JP2011168691A - Method for producing polymer - Google Patents
Method for producing polymer Download PDFInfo
- Publication number
- JP2011168691A JP2011168691A JP2010033603A JP2010033603A JP2011168691A JP 2011168691 A JP2011168691 A JP 2011168691A JP 2010033603 A JP2010033603 A JP 2010033603A JP 2010033603 A JP2010033603 A JP 2010033603A JP 2011168691 A JP2011168691 A JP 2011168691A
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- Japan
- Prior art keywords
- group
- monomer
- general formula
- hydrogen atom
- carbon atoms
- Prior art date
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- Granted
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- 229920000642 polymer Polymers 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 239000000178 monomer Substances 0.000 claims abstract description 114
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 77
- 239000002904 solvent Substances 0.000 claims abstract description 61
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 35
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 31
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 29
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 27
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims abstract description 23
- 125000000962 organic group Chemical group 0.000 claims abstract description 17
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 11
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims abstract description 5
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 81
- -1 1-trifluoromethylethyl group Chemical group 0.000 claims description 53
- 125000002723 alicyclic group Chemical group 0.000 claims description 18
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 12
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 12
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 9
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical class CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical class OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 7
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 claims description 7
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 claims description 7
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 6
- 229920006395 saturated elastomer Polymers 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 5
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 3
- 125000004977 cycloheptylene group Chemical group 0.000 claims description 3
- 125000004956 cyclohexylene group Chemical group 0.000 claims description 3
- 125000004979 cyclopentylene group Chemical group 0.000 claims description 3
- 125000004185 ester group Chemical group 0.000 claims description 3
- 125000001033 ether group Chemical group 0.000 claims description 3
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 abstract description 26
- 238000006243 chemical reaction Methods 0.000 abstract description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 9
- 239000011737 fluorine Substances 0.000 abstract description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 31
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 26
- 239000002253 acid Substances 0.000 description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 14
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 12
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 11
- 239000003513 alkali Substances 0.000 description 11
- DMEGYFMYUHOHGS-UHFFFAOYSA-N cycloheptane Chemical compound C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 9
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 8
- 125000005843 halogen group Chemical group 0.000 description 8
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 8
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 8
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 7
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 6
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 6
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 125000005916 2-methylpentyl group Chemical group 0.000 description 5
- 125000005917 3-methylpentyl group Chemical group 0.000 description 5
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 4
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 4
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 4
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- CRSOQBOWXPBRES-UHFFFAOYSA-N neopentane Chemical compound CC(C)(C)C CRSOQBOWXPBRES-UHFFFAOYSA-N 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 3
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000004849 alkoxymethyl group Chemical group 0.000 description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000003763 carbonization Methods 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 3
- 239000004914 cyclooctane Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000002950 monocyclic group Chemical group 0.000 description 3
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 0 *C(C(O*C(C(F)(F)F)(C(F)(F)F)O)=O)=C Chemical compound *C(C(O*C(C(F)(F)F)(C(F)(F)F)O)=O)=C 0.000 description 2
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- 125000004135 2-norbornyl group Chemical group [H]C1([H])C([H])([H])C2([H])C([H])([H])C1([H])C([H])([H])C2([H])* 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- GPRLTFBKWDERLU-UHFFFAOYSA-N bicyclo[2.2.2]octane Chemical compound C1CC2CCC1CC2 GPRLTFBKWDERLU-UHFFFAOYSA-N 0.000 description 2
- 239000001273 butane Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 150000001924 cycloalkanes Chemical class 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 235000013847 iso-butane Nutrition 0.000 description 2
- GJRQTCIYDGXPES-UHFFFAOYSA-N isobutyl acetate Chemical compound CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical class CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- 125000005657 1,3-cyclobutylene group Chemical group [H]C1([H])C([H])([*:1])C([H])([H])C1([H])[*:2] 0.000 description 1
- 125000005838 1,3-cyclopentylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:2])C([H])([H])C1([H])[*:1] 0.000 description 1
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 1
- SGRHVVLXEBNBDV-UHFFFAOYSA-N 1,6-dibromohexane Chemical compound BrCCCCCCBr SGRHVVLXEBNBDV-UHFFFAOYSA-N 0.000 description 1
- MNDIARAMWBIKFW-UHFFFAOYSA-N 1-bromohexane Chemical class CCCCCCBr MNDIARAMWBIKFW-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical class CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- OHJYHAOODFPJOD-UHFFFAOYSA-N 2-(2-ethylhexoxy)ethanol Chemical compound CCCCC(CC)COCCO OHJYHAOODFPJOD-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- UPGSWASWQBLSKZ-UHFFFAOYSA-N 2-hexoxyethanol Chemical compound CCCCCCOCCO UPGSWASWQBLSKZ-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- MKTOIPPVFPJEQO-UHFFFAOYSA-N 4-(3-carboxypropanoylperoxy)-4-oxobutanoic acid Chemical compound OC(=O)CCC(=O)OOC(=O)CCC(O)=O MKTOIPPVFPJEQO-UHFFFAOYSA-N 0.000 description 1
- WVYWICLMDOOCFB-UHFFFAOYSA-N 4-methyl-2-pentanol Chemical compound CC(C)CC(C)O WVYWICLMDOOCFB-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- FFOMXRBASTWAMX-UHFFFAOYSA-N C1=CC=CC=CC=CC=CC=CC=CC=CC=C2C=CC=CC=CC=CC=CC=CC=CC=CC=CC2=C1 Chemical group C1=CC=CC=CC=CC=CC=CC=CC=CC=C2C=CC=CC=CC=CC=CC=CC=CC=CC=CC2=C1 FFOMXRBASTWAMX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
本発明は化学増幅型レジスト、特にArF液浸露光用のレジストとして好適に用いることができる感放射線性樹脂組成物の構成成分となるフッ素含有重合体の製造方法に関する。 The present invention relates to a method for producing a fluorine-containing polymer as a constituent of a radiation-sensitive resin composition that can be suitably used as a chemically amplified resist, particularly a resist for ArF immersion exposure.
集積回路素子の製造に代表される微細加工の分野においては、酸解離性基を有する重合体を含む樹脂組成物によって基板上にレジスト被膜を形成し、マスクパターンを介してそのレジスト被膜に短波長の放射線(エキシマレーザー等)を照射して露光させ、露光部をアルカリ現像で除去することにより微細なレジストパターンを形成することが行われている。この際、樹脂組成物中に放射線照射により酸を発生する感放射線性酸発生剤を含有させ、その酸の作用により感度を向上させた「化学増幅型レジスト」が利用されている。 In the field of microfabrication represented by the manufacture of integrated circuit elements, a resist film is formed on a substrate with a resin composition containing a polymer having an acid-dissociable group, and the resist film has a short wavelength via a mask pattern. A fine resist pattern is formed by irradiating with radiation (excimer laser or the like) and exposing, and removing the exposed portion by alkali development. At this time, a “chemically amplified resist” is used in which a radiation-sensitive acid generator that generates an acid upon irradiation with radiation is contained in the resin composition, and the sensitivity is improved by the action of the acid.
更に微細なレジストパターン(例えば、線幅45nm程度)を形成する方法として、「液浸露光法(リキッドイマージョンリソグラフィ)」の利用が拡大しつつある。この方法では、露光光路空間(レンズとレジスト被膜との間)を空気や不活性ガスに比して屈折率(n)が大きい液浸露光液(例えば、純水、フッ素系不活性液体等)で満たした状態で露光を行う。これにより、レンズの開口数(NA)を増大させた場合でも、焦点深度が低下し難く、しかも高い解像性が得られるという利点がある。 As a method for forming a finer resist pattern (for example, a line width of about 45 nm), the use of the “immersion exposure method (liquid immersion lithography)” is expanding. In this method, an immersion exposure liquid (for example, pure water, fluorine-based inert liquid, etc.) having a refractive index (n) larger than that of air or an inert gas in the exposure optical path space (between the lens and the resist film). Exposure is performed in a state where As a result, even when the numerical aperture (NA) of the lens is increased, there is an advantage that the depth of focus is hardly lowered and high resolution can be obtained.
前述の液浸露光法に用いられる樹脂組成物として、例えば、レジスト被膜から液浸露光液への酸発生剤等の溶出を防止し、レジスト被膜の水切れを良くすること等を目的として、疎水性が高いフッ素含有重合体を含有する様々な樹脂組成物が提案されている(例えば、特許文献1、2参照)。 As a resin composition used in the above-described immersion exposure method, for example, for the purpose of preventing elution of an acid generator or the like from the resist coating to the immersion exposure solution and improving the drainage of the resist coating, etc. Various resin compositions containing a high fluorine-containing polymer have been proposed (for example, see Patent Documents 1 and 2).
上述のフッ素含有重合体は、その製造に際して、単量体の重合転化率(収率)が高くない。そこで、高収率でフッ素含有重合体を得るため、イソプロピルアルコール(以下、単に「IPA」とも記載する。)溶媒中で重合することが提案されている(例えば、特許文献3参照)。 In the production of the above-mentioned fluorine-containing polymer, the polymerization conversion rate (yield) of the monomer is not high. Therefore, in order to obtain a fluorine-containing polymer with high yield, it has been proposed to polymerize in an isopropyl alcohol (hereinafter also simply referred to as “IPA”) solvent (see, for example, Patent Document 3).
しかしながら、上述の特許文献3で提案されている重合方法で用いられるIPAは、沸点や引火点が低いため、工業的規模で利用する場合、重合効率の問題があるばかりでなく、安全性に十分配慮しつつ重合を行う必要がある。 However, since IPA used in the polymerization method proposed in the above-mentioned Patent Document 3 has a low boiling point and flash point, when used on an industrial scale, it not only has a problem of polymerization efficiency, but also has sufficient safety. It is necessary to carry out the polymerization with consideration.
本発明は、このような従来技術の有する問題点に鑑みてなされたものであり、その課題とするところは、単量体の重合転化率が高いフッ素含有重合体の製造方法を提供することにある。 The present invention has been made in view of such problems of the prior art, and the object of the present invention is to provide a method for producing a fluorine-containing polymer having a high monomer conversion rate. is there.
本発明者らは上記課題を達成すべく鋭意検討した結果、特定のフッ素含有単量体を含有する単量体成分を、特定の溶媒を含有する溶媒成分中で重合させることによって、上記課題を達成することが可能であることを見出し、本発明を完成するに至った。 As a result of intensive studies to achieve the above-mentioned problems, the present inventors have polymerized a monomer component containing a specific fluorine-containing monomer in a solvent component containing a specific solvent, thereby achieving the above-mentioned problem. The inventors have found that it is possible to achieve this, and have completed the present invention.
即ち、本発明によれば、以下に示す重合体の製造方法が提供される。 That is, according to the present invention, the following polymer production method is provided.
[1]下記一般式(1)で表される単量体(1)を含有する単量体成分を、下記一般式(S)で表される溶媒(S)を含有する溶媒成分中で重合することを含む重合体の製造方法。 [1] Polymerization of a monomer component containing the monomer (1) represented by the following general formula (1) in a solvent component containing the solvent (S) represented by the following general formula (S) A process for producing a polymer comprising:
上記一般式(1)中、R1は、水素原子、メチル基、又はトリフルオロメチル基を示し、R2は、単結合、或いは炭素数1〜20の直鎖状、分岐状、又は環状の飽和若しくは不飽和の2価の炭化水素基を示し、R3は、水素原子、又は1価の有機基を示し、Rf1は、少なくとも1つの水素原子がフッ素原子置換されたメチレン基、又は少なくとも1つの水素原子がフッ素原子置換された、炭素数2〜20の直鎖状、若しくは分岐状のアルキレン基を示す。但し、R2で示される2価の炭化水素基は、少なくともその一部の水素原子がフッ素原子置換されていても良い。 In the general formula (1), R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and R 2 is a single bond or a linear, branched, or cyclic group having 1 to 20 carbon atoms. A saturated or unsaturated divalent hydrocarbon group, R 3 represents a hydrogen atom or a monovalent organic group, Rf 1 represents a methylene group in which at least one hydrogen atom is substituted with a fluorine atom, or at least A linear or branched alkylene group having 2 to 20 carbon atoms, in which one hydrogen atom is substituted with a fluorine atom. However, in the divalent hydrocarbon group represented by R 2 , at least a part of the hydrogen atoms may be substituted with fluorine atoms.
上記一般式(S)中、R4は、水素原子又は1価の有機基を示し、R5及びR6は、それぞれ独立に、水素原子、アルキル基、又はアセチル基を示し、iは0以上の整数を示す。なお、iが1以上である場合、全てのR4は、同一の原子又は基であることが好ましい。 In the general formula (S), R 4 represents a hydrogen atom or a monovalent organic group, R 5 and R 6 each independently represent a hydrogen atom, an alkyl group, or an acetyl group, and i is 0 or more. Indicates an integer. In addition, when i is 1 or more, all R 4 are preferably the same atom or group.
[2]前記溶媒成分が前記溶媒(S)を30質量%以上含有する前記[1]に記載の重合体の製造方法。 [2] The method for producing a polymer according to [1], wherein the solvent component contains 30% by mass or more of the solvent (S).
[3]前記溶媒成分が前記溶媒(S)を60質量%以上含有する前記[1]又は[2]に記載の重合体の製造方法。 [3] The method for producing a polymer according to [1] or [2], wherein the solvent component contains 60% by mass or more of the solvent (S).
[4]前記単量体成分が、下記一般式(2)で表される単量体(2)を更に含有する前記[1]〜[3]のいずれかに記載の重合体の製造方法。 [4] The method for producing a polymer according to any one of [1] to [3], wherein the monomer component further contains a monomer (2) represented by the following general formula (2).
上記一般式(2)中、R7は、水素原子、メチル基、トリフルオロメチル基、又はヒドロキシメチル基を示し、3つのR8は、それぞれ独立に、炭素数1〜4の直鎖状若しくは分岐状のアルキル基、又は炭素数4〜20の1価の脂環式炭化水素基若しくはそれから誘導される基を示すか、或いは、いずれか2つのR8が相互に結合し、炭素数4〜20の炭化水素環若しくはそれから誘導される環を形成し、残りの1つのR8が、炭素数1〜4の直鎖状若しくは分岐状のアルキル基、又は炭素数4〜20の1価の脂環式炭化水素基若しくはそれから誘導される基を示す。 In the general formula (2), R 7 represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group, and three R 8 are each independently a straight chain having 1 to 4 carbon atoms or A branched alkyl group, or a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a group derived therefrom, or any two R 8 's bonded to each other, 20 hydrocarbon rings or a ring derived therefrom, and the remaining one R 8 is a linear or branched alkyl group having 1 to 4 carbon atoms, or a monovalent fat having 4 to 20 carbon atoms A cyclic hydrocarbon group or a group derived therefrom is shown.
[5]前記単量体(2)が、下記一般式(2−1)で表される単量体(2−1)である前記[4]に記載の重合体の製造方法。 [5] The method for producing a polymer according to [4], wherein the monomer (2) is a monomer (2-1) represented by the following general formula (2-1).
上記一般式(2−1)中、R9は、水素原子、メチル基、トリフルオロメチル基、又はヒドロキシメチル基を示し、R10は、炭素数1〜4の直鎖状又は分岐状のアルキル基を示し、kは、1〜4の整数を示す。 In the general formula (2-1), R 9 represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group, and R 10 is a linear or branched alkyl having 1 to 4 carbon atoms. Represents a group, and k represents an integer of 1 to 4.
[6]前記単量体成分がアルカリ可溶性基を有する単量体(3)(前記単量体(1)を除く。)を更に含有する前記[1]〜[5]のいずれかに記載の重合体の製造方法。 [6] The method according to any one of [1] to [5], wherein the monomer component further contains a monomer (3) having an alkali-soluble group (excluding the monomer (1)). A method for producing a polymer.
[7]前記単量体(3)が、下記一般式(3a)で表される基、下記一般式(3b)で表される基、及び下記式(3c)で表される基からなる群より選択される少なくとも1種のアルカリ可溶性基を有する単量体である前記[6]に記載の重合体の製造方法。 [7] The monomer (3) is composed of a group represented by the following general formula (3a), a group represented by the following general formula (3b), and a group represented by the following formula (3c). The method for producing a polymer according to the above [6], which is a monomer having at least one alkali-soluble group selected from the above.
上記一般式(3a)中、Rf2は、少なくとも1つの水素原子がフッ素原子置換された炭素数1〜10の炭化水素基を示し、上記一般式(3b)中、Rf3は、少なくとも1つの水素原子がフッ素原子置換された、メチレン基又は炭素数2〜20のアルキレン基を示す。 In the general formula (3a), Rf 2 represents a C 1-10 hydrocarbon group in which at least one hydrogen atom is substituted with a fluorine atom. In the general formula (3b), Rf 3 represents at least one A methylene group or an alkylene group having 2 to 20 carbon atoms in which a hydrogen atom is substituted with a fluorine atom.
[8]前記単量体(3)が、下記一般式(3−1)で表される単量体(3−1)である前記[6]又は[7]に記載の重合体の製造方法。 [8] The method for producing a polymer according to [6] or [7], wherein the monomer (3) is a monomer (3-1) represented by the following general formula (3-1): .
上記一般式(3−1)中、R11は、水素原子、炭素数1〜4のアルキル基、トリフルオロメチル基、又はヒドロキシメチル基を示し、R12は、2価の有機基を示す。 In General Formula (3-1), R 11 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a trifluoromethyl group, or a hydroxymethyl group, and R 12 represents a divalent organic group.
[9]前記単量体成分がアルカリ反応性基を有する単量体(4)(前記単量体(1)を除く。)を更に含有する前記[1]〜[8]のいずれかに記載の重合体の製造方法。 [9] The system according to any one of [1] to [8], wherein the monomer component further contains a monomer (4) having an alkali-reactive group (excluding the monomer (1)). A method for producing the polymer.
[10]前記単量体(4)が、下記一般式(4−1)〜(4−7)で表される単量体からなる群より選択される少なくとも1種である前記[9]に記載の重合体の製造方法。 [10] In the above [9], the monomer (4) is at least one selected from the group consisting of monomers represented by the following general formulas (4-1) to (4-7): The manufacturing method of the polymer of description.
上記一般式(4−1)〜(4−6)中、R13は、それぞれ独立に、水素原子、又はメチル基を示す。上記一般式(4−1)中、R14は、水素原子、又は置換されていても良い炭素数1〜4のアルキル基を示し、lは1〜3の整数を示す。上記一般式(4−2)及び(4−3)中、Aは、それぞれ独立に、単結合、エーテル基、エステル基、カルボニル基、炭素数1〜30の2価の鎖状炭化水素基、炭素数3〜30の2価の脂環式炭化水素基、炭素数6〜30の2価の芳香族炭化水素基、又はこれらを組み合わせた2価の基を示し、mは、それぞれ独立に、0又は1を示す。上記一般式(4−3)及び(4−5)中、Bは、それぞれ独立に、酸素原子、又はメチレン基を示す。上記一般式(4−4)及び(4−5)中、R15は、それぞれ独立に、水素原子、又はメトキシ基を示す。上記一般式(4−7)中、R16は、水素原子、メチル基、又はトリフルオロメチル基を示し、複数のR17は、それぞれ独立に、水素原子、又は炭素数1〜5の鎖状炭化水素基を示し、nは2〜4の整数を示す。 In the general formulas (4-1) to (4-6), R 13 each independently represents a hydrogen atom or a methyl group. In the general formula (4-1), R 14 represents a hydrogen atom or an optionally substituted alkyl group having 1 to 4 carbon atoms, and l represents an integer of 1 to 3. In the general formulas (4-2) and (4-3), each A independently represents a single bond, an ether group, an ester group, a carbonyl group, a divalent chain hydrocarbon group having 1 to 30 carbon atoms, A divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms, a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms, or a divalent group obtained by combining these, m is independently 0 or 1 is shown. In the above general formulas (4-3) and (4-5), B independently represents an oxygen atom or a methylene group. In the general formulas (4-4) and (4-5), R 15 each independently represents a hydrogen atom or a methoxy group. In the general formula (4-7), R 16 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and the plurality of R 17 are each independently a hydrogen atom or a chain having 1 to 5 carbon atoms. A hydrocarbon group is shown, n shows the integer of 2-4.
[11]前記単量体(1)が、下記一般式(1−1)で表される単量体(1−1)である前記[1]〜[10]のいずれかに記載の重合体の製造方法。 [11] The polymer according to any one of [1] to [10], wherein the monomer (1) is a monomer (1-1) represented by the following general formula (1-1): Manufacturing method.
上記一般式(1−1)中、R18及びR20は、それぞれ独立に、フッ素原子、又はトリフルオロメチル基を示し、R21は、水素原子、又は1価の有機基を示し、2つのR19は、それぞれ独立に、水素原子、メチル基、エチル基、プロピル基、ブチル基、シクロペンチル基、シクロヘキシル基、ノルボルニル基、アダマンチル基、トリフルオロメチル基、2,2,2−トリフルオロエチル基、1−トリフルオロメチルエチル基、又は3,3,3−トリフルオロプロピル基を示す。但し、2つのR19が相互に結合して、シクロペンチレン基、シクロヘキシレン基、又はシクロヘプチレン基を形成していても良い。 In the general formula (1-1), R 18 and R 20 each independently represent a fluorine atom or a trifluoromethyl group, R 21 represents a hydrogen atom or a monovalent organic group, and R 19 each independently represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, a cyclopentyl group, a cyclohexyl group, a norbornyl group, an adamantyl group, a trifluoromethyl group, or a 2,2,2-trifluoroethyl group. 1-trifluoromethylethyl group or 3,3,3-trifluoropropyl group. However, two R 19 may be bonded to each other to form a cyclopentylene group, a cyclohexylene group, or a cycloheptylene group.
[12]前記溶媒(S)が、プロピレングリコールの誘導体、又はエチレングリコールの誘導体である前記[1]〜[11]のいずれかに記載の重合体の製造方法。 [12] The method for producing a polymer according to any one of [1] to [11], wherein the solvent (S) is a derivative of propylene glycol or a derivative of ethylene glycol.
本発明の重合体の製造方法によれば、単量体の重合転化率が高いフッ素含有重合体を製造することができる。 According to the method for producing a polymer of the present invention, a fluorine-containing polymer having a high polymerization conversion rate of a monomer can be produced.
以下、本発明の実施の形態について説明するが、本発明は以下の実施の形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲で、当業者の通常の知識に基づいて、以下の実施の形態に対し適宜変更、改良等が加えられたものも本発明の範囲に入ることが理解されるべきである。 Hereinafter, embodiments of the present invention will be described. However, the present invention is not limited to the following embodiments, and based on ordinary knowledge of those skilled in the art without departing from the spirit of the present invention. It should be understood that modifications, improvements, and the like appropriately added to the embodiments described above fall within the scope of the present invention.
1.重合体の製造方法:
本発明の重合体の製造方法は、単量体(1)を含有する単量体成分を、溶媒(S)を含有する溶媒成分中で重合することを含む方法である。以下、その詳細について説明する。
1. Production method of polymer:
The manufacturing method of the polymer of this invention is a method including superposing | polymerizing the monomer component containing a monomer (1) in the solvent component containing a solvent (S). The details will be described below.
1−1.溶媒成分:
本発明の重合体の製造方法において、溶媒成分は、溶媒(S)を含有するものであれば、特に制限なく、従来公知の溶媒(その他の溶媒)を混合して使用することができる。なお、溶媒成分は、溶媒(S)を、一種単独で(100質量%)含有していても良い。
1-1. Solvent component:
In the method for producing a polymer of the present invention, the solvent component is not particularly limited as long as it contains the solvent (S), and a conventionally known solvent (other solvent) can be mixed and used. In addition, the solvent component may contain the solvent (S) alone (100% by mass).
1−1−1.溶媒(S):
溶媒(S)は、下記一般式(S)で表される溶媒である。
1-1-1. Solvent (S):
The solvent (S) is a solvent represented by the following general formula (S).
上記一般式(S)中、R4は、水素原子又は1価の有機基を示し、R5及びR6は、それぞれ独立に、水素原子、アルキル基、又はアセチル基を示し、iは0以上の整数を示す。なお、iが1以上である場合、全てのR4は、同一の原子又は基であることが好ましい。 In the general formula (S), R 4 represents a hydrogen atom or a monovalent organic group, R 5 and R 6 each independently represent a hydrogen atom, an alkyl group, or an acetyl group, and i is 0 or more. Indicates an integer. In addition, when i is 1 or more, all R 4 are preferably the same atom or group.
前記一般式(S)中、R4で示される「1価の有機基」の具体例としては、メチル基、エチル基、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、t−ブチル基、フェニル基、ベンジル基等を挙げることができる。これらの中でも、溶媒が比較的低粘度となることによる操作性の観点から、メチル基、エチル基等が好ましい。 In the general formula (S), specific examples of the “monovalent organic group” represented by R 4 include methyl group, ethyl group, methyl group, ethyl group, n-propyl group, i-propyl group, n- A butyl group, an i-butyl group, a t-butyl group, a phenyl group, a benzyl group, and the like can be given. Among these, a methyl group, an ethyl group, and the like are preferable from the viewpoint of operability due to the relatively low viscosity of the solvent.
前記一般式(S)中、R5及びR6で示される「アルキル基」の具体例としては、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、t−ブチル基、n−ヘキシル基、2−エチルヘキシル基等を挙げることができる。これらの中でも、溶媒が比較的低粘度となることによる操作性の観点から、メチル基、エチル基、ブチル基等が好ましい。 In the general formula (S), specific examples of the “alkyl group” represented by R 5 and R 6 include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group. Group, t-butyl group, n-hexyl group, 2-ethylhexyl group and the like. Among these, a methyl group, an ethyl group, a butyl group and the like are preferable from the viewpoint of operability due to the relatively low viscosity of the solvent.
上記一般式(S)中、iは、0〜2の整数であることが好ましく、0又は1であることがより好ましく、0であることが更に好ましい。 In the general formula (S), i is preferably an integer of 0 to 2, more preferably 0 or 1, and still more preferably 0.
溶媒(S)の具体例としては、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールモノヘキシルエーテル、エチレングリコールモノ−2−エチルヘキシルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、ジエチレングリコールジブチルエーテル、ジエチレングリコールモノメチルエーテル、トリエチレングリコールモノメチルエーテル等の多価アルコールのアルキルエーテル類;エチレングリコールエチルエーテルアセテート、エチレングリコールモノブチルエーテルアセテート、プロピレングリコールエチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート等の多価アルコールのアルキルエーテルアセテート類等を挙げることができる。 Specific examples of the solvent (S) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol monobutyl ether, ethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, Alkyl ethers of polyhydric alcohols such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, diethylene glycol dibutyl ether, diethylene glycol monomethyl ether, triethylene glycol monomethyl ether; ethylene glycol ethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol ethyl ether Le acetate, and alkyl ether acetates of polyhydric alcohol such as propylene glycol monomethyl ether acetate.
これら溶媒(S)の中でも、比較的低粘度であることにより操作性が良いことや、入手が容易であること等の観点から、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、エチレングリコールエチルエーテルアセテート、プロピレングリコールエチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート等が好ましい。 Among these solvents (S), ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, ethylene from the viewpoints of good operability due to relatively low viscosity and easy availability. Glycol diethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethylene glycol ethyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol monomethyl ether acetate and the like are preferable.
上述の好ましい溶媒(S)の中でも、プロピレングリコールの誘導体、又はエチレングリコールの誘導体が更に好ましく、プロピレングリコールモノメチルエーテル(以下、単に「PGME」とも記載する。)、プロピレングリコールモノメチルエーテルアセテート(以下、単に「PGMEA」とも記載する。)が特に好ましい。溶媒(S)は、プロピレングリコールの誘導体、又はエチレングリコールの誘導体を使用することにより、単量体の転化率がより高く、分子量がより大きい重合体を製造することができる。これは、プロピレングリコールの誘導体、又はエチレングリコールの誘導体を使用することで、重合反応中、成長重合体鎖のラジカルが溶媒等の単量体以外の成分へ移動する連鎖移動が起こりにくく、成長重合体鎖のラジカルが失活しにくくなるためであると推測される。 Among the preferable solvents (S) described above, a derivative of propylene glycol or a derivative of ethylene glycol is more preferable, and propylene glycol monomethyl ether (hereinafter also simply referred to as “PGME”), propylene glycol monomethyl ether acetate (hereinafter simply referred to as “PGME”). It is also described as “PGMEA”). By using a propylene glycol derivative or an ethylene glycol derivative as the solvent (S), a polymer having a higher monomer conversion and a higher molecular weight can be produced. This is because by using a propylene glycol derivative or an ethylene glycol derivative, chain transfer in which the radicals of the growing polymer chain move to components other than monomers such as solvents during the polymerization reaction is unlikely to occur. This is presumably because the radicals of the combined chain are less likely to be deactivated.
また、PGMEやPGMEAは、IPAやメチルエチルケトン(以下、単に「MEK」とも記載する。)よりも沸点が高いため、例えば、耐圧装置等の設備を必要とせずに、より高温での重合が可能となり、重合体を大量に製造する場合でも、効率よく製造することができる。また、PGMEやPGMEAは、IPAやMEKより引火点も高いため、より安全に使用することができる。 Further, since PGME and PGMEA have a higher boiling point than IPA and methyl ethyl ketone (hereinafter also simply referred to as “MEK”), for example, polymerization at a higher temperature is possible without requiring equipment such as a pressure device. Even when a polymer is produced in large quantities, it can be produced efficiently. Moreover, since PGME and PGMEA have a flash point higher than IPA and MEK, they can be used more safely.
溶媒成分中の溶媒(S)の配合割合は、30質量%以上であることが好ましく、60質量%以上であることが特に好ましい。溶媒(S)の配合割合を30質量%以上とすることにより、重合反応中、成長重合体鎖のラジカルの失活がより効果的に抑制されることが推測され、転化率を高めることができる。 The blending ratio of the solvent (S) in the solvent component is preferably 30% by mass or more, and particularly preferably 60% by mass or more. By setting the blending ratio of the solvent (S) to 30% by mass or more, it is speculated that radical deactivation of the growing polymer chain is more effectively suppressed during the polymerization reaction, and the conversion rate can be increased. .
1−1−2.その他の溶媒:
溶媒成分に含有される、溶媒(S)以外のその他の溶媒としては、溶媒(S)を含有することによる効果を阻害せず、重合反応を阻害しない溶媒であれば、特に制限なく従来公知の重合溶媒を使用することができる。その他の溶媒の具体例としては、n−ペンタン、n−ヘキサン、n−ヘプタン、n−オクタン、n−ノナン、n−デカン等のアルカン類;シクロヘキサン、シクロヘプタン、シクロオクタン、デカリン、ノルボルナン等のシクロアルカン類;ベンゼン、トルエン、キシレン、エチルベンゼン、クメン等の芳香族炭化水素類;クロロブタン類、ブロモヘキサン類、ジクロロエタン類、ヘキサメチレンジブロミド、クロロベンゼン等のハロゲン化炭化水素類;酢酸エチル、酢酸n−ブチル、酢酸i−ブチル、プロピオン酸メチル等の飽和カルボン酸エステル類;アセトン、2−ブタノン、4−メチル−2−ペンタノン、2−ヘプタノン等のケトン類;テトラヒドロフラン、ジメトキシエタン類、ジエトキシエタン類等のエーテル類;メタノール、エタノール、1−プロパノール、2−プロパノール、4−メチル−2−ペンタノール等のアルコール類等を挙げることができる。これらその他の溶媒は、一種単独で、又は二種以上を組み合わせて用いることができる。
1-1-2. Other solvents:
The other solvent other than the solvent (S) contained in the solvent component is not particularly limited as long as it is a solvent that does not inhibit the effect of containing the solvent (S) and does not inhibit the polymerization reaction. A polymerization solvent can be used. Specific examples of other solvents include alkanes such as n-pentane, n-hexane, n-heptane, n-octane, n-nonane, n-decane; cyclohexane, cycloheptane, cyclooctane, decalin, norbornane, etc. Cycloalkanes; aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene, cumene; halogenated hydrocarbons such as chlorobutanes, bromohexanes, dichloroethanes, hexamethylene dibromide, chlorobenzene; ethyl acetate, acetic acid n Saturated carboxylic acid esters such as butyl, i-butyl acetate and methyl propionate; ketones such as acetone, 2-butanone, 4-methyl-2-pentanone and 2-heptanone; tetrahydrofuran, dimethoxyethanes and diethoxyethane Ethers such as methanol; methanol, Ethanol, 1-propanol, 2-propanol, it may be mentioned alcohols such as 4-methyl-2-pentanol. These other solvents can be used singly or in combination of two or more.
1−2.単量体成分:
本発明の重合体の製造方法において、単量体成分は、単量体(1)を含有するものである。なお、この単量体成分は、以下で説明する単量体(2)〜(4)を更に含有していることが好ましい。また、単量体成分は、単量体(1)〜(4)以外の単量体を更に含有していても良い。
1-2. Monomer component:
In the method for producing a polymer of the present invention, the monomer component contains the monomer (1). In addition, it is preferable that this monomer component further contains the monomers (2)-(4) demonstrated below. The monomer component may further contain a monomer other than the monomers (1) to (4).
1−2−1.単量体(1):
単量体(1)は、下記一般式(1)で表される化合物である。
1-2-1. Monomer (1):
The monomer (1) is a compound represented by the following general formula (1).
上記一般式(1)中、R1は、水素原子、メチル基、又はトリフルオロメチル基を示し、R2は、単結合、或いは炭素数1〜20の直鎖状、分岐状、又は環状の飽和若しくは不飽和の2価の炭化水素基を示し、R3は、水素原子、又は1価の有機基を示し、Rf1は、少なくとも1つの水素原子がフッ素原子置換されたメチレン基、又は少なくとも1つの水素原子がフッ素原子置換された、炭素数2〜20の直鎖状、若しくは分岐状のアルキレン基を示す。但し、R2で示される2価の炭化水素基は、少なくともその一部の水素原子がフッ素原子置換されていても良い。 In the general formula (1), R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and R 2 is a single bond or a linear, branched, or cyclic group having 1 to 20 carbon atoms. A saturated or unsaturated divalent hydrocarbon group, R 3 represents a hydrogen atom or a monovalent organic group, Rf 1 represents a methylene group in which at least one hydrogen atom is substituted with a fluorine atom, or at least A linear or branched alkylene group having 2 to 20 carbon atoms, in which one hydrogen atom is substituted with a fluorine atom. However, in the divalent hydrocarbon group represented by R 2 , at least a part of the hydrogen atoms may be substituted with fluorine atoms.
前記一般式(1)中、R2で示される「炭素数1〜20の直鎖状、分岐状、又は環状の飽和若しくは不飽和の2価の炭化水素基」の具体例としては、メタン、エタン、プロパン、ブタン、2−メチルプロパン、ペンタン、2−メチルブタン、2,2−ジメチルプロパン、ヘキサン、ヘプタン、オクタン、ノナン、デカン等の直鎖状又は分岐状炭化水素;シクロブタン、シクロペンタン、シクロヘキサン、ビシクロ[2.2.1]ヘプタン、ビシクロ[2.2.2]オクタン、トリシクロ[5.2.1.02,6]デカン、トリシクロ[3.3.1.13,7]デカン等の脂環式炭化水素;ベンゼン、ナフタレン等の芳香族炭化水素等から水素原子を2個脱離させた2価の基等を挙げることができる。 In the general formula (1), specific examples of the “linear, branched, or cyclic saturated or unsaturated divalent hydrocarbon group having 1 to 20 carbon atoms” represented by R 2 include methane, Linear or branched hydrocarbons such as ethane, propane, butane, 2-methylpropane, pentane, 2-methylbutane, 2,2-dimethylpropane, hexane, heptane, octane, nonane, decane; cyclobutane, cyclopentane, cyclohexane , Bicyclo [2.2.1] heptane, bicyclo [2.2.2] octane, tricyclo [5.2.1.0 2,6 ] decane, tricyclo [3.3.1.1 3,7 ] decane And alicyclic hydrocarbons such as divalent groups obtained by removing two hydrogen atoms from aromatic hydrocarbons such as benzene and naphthalene.
また、上述のR2で示される「炭素数1〜20の直鎖状、分岐状、又は環状の飽和若しくは不飽和の2価の炭化水素基」は、少なくともその一部の水素原子がフッ素原子置換されていても良い。 In addition, the “straight, branched, or cyclic saturated or unsaturated divalent hydrocarbon group having 1 to 20 carbon atoms” represented by R 2 described above is such that at least part of the hydrogen atoms are fluorine atoms. It may be replaced.
前記一般式(1)中、R3で示される「1価の有機基」としては、例えば、炭素数1〜30の1価の炭化水素基、酸解離性基、アルカリ解離性基等を挙げることができる。 In the general formula (1), examples of the “monovalent organic group” represented by R 3 include a monovalent hydrocarbon group having 1 to 30 carbon atoms, an acid dissociable group, and an alkali dissociable group. be able to.
〔炭素数1〜30の1価の炭化水素基〕
炭素数1〜30の1価の炭化水素基としては、例えば、炭素数1〜10の直鎖状又は分岐状の1価の炭化水素基、炭素数3〜30の1価の環状炭化水素基等を挙げることができる。
[Monovalent hydrocarbon group having 1 to 30 carbon atoms]
Examples of the monovalent hydrocarbon group having 1 to 30 carbon atoms include, for example, a linear or branched monovalent hydrocarbon group having 1 to 10 carbon atoms and a monovalent cyclic hydrocarbon group having 3 to 30 carbon atoms. Etc.
〔酸解離性基〕
酸解離性基としては、例えば、ヒドロキシル基、カルボキシル基等の極性官能基の水素原子を置換する基であって、酸の存在下で解離する基であれば、特に制限なく従来公知の酸解離性基を適用することができる。
[Acid-dissociable group]
As the acid dissociable group, for example, a group that substitutes a hydrogen atom of a polar functional group such as a hydroxyl group or a carboxyl group, and is a group that dissociates in the presence of an acid. Sex groups can be applied.
酸解離性基の具体例としては、t−ブトキシカルボニル基、テトラヒドロピラニル基、テトラヒドロフラニル基、(チオテトラヒドロピラニルスルファニル)メチル基、(チオテトラヒドロフラニルスルファニル)メチル基、アルコキシメチル基、アルキルスルファニルメチル基等を挙げることができる。なお、アルコキシメチル基中のアルコキシ基としては、例えば、炭素数1〜4のアルコキシ基を挙げることができる。また、アルキルスルファニルメチル基中のアルキル基としては、例えば、炭素数1〜4のアルキル基を挙げることができる。 Specific examples of the acid dissociable group include t-butoxycarbonyl group, tetrahydropyranyl group, tetrahydrofuranyl group, (thiotetrahydropyranylsulfanyl) methyl group, (thiotetrahydrofuranylsulfanyl) methyl group, alkoxymethyl group, alkylsulfanyl. A methyl group etc. can be mentioned. In addition, as an alkoxy group in an alkoxymethyl group, a C1-C4 alkoxy group can be mentioned, for example. Moreover, as an alkyl group in an alkylsulfanylmethyl group, a C1-C4 alkyl group can be mentioned, for example.
上述の酸解離性基の他に、酸解離性基として、下記一般式(1a−1)で表される基を、更に挙げることができる。 In addition to the acid dissociable group described above, examples of the acid dissociable group further include a group represented by the following general formula (1a-1).
上記一般式(1a−1)中、3つのR22は、それぞれ独立に、炭素数1〜4の直鎖状若しくは分岐状のアルキル基、又は炭素数4〜20の1価の脂環式炭化水素基若しくはそれから誘導される基を示すか、或いは、いずれか2つのR22が相互に結合し、炭素数4〜20の炭化水素環若しくはそれから誘導される環を形成し、残りの1つのR22が、炭素数1〜4の直鎖状若しくは分岐状のアルキル基、又は炭素数4〜20の1価の脂環式炭化水素基若しくはそれから誘導される基を示す。 In the general formula (1a-1), three R 22 s are each independently a linear or branched alkyl group having 1 to 4 carbon atoms, or a monovalent alicyclic carbonization having 4 to 20 carbon atoms. A hydrogen group or a group derived therefrom, or any two R 22 's bonded to each other to form a hydrocarbon ring having 4 to 20 carbon atoms or a ring derived therefrom, and the remaining one R 22 represents a linear or branched alkyl group having 1 to 4 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a group derived therefrom.
前記一般式(1a−1)中、R22で示される、「炭素数1〜4の直鎖状若しくは分岐状のアルキル基」の具体例としては、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、2−メチルプロピル基、1−メチルプロピル基、t−ブチル基等を挙げることができる。 Specific examples of the “linear or branched alkyl group having 1 to 4 carbon atoms” represented by R 22 in the general formula (1a-1) include a methyl group, an ethyl group, an n-propyl group, Examples include i-propyl group, n-butyl group, 2-methylpropyl group, 1-methylpropyl group, t-butyl group and the like.
前記一般式(1a−1)中、R22で示される、「炭素数4〜20の1価の脂環式炭化水素基」の具体例としては、ノルボルナン、トリシクロデカン、テトラシクロドデカン、アダマンタンや、シクロブタン、シクロペンタン、シクロヘキサン、シクロヘプタン、シクロオクタン等のシクロアルカン類等に由来する脂環族環からなる基等を挙げることができる。これらの中でも、ノルボルナン、トリシクロデカン、テトラシクロドデカン、アダマンタンや、シクロペンタン又はシクロヘキサンに由来する脂環族環からなる基等が好ましい。 Specific examples of the “monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms” represented by R 22 in the general formula (1a-1) include norbornane, tricyclodecane, tetracyclododecane, and adamantane. And groups composed of alicyclic rings derived from cycloalkanes such as cyclobutane, cyclopentane, cyclohexane, cycloheptane, and cyclooctane. Among these, norbornane, tricyclodecane, tetracyclododecane, adamantane, a group composed of an alicyclic ring derived from cyclopentane or cyclohexane, and the like are preferable.
前記一般式(1a−1)中、R22で示される、「脂環式炭化水素基から誘導される基」としては、例えば、上述の脂環式炭化水素基の少なくとも1つの水素原子を、炭素数1〜4の直鎖状、分岐状、又は環状のアルキル基(以下、「置換基」とも記載する)のうち1種以上で置換した基等を挙げることができる。なお、炭素数1〜4の直鎖状、分岐状、又は環状のアルキル基の具体例としては、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、2−メチルプロピル基、1−メチルプロピル基、t−ブチル基等を挙げることができる。 In the general formula (1a-1), as the “group derived from an alicyclic hydrocarbon group” represented by R 22 , for example, at least one hydrogen atom of the alicyclic hydrocarbon group described above, Examples include a group substituted with one or more of linear, branched or cyclic alkyl groups having 1 to 4 carbon atoms (hereinafter also referred to as “substituents”). Specific examples of the linear, branched, or cyclic alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, 2-methyl group. A propyl group, a 1-methylpropyl group, a t-butyl group, etc. can be mentioned.
前記一般式(1a−1)中、「いずれか2つのR22が相互に結合して形成される、炭素数4〜20の炭化水素環」の具体例としては、シクロブタン、シクロペンタン、シクロヘキサン、シクロオクタン等の単環式炭化水素環;ノルボルナン、トリシクロデカン、テトラシクロドデカン等の多環式炭化水素環;アダマンタン等の架橋多環式炭化水素環等を挙げることができる。これらの中でも、シクロペンタン、シクロヘキサン等の単環式炭化水素環が好ましい。 In the general formula (1a-1), specific examples of “a hydrocarbon ring having 4 to 20 carbon atoms formed by bonding any two R 22 s” to each other include cyclobutane, cyclopentane, cyclohexane, Examples thereof include monocyclic hydrocarbon rings such as cyclooctane; polycyclic hydrocarbon rings such as norbornane, tricyclodecane and tetracyclododecane; bridged polycyclic hydrocarbon rings such as adamantane and the like. Among these, monocyclic hydrocarbon rings such as cyclopentane and cyclohexane are preferable.
前記一般式(1a−1)中、「いずれか2つのR22が相互に結合して形成される、炭素数4〜20の炭化水素環から誘導される環」としては、例えば、上述の炭化水素環の少なくとも1つの水素原子を、前述の置換基のうち1種以上で置換した基等を挙げることができる。 In the general formula (1a-1), examples of the “ring derived from a hydrocarbon ring having 4 to 20 carbon atoms formed by bonding any two R 22 s ” include the carbonization described above. Examples include a group in which at least one hydrogen atom of the hydrogen ring is substituted with one or more of the aforementioned substituents.
前記一般式(1a−1)で表される酸解離性基の好適例としては、t−ブチル基、1−(1−エチル−1−メチル)プロピル基、1−(1,1−ジメチル)プロピル基、1−n−(1,1−ジメチル)ブチル基、1−n−(1,1−ジメチル)ペンチル基、1−n−(1,1−ジエチル)プロピル基、1−n−(1,1−ジエチル)ブチル基、1−n−(1,1−ジエチル)ペンチル基、1−(1−メチル)シクロペンチル基、1−(1−エチル)シクロペンチル基、1−(1−n−プロピル)シクロペンチル基、1−(1−i−プロピル)シクロペンチル基、1−(1−メチル)シクロヘキシル基、1−(1−エチル)シクロヘキシル基、1−(1−n−プロピル)シクロヘキシル基、1−(1−i−プロピル)シクロヘキシル基、1−(1−メチル−1−(2−ノルボニル))エチル基、1−(1−メチル−1−(2−テトラシクロデカニル))エチル基、1−(1−メチル−1−(1−アダマンチル))エチル基、2−(2−メチル)ノルボニル基、2−(2−エチル)ノルボニル基、2−(2−n−プロピル)ノルボニル基、2−(2−i−プロピル)ノルボニル基、2−(2−メチル)テトラシクロデカニル基、2−(2−エチル)テトラシクロデカニル基、2−(2−n−プロピル)テトラシクロデカニル基、2−(2−i−プロピル)テトラシクロデカニル基、1−(1−メチル)アダマンチル基、1−(1−エチル)アダマンチル基、1−(1−n−プロピル)アダマンチル基、1−(1−i−プロピル)アダマンチル基や、これらの脂環族環からなる基の少なくとも1つの水素原子を、置換基の1種以上で置換した基等を挙げることができる。 Preferable examples of the acid dissociable group represented by the general formula (1a-1) include t-butyl group, 1- (1-ethyl-1-methyl) propyl group, 1- (1,1-dimethyl) Propyl group, 1-n- (1,1-dimethyl) butyl group, 1-n- (1,1-dimethyl) pentyl group, 1-n- (1,1-diethyl) propyl group, 1-n- ( 1,1-diethyl) butyl group, 1-n- (1,1-diethyl) pentyl group, 1- (1-methyl) cyclopentyl group, 1- (1-ethyl) cyclopentyl group, 1- (1-n- Propyl) cyclopentyl group, 1- (1-i-propyl) cyclopentyl group, 1- (1-methyl) cyclohexyl group, 1- (1-ethyl) cyclohexyl group, 1- (1-n-propyl) cyclohexyl group, 1 -(1-i-propyl) cyclohexyl group, 1- ( -Methyl-1- (2-norbornyl)) ethyl group, 1- (1-methyl-1- (2-tetracyclodecanyl)) ethyl group, 1- (1-methyl-1- (1-adamantyl)) Ethyl, 2- (2-methyl) norbornyl, 2- (2-ethyl) norbornyl, 2- (2-n-propyl) norbornyl, 2- (2-i-propyl) norbornyl, 2- ( 2-methyl) tetracyclodecanyl group, 2- (2-ethyl) tetracyclodecanyl group, 2- (2-n-propyl) tetracyclodecanyl group, 2- (2-i-propyl) tetracyclodecane Nyl group, 1- (1-methyl) adamantyl group, 1- (1-ethyl) adamantyl group, 1- (1-n-propyl) adamantyl group, 1- (1-i-propyl) adamantyl group, and these Fewer groups consisting of alicyclic rings Even of one hydrogen atom, it can be a group such as substituted with one or more substituents.
酸解離性基としては、上述の酸解離性基の中でも、前記一般式(1a−1)で表される基、t−ブトキシカルボニル基、アルコキシメチル基等が好ましく、前記一般式(1a−1)で表される基が特に好ましい。重合体がこのような酸解離性基を含有することで、露光部の重合体の現像液への溶解性を向上させることができる。 As the acid dissociable group, among the above acid dissociable groups, a group represented by the general formula (1a-1), a t-butoxycarbonyl group, an alkoxymethyl group, and the like are preferable, and the general formula (1a-1) is preferable. ) Is particularly preferred. When the polymer contains such an acid dissociable group, the solubility of the polymer in the exposed portion in the developer can be improved.
〔アルカリ解離性基〕
アルカリ解離性基としては、例えば、ヒドロキシル基、カルボキシル基等の極性官能基の水素原子を置換する基であって、アルカリの存在下で解離する基であれば、特に制限なく従来公知のアルカリ解離性基を適用することができる。
[Alkali dissociable group]
The alkali-dissociable group is, for example, a group that substitutes a hydrogen atom of a polar functional group such as a hydroxyl group or a carboxyl group, and is a group that dissociates in the presence of an alkali. Sex groups can be applied.
アルカリ解離性基としては、例えば、下記一般式(1b−1)〜(1b−3)でそれぞれ表されるアルカリ解離性基(1b−1)〜(1b−3)を挙げることができる。 Examples of the alkali dissociable groups include alkali dissociable groups (1b-1) to (1b-3) represented by the following general formulas (1b-1) to (1b-3), respectively.
上記一般式(1b−1)及び(1b−2)中、R23は、ハロゲン原子、又は炭素数1〜10の、アルキル基、アルコキシ基、アシル基、若しくはアシロキシ基を示す。上記一般式(1b−1)中、pは0〜5の整数を示す。上記一般式(1b−2)中、qは0〜4の整数を示す。上記一般式(1b−3)中、2つのR24は、それぞれ独立に、水素原子、又は炭素数1〜10のアルキル基を示すか、或いは、2つのR24が相互に結合して形成される炭素数4〜20の2価の脂環式炭化水素基を示す。 In the general formulas (1b-1) and (1b-2), R 23 represents a halogen atom or an alkyl group, alkoxy group, acyl group, or acyloxy group having 1 to 10 carbon atoms. In the general formula (1b-1), p represents an integer of 0 to 5. In the general formula (1b-2), q represents an integer of 0 to 4. In the general formula (1b-3), two R 24 s each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, or two R 24s are bonded to each other. A divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms.
前記一般式(1b−1)及び(1b−2)中、R23で示される「ハロゲン原子」の具体例としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等を挙げることができる。また、アルカリ解離性基は、R23がこれらハロゲン原子の中でも電子吸引性に優れるフッ素原子であることにより、アルカリ存在下での解離が容易となると推測することができる。 In the general formulas (1b-1) and (1b-2), specific examples of the “halogen atom” represented by R 23 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Further, it can be assumed that the alkali dissociable group is easily dissociated in the presence of an alkali when R 23 is a fluorine atom having excellent electron withdrawing property among these halogen atoms.
前記一般式(1b−1)及び(1b−2)中、R23で示される「炭素数1〜10のアルキル基」の具体例としては、メチル基、エチル基、1−プロピル基、2−プロピル基、1−ブチル基、2−ブチル基、2−(2−メチルプロピル)基、1−ペンチル基、2−ペンチル基、3−ペンチル基、1−(2−メチルブチル)基、1−(3−メチルブチル)基、2−(2−メチルブチル)基、2−(3−メチルブチル)基、ネオペンチル基、1−ヘキシル基、2−ヘキシル基、3−ヘキシル基、1−(2−メチルペンチル)基、1−(3−メチルペンチル)基、1−(4−メチルペンチル)基、2−(2−メチルペンチル)基、2−(3−メチルペンチル)基、2−(4−メチルペンチル)基、3−(2−メチルペンチル)基、3−(3−メチルペンチル)基等を挙げることができる。 In the general formulas (1b-1) and (1b-2), specific examples of the “alkyl group having 1 to 10 carbon atoms” represented by R 23 include a methyl group, an ethyl group, a 1-propyl group, 2- Propyl group, 1-butyl group, 2-butyl group, 2- (2-methylpropyl) group, 1-pentyl group, 2-pentyl group, 3-pentyl group, 1- (2-methylbutyl) group, 1- ( 3-methylbutyl) group, 2- (2-methylbutyl) group, 2- (3-methylbutyl) group, neopentyl group, 1-hexyl group, 2-hexyl group, 3-hexyl group, 1- (2-methylpentyl) Group, 1- (3-methylpentyl) group, 1- (4-methylpentyl) group, 2- (2-methylpentyl) group, 2- (3-methylpentyl) group, 2- (4-methylpentyl) Group, 3- (2-methylpentyl) group, 3- (3-methyl Pentyl) group and the like.
前記一般式(1b−1)及び(1b−2)中、R23で示される「炭素数1〜10のアルコキシ基」の具体例としては、メトキシ基、エトキシ基、n−ブトキシ基、t−ブトキシ基、プロポキシ基、イソプロポキシ基等を挙げることができる。 In the general formulas (1b-1) and (1b-2), specific examples of the “alkoxy group having 1 to 10 carbon atoms” represented by R 23 include a methoxy group, an ethoxy group, an n-butoxy group, t- A butoxy group, a propoxy group, an isopropoxy group, etc. can be mentioned.
前記一般式(1b−1)及び(1b−2)中、R23で示される「炭素数1〜10のアシル基」の具体例としては、アセチル基、エチルカルボニル基、プロピルカルボニル基等を挙げることができる。 Specific examples of the “acyl group having 1 to 10 carbon atoms” represented by R 23 in the general formulas (1b-1) and (1b-2) include an acetyl group, an ethylcarbonyl group, and a propylcarbonyl group. be able to.
前記一般式(1b−1)及び(1b−2)中、R23で示される「炭素数1〜10のアシロキシ基」の具体例としては、アセトキシ基、エチリルオキシ基、ブチリルオキシ基、t−ブチリルオキシ基、t−アミリルオキシ基、n−ヘキサンカルボニロキシ基、n−オクタンカルボニロキシ基等を挙げることができる。 In the general formulas (1b-1) and (1b-2), specific examples of the “acyloxy group having 1 to 10 carbon atoms” represented by R 23 include an acetoxy group, an ethylyloxy group, a butyryloxy group, and a t-butyryloxy group. , T-amylyloxy group, n-hexane carbonyloxy group, n-octane carbonyloxy group and the like.
前記一般式(1b−3)中、R24で示される「炭素数1〜10のアルキル基」の具体例としては、前述の前記一般式(1b−1)及び(1b−2)中のR23で示される炭素数1〜10のアルキル基と同様のものを挙げることができる。 Specific examples of the “alkyl group having 1 to 10 carbon atoms” represented by R 24 in the general formula (1b-3) include R in the general formulas (1b-1) and (1b-2) described above. The same thing as the C1-C10 alkyl group shown by 23 can be mentioned.
前記一般式(1b−3)中、2つのR24で示される、「2つのR24が相互に結合して形成される炭素数4〜20の2価の脂環式炭化水素基」の具体例としては、シクロペンチル基、シクロペンチルメチル基、1−(1−シクロペンチルエチル)基、1−(2−シクロペンチルエチル)基、シクロヘキシル基、シクロヘキシルメチル基、1−(1−シクロヘキシルエチル)基、1−(2−シクロヘキシルエチル基)、シクロヘプチル基、シクロヘプチルメチル基、1−(1−シクロヘプチルエチル)基、1−(2−シクロヘプチルエチル)基、2−ノルボルニル基等を挙げることができる。 Specific examples of “a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms formed by bonding two R 24 s ” represented by two R 24 in the general formula (1b-3) ” Examples include cyclopentyl group, cyclopentylmethyl group, 1- (1-cyclopentylethyl) group, 1- (2-cyclopentylethyl) group, cyclohexyl group, cyclohexylmethyl group, 1- (1-cyclohexylethyl) group, 1- (2-cyclohexylethyl group), cycloheptyl group, cycloheptylmethyl group, 1- (1-cycloheptylethyl) group, 1- (2-cycloheptylethyl) group, 2-norbornyl group and the like.
アルカリ解離性基(1b−3)の具体例としては、メチル基、エチル基、1−プロピル基、2−プロピル基、1−ブチル基、2−ブチル基、1−ペンチル基、2−ペンチル基、3−ペンチル基、1−(2−メチルブチル)基、1−(3−メチルブチル)基、2−(3−メチルブチル)基、ネオペンチル基、1−ヘキシル基、2−ヘキシル基、3−ヘキシル基、1−(2−メチルペンチル)基、1−(3−メチルペンチル)基、1−(4−メチルペンチル)基、2−(3−メチルペンチル)基、2−(4−メチルペンチル)基、3−(2−メチルペンチル)基等を挙げることができる。これらの中でも、メチル基、エチル基、1−プロピル基、2−プロピル基、1−ブチル基、2−ブチル基が好ましい。 Specific examples of the alkali dissociable group (1b-3) include a methyl group, an ethyl group, a 1-propyl group, a 2-propyl group, a 1-butyl group, a 2-butyl group, a 1-pentyl group, and a 2-pentyl group. 3-pentyl group, 1- (2-methylbutyl) group, 1- (3-methylbutyl) group, 2- (3-methylbutyl) group, neopentyl group, 1-hexyl group, 2-hexyl group, 3-hexyl group 1- (2-methylpentyl) group, 1- (3-methylpentyl) group, 1- (4-methylpentyl) group, 2- (3-methylpentyl) group, 2- (4-methylpentyl) group , 3- (2-methylpentyl) group and the like. Among these, a methyl group, an ethyl group, a 1-propyl group, a 2-propyl group, a 1-butyl group, and a 2-butyl group are preferable.
重合体はこのようなアルカリ解離性基を有する繰り返し単位を含有することにより、現像時の現像液に対する親和性を向上させることができる。 By containing the repeating unit having such an alkali dissociable group, the polymer can improve the affinity for the developer during development.
なお、上述した「炭素数1〜30の1価の炭化水素基」、「酸解離性基」、及び「アルカリ解離性基」は、レジストに含有される感放射線性酸発生剤の種類、現像液の種類、重合反応の条件等により、それぞれ適宜選択することができる。 The above-mentioned “monovalent hydrocarbon group having 1 to 30 carbon atoms”, “acid-dissociable group”, and “alkali-dissociable group” are the types of radiation-sensitive acid generators contained in the resist, and development. Each can be appropriately selected depending on the type of the liquid, the conditions of the polymerization reaction, and the like.
前記一般式(1)中、Rf1で示される「少なくとも1つの水素原子がフッ素原子置換されたメチレン基、又は少なくとも1つの水素原子がフッ素原子置換された、炭素数2〜20の直鎖状、若しくは分岐状のアルキレン基」の具体例としては、下記式(1c−1)〜(1c−11)で表される基等を挙げることができる。 In the general formula (1), represented by Rf 1 "a methylene group in which at least one hydrogen atom is substituted with a fluorine atom, or a straight chain having 2 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom" Specific examples of “or a branched alkylene group” include groups represented by the following formulas (1c-1) to (1c-11).
これらの中でも、上記式(1c−1)〜(1c−4)、又は(1c−8)で表される基が好ましく、上記式(1c−3)、(1c−4)、又は(1c−8)で表される気が更に好ましく、上記式(1c−4)で表される基が特に好ましい。 Among these, groups represented by the above formulas (1c-1) to (1c-4) or (1c-8) are preferable, and the above formulas (1c-3), (1c-4), or (1c- 8) is more preferable, and the group represented by the above formula (1c-4) is particularly preferable.
単量体(1)は、下記一般式(1−1)で表される単量体であることが好ましい。 The monomer (1) is preferably a monomer represented by the following general formula (1-1).
上記一般式(1−1)中、R18及びR20は、それぞれ独立に、フッ素原子、メチル基、又はトリフルオロメチル基を示し、R21は、水素原子、又は1価の有機基を示し、2つのR19は、それぞれ独立に、水素原子、メチル基、エチル基、プロピル基、ブチル基、シクロペンチル基、シクロヘキシル基、ノルボルニル基、アダマンチル基、トリフルオロメチル基、2,2,2−トリフルオロエチル基、1−トリフルオロメチルエチル基、又は3,3,3−トリフルオロプロピル基を示す。但し、2つのR19が相互に結合して、シクロペンチレン基、シクロヘキシレン基、又はシクロヘプチレン基を形成していても良い。 In the general formula (1-1), R 18 and R 20 each independently represent a fluorine atom, a methyl group, or a trifluoromethyl group, and R 21 represents a hydrogen atom or a monovalent organic group. Two R 19 s independently represent a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, a cyclopentyl group, a cyclohexyl group, a norbornyl group, an adamantyl group, a trifluoromethyl group, 2,2,2-trimethyl. A fluoroethyl group, a 1-trifluoromethylethyl group, or a 3,3,3-trifluoropropyl group is shown. However, two R 19 may be bonded to each other to form a cyclopentylene group, a cyclohexylene group, or a cycloheptylene group.
前記一般式(1−1)中、R21は、前記一般式(1)におけるR3と同義である。 In the general formula (1-1), R 21 has the same meaning as R 3 in the general formula (1).
単量体(1)は、下記式(1−1−1)〜(1−1−6)で表される単量体であることが特に好ましい。 The monomer (1) is particularly preferably a monomer represented by the following formulas (1-1-1) to (1-1-6).
単量体(1)は、例えば、アルカリ解離性基を有する場合、下記一般式(1A−1)で表される化合物と、下記一般式(1B−1)〜(1B−3)で表される化合物のいずれかと、を反応させることによって合成することができる。 For example, when the monomer (1) has an alkali dissociable group, it is represented by the compound represented by the following general formula (1A-1) and the following general formulas (1B-1) to (1B-3). It can be synthesized by reacting with any of the compounds.
上記一般式(1A−1)中、X1は、水酸基、又はハロゲン原子を示す。上記一般式(1B−1)中、X2は、ハロゲン原子を示し、塩素原子であることが好ましい。上記一般式(1B−2)中、X3は、ハロゲン原子を示し、臭素原子であることが好ましい。なお、上記一般式(1A−1)中のR1、R2、及びRf1は、前記一般式(1)中の、R1、R2、及びRf1と、上記一般式(1B−1)及び(1B−2)中のR23は、前記一般式(1b−1)及び(1b−2)中のR23と、上記一般式(1B−1)中のpは、前記一般式(1b−1)中のpと、上記一般式(1B−2)中のqは、前記一般式(1b−2)中のqと、上記一般式(1B−3)中のR24は、前記一般式(1b−3)のR24と、それぞれ同義である。 In the general formula (1A-1), X 1 represents a hydroxyl group or a halogen atom. In the general formula (1B-1), X 2 represents a halogen atom and is preferably a chlorine atom. In the general formula (1B-2), X 3 represents a halogen atom, and is preferably a bromine atom. Incidentally, R 1, R 2, and Rf 1 in the general formula (1A-1) is of the general formula (1), R 1, R 2, and the Rf 1, the general formula (1B-1 ) and (R 23 a 1B-2) in the said general formula (1b-1) and (1b-2) in R 23, p in the general formula (1B-1), the general formula ( P in 1b-1), q in the general formula (1B-2), q in the general formula (1b-2), and R 24 in the general formula (1B-3) are R 24 in formula (1b-3) has the same meaning as R 24 .
単量体(1)は、上述の合成方法の他にも、下記一般式(1C−1)で表される化合物と、下記一般式(1D−1)で表される化合物と、を反応させることによっても合成することができる。 In addition to the synthesis method described above, the monomer (1) reacts a compound represented by the following general formula (1C-1) with a compound represented by the following general formula (1D-1) Can also be synthesized.
上記一般式(1C−1)中、X4は、水酸基、又はハロゲン原子を示す。なお、上記一般式(1C−1)中のR1、並びに上記一般式(1D−1)中のR2、R3、及びRf1は、それぞれ前記一般式(1)中のR1、R2、R3、及びRf1と同義である。 In the general formula (1C-1), X 4 represents a hydroxyl group or a halogen atom. Note that R 1 in the general formula (1C-1) and R 2 , R 3 , and Rf 1 in the general formula (1D-1) are R 1 , R in the general formula (1), respectively. 2 , R 3 , and Rf 1 .
重合体中、単量体(1)に由来する繰り返し単位の含有割合は、全繰り返し単位の合計100mol%に対して、20〜90mol%であることが好ましく、20〜80mol%であることが更に好ましく、20〜70mol%であることが特に好ましい。単量体(1)に由来する繰り返し単位の含有割合が20〜90mol%であると、レジスト被膜の撥水性を向上させ、水切れを良好にすることができる。 In the polymer, the content of the repeating units derived from the monomer (1) is preferably 20 to 90 mol%, more preferably 20 to 80 mol%, based on 100 mol% in total of all repeating units. It is preferably 20 to 70 mol%, particularly preferably. When the content ratio of the repeating unit derived from the monomer (1) is 20 to 90 mol%, the water repellency of the resist film can be improved and water drainage can be improved.
1−2−2.単量体(2):
単量体(2)は、下記一般式(2)で表される単量体である。
1-2-2. Monomer (2):
The monomer (2) is a monomer represented by the following general formula (2).
上記一般式(2)中、R7は、水素原子、メチル基、トリフルオロメチル基、又はヒドロキシメチル基を示し、3つのR8は、それぞれ独立に、炭素数1〜4の直鎖状若しくは分岐状のアルキル基、又は炭素数4〜20の1価の脂環式炭化水素基若しくはそれから誘導される基を示すか、或いは、いずれか2つのR8が相互に結合し、炭素数4〜20の炭化水素環若しくはそれから誘導される環を形成し、残りの1つのR8が、炭素数1〜4の直鎖状若しくは分岐状のアルキル基、又は炭素数4〜20の1価の脂環式炭化水素基若しくはそれから誘導される基を示す。 In the general formula (2), R 7 represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group, and three R 8 are each independently a straight chain having 1 to 4 carbon atoms or A branched alkyl group, or a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a group derived therefrom, or any two R 8 's bonded to each other, 20 hydrocarbon rings or a ring derived therefrom, and the remaining one R 8 is a linear or branched alkyl group having 1 to 4 carbon atoms, or a monovalent fat having 4 to 20 carbon atoms A cyclic hydrocarbon group or a group derived therefrom is shown.
前記一般式(2)中のR8と前記一般式(1a−1)中のR22は同義であり、[−C(R8)3]で表される基は、前記一般式(1a−1)で表される酸解離性基と同様の説明をすることができる。 R 8 in the general formula (2) and R 22 in the general formula (1a-1) have the same meaning, and the group represented by [—C (R 8 ) 3 ] represents the general formula (1a- The same explanation as the acid dissociable group represented by 1) can be made.
単量体(2)は、下記一般式(2−1)で表される単量体(2−1)であることが好ましい。 The monomer (2) is preferably a monomer (2-1) represented by the following general formula (2-1).
上記一般式(2−1)中、R9は、水素原子、メチル基、トリフルオロメチル基、又はヒドロキシメチル基を示し、R10は、炭素数1〜4の直鎖状又は分岐状のアルキル基を示し、kは、1〜4の整数を示す。 In the general formula (2-1), R 9 represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group, and R 10 is a linear or branched alkyl having 1 to 4 carbon atoms. Represents a group, and k represents an integer of 1 to 4.
前記一般式中、R10で示される「炭素数1〜4の直鎖状又は分岐状のアルキル基」の具体例としては、前記一般式(1a−1)中のR22で示される「炭素数1〜4の直鎖状又は分岐状のアルキル基」と同様のものを挙げることができる。 Specific examples of the “linear or branched alkyl group having 1 to 4 carbon atoms” represented by R 10 in the general formula include “carbon represented by R 22 in the general formula (1a-1)”. Examples thereof are the same as those in the linear or branched alkyl group of formulas 1 to 4.
重合体中、単量体(2)に由来する繰り返し単位の含有割合は、全繰り返し単位の合計100mol%に対して、通常、80mol%以下であり、20〜80mol%であることが好ましく、30〜70mol%であることが更に好ましい。 In the polymer, the content of the repeating unit derived from the monomer (2) is usually 80 mol% or less and preferably 20 to 80 mol% with respect to 100 mol% in total of all repeating units, More preferably, it is -70 mol%.
1−2−3.単量体(3):
単量体(3)としては、アルカリ可溶性基を有し、且つ、単量体(1)以外の単量体であれば、特に制限なく従来公知のアルカリ可溶性基を有する単量体を使用することができる。
1-2-3. Monomer (3):
As the monomer (3), any conventionally known monomer having an alkali-soluble group is used without particular limitation as long as it has an alkali-soluble group and is a monomer other than the monomer (1). be able to.
単量体(3)は、下記一般式(3a)で表される基、下記一般式(3b)で表される基、及び下記式(3c)で表される基からなる群より選択される少なくとも1種のアルカリ可溶性基を有する単量体であることが好ましい。 The monomer (3) is selected from the group consisting of a group represented by the following general formula (3a), a group represented by the following general formula (3b), and a group represented by the following formula (3c). A monomer having at least one alkali-soluble group is preferred.
上記一般式(3a)中、Rf2は、少なくとも1つの水素原子がフッ素原子置換された炭素数1〜10の炭化水素基を示し、上記一般式(3b)中、Rf3は、少なくとも1つの水素原子がフッ素原子置換された、メチレン基又は炭素数2〜20のアルキレン基を示す。 In the general formula (3a), Rf 2 represents a C 1-10 hydrocarbon group in which at least one hydrogen atom is substituted with a fluorine atom. In the general formula (3b), Rf 3 represents at least one A methylene group or an alkylene group having 2 to 20 carbon atoms in which a hydrogen atom is substituted with a fluorine atom
前記一般式(3a)中、Rf2で示される「少なくとも1つの水素原子がフッ素原子置換された炭素数1〜10の炭化水素基」の具体例としては、トリフルオロメチル基等が好ましい。 In the general formula (3a), as a specific example of “a hydrocarbon group having 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom” represented by Rf 2 , a trifluoromethyl group or the like is preferable.
前記一般式(3b)中、Rf3で示される「少なくとも1つの水素原子がフッ素原子置換された、メチレン基又は炭素数2〜20のアルキレン基」の具体例としては、下記式(3b−1)〜(3b−8)で表される基等を挙げることができる。 In the general formula (3b), specific examples of the “methylene group or alkylene group having 2 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom” represented by Rf 3 include the following formula (3b-1 ) To (3b-8).
単量体(3)は、レジスト被膜の撥水性の確保と、現像液に対する親和性との両立との観点から、下記一般式(3−1)で表される単量体であることが好ましい。 The monomer (3) is preferably a monomer represented by the following general formula (3-1) from the viewpoint of ensuring water repellency of the resist film and compatibility with the developer. .
上記一般式(3−1)中、R11は、水素原子、炭素数1〜4のアルキル基、トリフルオロメチル基、又はヒドロキシメチル基を示し、R12は、2価の有機基を示す。 In General Formula (3-1), R 11 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a trifluoromethyl group, or a hydroxymethyl group, and R 12 represents a divalent organic group.
前記一般式(3−1)中、R11で示される「炭素数1〜4のアルキル基」の具体例としては、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、t−ブチル基等を挙げることができる。 Specific examples of the “alkyl group having 1 to 4 carbon atoms” represented by R 11 in the general formula (3-1) include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, and n-butyl. Group, i-butyl group, t-butyl group and the like.
前記一般式(3−1)中、R12で示される「2価の有機基」としては、炭素数1〜20の炭化水素基を挙げることができる。その具体例としては、メタン、エタン、プロパン、ブタン、2−メチルプロパン、ペンタン、2−メチルブタン、2,2−ジメチルプロパン、ヘキサン、ヘプタン、オクタン、ノナン、デカン等の直鎖状又は分岐状炭化水素;シクロブタン、シクロペンタン、シクロヘキサン、ビシクロ[2.2.1]ヘプタン、ビシクロ[2.2.2]オクタン、トリシクロ[5.2.1.02,6]デカン、トリシクロ[3.3.1.13,7]デカン等の脂環式炭化水素;ベンゼン、ナフタレン等の芳香族炭化水素等から水素原子を2個脱離させた2価の基等を挙げることができる。なお、これらの炭化水素基は、酸素原子、硫黄原子、イミノ基、カルボニル基、カルボニルオキシ基、又はアミド基を有していてもよい。 In the general formula (3-1), examples of the “divalent organic group” represented by R 12 include hydrocarbon groups having 1 to 20 carbon atoms. Specific examples thereof include linear or branched carbonization such as methane, ethane, propane, butane, 2-methylpropane, pentane, 2-methylbutane, 2,2-dimethylpropane, hexane, heptane, octane, nonane and decane. Hydrogen: cyclobutane, cyclopentane, cyclohexane, bicyclo [2.2.1] heptane, bicyclo [2.2.2] octane, tricyclo [5.2.1.0 2,6 ] decane, tricyclo [3.3. 1.1,7 ] alicyclic hydrocarbons such as decane; divalent groups obtained by removing two hydrogen atoms from aromatic hydrocarbons such as benzene and naphthalene. Note that these hydrocarbon groups may have an oxygen atom, a sulfur atom, an imino group, a carbonyl group, a carbonyloxy group, or an amide group.
重合体中、単量体(3)に由来する繰り返し単位の含有割合は、全繰り返し単位の合計100mol%に対して、通常、50mol%以下であり、5〜30mol%であることが好ましく、5〜20mol%であることが更に好ましい。単量体(3)に由来する繰り返し単位の含有割合が50mol%以下であると、レジスト被膜の撥水性を向上させ、水切れを良好にすることができる。 In the polymer, the content of the repeating unit derived from the monomer (3) is usually 50 mol% or less, preferably 5 to 30 mol%, based on the total 100 mol% of all repeating units. More preferably, it is -20 mol%. When the content ratio of the repeating unit derived from the monomer (3) is 50 mol% or less, the water repellency of the resist film can be improved and water drainage can be improved.
1−2−4.単量体(4):
単量体(4)としては、アルカリ反応性基を有し、且つ、単量体(1)以外の単量体であれば、特に制限なく従来公知のアルカリ反応性基を有する単量体を使用することができる。
1-2-4. Monomer (4):
As the monomer (4), a monomer having an alkali-reactive group and any conventionally known monomer having an alkali-reactive group is not particularly limited as long as it is a monomer other than the monomer (1). Can be used.
単量体(4)は、下記一般式(4−1)〜(4−7)で表される単量体からなる群より選択される少なくとも1種であることが好ましい。 The monomer (4) is preferably at least one selected from the group consisting of monomers represented by the following general formulas (4-1) to (4-7).
上記一般式(4−1)〜(4−6)中、R13は、それぞれ独立に、水素原子、又はメチル基を示す。上記一般式(4−1)中、R14は、水素原子、又は置換されていても良い炭素数1〜4のアルキル基を示し、lは1〜3の整数を示す。上記一般式(4−2)及び(4−3)中、Aは、それぞれ独立に、単結合、エーテル基、エステル基、カルボニル基、炭素数1〜30の2価の鎖状炭化水素基、炭素数3〜30の2価の脂環式炭化水素基、炭素数6〜30の2価の芳香族炭化水素基、又はこれらを組み合わせた2価の基を示し、mは、それぞれ独立に、0又は1を示す。上記一般式(4−3)及び(4−5)中、Bは、それぞれ独立に、酸素原子、又はメチレン基を示す。上記一般式(4−4)及び(4−5)中、R15は、それぞれ独立に、水素原子、又はメトキシ基を示す。上記一般式(4−7)中、R16は、水素原子、メチル基、又はトリフルオロメチル基を示し、複数のR17は、それぞれ独立に、水素原子、又は炭素数1〜5の鎖状炭化水素基を示し、nは2〜4の整数を示す。 In the general formulas (4-1) to (4-6), R 13 each independently represents a hydrogen atom or a methyl group. In the general formula (4-1), R 14 represents a hydrogen atom or an optionally substituted alkyl group having 1 to 4 carbon atoms, and l represents an integer of 1 to 3. In the general formulas (4-2) and (4-3), each A independently represents a single bond, an ether group, an ester group, a carbonyl group, a divalent chain hydrocarbon group having 1 to 30 carbon atoms, A divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms, a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms, or a divalent group obtained by combining these, m is independently 0 or 1 is shown. In the above general formulas (4-3) and (4-5), B independently represents an oxygen atom or a methylene group. In the general formulas (4-4) and (4-5), R 15 each independently represents a hydrogen atom or a methoxy group. In the general formula (4-7), R 16 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and the plurality of R 17 are each independently a hydrogen atom or a chain having 1 to 5 carbon atoms. A hydrocarbon group is shown, n shows the integer of 2-4.
前記一般式(4−1)中、R14で示される「置換されていても良い炭素数1〜4のアルキル基」の具体例としては、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、2−メチルプロピル基、1−メチルプロピル基、t−ブチル基等を挙げることができる。また、このアルキル基における1以上の水素原子は置換されていてもよい。具体的な置換基としては、例えば、ハロゲン原子(フッ素原子、塩素原子、臭素原子等)、フェニル基、アセトキシ基、アルコキシ基等を挙げることができる。 Specific examples of the “optionally substituted alkyl group having 1 to 4 carbon atoms” represented by R 14 in the general formula (4-1) include a methyl group, an ethyl group, an n-propyl group, i- A propyl group, n-butyl group, 2-methylpropyl group, 1-methylpropyl group, t-butyl group and the like can be mentioned. One or more hydrogen atoms in the alkyl group may be substituted. Specific examples of the substituent include a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, etc.), a phenyl group, an acetoxy group, and an alkoxy group.
前記一般式(4−2)及び(4−3)中、Aで示される「炭素数1〜30の2価の鎖状炭化水素基」の具体例としては、メチレン基、エチレン基、1,2−プロピレン基、1,3−プロピレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基、ヘプタメチレン基、オクタメチレン基、ノナメチレン基、デカメチレン基、ウンデカメチレン基、ドデカメチレン基、トリデカメチレン基、テトラデカメチレン基、ペンタデカメチレン基、ヘキサデカメチレン基、ヘプタデカメチレン基、オクタデカメチレン基、ノナデカメチレン基、イコサレン基等の直鎖状アルキレン基;1−メチル−1,3−プロピレン基、2−メチル−1,3−プロピレン基、2−メチル−1,2−プロピレン基、1−メチル−1,4−ブチレン基、2−メチル−1,4−ブチレン基、メチリデン基、エチリデン基、プロピリデン基、2−プロピリデン基等の分岐状アルキレン基等を挙げることができる。 Specific examples of the “divalent chain hydrocarbon group having 1 to 30 carbon atoms” represented by A in the general formulas (4-2) and (4-3) include a methylene group, an ethylene group, 2-propylene group, 1,3-propylene group, tetramethylene group, pentamethylene group, hexamethylene group, heptamethylene group, octamethylene group, nonamethylene group, decamethylene group, undecamethylene group, dodecamethylene group, tridecamethylene group A linear alkylene group such as a group, a tetradecamethylene group, a pentadecamethylene group, a hexadecamethylene group, a heptacamethylene group, an octadecamethylene group, a nonacamethylene group, an icosalen group; 1-methyl-1,3- Propylene group, 2-methyl-1,3-propylene group, 2-methyl-1,2-propylene group, 1-methyl-1,4-butylene group, 2-methyl 1,4-butylene group, methylidene group, ethylidene group, and a propylidene group, etc. branched alkylene group such as 2-propylidene group.
前記一般式(4−2)及び(4−3)中、Aで示される「炭素数3〜30の2価の脂環式炭化水素基」の具体例としては、1,3−シクロブチレン基、1,3−シクロペンチレ
ン基等、1,4−シクロヘキシレン基、1,5−シクロオクチレン基等の炭素数3〜
30の単環型シクロアルキレン基;1,4−ノルボルニレン基、2,5−ノルボルニレン
基、1,5−アダマンチレン基、2,6−アダマンチレン基等の多環型シクロアルキレ
ン基等を挙げることができる。
In the general formulas (4-2) and (4-3), specific examples of the “C3-C30 divalent alicyclic hydrocarbon group” represented by A include 1,3-cyclobutylene group 1,3-cyclopentylene group, 1,4-cyclohexylene group, 1,5-cyclooctylene group, etc.
30 monocyclic cycloalkylene groups; polycyclic cycloalkylene groups such as 1,4-norbornylene group, 2,5-norbornylene group, 1,5-adamantylene group, 2,6-adamantylene group, etc. Can do.
前記一般式(4−2)及び(4−3)中、Aで示される「炭素数6〜30の2価の芳香族炭化水素基」の具体例としては、フェニレン基、トリレン基、ナフチレン基、フェナン
トリレン基、アントリレン基等のアリーレン基等を挙げることができる。
Specific examples of the “divalent aromatic hydrocarbon group having 6 to 30 carbon atoms” represented by A in the general formulas (4-2) and (4-3) include a phenylene group, a tolylene group, and a naphthylene group. And arylene groups such as a phenanthrylene group and an anthrylene group.
重合体中、単量体(4)に由来する繰り返し単位の含有割合は、全繰り返し単位の合計100mol%に対して、通常、50mol%以下であり、5〜30mol%であることが好ましく、5〜20mol%であることが更に好ましい。単量体(4)に由来する繰り返し単位の含有割合が50mol%以下であると、レジスト被膜の撥水性を向上させ、水切れを良好にすることができる。 In the polymer, the content of the repeating unit derived from the monomer (4) is usually 50 mol% or less, preferably 5 to 30 mol%, preferably 100 mol% of the total repeating units. More preferably, it is -20 mol%. When the content ratio of the repeating unit derived from the monomer (4) is 50 mol% or less, the water repellency of the resist film can be improved and water drainage can be improved.
1−3.重合:
本発明の重合体の製造方法においては、上述の溶媒成分及び単量体成分を用いて、ラジカル重合による方法であれば、特に制限なく従来公知の重合方法を適用することができる。
1-3. polymerization:
In the method for producing a polymer of the present invention, a conventionally known polymerization method can be applied without particular limitation as long as it is a method by radical polymerization using the above-described solvent component and monomer component.
重合温度は、40〜150℃であることが好ましく、50〜120℃であることが更に好ましい。本発明においては、比較的沸点が高い溶媒(S)を使用するため、より高温での重合を行うことができる。なお、重合に要する時間は、通常、1〜48時間程度であり、1〜24時間であることが好ましい。 The polymerization temperature is preferably 40 to 150 ° C, more preferably 50 to 120 ° C. In the present invention, since a solvent (S) having a relatively high boiling point is used, polymerization at a higher temperature can be performed. The time required for the polymerization is usually about 1 to 48 hours, and preferably 1 to 24 hours.
また、重合開始剤についても、ラジカル重合開始剤であれば、特に制限されず従来公知の重合開始剤を使用することができる。 Further, the polymerization initiator is not particularly limited as long as it is a radical polymerization initiator, and a conventionally known polymerization initiator can be used.
ラジカル重合開始剤としては、例えば、ヒドロパーオキサイド類、ジアルキルパーオキサイド類、ジアシルパーオキサイド類、アゾ化合物等を挙げることができる。具体例としては、2,2’−アゾビスイソブチロニトリル、2,2’−アゾビス(2−メチルブチロニトリル)、2,2’−アゾビスイソ酪酸ジメチル、1,1’−アゾビス(シクロヘキサン−1−カルボニトリル)、4,4’−アゾビス(4−シアノ吉草酸)等のアゾ化合物;デカノイルパーオキサイド、ラウロイルパーオキサイド、ベンゾイルパーオキサイド、ビス(3,5,5−トリメチルヘキサノイル)パーオキサイド、コハク酸パーオキサイド、t−ブチルパーオキシ−2−エチルへキサノエート等の有機過酸化物等を挙げることができる。これらの中でも、2,2’−アゾビスイソブチロニトリル(以下、単に「AIBN」とも記載する。)、2,2’−アゾビス(2−メチルブチロニトリル)、2,2’−アゾビスイソ酪酸ジメチル等が好ましい。 Examples of radical polymerization initiators include hydroperoxides, dialkyl peroxides, diacyl peroxides, and azo compounds. Specific examples include 2,2′-azobisisobutyronitrile, 2,2′-azobis (2-methylbutyronitrile), dimethyl 2,2′-azobisisobutyrate, 1,1′-azobis (cyclohexane- 1-carbonitrile), azo compounds such as 4,4′-azobis (4-cyanovaleric acid); decanoyl peroxide, lauroyl peroxide, benzoyl peroxide, bis (3,5,5-trimethylhexanoyl) per Examples thereof include organic peroxides such as oxide, succinic acid peroxide, and t-butylperoxy-2-ethylhexanoate. Among these, 2,2′-azobisisobutyronitrile (hereinafter, also simply referred to as “AIBN”), 2,2′-azobis (2-methylbutyronitrile), 2,2′-azobisisobutyric acid Dimethyl and the like are preferable.
ラジカル重合開始剤の使用割合は、全単量体の合計100mol%に対して、通常、0.5〜30mol%であり、1〜20mol%であることが好ましい。 The use ratio of the radical polymerization initiator is usually 0.5 to 30 mol% and preferably 1 to 20 mol% with respect to 100 mol% in total of all monomers.
以下、本発明を実施例に基づいて具体的に説明するが、本発明はこれらの実施例に限定されるものではない。なお、実施例、比較例中の「%」は、特に断らない限り質量基準である。また、各種物性値の測定方法、及び諸特性の評価方法を以下に示す。 EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to these Examples. “%” In Examples and Comparative Examples is based on mass unless otherwise specified. Moreover, the measuring method of various physical-property values and the evaluation method of various characteristics are shown below.
[Mw及びMw/Mn]
GPCシステム(商品名「HLC8220」、東ソー社製)に、カラム「TSKguardcolumn SuperH−L、TSKgel SuperH4000、TSKgel SuperH2000の組み合わせ」を用い、カラム温度:40℃、注入量:10μl、測定流量:0.6ml/分の分析条件でのゲルパーミエーションクロマトグラフィ(GPC)により、単分散ポリスチレンを標準とした、各重合体の質量平均分子量(以下、「Mw」とも記載する。)及び数平均分子量(以下、「Mn」とも記載する。)を測定した。更に、この測定結果より、Mw/Mnを算出した。なお、測定用試料としては、重合後の樹脂溶液0.05gをテトラヒドロフランで5.00gに希釈し、0.45μmフィルターで濾過したものを用いた。
[Mw and Mw / Mn]
The column “TSKguardcolumn superH-L, TSKgel SuperH4000, TSKgel SuperH2000 combination” was used for the GPC system (trade name “HLC8220”, manufactured by Tosoh Corporation), column temperature: 40 ° C., injection amount: 10 μl, measurement flow rate: 0.6 ml The mass average molecular weight of each polymer (hereinafter also referred to as “Mw”) and the number average molecular weight (hereinafter, “Mw”), based on monodisperse polystyrene, by gel permeation chromatography (GPC) under analysis conditions per minute. Also described as “Mn”). Furthermore, Mw / Mn was calculated from this measurement result. In addition, as a measurement sample, 0.05 g of the resin solution after polymerization was diluted to 5.00 g with tetrahydrofuran and filtered through a 0.45 μm filter.
[転化率]
日本電子社製の核磁気共鳴装置「ECP−500」を用いて、1H−NMRから得られた重合液に残留するモノマーのビニル炭素上の水素と内部標準との積分比より、残留モノマー濃度を決定した。得られた残留モノマーの濃度から、消費されたモノマー量の仕込んだ総モノマー量に対する割合(%)として重合体の転化率を算出した。
[Conversion rate]
Using the nuclear magnetic resonance apparatus “ECP-500” manufactured by JEOL Ltd., the residual monomer concentration from the integral ratio of hydrogen on vinyl carbon of the monomer remaining in the polymerization solution obtained from 1 H-NMR and the internal standard It was determined. From the concentration of the residual monomer obtained, the conversion rate of the polymer was calculated as a ratio (%) of the consumed monomer amount to the total monomer amount charged.
(実施例1)
単量体(1)として下記式(M1)で表される単量体(M1)11.21g(25mol%)、単量体(2)として下記式(M2)で表される単量体(M2)21.68g(60mol%)、及び単量体(3)として下記式(M3)で表される単量体(M3)7.11g(15mol%)を、溶媒(S)としてのプロピレングリコールモノメチルエーテル(PGME)40.0g(溶媒(S)を100質量%含有する溶媒成分)に溶解し、アゾビスイソブチロニトリル(AIBN)1.32g(単量体の合計量に対して5mol%)を投入して単量体溶液を調製した。一方、500mlのセパラブルフラスコに40.0gのPGMEを投入し、30分間窒素パージした。窒素パージ後、セパラブルフラスコ内を撹拌しながら80℃に加熱し、前記単量体溶液を、滴下漏斗を用いて3時間かけて滴下した。滴下を開始した時点を重合開始時点とし、重合開始時点から6時間後及び8時間後の各時点での転化率を算出した。重合開始6時間後の時点での転化率は88.4%であり、8時間後の時点での転化率は90.5%であった。
Example 1
11.21 g (25 mol%) of the monomer (M1) represented by the following formula (M1) as the monomer (1), and the monomer (2) represented by the following formula (M2) ( M2) 21.68 g (60 mol%), and monomer (3) represented by the following formula (M3) 7.11 g (15 mol%), propylene glycol as solvent (S) Dissolved in 40.0 g of monomethyl ether (PGME) (solvent component containing 100% by mass of solvent (S)), 1.32 g of azobisisobutyronitrile (AIBN) (5 mol% based on the total amount of monomers) ) Was added to prepare a monomer solution. On the other hand, 40.0 g of PGME was put into a 500 ml separable flask and purged with nitrogen for 30 minutes. After purging with nitrogen, the inside of the separable flask was heated to 80 ° C. with stirring, and the monomer solution was added dropwise over 3 hours using a dropping funnel. The point of time when the dropping was started was regarded as the polymerization start point, and the conversion rates at the respective points 6 hours and 8 hours after the polymerization start point were calculated. The conversion at 6 hours after the start of polymerization was 88.4%, and the conversion at 8 hours was 90.5%.
重合開始時点から8時間後、重合溶液を水冷することにより30℃以下に冷却した。冷却した重合溶液を600gのメタノール90質量%/水10質量%の混合液へ投入し、析出した白色粉末をろ別した。ろ別した白色粉末を、50℃にて12時間真空乾燥することで白色粉末の重合体を得た。得られた重合体のMwは8158、Mw/Mnは2.04であった。 After 8 hours from the start of polymerization, the polymerization solution was cooled to 30 ° C. or lower by water cooling. The cooled polymerization solution was charged into 600 g of a mixed solution of 90% by mass of methanol / 10% by mass of water, and the precipitated white powder was separated by filtration. The white powder thus filtered was vacuum-dried at 50 ° C. for 12 hours to obtain a white powder polymer. Mw of the obtained polymer was 8158 and Mw / Mn was 2.04.
(実施例2〜5、比較例1)
下記表1に示した、溶媒の種類、及びAIBNの添加量としたこと以外は、実施例1と同様にして重合体を得た。
(Examples 2 to 5, Comparative Example 1)
A polymer was obtained in the same manner as in Example 1 except that the type of solvent and the amount of AIBN added were shown in Table 1 below.
上記表1中、使用した溶媒の略号は以下の通りである:
PGME: プロピレングリコールモノメチルエーテル
PGMEA: プロピレングリコールモノメチルエーテルアセテート
MEK: 2−ブタノン(メチルエチルケトン)
In Table 1 above, the abbreviations of the solvents used are as follows:
PGME: Propylene glycol monomethyl ether PGMEA: Propylene glycol monomethyl ether acetate MEK: 2-butanone (methyl ethyl ketone)
なお、実施例4における「PGME/MEK 60/40」は、溶媒として、PGME60質量%/MEK40質量%の混合溶媒を用いたことを意味し、実施例5における「PGME/MEK 30/70」は、溶媒として、PGME30質量%/MEK70質量%の混合溶媒を用いたことを意味する。 In addition, “PGME / MEK 60/40” in Example 4 means that a mixed solvent of PGME 60% by mass / MEK 40% by mass was used as a solvent, and “PGME / MEK 30/70” in Example 5 is This means that a mixed solvent of 30% by mass of PGME / 70% by mass of MEK was used as the solvent.
表1より、単量体(1)を含有する単量体成分を、溶媒(S)を含有する溶媒成分中で重合すると、単量体の転化率が高くなることが明らかである。 From Table 1, it is clear that when the monomer component containing the monomer (1) is polymerized in the solvent component containing the solvent (S), the conversion rate of the monomer is increased.
本発明の重合体の製造方法により得られる重合体は、化学増幅型レジスト、特にArF液浸露光用のレジストとして用いられる感放射線性樹脂組成物の構成成分として有用である。 The polymer obtained by the method for producing a polymer of the present invention is useful as a component of a radiation sensitive resin composition used as a chemically amplified resist, particularly a resist for ArF immersion exposure.
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014122356A (en) * | 2010-10-05 | 2014-07-03 | Shin Etsu Chem Co Ltd | Fluorinated ester polymer compound |
JP2015200895A (en) * | 2009-11-18 | 2015-11-12 | Jsr株式会社 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009019199A (en) * | 2007-06-12 | 2009-01-29 | Central Glass Co Ltd | Fluorine-containing compound, fluorine-containing polymer, positive-type resist composition and patterning process using same |
JP2009074085A (en) * | 2007-08-30 | 2009-04-09 | Central Glass Co Ltd | Positive-type resist composition |
JP2009271253A (en) * | 2008-05-02 | 2009-11-19 | Fujifilm Corp | Liquid immersion exposure resist composition and patterning method using the same |
WO2009142181A1 (en) * | 2008-05-19 | 2009-11-26 | Jsr株式会社 | Radiation-sensitive resin composition for liquid immersion exposure, polymer and method for forming resist pattern |
WO2010007993A1 (en) * | 2008-07-15 | 2010-01-21 | Jsr株式会社 | Positive-type radiation-sensitive composition, and resist pattern formation method |
JP2010032994A (en) * | 2008-02-06 | 2010-02-12 | Tokyo Ohka Kogyo Co Ltd | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
-
2010
- 2010-02-18 JP JP2010033603A patent/JP5540757B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009019199A (en) * | 2007-06-12 | 2009-01-29 | Central Glass Co Ltd | Fluorine-containing compound, fluorine-containing polymer, positive-type resist composition and patterning process using same |
JP2009074085A (en) * | 2007-08-30 | 2009-04-09 | Central Glass Co Ltd | Positive-type resist composition |
JP2010032994A (en) * | 2008-02-06 | 2010-02-12 | Tokyo Ohka Kogyo Co Ltd | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
JP2009271253A (en) * | 2008-05-02 | 2009-11-19 | Fujifilm Corp | Liquid immersion exposure resist composition and patterning method using the same |
WO2009142181A1 (en) * | 2008-05-19 | 2009-11-26 | Jsr株式会社 | Radiation-sensitive resin composition for liquid immersion exposure, polymer and method for forming resist pattern |
WO2010007993A1 (en) * | 2008-07-15 | 2010-01-21 | Jsr株式会社 | Positive-type radiation-sensitive composition, and resist pattern formation method |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015200895A (en) * | 2009-11-18 | 2015-11-12 | Jsr株式会社 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern |
JP2014122356A (en) * | 2010-10-05 | 2014-07-03 | Shin Etsu Chem Co Ltd | Fluorinated ester polymer compound |
US9261783B2 (en) | 2010-10-05 | 2016-02-16 | Shin-Etsu Chemical Co., Ltd. | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid |
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