JP2008308517A - Rubber composition and tire - Google Patents
Rubber composition and tire Download PDFInfo
- Publication number
- JP2008308517A JP2008308517A JP2007155161A JP2007155161A JP2008308517A JP 2008308517 A JP2008308517 A JP 2008308517A JP 2007155161 A JP2007155161 A JP 2007155161A JP 2007155161 A JP2007155161 A JP 2007155161A JP 2008308517 A JP2008308517 A JP 2008308517A
- Authority
- JP
- Japan
- Prior art keywords
- group
- rubber composition
- mass
- conjugated diene
- diene polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001971 elastomer Polymers 0.000 title claims abstract description 87
- 239000005060 rubber Substances 0.000 title claims abstract description 87
- 239000000203 mixture Substances 0.000 title claims abstract description 78
- 229920000642 polymer Polymers 0.000 claims abstract description 73
- 150000001993 dienes Chemical class 0.000 claims abstract description 57
- 125000000524 functional group Chemical group 0.000 claims abstract description 47
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 40
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 39
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims abstract description 21
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 13
- 238000001179 sorption measurement Methods 0.000 claims abstract description 13
- -1 aromatic vinyl compound Chemical class 0.000 claims description 49
- 150000001875 compounds Chemical class 0.000 claims description 37
- 238000006116 polymerization reaction Methods 0.000 claims description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 22
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 21
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 19
- 229920002554 vinyl polymer Polymers 0.000 claims description 14
- 125000003277 amino group Chemical group 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 230000009477 glass transition Effects 0.000 claims description 9
- 239000003505 polymerization initiator Substances 0.000 claims description 9
- 150000002430 hydrocarbons Chemical group 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 8
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052717 sulfur Inorganic materials 0.000 claims description 7
- 239000011593 sulfur Substances 0.000 claims description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 150000004658 ketimines Chemical group 0.000 claims description 6
- 150000002909 rare earth metal compounds Chemical class 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 125000003172 aldehyde group Chemical group 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 229920001577 copolymer Polymers 0.000 claims description 4
- 230000003247 decreasing effect Effects 0.000 claims description 4
- 150000002466 imines Chemical group 0.000 claims description 4
- AWIJRPNMLHPLNC-UHFFFAOYSA-N methanethioic s-acid Chemical group SC=O AWIJRPNMLHPLNC-UHFFFAOYSA-N 0.000 claims description 4
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 claims description 3
- 150000002148 esters Chemical group 0.000 claims description 3
- 125000002883 imidazolyl group Chemical group 0.000 claims description 3
- 125000001041 indolyl group Chemical group 0.000 claims description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 3
- 125000002560 nitrile group Chemical group 0.000 claims description 3
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims description 3
- 125000005068 thioepoxy group Chemical group S(O*)* 0.000 claims description 3
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 125000002228 disulfide group Chemical group 0.000 claims description 2
- LOZWAPSEEHRYPG-UHFFFAOYSA-N dithiane Natural products C1CSCCS1 LOZWAPSEEHRYPG-UHFFFAOYSA-N 0.000 claims description 2
- 125000004185 ester group Chemical group 0.000 claims description 2
- 229920001519 homopolymer Polymers 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 2
- 125000000468 ketone group Chemical group 0.000 claims description 2
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 2
- 125000004076 pyridyl group Chemical group 0.000 claims description 2
- 125000005156 substituted alkylene group Chemical group 0.000 claims description 2
- 150000007970 thio esters Chemical group 0.000 claims description 2
- 125000005309 thioalkoxy group Chemical group 0.000 claims description 2
- 125000005323 thioketone group Chemical group 0.000 claims description 2
- 125000003368 amide group Chemical group 0.000 claims 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 claims 2
- CXWGKAYMVASWDQ-UHFFFAOYSA-N 1,2-dithiane Chemical compound C1CCSSC1 CXWGKAYMVASWDQ-UHFFFAOYSA-N 0.000 claims 1
- 239000005973 Carvone Substances 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims 1
- 229920003244 diene elastomer Polymers 0.000 claims 1
- 230000002829 reductive effect Effects 0.000 abstract description 5
- 238000013329 compounding Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- 238000006243 chemical reaction Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 13
- 239000000178 monomer Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000003607 modifier Substances 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 9
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 7
- 238000012718 coordination polymerization Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- 239000006229 carbon black Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 238000006011 modification reaction Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- WBUSESIMOZDSHU-UHFFFAOYSA-N 3-(4,5-dihydroimidazol-1-yl)propyl-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN1CCN=C1 WBUSESIMOZDSHU-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 239000002879 Lewis base Substances 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 150000007527 lewis bases Chemical class 0.000 description 4
- 229920001194 natural rubber Polymers 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- 125000005372 silanol group Chemical group 0.000 description 4
- 238000004073 vulcanization Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910001868 water Inorganic materials 0.000 description 4
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- PRKPGWQEKNEVEU-UHFFFAOYSA-N 4-methyl-n-(3-triethoxysilylpropyl)pentan-2-imine Chemical compound CCO[Si](OCC)(OCC)CCCN=C(C)CC(C)C PRKPGWQEKNEVEU-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- 244000043261 Hevea brasiliensis Species 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical group 0.000 description 3
- 229920005549 butyl rubber Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000020169 heat generation Effects 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- 229920003052 natural elastomer Polymers 0.000 description 3
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- TUHNTFBFUHRNMN-UHFFFAOYSA-N (2,2-dimethoxyazasilolidin-1-yl)-trimethylsilane Chemical compound CO[Si]1(OC)CCCN1[Si](C)(C)C TUHNTFBFUHRNMN-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- RYPKRALMXUUNKS-UHFFFAOYSA-N 2-Hexene Natural products CCCC=CC RYPKRALMXUUNKS-UHFFFAOYSA-N 0.000 description 2
- GXDMUOPCQNLBCZ-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CC(=O)OC1=O GXDMUOPCQNLBCZ-UHFFFAOYSA-N 0.000 description 2
- DIGKGWWSMMWBIZ-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]-n,n-bis(trimethylsilyl)propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN([Si](C)(C)C)[Si](C)(C)C DIGKGWWSMMWBIZ-UHFFFAOYSA-N 0.000 description 2
- SLSKAIZCBJQHFI-UHFFFAOYSA-N 3-triethoxysilyl-n,n-bis(trimethylsilyl)propan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCN([Si](C)(C)C)[Si](C)(C)C SLSKAIZCBJQHFI-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000005234 alkyl aluminium group Chemical group 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- AFZSMODLJJCVPP-UHFFFAOYSA-N dibenzothiazol-2-yl disulfide Chemical compound C1=CC=C2SC(SSC=3SC4=CC=CC=C4N=3)=NC2=C1 AFZSMODLJJCVPP-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- SPRIOUNJHPCKPV-UHFFFAOYSA-N hydridoaluminium Chemical compound [AlH] SPRIOUNJHPCKPV-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 2
- CNBZTHQYUOSCDJ-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)butan-2-imine Chemical compound CCO[Si](OCC)(OCC)CCCN=C(C)CC CNBZTHQYUOSCDJ-UHFFFAOYSA-N 0.000 description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- QMMOXUPEWRXHJS-UHFFFAOYSA-N pentene-2 Natural products CCC=CC QMMOXUPEWRXHJS-UHFFFAOYSA-N 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000003141 primary amines Chemical class 0.000 description 2
- 239000010734 process oil Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 2
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 2
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- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- ZRLVQFQTCMUIRM-UHFFFAOYSA-N potassium;2-methylbutan-2-olate Chemical compound [K+].CCC(C)(C)[O-] ZRLVQFQTCMUIRM-UHFFFAOYSA-N 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000002683 reaction inhibitor Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005624 silicic acid group Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- CGRKYEALWSRNJS-UHFFFAOYSA-N sodium;2-methylbutan-2-olate Chemical compound [Na+].CCC(C)(C)[O-] CGRKYEALWSRNJS-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- QAZLUNIWYYOJPC-UHFFFAOYSA-M sulfenamide Chemical compound [Cl-].COC1=C(C)C=[N+]2C3=NC4=CC=C(OC)C=C4N3SCC2=C1C QAZLUNIWYYOJPC-UHFFFAOYSA-M 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- RKSOPLXZQNSWAS-UHFFFAOYSA-N tert-butyl bromide Chemical compound CC(C)(C)Br RKSOPLXZQNSWAS-UHFFFAOYSA-N 0.000 description 1
- NBRKLOOSMBRFMH-UHFFFAOYSA-N tert-butyl chloride Chemical compound CC(C)(C)Cl NBRKLOOSMBRFMH-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000005377 tertiary alkyl halides Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- OQTSOKXAWXRIAC-UHFFFAOYSA-N tetrabutan-2-yl silicate Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)OC(C)CC OQTSOKXAWXRIAC-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- BCLLLHFGVQKVKL-UHFFFAOYSA-N tetratert-butyl silicate Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C BCLLLHFGVQKVKL-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- IAQRGUVFOMOMEM-ONEGZZNKSA-N trans-but-2-ene Chemical compound C\C=C\C IAQRGUVFOMOMEM-ONEGZZNKSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- RWJUTPORTOUFDY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCOCC1CO1 RWJUTPORTOUFDY-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 1
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/80—Technologies aiming to reduce greenhouse gasses emissions common to all road transportation technologies
- Y02T10/86—Optimisation of rolling resistance, e.g. weight reduction
Landscapes
- Tires In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明はゴム組成物及びそれを用いたタイヤに関する。より詳細には、作業性を十分に維持しながら低発熱性に優れているゴム組成物、及びそれを用いたタイヤに関するものである。 The present invention relates to a rubber composition and a tire using the rubber composition. More specifically, the present invention relates to a rubber composition excellent in low heat buildup while maintaining workability sufficiently, and a tire using the rubber composition.
近年、省エネルギーの社会的な要請及び環境問題への関心が高まっている。このため、世界的な二酸化炭素排出規制の動きに関連して、自動車の低燃費化に対する要求がある。このような要求に対応するため、タイヤ性能についても転がり抵抗の減少が求められている。タイヤの転がり抵抗を下げる手法は、タイヤ構造の最適化による手法、及びタイヤの発熱性の低いゴム組成物を用いる手法がある。 In recent years, there has been a growing interest in social demands for energy conservation and environmental issues. For this reason, there is a demand for lower fuel consumption of automobiles in connection with the movement of global carbon dioxide emission regulations. In order to meet such demands, reduction of rolling resistance is also demanded for tire performance. There are two methods for reducing the rolling resistance of the tire: a method by optimizing the tire structure, and a method using a rubber composition having low heat generation of the tire.
例えば、発熱性の低いゴム組成物を得る方法としては、使用する充填剤に特定のシリカを使用する方法が知られている(例えば特許文献1を参照)。また、充填剤にカーボンブラックを用い、重合活性末端をスズ化合物にて修飾する方法(例えば、特許文献2を参照。)、同様にカーボンブラックを用い、重合活性末端にアミノ基を導入する方法(例えば、特許文献3を参照。)等がある。
しかしながら、単純なシリカ分散剤だけではシリカの分散が十分とはいえず、より一層の低発熱性化が期待できない。また、重合活性末端を導入した変性共役ジエン系重合体では、ML1+4の上昇を来たす傾向があり、作業性を悪くする。新たな問題である。
However, it cannot be said that the dispersion of silica is sufficient with a simple silica dispersant alone, and further reduction in heat generation cannot be expected. In addition, a modified conjugated diene polymer introduced with a polymerization active terminal tends to cause an increase in ML 1 + 4 , resulting in poor workability. It is a new problem.
本発明は、前記課題に鑑み、低発熱性がより向上し、且つ作業性も十分に維持することができるゴム組成物、及びそれを用いたタイヤを提供することである。 In view of the above problems, the present invention is to provide a rubber composition that can further improve low heat build-up and maintain sufficient workability, and a tire using the rubber composition.
本発明者等は、ゴム組成物に、特定の官能基を有する変性共役ジエン系重合体、吸着表面積が特定の範囲にある含水ケイ酸、及びシランカップリン剤を配合することによって、分散性が向上し、変性共役ジエン系重合体と充填剤との効果が相まって、ゴム組成物の低発熱性がより向上するだけでなく、その作業性が十分に維持されることを見出し、本発明に至ったものである。
即ち、本発明は以下の構成を特徴とするものである。
The present inventors can disperse the rubber composition by blending a modified conjugated diene polymer having a specific functional group, hydrous silicic acid having an adsorption surface area within a specific range, and a silane coupling agent. The improved conjugated diene polymer and the filler are combined to improve the low heat buildup of the rubber composition, and the workability is sufficiently maintained, leading to the present invention. It is a thing.
That is, the present invention is characterized by the following configuration.
少なくとも1種以上の官能基を有する変性共役ジエン系重合体を10質量%以上含むゴム成分100質量部に対して、セチルトリメチルアンモニウムブロマイド(CTAB)の吸着表面積が50〜250m2/gの範囲にあり、且つ数式(1):Y<5.00+0.47×X(式中のYは温度750℃で3時間加熱したときの減少質量%であり、Xは温度105℃で2時間加熱したときの減少質量%である。)の関係を満たす含水ケイ酸を10〜130質量部を配合すると共に、該含水ケイ酸100質量部に対してシランカップリング剤を10〜20質量部を配合してなるゴム組成物である。 The adsorption surface area of cetyltrimethylammonium bromide (CTAB) is in the range of 50 to 250 m 2 / g with respect to 100 parts by mass of the rubber component containing 10% by mass or more of the modified conjugated diene polymer having at least one kind of functional group. Yes, and Formula (1): Y <5.00 + 0.47 × X (Y in the formula is mass% decreased when heated at a temperature of 750 ° C. for 3 hours, and X is heated at a temperature of 105 ° C. for 2 hours) 10 to 130 parts by mass of hydrous silicic acid satisfying the relationship of) and 10 to 20 parts by mass of a silane coupling agent with respect to 100 parts by mass of the hydrous silicic acid. It is the rubber composition which becomes.
前記変性共役ジエン系重合体が1,3−ブタジエンと芳香族ビニル化合物との共重合体、又は1,3−ブタジエンの単独重合体であることが好ましい。
前記芳香族ビニル化合物はスチレン、α−メチルスチレン、1−ビニルナフタレン、3−ビニルトルエン、エチルビニルベンゼン、ジビニルベンゼン、4−シクロヘキシルスチレン、2,4,6−トリメチルスチレン、等を挙げることができる。
また前記変性共役ジエン系重合体のガラス転移点(Tg)が0℃以下であることが好ましい。
The modified conjugated diene polymer is preferably a copolymer of 1,3-butadiene and an aromatic vinyl compound, or a homopolymer of 1,3-butadiene.
Examples of the aromatic vinyl compound include styrene, α-methylstyrene, 1-vinylnaphthalene, 3-vinyltoluene, ethylvinylbenzene, divinylbenzene, 4-cyclohexylstyrene, 2,4,6-trimethylstyrene, and the like. .
The glass transition point (Tg) of the modified conjugated diene polymer is preferably 0 ° C. or lower.
本発明に係る変性共役ジエン系重合体の官能基は、変性共役ジエン系重合体の重合開始剤もしくは重合停止剤の末端及び/又は主鎖中もしくは側鎖中にあれば良い。
また、変性共役ジエン系重合体の官能基が、窒素を含む官能基、珪素を含む官能基、酸素又は硫黄を含む官能基、及び金属を含む官能基からなる群から選択された官能基であることが好ましい。
The functional group of the modified conjugated diene polymer according to the present invention may be in the terminal and / or main chain or side chain of the polymerization initiator or the polymerization stopper of the modified conjugated diene polymer.
Further, the functional group of the modified conjugated diene polymer is a functional group selected from the group consisting of a functional group containing nitrogen, a functional group containing silicon, a functional group containing oxygen or sulfur, and a functional group containing a metal. It is preferable.
本発明では、前記ゴム組成物からなる部材を用いたタイヤ、特に、前記部材がトレッド部材であるタイヤを提供することが好ましい。 In the present invention, it is preferable to provide a tire using a member made of the rubber composition, particularly a tire in which the member is a tread member.
本発明のゴム組成物は、変性共役ジエン系重合体と特定の水ケイ酸である充填剤とを配合することによって、その組成物のM1+4を維持し、即ち、作業性を維持し、且つその組成物の低発熱性(損失正接:tanδ)がより優れたものとなる。そして、それを使用したタイヤは低転がり抵抗性を一層発揮することができる。 The rubber composition of the present invention maintains the M 1 + 4 of the composition by blending the modified conjugated diene polymer and a filler that is a specific hydrosilicic acid, that is, maintains workability, and The low exothermic property (loss tangent: tan δ) of the composition becomes more excellent. And the tire which uses it can exhibit low rolling resistance further.
以下、本発明の実施の形態を説明する。
本発明のゴム組成物は、変性共役ジエン系重合体を10質量%以上含み、該変性共役ジエン系重合体100質量部に対して、セチルトリメチルアンモニウムブロマイド(CTAB)の吸着表面積が50〜250m2/gの範囲にあり、且つ数式(1):Y<5.00+0.47×X(式中のYは温度750℃で3時間加熱したときの減少質量%であり、Xは温度105℃で2時間加熱したときの減少質量%である。)の関係を満たす含水ケイ酸を10〜130質量部を配合すると共に、該含水ケイ酸100質量部に対してシランカップリング剤を10〜20質量部を配合してなる。
Embodiments of the present invention will be described below.
The rubber composition of the present invention contains 10% by mass or more of a modified conjugated diene polymer, and the adsorption surface area of cetyltrimethylammonium bromide (CTAB) is 50 to 250 m 2 with respect to 100 parts by mass of the modified conjugated diene polymer. / G, and Formula (1): Y <5.00 + 0.47 × X (Y in the formula is a mass% decreased when heated at a temperature of 750 ° C. for 3 hours, and X is a temperature of 105 ° C.) 10 to 130 parts by mass of hydrous silicic acid satisfying the relationship of 2) and 10 to 20 parts by mass of silane coupling agent with respect to 100 parts by mass of hydrous silicic acid. Part.
<変性共役ジエン系重合体>
本発明の変性共役ジエン系重合体は、少なくとも1つ以上の官能基を有する。
また、変性共役ジエン系重合体の官能基が、窒素を含む官能基、珪素を含む官能基、酸素又は硫黄を含む官能基、及び金属を含む官能基からなる群から選択された官能基であることが好ましい。
変性共役ジエン系重合体はその官能基を末端或いは主鎖中に有することができる。特に、末端官能基の場合、変性共役ジエン系重合体はその末端官能基が変性開始剤又は変性停止剤を使用して形成することができる。
変性共役ジエン系重合体を含むゴム組成物はその低発熱性が向上するが、後述の含水ケイ酸を配合することによってゴム組成物での作業性の低下を抑える。
<Modified conjugated diene polymer>
The modified conjugated diene polymer of the present invention has at least one functional group.
Further, the functional group of the modified conjugated diene polymer is a functional group selected from the group consisting of a functional group containing nitrogen, a functional group containing silicon, a functional group containing oxygen or sulfur, and a functional group containing a metal. It is preferable.
The modified conjugated diene polymer can have its functional group at the terminal or main chain. In particular, in the case of a terminal functional group, the modified conjugated diene polymer can be formed by using a modification initiator or a modification terminator.
The rubber composition containing the modified conjugated diene polymer is improved in low heat build-up, but the deterioration of workability in the rubber composition is suppressed by blending the hydrous silicic acid described later.
本発明に係る変性共役ジエン系重合体の窒素を含む官能基としては、置換もしくは非置換のアミノ基、アミド残基、イソシアネート基、イミダゾリル基、インドリル基、ニトリル基、ビリジル基、及びケチミン基であることが好ましい。置換もしくは非置換のアミノ基としては、第一アルキルアミン、第二アルキルアミン又は環状アミンあるいは、置換もしくは非置換のイミンから誘導されるアミノ基が挙げられる。
置換もしくは非置換のアミノ基としては、下記式(I)で表される置換アミノ基又は下記式(II)で表される環状アミノ基であることが、更に好ましい。
The functional group containing nitrogen of the modified conjugated diene polymer according to the present invention includes a substituted or unsubstituted amino group, an amide residue, an isocyanate group, an imidazolyl group, an indolyl group, a nitrile group, a biridyl group, and a ketimine group. Preferably there is. Examples of the substituted or unsubstituted amino group include primary alkylamines, secondary alkylamines, cyclic amines, and amino groups derived from substituted or unsubstituted imines.
The substituted or unsubstituted amino group is more preferably a substituted amino group represented by the following formula (I) or a cyclic amino group represented by the following formula (II).
具体的には、トリメチレン基、テトラメチレン基、ヘキサメチレン基、オキシジエチレン基、N−アルキルアザジエチレン基、ドデカメチレン基、及びヘキサデカメチレン基等が好ましい。
Specifically, a trimethylene group, a tetramethylene group, a hexamethylene group, an oxydiethylene group, an N-alkylazadiethylene group, a dodecamethylene group, a hexadecamethylene group, and the like are preferable.
また、本発明に係る変性共役ジエン系重合体の珪素を含む官能基としては、有機シリル基、又はシロキシ基あることが好ましく、より詳細には、アルコキシシリル基、アルキルハロシリル基、シロキシ基、アルキルアミノシリル基、及びアルコキシハロシリル基からなる群から選択された官能基であることが好ましい。
そして、本発明に係る変性共役ジエン系重合体の酸素又は硫黄を含む官能基が、水酸基、カルボキシル基、エポキシ基、グリシドキシ基、ジグリシジルアミノ基、サイクリックジチアン由来の官能基、エステル基、アルデヒド基、アルコキシ基、ケトン基、チオカルボキシル基、チオエポキシ基、チオグリシドキシ基、チオジグリシジルアミノ基、チオエステル基、チオアルデヒド基、チオアルコキシ基及びチオケトン基からなる群から選択された官能基であることが好ましい。アルコキシ基として,ペンゾフェノンから誘導されたアルコール由来のアルコキシ基であっても良い。
更に、本発明に係る変性共役ジエン系重合体の金属を含む官能基が、有機金属を含む官能基であることが好ましい。
The functional group containing silicon of the modified conjugated diene polymer according to the present invention is preferably an organic silyl group or a siloxy group, and more specifically, an alkoxysilyl group, an alkylhalosilyl group, a siloxy group, A functional group selected from the group consisting of an alkylaminosilyl group and an alkoxyhalosilyl group is preferred.
And the functional group containing oxygen or sulfur of the modified conjugated diene polymer according to the present invention is a hydroxyl group, a carboxyl group, an epoxy group, a glycidoxy group, a diglycidylamino group, a cyclic dithian-derived functional group, an ester group, It is a functional group selected from the group consisting of an aldehyde group, an alkoxy group, a ketone group, a thiocarboxyl group, a thioepoxy group, a thioglycidoxy group, a thiodiglycidylamino group, a thioester group, a thioaldehyde group, a thioalkoxy group, and a thioketone group. Is preferred. The alkoxy group may be an alcohol-derived alkoxy group derived from benzophenone.
Furthermore, it is preferable that the functional group containing a metal of the modified conjugated diene polymer according to the present invention is a functional group containing an organic metal.
前記有機アルカリ金属化合物等を重合開始剤として、アニオン重合により共役ジエン系重合体を製造する方法としては、特に制限はなく、例えば、重合反応に不活性な炭化水素溶媒中で、共役ジエン化合物単独で、又は共役ジエン化合物と芳香族ビニル化合物との混合物を重合させることで共役ジエン系重合体を製造することができる。ここで、重合反応に不活性な炭化水素溶媒としては、プロパン、n−ブタン、イソブタン、n−ペンタン、イソペンタン、n−ヘキサン、シクロヘキサン、プロペン、1−ブテン、イソブテン、トランス−2−ブテン、シス−2−ブテン、1−ペンテン、2−ペンテン、1−ヘキセン、2−ヘキセン、ベンゼン、トルエン、キシレン、エチルベンゼン等が挙げられる。これらは単独で用いてもよく、二種以上を混合して用いてもよい。 The method for producing a conjugated diene polymer by anionic polymerization using the organic alkali metal compound or the like as a polymerization initiator is not particularly limited. For example, in a hydrocarbon solvent inert to the polymerization reaction, the conjugated diene compound alone Alternatively, a conjugated diene polymer can be produced by polymerizing a mixture of a conjugated diene compound and an aromatic vinyl compound. Here, as the hydrocarbon solvent inert to the polymerization reaction, propane, n-butane, isobutane, n-pentane, isopentane, n-hexane, cyclohexane, propene, 1-butene, isobutene, trans-2-butene, cis -2-butene, 1-pentene, 2-pentene, 1-hexene, 2-hexene, benzene, toluene, xylene, ethylbenzene and the like. These may be used alone or in combination of two or more.
前記アニオン重合は、ランダマイザーの存在下で実施してもよい。該ランダマイザーは、共役ジエン化合物のミクロ構造を制御することができ、例えば、単量体としてブタジエンを用いた重合体のブタジエン単位の1,2−結合含量を制御したり、単量体としてスチレンとブタジエンを用いた共重合体のブタジエン単位とスチレン単位とをランダム化する等の作用を有する。前記ランダマイザーとしては、ジメトキシベンゼン、テトラヒドロフラン、ジメトキシエタン、ジエチレングリコールジブチルエーテル、ジエチレングリコールジメチルエーテル、ビステトラヒドロフリルプロパン、トリエチルアミン、ピリジン、N−メチルモルホリン、N,N,N’,N’−テトラメチルエチレンジアミン、1,2−ジピペリジノエタン、カリウム−t−アミレート、カリウム−t−ブトキシド、ナトリウム−t−アミレート等が挙げられる。これらランダマイザーの使用量は、重合開始剤の有機アルカリ金属化合物1モル当り0.01〜100モル当量の範囲が好ましい。 The anionic polymerization may be performed in the presence of a randomizer. The randomizer can control the microstructure of the conjugated diene compound. For example, the randomizer can control the 1,2-bond content of a butadiene unit in a polymer using butadiene as a monomer, or can be styrene as a monomer. And butadiene units of a copolymer using butadiene are randomized. Examples of the randomizer include dimethoxybenzene, tetrahydrofuran, dimethoxyethane, diethylene glycol dibutyl ether, diethylene glycol dimethyl ether, bistetrahydrofurylpropane, triethylamine, pyridine, N-methylmorpholine, N, N, N ′, N′-tetramethylethylenediamine, 1 , 2-dipiperidinoethane, potassium t-amylate, potassium t-butoxide, sodium t-amylate and the like. The amount of these randomizers used is preferably in the range of 0.01 to 100 molar equivalents per mole of the organic alkali metal compound as the polymerization initiator.
前記アニオン重合は、溶液重合、気相重合、バルク重合のいずれで実施してもよいが、溶液重合の場合、溶液中の前記単量体の濃度は、5〜50質量%の範囲が好ましく、10〜30質量%の範囲が更に好ましい。なお、単量体として、共役ジエン化合物と芳香族ビニル化合物を併用する場合、単量体混合物中の芳香族ビニル化合物の含有率は、3〜50質量%の範囲が好ましく、4〜45質量%の範囲が更に好ましい。また、重合形式は特に限定されず、回分式でも連続式でもよい。 The anionic polymerization may be performed by any of solution polymerization, gas phase polymerization, and bulk polymerization. In the case of solution polymerization, the concentration of the monomer in the solution is preferably in the range of 5 to 50% by mass, A range of 10 to 30% by mass is more preferable. In addition, when using together a conjugated diene compound and an aromatic vinyl compound as a monomer, the content rate of the aromatic vinyl compound in a monomer mixture has the preferable range of 3-50 mass%, and 4-45 mass%. The range of is more preferable. Further, the polymerization mode is not particularly limited, and may be batch type or continuous type.
前記アニオン重合の重合温度は、0〜150℃の範囲が好ましく、20〜130℃の範囲が更に好ましい。また、該重合は、発生圧力下で実施できるが、通常は、使用する単量体を実質的に液相に保つのに十分な圧力下で行うことが好ましい。ここで、重合反応を発生圧力より高い圧力下で実施する場合、反応系を不活性ガスで加圧することが好ましい。また、重合に使用する単量体、重合開始剤、溶媒等の原材料は、水、酸素、二酸化炭素、プロトン性化合物等の反応阻害物質を予め除去したものを用いることが好ましい。 The polymerization temperature of the anionic polymerization is preferably in the range of 0 to 150 ° C, more preferably in the range of 20 to 130 ° C. The polymerization can be carried out under a generated pressure, but it is usually preferred to carry out the polymerization under a pressure sufficient to keep the monomer used in a substantially liquid phase. Here, when the polymerization reaction is carried out under a pressure higher than the generated pressure, it is preferable to pressurize the reaction system with an inert gas. Moreover, it is preferable to use what removed reaction-inhibiting substances, such as water, oxygen, a carbon dioxide, and a protic compound, as raw materials, such as a monomer used for superposition | polymerization, a polymerization initiator, and a solvent.
一方、配位重合で活性末端を有する共役ジエン系重合体を製造する場合、重合開始剤としては、希土類金属化合物を用いるのが好ましく、下記(a)成分、(b)成分、(c)成分を組み合わせて用いることが更に好ましい。 On the other hand, when producing a conjugated diene polymer having an active terminal by coordination polymerization, it is preferable to use a rare earth metal compound as the polymerization initiator, and the following (a) component, (b) component, (c) component More preferably, these are used in combination.
前記配位重合に用いる(a)成分は、希土類金属化合物、及び希土類金属化合物とルイス塩基との錯化合物等から選択される。ここで、希土類金属化合物としては、希土類元素のカルボン酸塩、アルコキサイド、β−ジケトン錯体、リン酸塩及び亜リン酸塩等が挙げられ、ルイス塩基としては、アセチルアセトン、テトラヒドロフラン、ピリジン、N,N−ジメチルホルムアミド、チオフェン、ジフェニルエーテル、トリエチルアミン、有機リン化合物、1価又は2価のアルコール等が挙げられる。前記希土類金属化合物の希土類元素としては、ランタン、ネオジム、プラセオジム、サマリウム、ガドリニウムが好ましく、これらの中でも、ネオジムが特に好ましい。また、(a)成分として、具体的には、ネオジムトリ−2−エチルヘキサノエート,それとアセチルアセトンとの錯化合物,ネオジムトリネオデカノエート,それとアセチルアセトンとの錯化合物,ネオジムトリn−ブトキシド等が挙げられる。これら(a)成分は一種単独で用いても、二種以上を混合して用いてもよい。 The component (a) used for the coordination polymerization is selected from a rare earth metal compound, a complex compound of a rare earth metal compound and a Lewis base, and the like. Here, examples of rare earth metal compounds include rare earth element carboxylates, alkoxides, β-diketone complexes, phosphates and phosphites, and Lewis bases include acetylacetone, tetrahydrofuran, pyridine, N, N. -Dimethylformamide, thiophene, diphenyl ether, triethylamine, an organic phosphorus compound, monovalent or divalent alcohol, etc. are mentioned. As the rare earth element of the rare earth metal compound, lanthanum, neodymium, praseodymium, samarium and gadolinium are preferable, and among these, neodymium is particularly preferable. Specific examples of the component (a) include neodymium tri-2-ethylhexanoate, complex compounds thereof with acetylacetone, neodymium trineodecanoate, complex compounds thereof with acetylacetone, neodymium tri-n-butoxide, and the like. It is done. These (a) components may be used individually by 1 type, or 2 or more types may be mixed and used for them.
前記配位重合に用いる(b)成分は、有機アルミニウム化合物から選択される。該有機アルミニウム化合物として、具体的には、式:R9 3Alで表されるトリヒドロカルビルアルミニウム化合物、式:R9 2AlH又はR9AlH2で表されるヒドロカルビルアルミニウム水素化物(式中、R9は、それぞれ独立して炭素数1〜30の炭化水素基である)、炭素数1〜30の炭化水素基をもつヒドロカルビルアルミノキサン化合物等が挙げられる。該有機アルミニウム化合物として、具体的には、トリアルキルアルミニウム,ジアルキルアルミニウムヒドリド,アルキルアルミニウムジヒドリド,アルキルアルミノキサン等が挙げられる。これらの化合物は一種単独で用いても、二種以上を混合して用いてもよい。なお、(b)成分としては、アルミノキサンと他の有機アルミニウム化合物とを併用するのが好ましい。 The component (b) used for the coordination polymerization is selected from organoaluminum compounds. Specifically, as the organoaluminum compound, a trihydrocarbyl aluminum compound represented by the formula: R 9 3 Al, a hydrocarbyl aluminum hydride represented by the formula: R 9 2 AlH or R 9 AlH 2 (in the formula, R 9 is each independently a hydrocarbon group having 1 to 30 carbon atoms), hydrocarbylaluminoxane compounds having a hydrocarbon group having 1 to 30 carbon atoms, and the like. Specific examples of the organoaluminum compound include trialkylaluminum, dialkylaluminum hydride, alkylaluminum dihydride, alkylaluminoxane, and the like. These compounds may be used alone or in combination of two or more. In addition, as (b) component, it is preferable to use aluminoxane and another organoaluminum compound together.
前記配位重合に用いる(c)成分は、加水分解可能なハロゲンを有する化合物又はこれらとルイス塩基の錯化合物;三級アルキルハライド、ベンジルハライド又はアリルハライドを有する有機ハロゲン化物;非配位性アニオン及び対カチオンからなるイオン性化合物等から選択される。かかる(c)成分として、具体的には、アルキルアルミニウム二塩化物、ジアルキルアルミニウム塩化物、四塩化ケイ素、四塩化スズ、塩化亜鉛とアルコール等のルイス塩基との錯体、塩化マグネシウムとアルコール等のルイス塩基との錯体、塩化ベンジル,塩化t−ブチル,臭化ベンジル,臭化t−ブチル、トリフェニルカルボニウムテトラキス(ペンタフルオロフェニル)ボレート等が挙げられる。これら(c)成分は一種単独で用いても、二種以上を混合して用いてもよい。 The component (c) used in the coordination polymerization is a compound having a hydrolyzable halogen or a complex compound thereof with a Lewis base; an organic halide having a tertiary alkyl halide, benzyl halide or allyl halide; a non-coordinating anion And an ionic compound comprising a counter cation. Specific examples of the component (c) include alkylaluminum dichloride, dialkylaluminum chloride, silicon tetrachloride, tin tetrachloride, complexes of zinc chloride with Lewis bases such as alcohol, magnesium chloride and Lewis such as alcohol. Examples thereof include a complex with a base, benzyl chloride, t-butyl chloride, benzyl bromide, t-butyl bromide, triphenylcarbonium tetrakis (pentafluorophenyl) borate and the like. These (c) components may be used individually by 1 type, or 2 or more types may be mixed and used for them.
前記重合開始剤は、前記の(a),(b),(c)成分以外に、必要に応じて、重合用単量体と同じ共役ジエン化合物及び/又は非共役ジエン化合物を用いて予備的に調製してもよい。また、(a)成分又は(c)成分の一部又は全部を不活性な固体上に担持して用いてもよい。前記各成分の使用量は、適宜設定することができるが、通常、(a)成分は単量体100g当たり0.001〜0.5mmolである。また、モル比で(b)成分/(a)成分は5〜1000、(c)成分/(a)成分は0.5〜10の範囲が好ましい。 In addition to the components (a), (b), and (c), the polymerization initiator is preliminarily used by using the same conjugated diene compound and / or non-conjugated diene compound as the polymerization monomer, if necessary. May be prepared. Further, part or all of the component (a) or the component (c) may be supported on an inert solid. Although the usage-amount of each said component can be set suitably, Usually, (a) component is 0.001-0.5 mmol per 100g of monomers. The molar ratio (b) component / (a) component is preferably 5 to 1000, and (c) component / (a) component is preferably 0.5 to 10.
前記配位重合における重合温度は、−80〜150℃の範囲が好ましく、−20〜120℃の範囲が更に好ましい。また、配位重合に用いる溶媒としては、上述のアニオン重合で例示した反応に不活性な炭化水素溶媒を用いることができ、反応溶液中の単量体の濃度もアニオン重合の場合と同様である。更に、配位重合における反応圧力もアニオン重合の場合と同様であり、反応に使用する原材料も、水、酸素、二酸化炭素、プロトン性化合物等の反応阻害物質を実質的に除去したものが望ましい。 The polymerization temperature in the coordination polymerization is preferably in the range of −80 to 150 ° C., and more preferably in the range of −20 to 120 ° C. Moreover, as a solvent used for coordination polymerization, a hydrocarbon solvent inert to the reaction exemplified in the above-mentioned anionic polymerization can be used, and the concentration of the monomer in the reaction solution is the same as in the case of anionic polymerization. . Furthermore, the reaction pressure in coordination polymerization is the same as that in the case of anionic polymerization, and it is desirable that the raw material used for the reaction substantially removes reaction inhibitors such as water, oxygen, carbon dioxide, and protic compounds.
本発明に係る変性共役ジエン系重合体を製造する方法としては、上述のように製造された活性末端を有する共役ジエン系重合体の活性末端を変性剤で変性する方法、上述のようにリチウムアミド化合物等の変性基含有重合開始剤を用いて重合開始側の末端を変性する方法、共役ジエン系重合体の活性末端を変性剤で変性(第1段変性)した後に更にその変性基と変性剤とを反応させる多段変性の方法、共役ジエン系重合体の主鎖中もしくは側鎖中に変性剤をグラフトさせる方法及び共役ジエン系重合体の重合時に官能基含有モノマーと共重合する方法等が挙げられる。 The method for producing the modified conjugated diene polymer according to the present invention includes a method in which the active terminal of the conjugated diene polymer having an active terminal produced as described above is modified with a modifier, and a lithium amide as described above. A method for modifying the terminal on the polymerization initiation side using a modifying group-containing polymerization initiator such as a compound, and modifying the active end of the conjugated diene polymer with a modifying agent (first-stage modification) and further modifying the modifying group and the modifying agent For example, a method of multistage modification in which a conjugated diene polymer is reacted, a method of grafting a modifier in the main chain or side chain of a conjugated diene polymer, and a method of copolymerizing with a functional group-containing monomer during polymerization of the conjugated diene polymer. It is done.
本発明に係る変性共役ジエン系重合体を製造するために、上述のように製造された活性末端を有する共役ジエン系重合体の活性末端を変性剤で変性する場合、変性剤としては、窒素含有化合物、ケイ素含有化合物、酸素又は硫黄含有化合物、スズ含有化合物等を用いることができる。 In order to produce the modified conjugated diene polymer according to the present invention, when modifying the active end of the conjugated diene polymer having an active end produced as described above with a modifier, the modifier contains nitrogen. A compound, a silicon-containing compound, an oxygen or sulfur-containing compound, a tin-containing compound, or the like can be used.
前記変性剤として用いることができる窒素含有化合物としては、ビス(ジエチルアミノ)ベンゾフェノン、ジメチルイミダゾリジノン、N−メチルピロリドン、4−ジメチルアミノベンジリデンアニリン等が挙げられる。これらの窒素含有化合物を変性剤として用いることで、置換及び非置換のアミノ基、アミド残基、イミダゾリル基、インドリル基、ニトリル基、ピリジル基、ケチミン基等の窒素を含む官能基を共役ジエン系重合体に導入することができる。ケチミン基、即ち、ケチミン構造(−N=CR1R2)を有するアミノ基は、マスクされたアミノ基であり、そのままでは第一アミンとしての性質を示さないが、空気中の水分等により極めて容易に加水分解されケトン化合物が脱離することにより活性な第一アミンが再生する。 Nitrogen-containing compounds that can be used as the modifier include bis (diethylamino) benzophenone, dimethylimidazolidinone, N-methylpyrrolidone, 4-dimethylaminobenzylideneaniline, and the like. By using these nitrogen-containing compounds as modifiers, substituted and unsubstituted amino groups, amide residues, imidazolyl groups, indolyl groups, nitrile groups, pyridyl groups, ketimine groups and other functional groups containing nitrogen can be conjugated dienes. It can be introduced into the polymer. A ketimine group, that is, an amino group having a ketimine structure (—N═CR 1 R 2 ) is a masked amino group, and does not exhibit the properties as a primary amine as it is. It is easily hydrolyzed and the ketone compound is eliminated to regenerate the active primary amine.
また、前記変性剤として用いることができるケイ素含有化合物としては、ヒドロカルビルオキシシラン化合物が好ましく、下記式(III)、
又は式:R6 p−Si−(OR7)4−p・・・(IV)で表されるヒドロカルビルオキシシラン化合物からなる群から選択される少なくとも一種以上のヒドロカルビルオキシシラン化合物が更に好ましい。
Alternatively, at least one hydrocarbyloxysilane compound selected from the group consisting of hydrocarbyloxysilane compounds represented by the formula: R 6 p -Si- (OR 7 ) 4-p (IV) is more preferable.
式中、A1は(チオ)エポキシ基、(チオ)インシアネート基、(チオ)ケトン、(チオ)アルデヒド基、イミン残基、アミド残基、イソシアヌル酸トリエステル残基、(チオ)カルボン酸ヒドロカルビルエステル残基、(チオ)カルボン酸残基の金属塩、カルボン酸無水物残基、カルボン酸ハロゲン化物残基、炭酸ジヒドロカルビルエステル残基、環状第二アミン残基、非環状第二アミン残基、ピリジン基、及びシラザン基の中から選ばれる少なくとも一種の官能基を有する一価の基、あるいはジスルフィド基であり;R3及びR4は、それぞれ独立に炭素数1〜20の一価の脂肪族炭化水素基又は炭素数6〜18の一価の芳香族炭化水素基で;R5は単結合又は炭素数1〜20の二価の不活性炭化水素基であり;nは1〜3の整数であり;OR3が複数ある場合、複数のOR3はたがいに同一でも異なっていてもよく;また分子中には活性プロトン及びオニウム塩は含まれない In the formula, A 1 is (thio) epoxy group, (thio) inocyanate group, (thio) ketone, (thio) aldehyde group, imine residue, amide residue, isocyanuric acid triester residue, (thio) carboxylic acid Hydrocarbyl ester residue, metal salt of (thio) carboxylic acid residue, carboxylic acid anhydride residue, carboxylic acid halide residue, carbonic acid dihydrocarbyl ester residue, cyclic secondary amine residue, acyclic secondary amine residue A monovalent group having at least one functional group selected from a group, a pyridine group, and a silazane group, or a disulfide group; R 3 and R 4 are each independently a monovalent group having 1 to 20 carbon atoms. An aliphatic hydrocarbon group or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms; R 5 is a single bond or a divalent inert hydrocarbon group having 1 to 20 carbon atoms; Is an integer Ri; If OR 3 there are a plurality or different and a plurality of OR 3 in mutually identical; does not include active proton and onium salt is also in the molecule
また、A1における官能基の中で、イミン残基はケチミン基、アルジミン残基、アミジン基を包含し、(チオ)カルボン酸エステル基は、アクリレート残基やメタクリレート残基等の不飽和カルボン酸エステル残基を包含する。また、(チオ)カルボン酸残基の金属塩の金属としては、アルカリ金属、アルカリ土類金属、Al、Sn、Zn等を挙げることができる。 Further, among the functional groups in A 1, imine residue ketimine group, include aldimine residue, an amidine group, (thio) carboxylic acid ester groups, acrylate residues and methacrylates unsaturated carboxylic acid residues such as Includes ester residues. Examples of the metal of the metal salt of the (thio) carboxylic acid residue include alkali metals, alkaline earth metals, Al, Sn, and Zn.
R3及びR4としては、炭素数1〜20のアルキル基,炭素数2〜18のアルケニル基,炭素数6〜18のアリール基,炭素数7〜18のアラルキル基等が挙げられる。ここで、前記アルキル基及びアルケニル基は、直鎖状,枝分かれ状,環状のいずれであってもよく、例えば、メチル基,エチル基,n−プロピル基,イソプロピル基,n−ブチル基,イソブチル基,sec−ブチル基,tert−ブチル基,ペンチル基,ヘキシル基,オクチル基,デシル基,ドデシル基,シクロペンチル基,シクロヘキシル基,ビニル基,プロぺニル基,アリル基,ヘキセニル基,オクテニル基,シクロペンテニル基,シクロヘキセニル基等が挙げられる。また、前記アリール基は、芳香環上に低級アルキル基等の置換基を有していてもよく、例えば、フェニル基,トリル基,キシリル基,ナフチル基等が挙げられる。更に、前記アラルキル基は、芳香環上に低級アルキル基等の置換基を有していてもよく、例えば、ベンジル基,フェネチル基,ナフチルメチル基等が挙げられる。 Examples of R 3 and R 4 include an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms, and an aralkyl group having 7 to 18 carbon atoms. Here, the alkyl group and alkenyl group may be linear, branched, or cyclic, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group. , Sec-butyl, tert-butyl, pentyl, hexyl, octyl, decyl, dodecyl, cyclopentyl, cyclohexyl, vinyl, propenyl, allyl, hexenyl, octenyl, cyclo A pentenyl group, a cyclohexenyl group, etc. are mentioned. The aryl group may have a substituent such as a lower alkyl group on the aromatic ring, and examples thereof include a phenyl group, a tolyl group, a xylyl group, and a naphthyl group. Furthermore, the aralkyl group may have a substituent such as a lower alkyl group on the aromatic ring, and examples thereof include a benzyl group, a phenethyl group, and a naphthylmethyl group.
R5の内の炭素数1〜20の二価の不活性炭化水素基としては、炭素数1〜20のアルキレン基が好ましい。該アルキレン基は、直鎖状,枝分かれ状,環状のいずれであってもよいが、特に直鎖状のものが好適である。該直鎖状アルキレン基としては、メチレン基,エチレン基,トリメチレン基,テトラメチレン基,ペンタメチレン基,ヘキサメチレン基,オクタメチレン基,デカメチレン基,ドデカメチレン基等が挙げられる。 The divalent inert hydrocarbon group having 1 to 20 carbon atoms in R 5 is preferably an alkylene group having 1 to 20 carbon atoms. The alkylene group may be linear, branched or cyclic, but a linear one is particularly preferable. Examples of the linear alkylene group include a methylene group, an ethylene group, a trimethylene group, a tetramethylene group, a pentamethylene group, a hexamethylene group, an octamethylene group, a decamethylene group, and a dodecamethylene group.
式(III)で表されるヒドロカルビルオキシシラン化合物としては、例えば、(チオ)エポキシ基含有ヒドロカルビルオキシシラン化合物として、2−グリシドキシエチルトリメトキシシラン、2−グリシドキシエチルトリエトキシシラン、(2−グリシドキシエチル)メチルジメトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、(3−グリシドキシプロピル)メチルジメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチル(メチル)ジメトキシシラン及びこれらの化合物におけるエポキシ基をチオエポキシ基に置き換えたものを挙げることができるが、これらの中でも、3−グリシドキシプロピルトリメトキシシラン及び3−グリシドキシプロピルトリエトキシシランが特に好ましい。 Examples of the hydrocarbyloxysilane compound represented by the formula (III) include, for example, (thio) epoxy group-containing hydrocarbyloxysilane compounds such as 2-glycidoxyethyltrimethoxysilane, 2-glycidoxyethyltriethoxysilane, ( 2-glycidoxyethyl) methyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, (3-glycidoxypropyl) methyldimethoxysilane, 2- (3,4- Epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyl (methyl) dimethoxysilane and epoxy compounds in these compounds as thioepoxy groups Replacement There may be mentioned a was, among these, 3-glycidoxypropyltrimethoxysilane and 3-glycidoxypropyl triethoxysilane are particularly preferred.
また、イミン基含有ヒドロカルビルオキシシラン化合物として、N−(1,3−ジメチルブチリデン)−3−(トリエトキシシリル)−1−プロパンアミン,N−(1−メチルエチリデン)−3−(トリエトキシシリル)−1−プロパンアミン,N−エチリデン−3−(トリエトキシシリル)−1−プロパンアミン,N−(1−メチルプロピリデン)−3−(トリエトキシシリル)−1−プロパンアミン,N−(4−N,N−ジメチルアミノベンジリデン)−3−(トリエトキシシリル)−1−プロパンアミン,N−(シクロヘキシリデン)−3−(トリエトキシシリル)−1−プロパンアミン及びこれらのトリエトキシシリル化合物に対応するトリメトキシシリル化合物,メチルジエトキシシリル化合物,エチルジエトキシシリル化合物,メチルジメトキシシリル化合物,エチルジメトキシシリル化合物等を挙げることができるが、これらの中でも、N−(1−メチルプロピリデン)−3−(トリエトキシシリル)−1−プロパンアミン及びN−(1,3−ジメチルブチリデン)−3−(トリエトキシシリル)−1−プロパンアミンが特に好ましい。 Further, as the imine group-containing hydrocarbyloxysilane compound, N- (1,3-dimethylbutylidene) -3- (triethoxysilyl) -1-propanamine, N- (1-methylethylidene) -3- (triethoxy Silyl) -1-propanamine, N-ethylidene-3- (triethoxysilyl) -1-propanamine, N- (1-methylpropylidene) -3- (triethoxysilyl) -1-propanamine, N- (4-N, N-dimethylaminobenzylidene) -3- (triethoxysilyl) -1-propanamine, N- (cyclohexylidene) -3- (triethoxysilyl) -1-propanamine and their triethoxy Trimethoxysilyl compounds corresponding to silyl compounds, methyldiethoxysilyl compounds, ethyldiethoxysilyl compounds, Examples thereof include tildimethoxysilyl compounds and ethyldimethoxysilyl compounds. Among these, N- (1-methylpropylidene) -3- (triethoxysilyl) -1-propanamine and N- (1,3 -Dimethylbutylidene) -3- (triethoxysilyl) -1-propanamine is particularly preferred.
また、アミジンの部分構造含有化合物としては、1−[3−(トリエトキシシリル)プロピル]−4,5−ジヒドロイミダゾール,1−[3−(トリメトキシシリル)プロピル]−4,5−ジヒドロイミダゾール,N−(3−トリエトキシシリルプロピル)−4,5−ジヒドロイミダゾール,N−(3−イソプロポキシシリルプロピル)−4,5−ジヒドロイミダゾール,N−(3−メチルジエトキシシリルプロピル)−4,5−ジヒドロイミダゾール等が挙げられ、これらの中でも、N−(3−トリエトキシシリルプロピル)−4,5−ジヒドロイミダゾールが好ましい。 Examples of the amidine partial structure-containing compound include 1- [3- (triethoxysilyl) propyl] -4,5-dihydroimidazole, 1- [3- (trimethoxysilyl) propyl] -4,5-dihydroimidazole. , N- (3-triethoxysilylpropyl) -4,5-dihydroimidazole, N- (3-isopropoxysilylpropyl) -4,5-dihydroimidazole, N- (3-methyldiethoxysilylpropyl) -4 , 5-dihydroimidazole and the like. Among these, N- (3-triethoxysilylpropyl) -4,5-dihydroimidazole is preferable.
更に、その他のヒドロカルビルオキシシラン化合物として、以下のものを挙げることができる。即ち、カルボン酸エステル基含有化合物としては、3−メタクリロイロキシプロピルトリエトキシシラン、3−メタクリロイロキシプロピルトリメトキシシラン、3−メタクリロイロキシプロピルメチルジエトキシシラン、3−メタクリロイロキシプロピルトリイソプロポキシシランなどが挙げられ、これらの中でも、3−メタクリロイロキシプロピルトリメトキシシランが好ましい。 Furthermore, the following can be mentioned as another hydrocarbyl oxysilane compound. That is, examples of the carboxylic acid ester group-containing compound include 3-methacryloyloxypropyltriethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropylmethyldiethoxysilane, and 3-methacryloyloxypropyltriisosilane. Examples thereof include propoxysilane, and among these, 3-methacryloyloxypropyltrimethoxysilane is preferable.
また、イソシアネート基含有化合物としては、3−イソシアナトプロピルトリメトキシシラン、3−イソシアナトプロピルトリエトキシシラン、3−イソシアナトプロピルメチルジエトキシシラン、3−イソシアナトプロピルトリイソプロポキシシランなどが挙げられ、これらの中でも、3−イソシアナトプロピルトリエトキシシランが好ましい。 Examples of the isocyanate group-containing compound include 3-isocyanatopropyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-isocyanatopropylmethyldiethoxysilane, and 3-isocyanatopropyltriisopropoxysilane. Of these, 3-isocyanatopropyltriethoxysilane is preferred.
更に、カルボン酸無水物含有化合物としては、3−トリエトキシシリルプロピルコハク酸無水物、3−トリメトキシシリルプロピルコハク酸無水物、3−メチルジエトキシシリルプロピルコハク酸無水物等が挙げられ、これらの中でも、3−トリエトキシシリルプロピルコハク酸無水物が好ましい。 Furthermore, examples of the carboxylic acid anhydride-containing compound include 3-triethoxysilylpropyl succinic anhydride, 3-trimethoxysilylpropyl succinic anhydride, 3-methyldiethoxysilylpropyl succinic anhydride, and the like. Among these, 3-triethoxysilylpropyl succinic anhydride is preferable.
シラザン含有アルコキシシラン化合物としては、例えば、N、N−ビス(トリメチルシリル)アミノプロピルメチルジメトキシシラン、1−トリメチルシリル−2、2−ジメトキシ−1−アザ−2−シラシクロペンタン、N、N−ビス(トリメチルシリル)アミノプロピルトリメトキシシラン、N、N−ビス(トリメチルシリル)アミノプロピルトリエトキシシラン、N、N−ビス(トリメチルシリル)アミノプロピルメチルジエトキシシラン、N、N−ビス(トリメチルシリル)アミノエチルトリメトキシシラン、N、N−ビス(トリメチルシリル)アミノエチルトリエトキシシラン、N、N−ビス(トリメチルシリル)アミノエチルメチルジメトキシシラン、及びN、N−ビス(トリメチルシリル)アミノエチルメチルジエトキシシラン等が挙げられる。好ましくは、N、N−ビス(トリメチルシリル)アミノプロピルトリエトキシシラン、N、N−ビス(トリメチルシリル)アミノプロピルメチルジエトキシシラン、又は1−トリメチルシリル−2、2−ジメトキシ−1−アザ−2−シラシクロペンタンである。 Examples of the silazane-containing alkoxysilane compound include N, N-bis (trimethylsilyl) aminopropylmethyldimethoxysilane, 1-trimethylsilyl-2,2-dimethoxy-1-aza-2-silacyclopentane, N, N-bis ( Trimethylsilyl) aminopropyltrimethoxysilane, N, N-bis (trimethylsilyl) aminopropyltriethoxysilane, N, N-bis (trimethylsilyl) aminopropylmethyldiethoxysilane, N, N-bis (trimethylsilyl) aminoethyltrimethoxysilane N, N-bis (trimethylsilyl) aminoethyltriethoxysilane, N, N-bis (trimethylsilyl) aminoethylmethyldimethoxysilane, and N, N-bis (trimethylsilyl) aminoethylmethyldiethoxysilane And the like. Preferably, N, N-bis (trimethylsilyl) aminopropyltriethoxysilane, N, N-bis (trimethylsilyl) aminopropylmethyldiethoxysilane, or 1-trimethylsilyl-2,2-dimethoxy-1-aza-2-sila Cyclopentane.
式中、R6及びR7は、それぞれ独立して炭素数1〜20の一価の脂肪族炭化水素基又は炭素数6〜18の一価の芳香族炭化水素基であり;pは0〜2の整数であり;R6及びOR7がそれぞれ複数ある場合、複数のR6及びOR7はそれぞれたがいに同一でも異なっていてもよく;また分子中には活性プロトン及びオニウム塩は含まれない。 In the formula, R 6 and R 7 are each independently a monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms; It is 2 integer; if R 6 and oR 7 there are a plurality of each, or different in a plurality of R 6 and oR 7 on each mutually identical; in addition the molecule does not include active proton and an onium salt .
式(IV)で表されるヒドロカルビルオキシシラン化合物としては、例えば、テトラメトキシシラン、テトラエトキシシラン、テトラ−n−プロポキシシラン、テトライソプロポキシシラン、テトラ−n−ブトキシシラン、テトライソブトキシシラン、テトラ−sec−ブトキシシラン、テトラ−tert−ブトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリプロポキシシラン、メチルトリイソプロポキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、プロピルトリエトキシシラン、ブチルトリメトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、ジメチルジメトキシシラン、メチルフェニルジメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ジビニルジメトキシシラン、ジビニルジエトキシシラン等が挙げられ、これらの中でも、テトラエトキシシランが特に好ましい。 Examples of the hydrocarbyloxysilane compound represented by the formula (IV) include tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane, tetraisobutoxysilane, tetra -Sec-butoxysilane, tetra-tert-butoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyltriisopropoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltriethoxysilane, butyl Trimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethyldimethoxysilane, methylphenyldimethoxysilane, vinyltrimethoxysilane, vinyltriethoxy Silane, divinyl dimethoxysilane, divinyl diethoxy silane and the like, and among them, tetraethoxysilane is particularly preferred.
前記ヒドロカルビルオキシシラン化合物は、一種を単独で用いてもよく、二種以上を組み合わせて用いてもよい。また、前記ヒドロカルビルオキシシラン化合物の部分縮合物も用いることができる。 The said hydrocarbyl oxysilane compound may be used individually by 1 type, and may be used in combination of 2 or more type. Moreover, the partial condensate of the said hydrocarbyl oxysilane compound can also be used.
前記変性剤による変性反応は、溶液反応で行うのが好ましく、該溶液中には、重合時に使用した単量体が含まれていてもよい。また、変性反応の反応形式は特に制限されず、バッチ式でも連続式でもよい。更に、変性反応の反応温度は、反応が進行する限り特に限定されず、重合反応の反応温度をそのまま採用してもよい。なお、変性剤の使用量は、共役ジエン系重合体の製造に使用した重合開始剤1molに対し、0.25〜3.0molの範囲が好ましく、0.5〜1.5molの範囲が更に好ましい。 The modification reaction with the modifying agent is preferably performed by a solution reaction, and the solution may contain a monomer used during polymerization. The reaction mode of the modification reaction is not particularly limited, and may be a batch type or a continuous type. Furthermore, the reaction temperature of the modification reaction is not particularly limited as long as the reaction proceeds, and the reaction temperature of the polymerization reaction may be employed as it is. In addition, the usage-amount of modifier | denaturant has the preferable range of 0.25-3.0 mol with respect to 1 mol of polymerization initiators used for manufacture of a conjugated diene polymer, and the range of 0.5-1.5 mol is still more preferable. .
前記変性ジエン系重合体は、示差走査熱量分析計(DSC)で測定したガラス転移点(Tg)が0℃以下であることが好ましい。変性共役ジエン系重合体のガラス転移点が0℃を超えると、ゴム組成物の低発熱性や低温時の特性が悪化する傾向がある。 The modified diene polymer preferably has a glass transition point (Tg) measured by a differential scanning calorimeter (DSC) of 0 ° C. or lower. If the glass transition point of the modified conjugated diene polymer exceeds 0 ° C., the low exothermic property and low temperature characteristics of the rubber composition tend to deteriorate.
本発明のゴム組成物は、ゴム成分として上述の変性ジエン系重合体を含む。ここで、ゴム成分中の該変性ジエン系重合体の含有率は、10質量%以上である。ゴム成分(A)中の変性共役ジエン系重合体の含有率が10質量%未満では、充填剤等の分散性を改良する効果が小さく、ゴム組成物の作業性、低発熱性、破壊特性及び耐摩耗性を改善する効果が小さい。この観点から、20質量%以上が好ましく、30質量%以上が更に好ましい。
なお、本発明のゴム組成物において、前記変性ジエン系重合体以外のゴム成分(A)としては、天然ゴム(NR)の他、未変性のスチレン−ブタジエン共重合体(SBR)、ポリブタジエンゴム(BR)、ポリイソプレンゴム(IR)、ブチルゴム(IIR)、エチレン−プロピレン共重合体等を用いることができ、これらの中でも、天然ゴム及びポリイソプレンゴムが好ましい。これらゴム成分は、1種単独でも、2種以上のブレンドとして用いてもよい。
The rubber composition of the present invention contains the above-described modified diene polymer as a rubber component. Here, the content of the modified diene polymer in the rubber component is 10% by mass or more. When the content of the modified conjugated diene polymer in the rubber component (A) is less than 10% by mass, the effect of improving the dispersibility of the filler and the like is small, and the workability of the rubber composition, low heat build-up, fracture characteristics, and Less effective to improve wear resistance. In this respect, 20% by mass or more is preferable, and 30% by mass or more is more preferable.
In the rubber composition of the present invention, the rubber component (A) other than the modified diene polymer includes natural rubber (NR), unmodified styrene-butadiene copolymer (SBR), polybutadiene rubber ( BR), polyisoprene rubber (IR), butyl rubber (IIR), ethylene-propylene copolymer and the like can be used. Among these, natural rubber and polyisoprene rubber are preferable. These rubber components may be used alone or as a blend of two or more.
<含水ケイ酸>
本発明のゴム組成物は、変性共役ジエン系重合体100質量部に対して含水ケイ酸10〜130質量部を配合するものである。
含水ケイ酸は、セチルトリメチルアンモニウムブロマイド(以下、CTABという。)の吸着表面積が50〜250m2/gの範囲にあり、且つ数式(1):Y<5.00+0.47×Xを満たすものであることを特徴としている。ここで、数式中のYは温度750℃で3時間加熱したときの減少質量%であり、Xは温度105℃で2時間加熱したときの減少質量%である。
数式(1)を満たす含水ケイ酸は、表面に吸着した水分量と、表面シラノール基の数とが適度に維持され、かかる含水ケイ酸を配合することで、ゴム組成物の特性を低下させずに、ゴム組成物の未加硫時の粘度を低下させ、ゴム組成物の作業性又は加工性を大幅に向上させることができる。従って、該ゴム 組成物をタイヤ、特にタイヤのトレッドに適用することで、低発熱性のより一層の向上と工場での生産性を両立することができる。
<Hydrosilicate>
The rubber composition of this invention mix | blends 10-130 mass parts of hydrous silicic acids with respect to 100 mass parts of modified conjugated diene polymers.
Hydrous silicic acid has an adsorption surface area of cetyltrimethylammonium bromide (hereinafter referred to as CTAB) in the range of 50 to 250 m 2 / g and satisfies formula (1): Y <5.00 + 0.47 × X. It is characterized by being. Here, Y in the formula is a mass% decreased when heated at a temperature of 750 ° C. for 3 hours, and X is a mass% reduced when heated at a temperature of 105 ° C. for 2 hours.
In the hydrous silicic acid satisfying the mathematical formula (1), the amount of moisture adsorbed on the surface and the number of surface silanol groups are appropriately maintained, and by blending such hydrous silicic acid, the characteristics of the rubber composition are not deteriorated. In addition, the viscosity of the rubber composition when not vulcanized can be reduced, and the workability or processability of the rubber composition can be greatly improved. Therefore, by applying the rubber composition to a tire, particularly a tread of the tire, it is possible to achieve both further improvement of low heat generation and productivity in a factory.
本発明のゴム 組成物に用いる含水ケイ酸は、CTABの吸着比表面積が50〜250m2/gの範囲である。特に、80〜240m2/gであることが好ましい。使用する含水ケイ酸のCTABの吸着比表面積が50m2/g未満では、ゴム組成物の貯蔵弾性率が低下し、また耐摩耗性を確保することができず、250m2/gを超えると、未加硫時のゴム組成物の粘度が上昇して加工性を悪くする。また、前記範囲内にあれば、ゴム組成物の低発熱性及び耐破壊性を更に向上させることができる。 The hydrous silicic acid used for the rubber composition of the present invention has a CTAB adsorption specific surface area of 50 to 250 m 2 / g. In particular, it is preferable that it is 80-240 m < 2 > / g. When the adsorption specific surface area of CTAB of the hydrous silicic acid used is less than 50 m 2 / g, the storage elastic modulus of the rubber composition is lowered and the wear resistance cannot be ensured, and when it exceeds 250 m 2 / g, The viscosity of the rubber composition at the time of unvulcanization increases and the processability deteriorates. Moreover, if it exists in the said range, the low exothermic property and destruction resistance of a rubber composition can be improved further.
また、前記含水ケイ酸は、前記CTABの吸着比表面積と加熱減少量X、Y((%))とが前記数式(1)の関係を満たすことを要する。含水ケイ酸が数式(1)の関係を満たさない場合、ゴム組成物のムーニー粘度が高くなり、ゴム 組成物の加工性が低下する傾向がある。
数式(1)において、105℃で2時間加熱した時の質量減少は、含水ケイ酸に物理吸着した水分の脱離と含水ケイ酸のシラノール基の消滅に起因する。そして、数式(1)の関係を満たす含水ケイ酸は、シラノール基が少ないため、通常のシリカよりも凝集し難い。また、数式(1)の関係を満たす含水ケイ酸は、表面シラノール基と吸着水分のバランスが、変性共役ジエン系重合体の極性基と相互作用するのに最適であるため、変性共役ジエン系重合体に対する分散性が高く、ゴム組成物の低発熱性及び耐破壊性を改善することができる。
Further, the hydrous silicic acid requires that the adsorption specific surface area of the CTAB and the heating reduction amounts X and Y ((%)) satisfy the relationship of the formula (1). When the hydrous silicic acid does not satisfy the relationship of the mathematical formula (1), the Mooney viscosity of the rubber composition increases, and the processability of the rubber composition tends to decrease.
In the formula (1), the mass decrease when heated at 105 ° C. for 2 hours is attributed to the desorption of moisture physically adsorbed on the hydrous silicic acid and the disappearance of the silanol groups of the hydrous silicic acid. And the hydrous silicic acid which satisfy | fills the relationship of Numerical formula (1) has few silanol groups, Therefore It is hard to aggregate than normal silica. In addition, hydrous silicic acid satisfying the relationship of formula (1) is optimal for the balance between surface silanol groups and adsorbed moisture to interact with the polar groups of the modified conjugated diene polymer. The dispersibility with respect to coalescence is high, and the low heat build-up and the fracture resistance of the rubber composition can be improved.
前記含水ケイ酸は、湿式法で含水ケイ酸を製造する際の諸条件を調整することで製造することができ、また、含水ケイ酸としては、シリコーン処理を施した疎水シリカ、熱処理を施したシリカ等を使用することもできる。
本発明のゴム組成物において、前記含水ケイ酸の配合量は、変性共役ジエン系重合体100質量部に対して10〜130質患部の範囲にある。含水ケイ酸の配合量が10質量部未満では、ゴム組成物の補強性が不十分となる場合があり、一方、130質量部を超えると、ゴム組成物の加工性が悪化してくる。
The hydrous silicic acid can be produced by adjusting various conditions when producing the hydrous silicic acid by a wet method, and as the hydrous silicic acid, a silicone-treated hydrophobic silica, heat-treated Silica or the like can also be used.
In the rubber composition of the present invention, the amount of the hydrous silicic acid is in the range of 10 to 130 affected areas with respect to 100 parts by mass of the modified conjugated diene polymer. If the amount of hydrous silicic acid is less than 10 parts by mass, the reinforcing property of the rubber composition may be insufficient. On the other hand, if it exceeds 130 parts by mass, the processability of the rubber composition will deteriorate.
<シランカップリング剤>
本発明のシランカップリング剤は、含水ケイ酸の分散性、変性共役ジエン系重合体との親和性向上のために配合されるが、その配合量は含水ケイ酸に対して1〜20質量部の範囲で配合する。特に5〜10質量部であることが好ましい。シランカップリング剤の配合量が含水ケイ酸に対して1質量部未満ではカップリング剤としての配合効果が十分に発現されず、20質量部を超えて添加しても効果に差異は認められない。
<Silane coupling agent>
The silane coupling agent of the present invention is blended in order to improve the dispersibility of the hydrous silicic acid and the affinity with the modified conjugated diene polymer. In the range of. It is particularly preferably 5 to 10 parts by mass. If the blending amount of the silane coupling agent is less than 1 part by mass with respect to the hydrous silicic acid, the blending effect as a coupling agent is not sufficiently exhibited, and even if it is added in excess of 20 parts by mass, there is no difference in effect. .
シランカップリング剤としては、例えば、ビニルトリエトキシシラン、ビニルトリクロルシラン、γ−メタクリロキシプロピルトリメトキシシラン、ビニルトリス(β−メトキシ−エトキシ)シラン、β−(3,4−エポキシシクロヘキシル)−エチルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、γ−クロロプロピルトリメトキシシラン、γ−メルカプトプロピルトリメトキシシラン、N−(β−アミノエチル)−γ−アミノプロピルトリメトキシシラン、N−フェニル−γ−アミノプロピルトリメトキシシラン、N−(β−アミノエチル)−γ−アミノプロピルメチルジメトキシシラン、γ−アミノプロピルトリエトキシシラン、及びγ−トリメトキシシリルプロピルジメチルチオカルバミルテトラスルフィド、γ−トリメトキシシリルプロピルベンゾチアジルテトラスルフィド、ビス〔3−(トリエトキシシリル)プロピル〕テトラスルフィドなどのテトラスルフィド類などを挙げることができる。 Examples of the silane coupling agent include vinyltriethoxysilane, vinyltrichlorosilane, γ-methacryloxypropyltrimethoxysilane, vinyltris (β-methoxy-ethoxy) silane, β- (3,4-epoxycyclohexyl) -ethyltri. Methoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-chloropropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, N- (β-aminoethyl) -γ -Aminopropyltrimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N- (β-aminoethyl) -γ-aminopropylmethyldimethoxysilane, γ-aminopropyltriethoxysilane, and γ-trimethoxysilyl Propyl di Examples thereof include tetrasulfides such as methylthiocarbamyl tetrasulfide, γ-trimethoxysilylpropylbenzothiazyl tetrasulfide, and bis [3- (triethoxysilyl) propyl] tetrasulfide.
なお、シランカップリング剤としては、窒素及び/又は硫黄原子を含む化学構造のものが、ブチル系ゴムとの親和性の面から好ましく、このようなシランカップリング剤 としては、公知の市販品を用いることができ、例えば、N−(β−アミノエチル)−γ−アミノプロピルトリメトキシシラン、N−(β−アミノエチル)−γ−アミノプロピルメチルジメトキシシラン、N−フェニル−γ−アミノプロピルトリメトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、ビス〔3−(トリエトキシシリル)プロピル〕テトラスルフィド、γ−トリメトキシシリルプロピルベンゾチアジルテトラスルフィドなどのテトラスルフィド類などが挙げられ、特に、ビス(3−トリエトキシシリルプロピル)テトラスルフィド〔デグサ社製「Si69」〕、γ−メルカプトプロピルトリメトキシシラン〔東レダウコーニング社製「SH6062」〕を好適に使用することができる。これらは1種を単独で用いても良く、2種以上を併用しても良い。 As the silane coupling agent, those having a chemical structure containing nitrogen and / or sulfur atoms are preferable from the viewpoint of affinity with butyl rubber, and as such a silane coupling agent, a known commercial product may be used. For example, N- (β-aminoethyl) -γ-aminopropyltrimethoxysilane, N- (β-aminoethyl) -γ-aminopropylmethyldimethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane Tetrasulfides such as methoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, bis [3- (triethoxysilyl) propyl] tetrasulfide, γ-trimethoxysilylpropylbenzothiazyltetrasulfide, etc. In particular, bis (3-triethoxysilylpropyl) Torasurufido [manufactured by Degussa "Si69"], .gamma.-mercaptopropyltrimethoxysilane [manufactured by Dow Corning Toray Co., Ltd. "SH6062"] can be suitably used. These may be used alone or in combination of two or more.
シランカップリング剤は、無機充填剤をシランカップリング剤により表面処理し、この表面処理シリカを配合することによりゴム 組成物に含有させても良く、ゴム組成物調製時に添加することにより配合しても良い。 The silane coupling agent may be added to the rubber composition by surface treatment of the inorganic filler with the silane coupling agent, and by adding this surface-treated silica, or by adding it during preparation of the rubber composition. Also good.
本発明のゴム組成物には、本発明の目的が損なわれない範囲で、所望により、通常ゴム工業界で用いられる各種薬品、例えば加硫剤,加硫促進剤,プロセス油,老化防止剤,スコーチ防止剤,亜鉛華,ステアリン酸などを含有させることができる。前記加硫剤としては、硫黄等が挙げられ、その使用量は、ゴム成分100質量部に対し、硫黄分として0.1〜10.0質量部が好ましく、さらに好ましくは1.0〜5.0質量部である。0.1質量部未満では加硫ゴムの破壊強度、耐摩耗性、低発熱性が低下するおそれがあり、10.0質量部を超えるとゴム弾性が失われる原因となる。本発明で使用できる加硫促進剤は、特に限定されるものではないが、例えば、M(2−メルカプトベンゾチアゾール),DM(ジベンゾチアジルジスルフィド),CZ(N−シクロヘキシル−2−ベンゾチアジルスルフェンアミド)等のチアゾール系、あるいはDPG(ジフェニルグアニジン)等のグアジニン系の加硫促進剤等を挙げることができ、その使用量は、ゴム成分100質量部に対し、0.1〜5.0質量部が好ましく、さらに好ましくは0.2〜3.0質量部である。また、本発明のゴム組成物で使用できるプロセス油としては、例えばパラフィン系,ナフテン系,アロマチック系等を挙げることができる。引張強度、耐摩耗性を重視する用途にはアロマチック系が、ヒステリシスロス、低温特性を重視する用途にはナフテン系又はパラフィン系が用いられる。その使用量は、ゴム成分100質量部に対して、0〜100質量部が好ましく、100質量部を超えると加硫ゴムの引張強度、低発熱性が悪化する傾向がある。 In the rubber composition of the present invention, various chemicals usually used in the rubber industry, for example, vulcanizing agents, vulcanization accelerators, process oils, anti-aging agents, as long as the object of the present invention is not impaired. A scorch inhibitor, zinc white, stearic acid and the like can be contained. Examples of the vulcanizing agent include sulfur, and the amount thereof used is preferably 0.1 to 10.0 parts by mass, more preferably 1.0 to 5. 0 parts by mass. If the amount is less than 0.1 parts by mass, the fracture strength, wear resistance, and low heat build-up of the vulcanized rubber may be reduced. If the amount exceeds 10.0 parts by mass, rubber elasticity is lost. The vulcanization accelerator that can be used in the present invention is not particularly limited. For example, M (2-mercaptobenzothiazole), DM (dibenzothiazyl disulfide), CZ (N-cyclohexyl-2-benzothiazyl). Sulfenamide) and other guanidine-based vulcanization accelerators such as DPG (diphenylguanidine) can be used, and the amount used is 0.1-5. 0 mass part is preferable, More preferably, it is 0.2-3.0 mass part. Examples of the process oil that can be used in the rubber composition of the present invention include paraffinic, naphthenic, and aromatic oils. Aromatics are used for applications that emphasize tensile strength and wear resistance, and naphthenic or paraffinic systems are used for applications that emphasize hysteresis loss and low-temperature characteristics. The amount used is preferably 0 to 100 parts by mass with respect to 100 parts by mass of the rubber component, and if it exceeds 100 parts by mass, the tensile strength and low heat build-up of the vulcanized rubber tend to deteriorate.
本発明のゴム組成物は、ロール、インターナルミキサー等の混練り機を用いて混練りすることによって得られ、成形加工後、加硫を行い、タイヤトレッド,アンダートレッド,カーカス,サイドウォール,ビード部分等のタイヤ部材用途を始め、防振ゴム,ベルト,ホースその他の工業品等の用途にも用いることができるが、特にタイヤトレッド用ゴムとして好適に使用される。
本発明のタイヤは、本発明のゴム組成物を用いて通常の方法によって製造される。すなわち、必要に応じて、前記のように各種薬品を含有させた本発明のゴム組成物が未加硫の段階でトレッド用部材に押出し加工され、タイヤ成形機上で通常の方法により貼り付け成形され、生タイヤが成形される。この生タイヤを加硫機中で加熱加圧して、タイヤが得られる。このようにして得られた本発明のタイヤは、低燃費性、破壊特性及び耐摩耗性に優れており、しかも該ゴム組成物の加工性が良好であるので、生産性にも優れている。
尚、本発明のゴム組成物及びタイヤは、前記した実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々変更を加え得ることは勿論である。
The rubber composition of the present invention is obtained by kneading using a kneader such as a roll or an internal mixer. After molding, vulcanization is performed, and tire tread, under tread, carcass, sidewall, bead It can be used for applications such as anti-vibration rubber, belts, hoses, and other industrial products as well as tire member applications such as parts, but it is particularly preferably used as a rubber for tire treads.
The tire of the present invention is produced by an ordinary method using the rubber composition of the present invention. That is, if necessary, the rubber composition of the present invention containing various chemicals as described above is extruded into a tread member at an unvulcanized stage, and pasted and molded by a usual method on a tire molding machine. A green tire is formed. The green tire is heated and pressed in a vulcanizer to obtain a tire. The tire of the present invention thus obtained is excellent in low fuel consumption, fracture characteristics and wear resistance, and is excellent in productivity because the rubber composition has good processability.
The rubber composition and tire of the present invention are not limited to the above-described embodiments, and it is needless to say that various modifications can be made without departing from the gist of the present invention.
以下、実施例によって本発明をさらに具体的に説明するが、本発明は、これらの実施例によって何ら制限を受けるものではない。
なお、実施例中の各種の測定は下記の方法に拠った。
<変性共役ジエン系重合体等の製造>
変性重合体を下記の如く製造した。
(重合体Aの製造法)
乾燥し、窒素置換した800mLの耐圧ガラス容器に、シクロへキサン300g、1,3−ブタジエン40g、スチレン10g、ジテトラヒドロフリルプロパン0.2mmolを加え、更にリチウムヘキシルアミド[(ジヘキシルアミン/リチウム)=0.9(mol比)でインサイチューにて調整]0.4mmolを加えた後、50℃で1.5時間重合反応を行った。この際の重合転化率は、ほぼ100%であった。次に、重合反応系に、2,6−ジ−t−ブチル−p−クレゾール(BHT)のイソプロパノール溶液(BHT濃度:5質量%)0.5mLを加えて、重合反応を停止させ、更に常法に従って乾燥して重合体Aを得た。
前記のようにして製造した重合体Aの結合スチレン量(芳香族ビニル化合物量
)が20質量%で、ブタジエン部分(共役ジエン化合物部分)のビニル結合量が58質量%でガラス転移点(Tg)が−38℃であった。
EXAMPLES Hereinafter, although an Example demonstrates this invention further more concretely, this invention is not restrict | limited at all by these Examples.
Various measurements in the examples were based on the following methods.
<Production of modified conjugated diene polymer>
A modified polymer was prepared as follows.
(Method for producing polymer A)
To an 800 mL pressure-resistant glass container that has been dried and purged with nitrogen, 300 g of cyclohexane, 40 g of 1,3-butadiene, 10 g of styrene, 0.2 mmol of ditetrahydrofurylpropane, and lithium hexylamide [(dihexylamine / lithium) = Adjusted in situ at 0.9 (mol ratio)] After 0.4 mmol was added, a polymerization reaction was carried out at 50 ° C. for 1.5 hours. The polymerization conversion rate at this time was almost 100%. Next, 0.5 mL of an isopropanol solution (BHT concentration: 5 mass%) of 2,6-di-t-butyl-p-cresol (BHT) is added to the polymerization reaction system to stop the polymerization reaction. The polymer A was obtained by drying according to the method.
The polymer A produced as described above has a bound styrene amount (aromatic vinyl compound amount) of 20% by mass, a butadiene part (conjugated diene compound part) has a vinyl bond amount of 58% by mass and a glass transition point (Tg). Was −38 ° C.
(重合体Bの製造方法)
乾燥し、窒素置換した800mLの耐圧ガラス容器に、シクロへキサン300g、1,3−ブタジエン40g、スチレン10g、ジテトラヒドロフリルプロパン0.2mmolを加え、更にn−ブチルリチウム(n−BuLi)0.4mmolを加えた後、50℃で1.5時間重合反応を行った。この際の重合転化率は、ほぼ100%であった。次に、重合反応系に、変性剤として3−トリエトキシシリル−N−(1,3−ジメチル−ブチリデン)プロピルアミン(信越化学工業株式会社製)を0.43mmol速やかに加え、更に50℃で30分間変性反応を行った。その後、重合反応系に、2,6−ジ−t−ブチル−p−クレゾール(BHT)のイソプロパノール溶液(BHT濃度:5質量%)0.5mLを加えて、重合反応を停止させ、更に常法に従って乾燥して重合体Bを得た。
前記のようにして製造した重合体Bの結合スチレン量(芳香族ビニル化合物量
)が20質量%で、ブタジエン部分(共役ジエン化合物部分)のビニル結合量が59質量%でガラス転移点(Tg)が−35℃であった。
(Method for producing polymer B)
To an 800 mL pressure-resistant glass container that has been dried and purged with nitrogen, 300 g of cyclohexane, 40 g of 1,3-butadiene, 10 g of styrene, 0.2 mmol of ditetrahydrofurylpropane, and n-butyllithium (n-BuLi) 0. After adding 4 mmol, a polymerization reaction was performed at 50 ° C. for 1.5 hours. The polymerization conversion rate at this time was almost 100%. Next, 0.43 mmol of 3-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine (manufactured by Shin-Etsu Chemical Co., Ltd.) is quickly added as a modifier to the polymerization reaction system, and further at 50 ° C. Denaturation reaction was performed for 30 minutes. Thereafter, 0.5 mL of an isopropanol solution (BHT concentration: 5% by mass) of 2,6-di-t-butyl-p-cresol (BHT) was added to the polymerization reaction system to stop the polymerization reaction. To obtain a polymer B.
The polymer B produced as described above has a bonded styrene content (aromatic vinyl compound content) of 20% by mass, a butadiene moiety (conjugated diene compound moiety) has a vinyl bond content of 59% by mass, and a glass transition point (Tg). Was −35 ° C.
(重合体Cの製造方法)
変性剤にN−(3−トリエトキシシリルプロピル)−4,5−ジヒドロイミダゾール(Gelest社製)を用いた以外は製造例2と同様な方法で調製を行い、重合体Cを得た。
前記のようにして製造した重合体Cの結合スチレン量(芳香族ビニル化合物量
)が20質量%で、ブタジエン部分(共役ジエン化合物部分)のビニル結合量が58質量%でガラス転移点(Tg)が−38℃であった。
(Method for producing polymer C)
A polymer C was obtained in the same manner as in Production Example 2 except that N- (3-triethoxysilylpropyl) -4,5-dihydroimidazole (manufactured by Gelest) was used as the modifier.
Polymer C produced as described above has a bonded styrene content (aromatic vinyl compound content) of 20% by mass, a butadiene moiety (conjugated diene compound moiety) has a vinyl bond content of 58% by mass, and a glass transition point (Tg). Was −38 ° C.
(1)数平均分子量(Mn)及び質量平均分子量(Mw)
ゲルパーミエーションクロマトグラフィー[GPC:東ソー製HLC−8020、カラム:東ソー製GMH−XL(2本直列)、検出器:示差屈折率計(RI)]で単分散ポリスチレンを基準として、各重合体のポリスチレン換算の数平均分子量(Mn)及び質量平均分子量(Mw)を求めた。なお、表1には、各重合体の変性 反応前の数平均分子量と、変反応後の質量平均分子量を示す。
(1) Number average molecular weight (Mn) and mass average molecular weight (Mw)
Gel permeation chromatography [GPC: Tosoh HLC-8020, column: Tosoh GMH-XL (two in series), detector: differential refractometer (RI)], based on monodisperse polystyrene, The number average molecular weight (Mn) and mass average molecular weight (Mw) in terms of polystyrene were determined. Table 1 shows the number average molecular weight of each polymer before the modification reaction and the weight average molecular weight after the modification reaction.
(2)ミクロ構造及び結合スチレン量
重合体のミクロ構造を赤外法(モレロ法)で求め、重合体の結合スチレン量を1H−NMRスペクトルの積分比より求めた。
(2) Microstructure and amount of bound styrene The microstructure of the polymer was determined by an infrared method (Morero method), and the amount of bound styrene of the polymer was determined from the integral ratio of the 1H-NMR spectrum.
(3)ガラス転移点
パーキンエルマー社製の示差熱分析機(DSC)7型装置を用い、各重合体を−100℃まで冷却した後に10℃/minの昇温速度で昇温して、各重合体のガラス転移点を測定した。
(3) Glass transition point Using a differential thermal analyzer (DSC) type 7 device manufactured by PerkinElmer, Inc., each polymer was cooled to -100 ° C and then heated at a rate of temperature increase of 10 ° C / min. The glass transition point of the polymer was measured.
<含水ケイ酸の製造例1>
攪拌機を備えた180Lのジャケット付きステンレス反応槽に、水93Lとケイ酸ナトリウム水溶液(SiO2160g/L、SiO2/Na2Oモル比3.3)0.6Lを入れ、96℃に加熱した。生成した溶液中のNa2O濃度は0.05mol/Lであった。この溶液の温度を96度に維持しながら、前記と同様のケイ酸ナトリウム水溶液を540mL/分で、硫酸(18mol/L)を流量24mL/分で同時に滴下した。流量を調整して、反応液中のNa2O濃度を0.00から0,01mol/Lの範囲に維持しながら中和反応を行った。反応途中から反応溶液は白濁をはじめ、50分目に粘度が上昇してゲル状溶液となった。
更に、添加を続けて75分で反応を停止した。生成した溶液中のシリカ濃度は49g/Lであった。引き続き、前記と同様の硫酸を添加して、溶液のpHを3として酸性化を終了し、ケイ酸スラリーを得た。得られたケイ酸スラリーをフィルタープレスで濾過、水洗を行って湿潤ケーキを得、次いで、該湿潤ケーキを乳化装置を用いてスラリーとして、噴霧式乾燥機で乾燥して湿式法含水ケイ酸Aを得た。
<Production Example 1 of Hydrous Silicic Acid>
A 180 L jacketed stainless steel reaction vessel equipped with a stirrer was charged with 93 L of water and 0.6 L of sodium silicate aqueous solution (SiO 2 160 g / L, SiO 2 / Na 2 O molar ratio 3.3) and heated to 96 ° C. . The concentration of Na 2 O in the resulting solution was 0.05 mol / L. While maintaining the temperature of this solution at 96 ° C., the same sodium silicate aqueous solution as described above was simultaneously added dropwise at 540 mL / min and sulfuric acid (18 mol / L) at a flow rate of 24 mL / min. The neutralization reaction was performed while adjusting the flow rate and maintaining the Na2O concentration in the reaction solution in the range of 0.00 to 0.01 mol / L. From the middle of the reaction, the reaction solution began to become cloudy, and the viscosity increased to a gel solution at 50 minutes.
Further, the addition was continued and the reaction was stopped in 75 minutes. The silica concentration in the resulting solution was 49 g / L. Subsequently, sulfuric acid similar to that described above was added to finish the acidification by setting the pH of the solution to 3 to obtain a silicic acid slurry. The obtained silicic acid slurry is filtered with a filter press and washed with water to obtain a wet cake. Then, the wet cake is made into a slurry using an emulsifier and dried with a spray dryer to obtain a wet method hydrous silicic acid A. Obtained.
<含水ケイ酸の評価>
前記のようにして製適した含水ケイ酸のCTAB吸着比表面積並びに加熱減量及び灼熱減量を下記の方法で評価した。また、比較として、東ソー・シリカ(株)社製の含水ケイ酸「NipsilAQ」(商標名)についても評価した。
<Evaluation of hydrous silicic acid>
The CTAB adsorption specific surface area, heat loss and loss on ignition of the hydrous silicic acid suitable for production as described above were evaluated by the following methods. For comparison, hydrous silicic acid “NipsilAQ” (trade name) manufactured by Tosoh Silica Co., Ltd. was also evaluated.
(4)CTAB吸着比表面積の測定
ASTM D3765−92記載の方法に準拠して実施した。但し、ASTM D3765−92記載の方法は、カーボンブラックのCTABを測定する方法であるので、若干の改良を加えた方法とした。
即ち、カーボンブラックの榛準晶であるIRB♯3(83.0m2/g)を使用せず、別途セチルトリメチルアンモニウムブロマイド(CTAB)標準液を調製し、これによって含水ケイ酸OT(ジ−2−エチルへキシルスルホコハク酸ナトリウム)溶液の標定を行い、含水ケイ酸表面に対するCTAB 1分子当たりの吸着断面積を0.35nm2としてCTABの吸着量から比表面積を算出した。これは、カーボンブラックと含水ケイ酸とでは表面が異なるので、同一表面積でもCTABの吸着最に違いがあると考えられるからである。
(4) Measurement of CTAB adsorption specific surface area It was carried out according to the method described in ASTM D3765-92. However, since the method described in ASTM D3765-92 is a method for measuring CTAB of carbon black, it is a method with some improvements.
That is, a cetyltrimethylammonium bromide (CTAB) standard solution was separately prepared without using IRB # 3 (83.0 m 2 / g) which is a carbon black canonical crystal, whereby hydrous silicic acid OT (di-2) was prepared. -Sodium ethylhexylsulfosuccinate) was standardized, and the specific surface area was calculated from the amount of CTAB adsorbed with an adsorption cross-sectional area per molecule of CTAB on the hydrous silicate surface of 0.35 nm 2 . This is because carbon black and hydrous silicic acid have different surfaces, and it is considered that there is a difference in CTAB adsorption even with the same surface area.
(5)加熱減量X及び灼熱減塩Y
含水ケイ酸のサンプルを秤量し、加熱減量Xの場合はサンプルを105℃で2時間加熱し、灼熱減量Yの場合はサンプルを750℃で3時間加熱した後、サンプルの質量を測定し、加熱前のサンプル質量との差を質量減少%とした。
製造した含水ケイ酸及び市販シリカの評価を表1に示した。
(5) Heat loss X and burning loss salt Y
Weigh the hydrous silicic acid sample. In the case of heat loss X, the sample is heated at 105 ° C. for 2 hours. In the case of ignition loss Y, the sample is heated at 750 ° C. for 3 hours, and then the weight of the sample is measured and heated. The difference from the previous sample mass was defined as mass reduction%.
Table 1 shows the evaluation of the produced hydrous silicic acid and the commercially available silica.
次に、下記表3及び表4の配合処方を行って、実施例及び比較例のゴム組成物を処方した。また、かかるゴム組成物を加硫又はゴム組成物をトレッドに使用してタイヤを製造して評価をした。ゴム組成物の損失正接(60℃tanδ)及びML1+4を測定した。結果を表2に示す。 Next, the compounding prescription of following Table 3 and Table 4 was performed, and the rubber composition of an Example and a comparative example was prescribed. Further, the rubber composition was vulcanized or a tire was produced and evaluated using the rubber composition as a tread. The loss tangent (60 ° C. tan δ) and ML 1 + 4 of the rubber composition were measured. The results are shown in Table 2.
(6)損失正接(60℃tanδ)
レオメトリクス社製、メカニカルスペクトロメーターを用いて動的歪1.0%、周波数(振動)15Hzの条件下で60℃におけるtanδを測定した。
表3及び4においては比較例1及び比較例7の値をそれぞれ100として指数表示した。指数値が小さいほど優れている。
損失正接(tanδ)については、指数値が小さい程、低発熱性に優れ、一方、貯蔵弾性率(G’)については、指数値が大きい程、貯蔵弾性率が高いことを示す
(7)ML1+4(130℃)
ムーニー粘度により流動性を評価した。ムーニー粘度は、島津製作所製ムーニー粘度計を使用して、130℃で測定した。試験法は、JIS K6300に準拠して行い、ML1+4(1分予熱後、4分稼動後のムーニー粘度値)を求めた。表3及び4においては比較例1及び比較例7の値をそれぞれ100として指数表示した。指数が小さいほど作業性が良好なことを示す。
(6) Loss tangent (60 ° C. tan δ)
Using a mechanical spectrometer manufactured by Rheometrics, tan δ at 60 ° C. was measured under conditions of a dynamic strain of 1.0% and a frequency (vibration) of 15 Hz.
In Tables 3 and 4, the values of Comparative Example 1 and Comparative Example 7 were each shown as an index, with the value being 100. The smaller the index value, the better.
Regarding the loss tangent (tan δ), the smaller the index value, the better the low exothermic property, while the storage modulus (G ′) indicates that the larger the index value, the higher the storage modulus. (7) ML 1 + 4 (130 ° C)
The fluidity was evaluated by Mooney viscosity. The Mooney viscosity was measured at 130 ° C. using a Mooney viscometer manufactured by Shimadzu Corporation. The test method was performed according to JIS K6300, and ML 1 + 4 (Mooney viscosity value after 1 minute preheating and after 4 minutes operation) was obtained. In Tables 3 and 4, the values of Comparative Example 1 and Comparative Example 7 were each shown as an index, with the value being 100. The smaller the index, the better the workability.
表2、3中の*2:東海カーボン(株)製「シーストKH(N339)(商標)」、*3;デグッサ社製 Si75、*4;N−(1,3−ジメチルブチル)−N’−フェニル−p−フェニレンジアミン大内新興化学工業(株)製 ノクラック6C、*5;ジフェニルグアニジン大内新興化学工業(株)製 ノクセラーD、*6;メルカプトベンゾチアジルジスルフィド大内新興化学工業(株)製 ノクセラーDM、*6;N−t−ブチル−2−ベンゾチアジルスルフェンアミド大内新興化学工業(株)製 ノクセラーNSである。 * 2 in Tables 2 and 3: “Seast KH (N339) (trademark)” manufactured by Tokai Carbon Co., Ltd., * 3; Si75 manufactured by Degussa, * 4; N- (1,3-dimethylbutyl) -N ′ -Phenyl-p-phenylenediamine Ouchi Shinsei Chemical Industry Co., Ltd. Nocrack 6C, * 5; Diphenylguanidine Ouchi Shinsei Chemical Industry Co., Ltd. Noxeller D, * 6; Mercaptobenzothiazyl disulfide Ouchi Shinsei Chemical Industry ( Noxeller DM, * 6; Nt-butyl-2-benzothiazylsulfenamide Ouchi Shinsei Chemical Co., Ltd. Noxeller NS.
本発明のゴム組成物は低発熱性に優れ、作業性も良好であり、タイヤにそれを用いた場合に転がり抵抗性が向上する産業上の利用可能性があるものである。 The rubber composition of the present invention is excellent in low heat build-up, has good workability, and has industrial applicability that improves rolling resistance when used in a tire.
Claims (17)
R6 p−Si−(OR7)4−p・・・(IV)
[式中、R6及びR7は、それぞれ独立して炭素数1〜20の一価の脂肪族炭化水素基又は炭素数6〜18の一価の芳香族炭化水素基であり;pは0〜2の整数であり;R6及びOR7がそれぞれ複数ある場合、複数のR6及びOR7はそれぞれたがいに同一でも異なっていてもよく;また分子中には活性プロトン及びオニウム塩は含まれない]で表されるヒドロカルビルオキシシラン化合物からなる群から選択される少なくとも一種を反応させて得たものであることを特徴とする請求項7に記載のゴム組成物。 The modified conjugated diene polymer has the following formula (III) at the active end of the conjugated diene polymer having an active end:
R 6 p -Si- (OR 7) 4-p ··· (IV)
[Wherein, R 6 and R 7 are each independently a monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or a monovalent aromatic hydrocarbon group having 6 to 18 carbon atoms; If R 6 and oR 7 there are a plurality of each, or different in a plurality of R 6 and oR 7 on each mutually identical; be ~ 2 integer active proton and onium salt are included in addition molecular The rubber composition according to claim 7, wherein the rubber composition is obtained by reacting at least one selected from the group consisting of hydrocarbyloxysilane compounds represented by
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