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JP2010194680A - Method and apparatus for machining workpiece - Google Patents

Method and apparatus for machining workpiece Download PDF

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Publication number
JP2010194680A
JP2010194680A JP2009043185A JP2009043185A JP2010194680A JP 2010194680 A JP2010194680 A JP 2010194680A JP 2009043185 A JP2009043185 A JP 2009043185A JP 2009043185 A JP2009043185 A JP 2009043185A JP 2010194680 A JP2010194680 A JP 2010194680A
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Prior art keywords
grinding
workpiece
plate
holding
grinding wheel
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Shinji Yoshida
真司 吉田
Keiichi Suzuki
佳一 鈴木
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Disco Corp
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Disco Abrasive Systems Ltd
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Priority to JP2009043185A priority Critical patent/JP2010194680A/en
Priority to CN201010113661A priority patent/CN101811273A/en
Priority to DE102010008975.3A priority patent/DE102010008975B4/en
Publication of JP2010194680A publication Critical patent/JP2010194680A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B19/00Single-purpose machines or devices for particular grinding operations not covered by any other main group
    • B24B19/02Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding grooves, e.g. on shafts, in casings, in tubes, homokinetic joint elements
    • B24B19/028Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding grooves, e.g. on shafts, in casings, in tubes, homokinetic joint elements for microgrooves or oil spots
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To suppress the generation of cracks in a grinding surface when a plate-like workpiece is further thinly ground in grinding the plate-like workpiece to form a ring-like reinforcement portion. <P>SOLUTION: Grinding is carried out so that a first circular arc-shaped mark 21 is formed by a first machining means while grinding is carried out so that a second grinding mark 23 intersecting the first grinding mark 21 is formed by a second machining means. This prevents the deterioration of the strength of the grinding surface caused by the continuous formation of the first grinding mark and the second grinding mark in the same direction. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、外縁部にリング状の補強部を形成するように板状ワークを研削加工するワーク加工方法およびワーク加工装置に関する。   The present invention relates to a workpiece processing method and a workpiece processing apparatus for grinding a plate-shaped workpiece so as to form a ring-shaped reinforcing portion at an outer edge portion.

半導体デバイス製造工程においては、略円板形状である半導体ウエーハの表面に格子状に配列されたストリートと呼ばれる分割予定ラインによって複数の領域が区画され、この区画された領域にIC、LSI等のデバイスを形成する。そして、半導体ウエーハをストリートに沿って切断することによりデバイスが形成された領域を分割して個々の半導体チップを製造している。また、サファイア基板の表面に窒化ガリウム系化合物半導体等が積層された光デバイスウエーハもストリートに沿って切断することにより個々の発光ダイオード、レーザダイオード等の光デバイスに分割され、電子機器に広く利用されている。   In the semiconductor device manufacturing process, a plurality of regions are partitioned by dividing lines called streets arranged in a lattice pattern on the surface of a substantially wafer-shaped semiconductor wafer, and devices such as ICs, LSIs, etc. are partitioned in the partitioned regions. Form. Then, the semiconductor wafer is cut along the streets to divide the region in which the device is formed to manufacture individual semiconductor chips. In addition, an optical device wafer in which a gallium nitride compound semiconductor is laminated on the surface of a sapphire substrate is divided along the street into optical devices such as individual light emitting diodes and laser diodes, which are widely used in electronic equipment. ing.

上述したように分割されるウエーハは、ストリートに沿って切断する前に、裏面を研削またはエッチングによって所定の厚さに形成される。近年、電子機器の軽量化、小型化を達成するためにウエーハの厚さを50μm以下に形成することが要求されている。   The wafer to be divided as described above is formed to have a predetermined thickness by grinding or etching the back surface before cutting along the street. In recent years, it has been required to form a wafer with a thickness of 50 μm or less in order to reduce the weight and size of electronic devices.

ところが、ウエーハの厚さを50μm以下に形成すると、破損し易くなり、ウエーハの搬送等の取り扱いが困難になるという問題がある。   However, when the thickness of the wafer is formed to be 50 μm or less, there is a problem that the wafer is easily damaged and handling such as wafer conveyance becomes difficult.

このような問題を解消するために、ウエーハの裏面におけるデバイス領域に対応する領域を研削してデバイス領域の厚さを所定厚さに形成するとともに、ウエーハの裏面における外周余剰領域を残存させてリング状の補強部を形成することにより、薄くなったウエーハの搬送等の取り扱いを容易にしたウエーハの加工方法が提案されている(例えば、特許文献1参照)。   In order to solve such problems, the area corresponding to the device area on the back surface of the wafer is ground to form the thickness of the device area to a predetermined thickness, and the outer peripheral surplus area on the back surface of the wafer is left to remain in the ring. There has been proposed a wafer processing method in which a thin reinforcing portion is formed to facilitate handling of a thinned wafer (for example, see Patent Document 1).

特開2007−19461号公報JP 2007-19461 A

特許文献1によれば、ウエーハの厚さを50μm以下に形成しても破損しにくく、搬送等の取り扱いが容易になった。そして、実際の研削加工にあっては、砥粒の大きさの異なる研削砥石を用い、粗研削加工と仕上げ研削加工との2段階の研削加工を順次行うことでリング状の補強部が形成されるようにウエーハを加工するようにしている。しかしながら、このように2段階の研削加工を順次行うことで、ウエーハの中央部周りをさらに薄く研削加工する際には、ウエーハの被研削面に割れが発生してしまう場合があった。   According to Patent Document 1, even when the thickness of the wafer is formed to be 50 μm or less, it is not easily damaged and handling such as conveyance becomes easy. In an actual grinding process, a ring-shaped reinforcing portion is formed by sequentially performing two stages of grinding processes, a rough grinding process and a finish grinding process, using a grinding wheel having different abrasive grain sizes. So that the wafer is processed. However, by performing the two-stage grinding process sequentially in this way, there is a case where the surface to be ground of the wafer is cracked when the periphery of the wafer is thinned further.

本発明は、上記に鑑みてなされたものであって、リング状の補強部が形成されるように板状ワークを研削加工するに際して、板状ワークをより薄く研削加工する場合であっても、被研削面に割れが発生するのを抑制することができるワーク加工方法およびワーク加工装置を提供することを目的とする。   The present invention was made in view of the above, and when grinding a plate-like workpiece so that a ring-shaped reinforcing portion is formed, even if the plate-like workpiece is ground thinner, It is an object of the present invention to provide a workpiece processing method and a workpiece processing apparatus capable of suppressing the occurrence of cracks on the surface to be ground.

上述した課題を解決し、目的を達成するために、本発明にかかるワーク加工方法は、板状ワークを保持して回転軸を中心に回転駆動される保持面を有する保持手段と、前記保持面に対向する第1の研削面を有する第1の研削砥石と、該第1の研削砥石を前記第1の研削面に対して垂直な垂直軸を第1の回転軸として回転可能に支持する第1のスピンドル部とを有する第1の加工手段と、前記保持面に対向する第2の研削面を有する第2の研削砥石と、該第2の研削砥石を前記第2の研削面に対して垂直な垂直軸を第2の回転軸として回転可能に支持する第2のスピンドル部とを有する第2の加工手段と、を含む加工装置を用いて、表面側にデバイスが形成されたデバイス領域と該デバイス領域を囲む余剰領域とを有する前記板状ワークを加工するワーク加工方法であって、前記板状ワークの前記表面側を前記保持面に保持する保持工程と、前記保持面に保持された前記板状ワークの裏面側に対して、前記第1の研削砥石の外周縁が前記余剰領域に対応する領域の内側と前記板状ワークの中心とを通るように前記第1の研削面を位置付けて、円弧状の第1の研削痕が形成されるように研削加工を施し、前記板状ワークの前記デバイス領域に対応した前記裏面を凹形状部とする第1の加工工程と、前記保持面に保持されて前記第1の加工工程済みの前記板状ワークの前記裏面側に対して、前記第2の研削砥石の外周縁が前記凹形状部の内側と前記板状ワークの中心とを通るように前記第2の研削面を位置付けて、前記第1の研削痕に交差する円弧状の第2の研削痕が形成されるように研削加工を施す第2の加工工程と、を含むことを特徴とする。   In order to solve the above-described problems and achieve the object, a workpiece processing method according to the present invention includes a holding unit having a holding surface that holds a plate-like workpiece and is driven to rotate about a rotation axis, and the holding surface. A first grinding wheel having a first grinding surface facing the first grinding wheel, and a first grinding wheel that rotatably supports the first grinding wheel with a vertical axis perpendicular to the first grinding surface as a first rotation axis. A first processing means having a first spindle portion, a second grinding wheel having a second grinding surface facing the holding surface, and the second grinding wheel with respect to the second grinding surface. A device region in which a device is formed on the surface side using a processing apparatus comprising: a second processing unit having a second spindle unit rotatably supporting a vertical axis as a second rotation axis; Machining the plate-like workpiece having a surplus area surrounding the device area A holding step of holding the surface side of the plate-like workpiece on the holding surface, and the first grinding with respect to the back side of the plate-like workpiece held on the holding surface The first grinding surface is positioned so that the outer peripheral edge of the grindstone passes through the inside of the region corresponding to the surplus region and the center of the plate-shaped workpiece, so that the arc-shaped first grinding trace is formed. A first machining step that performs grinding and uses the back surface corresponding to the device region of the plate-like workpiece as a concave-shaped portion; and the plate-like workpiece that is held on the holding surface and has undergone the first machining step The second grinding surface is positioned so that the outer peripheral edge of the second grinding wheel passes through the inside of the concave portion and the center of the plate-like workpiece with respect to the back surface side of the first grinding wheel. Grind so that an arc-shaped second grinding mark intersecting with the grinding mark is formed. A second processing step of performing processing, characterized in that it comprises a.

また、本発明にかかるワーク加工装置は、板状ワークを保持して回転軸を中心として回転駆動される保持面を有する保持手段と、前記保持面に対向する第1の研削面を有する第1の研削砥石と、該第1の研削砥石を前記第1の研削面に対して垂直な垂直軸を第1の回転軸として回転可能に支持する第1のスピンドル部とを有し、前記第1の回転軸を前記回転軸に対して相対的に僅かに傾斜させた第1の加工手段と、前記保持面に対向する第2の研削面を有する第2の研削砥石と、該第2の研削砥石を前記第2の研削面に対して垂直な垂直軸を第2の回転軸として回転可能に支持する第2のスピンドル部とを有し、前記第2の回転軸を前記回転軸に対して相対的に前記第1の回転軸とは逆方向に僅かに傾斜させた第2の加工手段と、表面側にデバイスが形成されたデバイス領域と該デバイス領域を囲む余剰領域とを有して前記保持面に保持された前記板状ワークの裏面側に対して、前記第1の研削砥石の外周縁が前記余剰領域に対応する領域の内側と前記板状ワークの中心とを通るように前記第1の研削面を位置付けて研削加工を施すとともに、前記保持面に保持されて前記研削加工済みの前記板状ワークの裏面側に対して、前記第2の研削砥石の外周縁が前記余剰領域に対応する領域の内側と前記板状ワークの中心とを通るように第2の研削面を位置付けて研削加工を施すことによって前記余剰領域に対応する裏面側にリング状の補強部を形成するように制御する制御手段と、を備えることを特徴とする。   The workpiece processing apparatus according to the present invention includes a holding unit having a holding surface that holds a plate-like workpiece and is driven to rotate about a rotation axis, and a first grinding surface that faces the holding surface. And a first spindle portion that rotatably supports the first grinding wheel with a vertical axis perpendicular to the first grinding surface as a first rotation axis. A first processing means in which the rotation shaft of the first grinding means is slightly inclined relative to the rotation shaft, a second grinding wheel having a second grinding surface facing the holding surface, and the second grinding And a second spindle portion that rotatably supports the grindstone with a vertical axis perpendicular to the second grinding surface as a second rotation axis, and the second rotation axis with respect to the rotation axis. A second processing means that is slightly inclined in a direction opposite to the first rotation axis; The outer periphery of the first grinding wheel has the surplus area with respect to the back surface side of the plate-like workpiece held on the holding surface with a device area in which chairs are formed and an extra area surrounding the device area. The plate-like workpiece that has been ground by positioning the first grinding surface so as to pass through the inside of the region corresponding to the region and the center of the plate-like workpiece and holding the grinding surface. The second grinding surface is positioned and subjected to grinding so that the outer peripheral edge of the second grinding wheel passes through the inside of the region corresponding to the surplus region and the center of the plate-like workpiece with respect to the back surface side of And a control means for controlling to form a ring-shaped reinforcing portion on the back side corresponding to the surplus region.

本発明にかかるワーク加工方法およびワーク加工装置によれば、第1の加工手段によって円弧状の第1の研削痕が形成されるように研削加工を施すのに対して、第2の加工手段では第1の研削痕に交差する円弧状の第2の研削痕が形成されるように研削加工を施すようにしたので、第1の研削痕と第2の研削痕が同一方向に連続して形成されることによる被研削面の強度低下を防止することができ、よって、リング状の補強部が形成されるように板状ワークを研削加工するに際して、板状ワークをより薄く研削加工する場合であっても、被研削面に割れが発生するのを抑制することができるという効果を奏する。   According to the workpiece machining method and the workpiece machining apparatus according to the present invention, the first machining means performs grinding so that the arc-shaped first grinding mark is formed, whereas the second machining means Since the grinding process is performed so that the arc-shaped second grinding trace intersecting with the first grinding trace is formed, the first grinding trace and the second grinding trace are continuously formed in the same direction. The strength of the surface to be ground can be prevented from being reduced, so that when grinding a plate workpiece so that a ring-shaped reinforcing part is formed, Even if it exists, there exists an effect that it can suppress that a crack generate | occur | produces in a to-be-ground surface.

図1は、本発明の実施の形態にかかるワーク加工方法を実施するためのワーク加工装置の構成例を示す斜視図である。FIG. 1 is a perspective view showing a configuration example of a workpiece machining apparatus for carrying out a workpiece machining method according to an embodiment of the present invention. 図2−1は、第1の回転軸の傾斜状態を示す概略図である。FIG. 2A is a schematic diagram illustrating an inclined state of the first rotation shaft. 図2−2は、第2の回転軸の傾斜状態を示す概略図である。FIG. 2-2 is a schematic diagram illustrating an inclined state of the second rotating shaft. 図3−1は、板状ワークの表面側を示す斜視図である。FIG. 3A is a perspective view illustrating the surface side of the plate-like workpiece. 図3−2は、板状ワークの裏面側を示す斜視図である。FIG. 3-2 is a perspective view illustrating the back side of the plate-like workpiece. 図4は、第1の加工工程における位置付け状態を示す図である。FIG. 4 is a diagram showing a positioning state in the first processing step. 図5は、第1の加工工程における加工中の状態を示す図である。FIG. 5 is a diagram showing a state during processing in the first processing step. 図6は、第1の加工工程による加工後の状態を示す図である。FIG. 6 is a diagram illustrating a state after processing by the first processing step. 図7は、第2の加工工程における位置付け状態を示す図である。FIG. 7 is a diagram showing a positioning state in the second processing step. 図8は、第2の加工工程における加工中の状態を示す図である。FIG. 8 is a diagram showing a state during processing in the second processing step. 図9は、第2の加工工程による加工後の状態を示す図である。FIG. 9 is a diagram illustrating a state after processing by the second processing step.

以下、本発明を実施するための形態であるワーク加工方法およびワーク加工装置について図面を参照して説明する。図1は、本実施の形態にかかるワーク加工方法を実施するためのワーク加工装置の構成例を示す斜視図であり、図2−1は、第1の回転軸の傾斜状態を示す概略図であり、図2−2は、第2の回転軸の傾斜状態を示す概略図である。本実施の形態のワーク加工装置1は、後述するように板状ワークの裏面におけるデバイス領域に対応する領域を研削してデバイス領域の厚さを所定厚さに形成するとともに、板状ワークの裏面における外周余剰領域を残存させてリング状の補強部を形成するためのものである。本実施の形態のワーク加工装置1は、例えば、ハウジング2と、第1の加工手段3と、第2の加工手段4と、ターンテーブル5上に設置された例えば3つの保持手段6と、カセット7,8と、位置合わせ手段9と、搬送手段10と、搬出手段11と、洗浄手段12と、搬出入手段13と、制御手段14とを主に備えている。   Hereinafter, a workpiece machining method and a workpiece machining apparatus, which are embodiments for carrying out the present invention, will be described with reference to the drawings. FIG. 1 is a perspective view illustrating a configuration example of a workpiece machining apparatus for carrying out the workpiece machining method according to the present embodiment, and FIG. 2A is a schematic diagram illustrating an inclined state of a first rotating shaft. FIG. 2-2 is a schematic diagram illustrating an inclined state of the second rotating shaft. As will be described later, the workpiece processing apparatus 1 according to the present embodiment grinds a region corresponding to the device region on the back surface of the plate-shaped workpiece to form a thickness of the device region to a predetermined thickness, and the back surface of the plate-shaped workpiece. The ring-shaped reinforcing portion is formed by leaving the outer peripheral surplus region. The workpiece machining apparatus 1 according to the present embodiment includes, for example, a housing 2, a first machining means 3, a second machining means 4, for example, three holding means 6 installed on a turntable 5, and a cassette. 7, 8, positioning means 9, transport means 10, carry-out means 11, cleaning means 12, carry-in / out means 13, and control means 14.

ターンテーブル5は、ハウジング2の上面に設けられた円盤状のものであり、水平面内で回転可能に設けられ、適宜タイミングで回転駆動される。このターンテーブル5上には、例えば3つの保持手段6が、例えば120度の位相角で等間隔に配設されている。これら保持手段6は、上面に真空チャックを備えたチャックテーブル構造のものであり、平坦に形成された保持面6sに載置された板状ワークWを真空吸着して保持する。これら保持手段6は、研削加工時には、図示しない回転駆動機構によって保持面6sに垂直な回転軸φ0を中心として水平面内で回転駆動される。このような保持手段6は、ターンテーブル5の回転によって、搬入搬出待機位置A、第1の加工手段3に対向する粗研削位置B、第2の加工手段4に対向する仕上げ研削位置Cとの間で相対移動される。   The turntable 5 is a disk-like one provided on the upper surface of the housing 2, is provided rotatably in a horizontal plane, and is driven to rotate at an appropriate timing. On the turntable 5, for example, three holding means 6 are arranged at equal intervals with a phase angle of 120 degrees, for example. These holding means 6 have a chuck table structure having a vacuum chuck on the upper surface, and hold the plate-like workpiece W placed on a flat holding surface 6s by vacuum suction. At the time of grinding, these holding means 6 are rotationally driven in a horizontal plane around a rotation axis φ0 perpendicular to the holding surface 6s by a rotation driving mechanism (not shown). Such a holding means 6 is brought into contact with a carry-in / out standby position A, a rough grinding position B facing the first processing means 3, and a finish grinding position C facing the second processing means 4 by the rotation of the turntable 5. Moved relative to each other.

第1の加工手段3は、粗研削位置Bに位置する保持手段6の保持面6sに対向する第1の研削面3aを有する第1の研削砥石3bと、この第1の研削砥石3bを第1の研削面3aに対して垂直な垂直軸を第1の回転軸φ1として回転可能に支持する第1のスピンドル部3cと、この第1のスピンドル部3cを第1の回転軸φ1の軸心方向に進退可能に支持する第1のスライド部3dとを有する。ここで、第1の研削砥石3bとしては、砥粒の大きさが粗い粗研削用のものが用いられている。すなわち、第1のスピンドル部3cの下端に着脱自在に装着された第1の研削面3aを有する第1の研削砥石3bをモータ3eによって第1の回転軸φ1を中心として回転させながら、粗研削位置Bに位置する保持手段6の保持面6sに保持された板状ワークWの上面に第1のスライド部3dによって押圧接触させることで、板状ワークWの上面に対して後述するように所定の粗研削加工を施すためのものである。このような第1の加工手段3は、図示しないが、第1の回転軸φ1を回転軸φ0に対して傾けて設定する機構を有する。   The first processing means 3 includes a first grinding wheel 3b having a first grinding surface 3a facing the holding surface 6s of the holding means 6 located at the rough grinding position B, and the first grinding wheel 3b. A first spindle portion 3c that rotatably supports a vertical axis perpendicular to the grinding surface 3a as a first rotation axis φ1, and the first spindle portion 3c is an axis of the first rotation axis φ1 And a first slide portion 3d that is supported so as to be movable back and forth in the direction. Here, as the first grinding wheel 3b, a coarse grinding stone having a coarse abrasive grain size is used. That is, the rough grinding is performed while rotating the first grinding wheel 3b having the first grinding surface 3a detachably attached to the lower end of the first spindle portion 3c around the first rotation axis φ1 by the motor 3e. The upper surface of the plate-like workpiece W held on the holding surface 6s of the holding means 6 located at the position B is pressed and brought into contact with the upper surface of the plate-like workpiece W by the first slide portion 3d, so that it is predetermined as will be described later. For rough grinding. Although not shown, the first processing means 3 has a mechanism for setting the first rotation axis φ1 to be inclined with respect to the rotation axis φ0.

第2の加工手段4は、仕上げ研削位置Cに位置する保持手段6の保持面6sに対向する第2の研削面4aを有する第2の研削砥石4bと、この第2の研削砥石4bを第2の研削面3bに対して垂直な垂直軸を第2の回転軸φ2として回転可能に支持する第2のスピンドル部4cと、この第2のスピンドル部4cを第2の回転軸φ2の軸心方向に進退可能に支持する第2のスライド部4dとを有する。ここで、第2の研削砥石4bとしては、砥粒の大きさが細かい仕上げ研削用のものが用いられている。すなわち、第2のスピンドル部4cの下端に着脱自在に装着された第2の研削面4aを有する第2の研削砥石4bをモータ4eによって第2の回転軸φ2を中心として回転させながら、仕上げ研削位置Cに位置する保持手段6の保持面6sに保持された板状ワークWの上面に第2のスライド部4dによって押圧接触させることで、板状ワークWの上面に対して後述するように所定の仕上げ研削加工を施すためのものである。このような第2の加工手段4は、図示しないが、第2の回転軸φ2を回転軸φ0に対して傾けて設定する機構を有する。   The second processing means 4 includes a second grinding wheel 4b having a second grinding surface 4a facing the holding surface 6s of the holding means 6 located at the finish grinding position C, and the second grinding wheel 4b. A second spindle portion 4c that rotatably supports a vertical axis perpendicular to the second grinding surface 3b as a second rotation axis φ2, and the second spindle portion 4c is an axis of the second rotation axis φ2. And a second slide portion 4d that is supported so as to be able to advance and retract in the direction. Here, as the second grinding wheel 4b, one for fine grinding with fine abrasive grains is used. That is, finish grinding is performed by rotating a second grinding wheel 4b having a second grinding surface 4a detachably mounted on the lower end of the second spindle portion 4c about the second rotation axis φ2 by a motor 4e. The upper surface of the plate-like workpiece W held on the holding surface 6s of the holding means 6 located at the position C is brought into press contact with the upper surface of the plate-like workpiece W by the second slide portion 4d, so that the predetermined upper surface of the plate-like workpiece W is described later. It is for performing the finish grinding process. Although not shown, the second processing means 4 has a mechanism for setting the second rotation axis φ2 to be inclined with respect to the rotation axis φ0.

また、第1,第2の加工手段3,4の第1,第2のスライド部3d,4dは、それぞれ昇降送り手段15,16により昇降送り可能に設けられ、第1,第2の研削砥石3b,4bを保持手段6上の板状ワークWの上面に対して研削送り可能に構成されている。これらの昇降送り手段15,16は、ハウジング2の上面に設けられた可動ブロック17,18に搭載されている。可動ブロック17,18は、第1,第2の研削砥石3b,4bが粗研削位置Bや仕上げ研削位置Cに位置する保持手段6に対してターンテーブル5の半径方向に進退移動するように、図示しない移動機構によってハウジング2に対して可動的に設けられている。   The first and second slide portions 3d and 4d of the first and second processing means 3 and 4 are provided so as to be moved up and down by the lifting and lowering feeding means 15 and 16, respectively. 3b and 4b are configured to be capable of being ground and fed to the upper surface of the plate-like workpiece W on the holding means 6. These elevating and feeding means 15 and 16 are mounted on movable blocks 17 and 18 provided on the upper surface of the housing 2. The movable blocks 17 and 18 are moved so that the first and second grinding wheels 3b and 4b move forward and backward in the radial direction of the turntable 5 with respect to the holding means 6 positioned at the rough grinding position B or the finish grinding position C. The housing 2 is movably provided by a moving mechanism (not shown).

カセット7,8は、複数のスロットを有する板状ワーク用の収容器である。一方のカセット7は、研削加工前の板状ワークWを収容し、他方のカセット8は、研削加工後の板状ワークWを収容する。なお、板状ワークWとしては、特に限定されないが、例えばシリコンウエーハやGaAs等の半導体ウエーハ、セラミック、ガラス、サファイア(Al)系の無機材料基板、板状金属や樹脂の延性材料、さらには、ミクロンオーダーからサブミクロンオーダーの面内平坦度(TTV:Total Thickness Variation:板状ワークの被研削面を基準面として厚み方向に測定した高さの板状ワーク全面における最大値と最小値の差)が要求される各種加工材料が挙げられる。 The cassettes 7 and 8 are containers for plate-like workpieces having a plurality of slots. One cassette 7 accommodates the plate-like workpiece W before grinding, and the other cassette 8 accommodates the plate-like workpiece W after grinding. The plate-like workpiece W is not particularly limited. For example, a semiconductor wafer such as silicon wafer or GaAs, ceramic, glass, sapphire (Al 2 O 3 ) -based inorganic material substrate, plate-like metal or resin ductile material, Further, in-plane flatness (TTV: Total Thickness Variation): the maximum and minimum values of the entire surface of the plate workpiece measured in the thickness direction with the surface to be ground of the plate workpiece as the reference surface Various processing materials that require a difference between the two.

また、位置合わせ手段9は、カセット7から取り出された板状ワークWが仮置きされて、その中心位置合わせを行うためのテーブルである。搬入手段10は、吸着パッドを有して水平面内で回転駆動される搬送アームからなり、位置合わせ手段9で位置合わせされた研削加工前の板状ワークWを吸着保持して搬入搬出待機位置Aに位置する保持手段6上に搬入する。搬出手段11は、吸着パッドを有して水平面内で回転駆動される搬送アームからなり、搬入搬出待機位置Aに位置する保持手段6上に保持された研削加工後の板状ワークWを吸着保持して洗浄手段12に搬出する。また、搬出入手段13は、例えばU字型ハンド13aを備えるロボットピックであり、U字型ハンド13aによって板状ワークWを吸着保持して搬送する。具体的には、搬出入手段13は、研削加工前の板状ワークWをカセット7から位置合わせ手段9へ搬出するとともに、研削加工後の板状ワークWを洗浄手段12からカセット8へ搬入する。洗浄手段12は、研削加工後の板状ワークWを洗浄し、研削された加工面に付着している研削屑等のコンタミネーションを除去する。   The alignment means 9 is a table on which the plate-like workpiece W taken out from the cassette 7 is temporarily placed and its center is aligned. The carry-in means 10 is composed of a transfer arm that has a suction pad and is driven to rotate in a horizontal plane, and sucks and holds the plate-like work W before grinding that has been aligned by the alignment means 9 to carry-in / out standby position A. It is carried onto the holding means 6 located at the position. The unloading means 11 includes a transfer arm having a suction pad and rotationally driven in a horizontal plane, and holds the plate-like workpiece W after grinding held on the holding means 6 positioned at the load / unload standby position A by suction. Then, it is carried out to the cleaning means 12. The carry-in / out means 13 is, for example, a robot pick provided with a U-shaped hand 13a. Specifically, the carry-in / out means 13 carries the plate-like workpiece W before grinding from the cassette 7 to the alignment means 9 and carries the plate-like workpiece W after grinding into the cassette 8 from the cleaning means 12. . The cleaning means 12 cleans the plate-like workpiece W after grinding, and removes contamination such as grinding dust adhering to the ground processing surface.

さらに、制御手段14は、マイクロコンピュータからなり、板状ワークWに対して所望の研削加工を施すためにワーク加工装置1の各部の動作を制御するためのものである。   Furthermore, the control means 14 consists of a microcomputer, and controls the operation | movement of each part of the workpiece | work processing apparatus 1 in order to perform a desired grinding process with respect to the plate-shaped workpiece | work W. FIG.

このようなワーク加工装置1において、粗研削位置Bに位置する保持手段6と第1の研削砥石3bとがともに反時計方向に回転するとした場合、第1の加工手段3の第1の回転軸φ1は、図2−1に示すように、保持手段6の保持面6sに垂直な回転軸φ0に対して、保持面6sの回転方向(円周方向)において前下がりとなるように第1の傾斜角αだけ僅かに傾斜させて設定されている。   In such a workpiece processing apparatus 1, when both the holding means 6 located at the rough grinding position B and the first grinding wheel 3 b rotate counterclockwise, the first rotating shaft of the first processing means 3 is used. As shown in FIG. 2A, the first φ 1 is such that the first lower side of the holding means 6 is forwardly lowered with respect to the rotation axis φ 0 perpendicular to the holding surface 6 s in the rotation direction (circumferential direction) of the holding surface 6 s. It is set to be slightly inclined by the inclination angle α.

また、仕上げ研削位置Cに位置する保持手段6と第2の研削砥石4bとがともに時計方向に回転するとした場合、第2の加工手段4の第2の回転軸φ2は、図2−2に示すように、保持手段6の保持面6sに垂直な回転軸φ0に対して、保持面6sの回転方向(円周方向)において前下がりとなるように第2の傾斜角βだけ僅かに傾斜させて設定されている。すなわち、第2の回転軸φ2は、回転軸φ0に対して、第1の回転軸φ1とは逆方向に傾斜されている。また、第2の傾斜角βは、第1の傾斜角αよりも小さな角度に設定されている。なお、これらの第1,第2の傾斜角α,βは、図面上では誇張した角度で示しているが、例えば、0〜0.5度の範囲内で設定される微小角である。   When both the holding means 6 and the second grinding wheel 4b positioned at the finish grinding position C rotate clockwise, the second rotation axis φ2 of the second processing means 4 is as shown in FIG. As shown in the figure, the second tilt angle β is slightly inclined with respect to the rotation axis φ0 perpendicular to the holding surface 6s of the holding means 6 so as to be forwardly lowered in the rotation direction (circumferential direction) of the holding surface 6s. Is set. That is, the second rotation axis φ2 is inclined in the direction opposite to the first rotation axis φ1 with respect to the rotation axis φ0. Further, the second inclination angle β is set to an angle smaller than the first inclination angle α. In addition, although these 1st, 2nd inclination-angle (alpha) and (beta) are shown by the exaggerated angle on drawing, it is a minute angle set within the range of 0-0.5 degree | times, for example.

ついで、本実施の形態で研削加工する対象である板状ワークWについて説明する。図3−1は、板状ワークWの表面側を示す斜視図であり、図3−2は、板状ワークWの裏面側を示す斜視図である。本実施の形態で研削対象とする板状ワークWは、表面Wa側には縦横に区画された複数のデバイスが全面的に形成され、その内の製品化に有効なデバイスを有する領域(図3−1中に網掛けで示す領域)がデバイス領域W1とされ、このデバイス領域W1を囲む外側の領域が余剰領域W2とされる。   Next, the plate-like workpiece W that is an object to be ground in the present embodiment will be described. FIG. 3A is a perspective view showing the front surface side of the plate-like workpiece W, and FIG. 3-2 is a perspective view showing the back surface side of the plate-like workpiece W. In the plate-like workpiece W to be ground in the present embodiment, a plurality of devices partitioned vertically and horizontally are entirely formed on the surface Wa side, and a region having devices effective for commercialization (FIG. 3). -1 is a device area W1, and an outer area surrounding the device area W1 is a surplus area W2.

本実施の形態では、このような板状ワークWのデバイス領域W1に対応する裏面Wbを被研削領域として裏面Wb側から研削して余剰領域W2に対応する裏面Wbにリング状の補強部を形成するように研削加工するものである。このため、本実施の形態の第1,第2の研削砥石3b,研削砥石4bは、その回転軌跡の最外周の直径がデバイス領域W1の半径より大きくデバイス領域W1の直径より小さくなるように形成されている。   In the present embodiment, the back surface Wb corresponding to the device region W1 of the plate-like workpiece W is ground from the back surface Wb side as a region to be ground to form a ring-shaped reinforcing portion on the back surface Wb corresponding to the surplus region W2. So that it is ground. Therefore, the first and second grinding wheels 3b and 4b of the present embodiment are formed so that the diameter of the outermost circumference of the rotation locus is larger than the radius of the device region W1 and smaller than the diameter of the device region W1. Has been.

以下、図4〜図9を参照して、制御手段14による制御の下に実行される本実施の形態の板状ワークWの加工方法について説明する。   Hereinafter, with reference to FIGS. 4-9, the processing method of the plate-shaped workpiece | work W of this Embodiment performed under control by the control means 14 is demonstrated.

(保持工程)
まず、カセット7から研削前の板状ワークWを搬出入手段13により取り出して、位置合わせ手段9で中心位置合わせした後、搬送手段10によって上方から吸着保持して、搬入搬出待機位置Aに位置する保持手段6の保持面6s上に搬入し吸着保持させる。この際、板状ワークWは、被研削面となる裏面Wb側が上面となるようにする。
(Holding process)
First, the plate-like workpiece W before grinding is taken out from the cassette 7 by the carry-in / out means 13 and centered by the positioning means 9 and then sucked and held by the carrying means 10 from above and positioned at the carry-in / out standby position A. It is carried on the holding surface 6s of the holding means 6 to be sucked and held. At this time, the plate-like workpiece W is set so that the back surface Wb side to be ground becomes the top surface.

(第1の加工工程)
ついで、ターンテーブル5を120度回転させることで、搬入搬出待機位置Aに位置していた保持手段6を粗研削位置に位置付ける。そして、板状ワークWを保持した保持面6sを回転軸φ0を中心として反時計方向に回転させるとともに、第1の加工手段3の第1の研削砥石3bを反時計方向に回転させて、板状ワークWの裏面Wb側から中央部を凹状に研削加工する。まず、可動ブロック17を進退させることで、図4に示すように、第1の研削砥石3bの外周縁が余剰領域W2に対応する領域の内側(デバイス領域W1と余剰領域W2との境界)と板状ワークWの中心W0とを通るように第1の研削面3aを位置付ける。そして、図5に示すように、高速回転している第1の研削砥石3bを昇降送り手段15により板状ワークWの裏面Wbに対して下降させて研削送りすることで、図6に示すように、円弧状の第1の研削痕21が形成されるように研削加工を施し、板状ワークWのデバイス領域W1に対応した裏面Wbを凹形状部W3とする。
(First processing step)
Next, by rotating the turntable 5 120 degrees, the holding means 6 that has been located at the loading / unloading standby position A is positioned at the rough grinding position. Then, the holding surface 6s holding the plate-like workpiece W is rotated counterclockwise about the rotation axis φ0, and the first grinding wheel 3b of the first processing means 3 is rotated counterclockwise to The center portion is ground into a concave shape from the back surface Wb side of the workpiece W. First, by moving the movable block 17 back and forth, as shown in FIG. 4, the outer peripheral edge of the first grinding wheel 3b is inside the region corresponding to the surplus region W2 (the boundary between the device region W1 and the surplus region W2). The first grinding surface 3a is positioned so as to pass through the center W0 of the plate-like workpiece W. Then, as shown in FIG. 5, the first grinding wheel 3 b rotating at a high speed is lowered with respect to the back surface Wb of the plate-like workpiece W by the lifting and lowering feeding means 15 and is fed by grinding, as shown in FIG. 6. Then, grinding is performed so that the arc-shaped first grinding mark 21 is formed, and the back surface Wb corresponding to the device region W1 of the plate-like workpiece W is defined as the concave portion W3.

ここで、図5に示す研削加工において、第1の研削砥石3bの第1の回転軸φ1が保持手段6の回転軸φ0に対して回転方向において前下がりとなるように第1の傾斜角αだけ傾斜しているので、第1の研削面3aのうちで、図中、網掛け状態で示す前下がりの半分が板状ワークWに接して研削作用を示す部分となり、後ろ上がりの半分は板状ワークWから浮いているので、板状ワークWの中心W0から余剰領域W2に対応する領域の内側までの部分が僅かに凹面形状に研削される。22は、前下がり傾斜した第1の研削砥石3bによる研削によって板状ワークWの裏面Wbに形成される凹面形状部を示している。この場合の研削痕は、図6に示すような円弧状の第1の研削痕21となる。   Here, in the grinding process shown in FIG. 5, the first inclination angle α so that the first rotation axis φ1 of the first grinding wheel 3b is lowered forward in the rotation direction with respect to the rotation axis φ0 of the holding means 6. In the first grinding surface 3a, the half of the front lowering shown in the shaded state is in contact with the plate-like workpiece W and shows the grinding action, and the half of the rear raising is the plate. Since it floats from the workpiece W, the portion from the center W0 of the plate workpiece W to the inside of the region corresponding to the surplus region W2 is slightly ground into a concave shape. Reference numeral 22 denotes a concave shape portion formed on the back surface Wb of the plate-like workpiece W by grinding with the first grinding wheel 3b inclined forward and downward. The grinding traces in this case are arc-shaped first grinding traces 21 as shown in FIG.

このような第1の加工工程においては、第1の研削砥石3bによる研削加工に際して、脱落砥粒が生じても、第1の回転軸φ1の回転軸φ0に対する第1の傾斜角αが、砥粒の粒径よりも大きくなるように比較的大きな角度に設定されており、第1の研削砥石3bからの脱落砥粒が第1の研削砥石3bと凹面形状部22との間の噛みこまれにくくなるので、凹面形状部22にスクラッチが起こりにくいものとなる。一方、第1の回転軸φ1の回転軸φ0に対する第1の傾斜角αが比較的大きいため、図6(b)に示すように、面内平坦度(TTV)は悪くなってしまう。   In such a first processing step, even when falling abrasive grains are generated during the grinding process by the first grinding wheel 3b, the first inclination angle α of the first rotation shaft φ1 with respect to the rotation shaft φ0 is the grinding angle. The angle is set at a relatively large angle so as to be larger than the grain size of the grains, and the falling abrasive grains from the first grinding wheel 3b are caught between the first grinding wheel 3b and the concave shape portion 22. Since it becomes difficult, scratches are unlikely to occur in the concave surface portion 22. On the other hand, since the first inclination angle α of the first rotation axis φ1 with respect to the rotation axis φ0 is relatively large, as shown in FIG. 6B, the in-plane flatness (TTV) is deteriorated.

(第2の加工工程)
ついで、ターンテーブル5を120度回転させることで、粗研削位置Bに位置していた保持手段6を仕上げ研削位置に位置付ける。そして、粗研削加工済みの板状ワークWを保持した保持面6sを回転軸φ0を中心として時計方向に回転させるとともに、第2の加工手段4の第2の研削砥石4bを時計方向に回転させて、板状ワークWの裏面Wb側から中央部(凹形状部W3)をさらに凹状に仕上げ研削加工する。まず、可動ブロック18を進退させることで、図7に示すように、第2の研削砥石4bの外周縁が余剰領域W2に対応する領域の内側(デバイス領域W1と余剰領域W2との境界)と板状ワークWの中心W0とを通るように第2の研削面4aを位置付ける。そして、図8に示すように、高速回転している第2の研削砥石4bを昇降送り手段16により板状ワークWの裏面Wbに対して下降させて研削送りすることで、図9に示すように、円弧状の第2の研削痕23が形成されるように研削加工を施す。このようにして、板状ワークWの裏面Wb側から板状ワークWの余剰領域W2を残して研削し、板状ワークWの裏面Wb側に研削による凹形状部W3とこの凹形状部W3を囲むリング状の補強部W4とを形成する加工工程が終了する。この補強部W4が、切削加工終了後の搬出手段11等による保持部分となる。
(Second processing step)
Next, by rotating the turntable 5 by 120 degrees, the holding means 6 located at the rough grinding position B is positioned at the finish grinding position. Then, the holding surface 6s holding the plate-like workpiece W that has been subjected to rough grinding is rotated clockwise about the rotation axis φ0, and the second grinding wheel 4b of the second processing means 4 is rotated clockwise. Then, the center part (concave part W3) is further ground into a concave shape from the back surface Wb side of the plate-like workpiece W. First, by moving the movable block 18 back and forth, as shown in FIG. 7, the outer peripheral edge of the second grinding wheel 4b is inside the region corresponding to the surplus region W2 (the boundary between the device region W1 and the surplus region W2). The second grinding surface 4a is positioned so as to pass through the center W0 of the plate-like workpiece W. Then, as shown in FIG. 8, the second grinding wheel 4b rotating at a high speed is lowered and fed to the back surface Wb of the plate-like workpiece W by the lifting and lowering feeding means 16, as shown in FIG. In addition, grinding is performed so that the arc-shaped second grinding mark 23 is formed. In this way, grinding is performed from the back surface Wb side of the plate-like workpiece W, leaving the surplus area W2 of the plate-like workpiece W, and the concave shape portion W3 and this concave shape portion W3 are ground on the back surface Wb side of the plate-like workpiece W. The processing step for forming the surrounding ring-shaped reinforcing portion W4 ends. This reinforcement part W4 becomes a holding part by the carrying-out means 11 etc. after completion | finish of cutting.

ここで、図8に示す研削加工において、第2の研削砥石4bの第2の回転軸φ2が保持手段6の回転軸φ0に対して回転方向において前下がりとなるように第2の傾斜角βだけ傾斜しているので、第2の研削面4aのうちで、図中、網掛け状態で示す前下がりの半分が板状ワークWに接して研削作用を示す部分となり、後ろ上がりの半分は板状ワークWから浮いているので、板状ワークWの中心W0から余剰領域W2に対応する領域の内側までの部分が僅かに凹面形状に研削される。24は、前下がり傾斜した第2の研削砥石4bによる研削によって板状ワークWの裏面Wbに形成される凹面形状部を示している。   Here, in the grinding process shown in FIG. 8, the second inclination angle β so that the second rotation axis φ2 of the second grinding wheel 4b is lowered forward in the rotation direction with respect to the rotation axis φ0 of the holding means 6. In the second grinding surface 4a of the second grinding surface 4a, the half of the front lowering shown in the shaded state is in contact with the plate-like workpiece W and shows the grinding action, and the half of the rear raising is the plate Since it floats from the workpiece W, the portion from the center W0 of the plate workpiece W to the inside of the region corresponding to the surplus region W2 is slightly ground into a concave shape. Reference numeral 24 denotes a concave shape portion formed on the back surface Wb of the plate-like workpiece W by grinding with the second grinding wheel 4b inclined forward and downward.

この場合の研削痕は、図9に示すように第1の研削痕21に交差する円弧状の第2の研削痕23となる。すなわち、第2の回転軸φ2の第2の傾斜角βが、第1の回転軸φ1の第1の傾斜角αとは逆向きに設定されているので、第2の研削面4aによる仕上げ研削加工に際して形成される第2の研削痕23は、粗研削で形成された第1の研削痕21に交差するものとなる。これにより、図9(a)中に破線で示すように、第1の研削痕21を仕上げ研削で消すとともに、第1の研削痕と第2の研削痕が同一方向に連続して形成されることによる被研削面の強度低下を防止することができる。よって、リング状の補強部W4が形成されるように板状ワークWを研削加工するに際して、板状ワークWをより薄く研削加工する場合であっても、被研削面に割れが発生するのを抑制することができる。   In this case, the grinding trace is an arc-shaped second grinding trace 23 that intersects the first grinding trace 21 as shown in FIG. That is, since the second inclination angle β of the second rotation axis φ2 is set in the direction opposite to the first inclination angle α of the first rotation axis φ1, the finish grinding by the second grinding surface 4a is performed. The second grinding mark 23 formed at the time of processing intersects the first grinding mark 21 formed by rough grinding. As a result, as shown by the broken line in FIG. 9A, the first grinding trace 21 is erased by finish grinding, and the first grinding trace and the second grinding trace are continuously formed in the same direction. Accordingly, it is possible to prevent the strength of the surface to be ground from being lowered. Therefore, when the plate-like workpiece W is ground so that the ring-shaped reinforcing portion W4 is formed, even if the plate-like workpiece W is ground thinner, the surface to be ground is cracked. Can be suppressed.

また、このような第2の加工工程においては、第2の回転軸φ2の回転軸φ0に対する第2の傾斜角βは第1の傾斜角αに比して小さいが、砥粒の粒径も小さいので噛みこみが起こりにくい。また、仕上げ研削用の第2の研削砥石4bを用いた仕上げ研削加工にあっては、第1の加工工程のように砥粒が被加工面に衝突してその衝撃で板状ワークを除去加工する加工ではなく、砥粒がバイトのように被研削面をすくい取る延性モードが支配的となる加工となるので、脱落砥粒による噛みこみが起こったとしても、脱落砥粒によるスクラッチの影響は実質上無視できるものとなる。一方、第2の回転軸φ2の回転軸φ0に対する第2の傾斜角βが第1の傾斜角αに比して小さいため、図9(b)に示すように、面内平坦度(TTV)がよい状態で仕上げることができる。   In such a second processing step, the second inclination angle β of the second rotation axis φ2 with respect to the rotation axis φ0 is smaller than the first inclination angle α. Because it is small, it is difficult to bite. Further, in the finish grinding using the second grinding wheel 4b for finish grinding, the abrasive grains collide with the work surface and the plate workpiece is removed by the impact as in the first machining step. This is a process in which the ductile mode in which the abrasive grain scoops the surface to be ground like a bite is dominant, so even if the occlusion by the falling abrasive grains occurs, the effect of scratches by the falling abrasive grains is It is virtually negligible. On the other hand, since the second inclination angle β of the second rotation axis φ2 with respect to the rotation axis φ0 is smaller than the first inclination angle α, as shown in FIG. 9B, the in-plane flatness (TTV) Can finish in good condition.

よって、本実施の形態によれば、リング状の補強部W4が形成されるように板状ワークWを粗研削加工と仕上げ研削加工とによる2段階で研削加工するに際して、脱落砥粒によるスクラッチの発生を抑制できるとともに、被研削面の平坦度を維持することができる。   Therefore, according to the present embodiment, when the plate-like workpiece W is ground in two stages by rough grinding and finish grinding so as to form the ring-shaped reinforcing portion W4, Generation | occurrence | production can be suppressed and the flatness of a to-be-ground surface can be maintained.

なお、本発明は、上述した実施の形態に限らず、本発明の趣旨を逸脱しない範囲であれば、種々の変形が可能である。例えば、本実施の形態では、保持手段6の回転軸φ0に対して第1,第2の研削砥石3b,4bの第1,第2の回転軸φ1,φ2を、保持手段6の回転方向において前下がり方向に僅かに第1,第2の傾斜角α,βだけ傾けるようにしたが、相対的に傾斜していればよく、保持手段6の回転軸φ0側を傾けるようにしてもよい。もっとも、保持手段6側の回転軸φ0を傾斜設定自在とした場合、受けが弱くなる場合があるので、保持手段6側の回転軸φ0は保持面6sに垂直な状態で固定させることが好ましい。   The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. For example, in the present embodiment, the first and second rotating shafts φ 1 and φ 2 of the first and second grinding wheels 3 b and 4 b with respect to the rotating shaft φ 0 of the holding unit 6 are arranged in the rotation direction of the holding unit 6. Although the first and second inclination angles α and β are slightly inclined in the forward downward direction, they may be inclined relatively, and the rotation axis φ0 side of the holding means 6 may be inclined. However, if the rotation axis φ0 on the holding means 6 side can be set to be tilted, the receiving may be weakened. Therefore, the rotation axis φ0 on the holding means 6 side is preferably fixed in a state perpendicular to the holding surface 6s.

また、粗研削にあっては、保持手段6および第1の研削砥石3bの回転方向を反時計方向としたが、時計方向に回転させるようにしてもよい。同様に、仕上げ研削にあっては、保持手段6および第2の研削砥石4bの回転方向を時計方向としたが、反時計方向に回転させるようにしてもよい。   In the rough grinding, the rotation direction of the holding means 6 and the first grinding wheel 3b is the counterclockwise direction, but it may be rotated in the clockwise direction. Similarly, in the finish grinding, the rotation direction of the holding means 6 and the second grinding wheel 4b is clockwise, but it may be rotated counterclockwise.

1 ワーク加工装置
3 第1の加工手段
3a 第1の研削面
3b 第1の研削砥石
3c 第1のスピンドル部
4 第2の加工手段
4a 第2の研削面
4b 第2の研削砥石
4c 第2のスピンドル部
6 保持手段
6s 保持面
14 制御手段
21 第1の研削痕
23 第2の研削痕
W 板状ワーク
Wa 表面
Wb 裏面
W1 デバイス領域
W2 余剰領域
W3 凹形状部
W4 補強部
φ0 回転軸
φ1 第1の回転軸
φ2 第2の回転軸
DESCRIPTION OF SYMBOLS 1 Work processing apparatus 3 1st processing means 3a 1st grinding surface 3b 1st grinding wheel 3c 1st spindle part 4 2nd processing means 4a 2nd grinding surface 4b 2nd grinding wheel 4c 2nd Spindle portion 6 Holding means 6s Holding surface 14 Control means 21 First grinding mark 23 Second grinding mark W Plate-like workpiece Wa Front surface Wb Back surface W1 Device region W2 Surplus region W3 Concave portion W4 Reinforcement portion φ0 Rotating shaft φ1 First Axis of rotation φ2 Second axis of rotation

Claims (2)

板状ワークを保持して回転軸を中心に回転駆動される保持面を有する保持手段と、
前記保持面に対向する第1の研削面を有する第1の研削砥石と、該第1の研削砥石を前記第1の研削面に対して垂直な垂直軸を第1の回転軸として回転可能に支持する第1のスピンドル部とを有する第1の加工手段と、
前記保持面に対向する第2の研削面を有する第2の研削砥石と、該第2の研削砥石を前記第2の研削面に対して垂直な垂直軸を第2の回転軸として回転可能に支持する第2のスピンドル部とを有する第2の加工手段と、
を含む加工装置を用いて、表面側にデバイスが形成されたデバイス領域と該デバイス領域を囲む余剰領域とを有する前記板状ワークを加工するワーク加工方法であって、
前記板状ワークの前記表面側を前記保持面に保持する保持工程と、
前記保持面に保持された前記板状ワークの裏面側に対して、前記第1の研削砥石の外周縁が前記余剰領域に対応する領域の内側と前記板状ワークの中心とを通るように前記第1の研削面を位置付けて、円弧状の第1の研削痕が形成されるように研削加工を施し、前記板状ワークの前記デバイス領域に対応した前記裏面を凹形状部とする第1の加工工程と、
前記保持面に保持されて前記第1の加工工程済みの前記板状ワークの前記裏面側に対して、前記第2の研削砥石の外周縁が前記凹形状部の内側と前記板状ワークの中心とを通るように前記第2の研削面を位置付けて、前記第1の研削痕に交差する円弧状の第2の研削痕が形成されるように研削加工を施す第2の加工工程と、
を含むことを特徴とするワーク加工方法。
Holding means having a holding surface that holds the plate-like workpiece and is driven to rotate about the rotation axis;
A first grinding wheel having a first grinding surface facing the holding surface, and the first grinding wheel can be rotated with a vertical axis perpendicular to the first grinding surface as a first rotation axis. First processing means having a first spindle portion to support;
A second grinding wheel having a second grinding surface facing the holding surface; and the second grinding wheel is rotatable about a vertical axis perpendicular to the second grinding surface as a second rotation axis. A second processing means having a second spindle portion to support;
A workpiece processing method for processing the plate-shaped workpiece having a device region in which a device is formed on the surface side and a surplus region surrounding the device region using a processing apparatus including:
A holding step of holding the surface side of the plate-like workpiece on the holding surface;
With respect to the back surface side of the plate-like workpiece held on the holding surface, the outer peripheral edge of the first grinding wheel passes through the inside of the region corresponding to the excess region and the center of the plate-like workpiece. A first grinding surface is positioned, and grinding is performed so that an arc-shaped first grinding mark is formed, and the back surface corresponding to the device region of the plate-like workpiece is a concave portion. Processing steps,
With respect to the back surface side of the plate-like workpiece that has been held by the holding surface and has undergone the first machining step, the outer peripheral edge of the second grinding wheel is inside the concave portion and the center of the plate-like workpiece. A second machining step in which the second grinding surface is positioned so as to pass through and a grinding process is performed so that an arc-shaped second grinding trace intersecting the first grinding trace is formed;
A workpiece machining method comprising:
板状ワークを保持して回転軸を中心として回転駆動される保持面を有する保持手段と、
前記保持面に対向する第1の研削面を有する第1の研削砥石と、該第1の研削砥石を前記第1の研削面に対して垂直な垂直軸を第1の回転軸として回転可能に支持する第1のスピンドル部とを有し、前記第1の回転軸を前記回転軸に対して相対的に僅かに傾斜させた第1の加工手段と、
前記保持面に対向する第2の研削面を有する第2の研削砥石と、該第2の研削砥石を前記第2の研削面に対して垂直な垂直軸を第2の回転軸として回転可能に支持する第2のスピンドル部とを有し、前記第2の回転軸を前記回転軸に対して相対的に前記第1の回転軸とは逆方向に僅かに傾斜させた第2の加工手段と、
表面側にデバイスが形成されたデバイス領域と該デバイス領域を囲む余剰領域とを有して前記保持面に保持された前記板状ワークの裏面側に対して、前記第1の研削砥石の外周縁が前記余剰領域に対応する領域の内側と前記板状ワークの中心とを通るように前記第1の研削面を位置付けて研削加工を施すとともに、前記保持面に保持されて前記研削加工済みの前記板状ワークの裏面側に対して、前記第2の研削砥石の外周縁が前記余剰領域に対応する領域の内側と前記板状ワークの中心とを通るように第2の研削面を位置付けて研削加工を施すことによって前記余剰領域に対応する裏面側にリング状の補強部を形成するように制御する制御手段と、
を備えることを特徴とするワーク加工装置。
Holding means having a holding surface that holds the plate-like workpiece and is driven to rotate about the rotation axis;
A first grinding wheel having a first grinding surface facing the holding surface, and the first grinding wheel can be rotated with a vertical axis perpendicular to the first grinding surface as a first rotation axis. A first processing unit having a first spindle portion to support, wherein the first rotating shaft is slightly inclined relative to the rotating shaft;
A second grinding wheel having a second grinding surface facing the holding surface; and the second grinding wheel is rotatable about a vertical axis perpendicular to the second grinding surface as a second rotation axis. And a second processing unit that has a second spindle portion to be supported and inclines the second rotation shaft slightly relative to the rotation shaft in a direction opposite to the first rotation shaft. ,
An outer peripheral edge of the first grinding wheel with respect to the back surface side of the plate-like workpiece held on the holding surface having a device region where a device is formed on the front surface side and a surplus region surrounding the device region The first grinding surface is positioned so as to pass through the inside of the region corresponding to the surplus region and the center of the plate-shaped workpiece, and the grinding is performed while being held on the holding surface. The second grinding surface is positioned and ground so that the outer peripheral edge of the second grinding wheel passes through the inside of the region corresponding to the surplus region and the center of the plate-like workpiece with respect to the back surface side of the plate-like workpiece. Control means for controlling to form a ring-shaped reinforcing portion on the back surface side corresponding to the surplus region by processing;
A workpiece machining apparatus comprising:
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CN113211250A (en) * 2020-02-06 2021-08-06 皇家大师研磨机公司 Trocar grinding machine
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CN113211250A (en) * 2020-02-06 2021-08-06 皇家大师研磨机公司 Trocar grinding machine
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