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JP2012021905A - Radiation detector and radiation detector manufacturing method - Google Patents

Radiation detector and radiation detector manufacturing method Download PDF

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JP2012021905A
JP2012021905A JP2010160581A JP2010160581A JP2012021905A JP 2012021905 A JP2012021905 A JP 2012021905A JP 2010160581 A JP2010160581 A JP 2010160581A JP 2010160581 A JP2010160581 A JP 2010160581A JP 2012021905 A JP2012021905 A JP 2012021905A
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substrate
radiation detector
wiring pattern
semiconductor element
adhesive member
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JP5725747B2 (en
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Yoshinori Sunaga
義則 須永
Shugen Ryu
主鉉 柳
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Hitachi Consumer Electronics Co Ltd
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Hitachi Consumer Electronics Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a radiation detector with which the yield of products in production steps can be enhanced and a radiation detector manufacturing method.SOLUTION: A radiation detector according to the present invention includes a wiring pattern 200, a substrate 20 having a connecting member provided on the surface of a wiring pattern 200, an adhesive member adhered on a part of the substrate 20 and a semiconductor element 10 which is arranged on the substrate 20 via an adhesive member and can detect radiation. A connecting member electrically connects the wiring pattern 200 and the semiconductor element 10.

Description

本発明は、放射線検出器、及び放射線検出器の製造方法に関する。特に、本発明は、γ線、X線等の放射線を検出する放射線検出器、及び放射線検出器の製造方法に関する。   The present invention relates to a radiation detector and a method for manufacturing the radiation detector. In particular, the present invention relates to a radiation detector that detects radiation such as γ-rays and X-rays, and a method for manufacturing the radiation detector.

従来、熱膨張係数が8.0×10−6[1/℃]以上の基板と、基板上に配置された半導体検出素子とから構成される半導体検出部を備え、半導体検出素子が略平板状の半導体結晶体からなり、半導体結晶体の下面にAuからなる素子電極が設けられ、素子電極と配線基板に設けられたパッド電極とを半導体結晶のヤング率より小さいずれ弾性を有するバンプで固定する放射線検出器が知られている(例えば、特許文献1参照)。特許文献1に記載の放射線検出器は、半導体結晶体との間で熱膨張係数差が大きな配線基板でも半導体結晶体の検出特性の劣化を抑制することができる。 2. Description of the Related Art Conventionally, a semiconductor detection unit including a substrate having a thermal expansion coefficient of 8.0 × 10 −6 [1 / ° C.] or more and a semiconductor detection element disposed on the substrate is provided. An element electrode made of Au is provided on the lower surface of the semiconductor crystal, and the element electrode and the pad electrode provided on the wiring substrate are fixed by a bump having a displacement elasticity smaller than the Young's modulus of the semiconductor crystal. A radiation detector is known (see, for example, Patent Document 1). The radiation detector described in Patent Document 1 can suppress deterioration in detection characteristics of a semiconductor crystal even in a wiring board having a large difference in thermal expansion coefficient with the semiconductor crystal.

特開2007−214191号公報JP 2007-214191 A

しかし、特許文献1に係る放射線検出器は、基板に半導体検出素子を配置し、半導体検出素子を基板に固定する工程において基板の反り等に起因する放射線検出器の製造歩留りについて考慮していない。   However, the radiation detector according to Patent Document 1 does not consider the manufacturing yield of the radiation detector due to warpage of the substrate or the like in the process of arranging the semiconductor detection element on the substrate and fixing the semiconductor detection element to the substrate.

したがって、本発明の目的は、製造工程において製品の歩留りを向上させることのできる放射線検出器、及び放射線検出器の製造方法を提供することにある。   Accordingly, an object of the present invention is to provide a radiation detector capable of improving the product yield in the manufacturing process, and a method for manufacturing the radiation detector.

本発明は、上記目的を達成するため、配線パターンと、配線パターンの表面に設けられる接続部材とを有する基板と、基板の一部に貼り付けられる粘着部材と、粘着部材を介して基板上に配置され、放射線を検出可能な半導体素子とを備え、接続部材が、配線パターンと半導体素子とを電気的に接続する放射線検出器が提供される。   In order to achieve the above object, the present invention provides a substrate having a wiring pattern and a connecting member provided on the surface of the wiring pattern, an adhesive member attached to a part of the substrate, and an adhesive member on the substrate. A radiation detector is provided that includes a semiconductor element that is disposed and capable of detecting radiation, and in which a connection member electrically connects the wiring pattern and the semiconductor element.

また、上記放射線検出器において、粘着部材が、基板の配線パターン上に貼り付けられ、粘着部材により配線パターンと半導体素子とが接着されることもできる。   In the radiation detector, the adhesive member may be attached on the wiring pattern of the substrate, and the wiring pattern and the semiconductor element may be bonded by the adhesive member.

また、上記放射線検出器において、粘着部材が、基材と、基材の両面に設けられる粘着剤層とを有する両面テープであってもよい。   Moreover, the said radiation detector WHEREIN: The double-sided tape which has a base material and the adhesive layer provided in both surfaces of a base material may be sufficient as it.

また、上記放射線検出器において、接続部材の厚さと粘着部材の厚さとが一致することが好ましい。   Moreover, in the said radiation detector, it is preferable that the thickness of a connection member and the thickness of an adhesion member correspond.

また、上記放射線検出器において、半導体素子が、平面視にて略四角形状を有し、粘着部材が、接続部材を挟んだ配線パターンの両端側のそれぞれに貼り付けられてもよい。   In the radiation detector, the semiconductor element may have a substantially square shape in a plan view, and the adhesive member may be attached to each of both end sides of the wiring pattern with the connection member interposed therebetween.

また、上記放射線検出器において、接続部材が、配線パターンと半導体素子とを電気的に接続してよい。   In the radiation detector, the connection member may electrically connect the wiring pattern and the semiconductor element.

また、本発明は、上記目的を達成するため、配線パターンと、配線パターンの表面に設けられる接続部材とを有する基板を準備する基板準備工程と、粘着剤層を有する粘着部材を、基板の一部に貼り付ける貼り付け工程と、粘着部材を介して基板上に放射線を検出可能な半導体素子を配置し、半導体素子を基板に一時的に固定する仮固定工程とを備える放射線検出器の製造方法が提供される。   In order to achieve the above object, the present invention provides a substrate preparation step for preparing a substrate having a wiring pattern and a connection member provided on the surface of the wiring pattern, and an adhesive member having an adhesive layer. A method of manufacturing a radiation detector, comprising: an attaching step to be attached to a portion; and a temporary fixing step in which a semiconductor element capable of detecting radiation is disposed on a substrate via an adhesive member, and the semiconductor element is temporarily fixed to the substrate. Is provided.

また、上記放射線検出器の製造方法において、仮固定工程の後に接続部材を硬化させ、配線パターンと半導体素子とを電気的に接続させる硬化工程を更に備えることができる。   Moreover, the manufacturing method of the said radiation detector can further be equipped with the hardening process which hardens a connection member after a temporary fixing process, and electrically connects a wiring pattern and a semiconductor element.

また、上記放射線検出器の製造方法において、貼り付け工程が、基板の配線パターン上に粘着部材を貼り付け、粘着部材により配線パターンと半導体素子とを接着させることもできる。   Moreover, in the manufacturing method of the said radiation detector, an affixing process can also affix an adhesive member on the wiring pattern of a board | substrate, and can adhere a wiring pattern and a semiconductor element with an adhesive member.

また、上記放射線検出器の製造方法において、粘着部材が、基材と、基材の両面に粘着剤層を有する両面テープであってもよい。   Moreover, in the manufacturing method of the said radiation detector, the adhesive member may be a double-sided tape which has a base material and an adhesive layer on both surfaces of a base material.

また、上記放射線検出器の製造方法において、仮固定工程が、半導体素子を基板側に向けて押し付けることにより接続部材の厚さを粘着部材の厚さに一致させることもできる。   Moreover, in the manufacturing method of the said radiation detector, the temporary fixing process can also make the thickness of a connection member correspond with the thickness of an adhesion member by pressing a semiconductor element toward a board | substrate side.

また、上記放射線検出器の製造方法において、半導体素子が、平面視にて略四角形状を有し、貼り付け工程が、接続部材を挟んだ配線パターンの両端側のそれぞれに粘着部材を貼り付けることもできる。   Moreover, in the manufacturing method of the radiation detector, the semiconductor element has a substantially quadrangular shape in plan view, and the attaching step attaches the adhesive member to each of both ends of the wiring pattern with the connection member interposed therebetween. You can also.

また、本発明は、上記目的を達成するため、長手方向に略一定の幅を有する中央部と、中央部の両端のそれぞれに中央部の幅より広い幅を有する端部とを有する配線パターンと、配線パターンの表面に設けられる接続部材とを有する基板と、配線パターンの端部に貼り付けられる粘着部材と、粘着部材を介して基板上に配置され、放射線を検出可能な半導体素子とを備え、接続部材が、配線パターンと半導体素子とを電気的に接続する放射線検出器が提供される。   In order to achieve the above object, the present invention provides a wiring pattern having a central portion having a substantially constant width in the longitudinal direction and end portions having a width wider than the width of the central portion at both ends of the central portion. A substrate having a connection member provided on the surface of the wiring pattern, an adhesive member attached to an end of the wiring pattern, and a semiconductor element disposed on the substrate via the adhesive member and capable of detecting radiation. A radiation detector is provided in which the connecting member electrically connects the wiring pattern and the semiconductor element.

本発明に係る放射線検出器、及び放射線検出器の製造方法によれば、製造工程において製品の歩留りを向上させることのできる放射線検出器、及び放射線検出器の製造方法を提供することができる。   According to the radiation detector and the manufacturing method of the radiation detector according to the present invention, it is possible to provide a radiation detector capable of improving the product yield in the manufacturing process and the manufacturing method of the radiation detector.

本発明の実施の形態に係る放射線検出器の斜視図である。It is a perspective view of a radiation detector concerning an embodiment of the invention. 本発明の実施の形態に係る放射線検出器から一部の放射線検出素子を取り外した場合の斜視図の一部の概要図である。It is a one part schematic diagram of the perspective view at the time of removing some radiation detection elements from the radiation detector which concerns on embodiment of this invention. 図2のA−A線における断面図である。It is sectional drawing in the AA of FIG. 本発明の実施の形態に係る放射線検出器の一部を放射線が入射する側から見た場合における上面図である。It is a top view in the case of seeing a part of radiation detector concerning an embodiment of the invention from the side which radiation enters. 本発明の実施の形態に係る放射線検出器の製造工程の一部の模式図である。It is a partial schematic diagram of the manufacturing process of the radiation detector which concerns on embodiment of this invention. 本発明の実施の形態に係る放射線検出器の製造工程の一部の模式図である。It is a partial schematic diagram of the manufacturing process of the radiation detector which concerns on embodiment of this invention. 本発明の実施の形態に係る放射線検出器の製造工程の一部の模式図である。It is a partial schematic diagram of the manufacturing process of the radiation detector which concerns on embodiment of this invention. 本発明の実施の形態の変形例に係る放射線検出器の基板の一部を示す図である。It is a figure which shows a part of board | substrate of the radiation detector which concerns on the modification of embodiment of this invention.

[実施の形態]
図1は、本発明の実施の形態に係る放射線検出器の斜視図の概要を示す。
[Embodiment]
FIG. 1 shows an outline of a perspective view of a radiation detector according to an embodiment of the present invention.

(放射線検出器1の構成の概要)
本実施の形態に係る放射線検出器1は、カード形状を呈し、γ線、X線等の放射線を検出する放射線検出器である。図1において放射線100は、紙面の上方から下方に沿って入射してくる。すなわち、放射線100は、放射線検出器1の半導体素子10からカードホルダ30及びカードホルダ31に向かう方向に沿って伝搬して放射線検出器1に到達する。そして、放射線検出器1は、半導体素子10の側面(つまり、図1の上方に面している面)に放射線100が入射する。したがって、半導体素子10の側面が放射線100の入射面となっている。このように、半導体素子10の側面を放射線100の入射面とする放射線検出器1を、本実施の形態ではエッジオン型の放射線検出器1と称する。
(Outline of configuration of radiation detector 1)
The radiation detector 1 according to the present embodiment is a radiation detector that has a card shape and detects radiation such as γ rays and X rays. In FIG. 1, the radiation 100 enters from the upper side to the lower side of the page. That is, the radiation 100 propagates along the direction from the semiconductor element 10 of the radiation detector 1 toward the card holder 30 and the card holder 31 and reaches the radiation detector 1. In the radiation detector 1, the radiation 100 is incident on the side surface of the semiconductor element 10 (that is, the surface facing upward in FIG. 1). Therefore, the side surface of the semiconductor element 10 is an incident surface for the radiation 100. Thus, the radiation detector 1 having the side surface of the semiconductor element 10 as the incident surface of the radiation 100 is referred to as an edge-on type radiation detector 1 in the present embodiment.

なお、放射線検出器1は、特定の方向(例えば、放射線検出器1に向かう方向)に沿って入射してくる放射線100が通過する複数の開口を有するコリメータ(例えば、マッチドコリメータ、ピンホールコリメータ等)を介して放射線100を検出する複数の放射線検出器1が並べられて構成されるエッジオン型の放射線検出器用の放射線検出器1として構成することもできる。   The radiation detector 1 includes a collimator (for example, a matched collimator, a pinhole collimator, etc.) having a plurality of openings through which the incident radiation 100 passes along a specific direction (for example, a direction toward the radiation detector 1). The radiation detector 1 can be configured as an edge-on type radiation detector configured by arranging a plurality of radiation detectors 1 that detect the radiation 100 via the above.

具体的に、放射線検出器1は、放射線100を検出可能な一対の半導体素子10と、薄い基板20と、一対の半導体素子10の隣接部分にて基板20を挟み込むことにより基板20を支持するカードホルダ30及びカードホルダ31とを備える。そして、本実施の形態においては、一例として、一対の半導体素子10が4組、基板20を挟み込む位置において基板20に固定される。すなわち、各組の一対の半導体素子10は、基板20の一方の面と他方の面とのそれぞれに基板20を対称面として対称の位置に固定される。   Specifically, the radiation detector 1 includes a pair of semiconductor elements 10 capable of detecting the radiation 100, a thin substrate 20, and a card that supports the substrate 20 by sandwiching the substrate 20 between adjacent portions of the pair of semiconductor elements 10. A holder 30 and a card holder 31 are provided. In the present embodiment, as an example, four pairs of the semiconductor elements 10 are fixed to the substrate 20 at positions where the substrate 20 is sandwiched. That is, the pair of semiconductor elements 10 in each set is fixed to a symmetric position with the substrate 20 as a symmetry plane on each of one surface and the other surface of the substrate 20.

また、基板20はカードホルダ30とカードホルダ31とに挟み込まれて支持される。カードホルダ30とカードホルダ31とはそれぞれ同一形状を有して形成され、カードホルダ30が有する溝付穴34にカードホルダ31が有する突起部36が嵌め合うと共に、カードホルダ31が有する溝付穴34(図示しない)にカードホルダ30が有する突起部36(図示しない)が嵌め合うことにより基板20を支持する。   The substrate 20 is supported by being sandwiched between a card holder 30 and a card holder 31. The card holder 30 and the card holder 31 are formed to have the same shape, and the protruding portion 36 of the card holder 31 is fitted into the grooved hole 34 of the card holder 30 and the grooved hole of the card holder 31 is fitted. The board | substrate 20 is supported by the projection part 36 (not shown) which the card holder 30 has fitting to 34 (not shown).

また、板ばね等から構成される弾性部材32は、複数の放射線検出器1を支持する放射線検出器立てに放射線検出器1が挿入された場合に、放射線検出器1を放射線検出器立てに押し付ける。なお、放射線検出器立てはカードエッジ部29が挿入されるコネクタを有しており、放射線検出器1は、カードエッジ部29がコネクタに挿入され、コネクタとパターン29aとが電気的に接続することにより外部の電気回路としての制御回路、外部からの電源線、グランド線等に電気的に接続される。   Further, the elastic member 32 constituted by a leaf spring or the like presses the radiation detector 1 against the radiation detector stand when the radiation detector 1 is inserted into the radiation detector stand that supports the plurality of radiation detectors 1. . The radiation detector stand has a connector into which the card edge portion 29 is inserted. In the radiation detector 1, the card edge portion 29 is inserted into the connector, and the connector and the pattern 29a are electrically connected. Thus, the circuit is electrically connected to a control circuit as an external electric circuit, an external power supply line, a ground line, and the like.

なお、放射線検出器1は、一対の半導体素子10の基板20の反対側に、各半導体素子10の電極パターンと複数の基板端子22とのそれぞれを電気的に接続する配線パターンを有するフレキシブル基板を更に備えることができる(なお、半導体素子10の電極パターン、フレキシブル基板、フレキシブル基板の配線パターンは図示しない)。フレキシブル基板は、一対の半導体素子10の一方の半導体素子10側、及び他方の半導体素子10側の双方に設けることができる。例えば、4組の一対の半導体素子10の一方の半導体素子10側のそれぞれと、他方の半導体素子10側のそれぞれとの双方に、フレキシブル基板をそれぞれ設けることができる。なお、基板端子22は、基板20の表面に設けられており、基板20の配線パターンに電気的に接続されている。   The radiation detector 1 includes a flexible substrate having a wiring pattern for electrically connecting the electrode pattern of each semiconductor element 10 and the plurality of substrate terminals 22 to the opposite side of the substrate 20 of the pair of semiconductor elements 10. Further, an electrode pattern of the semiconductor element 10, a flexible substrate, and a wiring pattern of the flexible substrate are not shown. The flexible substrate can be provided on both the one semiconductor element 10 side and the other semiconductor element 10 side of the pair of semiconductor elements 10. For example, a flexible substrate can be provided on each of one semiconductor element 10 side of each of the four pairs of semiconductor elements 10 and each of the other semiconductor element 10 side. The substrate terminal 22 is provided on the surface of the substrate 20 and is electrically connected to the wiring pattern of the substrate 20.

図2は、本発明の実施の形態に係る放射線検出器から一部の放射線検出素子を取り外した場合の斜視図の一部の概要を示す。また、図3は、図2のA−A線における断面の概要を示す。   FIG. 2 shows a partial outline of a perspective view when a part of the radiation detection elements is removed from the radiation detector according to the embodiment of the present invention. Moreover, FIG. 3 shows the outline of the cross section in the AA line of FIG.

(基板20の詳細)
基板20は、金属導体等の導電性材料からなる導電性薄膜(例えば、銅箔)が表面に形成された薄肉基板(例えば、FR4等のガラスエポキシ基板)を、ソルダーレジスト等の絶縁材料からなる絶縁層で挟んで可撓性を有して形成される。また、基板20は、半導体素子10の電極に電気的に接続する配線パターン200を有する。配線パターン200は、例えば、平面視にて幅が略一定の略長方形状を有して基板20の一方の面、及び他方の面のそれぞれに設けられる。そして、配線パターン200の表面の一部の領域に導電性を有する接続部材としての銀ペースト50が設けられ、半導体素子10の電極は銀ペースト50を介して配線パターン200に電気的に接続する。
(Details of substrate 20)
The substrate 20 is a thin substrate (for example, a glass epoxy substrate such as FR4) on which a conductive thin film (for example, copper foil) made of a conductive material such as a metal conductor is formed, and is made of an insulating material such as a solder resist. It is formed with flexibility by being sandwiched between insulating layers. The substrate 20 has a wiring pattern 200 that is electrically connected to the electrodes of the semiconductor element 10. The wiring pattern 200 has, for example, a substantially rectangular shape with a substantially constant width in plan view, and is provided on each of the one surface and the other surface of the substrate 20. A silver paste 50 as a conductive connection member is provided in a partial region on the surface of the wiring pattern 200, and the electrodes of the semiconductor element 10 are electrically connected to the wiring pattern 200 through the silver paste 50.

基板20は、一例として、幅広の方向、すなわち長手方向は40mm程度の長さを有して形成される。そして、基板20は、幅広の部分の端部から幅が狭くなっている部分の端部までの短手方向において、20mm程度の長さを有して形成される。なお、銀ペースト50の代わりに低温で溶融するはんだを用いることもできる。   As an example, the substrate 20 is formed to have a length of about 40 mm in the wide direction, that is, the longitudinal direction. The substrate 20 is formed to have a length of about 20 mm in the short direction from the end of the wide portion to the end of the narrow portion. Instead of the silver paste 50, a solder that melts at a low temperature can be used.

ここで、基板20は放射線を検出できない領域であるので、一対の半導体素子10によって挟まれる基板20の領域は不感領域になる。よって、基板20の厚さは、薄いことが好ましい。具体的に、基板20は、0.4mm以下の厚さを有することが好ましい。本実施の形態では、一例として、基板20は、0.2mmの厚さを有する。   Here, since the substrate 20 is a region where radiation cannot be detected, the region of the substrate 20 sandwiched between the pair of semiconductor elements 10 becomes a dead region. Therefore, it is preferable that the thickness of the substrate 20 is thin. Specifically, the substrate 20 preferably has a thickness of 0.4 mm or less. In the present embodiment, as an example, the substrate 20 has a thickness of 0.2 mm.

また、基板20に形成された配線により、配線パターン200はカードエッジ部29のパターン29aに電気的に接続される。また、基板20は、基板端子22とカードエッジ部29のパターン29aとを電気的に接続する配線を有する。これにより、基板20において、半導体素子10の基板20側の面の電極は、基板20の配線によりカードエッジ部29のパターン29aに電気的に接続される。また、半導体素子10の基板20側の反対側の面の電極は、フレキシブル基板の配線パターンと、基板端子22と、基板20の配線とを経由してカードエッジ部29のパターン29aに電気的に接続される。ここで、例えば、半導体素子10の基板20側の電極をアノード電極、半導体素子10の基板20側の反対側の面の電極をカソード電極とする。この場合、アノード電極からの信号とカソード電極からの信号とはそれぞれ、カードエッジ部29のパターン29aに導かれ、パターン29aを介し、外部の電気回路へ出力される。   Further, the wiring pattern 200 is electrically connected to the pattern 29 a of the card edge portion 29 by the wiring formed on the substrate 20. Further, the substrate 20 has a wiring for electrically connecting the substrate terminal 22 and the pattern 29 a of the card edge portion 29. Thereby, in the substrate 20, the electrode on the surface of the semiconductor element 10 on the substrate 20 side is electrically connected to the pattern 29 a of the card edge portion 29 by the wiring of the substrate 20. Further, the electrode on the surface opposite to the substrate 20 side of the semiconductor element 10 is electrically connected to the pattern 29 a of the card edge portion 29 via the wiring pattern of the flexible substrate, the substrate terminal 22, and the wiring of the substrate 20. Connected. Here, for example, an electrode on the substrate 20 side of the semiconductor element 10 is an anode electrode, and an electrode on the opposite side of the substrate 20 side of the semiconductor element 10 is a cathode electrode. In this case, the signal from the anode electrode and the signal from the cathode electrode are respectively guided to the pattern 29a of the card edge portion 29 and output to an external electric circuit via the pattern 29a.

(半導体素子10の詳細)
半導体素子10は、略直方体状に形成され(つまり、平面視にて略四角状に形成され)、素子表面10bと、素子表面10bの反対側の素子表面10cとのそれぞれに電極が設けられる(電極は図示しない)。放射線は各半導体素子10の端部から入射して、カードエッジ部29側に向かって半導体素子10中を走行する。また、本実施の形態に係る半導体素子10は、放射線が入射する面に垂直な一の面である素子表面10cに複数の溝10aが設けられる。溝10aの幅は、一例として、0.2mmである。
(Details of semiconductor element 10)
The semiconductor element 10 is formed in a substantially rectangular parallelepiped shape (that is, formed in a substantially square shape in plan view), and electrodes are provided on each of the element surface 10b and the element surface 10c opposite to the element surface 10b ( Electrode is not shown). Radiation enters from the end of each semiconductor element 10 and travels through the semiconductor element 10 toward the card edge portion 29 side. In addition, the semiconductor element 10 according to the present embodiment is provided with a plurality of grooves 10a on the element surface 10c, which is one surface perpendicular to the surface on which the radiation is incident. As an example, the width of the groove 10a is 0.2 mm.

そして、放射線が入射する半導体素子10の面であって、各溝10aから、溝10aが設けられている面の反対側の面(つまり、素子表面10b)への仮想的な垂線により区切られる領域、及び当該仮想的な垂線と半導体素子10の端部とで区切られる領域を、素子内ピクセル領域と称する。半導体素子10が、(n−1)個の溝10aを有すると共に、複数の溝10a間、及び素子表面10bにそれぞれ電極を有することにより、n個の素子内ピクセル領域が構成される。複数の素子内ピクセル領域のそれぞれが、放射線を検出する1つの画素(ピクセル)に対応する。これにより、一の半導体素子10は、複数の画素を有することになる。   And the area | region of the semiconductor element 10 into which radiation injects, Comprising: The area | region divided by the virtual perpendicular | vertical from each groove | channel 10a to the surface (namely, element surface 10b) on the opposite side to the surface in which the groove | channel 10a is provided. , And a region divided by the virtual perpendicular and the end of the semiconductor element 10 is referred to as an in-element pixel region. The semiconductor element 10 has (n−1) grooves 10a, and electrodes are provided between the plurality of grooves 10a and on the element surface 10b, thereby forming n element pixel regions. Each of the plurality of in-element pixel regions corresponds to one picture element (pixel) that detects radiation. Thereby, one semiconductor element 10 has a plurality of pixels.

一例として、1つの放射線検出器1が8つの半導体素子10(4組の一対の半導体素子10)を備え、1つの半導体素子10がそれぞれ8つの素子内ピクセル領域を有する場合、1つの放射線検出器1は、64ピクセルの解像度を有することになる。溝10aの数を増減させることにより、一の半導体素子10のピクセル数を増減させることができる。なお、一例として、半導体素子10の幅は1.2mm程度、長さは11.2mm程度、高さは5mm程度である。   As an example, when one radiation detector 1 includes eight semiconductor elements 10 (four pairs of semiconductor elements 10) and one semiconductor element 10 has eight in-element pixel regions, one radiation detector. 1 will have a resolution of 64 pixels. By increasing or decreasing the number of grooves 10a, the number of pixels of one semiconductor element 10 can be increased or decreased. As an example, the width of the semiconductor element 10 is about 1.2 mm, the length is about 11.2 mm, and the height is about 5 mm.

半導体素子10を構成する材料としては、CdTeを用いることができる。また、γ線等の放射線を検出できる限り、半導体素子10はCdTe素子に限られない。例えば、半導体素子10として、CdZnTe(CZT)素子、HgI素子等の化合物半導体素子を用いることもできる。 As a material constituting the semiconductor element 10, CdTe can be used. Further, the semiconductor element 10 is not limited to a CdTe element as long as radiation such as γ rays can be detected. For example, a compound semiconductor element such as a CdZnTe (CZT) element or an HgI 2 element can also be used as the semiconductor element 10.

(両面テープ40の詳細)
ここで、本実施の形態においては、基板20の半導体素子10が搭載される領域の一部の領域に、粘着剤層を有する粘着部材としての両面テープ40が設けられる。両面テープ40は、基板20の配線パターン200上に貼り付けられ、両面テープ40により配線パターン200と半導体素子10とが接着される。両面テープ40は、基材と、基材の一方の面と他方の面との両面に粘着剤層を有して構成される。そして、両面テープ40の厚さは、一例として、10μm以上15μm以下程度であり、幅は1mm程度である。
(Details of double-sided tape 40)
Here, in the present embodiment, a double-sided tape 40 as an adhesive member having an adhesive layer is provided in a partial region of the substrate 20 where the semiconductor element 10 is mounted. The double-sided tape 40 is affixed on the wiring pattern 200 of the substrate 20, and the wiring pattern 200 and the semiconductor element 10 are bonded by the double-sided tape 40. The double-sided tape 40 is configured to have a pressure-sensitive adhesive layer on both the base material and one surface and the other surface of the base material. And the thickness of the double-sided tape 40 is 10 micrometers or more and about 15 micrometers or less as an example, and a width | variety is about 1 mm.

具体的に、両面テープ40は、半導体素子10と基板20との間であって、半導体素子10の短手方向に間隔をおき、基板20の長手方向に沿って設けられる。ここで、配線パターン200の一方の端部と他方の端部との間の表面の一部には、銀ペースト50が設けられている。この場合、両面テープ40は、銀ペースト50を挟む位置であって、配線パターン200の一方の端部側と他方の端部側とのそれぞれに設けられる。なお、両面テープ40は、基板20の一方の面、及び他方の面のそれぞれに設けられる。例えば、基板20を対称面とした場合、基板20の一方の面に設けられた両面テープ40の対称の位置を含む他方の面にも両面テープ40が設けられる。本実施の形態では、半導体素子10は、銀ペースト50により配線パターン200に電気的に接続されると共に、基板20に機械的に固定される。そして、両面テープ40は、半導体素子10を基板20に仮に固定している。なお、本実施の形態において「仮に固定」とは、半導体素子10が銀ペースト50を介して基板20に機械的に固定されており、両面テープ40は、後述する放射線検出器1の製造工程において半導体素子10を基板20に一時的に固定することを目的として用いられていることを意味する。   Specifically, the double-sided tape 40 is provided along the longitudinal direction of the substrate 20 between the semiconductor element 10 and the substrate 20, with an interval in the short direction of the semiconductor element 10. Here, a silver paste 50 is provided on a part of the surface between one end and the other end of the wiring pattern 200. In this case, the double-sided tape 40 is provided at each of the one end side and the other end side of the wiring pattern 200 at a position sandwiching the silver paste 50. The double-sided tape 40 is provided on each of the one surface and the other surface of the substrate 20. For example, when the substrate 20 is a symmetric surface, the double-sided tape 40 is also provided on the other surface including the symmetrical position of the double-sided tape 40 provided on one surface of the substrate 20. In the present embodiment, the semiconductor element 10 is electrically connected to the wiring pattern 200 by the silver paste 50 and mechanically fixed to the substrate 20. The double-sided tape 40 temporarily fixes the semiconductor element 10 to the substrate 20. In the present embodiment, “temporarily fixed” means that the semiconductor element 10 is mechanically fixed to the substrate 20 via the silver paste 50, and the double-sided tape 40 is used in the manufacturing process of the radiation detector 1 to be described later. It means that it is used for the purpose of temporarily fixing the semiconductor element 10 to the substrate 20.

図4は、本発明の実施の形態に係る放射線検出器の一部を放射線が入射する側から見た場合における上面の概要を示す。   FIG. 4 shows an outline of the upper surface when a part of the radiation detector according to the embodiment of the present invention is viewed from the side on which the radiation is incident.

半導体素子10は、両面テープ40により配線パターン200を介して基板20に仮に固定されると共に、銀ペースト50により配線パターン200に固定される。すなわち、両面テープ40が接着している配線パターン200の領域において、半導体素子10は、両面テープ40により基板20に仮に固定される。また、この場合において、半導体素子10と配線パターン200との間の両面テープ40の厚さと、半導体素子10と配線パターン200との間の銀ペースト50の厚さとは一致する。   The semiconductor element 10 is temporarily fixed to the substrate 20 by the double-sided tape 40 via the wiring pattern 200 and is fixed to the wiring pattern 200 by the silver paste 50. That is, the semiconductor element 10 is temporarily fixed to the substrate 20 by the double-sided tape 40 in the region of the wiring pattern 200 where the double-sided tape 40 is bonded. In this case, the thickness of the double-sided tape 40 between the semiconductor element 10 and the wiring pattern 200 matches the thickness of the silver paste 50 between the semiconductor element 10 and the wiring pattern 200.

(放射線検出器1の製造方法)
図5A〜図5Cは、本発明の実施の形態に係る放射線検出器の製造工程の一部を模式的に示す。
(Manufacturing method of radiation detector 1)
5A to 5C schematically show a part of the manufacturing process of the radiation detector according to the exemplary embodiment of the present invention.

まず、表面及び裏面のそれぞれに複数の配線パターン200と、複数の配線パターン200それぞれの表面の一部の領域に設けられる銀ペースト50とを有する基板20を準備する(図5Aの(a)、基板準備工程)。銀ペースト50は、例えば、メタルマスク塗布、又はディスペンサ塗布により配線パターン200の表面の一部の領域に塗布することができる。   First, a substrate 20 having a plurality of wiring patterns 200 on each of the front surface and the back surface and a silver paste 50 provided in a partial region of each surface of the plurality of wiring patterns 200 is prepared ((a) in FIG. 5A). Substrate preparation step). The silver paste 50 can be applied to a partial region of the surface of the wiring pattern 200 by, for example, metal mask application or dispenser application.

次に、両面テープ40を基板20上の予め定められた領域に貼り付ける(図5Aの(b)、貼り付け工程)。すなわち、基板20に搭載されるべき半導体素子10の一の辺の近傍、及び一の辺の対辺の近傍それぞれに対応する位置に両面テープ40を貼り付ける。例えば、配線パターン200の両端それぞれに、両面テープ40を貼り付ける。次に、両面テープ40を介して基板20上に半導体素子10を配置すると共に、半導体素子10を基板20に一時的に固定する(図5B、仮固定工程)。   Next, the double-sided tape 40 is attached to a predetermined region on the substrate 20 ((b) in FIG. 5A, attaching step). That is, the double-sided tape 40 is affixed at positions corresponding to the vicinity of one side of the semiconductor element 10 to be mounted on the substrate 20 and the vicinity of the opposite side of the one side. For example, the double-sided tape 40 is affixed to both ends of the wiring pattern 200. Next, the semiconductor element 10 is disposed on the substrate 20 via the double-sided tape 40, and the semiconductor element 10 is temporarily fixed to the substrate 20 (FIG. 5B, temporary fixing step).

具体的に、本実施の形態では、基板20の表面側及び裏面側のそれぞれに一対の半導体素子10を基板20を対称面として対称に配置する。例えば、半導体素子10の基板20への配置は、自動マウント装置を用いて実施する。まず、自動マウント装置が備えるコレット60で半導体素子10を吸着する。そして、コレット60は、吸着した半導体素子10を基板20上の予め定められた位置に配置し、一定の力(例えば、50〜100g)で一定時間、基板20側へ半導体素子10を押し付ける。本実施の形態では、基板20を挟んだ対称の位置において、一方のコレット60が吸着している半導体素子10と、他方のコレット60が吸着している半導体素子10とが基板20に略同時に押しつけられる。   Specifically, in the present embodiment, a pair of semiconductor elements 10 are symmetrically arranged on the front side and the back side of the substrate 20 with the substrate 20 as a symmetry plane. For example, the placement of the semiconductor element 10 on the substrate 20 is performed using an automatic mounting apparatus. First, the semiconductor element 10 is adsorbed by the collet 60 provided in the automatic mounting apparatus. And the collet 60 arrange | positions the adsorbed semiconductor element 10 in the predetermined position on the board | substrate 20, and presses the semiconductor element 10 to the board | substrate 20 side with a fixed force (for example, 50-100g) for a fixed time. In the present embodiment, the semiconductor element 10 on which one collet 60 is adsorbed and the semiconductor element 10 on which the other collet 60 is adsorbed are pressed against the substrate 20 at substantially the same position with the substrate 20 in between. It is done.

これにより、一対の半導体素子10が基板20の表面及び裏面の予め定められた位置に両面テープ40により一時的に固定される。また、仮固定工程の時点で銀ペースト50はまだ硬化していないので、コレット60により半導体素子10を基板20側に押し付けることにより銀ペースト50が押しつぶされ、銀ペースト50の厚さが両面テープ40の厚さに一致する。   As a result, the pair of semiconductor elements 10 are temporarily fixed to the predetermined positions on the front and back surfaces of the substrate 20 by the double-sided tape 40. Further, since the silver paste 50 is not yet cured at the time of the temporary fixing step, the silver paste 50 is crushed by pressing the semiconductor element 10 against the substrate 20 side by the collet 60, and the thickness of the silver paste 50 becomes the double-sided tape 40. To match the thickness of

続いて、一時的に固定した一対の半導体素子10の隣に、新たに一対の半導体素子10を配置すると共に基板20に一時的に固定する(図5C)。なお、基板20の表面側及び裏面側のそれぞれに複数対の半導体素子10を配置し、複数対の半導体素子10を基板20の対称の位置に実質的に同時に、かつ、一時的に固定することもできる。なお、仮固定工程は、基板20を縦の状態に設置し(例えば、基板20を吊り下げる)、この状態で基板20の左右から一対若しくは複数対の半導体素子10を基板20の対称の位置に一時的に固定することもできる。   Subsequently, a pair of semiconductor elements 10 is newly disposed next to the pair of temporarily fixed semiconductor elements 10 and temporarily fixed to the substrate 20 (FIG. 5C). In addition, a plurality of pairs of semiconductor elements 10 are arranged on each of the front surface side and the back surface side of the substrate 20, and the plurality of pairs of semiconductor elements 10 are fixed to the symmetrical position of the substrate 20 substantially simultaneously and temporarily. You can also. In the temporary fixing step, the substrate 20 is installed in a vertical state (for example, the substrate 20 is suspended), and in this state, a pair or a plurality of pairs of semiconductor elements 10 are placed at symmetrical positions of the substrate 20 from the left and right of the substrate 20. It can be temporarily fixed.

次に、銀ペースト50を硬化させ、配線パターン200と半導体素子10とを電気的に接続させる(硬化工程)。硬化工程は、例えば、高温槽内において銀ペースト50を加熱することにより実施する。一例として、75℃、2〜3.5時間程度の加熱により硬化する銀ペースト50を用いることができる。また、硬化工程においては、半導体素子10の自重により基板20に発生する反りを抑制することを目的として、高温槽内に基板20を縦の状態にして設置することができる。   Next, the silver paste 50 is cured, and the wiring pattern 200 and the semiconductor element 10 are electrically connected (curing process). A hardening process is implemented by heating the silver paste 50 in a high temperature tank, for example. As an example, a silver paste 50 that is cured by heating at 75 ° C. for about 2 to 3.5 hours can be used. In the curing step, the substrate 20 can be installed in a vertical state in the high-temperature bath for the purpose of suppressing warpage generated in the substrate 20 due to the weight of the semiconductor element 10.

硬化工程後、フレキシブル基板、カードホルダ30及びカードホルダ31、弾性部材32等を複数の半導体素子10及び基板20の定められた位置に取り付ける(組み立て工程)。これにより、本実施の形態に係る放射線検出器1が製造される。   After the curing process, the flexible substrate, the card holder 30, the card holder 31, the elastic member 32, and the like are attached to the predetermined positions of the plurality of semiconductor elements 10 and the substrate 20 (assembly process). Thereby, the radiation detector 1 which concerns on this Embodiment is manufactured.

(実施の形態の効果)
本発明の実施の形態に係る放射線検出器1の製造方法は、両面テープ40により半導体素子10を基板20に一時的に固定した状態で銀ペースト50を硬化させるので、銀ペースト50の硬化中に基板20の反りに起因する半導体素子10の基板20からの剥がれを抑制することができる。また、画像処理で半導体素子10の基板20に対する位置を決めることができる自動マウント装置を用いて半導体素子10を基板20に仮固定することができる。したがって、特別な冶具を要することなく、例えば、半導体素子10の間隔を0.1mm程度に制御しつつ、半導体素子10同士が接触することを防止できる。これにより、放射線検出器1の製造工程中に半導体素子10同士が接触することを抑制できるので、放射線検出器1の製造歩留りを向上させることができる。
(Effect of embodiment)
In the manufacturing method of the radiation detector 1 according to the embodiment of the present invention, the silver paste 50 is cured in a state where the semiconductor element 10 is temporarily fixed to the substrate 20 by the double-sided tape 40. The peeling of the semiconductor element 10 from the substrate 20 due to the warpage of the substrate 20 can be suppressed. Further, the semiconductor element 10 can be temporarily fixed to the substrate 20 by using an automatic mounting apparatus that can determine the position of the semiconductor element 10 with respect to the substrate 20 by image processing. Therefore, it is possible to prevent the semiconductor elements 10 from contacting each other, for example, while controlling the distance between the semiconductor elements 10 to about 0.1 mm without requiring a special jig. Thereby, since it can suppress that semiconductor elements 10 contact during the manufacturing process of the radiation detector 1, the manufacturing yield of the radiation detector 1 can be improved.

また、本発明の実施の形態に係る放射線検出器1の製造方法は、厚さが薄く、撓み易く、反りが発生しやすい基板20を用いる場合に特に有効である。薄い基板、例えば、0.4mm以下の厚さを有する基板20を用いることにより不感領域を低減することができる。   In addition, the method of manufacturing the radiation detector 1 according to the embodiment of the present invention is particularly effective when the substrate 20 is thin, easily bent, and easily warped. By using a thin substrate, for example, the substrate 20 having a thickness of 0.4 mm or less, the insensitive area can be reduced.

また、本実施の形態に係る放射線検出器1の製造方法は、銀ペースト50が硬化する前に、両面テープ40に接触している半導体素子10を基板20側に押し付けることで、両面テープ40の厚さを利用し、銀ペースト50の厚さを仮固定工程と同時に高精度に制御することができる。したがって、温度変化等に起因し、銀ペースト50により半導体素子10中に発生する応力を制御することができるので、放射線検出器1の特性の低下を抑制することができる。   Moreover, the manufacturing method of the radiation detector 1 which concerns on this Embodiment presses the semiconductor element 10 which is in contact with the double-sided tape 40 to the board | substrate 20 side, before the silver paste 50 hardens | cures, and the double-sided tape 40 of FIG. By using the thickness, the thickness of the silver paste 50 can be controlled with high accuracy simultaneously with the temporary fixing step. Therefore, since the stress generated in the semiconductor element 10 by the silver paste 50 due to a temperature change or the like can be controlled, the deterioration of the characteristics of the radiation detector 1 can be suppressed.

また、自動マウント装置を用いる場合、±0.02mmの位置精度で半導体素子10を基板20に配置することができる。これにより、高精度で半導体素子10を基板20に配置することができると共に、配置スピードを向上させることができる   Further, when the automatic mounting apparatus is used, the semiconductor element 10 can be arranged on the substrate 20 with a positional accuracy of ± 0.02 mm. Thereby, the semiconductor element 10 can be arranged on the substrate 20 with high accuracy, and the arrangement speed can be improved.

[実施の形態の変形例]
図6は、本発明の実施の形態の変形例に係る放射線検出器の基板の一部を示す。
[Modification of Embodiment]
FIG. 6 shows a part of a substrate of a radiation detector according to a modification of the embodiment of the present invention.

実施の形態の変形例に係る放射線検出器は、実施の形態に係る放射線検出器1とは基板20に設けられる配線パターン200の形状が一部異なる点を除き、実施の形態に係る放射線検出器1と略同一の構成及び機能を備える。したがって、相違点を除き詳細な説明は省略する。   The radiation detector according to the modification of the embodiment is different from the radiation detector 1 according to the embodiment except that the shape of the wiring pattern 200 provided on the substrate 20 is partially different. 1 has substantially the same configuration and function. Therefore, a detailed description is omitted except for differences.

実施の形態の変形例に係る放射線検出器1の基板21は、長手方向に略一定の幅を有する中央部202と、中央部202の両端のそれぞれに中央部202の幅より広い幅を有する端部204とを有する配線パターン210を備える。端部204は、両面テープ40が貼り付けられる部分に設けられる。実施の形態の変形例では、配線パターン210が実施の形態の配線パターン200より幅が広い端部204を有するので、両面テープ40と配線パターン210との接触面積を増やすことができる。これにより、両面テープ40の配線パターン210への粘着力を増大させることができる。   The substrate 21 of the radiation detector 1 according to the modification of the embodiment includes a center portion 202 having a substantially constant width in the longitudinal direction, and ends having a width wider than the width of the center portion 202 at both ends of the center portion 202. A wiring pattern 210 having a portion 204 is provided. The edge part 204 is provided in the part to which the double-sided tape 40 is affixed. In the modification of the embodiment, since the wiring pattern 210 has the end portion 204 that is wider than the wiring pattern 200 of the embodiment, the contact area between the double-sided tape 40 and the wiring pattern 210 can be increased. Thereby, the adhesive force to the wiring pattern 210 of the double-sided tape 40 can be increased.

以上、本発明の実施の形態を説明したが、上記に記載した実施の形態は特許請求の範囲に係る発明を限定するものではない。また、実施の形態の中で説明した特徴の組合せの全てが発明の課題を解決するための手段に必須であるとは限らない点に留意すべきである。   While the embodiments of the present invention have been described above, the embodiments described above do not limit the invention according to the claims. In addition, it should be noted that not all the combinations of features described in the embodiments are essential to the means for solving the problems of the invention.

1 放射線検出器
10 半導体素子
10a 溝
10b、10c 素子表面
20、21 基板
22 基板端子
29 カードエッジ部
29a パターン
30、31 カードホルダ
32 弾性部材
34 溝付穴
36 突起部
40 両面テープ
50 銀ペースト
60 コレット
100 放射線
200 配線パターン
202 中央部
204 端部
210 配線パターン
DESCRIPTION OF SYMBOLS 1 Radiation detector 10 Semiconductor element 10a Groove 10b, 10c Element surface 20, 21 Board | substrate 22 Board terminal 29 Card edge part 29a Pattern 30, 31 Card holder 32 Elastic member 34 Grooved hole 36 Protrusion part 40 Double-sided tape 50 Silver paste 60 Collet DESCRIPTION OF SYMBOLS 100 Radiation 200 Wiring pattern 202 Center part 204 End part 210 Wiring pattern

Claims (12)

配線パターンと、前記配線パターンの表面に設けられる接続部材とを有する基板と、
前記基板の一部に貼り付けられる粘着部材と、
前記粘着部材を介して前記基板上に配置され、放射線を検出可能な半導体素子と
を備え、
前記接続部材が、前記配線パターンと前記半導体素子とを電気的に接続する放射線検出器。
A substrate having a wiring pattern and a connection member provided on the surface of the wiring pattern;
An adhesive member attached to a part of the substrate;
A semiconductor element disposed on the substrate via the adhesive member and capable of detecting radiation;
A radiation detector in which the connection member electrically connects the wiring pattern and the semiconductor element.
前記粘着部材が、前記基板の前記配線パターン上に貼り付けられ、前記粘着部材により前記配線パターンと前記半導体素子とが接着される請求項1に記載の放射線検出器。   The radiation detector according to claim 1, wherein the adhesive member is attached on the wiring pattern of the substrate, and the wiring pattern and the semiconductor element are bonded to each other by the adhesive member. 前記粘着部材が、基材と、前記基材の両面に設けられる粘着剤層とを有する両面テープである請求項2に記載の放射線検出器。   The radiation detector according to claim 2, wherein the pressure-sensitive adhesive member is a double-sided tape having a base material and a pressure-sensitive adhesive layer provided on both surfaces of the base material. 前記接続部材の厚さと前記粘着部材の厚さとが一致する請求項3に記載の放射線検出器。   The radiation detector according to claim 3, wherein a thickness of the connection member and a thickness of the adhesive member coincide. 前記半導体素子が、平面視にて略四角形状を有し、
前記粘着部材が、前記接続部材を挟んだ前記配線パターンの両端側のそれぞれに貼り付けられる請求項4に記載の放射線検出器。
The semiconductor element has a substantially square shape in plan view,
The radiation detector according to claim 4, wherein the adhesive member is attached to each of both end sides of the wiring pattern with the connection member interposed therebetween.
配線パターンと、前記配線パターンの表面に設けられる接続部材とを有する基板を準備する基板準備工程と、
粘着剤層を有する粘着部材を、前記基板の一部に貼り付ける貼り付け工程と、
前記粘着部材を介して前記基板上に放射線を検出可能な半導体素子を配置し、前記半導体素子を前記基板に一時的に固定する仮固定工程と
を備える放射線検出器の製造方法。
A substrate preparation step of preparing a substrate having a wiring pattern and a connection member provided on a surface of the wiring pattern;
A sticking step of sticking an adhesive member having an adhesive layer to a part of the substrate;
A method of manufacturing a radiation detector comprising: a semiconductor element capable of detecting radiation on the substrate via the adhesive member; and a temporary fixing step of temporarily fixing the semiconductor element to the substrate.
前記仮固定工程の後に前記接続部材を硬化させ、前記配線パターンと前記半導体素子とを電気的に接続させる硬化工程
を更に備える請求項6に記載の放射線検出器の製造方法。
The manufacturing method of the radiation detector of Claim 6 further equipped with the hardening process which hardens the said connection member after the said temporary fixing process, and electrically connects the said wiring pattern and the said semiconductor element.
前記貼り付け工程が、前記基板の前記配線パターン上に前記粘着部材を貼り付け、前記粘着部材により前記配線パターンと前記半導体素子とを接着させる請求項7に記載の放射線検出器の製造方法。   The method of manufacturing a radiation detector according to claim 7, wherein in the attaching step, the adhesive member is attached on the wiring pattern of the substrate, and the wiring pattern and the semiconductor element are adhered by the adhesive member. 前記粘着部材が、基材と、前記基材の両面に前記粘着剤層を有する両面テープである請求項8に記載の放射線検出器の製造方法。   The method for manufacturing a radiation detector according to claim 8, wherein the pressure-sensitive adhesive member is a base material and a double-sided tape having the pressure-sensitive adhesive layer on both surfaces of the base material. 前記仮固定工程が、前記半導体素子を前記基板側に向けて押し付けることにより前記接続部材の厚さを前記粘着部材の厚さに一致させる請求項9に記載の放射線検出器の製造方法。   The method of manufacturing a radiation detector according to claim 9, wherein in the temporary fixing step, the thickness of the connection member is matched with the thickness of the adhesive member by pressing the semiconductor element toward the substrate. 前記半導体素子が、平面視にて略四角形状を有し、
前記貼り付け工程が、前記接続部材を挟んだ前記配線パターンの両端側のそれぞれに前記粘着部材を貼り付ける請求項10に記載の放射線検出器の製造方法。
The semiconductor element has a substantially square shape in plan view,
The method of manufacturing a radiation detector according to claim 10, wherein in the attaching step, the adhesive member is attached to each of both end sides of the wiring pattern with the connection member interposed therebetween.
長手方向に略一定の幅を有する中央部と、前記中央部の両端のそれぞれに前記中央部の幅より広い幅を有する端部とを有する配線パターンと、前記配線パターンの表面に設けられる接続部材とを有する基板と、
前記配線パターンの前記端部に貼り付けられる粘着部材と、
前記粘着部材を介して前記基板上に配置され、放射線を検出可能な半導体素子と
を備え、
前記接続部材が、前記配線パターンと前記半導体素子とを電気的に接続する放射線検出器。
A wiring pattern having a central portion having a substantially constant width in the longitudinal direction, end portions having a width wider than the width of the central portion at each of both ends of the central portion, and a connecting member provided on the surface of the wiring pattern A substrate having
An adhesive member attached to the end of the wiring pattern;
A semiconductor element disposed on the substrate via the adhesive member and capable of detecting radiation;
A radiation detector in which the connection member electrically connects the wiring pattern and the semiconductor element.
JP2010160581A 2010-07-15 2010-07-15 Radiation detector and method for manufacturing radiation detector Expired - Fee Related JP5725747B2 (en)

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JPH0621501A (en) * 1992-03-31 1994-01-28 Canon Inc Solar cell module and manufacture thereof
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