WO2011114926A1 - Template processing method, computer storage medium and template processing apparatus - Google Patents

Abstract

Disclosed is a template processing apparatus used for forming a predetermined pattern on a coated film by transferring a transfer pattern onto the coated film formed on a substrate, and that forms a film of a mold-release agent on the template formed with an uneven-shaped transfer pattern on a surface. The mold-release agent film is formed only on a top surface of a convex portion of the transfer pattern. A contact angle of the convex portion upper surface to a coating liquid applied to the template thereafter increases compared to an inner surface of the transfer pattern concave portion, so the coating liquid applied to the template easily flows into the concave portion of the transferred pattern and fills the concave portions of the transfer pattern without gaps.

Description

Template processing method, computer storage medium, and template processing apparatus

The present invention relates to a template processing method, a computer storage medium, and a template processing apparatus for forming a release agent on a template having a concavo-convex transfer pattern formed on the surface.

For example, in a semiconductor device manufacturing process, for example, a semiconductor wafer (hereinafter referred to as “wafer”) is subjected to a photolithography process to form a predetermined resist pattern on the wafer.

When forming the above-described resist pattern, the resist pattern is required to be miniaturized in order to further increase the integration of the semiconductor device. In general, the limit of miniaturization in the photolithography process is about the wavelength of light used for the exposure process. For this reason, it has been advancing to shorten the wavelength of exposure light. However, there are technical and cost limitations to shortening the wavelength of the exposure light source, and it is difficult to form a fine resist pattern on the order of several nanometers, for example, only by the method of advancing the light wavelength. is there.

Therefore, in recent years, it has been proposed to form a fine resist pattern on a wafer by using a so-called imprint method instead of performing a photolithography process on the wafer. In this method, a template (sometimes referred to as a mold or a mold) having an uneven pattern on the surface is pressure-bonded to the resist surface formed on the wafer, then peeled off, and the pattern is directly transferred to the resist surface. (Patent Document 1).

Japanese Unexamined Patent Publication No. 2009-43998

A mold release agent having a liquid repellency to the resist is usually formed on the entire surface of the template used in the above-described imprinting method so that the template can be easily peeled off from the resist.

However, as described above, the pattern on the template is very fine, and the mold release agent has liquid repellency to the resist. The liquid is difficult to enter. In this case, the resist solution stays on the droplets inside the recess, and bubbles are generated in the recess. That is, the resist solution is not filled in the recesses of the transfer pattern without any gaps. Then, since the shape of the droplet is transferred as it is to the resist pattern on the wafer, there is a case where a predetermined resist pattern cannot be formed on the wafer.

The present invention has been made in view of such a point, and an object thereof is to appropriately form a release agent on the surface of a template so that a predetermined pattern is formed on the substrate using the template. To do.

In order to achieve the above object, the present invention is used to transfer a transfer pattern to a coating film formed on a substrate to form a predetermined pattern on the coating film, and a transfer pattern having an uneven shape on the surface. In the template processing method of forming a release agent on the template on which the film is formed, the release agent is formed only on the upper surface of the convex portion of the transfer pattern.

According to the present invention, since the release agent is formed only on the upper surface of the convex portion of the transfer pattern, the upper surface of the convex portion is less than the inner surface of the concave portion of the transfer pattern with respect to the coating liquid applied on the template thereafter. The contact angle increases. For this reason, the coating liquid applied on the template tends to flow into the recesses of the transfer pattern. That is, the coating liquid is filled in the recesses of the transfer pattern without any gaps. Therefore, a predetermined pattern can be formed on the coating film on the substrate using such a template.

Another aspect of the present invention is a readable computer storage medium storing a program that operates on a computer of a control unit that controls the template processing apparatus in order to cause the template processing apparatus to execute the template processing method.

According to another aspect of the present invention, the transfer pattern is transferred to a coating film formed on a substrate to form a predetermined pattern on the coating film, and a concavo-convex transfer pattern is formed on the surface. A template processing apparatus for depositing a release agent on a template further includes a deposition unit for depositing the release agent only on the upper surface of the convex portion of the transfer pattern.

According to the present invention, a release agent can be appropriately formed on the surface of the template, and a predetermined pattern can be formed on the substrate using the template.

It is a top view which shows the outline of a structure of the template processing apparatus concerning this Embodiment. It is a side view which shows the outline of a structure of the template processing apparatus concerning this Embodiment. It is a side view which shows the outline of a structure of the template processing apparatus concerning this Embodiment. It is a perspective view of a template. It is a longitudinal cross-sectional view which shows the outline of a structure of the film-forming unit. It is a cross-sectional view which shows the outline of a structure of the film-forming unit. It is a side view which shows the outline of a structure of a mold release agent supply part. It is a longitudinal cross-sectional view which shows the outline of a structure of a rinse unit. It is a top view which shows the outline of a structure of a rotation holding member. It is a cross-sectional view which shows the outline of a structure of a rinse unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a cleaning unit. It is a cross-sectional view which shows the outline of a structure of a washing | cleaning unit. It is a longitudinal cross-sectional view which shows the outline of a structure of a heating unit. It is the flowchart which showed each process of the template process. It is a longitudinal cross-sectional view which shows the outline of a structure of the imprint unit. It is a cross-sectional view which shows the outline of a structure of an imprint unit. It is explanatory drawing which showed typically the state of the template and wafer in each process of an imprint process, (a) shows a mode that the resist liquid was apply | coated on the template in which the mold release agent was formed, (b ) Shows how the resist film on the template is photopolymerized, (c) shows how the resist pattern is formed on the wafer, and (d) shows how the remaining film on the wafer is removed. ing. It is a side view which shows the outline of a structure of the mold release agent supply part concerning other embodiment. It is a side view which shows the outline of a structure of the mold release agent supply part concerning other embodiment. It is a side view which shows the outline of a structure of the mold release agent supply part concerning other embodiment. It is a side view which shows the outline of a structure of the mold release agent supply part concerning other embodiment. It is a side view which shows the outline of a structure of the template processing apparatus concerning other embodiment. It is a side view which shows the outline of a structure of the template processing apparatus concerning other embodiment. It is a longitudinal cross-sectional view which shows the outline of a structure of the post-processing unit concerning other embodiment. It is a cross-sectional view which shows the outline of a structure of the post-processing unit concerning other embodiment. It is the flowchart which showed each process of the template process. It is a cross-sectional view which shows the outline of a structure of the film-forming unit concerning other embodiment.

Hereinafter, embodiments of the present invention will be described. FIG. 1 is a plan view schematically showing the configuration of the template processing apparatus 1 according to the present embodiment. 2 and 3 are side views showing an outline of the configuration of the template processing apparatus 1.

In the template processing apparatus 1 of the present embodiment, a template T having a rectangular parallelepiped shape and having a concavo-convex transfer pattern C formed on the surface is used as shown in FIG. Transfer pattern C is constituted by a convex portion C ₁ and the recess C _2. Hereinafter, the transfer pattern C means the side of the template T which is formed with the surface T _1, the surface T ₁ opposite to the surface of the backside T _2. For the template T, a transparent material that can transmit visible light, near ultraviolet light, ultraviolet light, or the like, such as glass, is used. Further, the convex height of the _{C 1} of the transfer pattern C is, for example, 40 nm ~ 100 nm.

As shown in FIG. 1, the template processing apparatus 1 carries a plurality of, for example, five templates T in the cassette unit between the outside and the template processing apparatus 1 and carries the template T into and out of the cassette C. The carry-in / out station 2 and the processing station 3 including a plurality of processing units for performing predetermined processing on the template T are integrally connected.

The cassette loading table 10 is provided at the loading / unloading station 2. The cassette mounting table 10 can mount a plurality of cassettes C in a row in the X direction (vertical direction in FIG. 1). That is, the carry-in / out station 2 is configured to be capable of holding a plurality of templates T.

The carry-in / out station 2 is provided with a template carrier 12 that can move on a conveyance path 11 extending in the X direction. The template transport body 12 is also movable in the vertical direction and around the vertical direction (θ direction), and can transport the template T between the cassette C and the processing station 3.

The processing station 3 is provided with a transport unit 20 at the center thereof. Around the transport unit 20, for example, four processing blocks G1 to G4 in which various processing units are arranged in multiple stages are arranged. A first processing block G1 and a second processing block G2 are arranged in this order from the loading / unloading station 2 side on the front side of the processing station 3 (X direction negative direction side in FIG. 1). A third processing block G3 and a fourth processing block G4 are arranged in this order from the loading / unloading station 2 side on the back side of the processing station 3 (positive side in the X direction in FIG. 1). A transition unit 21 for delivering the template T is arranged on the loading / unloading station 2 side of the processing station 3. The transport unit 20 can transport the template T to various processing units (to be described later) disposed in these processing blocks G1 to G4 and the transition unit 21.

The first processing block G1, is formed by a plurality of liquid processing units, for example only on the upper surface of the convex portion C ₁ of the transfer pattern C in the template T of the liquid release agent is applied as shown in FIG. 2 A film forming unit 30 and a rinse unit 31 for rinsing the release agent on the template T are stacked in two stages in order from the bottom. Similarly, in the second processing block G2, the film forming unit 32 and the rinsing unit 33 are stacked in two stages from the bottom. In addition, chemical chambers 34 and 35 for supplying various processing liquids to the liquid processing unit are provided at the lowermost stages of the first processing block G1 and the second processing block G2, respectively.

The third processing block G3, the cleaning unit 40 that ultraviolet rays are irradiated to the template T as shown in FIG. 3, the release agent on the template T is to clean the surface T ₁ of the before the deposition, the template Temperature adjusting units 41 and 42 for adjusting the temperature of T, and heating units 43 and 44 for heating the template T are stacked in five stages in order from the bottom.

In the fourth processing block G4, similarly to the third processing block G3, the cleaning unit 50, the temperature control units 51 and 52, and the heating units 53 and 54 are stacked in five stages in order from the bottom.

Next, the configuration of the film forming units 30 and 32 described above will be described. As shown in FIG. 5, the film forming unit 30 has a casing 100 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

A mounting table 101 on which the template T is mounted is provided on the bottom surface in the casing 100. Template T has a surface T ₁ is placed on the top surface of the mounting table 101 to face upward. In the mounting table 101, raising / lowering pins 102 for supporting the template T from below and raising / lowering it are provided. The elevating pin 102 can be moved up and down by the elevating drive unit 103. A through hole 104 penetrating the upper surface in the thickness direction is formed on the upper surface of the mounting table 101, and the elevating pin 102 is inserted through the through hole 104.

As shown in FIG. 6, a rail 110 extending along the Y direction (left-right direction in FIG. 6) is provided on the mounting table 101 on the negative side in the X direction (downward in FIG. 6). For example, the rail 110 is formed from the outside of the mounting table 101 on the Y direction negative direction (left direction in FIG. 6) side to the outside on the Y direction positive direction (right direction in FIG. 6) side. An arm 111 is attached to the rail 110.

A release agent supply unit 112 that supplies a release agent onto the template T is supported on the arm 111. The release agent supply unit 112 is, for example, equal to or longer than one side dimension of the template T and extends along the X direction. Note that a material having a liquid repellency with respect to a resist film on the wafer, which will be described later, such as a fluororesin, is used as the material of the release agent.

The arm 111 is movable on the rail 110 by the drive unit 113. As a result, the release agent supply unit 112 can move from the standby unit 114 installed outside the mounting table 101 on the positive side in the Y direction to above the template T on the mounting table 101, and further the surface of the template T T ₁ on the movable in the side direction of the template T. Further, the arm 111 can be raised and lowered by the drive unit 113, and the height of the release agent supply unit 112 can be adjusted. In the present embodiment, the rail 110, the arm 111, and the drive unit 113 constitute a moving mechanism.

The release agent supply unit 112 has a support member 120 supported by the arm 111 as shown in FIG. The support member 120 is in contact with the upper surface of the convex portion C _1, a first roller 121 for applying a liquid release agent S on the upper surface of the convex portion C _1, the first roller 121 and coaxially And a second roller 122 that contacts the first roller 121 is supported. The first roller 121 and the second roller 122 are each equal to or longer than one side dimension of the template T and extend along the X direction. Then, as the support member 120 moves in the horizontal direction, the first roller 121 and the second roller 122 rotate in opposite directions.

A release agent nozzle 123 that supplies the release agent S to the second roller 122 is provided above the second roller 122. The release agent nozzle 123 is supported by the support member 120. Further, the release agent nozzle 123 is equal to or longer than one side dimension of the template T and extends along the X direction. Similarly, the release agent S supply port of the release agent nozzle 123 extends in the X direction. The release agent S supplied from the release agent nozzle 123 to the second roller 122 is supplied from the second roller 122 to the first roller 121. At this time, since the first roller 121 and the second roller 122 are in contact with each other, the release agent S is stretched thinly. Then, it adheres to the surface of the first roller 121 with a predetermined film thickness, for example, 5 nm. Then, the convex portion C ₁ upper surface of the transfer pattern C from the first roller 121, the release agent S is coated by a predetermined thickness, for example, 5 nm.

Behind the first roller 120 (Y-direction negative direction side), the gas is supplied to the convex portion C ₁ release agent is applied to the upper surface S, the drying nozzle 124 is provided for drying the release agent S ing. The drying nozzle 124 is supported by the support member 120. Further, the drying nozzle 124 is equal to or longer than one side dimension of the template T, and extends along the X direction. Similarly, the gas supply port of the drying nozzle 124 extends along the X direction. The gas supplied from the drying nozzle 124 is air at room temperature, for example, 23 ° C., for example.

Note that the configuration of the film forming unit 32 is the same as the configuration of the film forming unit 30 described above, and a description thereof will be omitted.

Next, the configuration of the rinse units 31 and 33 described above will be described. As shown in FIG. 8, the rinse unit 31 has a casing 130 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

A rotation holding member 131 that holds and rotates the template T is provided at the center of the casing 130. A central portion of the rotation holding member 131 is depressed downward, whereby an accommodating portion 132 for accommodating the template T is formed. A groove 132 a smaller than the outer shape of the template T is formed in the lower portion of the housing portion 132. Therefore, in the accommodating portion 132, the inner peripheral portion of the lower surface of the template T is not in contact with the rotation holding member 131 due to the presence of the groove portion 132 a, and only the outer peripheral portion of the lower surface of the template T is supported by the rotation holding member 131. As shown in FIG. 9, the accommodating portion 132 has a substantially rectangular planar shape that matches the outer shape of the template T. A plurality of projecting portions 133 projecting inward from the side surface are formed in the housing portion 132, and the template T accommodated in the housing portion 132 is positioned by the projecting portion 133. Further, when the template T is transferred from the transfer arm 20 a of the transfer unit 20 to the storage unit 132, a cutout portion 134 is formed on the outer periphery of the storage unit 132 in order to prevent the transfer arm 20 a from interfering with the storage unit 132. It is formed in four places.

The rotation holding member 131 is attached to the cover body 135 as shown in FIG. 8, and a rotation driving unit 137 is provided below the rotation holding member 131 via a shaft 136. By this rotation drive unit 137, the rotation holding member 131 can rotate around the vertical at a predetermined speed and can move up and down.

Around the rotation holding member 131, there is provided a cup 140 that receives and collects a release agent scattered or dropped from the template T. A lower surface of the cup 140 is connected to a discharge pipe 141 that discharges the collected release agent and an exhaust pipe 142 that exhausts the atmosphere in the cup 140.

As shown in FIG. 10, a rail 150 extending along the Y direction (left-right direction in FIG. 10) is formed on the negative side of the cup 140 in the X direction (downward direction in FIG. 10). The rail 150 is formed, for example, from the outside of the cup 140 in the Y direction negative direction (left direction in FIG. 10) to the outside in the Y direction positive direction (right direction in FIG. 10). An arm 151 is attached to the rail 150.

The arm 151 supports a rinsing liquid nozzle 152 for supplying a rinsing liquid, for example, an organic solvent for the release agent S, onto the template T. The arm 151 is movable on the rail 150 by a nozzle driving unit 153. As a result, the rinse liquid nozzle 152 can move from the standby portion 154 installed outside the cup 140 on the Y direction positive direction side to above the center portion of the template T in the cup 140. The arm 151 can be moved up and down by a nozzle driving unit 153, and the height of the rinsing liquid nozzle 152 can be adjusted.

For example, a cleaning liquid nozzle that injects a cleaning liquid, for example, an organic solvent, may be provided in the groove 132 a of the rotation holding member 131. By spraying the cleaning liquid onto the back surface T _{2 of the} template T from the cleaning liquid nozzle, the back surface T ₂ can be cleaned.

The configuration of the rinse unit 33 is the same as the configuration of the rinse unit 31 described above, and a description thereof will be omitted.

Next, the configuration of the above-described cleaning units 40 and 50 will be described. As shown in FIG. 11, the cleaning unit 40 has a casing 160 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

A chuck 161 for adsorbing and holding the template T is provided in the casing 160. Chuck 161, the surface _{T 1} of the template T to face upward, suction-holds the rear surface _{T 2.} A chuck drive unit 162 is provided below the chuck 161. The chuck driving unit 162 is provided on the bottom surface in the casing 150 and is mounted on a rail 163 extending along the Y direction. The chuck 161 can be moved along the rail 163 by the chuck driving unit 162.

An ultraviolet irradiation unit 164 that irradiates the template T held by the chuck 161 with ultraviolet rays is provided on the ceiling surface in the casing 150 and above the rails 163. The ultraviolet irradiation part 164 extends in the X direction as shown in FIG. Then, while moving the template T along the rail 163, by irradiating ultraviolet from the ultraviolet irradiation unit 164 to the surface T ₁ of the said template T, ultraviolet rays are irradiated onto the surface T ₁ the entire surface of the template T.

Note that the configuration of the cleaning unit 50 is the same as the configuration of the cleaning unit 40 described above, and thus the description thereof is omitted.

Next, the configuration of the heating units 43, 44, 53, and 54 will be described. As shown in FIG. 13, the heating unit 43 has a casing 170 in which a loading / unloading port (not shown) for the template T is formed on the side surface.

A mounting table 171 on which the template T is mounted is provided on the bottom surface in the casing 170. Template T has a surface T ₁ is placed on the top surface of the mounting table 171 to face upward. In the mounting table 171, elevating pins 172 for supporting the template T from below and elevating it are provided. The elevating pin 172 can be moved up and down by the elevating drive unit 173. A through hole 174 that penetrates the upper surface in the thickness direction is formed on the upper surface of the mounting table 171, and the elevating pin 172 is inserted through the through hole 174. A hot plate 175 for heating the template T is provided on the upper surface of the mounting table 171. Inside the hot plate 175, for example, a heater that generates heat by power feeding is provided, and the hot plate 175 can be adjusted to a predetermined set temperature. In addition, you may provide this hot platen 175 above the template T, for example, the ceiling surface of the cover body 180 mentioned later. Further, a hot plate 175 may be provided above and below the template T.

A lid body 180 that can move up and down is provided above the mounting table 171. The lid 180 has an open bottom surface and forms a processing chamber K together with the mounting table 171. An exhaust part 181 is provided at the center of the upper surface of the lid 180. The atmosphere in the processing chamber K is uniformly exhausted from the exhaust unit 181.

In addition, since the structure of the heating units 44, 53, and 54 is the same as the structure of the heating unit 43 mentioned above, description is abbreviate | omitted.

Also, the temperature control units 41, 42, 51, 52 have the same configuration as that of the heating unit 43 described above, and a temperature control plate is used instead of the hot plate 175. A cooling member such as a Peltier element is provided inside the temperature adjustment plate, and the temperature adjustment plate can be adjusted to a set temperature. In this case, the lid 180 in the heating unit 43 may be omitted.

In the template processing apparatus 1 described above, a control unit 200 is provided as shown in FIG. The control unit 200 is a computer, for example, and has a program storage unit (not shown). The program storage unit controls the transfer of the template T between the loading / unloading station 2 and the processing station 3, the operation of the drive system in the processing station 3, and the like, and executes template processing to be described later in the template processing apparatus 1. The program is stored. This program is recorded in a computer-readable storage medium such as a computer-readable hard disk (HD), flexible disk (FD), compact disk (CD), magnetic optical desk (MO), memory card, or the like. Or installed in the control unit 200 from the storage medium.

The template processing apparatus 1 according to the present embodiment is configured as described above. Next, the process which forms the mold release agent performed in the template processing apparatus 1 will be described. FIG. 14 shows the main processing flow of this template processing.

First, the template transport body 12 takes out the template T from the cassette C on the cassette mounting table 10 and transports it to the transition unit 21 of the processing station 3 (step A1 in FIG. 14). At this time, the cassette C, the template T, the surface T ₁ of the transfer pattern C is formed is accommodated so as to face upward, the template T in this state is conveyed to the transition unit 21.

Thereafter, the template T is transported to the cleaning unit 40 by the transport unit 20 and is sucked and held by the chuck 161. Subsequently, the template T is irradiated with ultraviolet rays from the ultraviolet irradiation unit 164 while moving the template T along the rails 163 by the chuck driving unit 162. Thus, ultraviolet light is irradiated on the surface _{T 1} the entire surface of the template T, the surface _{T 1} of the template T is cleaned (step A2 in FIG. 14).

Thereafter, the template T is transported to the film forming unit 30 by the transport unit 20. The template T transported to the film forming unit 30 is transferred to the lifting pins 102 and placed on the placing table 101. Subsequently, the release agent S is supplied from the release agent nozzle 123 to the second roller 122 while moving the release agent supply unit 112 in the side direction of the template T. The release agent S supplied from the release agent nozzle 123 to the second roller 122 is supplied from the second roller 122 to the first roller 121. At this time, since the first roller 121 and the second roller 122 are in contact with each other, the release agent S is stretched thinly. Then, it adheres to the surface of the first roller 121 with a predetermined film thickness, for example, 5 nm. Then, with the movement of the release agent supply unit 112, the first roller 121 comes into contact with the upper surface of the convex portion C ₁ of the transfer pattern C of the template T while rotating. Thus, the convex portion C ₁ upper surface of the transfer pattern C from the first roller 121, the release agent S is coated by a predetermined thickness, for example, 5 nm. At this time, the first roller 121 abuts only on the convex portion C ₁ top, since the release agent S on the surface of the first roller 121 is adjusted to small thickness, the release agent S is It will not be applied to portions other than the convex portion C ₁ top.

Further, while moving the release agent supply unit 112, the drying nozzle 124 by supplying gas to the upper surface of the convex portion C _1, drying the release agent S of the convex portion C ₁ top. Thus, the release agent S is formed on the convex portion _{C 1} top (step A3 in FIG. 14).

Thereafter, the template T is transported to the heating unit 43 by the transport unit 20. The template T carried into the heating unit 43 is transferred to the lift pins 172 and placed on the placement table 171. Subsequently, the lid 180 is closed, and the template T is heated to, for example, 200 ° C. by the hot plate 175. After a predetermined time has elapsed, the release agent S on the template T is baked (step A4 in FIG. 14).

Thereafter, the transport unit 20 transports the template T to the temperature adjustment unit 41, and the template T is adjusted to a predetermined temperature.

Thereafter, the template T is transported to the rinse unit 31 by the transport unit 20 and transferred to the rotation holding member 131. Subsequently, the rinse liquid nozzle 152 is moved to above the center of the template T and the template T is rotated. Then, the rinse liquid is supplied onto the rotating template T, and the rinse liquid is diffused on the template T by centrifugal force. When it does so, only the unreacted part of the mold release agent S will peel (process A5 of FIG. 14). Then, after stopping the supply of the rinsing liquid, it continues to further rotate the template T, drying finishing off the surface T _1.

Thereafter, the template T is transported to the transition unit 21 by the transport unit 20 and returned to the cassette C by the template transport body 12 (step A6 in FIG. 14). Thus a series of template processing in template processing apparatus 1 is completed, the release agent S is deposited only on the convex portion C ₁ upper surface in the transfer pattern C of the template T.

The template T on which the release agent S is formed as described above is conveyed to, for example, the imprint unit 210 shown in FIGS. 15 and 16, and a resist pattern is formed on the wafer W using the template T in the imprint unit 210. It is formed.

Next, the configuration of the imprint unit 210 will be described. As shown in FIG. 15, the imprint unit 210 has a casing 211 in which a loading / unloading port (not shown) for the template T and a loading / unloading port (not shown) for the wafer W are formed on the side surfaces.

A template holding unit 220 that holds the template T is provided on the bottom surface in the casing 211. Template holding portion 220, the outer peripheral portion of the rear surface T ₂ of the template T has a chuck 221 for holding suction. The chuck 221 is movable in the vertical direction and rotatable around the vertical by a moving mechanism 222 provided below the chuck 221. Thus, the template T can be rotated up and down in a predetermined direction with respect to a wafer W on a wafer holding unit 240 described later.

The template holding unit 220 has a light source 223 provided above the template T held by the chuck 221. The light source 223 emits light such as visible light, near ultraviolet light, and ultraviolet light, and the light from the light source 223 is transmitted upward through the template T.

16, a rail 230 extending along the Y direction (left and right direction in FIG. 16) is provided on the negative side in the X direction (downward direction in FIG. 16) of the template holding unit 220. The rail 230 is formed, for example, from the outside of the template holding unit 220 on the Y direction negative direction (left direction in FIG. 16) to the outside on the Y direction positive direction (right direction in FIG. 16). An arm 231 is attached to the rail 230.

The arm 231 supports a resist solution nozzle 232 that supplies a resist solution onto the template T. The resist solution nozzle 232 has, for example, an elongated shape along the X direction that is the same as or longer than the diameter dimension of the wafer W. For example, an ink jet type nozzle is used as the resist solution nozzle 232, and a plurality of supply ports (not shown) formed in a line along the longitudinal direction are formed below the resist solution nozzle 232. The resist solution nozzle 232 can strictly control the resist solution supply timing, the resist solution supply amount, and the like.

The arm 231 is movable on the rail 230 by the nozzle driving unit 233. Accordingly, the resist solution nozzle 232 can move from the standby unit 234 installed on the outer side of the template holding unit 220 on the Y direction positive direction side to above the template T on the template holding unit 220, and the surface of the template T The top can be moved in the side direction of the template T. The arm 231 can be moved up and down by a nozzle driving unit 233, and the height of the resist solution nozzle 232 can be adjusted.

A wafer holding unit 240 that holds the wafer W as shown in FIG. 15 is provided on the ceiling surface in the casing 30 and above the template holding unit 220. That is, the template holding unit 220 and the wafer holding unit 240 are arranged so that the template T held by the template holding unit 220 and the wafer W placed on the wafer holding unit 240 face each other. The wafer holding unit 240 holds the back surface of the wafer W by suction so that the processing surface of the wafer W faces downward. The wafer holding unit 240 can be moved in the horizontal direction by a moving mechanism 241 provided above the wafer holding unit 240.

Next, an imprint process performed by the imprint unit 210 configured as described above will be described. FIG. 17 shows the state of the template T and the wafer W in the main process.

First, the template T and the wafer W are carried into the imprint unit 210 and are sucked and held by the template holding unit 220 and the wafer holding unit 240, respectively. At this time, on the template T, release agent S is deposited only on the convex portion C ₁ upper surface of the transfer pattern C.

Thereafter, the resist solution nozzle 232 is moved in the side direction of the template T, and the resist solution is applied onto the template T as shown in FIG. 17A to form a resist film R as a coating film. At this time, the amount of the resist solution applied onto the recess C ₂ portion corresponding to the transfer pattern C of the template T (portion corresponding to the convex portion of the resist pattern P formed on the wafer W) is often convex portion C _The resist solution is applied onto the template T so that the amount of the resist solution applied to the portion corresponding to ₁ (the portion corresponding to the recess in the resist pattern P) is reduced. In this way, a resist solution is applied on the template T in accordance with the aperture ratio of the transfer pattern C.

Further, since the release agent S is formed only on the upper surface of the convex portion C _{1 in} the transfer pattern C of the template T, the upper surface of the convex portion C ₁ is more resist resist than the inner surface of the concave portion C _2. The contact angle with respect to increases. Therefore, the resist solution applied on the template T is likely to flow into the concave portion C _2. Namely, the resist solution is filled without gaps in the recess C _2.

When the resist film R is applied on the template T in this manner, the wafer W held on the wafer holding unit 240 is moved to a predetermined position in the horizontal direction to be aligned and held on the template holding unit 220. The template T is rotated in a predetermined direction. Then, the template T is raised to the wafer W side as indicated by the arrow in FIG. The template T rises to a predetermined position, and the surface T _{1 of the} template T is pressed against the resist film R on the wafer W. Subsequently, light is emitted from the light source 223. The light from the light source 223 passes through the template T as shown in FIG. 17B and is applied to the resist film R on the wafer W, whereby the resist film R is photopolymerized. In this way, the transfer pattern C of the template T is transferred to the resist film R on the wafer W, and a resist pattern P is formed.

Thereafter, the template T is lowered as shown in FIG. 17C to form a resist pattern P on the wafer W. At this time, the convex portion C ₁ is the top surface release agent S in the transfer pattern C of the template T is deposited, never resist on the wafer W adheres to the surface T ₁ of the template T. That is, according to the inventors, if the release agent S on the convex portion C ₁ upper surface long as it is deposited, the template T is able to exert a sufficient releasing effect has been confirmed. Note that after the wafer W is unloaded from the imprint unit 210, the remaining film L on the wafer W may be removed as shown in FIG. Thus, the imprint process in the imprint unit 210 is completed, and a predetermined resist pattern P is formed on the wafer W.

According to the above embodiment, since the formation of the release agent S only the convex portion C ₁ upper surface of the transfer pattern C in step A3, the convex portion C ₁ upper surface, the inner surface of the concave portion C ₂ of the transfer pattern C The contact angle with respect to the resist solution is larger than Therefore, the resist solution applied on the template T is likely to flow into the concave portion C ₂ of the transfer pattern C. Namely, the resist solution is filled without gaps in the recess C _2. Therefore, a predetermined resist pattern P can be formed on the wafer W using the template T.

Further, since the first roller 121 and the second roller 122 are provided in contact with the release agent supply unit 112 of the film forming unit 30, the supply is performed from the release agent nozzle 123 to the second roller 122. The released release agent S is stretched thinly between the second roller 122 and the first roller 121. Then, the release agent S adheres to the surface of the first roller 121 with a predetermined film thickness. Accordingly, the convex portion C ₁ upper surface of the transfer pattern C from the first roller 121 may be coated with a release agent S in a predetermined thickness.

Further, the drying nozzle 124 and the first roller 121 can be dried the same because it is supported by the support member 120, immediately efficiently release agent S coated on the convex portion C ₁ upper surface of the transfer pattern C .

Furthermore, since the first roller 121, the second roller 122, the release agent nozzle 123, and the drying nozzle 124 are all supported by one support member 120, the release agent supply unit 112 configured by these is provided. It can be moved efficiently. In addition, only one moving mechanism for moving the release agent supply unit 112 is required, and the manufacturing cost of the template processing apparatus 1 can be reduced.

Moreover, since cleaning the surface T ₁ of the template T in step A2, it is possible to film the release agent S in a predetermined thickness on the surface T ₁ of the template T in the subsequent step S3. Note that this step A2 may be omitted if the surface T ₁ of the template T is prewashed thoroughly.

In the above embodiment, in the film forming units 30 and 32, the template T is mounted on the mounting table 101. However, the present invention is not limited to this as long as the template T can be held. For example, instead of the mounting table 101, a rotation holding member having the same configuration as the rotation holding member 131 of the rinse units 31 and 33 may be provided. In such a case, the lifting pins 102 and the lifting drive unit 103 can be omitted.

In the above embodiment, in the film forming units 30 and 32, the release agent supply unit 112 is arranged above the mounting table 101. However, the arrangement of the mounting table 101 and the release agent supply unit 112 is arranged in the vertical direction. It may be reversed. In such a case, the mounting table 101 suction-holds the rear surface _{T 2} of the template T. Then, the first roller 121 from below the template T releasing agent supply unit 112 is in contact with the convex portion C ₁ upper surface of the transfer pattern C, and depositing the release agent S on the convex portion C ₁ top.

In the above embodiment, the rinsing units 31 and 33 supply the rinsing liquid onto the rotating template T to rinse the release agent S. For example, the template T is applied to the immersion layer in which the rinsing liquid is stored. May be dipped to rinse the release agent S.

In the above embodiment, in the cleaning unit 40 and 50, while moving the template T, had been irradiated with ultraviolet rays to the template T in the mobile, for example, an ultraviolet irradiation unit for covering the surface T ₁ the entire surface of the template T The template T may be irradiated with ultraviolet rays. The ultraviolet irradiation unit is disposed above the template T so as to face the template T. In this case, it is possible to irradiate ultraviolet rays to the surface T ₁ the entire surface of the template T by one irradiation, it is possible to clean the surface T ₁ of the template T quickly. In this case, similarly to the rinsing unit 31 and 33, the template T is rotated, may be irradiated with ultraviolet rays to the surface T ₁ entire template T in the rotation.

In the above embodiment, the film formation of the release agent S on the template T and the heating of the template T are performed in separate processing units ( film formation units 30 and 32 and heating units 43, 44, 53, and 54). Although it was performed, it may be performed by one processing unit. For example, a hot plate is provided in the mounting table 101 of the film forming units 30 and 32. In such a case, since the application of the release agent S and the heating of the template T can be continuously performed in one processing unit, the throughput of the template processing can be improved. In addition, the configuration of the template processing apparatus 1 can be simplified.

In the above embodiment, in the imprint unit 210, the template holding unit 220 is provided below the wafer holding unit 240. However, the arrangement of the template holding unit 220 and the wafer holding unit 240 may be reversed in the vertical direction. . That is, the template holding unit 220 may be arranged on the ceiling surface in the casing 211, and the wafer holding unit 240 may be arranged on the bottom surface in the casing 211. In such a case, after the resist solution is supplied onto the wafer W placed on the wafer holder 240 and the resist film R is formed, the template holder 220 holding the template T is lowered. Then, the transfer pattern C of the template T is transferred to the resist film R on the wafer W, and a resist pattern P is formed.

In the above embodiment, the resist solution is applied on the template T in the imprint unit 210. However, the resist solution may be applied in the film forming units 30 and 32 described above. In such a case, a resist solution nozzle that supplies the resist solution to the release agent supply unit 112 is provided. Then, the template T on which the release agent S and the resist film R are formed is conveyed to the imprint 210, and the transfer pattern C of the template T is transferred to the resist film R on the wafer W in the imprint unit 210. Is formed.

In the above embodiment, the imprint unit 210 and the template processing apparatus 1 are provided separately, but they may be arranged in one system. In such a case, since the template processing in the template processing apparatus 1 and the imprint processing in the imprint unit 210 can be performed continuously, the throughput of these processes can be improved.

In the film forming units 30 and 32 of the above embodiment, the configuration of the release agent supply unit 112 is not limited to the above embodiment, and various configurations can be adopted.

For example, as shown in FIG. 18, the drying nozzle 124 of the release agent supply unit 112, the surrounding atmosphere of the convex portion C ₁ top release agent is applied to the S of the transfer pattern C may be aspirated. In this case, since the upward force on the release agent S of the convex portion C ₁ top acts, the release agent S can be reliably prevented from flowing into the recess C _2. Therefore, it is possible to form a release agent S only more reliable protrusions C ₁ top.

Further, for example, in the release agent supply unit 112, the second roller 122 may be omitted, and only the first roller 121 may be provided as shown in FIG. In such a case, the release agent S is supplied from the release agent nozzle 123 to the first roller 121. Then, by controlling the supply amount of the release agent S from the release agent nozzle 123, the release agent S adheres to the surface of the first roller 121 with a predetermined film thickness. Therefore, the apparatus configuration of the film forming units 30 and 32 can be simplified and the manufacturing cost can be reduced.

Further, in the release agent supply unit 112 of the above embodiment, the liquid release agent S is attached to the surface (circumferential surface) of the first roller 121, but as shown in FIG. A mold release agent S that has been dried and solidified may be adhered to the peripheral surface. The roller 300 is supported by the support member 120. In such a case, for example, the liquid release agent S is attached to the roller 300 in the standby unit 114 shown in FIG. 6, and then the release agent S is dried. In a state where the roller 300 as shown in FIG. 20 in contact with the convex portion C ₁ upper surface of the transfer pattern C, to move the roller 300 in the side direction of the template T. Then, the roller 300 is rotated on the convex portion C _1, the release agent S on the surface of the roller 300 is transferred to the convex portion C ₁ top. In this case, the release agent S is so dry, are transferred to the convex portion C ₁ upper surface at a predetermined thickness. According to this example, since no release agent S on the convex portion C ₁ upper surface must be dried, it can be omitted drying nozzle 124 in the release agent supply unit 112 of the embodiment described above. Therefore, the apparatus configuration of the film forming units 30 and 32 can be simplified and the manufacturing cost can be reduced.

Further, in the above embodiment, although the release agent S on the convex portion C ₁ upper surface of the transfer pattern C using rollers 121,122,300 was applied, release agent on the surface as shown in FIG. 21 An application plate 310 to which S is attached may be used. The application plate 310 has a shape that covers at least the transfer pattern C of the template T. Then, by the elevating mechanism (not shown) to lower the applied plate 310 to the template T side, it is brought into contact with the surface of the coating plate 310 to the convex portion C ₁ top. Then, the release agent S is coated on the convex portion C ₁ top. The release agent S attached to the surface of the coating plate 310 may be in a liquid form or may be dried and solidified. If the release agent S is a liquid, after application of the release agent S on the upper surface of the convex portion C ₁ using a coating plate 310, the release agent S, is dried by, for example, gas.

In the above embodiment, after forming a release agent S on the convex portion C ₁ upper surface in step A3, it had been calcined by heating the release agent S in step A4, firing the release agent S Alternatively, alcohol treatment may be performed.

In this case, as shown in FIG. 22, post-processing units 400 and 401 are arranged in the first processing block G1 and the second processing block G2 of the template processing apparatus 1 in place of the rinse units 31 and 33, for example. . In the post-processing unit 400 and 401, and supplies the alcohol to the convex portion _{C 1} release agent is deposited on the upper surface S in the film forming unit 30 and 32, the adhesion between the convex portion _{C 1} top and a release agent S Thereafter, the release agent S supplied with alcohol is rinsed to remove unreacted portions of the release agent S. Further, as shown in FIG. 23, in the third processing block G3 and the fourth processing block G4, the heating units 43, 44, 53, 54 and the temperature control units 41, 42, 51, 52 are omitted, and the cleaning unit 40 is used. , 50 are arranged in two stages.

Next, the configuration of the post-processing units 400 and 401 will be described. As shown in FIG. 24, the post-processing unit 400 includes a casing 410 having a loading / unloading port (not shown) for the template T formed on the side surface.

A rotation holding member 411 that holds and rotates the template T is provided at the center of the casing 410. The configuration of the rotation holding member 411 is the same as the configuration of the rotation holding member 131 shown in FIGS.

The rotation holding member 411 is attached to the cover body 412 as shown in FIG. 24, and a rotation driving unit 414 is provided below the rotation holding member 411 via a shaft 413. By this rotation drive unit 414, the rotation holding member 411 can rotate at a predetermined speed around the vertical and can move up and down.

Around the rotation holding member 411, there is provided a cup 420 that receives and collects alcohol or rinsing liquid scattered or dropped from the template T. A lower surface of the cup 420 is connected to a discharge pipe 421 for discharging the collected alcohol or rinsing liquid and an exhaust pipe 422 for exhausting the atmosphere in the cup 420.

25, a rail 430 extending along the Y direction (left-right direction in FIG. 25) is formed on the X direction negative direction (downward direction in FIG. 25) side of the cup 420. As shown in FIG. The rail 430 is formed, for example, from the outside of the cup 420 in the Y direction negative direction (left direction in FIG. 25) to the outside in the Y direction positive direction (right direction in FIG. 25). For example, two arms 431 and 432 are attached to the rail 430.

The first arm 431 supports an alcohol nozzle 433 that supplies normal temperature alcohol, for example ethanol, to the release agent S on the template T. The first arm 431 is movable on the rail 430 by the nozzle driving unit 434. As a result, the alcohol nozzle 433 can move from the standby portion 435 installed outside the cup 420 on the Y direction positive direction side to above the center portion of the template T in the cup 420. The first arm 431 can be moved up and down by a nozzle driving unit 434, and the height of the alcohol nozzle 433 can be adjusted. In addition, alcohol should just be alcohols and you may use alcohol other than ethanol. For example, methanol, propanol, butanol, pentanol, hexanol, heptanol may be used, or a mixture of these alcohols may be used. The concentration of alcohol is not particularly limited, but is preferably 100%. Moreover, although normal temperature alcohol is used in this Embodiment, in order to suppress condensation of alcohol, you may use alcohol heated, for example to 70 degrees C or less. Furthermore, although liquid alcohol is used in the present embodiment, gaseous alcohol may be used.

The second arm 432 supports a rinsing liquid nozzle 440 that supplies a rinsing liquid, for example, an organic solvent of the release agent S, onto the template T. The second arm 432 is movable on the rail 430 by the nozzle driving unit 441. Thereby, the rinsing liquid nozzle 440 can move from the standby portion 442 provided on the outer side of the cup 420 on the Y direction negative direction side to above the center portion of the template T in the cup 420. The second arm 432 can be moved up and down by the nozzle driving unit 441, and the height of the rinsing liquid nozzle 440 can be adjusted.

In the above configuration, the alcohol nozzle 433 and the rinsing liquid nozzle 440 are supported by separate arms 431 and 432. However, the alcohol nozzle 433 and the rinsing liquid nozzle are supported by the same arm and controlled by movement of the arms. The movement and supply timing of 440 may be controlled.

Note that the configuration of the post-processing unit 401 is the same as the configuration of the post-processing unit 400 described above, and a description thereof will be omitted.

The template processing apparatus 1 according to the present embodiment is configured as described above. Next, the process which forms the mold release agent performed in the template processing apparatus 1 will be described. FIG. 26 shows the main processing flow of this template processing.

First, the template T is transferred from the loading / unloading station 2 to the processing station 3 by the template transfer body 12 (step B1 in FIG. 26). Thereafter, in the cleaning unit 40, after the cleaning of the surface _{T 1} of the template T (step B2 in FIG. 26) is performed, in the film deposition unit 30. The template T is formed (step B3 in FIG. 26). Since these steps B1 to B3 are the same as the steps A1 to A3 in the above embodiment, a detailed description thereof is omitted.

Thereafter, the template T is transported to the post-processing unit 400 by the transport unit 20 and transferred to the rotation holding member 411. Subsequently, the alcohol nozzle 433 is moved above the center of the template T by the first arm 431 and the template T is rotated. Then, alcohol is supplied onto the rotating template T, and the alcohol is diffused on the template T by centrifugal force (step B4 in FIG. 26). Then, the alcohol on the template T, the release agent S is firmly and closely chemically react with the surface T ₁ of the template T, release agent S is brought into close contact with the surface T ₁ of the said template T.

Thereafter, the supply of alcohol from the alcohol nozzle 433 is stopped, and the template T is further rotated. By the rotation of the template T, the alcohol on the template T is dried and removed (step B5 in FIG. 26). While the alcohol is being dried in this way, the alcohol nozzle 433 moves from above the center of the template T, and the second arm 432 moves the rinse liquid nozzle 440 of the standby unit 442 to above the center of the template T. To do.

When the alcohol on the template T is dried, the template T is continuously rotated, and the rinse liquid is supplied from the rinse liquid nozzle 440 onto the rotating template T. The rinse liquid diffuses on the template T by centrifugal force. Only the unreacted portion of the release agent S is peeled off by this rinsing liquid (step B6 in FIG. 26). Then, after stopping the supply of the rinsing liquid, it continues to further rotate the template T, drying finishing off the surface T _1.

Thereafter, the template T is transported to the transition unit 21 by the transport unit 20 and returned to the cassette C by the template transport body 12 (step B7 in FIG. 26). Thus a series of template processing in template processing apparatus 1 is completed, the release agent S is deposited only on the convex portion C ₁ upper surface in the transfer pattern C of the template T.

According to the above embodiment, since the alcohol was applied to the release agent S on the template T in step B4, the chemical reaction between the surface T ₁ and the release agent S of the template T is promoted, the template The adhesion between the surface T ₁ of T and the release agent S is improved. In other words, it can be brought into close contact with the surface T ₁ of the template T of the release agent S in a short time. Thereby, the throughput of template processing can be further improved.

Further, since the release agent S on the surface T ₁ of the template T in the step B4 to adhesion, the predetermined angle and the contact angle of the release agent S on the template T, can be for example, about 110 degrees. Thereby, the release agent S has sufficient liquid repellency with respect to the resist film, and can exhibit its release function.

In addition, since the process B4 and the process B5, that is, the application and drying of the alcohol and the application and drying of the rinse liquid are performed in one post-processing unit 400, the alcohol processing and the rinsing process can be performed efficiently, and the template processing apparatus 1 The size can be reduced, and the manufacturing cost can be reduced.

In the above embodiment, the film formation of the release agent S on the template T and the alcohol treatment and the rinsing treatment of the release agent S are performed in separate processing units (the film formation units 30 and 32 and the post-processing unit 400, respectively). 401), it may be performed by one processing unit.

For example, as shown in FIG. 27, the film forming unit 500, which is the above-described processing unit, supplies the release agent shown in FIGS. 4 and 6 into the casing 410 of the post-processing unit 400 shown in FIGS. The portion 112 is arranged. The release agent supply unit 112 is supported by the third arm 501 as shown in FIG. The third arm 501 is movable on the rail 430 by the drive unit 502. Thereby, the release agent supply unit 112 extends from the standby unit 503 installed on the outer side of the standby unit 442 in the negative Y direction (left direction in FIG. 27) to above the center of the template T in the cup 420. I can move. Further, the third arm 501 can be raised and lowered by the drive unit 502, and the height of the release agent supply unit 112 can be adjusted. Further, a standby unit 504 is installed between the standby unit 435 and the cup 420, and the rinse liquid nozzle 440 can move from the standby unit 442 to the standby unit 504 through the center of the template T in the cup 420. The other configuration of the film forming unit 500 is the same as the configuration of the post-processing unit 400, and thus the description thereof is omitted. In the above configuration, the release agent supply unit 112 is supported by the third arm 501, but may be supported by the same arm together with the alcohol nozzle 433 and the rinse liquid nozzle 440.

The film formation of the release agent S on the template T performed in the film formation unit 500 and the alcohol treatment and the rinsing treatment of the release agent S on the template T are the same as the steps B3 to B6 of the above embodiment. Therefore, explanation is omitted.

In such a case, since the process B3 to the process B6 are performed by the single film forming unit 500, the film forming process, the alcohol process, and the rinsing process of the release agent S can be performed efficiently. Moreover, the template processing apparatus 1 can be reduced in size, and the manufacturing cost can be reduced.

Incidentally, in the above embodiment, with respect to the release agent S which is formed in the convex portion C ₁ upper surface in the transfer pattern C of the template T, it may be irradiated with light. The wavelength of the light applied to the release agent S is preferably, for example, 350 nm to 2500 nm. When the inventors have examined, is irradiated with light of such wavelengths release agent S, it is possible to accelerate the chemical bonding of the surface T ₁ and the release agent S of the template T, the surface T ₁ and the release of the template T It was found that the adhesion with the agent S was improved. That is, the chemical bonding between the surface T ₁ of the template T and the release agent S by the alcohol described above can be further promoted, and the release agent S can be brought into close contact with the surface T ₁ of the template T in a shorter time.

The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the idea described in the claims, and these naturally belong to the technical scope of the present invention. It is understood. The present invention is not limited to this example and can take various forms. The present invention can also be applied to a case where the substrate is another substrate such as an FPD (flat panel display) other than a wafer or a mask reticle for a photomask.

DESCRIPTION OF SYMBOLS 1 Template processing apparatus 30, 32 Film-forming unit 31, 33 Rinse unit 40, 50 Cleaning unit 43, 44, 53, 54 Heating unit 110 Rail 111 Arm 112 Release agent supply part 113 Drive part 120 Support member 121 1st roller 122 Second roller 123 Release agent nozzle 124 Drying nozzle 200 Control unit 210 Imprint unit 300 Roller 310 Application plate 400, 401 Post-processing unit 411 Rotation holding member 433 Alcohol nozzle 440 Rinse liquid nozzle 500 Film formation unit C Transfer pattern C ₁ Convex part C ₂ concave part P Resist pattern R Resist film S Release agent T Template W Wafer

Claims (19)

1. A mold release agent is applied to a template having a concavo-convex transfer pattern formed on the surface thereof, which is used to transfer a transfer pattern to a coating film formed on a substrate to form a predetermined pattern on the coating film. In the template processing method for film formation,
   A release agent is formed only on the upper surface of the convex portion of the transfer pattern.
2. The template processing method according to claim 1,
   When a release agent is formed on the upper surface of the convex portion, a liquid release agent is supplied to the upper surface of the convex portion, and then a gas is supplied to the release agent to dry the release agent.
3. The template processing method according to claim 1,
   When a release agent is formed on the upper surface of the convex portion, a liquid release agent is supplied to the upper surface of the convex portion, and then the atmosphere around the release agent is sucked to dry the release agent.
4. The template processing method according to claim 1,
   When a release agent is formed on the upper surface of the convex portion, the release agent solidified by drying is attached to the upper surface of the convex portion.
5. The template processing method according to claim 1,
   After forming a release agent on the upper surface of the convex portion, the release agent is heated and baked,
   Thereafter, the fired release agent is rinsed to remove unreacted portions of the release agent.
6. The template processing method according to claim 1,
   After forming a release agent film on the upper surface of the convex portion, supplying alcohol to the release agent to improve the adhesion between the upper surface of the convex portion and the release agent,
   Thereafter, the release agent supplied with the alcohol is rinsed to remove the unreacted portion of the release agent.
7. The template processing method according to claim 1,
   The surface of the template is cleaned before depositing a release agent on the upper surface of the convex portion.
8. A readable computer storage medium storing a program that operates on a computer of a control unit that controls the template processing apparatus in order to execute the template processing method by the template processing apparatus,
   The template processing method is:
   A mold release agent is applied to a template having a concavo-convex transfer pattern formed on the surface and used to transfer a transfer pattern to a coating film formed on a substrate to form a predetermined pattern on the coating film. A film is formed, and a release agent is formed only on the upper surface of the convex portion of the transfer pattern.
9. A mold release agent is applied to a template having a concavo-convex transfer pattern formed on the surface thereof, which is used to transfer a transfer pattern to a coating film formed on a substrate to form a predetermined pattern on the coating film. In a template processing apparatus for film formation,
   A film forming unit for forming a release agent on only the upper surface of the convex portion of the transfer pattern is provided.
10. The template processing apparatus according to claim 9, wherein
    A roller that contacts the upper surface of the convex portion and applies a release agent to the upper surface of the convex portion, a release agent nozzle that supplies a liquid release agent to the surface of the roller, the roller, and the release agent A release agent supply unit comprising a support member for supporting the nozzle;
    And a moving mechanism that supports the release agent supply section and moves it in the horizontal direction.
11. The template processing apparatus according to claim 10, wherein
    The release agent supply unit includes another roller that is supported by the support member and that extends in the same direction as the roller and contacts the roller.
    The release agent nozzle supplies a release agent to the other roller.
12. The template processing apparatus according to claim 10, wherein
    The release agent supply unit is supported by the support member, and has a drying nozzle that dries the release agent applied to the upper surface of the convex portion.
    The drying nozzle supplies gas to the release agent on the upper surface of the convex portion.
13. The template processing apparatus according to claim 10, wherein
    The release agent supply unit is supported by the support member, and has a drying nozzle that dries the release agent applied to the upper surface of the convex portion.
    The drying nozzle sucks the atmosphere around the release agent on the upper surface of the convex portion.
14. The template processing apparatus according to claim 9, wherein
    The film forming unit includes:
    A release agent solidified by drying on the surface, and a roller that contacts the upper surface of the convex portion and attaches the release agent to the upper surface of the convex portion;
    A moving mechanism that supports the roller and moves it in a horizontal direction;
    Have
15. The template processing apparatus according to claim 9, wherein
    The film forming unit has a coating plate on which a release agent adheres to the surface, abuts on the upper surface of the convex portion, and applies the release agent to the upper surface of the convex portion.
16. The template processing apparatus according to claim 9, wherein
    A heating unit for firing the release agent formed in the film forming unit;
    A rinse unit for rinsing the release agent baked in the heating unit;
    Have
17. The template processing apparatus according to claim 9, wherein
    A rotation holding member for holding and rotating the template;
    An alcohol nozzle for supplying alcohol to the release agent formed by the film forming unit;
    A post-processing unit comprising a rinsing liquid nozzle for supplying a rinsing liquid to the mold release agent supplied with the alcohol;
    Have
18. The template processing apparatus according to claim 9, wherein
    The film forming unit includes:
    A rotation holding member for holding and rotating the template;
    An alcohol nozzle for supplying alcohol to a release agent formed on the upper surface of the convex portion;
    A rinse liquid nozzle for supplying a rinse liquid to the release agent supplied with the alcohol;
    Have
19. The template processing apparatus according to claim 9, wherein
    A cleaning unit that cleans the surface of the template before the release agent is formed by the film forming unit;

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