JP2012009830A - Imprint system, imprint method, program and computer storage medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form a prescribed resist pattern on a substrate appropriately and efficiently using a template.SOLUTION: An imprint system 1 has a configuration connecting together the followings: a wafer carry-in-and-out station 2; a wafer processing station 3 which forms a first resist film on a wafer W; an imprint processing station 4 which forms a second resist film on the wafer W and a prescribed resist pattern upon the second resist film; a template processing station 5 which deposits a release agent on the template; and a template carry-in-and-out station 6. In the imprint process station 4, a plurality of imprint units 60 to form the second resist film and the prescribed resist pattern are provided.

Description

  The present invention relates to an imprint system for forming a predetermined resist pattern on a substrate using a template having a transfer pattern formed on the surface, an imprint method using the imprint system, a program, and a computer storage medium.

  For example, in a semiconductor device manufacturing process, for example, a photolithography process is performed on a semiconductor wafer (hereinafter referred to as “wafer”) to form a predetermined resist pattern on the wafer. Then, using the resist pattern as a mask, an etching process is performed on the film to be processed on the wafer, and then a resist film removing process or the like is performed to form a predetermined pattern of the film to be processed.

  When the resist pattern described above is formed, the resist pattern is required to be miniaturized in order to achieve higher integration of the semiconductor device. In general, the limit of miniaturization in the photolithography process is about the wavelength of light used for the exposure process. For this reason, it has been advancing to shorten the wavelength of exposure light. However, there are technical and cost limitations to shortening the wavelength of the exposure light source, and it is difficult to form a fine resist pattern on the order of several nanometers, for example, only by the method of advancing the wavelength of light. is there.

  Therefore, in recent years, it has been proposed to form a fine resist pattern on a wafer by using a so-called imprint method instead of performing a photolithography process on the wafer. In this method, a template having a fine pattern on the surface (sometimes referred to as a mold or a mold) is pressed onto the surface of a resist film formed on a wafer, then peeled off, and directly patterned on the surface of the resist film. Transfer is performed (Patent Document 1).

JP 2009-43998 A

  However, at present, it is technically difficult to form a predetermined fine pattern on the surface of the template. That is, it is difficult to form a pattern having a deep groove with a high aspect ratio on the template. When the imprint process described above is performed using such a template, a thin resist pattern is formed on the wafer. In this case, when the etching process of the film to be processed on the wafer is performed thereafter, the resist pattern cannot exhibit a sufficient etching resistance, and the pattern of the film to be processed cannot be appropriately formed.

  Therefore, it is conceivable to form another resist film on the film to be processed in advance before performing the above-described imprint process. In this case, another resist film is etched using the resist pattern formed by the imprint process as a mask to form another resist pattern. Then, these two resist patterns can be integrated to exhibit sufficient etching resistance, and the pattern of the film to be processed can be appropriately formed.

  However, the processing time required for each wafer differs between the other resist film formation processing and the imprint processing. The other resist film is formed, for example, by applying a coating solution on a wafer and baking the coating solution. In this case, the processing time required for one wafer is short, and in the current apparatus, for example, another resist film can be formed on 200 wafers per hour. On the other hand, in the imprint process, after a resist film is formed on the wafer, the template pattern is transferred to the resist film a plurality of times, for example, 100 times. For this reason, the processing time required for one wafer is long, and the current apparatus has a limit of performing imprint processing on, for example, 20 wafers per hour.

  If two processes having different processing times are continuously performed in this way, the other resist film forming process must be stopped during the imprint process. Therefore, it is practically difficult to continuously and efficiently form a predetermined resist pattern on a plurality of wafers, and it cannot cope with mass production of semiconductor devices.

  The present invention has been made in view of such a point, and an object thereof is to appropriately and efficiently form a predetermined resist pattern on a substrate using a template.

  In order to achieve the above object, the present invention provides an imprint system for forming a predetermined resist pattern on a substrate using a template having a transfer pattern formed on the surface, wherein the first resist film is formed on the substrate. A template processing station having a release agent processing block for forming a release agent on the surface of the template, and a second resist film on the substrate on which the first resist film is formed A plurality of imprint units are arranged to transfer a template transfer pattern on which the release agent is formed to the second resist film to form a predetermined resist pattern on the second resist film, An imprint processing station connected to the substrate processing station and the template processing station; and the substrate processing station A substrate loading / unloading station for loading / unloading a substrate to / from the substrate processing station, and a template loading / unloading station connected to the template processing station for loading / unloading a template to / from the template processing station. It is said.

  According to the present invention, with respect to one substrate processing station, the imprint processing station forms a second resist film and a predetermined resist pattern (hereinafter sometimes referred to as “imprint processing”). A plurality of imprint units to be performed are arranged. Therefore, the first resist film can be formed on the plurality of substrates at the substrate processing station, and the plurality of substrates on which the first resist film is formed can be continuously transferred from the substrate processing station to the imprint processing station. In addition, since the template processing station is connected to the imprint processing station, a plurality of templates on which a release agent is formed can be continuously conveyed from the template processing station to the imprint processing station. In the imprint processing station, imprint processing for each substrate using each template can be performed in parallel in each imprint unit. For this reason, even when the processing time in the substrate processing station and the processing time in the imprint unit are different, the substrate can be processed properly continuously without stopping the processing of the substrate in the substrate processing station. Therefore, a predetermined resist pattern can be appropriately and efficiently formed on the substrate.

  The substrate processing station and the template processing station may be stacked in the vertical direction, and the substrate loading / unloading station and the template loading / unloading station may be stacked in the vertical direction. In this case, the template processing station may be disposed above the substrate processing station, and the template loading / unloading station may be disposed above the substrate loading / unloading station.

  The substrate processing station and the template processing station may be arranged side by side in the horizontal direction with the imprint processing station interposed therebetween.

  The substrate processing station may include a coating unit that applies a coating solution onto the substrate.

  The coating unit may supply liquid vapor forming the first resist film onto the substrate.

  The substrate processing station may include an adhesive application unit that applies an adhesive that improves adhesion to the second resist film on the substrate on which the first resist film is formed.

  The adhesion agent application unit may supply adhesion agent vapor onto the substrate on which the first resist film is formed.

  The adhesive application unit may have a function of supplying water vapor to the substrate.

  In the template processing station, a template cleaning block for cleaning the surface of the template carried out from the imprint processing station may be arranged.

  The imprint processing station is formed with two rows of imprint blocks in which the plurality of imprint units are arranged in a horizontal direction, and a substrate and a template are placed on each imprint unit between the two rows of imprint blocks. A transport region for transport may be formed.

  A release agent film forming unit for supplying a release agent vapor to the surface of the template to form a release agent film on the surface may be provided in the release agent processing block.

  The release agent film forming unit may have a function of supplying water vapor to the template.

  According to another aspect, the present invention provides an imprint method for forming a predetermined resist pattern on a substrate using a template having a transfer pattern formed on a surface thereof in the imprint system, wherein the imprint system includes a substrate. A substrate processing station for forming a first resist film thereon, a template processing station having a release agent processing block for forming a release agent on the surface of the template, and a substrate on which the first resist film is formed A second resist film is formed thereon, and a template transfer pattern on which the release agent is formed is transferred to the second resist film to form a predetermined resist pattern on the second resist film. A plurality of print units are arranged, and the imprint is connected to the substrate processing station and the template processing station. A processing station, a substrate loading / unloading station connected to the substrate processing station for loading / unloading a substrate, and a template loading / unloading station connected to the template processing station for loading / unloading a template to / from the template processing station And forming a first resist film on the plurality of substrates at the substrate processing station, and forming a release agent on the surfaces of the plurality of templates at the template processing station. A plurality of substrates on which the first resist film is formed are continuously conveyed to the imprint processing station, and a plurality of templates on which the release agent is formed from the template processing station to the imprint processing station. Conveyed continuously over bets, in the imprint processing station, forming a predetermined resist pattern for each substrate using the template is characterized by dividing in parallel with each imprint unit.

  In the substrate processing station, a coating solution may be applied onto the substrate.

  A template cleaning block may be disposed in the template processing station, and a surface of the template carried out from the imprint processing station may be cleaned in the template cleaning block.

  The imprint system includes an adhesive agent coating unit that applies an adhesive agent that improves adhesion to the second resist film on the substrate on which the first resist film is formed, in the substrate processing station. In addition, after the first resist film is formed, the adhesive may be applied onto the substrate.

  According to another aspect of the present invention, there is provided a program that operates on a computer of a control unit that controls the imprint system in order to cause the imprint method to be executed by the imprint system.

  According to another aspect of the present invention, a readable computer storage medium storing the program is provided.

  According to the present invention, a predetermined resist pattern can be appropriately and efficiently formed on a substrate using a template.

It is a top view which shows the outline of a structure of the imprint system concerning this Embodiment. It is a side view which shows the outline of a structure of the imprint system concerning this Embodiment. It is a side view which shows the outline of the internal structure of the imprint system concerning this Embodiment. It is a side view which shows the outline of a structure of the imprint system concerning this Embodiment. It is a perspective view of a template. It is a longitudinal cross-sectional view which shows the outline of a structure of a resist application unit. It is a cross-sectional view which shows the outline of a structure of a resist application unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a heating unit. It is a longitudinal cross-sectional view which shows the outline of a structure of the imprint unit. It is a cross-sectional view which shows the outline of a structure of an imprint unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a mold release agent application unit. It is a top view which shows the outline of a structure of a holding member. It is a cross-sectional view which shows the outline of a structure of a mold release agent application unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a rinse unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a pre-cleaning unit. It is a cross-sectional view which shows the outline of a structure of a pre-cleaning unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a post-cleaning unit. It is a cross-sectional view which shows the outline of a structure of a post-cleaning unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a heating unit. It is the flowchart which showed each process of a wafer process, a template process, and an imprint process. It is explanatory drawing which showed typically the state of the wafer and template in each process of a wafer process, a template process, and an imprint process, (a) shows a mode that the surface of the template was wash | cleaned, (b) (C) shows a state in which the release agent on the template is baked, (d) shows a state in which the release agent is formed on the template, (E) shows how the first resist film is formed on the wafer, (f) shows how the second resist film is formed on the wafer, and (g) shows the second resist film on the wafer. A state in which the resist film is photopolymerized is shown, (h) shows a state in which a resist pattern is formed on the wafer, and (i) shows a state in which the remaining film on the wafer is removed. It is a top view which shows the outline of a structure of the imprint system concerning other embodiment. It is a top view which shows the outline of a structure of the imprint system concerning other embodiment. It is a top view which shows the outline of the internal structure of the imprint system concerning other embodiment. It is a side view which shows the outline of a structure of the imprint system concerning other embodiment. It is a side view which shows the outline of the internal structure of the imprint system concerning other embodiment. It is a side view which shows the outline of a structure of the imprint system concerning other embodiment. It is a longitudinal cross-sectional view which shows the outline of a structure of the film-forming unit of adhesive agent.

  Embodiments of the present invention will be described below. FIG. 1 is a plan view showing an outline of a configuration of an imprint system 1 according to the present embodiment. 2 to 4 are side views illustrating the outline of the configuration of the imprint system 1.

In the imprint system 1 of the present embodiment, a template T having a rectangular parallelepiped shape and having a predetermined transfer pattern C formed on the surface is used as shown in FIG. Hereinafter, the transfer pattern C means the side of the template T which is formed with the surface T _1, the surface T ₁ opposite to the surface of the backside T _2. For the template T, a transparent material that can transmit visible light, near ultraviolet light, ultraviolet light, or the like, such as glass, is used.

As shown in FIG. 1, the imprint system 1 carries in and out a plurality of, for example, 25 wafers W as a substrate between the outside and the imprint system 1 in a cassette unit, or the wafer _{W with} respect to the wafer cassette CW. A wafer loading / unloading station 2 as a substrate loading / unloading station, a wafer processing station 3 as a substrate processing station including a plurality of processing units for performing predetermined processing on the wafer W, and a template T. An imprint processing station 4 having a plurality of imprint units for forming a predetermined resist pattern on W, a template processing station 5 having a plurality of processing units for performing predetermined processing on the template T, and a plurality of, for example, five templates T in cassette unit and external and imprint system 1 Or transferring, between a template unloading station 6 or transferring, the template T with respect to the template cassette C _T, has a structure obtained by connecting together. The wafer carry-in / out station 2, the wafer processing station 3, the imprint processing station 4, the template processing station 5, and the template carry-in / out station 6 are arranged in this order in the Y direction (left and right direction in FIG. 1).

The wafer loading / unloading station 2 is provided with a cassette mounting table 10. The cassette mounting table 10 can mount a plurality of wafer cassettes _CW in a row in the X direction (vertical direction in FIG. 1). That is, the wafer carry-in / out station 2 is configured to be capable of holding a plurality of wafers W. In this embodiment, a film to be processed (not shown) to be etched is formed in advance on the wafer W in the wafer cassette _CW .

The wafer carry-in / out station 2 is provided with a wafer carrier 12 that can move on a conveyance path 11 extending in the X direction. The wafer transfer body 12 can be expanded and contracted in the horizontal direction and can also move in the vertical direction and the vertical direction (θ direction), and can transfer the wafer _W between the wafer cassette _CW and the wafer processing station 3.

  The wafer processing station 3 is provided with a transfer unit 20 at the center thereof. Around the transport unit 20, for example, four processing blocks G1 to G4 in which various processing units are arranged in multiple stages are arranged. On the front side of the wafer processing station 3 (X direction negative direction side in FIG. 1), the first processing block G1 and the second processing block G2 are sequentially arranged from the wafer carry-in / out station 2 side. A third processing block G3 and a fourth processing block G4 are arranged in this order from the wafer carry-in / out station 2 side on the back side of the processing station 3 (the positive side in the X direction in FIG. 1). On the wafer carry-in / out station 2 side of the wafer processing station 3, a transition unit 21 for transferring the wafer W is disposed. On the imprint processing station 4 side of the wafer processing station 3, a transition unit 22 for delivering the wafer W and a buffer cassette 23 for temporarily storing the wafer W are arranged.

  The transfer unit 20 has a transfer arm that holds and transfers the wafer W and is movable in the horizontal direction, the vertical direction, and the vertical direction. The transfer unit 20 can transfer the wafer W to various processing units, transition units 21 and 22, and a buffer cassette 23, which will be described later, arranged in the processing blocks G1 to G4.

  As shown in FIG. 2, the first processing block G1 includes a plurality of liquid processing units, for example, resist coating units 30, 31 as coating units for coating a first resist liquid as a coating liquid on the wafer W. Are stacked in two stages. Similarly, in the second processing block G2, resist coating units 32 and 33 are stacked in two stages in order from the bottom. In addition, chemical chambers 34 and 35 for supplying various processing liquids to the liquid processing unit are provided at the lowermost stages of the first processing block G1 and the second processing block G2, respectively.

  In the third processing block G3, as shown in FIG. 4, temperature adjusting units 40 and 41 for adjusting the temperature of the wafer W, and heating units 42 and 43 for heating the wafer W are stacked in four stages in order from the bottom. Yes.

  In the fourth processing block G4, similarly to the third processing block G3, the temperature adjustment units 50 and 51 and the heating units 52 and 53 for heating the wafer W are sequentially stacked in four stages from the bottom.

  In the imprint processing station 4, two rows of imprint blocks E1 and E2 are arranged as shown in FIG. The first imprint block E1 is disposed on the front side of the imprint processing station 4 (X direction negative direction side in FIG. 1), and the second imprint block E2 is on the back side of the imprint processing station 4 (in FIG. 1). (X direction positive direction side). A transfer area E3 for transferring the wafer W and the template T is formed between the two rows of imprint blocks E1 and E2.

  In the first imprint block E1, a plurality of, for example, five imprint units 60 are arranged in the Y direction. Further, a transition unit 61 that transfers the wafer W and the template T is disposed on the transfer area side E3 of each imprint unit 60.

  Similarly to the first imprint block E1, a plurality of, for example, five imprint units 60 and transition units 61 are also arranged in the Y direction in the second imprint block E2.

  The number of imprint units 60 is set based on the processing time at the wafer processing station 3 and the processing time of the imprint unit 60. That is, the wafer processing station 3 can perform wafer processing on, for example, 200 wafers W per hour. On the other hand, in the imprint unit 60, for example, imprint processing is performed on 20 wafers W per hour. Therefore, in the present embodiment, ten imprint units 60 are provided in the imprint processing station 4.

  In the transfer area E3, a wafer transfer unit 70 that holds and transfers the wafer W and a template transfer unit 71 that holds and transfers the template T are provided. Wafer transfer unit 70 and template transfer unit 71 are arranged so as not to interfere with each other.

  The wafer transfer unit 70 has, for example, a transfer arm that can be expanded and contracted in the horizontal direction and is also movable in the vertical direction and the vertical direction (θ direction). The wafer transfer unit 70 moves in the transfer area E3 and can transfer the wafer W between the wafer processing station 3 and the transition unit 61.

  Similarly, the template unit 71 also has a transfer arm that can be expanded and contracted in the horizontal direction and can also move in the vertical direction and the vertical direction (θ direction). The template transport unit 71 can move in the transport area E3 and transport the template T between the template carry-in / out station 5 and the transition unit 61.

  The template processing station 5 is provided with a transport unit 80 at the center thereof. Around the transport unit 80, for example, six processing blocks F1 to F6 in which various processing units are arranged in multiple stages are arranged. On the front side of the template processing station 5 (X direction negative direction side in FIG. 1), the first processing block F1 and the second processing block F2 are sequentially arranged from the template loading / unloading station 6 side. A third processing block F3 is disposed on the template loading / unloading station 6 side of the template processing station 5, and a fourth processing block F4 and a buffer cassette 81 are disposed on the imprint processing station 4 side of the template processing station 5. Has been. A fifth processing block F5 and a sixth processing block F6 are arranged in this order from the template loading / unloading station 6 side on the back side of the template processing station 5 (X direction positive direction side in FIG. 1). The transport unit 80 can transport the template T to various processing units and buffer cassettes 81 to be described later disposed in these processing blocks F1 to F6. In the present embodiment, the processing blocks F1 to F4 constitute a release agent processing block, and the processing blocks F5 and F6 constitute a template cleaning block.

  As shown in FIG. 2, the first processing block F1 includes a plurality of liquid processing units, for example, a release agent application unit 90 for applying a release agent to the template T, and a rinse unit for rinsing the release agent on the template T. 91 are stacked in two steps from the bottom. Similarly, in the second processing block F2, a release agent coating unit 92 and a rinse unit 93 are stacked in two stages in order from the bottom. In addition, chemical chambers 94 and 95 for supplying various processing liquids to the liquid processing unit are provided at the lowermost stage of the first processing block F1 and the second processing block F2, respectively.

The third processing block F3, ultraviolet rays are irradiated to the template T as shown in FIG. 3, the cleaning unit 100 before the pre-cleaning the surface T ₁ of the release agent on the template T is deposited, Temperature control units 101 and 102 for adjusting the temperature of the template T, a transition unit 103 for transferring the template T, and heating units 104 and 105 for heat-treating the template T are stacked in six stages from the bottom.

  Similarly to the third processing block F3, the pre-cleaning unit 110, the temperature control units 111 and 112, the transition unit 113, and the heating units 114 and 115 are stacked in six steps from the bottom on the fourth processing block F4. Yes.

The fifth processing block F5, the inspection unit 122 for inspecting the cleaning unit 120 and 121, the surface _{T 1} of the template T after washing after cleaning the surface _{T 1} of the template T after use, as shown in FIG. 4 Three layers are stacked in order from the bottom.

In the sixth processing block F6, as in the fifth processing block F5, the post-cleaning units 130 and 131 and the inspection unit 132 are stacked in three stages in order from the bottom. Incidentally, post-cleaning unit 120,121,130,131 may be the rear surface _{T 2} also further washed template T, the inspection unit 122 and 132 may be further examined also the rear surface _{T 2} of the template T.

The template loading / unloading station 6 is provided with a cassette mounting table 140 as shown in FIG. The cassette mounting table 140 is capable of mounting a plurality of template cassettes _{CT in a line} in the X direction (vertical direction in FIG. 1). That is, the template carry-in / out station 6 is configured to be capable of holding a plurality of templates T.

The template carry-in / out station 6 is provided with a template carrier 142 that can move on a conveyance path 141 extending in the X direction. The template transport body 142 can expand and contract in the horizontal direction and can also move in the vertical direction and the vertical direction (θ direction), and can transport the template T between the template cassette _CT and the template processing station 5.

  Next, the configuration of the resist coating units 30 to 33 of the wafer processing station 3 described above will be described. As shown in FIG. 6, the resist coating unit 30 has a casing 200 in which a loading / unloading port (not shown) for the wafer W is formed on the side surface.

  A spin chuck 210 that holds and rotates the wafer is provided at the center of the casing 200. The spin chuck 210 has a horizontal upper surface, and a suction port (not shown) for sucking the wafer W, for example, is provided on the upper surface. By suction from this suction port, the wafer W can be sucked and held on the spin chuck 210.

  The spin chuck 210 is provided with a rotation drive unit 212 via a shaft 211. By this rotation drive unit 212, the spin chuck 210 can rotate at a predetermined speed around the vertical and can move up and down.

  Around the spin chuck 210, there is provided a cup 213 that receives and collects the liquid scattered or dropped from the wafer W. A lower surface of the cup 213 is connected to a discharge pipe 214 that discharges the collected liquid and an exhaust pipe 215 that exhausts the atmosphere in the cup 213.

  As shown in FIG. 7, a rail 220 extending along the Y direction (left and right direction in FIG. 7) is formed on the negative side of X direction (downward direction in FIG. 7) of the cup 213. The rail 220 is formed, for example, from the outside of the cup 213 on the Y direction negative direction (left direction in FIG. 7) side to the outside on the Y direction positive direction (right direction in FIG. 7) side. An arm 221 is attached to the rail 220.

  A resist solution nozzle 222 that supplies a first resist solution onto the wafer W is supported on the arm 221. The arm 221 is movable on the rail 220 by the nozzle driving unit 223. As a result, the resist solution nozzle 222 can move from the standby unit 224 installed on the outer side of the cup 213 on the positive side in the Y direction to above the center of the wafer W in the cup 213, and further on the wafer W. It can move in the radial direction. The arm 221 can be moved up and down by a nozzle driving unit 223, and the height of the resist solution nozzle 222 can be adjusted. In the present embodiment, for example, a resist solution containing carbon is used as the first resist solution as the coating solution. Further, as a coating solution, a coating solution for forming an SOG (Spin On Glass) film may be used.

  Note that the configuration of the resist coating units 31 to 33 is the same as the configuration of the resist coating unit 30 described above, and a description thereof will be omitted.

  Next, the configuration of the heating units 42, 43, 52, and 53 of the wafer processing station 3 described above will be described. As shown in FIG. 8, the heating unit 42 has a casing 230 in which a loading / unloading port (not shown) for the wafer W is formed on the side surface.

  A mounting table 231 on which the wafer W is mounted is provided on the bottom surface in the casing 230. The wafer W is mounted on the upper surface of the mounting table 231 so that the surface to be processed faces upward. In the mounting table 231, raising / lowering pins 232 for supporting the wafer W from below and raising / lowering it are provided. The elevating pin 232 can be moved up and down by the elevating drive unit 233. A through hole 234 that penetrates the upper surface in the thickness direction is formed on the upper surface of the mounting table 231, and the elevating pin 232 is inserted through the through hole 234. A hot plate 235 for heating the wafer W is provided on the upper surface of the mounting table 231. Inside the hot plate 235, for example, a heater that generates heat by power feeding is provided, and the hot plate 235 can be adjusted to a predetermined set temperature. The hot plate 235 may be provided above the wafer W, for example, on the ceiling surface of the lid 240 described later. Further, hot plates 235 may be provided above and below the wafer W.

  Above the mounting table 231, a lid body 240 that is movable up and down is provided. The lid 240 has an open bottom surface and forms a processing chamber K together with the mounting table 231. An exhaust part 241 is provided at the center of the upper surface of the lid 240. The atmosphere in the processing chamber K is uniformly exhausted from the exhaust unit 241.

  In addition, since the structure of the heating units 43, 52, and 53 is the same as that of the heating unit 42 mentioned above, description is abbreviate | omitted.

  Further, the temperature control units 40, 41, 50, 51 have the same configuration as that of the heating unit 42 described above, and a temperature control plate is used instead of the heat plate 235. A cooling member such as a Peltier element is provided inside the temperature adjustment plate, and the temperature adjustment plate can be adjusted to a set temperature. In this case, the lid 240 in the heating unit 42 may be omitted.

  Next, the configuration of the imprint unit 60 of the above-described imprint processing station 4 will be described. As shown in FIG. 9, the imprint unit 60 has a casing 250 in which a loading / unloading port (not shown) for the wafer W and a loading / unloading port (not shown) for the template T are formed on the side surfaces.

  A wafer holder 251 on which the wafer W is placed and held is provided on the bottom surface in the casing 250. The wafer W is placed on the upper surface of the wafer holder 251 so that the surface to be processed faces upward. In the wafer holding part 251, raising / lowering pins 252 for supporting the wafer W from below and raising / lowering it are provided. The elevating pin 252 can be moved up and down by the elevating drive unit 253. A through hole 254 that penetrates the upper surface in the thickness direction is formed on the upper surface of the wafer holding unit 251, and the elevating pins 252 are inserted through the through hole 254. Further, the wafer holding unit 251 can be moved in the horizontal direction and can be rotated around the vertical by a moving mechanism 255 provided below the wafer holding unit 251.

  As shown in FIG. 10, a rail 260 extending along the Y direction (left and right direction in FIG. 10) is provided on the X direction negative direction (downward direction in FIG. 10) side of the wafer holding unit 251. For example, the rail 260 is formed from the outside of the wafer holding portion 251 on the Y direction negative direction (left direction in FIG. 10) side to the outside on the Y direction positive direction (right direction in FIG. 10) side. An arm 261 is attached to the rail 260.

  The arm 261 supports a resist solution nozzle 262 that supplies a second resist solution onto the wafer W. The resist solution nozzle 262 has, for example, an elongated shape along the X direction that is the same as or longer than the diameter dimension of the wafer W. For example, an ink jet type nozzle is used as the resist solution nozzle 262, and a plurality of supply ports (not shown) formed in a line along the longitudinal direction are formed below the resist solution nozzle 262. The resist solution nozzle 262 can strictly control the supply timing of the second resist solution, the supply amount of the second resist solution, and the like.

  The arm 261 is movable on the rail 260 by the nozzle driving unit 263. As a result, the resist solution nozzle 262 can move from the standby unit 264 installed outside the wafer holding unit 251 on the positive side in the Y direction to above the wafer W on the wafer holding unit 251, and the surface of the wafer W The top can be moved in the radial direction of the wafer W. Further, the arm 261 can be moved up and down by a nozzle driving unit 263, and the height of the resist solution nozzle 262 can be adjusted.

A template holding unit 270 that holds the template T as shown in FIG. 9 is provided on the ceiling surface in the casing 250 and above the wafer holding unit 251. That is, the wafer holding unit 251 and the template holding unit 270 are arranged so that the wafer W placed on the wafer holding unit 251 and the template T held on the template holding unit 270 face each other. Furthermore, the template holding portion 270 has a chuck 271 for holding adsorb outer peripheral portion of the rear surface T ₂ of the template T. The chuck 271 is movable in the vertical direction and rotatable about the vertical by a moving mechanism 272 provided above the chuck 271. Thus, the template T can be rotated up and down in a predetermined direction with respect to the wafer W on the wafer holding unit 251.

  The template holding part 270 has a light source 273 provided above the template T held by the chuck 271. The light source 273 emits light such as visible light, near ultraviolet light, and ultraviolet light, and the light from the light source 273 passes through the template T and is irradiated downward.

  In the imprint unit 60, a wafer transfer mechanism (not shown) that transfers the wafer W to / from the transition unit 61 and a template transfer mechanism (not shown) that transfers the template T to / from the transition unit 61. ) And are provided. The template transport mechanism is configured to be rotatable so as to invert the front and back surfaces of the template T.

  Next, the configuration of the release agent application units 90 and 92 of the template processing station 5 described above will be described. As shown in FIG. 11, the release agent coating unit 90 has a casing 280 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

  A holding member 281 that holds and rotates the template T is provided at the center of the casing 280. A central portion of the holding member 281 is recessed downward, and an accommodating portion 282 for accommodating the template T is formed. A groove portion 282 a smaller than the outer shape of the template T is formed in the lower portion of the housing portion 282. Therefore, in the accommodating portion 282, the inner peripheral portion of the lower surface of the template T is not in contact with the holding member 281 by the groove portion 282a, and only the outer peripheral portion of the lower surface of the template T is supported by the holding member 281. As shown in FIG. 12, the accommodating portion 282 has a substantially rectangular planar shape that conforms to the outer shape of the template T. A plurality of projecting portions 283 projecting inward from the side surfaces are formed in the housing portion 282, and the template T housed in the housing portion 282 is positioned by the projecting portions 283. In addition, when the template T is transferred from the transfer arm of the transfer unit 80 to the storage unit 282, there are four notches 284 on the outer periphery of the storage unit 282 in order to prevent the transfer arm from interfering with the storage unit 282. It is formed in the place.

  As shown in FIG. 11, the holding member 281 is attached to the cover body 285, and a rotation driving unit 287 is provided below the holding member 281 via a shaft 286. By this rotation drive unit 287, the holding member 281 can rotate around the vertical at a predetermined speed and can move up and down.

  Around the holding member 281, there is provided a cup 290 that receives and collects the release agent S scattered or dropped from the template T. A discharge pipe 291 that discharges the collected release agent S and an exhaust pipe 292 that exhausts the atmosphere in the cup 290 are connected to the lower surface of the cup 290.

  As shown in FIG. 13, a rail 300 extending along the Y direction (left and right direction in FIG. 13) is formed on the negative side in the X direction (downward direction in FIG. 13) of the cup 290. The rail 300 is formed, for example, from the outer side of the cup 290 on the Y direction negative direction (left direction in FIG. 13) to the outer side on the Y direction positive direction (right direction in FIG. 13). An arm 301 is attached to the rail 300.

  A release agent nozzle 302 that supplies a release agent onto the template T is supported on the arm 301. The arm 301 is movable on the rail 300 by a nozzle driving unit 303. As a result, the release agent nozzle 302 can move from the standby unit 304 installed on the outer side of the cup 290 on the positive side in the Y direction to above the center of the template T in the cup 290. The arm 301 can be moved up and down by a nozzle driving unit 303 and the height of the release agent nozzle 302 can be adjusted. As the material for the release agent, a material having liquid repellency with respect to the second resist film on the wafer, such as a fluororesin, is used.

For example, a cleaning liquid nozzle that ejects a cleaning liquid, for example, an organic solvent, may be provided in the groove 282 a of the holding member 281. By spraying the cleaning liquid onto the back surface T _{2 of the} template T from the cleaning liquid nozzle, the back surface T ₂ can be cleaned.

  Note that the configuration of the release agent application unit 92 is the same as the configuration of the release agent application unit 90 described above, and a description thereof will be omitted.

  Next, the structure of the rinse units 91 and 93 of the template processing station 5 described above will be described. As shown in FIG. 14, the rinse unit 91 has a casing 310 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

  An immersion tank 311 in which the template T is immersed is provided on the bottom surface in the casing 310. In the immersion tank 311, an organic solvent for rinsing the release agent on the template T is stored.

A holding part 312 for holding the template T is provided on the ceiling surface in the casing 310 and above the immersion tank 311. Holding portion 312, the outer peripheral portion of the rear surface _{T 2} of the template T has a chuck 313 for holding suction. Template T has a surface T ₁ is held by the chuck 313 to face upward. The chuck 313 can be moved up and down by a lifting mechanism 314. And the template T is immersed in the organic solvent stored in the immersion tank 311 in the state hold | maintained at the holding | maintenance part 312, and the mold release agent on the said template T is rinsed.

The holding unit 312 has a gas supply unit 315 provided above the template T held by the chuck 313. The gas supply unit 315 can spray an inert gas such as nitrogen or a gas gas such as dry air downward, that is, the surface T ₁ of the template T held by the chuck 313. Thus, it is possible to dry the surface T ₁ of the rinsing template T in the immersion bath 311. The rinse unit 91 is connected to an exhaust pipe (not shown) that exhausts the internal atmosphere.

  The configuration of the rinse unit 93 is the same as the configuration of the rinse unit 91 described above, and a description thereof will be omitted.

  Next, the configuration of the pre-cleaning units 100 and 110 of the template processing station 5 described above will be described. As shown in FIG. 15, the pre-cleaning unit 100 has a casing 320 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

A chuck 321 for attracting and holding the template T is provided in the casing 320. Chuck 321, the surface _{T 1} of the template T to face upward, suction-holds the rear surface _{T 2.} A chuck driving unit 322 is provided below the chuck 321. The chuck driving unit 322 is provided on a bottom surface in the casing 320 and attached to a rail 323 extending along the Y direction. The chuck 321 can be moved along the rail 323 by the chuck driving unit 322.

An ultraviolet irradiation unit 324 that irradiates the template T held by the chuck 321 with ultraviolet rays is provided on the ceiling surface in the casing 320 and above the rail 323. The ultraviolet irradiation unit 324 extends in the X direction as shown in FIG. Then, while the template T is moving along the rail 323, the surface T ₁ of the template T is irradiated with ultraviolet rays from the ultraviolet irradiation unit 324 so that the entire surface T ₁ of the template T is irradiated with ultraviolet rays.

  Note that the configuration of the pre-cleaning unit 110 is the same as the configuration of the pre-cleaning unit 100 described above, and a description thereof will be omitted.

  Next, the configuration of the post-cleaning units 120, 121, 130, 131 of the template processing station 5 described above will be described. As shown in FIG. 17, the post-cleaning unit 120 has a casing 330 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

On the bottom surface in the casing 330, a mounting table 331 on which the template T is mounted is provided. Template T has a surface T ₁ is placed on the top surface of the mounting table 331 to face upward. In the mounting table 331, elevating pins 332 for supporting the template T from below and elevating it are provided. The raising / lowering pin 332 can be moved up and down by the raising / lowering drive part 333. A through hole 334 penetrating the upper surface in the thickness direction is formed on the upper surface of the mounting table 331, and the elevating pin 332 is inserted through the through hole 334.

  As shown in FIG. 18, a rail 340 extending along the Y direction (left-right direction in FIG. 18) is provided on the side of the mounting table 331 in the negative X direction (downward in FIG. 18). The rail 340 is formed, for example, from the outside of the mounting table 331 on the Y direction negative direction (left direction in FIG. 18) to the outside on the Y direction positive direction (right direction in FIG. 18). An arm 341 is attached to the rail 340.

  The arm 341 supports a cleaning liquid nozzle 342 that supplies a cleaning liquid onto the template T. The cleaning liquid nozzle 342 has, for example, an elongated shape along the X direction that is the same as or longer than one side dimension of the template T. For example, an organic solvent or pure water is used as the cleaning liquid, and IPA (isopropyl alcohol), dibutyl ether, cyclohexane, or the like is used as the organic solvent.

The arm 341 is movable on the rail 340 by the nozzle driving unit 343. As a result, the cleaning liquid nozzle 342 can move from the standby unit 344 installed on the outer side of the mounting table 331 on the positive side in the Y direction to above the template T on the mounting table 331, and further on the surface T _{1 of the} template T. Can be moved in the side direction of the template T. The arm 341 can be moved up and down by a nozzle driving unit 343, and the height of the cleaning liquid nozzle 342 can be adjusted.

An ultraviolet irradiation unit 345 for irradiating the template T with ultraviolet rays is provided on the ceiling surface in the casing 330 and above the mounting table 331. The ultraviolet irradiation unit 345 is disposed so as to face the surface T ₁ of the template T placed on the mounting table 331, and can irradiate the entire surface T _{1 of the} template T with ultraviolet rays.

  Note that the configurations of the post-cleaning units 121, 130, and 131 are the same as the configuration of the post-cleaning unit 120 described above, and thus description thereof is omitted.

  The configuration of the heating units 104, 105, 114, and 115 of the template processing station 5 described above is the same as the configuration of the heating units 42, 43, 52, and 53 in the wafer processing station 3 as shown in FIG. Is omitted.

  Further, the temperature control units 101, 102, 111, and 112 of the template processing station 5 have the same configuration as the heating unit 104 described above, and a temperature control plate is used instead of the hot plate 235. A cooling member such as a Peltier element is provided inside the temperature adjustment plate, and the temperature adjustment plate can be adjusted to a set temperature. In this case, the lid 240 in the heating unit 104 may be omitted.

  The imprint system 1 described above is provided with a control unit 350 as shown in FIG. The control unit 350 is a computer, for example, and has a program storage unit (not shown). The program storage unit stores a program for executing wafer processing, template processing, imprint processing, and the like in the imprint system 1. This program is recorded in a computer-readable storage medium such as a computer-readable hard disk (HD), flexible disk (FD), compact disk (CD), magnetic optical desk (MO), memory card, or the like. Or installed in the control unit 350 from the storage medium.

  The imprint system 1 according to the present embodiment is configured as described above. Next, wafer processing, template processing imprint processing, and the like performed in the imprint system 1 will be described. FIG. 20 shows the main processing flow of these wafer processing, template processing, and imprint processing, and FIG. 21 shows the state of the wafer W and template T in each step.

First, the template transfer member 22, the template T is taken from the template cassette C _T on the cassette mounting table 140 of the template unloading station 6, it is conveyed to the transition unit 103 of the template processing station 5 (step A1 in FIG. 20) . Incidentally, the template T in the template cassette C _T is the surface T ₁ of the transfer pattern C is formed is accommodated to face upward.

Thereafter, the template T is transported to the pre-cleaning unit 100 by the transport unit 80 and sucked and held by the chuck 321. Subsequently, the template T is moved along the rail 323 by the chuck driving unit 322, and the template T is irradiated with ultraviolet rays from the ultraviolet irradiation unit 324. Thus, ultraviolet light is irradiated on the surface _{T 1} the entire surface of the template T, the surface _{T 1} of the template T is cleaned as shown in FIG. 21 (a) (step A2 in FIG. 20).

Thereafter, the transport unit 80 transports the template T to the release agent coating unit 90 and delivers it to the holding member 281. Subsequently, the release agent nozzle 302 is moved to above the center of the template T and the template T is rotated. Then, the release agent S is supplied onto the rotating template T, and the release agent S is diffused on the template T by centrifugal force, so that the entire surface T _{1 of the} template T as shown in FIG. A release agent S is applied (step A3 in FIG. 20).

  Thereafter, the template T is transported to the heating unit 104 by the transport unit 80. The template T carried into the heating unit 104 is transferred to the lift pins 232 and placed on the placement table 231. Subsequently, the lid 240 is closed, and the template T is heated to, for example, 200 ° C. by the hot plate 235. After a predetermined time has elapsed, the release agent S on the template T is baked as shown in FIG. 21 (c) (step A4 in FIG. 20).

  Thereafter, the transport unit 80 transports the template T to the temperature adjustment unit 211, and the template T is adjusted to a predetermined temperature.

Thereafter, the transport unit 80 transports the template T to the rinse unit 91 and holds it in the holding unit 312. Subsequently, the holding unit 312 is lowered, and the template T is immersed in the organic solvent stored in the immersion tank 311. When a predetermined time elapses, only the unreacted part of the release agent S is peeled off, and the release agent S along the transfer pattern C is formed on the template T as shown in FIG. Step A5). Then, raise the holding portion 312, blown from the gas supply unit 315 gas gas to the template T, drying the surface T _1. The unreacted part of the release agent S means a part other than the part where the release agent S chemically reacts with the surface T _{1 of the} template T and adsorbs to the surface T ₁ .

  Thereafter, the template T is transported to the transition unit 113 by the transport unit 80. Subsequently, the template T is transported to the imprint processing station 4 by the transport unit 70. Here, the steps A1 to A5 described above are repeated to form a release agent S on the plurality of templates T, and the plurality of templates T are continuously conveyed to the imprint processing station 4. At this time, the template T on which the release agent S is formed may be temporarily stored in the buffer cassette 81 before the template T is conveyed to the imprint processing station 4.

Thereafter, the template T is transported to the transition unit 61 by the template transport unit 71. Subsequently, the template T is transported into the imprint unit 60 by the template transport mechanism in the imprint unit 60 (step A6 in FIG. 20). At this time, the front and back surfaces of the template T are reversed by the template transport mechanism. That is, the rear surface T ₂ of the template T is directed upwards. The template T carried into the imprint unit 60 is sucked and held by the chuck 271 of the template holding unit 270.

In this way, a predetermined process is performed on the template T in the template processing station 5 and the template T is transferred to the imprint unit 60 while the template T is being transferred to the imprint unit 60. _The wafer W is taken out from W and transferred to the transition unit 21 of the wafer processing station 3 (step A7 in FIG. 20). The wafer _W in the wafer cassette CW is accommodated so that the surface to be processed faces upward.

  Thereafter, the wafer W is transferred to the resist coating unit 30 by the transfer unit 20 and transferred to the spin chuck 210. Subsequently, the resist solution nozzle 222 is moved to above the center of the wafer W, and the wafer W is rotated. Then, the first resist solution is supplied onto the rotating wafer W, the first resist solution is diffused on the wafer W by centrifugal force, and the first resist solution is applied to the entire surface of the wafer W ( Step A8 in FIG.

Thereafter, the wafer W is transferred to the heating unit 42 by the transfer unit 20. The wafer W carried into the heating unit 42 is transferred to the lifting pins 232 and placed on the placement table 231. Subsequently, the lid 240 is closed, and the wafer W is heated to, for example, 200 ° C. by the hot plate 235. After a predetermined time, is fired first resist solution on the wafer W, the first resist film R ₁ is formed on the wafer W as shown in FIG. 21 (e) (step A9 in FIG. 20). The first resist film _{R 1} is formed by, for example, 10nm thickness of.

  Thereafter, the wafer W is transferred to the temperature adjustment unit 40 by the transfer unit 20, and the wafer W is adjusted to a predetermined temperature, for example, room temperature.

Thereafter, the wafer W is transferred to the transition unit 22 by the transfer unit 20. Subsequently, the wafer W is transferred to the imprint processing station 4 by the transfer unit 70. Here, it repeats the steps A7~A9 described above, the first resist film R ₁ is formed on a plurality of wafers W, a plurality of wafers W are transported continuously to the imprinting station 4. In this case, prior to transferring the wafer W to the imprinting station 4, the buffer cassette 23, the wafer W in which the first resist film R ₁ is formed may be temporarily stored.

  Thereafter, the wafer W is transferred to the transition unit 61 by the transfer unit 70. Subsequently, the wafer W is transferred into the imprint unit 60 by the wafer transfer mechanism in the imprint unit 60 (step A10 in FIG. 20).

The wafer W carried into the imprint unit 60 is transferred to the lift pins 252 and is placed and held on the wafer holding unit 251. Subsequently, after the wafer W held by the wafer holding unit 251 is moved to a predetermined position in the horizontal direction and aligned, the resist solution nozzle 262 is moved in the radial direction of the wafer W, and FIG. As shown, a second resist solution is applied onto the wafer W to form a _second resist film R2 (step A11 in FIG. 20). At this time, the control unit 350 controls the supply timing and supply amount of the second resist solution supplied from the resist solution nozzle 262. That is, in the resist pattern formed on the wafer W, the amount of the second resist solution applied to the portion corresponding to the convex portion (the portion corresponding to the concave portion in the transfer pattern C of the template T) is large and corresponds to the concave portion. The amount of the second resist solution applied to the portion to be applied (the portion corresponding to the convex portion in the transfer pattern C) is controlled to be small. In this way, the second resist solution is applied onto the wafer W in accordance with the aperture ratio of the transfer pattern C. The second resist film _{R 2} is formed by, for example, 50nm thickness of.

When the second resist film R ₂ is formed on the wafer W, held together perform positioning by moving the wafer W held by the wafer holding unit 251 in a predetermined position in the horizontal direction, the template holding portion 270 The made template T is rotated in a predetermined direction. Then, the template T is lowered to the wafer W side as shown by the arrow in FIG. Template T is lowered to a predetermined position, the surface T ₁ of the template T is pressed against the resist film R ₂ of the second on the wafer W. The predetermined position is set based on the height of the resist pattern formed on the wafer W. Subsequently, light is emitted from the light source 273. Light from the light source 273 is irradiated on the second resist film R ₂ on the wafer W passes through the template T as shown in FIG. 21 (g), whereby the second resist film R ₂ is photopolymerized . The transfer pattern C of the template T is transferred to the resist film R ₂ of the second on the wafer W, the resist pattern P is formed (step A12 in FIG. 20).

Thereafter, as shown in FIG. 21 (h), the template T is raised to form a resist pattern P on the wafer W. At this time, since the surface T ₁ of the template T release agent S is coated, never resist on the wafer W adheres to the surface T ₁ of the template T. Thereafter, the wafer W is transferred to the wafer transfer mechanism by the lift pins 252, unloaded from the imprint unit 60, and transferred to the transition unit 61 (step A <b> 13 in FIG. 20). Thereafter, the wafer W is transferred to the wafer processing station 3 by the transfer unit 70 and then returned to the wafer cassette _CW by the wafer transfer body 12. A thin resist residual film L may remain in the concave portion of the resist pattern P formed on the wafer W. For example, as shown in FIG. 21 (i), the residual film L remains outside the imprint system 1. The film L may be removed.

  The above steps A10 to A13 are repeated, and the resist pattern P is formed on each of the plurality of wafers W using one template T. Then, when steps A10 to A13 are performed on a predetermined number of wafers W, the template T is replaced. That is, after the front and back surfaces of the template T are reversed by the template transport mechanism, the template T is transported from the imprint unit 60 and transported to the transition unit 61 (step A14 in FIG. 20).

  Note that the timing for exchanging the template T is set in consideration of deterioration of the template T and the like. The template T is also replaced when a different pattern P is formed on the wafer W. For example, the template T may be exchanged every time the template T is used once. Further, for example, the template T may be exchanged for each wafer W, or the template T may be exchanged for each lot, for example.

Thereafter, the template T is transported to the transition unit 113 of the template processing station 5 by the transport unit 70 and then transported to the post-cleaning unit 120 by the transport unit 80. The template T conveyed to the post-cleaning unit 120 is transferred to the lifting pins 332 and placed on the placing table 331. Subsequently, ultraviolet rays are irradiated from the ultraviolet irradiation unit 345 to the entire surface T _{1 of the} template T. Then, the release agent S on the template T is vaporized and most of it is removed. After the elapse of a predetermined time, the irradiation of ultraviolet rays is stopped, and the cleaning liquid is supplied to the release agent S remaining on the template T while moving the cleaning liquid nozzle 342 in the side direction of the template T. Thus, the release agent S on the template T is removed, the surface _{T 1} is washed (step A15 in FIG. 20). In the case of using pure water as a cleaning solution, to avoid water marks on the surface T ₁ of the template T is attached, preferably then further washed with IPA is an organic solvent. In the post-cleaning unit 120, the rear surface _{T 2} may also be washed well surface _{T 1} of the template T.

Thereafter, the template T is transported to the inspection unit 122 by the transport unit 80. Then, in the inspection unit 122, for example, by observation or the like of the interference fringes, the surface _{T 1} of the template T is inspected (step A16 in FIG. 20). Note that the inspection unit 122 may inspect not only the front surface T _{1 of the} template T but also the back surface T ₂ .

Thereafter, the template T is carried to the transit unit 103 by the transport unit 80, and returned to the template cassette _{C T} by the template carrier 142. In the case the test result of the inspection unit 122 is good, for example, be surface T ₁ it is properly cleaned of the template T, and if the surface T ₁ is not deteriorated, the template T returned to the template cassette C _T Are used again in the imprint unit 1. On the other hand, if the inspection result of the inspection unit 122 is bad, for example if the surface T ₁ of the template T is degraded, the template T is carried to the outside of the imprint unit 1.

  In this manner, in the imprint system 1, a predetermined resist pattern P is continuously formed on the plurality of wafers W while the template T is continuously replaced.

According to the above embodiment, in the imprint system 1, first the resist film R ₁ on the wafer W as shown in FIG. 21 (i), a second resist pattern P of the resist film R ₂ It is formed. Thereafter the imprint system 1 external etching unit (not shown), a second resist pattern P of the resist film R ₂ as a mask, a resist pattern of the first resist film R ₁ is etched Form. Then, these first resist film R ₁ of the resist pattern and second resist pattern P of the resist film R ₂ exerts sufficient etching resistant work together. Therefore, it is possible to appropriately form the pattern of the film to be processed by appropriately etching the film to be processed on the wafer W.

According to the above embodiment, a plurality of imprint units 60 are arranged in the imprint processing station 4 with respect to one wafer processing station 3. Therefore, the wafer processing station 3 in the first on a plurality of wafers W of the resist film R ₁ is formed from the wafer processing station 3 in the imprint processing station 4 the first resist film R ₁ is more formed The wafer W can be continuously transferred. Further, since the template processing station 5 is connected to the imprint processing station 3, a plurality of templates T on which the release agent S is formed are continuously conveyed from the template processing station 5 to the imprint processing station 4. it can. In the imprint processing station 4, an imprint process for each wafer W using each template T can be performed in parallel in each imprint unit 60. For this reason, even when the processing time in the wafer processing station 3 and the processing time in the imprint unit 60 are different, the wafer W can be appropriately processed continuously without stopping the wafer processing in the wafer processing station 3. Therefore, the predetermined resist pattern P can be appropriately and efficiently formed on the wafer W. This also enables mass production of semiconductor devices.

  Further, since the processing blocks F1 to F4 constituting the release agent processing block are provided in the template processing station 5, the template is formed while forming the release agent S on the template T in the imprint system 1. T can be continuously supplied to the imprint unit 60. Thereby, for example, even when the resist pattern P is formed on the plurality of wafers W before the template T deteriorates, the template T in the imprint unit 60 can be exchanged continuously and efficiently. Therefore, the predetermined resist pattern P can be appropriately formed on the plurality of wafers W.

In the template processing station 5, processing blocks F5 and F6 constituting a template cleaning block are provided. For example, post-cleaning units 120, 121, 130, and 131 are provided, so that they are used in the imprint system 1. it is possible to clean the surface T ₁ of the pre-template T. As a result, the template T can be used again in the imprint unit 1.

Furthermore, the template processing station 5, since the inspection unit 122, 132 is provided, it is possible to inspect the surface T ₁ of the template T after washing. Based on the inspection result, for example, the template T can be used again in the imprint unit 1 or can be determined to be carried out of the imprint unit 1. As a result, the template T can be used effectively, and a defective template T is not used in the imprint unit 1, so that a predetermined resist pattern P can be appropriately formed on the plurality of wafers W. .

In the wafer processing station 3, after the first resist solution is applied onto the wafer W in the resist coating unit 30, the first resist solution on the wafer W is baked in the heating unit 42. Therefore, it is possible to appropriately form a first resist film R ₁ on the wafer W.

In the template processing station 5 of the above embodiment, both the processing blocks F1 to F4 that constitute the release agent processing block and the processing blocks F5 and F6 that constitute the template cleaning block are provided. For example, as shown in FIG. 22, only the processing blocks F1 to F4 that are release agent processing blocks may be provided in the template processing station 5. In this case, step A15, A16 of the embodiment is omitted, the cleaning of the surface T ₁ of the used template T is performed outside the imprint system 1. In such a case, the processing blocks F3 and F4 may be moved to the positions of the processing blocks F5 and F6, respectively, and a transition unit for transferring the template T may be provided at the positions of the processing blocks F3 and F4. .

  In the imprint system 1 of the above embodiment, the wafer carry-in / out station 2, the wafer processing station 3, the imprint processing station 4, the template processing station 5, and the template carry-in / out station 6 are arranged side by side in the horizontal direction. As shown in FIGS. 23 to 27, the template processing station 5 may be stacked and disposed above the wafer processing station 3. Further, the template loading / unloading station 6 may be stacked and arranged above the wafer loading / unloading station 2. In such a case, the area occupied by the imprint system 1 can be reduced, and the manufacturing cost can be reduced.

  The vertical relationship between the template processing station 5 and the template carry-in / out station 6 and the wafer processing station 3 and the wafer carry-in / out station 2 is not limited to the present embodiment, and the wafer processing station 3 and the wafer carry-in / out station 2 You may arrange in. However, since the template T is arranged above the wafer W in the imprint unit 60, it is preferable to arrange the template processing station 5 and the template carry-in / out station 6 in the upper layer as in the present embodiment.

Also in the present embodiment, only the processing blocks F1 to F4 which are release agent processing blocks may be provided in the template processing station 5, and the processing blocks F5 and F6 constituting the template cleaning block may be omitted. In this case, step A15, A16 of the embodiment is omitted, the cleaning of the surface T ₁ of the used template T is performed outside the imprint system 1.

  The configurations of the wafer carry-in / out station 2, the wafer processing station 3, the imprint processing station 4, the template processing station 5, and the template carry-in / out station 6 are the same as those in the above-described embodiment, and thus description thereof is omitted.

In the above embodiment, after applying the release agent S on the template T in the template processing station 5, the release agent S is heated and baked, but instead of baking the release agent S. You may irradiate light. In such a case, the release agent S on the template T is irradiated with light having a wavelength of, for example, 350 nm to 2500 nm. As a result, the surface T _{1 of the} template T and the active group of the release agent S can be chemically and strongly bonded, and the adhesion between the surface T _{1 of the} template T and the release agent S is improved. In other words, it can be brought into close contact with the surface T ₁ of the template T of the release agent S in a short time.

In addition, after applying the release agent S on the template T in the template processing station 5, an alcohol treatment may be performed instead of baking the release agent S. In such a case, alcohol is applied to the release agent S on the template T. Then, the release agent S is firmly and closely chemically react with the surface T ₁ of the template T, thereby improving adhesion between the surfaces T ₁ and the release agent S of the template T. In addition, alcohol should just be alcohols and you may use alcohol other than ethanol. For example, methanol, propanol, butanol, pentanol, hexanol, heptanol may be used, or a mixture of these alcohols may be used. The concentration of alcohol is not particularly limited, but is preferably 100%.

In the imprint system 1 of the above embodiment, the configuration of each processing unit is not limited to the above-described embodiment, and various configurations can be adopted as long as each processing can be performed. For example, in the rinsing units 91 and 93 of the above embodiment, the mold release agent S is rinsed by immersing the template T in the organic solvent stored in the immersing layer 311, as shown in FIGS. 11 and 13. A rinse unit having the same configuration as that of the release agent coating unit 90 may be used. In such a case, instead of the release agent nozzle 302 of the release agent application unit 90, a rinse liquid nozzle that supplies an organic solvent as a rinse liquid of the release agent S onto the template T is used. And in this rinsing unit, an organic solvent is supplied onto the template T during rotation, to rinse the surface T ₁ the entire surface of the template T. When a predetermined time elapses, only the unreacted portion of the release agent S is peeled off, and the release agent S along the transfer pattern C is formed on the template T. Then, after stopping the supply of the organic solvent, it continues to further rotate the template T, drying finishing off the surface T _1. In this way, the release agent S on the template T is rinsed.

In the embodiment described above, as shown in the flow of FIG. 20, after the first resist film R ₁ is formed on the wafer W is the wafer W is conveyed to the imprint processing station 4, then the second resist film R ₂ is formed.

However, when the template T to transfer the transfer pattern C in contact with a second resist film R _2, even if the release agent S is formed on the surface of the template T, the second resist film R ₂ is The possibility of adhering to the template T side cannot be denied. In view of such a case, adhesion to the second resist film R ₂ of the wafer W side, the processing for improving the fixing production, it is preferable to previously performed before the formation of the second resist film R _2.

For example, when the material of the second resist film R ₂ is, for example, a UV curable resin, the surface of the _first resist film R ₁ is improved in adhesion to the UV curable resin, such as a silane coupling agent. It is preferable to form a film by applying an adhesive. Such a coating process may be performed, for example, after the first resist solution is baked (after step A9), in accordance with the flow of FIG.

In applying such an adhesive, the first resist solution for forming the _first resist film R1 is applied and has the same configuration as the application units 30 to 33 shown in FIG. A coating device can be used. Then, after applying the adhesive as described above, the wafer W is heated as necessary, further cooled as necessary, and then carried into the imprint unit 60. Thereafter, similarly to the flow shown in FIG. What is necessary is just to implement formation process (process A11) of _2nd resist film R2.

Also during the formation so the adhesion agent in the first resist film R ₁ of the surface, rather than a device for applying a liquid such as coating unit 30 described above, the vapor of the adhesion agent is supplied to the wafer W surface A film may be formed.

  FIG. 28 shows an outline of the configuration of a film forming unit 450 as a coating unit for the adhesive used at that time. The film forming unit 450 is mounted on the substrate processing station 3, for example, instead of a part of the coating units 30 to 33.

  As shown in FIG. 28, the film forming unit 450 includes a mounting table 460 on which the wafer W is mounted, and a lid 461 provided above the mounting table 460. The lid body 461 is configured to be movable in the vertical direction by, for example, an elevating mechanism (not shown). Further, the lower surface of the lid 461 is open. The lid 461 and the mounting table 460 are integrated to form a sealed processing space K.

On the mounting table 460, the wafer W is mounted such that the surface of the wafer W (for example, the formation surface of the _first resist film R1) faces upward. A temperature control plate 470 that controls the temperature of the wafer W is provided on the upper surface of the mounting table 460. The temperature control plate 470 includes a Peltier element, for example, and can adjust the wafer W to a predetermined temperature. In the mounting table 460, lifting pins 471 for supporting the wafer W from below and lifting it are provided. The elevating pin 471 can be moved up and down by an elevating drive unit 472. A through hole 473 that penetrates the upper surface in the thickness direction is formed on the upper surface of the mounting table 460, and the elevating pin 471 is inserted through the through hole 473.

  In addition, a gas supply pipe 490 that supplies vapor and water vapor of the adhesive onto the wafer W is provided on the ceiling surface of the lid 461. The gas supply pipe 490 is connected to an adhesion agent supply source 491 that supplies vapor of the adhesion agent and a water vapor supply source 492 that supplies water vapor. In addition, the gas supply pipe 490 includes a supply device group 493 including a valve, a flow rate control unit, and the like that control the flow of the adhesive agent supplied from the adhesive agent supply source 491 and the water vapor supplied from the water vapor supply source 492. Is provided.

  The adhesive agent supply source 491 stores a liquid adhesive agent therein. Further, a gas supply pipe (not shown) for supplying nitrogen gas into the adhesive agent supply source 491 is connected to the adhesive agent supply source 491. In the adhesive agent supply source 491, the liquid adhesive agent is vaporized by supplying nitrogen gas therein, and vapor of the adhesive agent is generated. The adhesion agent vapor is supplied to the gas supply pipe 490 using the nitrogen gas as a carrier gas.

  For example, the water vapor supply source 492 stores water therein. For example, this water is heated and vaporized to generate water vapor.

  An exhaust pipe 494 that exhausts the atmosphere of the processing space K is connected to the side surface of the lid 461. An exhaust pump 495 that evacuates the atmosphere of the processing space K is connected to the exhaust pipe 494.

In order to form an adhesive on the surface of the _first resist film R1 using the film forming unit 450 having such a configuration, for example, after step A9 shown in FIG. 20, the wafer W is transferred to the coating unit 450. The The transferred wafer W is transferred to the raising / lowering pins 471 and mounted on the mounting table 460. At this time, the temperature of the wafer W on the mounting table 460 is adjusted to a predetermined temperature, for example, 50 ° C. by the temperature control plate 470. Subsequently, the lid body 461 is lowered, and a processing space K sealed by the lid body 461 and the mounting table 460 is formed. Thereafter, the vapor of the adhesive is supplied from the gas supply pipe 490 to the processing space K. The supplied adhesive agent vapor is deposited on the surface of the wafer W. Thereafter, water vapor is supplied from the gas supply pipe 490 to the processing space K, and the water vapor is supplied to the adhesion agent deposited on the wafer W.

When water vapor is supplied, the molecules of the adhesion agent deposited on the wafer W are hydrolyzed, and the surface of the wafer W and the adhesion agent molecules are bonded by dehydration condensation. Thus the first resist film R ₁ formed on the wafer W, so as to improve the adhesive property between the second resist film R ₂ is formed thereon. In addition, after depositing the adhesive on the wafer W, the atmosphere in the processing space K may be replaced with an inert gas, for example, nitrogen gas.

  Thus, according to the method of supplying the adhesion agent vapor and forming the adhesion agent on the surface of the wafer W, it is not necessary to rinse as compared with the case where the film is formed by applying the liquid adhesion agent. It is possible to form a film more uniformly.

  In the example described above, the temperature of the wafer W on the mounting table 460 is adjusted to a predetermined temperature, for example, 50 ° C. by the temperature control plate 470. However, the temperature of the wafer W is necessarily adjusted to a temperature higher than normal temperature. The film may be formed at room temperature, for example, 20 ° C. to 25 ° C.

  In the above example, the water vapor is actively supplied to promote the hydrolysis. However, the hydrolysis is performed by the moisture in the surrounding atmosphere without the water vapor being actively supplied. The coupling reaction by dehydration condensation described above is realized.

In applying the first resist film R ₁ , resist solution vapor may be supplied onto the wafer W to form the _first resist film R ₁ on the wafer W. In this case, the first resist film R ₁ are those having an effect of enhancing the adhesion as described above are preferred.

  Furthermore, in the above-described embodiment, the release agent application unit 90 is adopted, and the liquid release agent S is applied to the surface of the template T by the release agent nozzle 302 by a so-called spin coating method. The release agent was formed into a film by firing, but instead of this, the release agent vapor is supplied to the surface of the template T as in the film formation unit 450 described above. Alternatively, a release agent film forming unit may be employed.

  Such a release agent film forming unit that supplies the release agent vapor can be structurally the same as the film formation unit 450. Instead of the adhesive supply source 491, a release agent ( For example, a release agent supply source storing a silane coupling agent) may be used. The water vapor supply source 492 for supplying water vapor can be used as it is.

  In this manner, according to the system in which the release agent vapor is supplied and the release agent is formed on the surface of the template T, rinsing and baking are performed as compared with the case where the liquid release agent is applied to form a film. There is no need to form the film more uniformly.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the idea described in the claims, and these naturally belong to the technical scope of the present invention. It is understood. The present invention is not limited to this example and can take various forms. The present invention can also be applied to a case where the substrate is another substrate such as an FPD (flat panel display) other than a wafer or a mask reticle for a photomask.

DESCRIPTION OF SYMBOLS 1 Imprint system 2 Wafer carrying in / out station 3 Wafer processing station 4 Imprint processing station 5 Template processing station 6 Template carrying in / out station 30-33 Resist application unit 42, 43, 52, 53 Heating unit 60 Imprint unit 350 Control part 450 Formation Membrane unit E1, E2 Imprint block E3 Transport area F1-F6 Processing block C Transfer pattern P Resist pattern R ₁ First resist film R ₂ Second resist film S Release agent T Template W Wafer

Claims (19)

An imprint system for forming a predetermined resist pattern on a substrate using a template having a transfer pattern formed on the surface,
A substrate processing station for forming a first resist film on the substrate;
A template processing station having a release agent processing block for forming a release agent on the surface of the template;
A second resist film is formed on the substrate on which the first resist film is formed, a template transfer pattern on which the release agent is formed is transferred to the second resist film, and the second resist film is transferred to the second resist film. A plurality of imprint units for forming a predetermined resist pattern on the resist film, and an imprint processing station connected to the substrate processing station and the template processing station;
A substrate loading / unloading station connected to the substrate processing station and loading / unloading the substrate to / from the substrate processing station;
An imprint system comprising: a template loading / unloading station connected to the template processing station for loading / unloading a template to / from the template processing station. The substrate processing station and the template processing station are stacked in a vertical direction,
The imprint system according to claim 1, wherein the substrate carry-in / out station and the template carry-in / out station are stacked in the vertical direction. The template processing station is disposed above the substrate processing station,
The imprint system according to claim 2, wherein the template loading / unloading station is disposed above the substrate loading / unloading station. The imprint system according to claim 1, wherein the substrate processing station and the template processing station are arranged in a horizontal direction with the imprint processing station interposed therebetween. The imprint system according to claim 1, wherein the substrate processing station includes a coating unit that coats a coating liquid on a substrate. The imprint system according to claim 5, wherein the coating unit supplies a vapor of a liquid that forms the first resist film onto the substrate. The substrate processing station has an adhesive agent coating unit that applies an adhesive agent that improves adhesion to the second resist film on the substrate on which the first resist film is formed. Item 7. The imprint system according to any one of Items 1 to 6. The imprint system according to claim 7, wherein the adhesive application unit supplies vapor of the adhesive onto a substrate on which the first resist film is formed. The imprint system according to claim 8, wherein the adhesive application unit has a function of supplying water vapor to the substrate. The imprint system according to any one of claims 1 to 9, wherein a template cleaning block for cleaning the surface of the template carried out from the imprint processing station is disposed in the template processing station. . In the imprint processing station, two rows of imprint blocks in which the plurality of imprint units are arranged in a horizontal direction are formed,
The imprint according to any one of claims 1 to 10, wherein a transport area for transporting a substrate and a template is formed in each of the imprint units between the two imprint blocks. system. The release agent processing block is provided with a release agent film forming unit for supplying a release agent vapor to the surface of the template to form a release agent film on the surface. Item 12. The imprint system according to any one of Items 1 to 11. The imprint system according to claim 12, wherein the release agent film forming unit has a function of supplying water vapor to the template. In an imprint system, using a template having a transfer pattern formed on a surface, an imprint method for forming a predetermined resist pattern on a substrate,
The imprint system includes:
A substrate processing station for forming a first resist film on the substrate;
A template processing station having a release agent processing block for forming a release agent on the surface of the template;
A second resist film is formed on the substrate on which the first resist film is formed, a template transfer pattern on which the release agent is formed is transferred to the second resist film, and the second resist film is transferred to the second resist film. A plurality of imprint units for forming a predetermined resist pattern on the resist film, and an imprint processing station connected to the substrate processing station and the template processing station;
A substrate loading / unloading station connected to the substrate processing station and loading / unloading the substrate to / from the substrate processing station;
A template loading / unloading station connected to the template processing station and loading / unloading the template to / from the template processing station;
Forming a first resist film on a plurality of substrates in the substrate processing station, and forming a release agent on the surfaces of the plurality of templates in the template processing station;
A plurality of substrates on which the first resist film is formed are continuously conveyed from the substrate processing station to the imprint processing station, and the release agent is formed from the template processing station to the imprint processing station. Conveyed multiple templates in succession,
In the imprint processing station, the formation of the predetermined resist pattern on each substrate using each template is performed in parallel in each imprint unit. The imprint method according to claim 14, wherein a coating liquid is applied on the substrate in the substrate processing station. A template cleaning block is disposed in the template processing station,
16. The imprint method according to claim 14, wherein the template cleaning block cleans the surface of the template carried out from the imprint processing station. The imprint system includes an adhesive agent coating unit that applies an adhesive agent that improves adhesion to the second resist film on the substrate on which the first resist film is formed, in the substrate processing station. ,
The imprint method according to claim 14, further comprising a step of applying the adhesive on a substrate after forming the first resist film. A program that operates on a computer of a control unit that controls the imprint system in order to cause the imprint method according to any one of claims 14 to 17 to be executed by the imprint system. A readable computer storage medium storing the program according to claim 18.

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