * 11: Ultrasil7000GR, manufactured by Degussa * 12: TOKUSIL255G, manufactured by OSC
※1:#1500、JSR社製
※2:登録商標シーストKH(N339)、東海カーボン社製
※3:表5に示す含水ケイ酸
※13:ビス(3−トリエトキシシリルプロピル)テトラスルフィド、エボニック・デグッサ社製、Si69
※5:N−(1,3−ジメチルブチル)−N’−フェニル−p−フェニレンジアミン、ノラック6C、大内新興化学工業製
※6:ジフェニルグアニジン、ノクセラーD、大内新興化学工業製
※7:ベンゾチアジルジスルフィド、ノクセラーDM−P、大内新興化学工業製
※8:N−t−ブチル−2−ベンゾチアジルスルフェンアミド、ノクセラーNS−P、大内新興化学工業製
* 1: # 1500, manufactured by JSR * 2: Registered trademark Seast KH (N339), manufactured by Tokai Carbon Co., Ltd. * 3: Hydrous silicic acid shown in Table 5 * 13: Bis (3-triethoxysilylpropyl) tetrasulfide, Evonik・ Si69, manufactured by Degussa
* 5: N- (1,3-dimethylbutyl) -N'-phenyl-p-phenylenediamine, Nolac 6C, manufactured by Ouchi Shinsei Chemical Industry * 6: Diphenylguanidine, Noxeller D, manufactured by Ouchi Shinsei Chemical Industry * 7 : Benzothiazyl disulfide, Noxeller DM-P, manufactured by Ouchi Shinsei Chemical Industry * 8: Nt-butyl-2-benzothiazylsulfenamide, Noxeller NS-P, manufactured by Ouchi Shinsei Chemical Industry
※9:Nipsil AQ、東ソー・シリカ社製 * 9: Nipsil AQ, manufactured by Tosoh Silica
表2〜3及び5の結果によれば、上記式(I)を満たす含水ケイ酸を配合したゴム組成物を適用した実施例1〜6及び7〜9は、比較例1〜4及び5に比して、優れた転がり抵抗性及び耐摩耗性をバランスよく発揮することがわかる。 According to the results of Tables 2 to 3 and 5, Examples 1 to 6 and 7 to 9 to which the rubber composition containing the hydrous silicic acid satisfying the above formula (I) was applied are compared with Comparative Examples 1 to 4 and 5. In comparison, it can be seen that excellent rolling resistance and wear resistance are exhibited in a well-balanced manner.
A:略円筒状を呈する細孔
B:インクボトル状を呈する細孔
Ma:粒子の外表面における細孔Aの開口部の直径
Mb:粒子の外表面における細孔Bの開口部の直径
Ra:粒子内部における細孔Aの細孔径(内径)
Rb:粒子内部における細孔Bの細孔径(内径)
C:水銀の圧入曲線
D:水銀の排出曲線
M1:水銀圧入量の最大値を示す開口部の直径
M2:水銀排出量の最大値を示す開口部の直径
IB:インクボトル状細孔指数
A: Fine pores having a substantially cylindrical shape B: Fine pores having an ink bottle shape M a : Diameter of the opening of the pore A on the outer surface of the particle M b : Diameter of the opening of the pore B on the outer surface of the particle R a : pore diameter (inner diameter) of pore A inside the particle
R b : pore diameter (inner diameter) of pore B inside the particle
C: Mercury intrusion curve D: Mercury discharge curve M1: Diameter of opening showing maximum value of mercury intrusion amount M2: Diameter of opening showing maximum value of mercury discharge amount IB: Ink bottle-like pore index
Claims (7)
直径1.2×105nm〜6nmの範囲にある開口部を外表面に具えた細孔を有する含水ケイ酸に対し、水銀圧入法に基づく水銀ポロシメータを用いた測定において、圧力を1〜32000PSIまで上昇させた際に水銀圧入量の最大値を示す開口部の直径(M1)(nm)、及び圧力を32000PSI〜1PSIまで下降させた際に水銀排出量の最大値を示す開口部の直径(M2)(nm)により、下記式(X);
IB=M2−M1・・・(X)
で求められる値であって、
セチルトリメチルアンモニウムブロミド吸着比表面積(CTAB)(m2/g)及び前記インクボトル状細孔指数(IB)が、下記式(I);
IB≦−0.36×CTAB+86.8 ・・・(I)
を満たす含水ケイ酸を、ゴム成分に配合してなることを特徴とするゴム組成物。 Ink bottle-like pore index (IB)
In a measurement using a mercury porosimeter based on the mercury intrusion method for hydrous silicic acid having pores having an opening on the outer surface having a diameter in the range of 1.2 × 10 5 nm to 6 nm, the pressure is 1 to 32,000 PSI. The diameter (M1) (nm) of the opening showing the maximum value of the mercury intrusion when the pressure is raised to 32,000 PSI and the diameter of the opening showing the maximum value of the mercury discharge when the pressure is lowered to 32000 PSI to 1 PSI ( M2) (nm), the following formula (X);
IB = M2-M1 (X)
Which is the value found in
Cetyltrimethylammonium bromide adsorption specific surface area (CTAB) (m 2 / g) and the ink bottle-like pore index (IB) are represented by the following formula (I):
IB ≦ −0.36 × CTAB + 86.8 (I)
A rubber composition comprising water-containing silicic acid satisfying the above requirements in a rubber component.
前記ゴム成分100質量部に対し、前記含水ケイ酸を10〜150質量部の量で配合してなることを特徴とする請求項1又は2に記載のゴム組成物。 The rubber component is composed of natural rubber and / or a diene synthetic rubber, and the hydrous silicic acid is blended in an amount of 10 to 150 parts by mass with respect to 100 parts by mass of the rubber component. The rubber composition according to 1 or 2.
AmB3−mSi−(CH2)a−Sb−(CH2)a−SiAmB3−m・・・(IV)
[式(IV)中、AはCnH2n+1O(nは1〜3の整数)又は塩素原子であり、Bは炭素数1〜3のアルキル基であり、mは1〜3の整数、aは1〜9の整数、bは1以上の整数である。但し、mが1の時、Bは互いに同一であっても異なっていてもよく、mが2又は3の時、Aは互いに同一であっても異なっていてもよい。]で表される化合物、下記式(V);
AmB3−mSi−(CH2)c−Y・・・(V)
[式(V)中、AはCnH2n+1O(nは1〜3の整数)又は塩素原子であり、Bは炭素数1〜3のアルキル基であり、Yはメルカプト基、ビニル基、アミノ基、グリシドキシ基又はエポキシ基であり、mは1〜3の整数、cは0〜9の整数である。但し、mが1の時、Bは互いに同一であっても異なっていてもよく、mが2又は3の時、Aは互いに同一であっても異なっていてもよい。]で表される化合物、下記式(VI);
AmB3−mSi−(CH2)a−Sb−Z・・・(VI)
[式(VI)中、AはCnH2n+1O(nは1〜3の整数)又は塩素原子であり、Bは炭素数1〜3のアルキル基であり、Zはベンゾチアゾリル基、N,N−ジメチルチオカルバモイル基又はメタクリロイル基であり、mは1〜3の整数、aは1〜9の整数、bは1以上の整数で分布を有していてもよい。但し、mが1の時、Bは互いに同一であっても異なっていてもよく、mが2又は3の時、Aは互いに同一であっても異なっていてもよい。]で表される化合物及び下記式(VII);
R1 xR2 yR3 zSi−R4−S−CO−R5・・・(VII)
[式(VII)中、R1は、R6O−、R6C(=O)O−、R6R7C=NO−、R6R7NO−、R6R7N−及び−(OSiR6R7)n(OSiR5R6R7)から選択され、かつ炭素数が1〜18であり(但し、R6及びR7は、それぞれ独立してアルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基及びアリール基から選択され、かつ炭素数が1〜18であり、nは0〜10である);
R2は、水素、又は炭素数1〜18のアルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基及びアリール基から選択され;
R3は、−[O(R8O)m]0.5−(但し、R8は、アルキレン基及びシクロアルキレン基から選択され、かつ炭素数が1〜18であり、mは1〜4である)であり;
x、y及びzは、x+y+2z=3、0≦x≦3、0≦y≦2、0≦z≦1の関係を満たし;
R4は、アルキレン基、シクロアルキレン基、シクロアルキルアルキレン基、アルケニレン基、アリーレン基及びアラルキレン基から選択され、かつ炭素数が1〜18であり;
R5は、アルキル基、シクロアルキル基、アルケニル基、シクロアルケニル基、アリール基及びアラルキル基から選択され、かつ炭素数が1〜18である。]で表される化合物からなる群より選ばれる少なくとも1種であることを特徴とする請求項4に記載のゴム組成物。 The silane coupling agent has the following formula (IV):
A m B 3-m Si- ( CH 2) a -S b - (CH 2) a -SiA m B 3-m ··· (IV)
Wherein (IV), A is C n H 2n + 1 O ( n is an integer of 1 to 3) or a chlorine atom, B is an alkyl group having 1 to 3 carbon atoms, m is an integer of 1 to 3, a is an integer of 1 to 9, and b is an integer of 1 or more. However, when m is 1, B may be the same or different from each other, and when m is 2 or 3, A may be the same or different from each other. A compound represented by the following formula (V);
A m B 3-m Si— (CH 2 ) c —Y (V)
Wherein (V), A is C n H 2n + 1 O ( n is an integer of 1 to 3) or a chlorine atom, B is an alkyl group having 1 to 3 carbon atoms, Y is a mercapto group, a vinyl group, It is an amino group, a glycidoxy group or an epoxy group, m is an integer of 1 to 3, and c is an integer of 0 to 9. However, when m is 1, B may be the same or different from each other, and when m is 2 or 3, A may be the same or different from each other. A compound represented by the following formula (VI);
A m B 3-m Si- ( CH 2) a -S b -Z ··· (VI)
Wherein (VI), A is C n H 2n + 1 O ( n is an integer of 1 to 3) or a chlorine atom, B is an alkyl group having 1 to 3 carbon atoms, Z is a benzothiazolyl group, N, N -A dimethylthiocarbamoyl group or a methacryloyl group, m is an integer of 1 to 3, a is an integer of 1 to 9, and b is an integer of 1 or more and may have a distribution. However, when m is 1, B may be the same or different from each other, and when m is 2 or 3, A may be the same or different from each other. And a compound represented by the following formula (VII):
R 1 x R 2 y R 3 z Si-R 4 -S-CO-R 5 ··· (VII)
[In the formula (VII), R 1 represents R 6 O—, R 6 C (═O) O—, R 6 R 7 C═NO—, R 6 R 7 NO—, R 6 R 7 N— and — (OSiR 6 R 7 ) n (OSiR 5 R 6 R 7 ) and having 1 to 18 carbon atoms (provided that R 6 and R 7 are each independently an alkyl group, a cycloalkyl group, an alkenyl group) Selected from a group, a cycloalkenyl group and an aryl group, and having 1 to 18 carbon atoms and n being 0 to 10);
R 2 is selected from hydrogen or an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group, an alkenyl group, a cycloalkenyl group and an aryl group;
R 3 is — [O (R 8 O) m ] 0.5 — (where R 8 is selected from an alkylene group and a cycloalkylene group, has 1 to 18 carbon atoms, and m is 1 to 4). );
x, y and z satisfy the relationship x + y + 2z = 3, 0 ≦ x ≦ 3, 0 ≦ y ≦ 2, 0 ≦ z ≦ 1;
R 4 is selected from an alkylene group, a cycloalkylene group, a cycloalkylalkylene group, an alkenylene group, an arylene group, and an aralkylene group, and has 1 to 18 carbon atoms;
R 5 is selected from an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, an aryl group, and an aralkyl group, and has 1 to 18 carbon atoms. The rubber composition according to claim 4, wherein the rubber composition is at least one selected from the group consisting of compounds represented by the formula:
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