Nothing Special   »   [go: up one dir, main page]

JP2009223998A - Method of manufacturing magnetic recording medium and manufacturing apparatus - Google Patents

Method of manufacturing magnetic recording medium and manufacturing apparatus Download PDF

Info

Publication number
JP2009223998A
JP2009223998A JP2008069878A JP2008069878A JP2009223998A JP 2009223998 A JP2009223998 A JP 2009223998A JP 2008069878 A JP2008069878 A JP 2008069878A JP 2008069878 A JP2008069878 A JP 2008069878A JP 2009223998 A JP2009223998 A JP 2009223998A
Authority
JP
Japan
Prior art keywords
substrate
mold part
glass substrate
mold
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008069878A
Other languages
Japanese (ja)
Other versions
JP5003545B2 (en
Inventor
Hiroki Kodama
宏喜 児玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2008069878A priority Critical patent/JP5003545B2/en
Publication of JP2009223998A publication Critical patent/JP2009223998A/en
Application granted granted Critical
Publication of JP5003545B2 publication Critical patent/JP5003545B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To simultaneously perform imprint on front and back surfaces of a substrate while pressing stamp parts against the front and back surfaces with uniform force. <P>SOLUTION: A method includes a step of vertically holding a glass substrate 28 in which resin parts 38 are formed on both surfaces, i.e. the front and back surfaces of the glass substrate, a step of pressing the stamp parts 48 having a uneven pattern on both surfaces of the vertically held glass substrate 28, and a step of transferring the uneven pattern to the resin parts 38 formed on both surfaces of the glass substrate 28 while pressing the stamp parts 48 against the glass substrate 28. By pressing the stamp parts 48 against both surfaces of the vertically held glass substrate 28, the effect of gravity is reduced and the stamp parts 48 are pressed against both surfaces of the glass substrate 28 with uniform force. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、磁気記録媒体の製造方法および製造装置に関し、特に微細なパターンを有する磁気記録媒体の製造方法および製造装置に関する。   The present invention relates to a method and apparatus for manufacturing a magnetic recording medium, and more particularly to a method and apparatus for manufacturing a magnetic recording medium having a fine pattern.

近年の高度情報化社会の進展に伴い、ハード・ディスク・ドライブ(HDD)等の磁気記録再生装置は小型化、大容量化が急速に進んでいる。このため、磁気記録媒体の記録密度の向上が要求されていて、現状は磁性粒子を微細化させることで記録密度の向上を図っている。しかしながら、磁性粒子の微細化も限界に近づきつつあり、この打開策として、ディスクリートトラックメディアやパターンドメディアと呼ばれる磁気記録媒体が提案されている。ディスクリートトラックメディアとは、人工的にデータトラックをパターニングして、データトラック間を物理的、磁気的に分離させた構造をしている。パターンドメディアとは、データビット単位でパターニングを行い、1ビットごとに物理的、磁気的に分離させた構造をしている。   With the progress of the advanced information society in recent years, magnetic recording / reproducing apparatuses such as hard disk drives (HDD) have been rapidly reduced in size and capacity. For this reason, an improvement in the recording density of the magnetic recording medium is required, and at present the recording density is improved by making the magnetic particles finer. However, miniaturization of magnetic particles is approaching its limit, and as a breakthrough, magnetic recording media called discrete track media and patterned media have been proposed. The discrete track media has a structure in which data tracks are artificially patterned to physically and magnetically separate the data tracks. Patterned media has a structure in which patterning is performed in units of data bits, and each bit is physically and magnetically separated.

これらのパターンを形成する方法の1つにインプリント方法と呼ばれる手法がある。インプリント方法とは、予め凹凸パターンが形成された型部(モールド)を、樹脂部が形成された基板に押し当てて、樹脂部に凹凸パターンを転写する方法である。代表的なインプリント方法に、熱硬化型の樹脂を用いた熱インプリント方法と、紫外線硬化型の樹脂を用いた光インプリント方法とがある。   One of the methods for forming these patterns is a method called an imprint method. The imprint method is a method of transferring a concavo-convex pattern onto a resin part by pressing a mold part (mold) on which a concavo-convex pattern has been formed in advance against a substrate on which a resin part is formed. Typical imprinting methods include a thermal imprinting method using a thermosetting resin and a photoimprinting method using an ultraviolet curable resin.

熱インプリント方法は、樹脂を硬化させるために熱を加えるため、基板や型部等が熱膨張により変形し、樹脂部に形成されるパターンに影響を及ぼす場合がある。一方、光インプリント方法は、紫外線を照射することで樹脂を硬化させるため、熱膨張による基板や型部等の変形は起こり難い。このため、微細なパターンを形成する場合は、光インプリント方法が適している。   In the thermal imprinting method, heat is applied to cure the resin, so that the substrate, the mold part, or the like may be deformed by thermal expansion and affect the pattern formed on the resin part. On the other hand, in the optical imprint method, since the resin is cured by irradiating ultraviolet rays, deformation of the substrate, the mold part, and the like due to thermal expansion hardly occurs. For this reason, the optical imprint method is suitable for forming a fine pattern.

例えば、特許文献1及び特許文献2には、地面に平行に配置した基板の表面と裏面とに型部を押し当てて、基板の表面と裏面とを同時にインプリントする技術が開示されている。
特開2007−95162号公報 特許第3618057号公報
For example, Patent Literature 1 and Patent Literature 2 disclose a technique in which a mold portion is pressed against a front surface and a back surface of a substrate arranged in parallel to the ground to simultaneously imprint the front surface and the back surface of the substrate.
JP 2007-95162 A Japanese Patent No. 3618057

磁気記録媒体においては、基板の表面と裏面とにインプリントを行う必要がある。もちろん、片面づつインプリントを行うことも可能であるが、量産性を考慮すれば両面同時にインプリントすることが好ましい。   In a magnetic recording medium, it is necessary to perform imprinting on the front surface and the back surface of the substrate. Of course, it is possible to perform imprinting for each side, but it is preferable to perform imprinting on both sides simultaneously in consideration of mass productivity.

例えば、特許文献1及び特許文献2のように、基板を地面に平行に配置し、基板の表面と裏面とに型部を押し当ててインプリントする方法は、型部を表面と裏面とに押し当てる力が、重力の影響により、均一になり難いという欠点がある。   For example, as in Patent Document 1 and Patent Document 2, a method of imprinting by placing a substrate parallel to the ground and pressing a mold portion against the front and back surfaces of the substrate pushes the mold portion against the front and back surfaces. There is a drawback that the force applied is difficult to be uniform due to the influence of gravity.

特に、ディスクリートトラックメディアやパターンドメディアは、データトラックやデータビット単位でパターン形成を行うため、パターンが非常に微細となる。また、これらディスクリートトラックメディアやパターンドメディアをHDDに搭載した際、磁気ヘッドの位置とパターンの位置とが精度良く合うようにするため、高精度なパターン形成が求められる。このため、ディスクリートトラックメディアやパターンドメディアにおいて、型部を基板の表面と裏面とに押し当てる力の大きさの僅かな歪みが、パターン形成に及ぼす影響は非常に大きい。   In particular, since discrete track media and patterned media perform pattern formation in units of data tracks and data bits, the pattern becomes very fine. In addition, when these discrete track media and patterned media are mounted on an HDD, high-precision pattern formation is required so that the position of the magnetic head and the position of the pattern can be accurately matched. For this reason, in discrete track media and patterned media, a slight distortion in the magnitude of the force pressing the mold portion against the front and back surfaces of the substrate has a great influence on pattern formation.

そこで本発明は上記課題に鑑みなされたものであり、基板の表面と裏面とに均一な力で型部を押し当てながら、表面と裏面とを同時にインプリントすることが可能な磁気記録媒体の製造方法および製造装置を提供することを目的とする。   Accordingly, the present invention has been made in view of the above problems, and manufacture of a magnetic recording medium capable of simultaneously imprinting the front and back surfaces while pressing the mold portion with a uniform force on the front and back surfaces of the substrate. It is an object to provide a method and a manufacturing apparatus.

上記課題を解決するために、明細書開示の磁気記録媒体の製造方法は、表面と裏面とに樹脂部が形成された基板を縦に保持する工程と、縦にして保持された前記基板の表面と裏面とに凹凸パターンを有する型部を押し当てる工程と、前記基板に前記型部を押し当てながら前記基板の表面と裏面とに形成された前記樹脂部に前記凹凸パターンを転写する工程と、を有するものである。   In order to solve the above-described problems, a method of manufacturing a magnetic recording medium disclosed in the specification includes a step of vertically holding a substrate having a resin portion formed on a front surface and a back surface, and a surface of the substrate held vertically. And a step of pressing a mold part having a concavo-convex pattern on the back surface, and a step of transferring the concavo-convex pattern to the resin part formed on the front and back surfaces of the substrate while pressing the mold part against the substrate; It is what has.

また、明細書開示の磁気記録媒体の製造装置は、表面と裏面とに樹脂部が形成された基板を縦にして保持する基板保持機構と、縦にして保持された前記基板の表面と裏面とに凹凸パターンを有する型部を押し当てる型部動作機構と、前記基板に前記型部を押し当てながら前記基板の表面と裏面とに形成された前記樹脂部に前記凹凸パターンを転写する転写手段と、を具備するものである。   In addition, the magnetic recording medium manufacturing apparatus disclosed in the specification includes a substrate holding mechanism for vertically holding a substrate having a resin portion formed on the front surface and the back surface, and the front and back surfaces of the substrate held vertically. A mold part operating mechanism that presses a mold part having a concavo-convex pattern onto the substrate, and a transfer unit that transfers the concavo-convex pattern to the resin part formed on the front and back surfaces of the substrate while pressing the mold part against the substrate. Are provided.

これらによれば、基板の表面と裏面とに型部を押し当てる際に、重力の影響を受け難くなり、基板の表面と裏面とに均一な力で型部を押し当てることができる。つまり、基板の表面と裏面とに均一な力で型部を押し当てながら、表面と裏面とを同時にインプリントすることができる。このため、微細なパターンを高精度で、且つ量産性に優れて形成することが可能となる。   According to these, when the mold part is pressed against the front surface and the back surface of the substrate, it becomes difficult to be affected by gravity, and the mold part can be pressed against the front surface and the back surface of the substrate with a uniform force. That is, the front surface and the back surface can be simultaneously imprinted while pressing the mold portion with a uniform force on the front surface and the back surface of the substrate. For this reason, it becomes possible to form a fine pattern with high accuracy and excellent mass productivity.

明細書開示の磁気記録媒体の製造方法および製造装置によれば、基板の表面と裏面とに均一な力で型部を押し当てながら、表面と裏面とを同時にインプリントすることができる。このため、微細なパターンを高精度で、且つ量産性に優れて形成することが可能となる。   According to the method and apparatus for manufacturing a magnetic recording medium disclosed in the specification, the front and back surfaces can be simultaneously imprinted while pressing the mold portion with a uniform force against the front and back surfaces of the substrate. For this reason, it becomes possible to form a fine pattern with high accuracy and excellent mass productivity.

以下、図面を参照して、本発明の実施例について説明する。   Embodiments of the present invention will be described below with reference to the drawings.

図1は実施例1に係る磁気記録媒体の製造装置のブロック図である。図2は実施例1に係る磁気記録媒体の製造工程を示すフローチャート図である。図1および図2を用いて実施例1に係る磁気記録媒体の製造方法および製造装置を説明する。図1において、実施例1に係る磁気記録媒体の製造装置10は、洗浄部12と、検査部14と、密着層形成部16と、樹脂部形成部18と、インプリント部20と、制御部22とを備えている。洗浄部12は磁気記録媒体となる基板の洗浄を行う。検査部14は基板の表面と裏面(以下、基板の両面とする)とに付着したパーティクルの検査を行う。密着層形成部16は基板と樹脂との密着性を向上させるための密着層を基板の両面に形成する。樹脂部形成部18は基板の両面に樹脂部の形成を行う。インプリント部20は基板の両面に形成された樹脂部にパターン形成を行う。制御部22は、これら洗浄部12、検査部14、密着層形成部16、樹脂部形成部18、インプリント部20間の基板の搬送及びそれぞれの処理の制御を行う。なお、基板の搬送は、カセット24からカセット24のいわゆるカセット・トュ・カセットで行い、それぞれの処理は連続して実行される。カセット・トュ・カセットで基板を搬送して、それぞれの処理を連続して実行するのは、基板に付着するパーティクルを極力抑えるためである。   FIG. 1 is a block diagram of a magnetic recording medium manufacturing apparatus according to the first embodiment. FIG. 2 is a flowchart illustrating the manufacturing process of the magnetic recording medium according to the first embodiment. A method and apparatus for manufacturing a magnetic recording medium according to Example 1 will be described with reference to FIGS. In FIG. 1, a magnetic recording medium manufacturing apparatus 10 according to the first embodiment includes a cleaning unit 12, an inspection unit 14, an adhesion layer forming unit 16, a resin unit forming unit 18, an imprint unit 20, and a control unit. 22. The cleaning unit 12 cleans the substrate that becomes the magnetic recording medium. The inspection unit 14 inspects particles attached to the front surface and the back surface of the substrate (hereinafter referred to as both surfaces of the substrate). The adhesion layer forming unit 16 forms adhesion layers for improving the adhesion between the substrate and the resin on both surfaces of the substrate. The resin part forming part 18 forms the resin part on both surfaces of the substrate. The imprint unit 20 performs pattern formation on the resin portions formed on both sides of the substrate. The control unit 22 controls the conveyance of the substrate between the cleaning unit 12, the inspection unit 14, the adhesion layer forming unit 16, the resin unit forming unit 18, and the imprint unit 20, and the respective processes. The substrate is transported by a so-called cassette-to-cassette from the cassette 24 to the cassette 24, and each process is continuously executed. The reason why the substrate is transported by the cassette-to-cassette and the respective processes are continuously executed is to suppress particles adhering to the substrate as much as possible.

図2において、まず、両面に下地層、中間層、磁性層が順次成膜されたガラス基板を準備する(ステップS10)。ガラス基板は、例えば厚さ0.7mm、外径65mmで、中心部に直径20mmの孔(以下、内径とする)が空けられている。これら下地層、中間層、磁性層はそれぞれ例えばスパッタ法を用いて成膜することができる。そして、図1に示すように、下地層、中間層、磁性層が形成されたガラス基板をカセット24に収納し、カセット24ごと磁気記録媒体の製造装置10にセットする。   In FIG. 2, first, a glass substrate having a base layer, an intermediate layer, and a magnetic layer sequentially formed on both sides is prepared (step S10). The glass substrate has a thickness of 0.7 mm and an outer diameter of 65 mm, for example, and a hole having a diameter of 20 mm (hereinafter referred to as an inner diameter) is formed in the center. These underlayer, intermediate layer, and magnetic layer can each be formed by sputtering, for example. Then, as shown in FIG. 1, the glass substrate on which the underlayer, the intermediate layer, and the magnetic layer are formed is stored in the cassette 24, and the entire cassette 24 is set in the magnetic recording medium manufacturing apparatus 10.

図1および図2において、ガラス基板を収納したカセット24は、まず洗浄部12に搬送される。洗浄部12では、ガラス基板の両面に付着したパーティクルを取り除くため、ガラス基板の両面に純水を注水しながらスクラブ洗浄を行う(ステップS12)。その後、リンス、乾燥を実施する。なお、洗浄の際に薬液を用いる場合は、ガラス基板の両面に成膜した最表面の膜(例えば磁性層)に影響を及ぼさない薬液を選択することが好ましい。   1 and 2, the cassette 24 storing the glass substrate is first transported to the cleaning unit 12. The cleaning unit 12 performs scrub cleaning while pouring pure water on both surfaces of the glass substrate to remove particles adhering to both surfaces of the glass substrate (step S12). Thereafter, rinsing and drying are performed. In addition, when using a chemical | medical solution in the case of washing | cleaning, it is preferable to select the chemical | medical solution which does not affect the film | membrane (for example, magnetic layer) of the outermost surface formed into a film on both surfaces.

次に、カセット24は検査部14に搬送される。検査部14では、ガラス基板の両面に付着したパーティクルの検査を行う(ステップS14)。パーティクルの検査は、例えばレーザー等の光学的な計測手法を用いることができ、ここでは、0.1μm以上の大きさのパーティクルを検出させた。なお、検出させるパーティクルの大きさは、形成するパターンの微細化に応じて随時変更することが好ましい。パーティクル検査で、ガラス基板の両面に付着したパーティクルの個数がゼロの場合は次工程に進む。パーティクルの個数がゼロでない場合は、基板洗浄工程に戻される(ステップS16)。   Next, the cassette 24 is conveyed to the inspection unit 14. The inspection unit 14 inspects particles attached to both surfaces of the glass substrate (step S14). For the particle inspection, for example, an optical measuring method such as a laser can be used. Here, particles having a size of 0.1 μm or more were detected. In addition, it is preferable to change the size of the particle to detect at any time according to the refinement | miniaturization of the pattern to form. In the particle inspection, if the number of particles adhering to both surfaces of the glass substrate is zero, the process proceeds to the next step. If the number of particles is not zero, the process returns to the substrate cleaning process (step S16).

パーティクル検査に合格したガラス基板は、次に、カセット24ごと密着層形成部16に搬送される。密着層形成部16では、ガラス基板の両面に形成される樹脂とガラス基板との密着性を向上させるための密着層を形成する(ステップS18)。ここで、図3(a)から図3(c)を用いて、密着層の形成工程を詳細に説明する。なお、図3(a)から図3(c)において、簡明化のためにガラス基板28の枚数を少なく図示している。図3(a)において、密着層形成部16に搬送されたガラス基板28を、移送冶具26によりカセット24から例えば25枚取り出す。そして、移送冶具26ごとガラス基板28を浴槽30の中に浸漬させる。浴槽30は例えばプロピリングリコールモノメチルエーテルアセテート(PGMEA)を溶媒としたポリマーからなる密着液32で満たされている。図3(b)において、ガラス基板28を例えば4秒間完全に密着液32に浸漬させた後、密着液32の液面を降下させて、徐々にガラス基板28を密着液32から取り出していく。このときの液面の降下速度は例えば3mm/秒である。図3(c)において、密着液32の液面を完全に降下させ、ガラス基板28の両面に密着層34を形成する。その後、移送冶具26ごとガラス基板28をベーク炉に移動し、ガラス基板28を例えば150℃の窒素雰囲気中で100秒間ベークして、密着層34を硬化させる。なお、密着層34はガラス基板28と樹脂との密着性を考慮しつつ、極力薄くすることが好ましい。また、使用する樹脂の種類に応じて、密着層34を形成する工程は省いてもよい。   The glass substrate that has passed the particle inspection is then transported to the adhesion layer forming unit 16 together with the cassette 24. In the adhesion layer forming unit 16, an adhesion layer for improving the adhesion between the resin formed on both surfaces of the glass substrate and the glass substrate is formed (step S18). Here, the formation process of the adhesion layer will be described in detail with reference to FIGS. In FIG. 3A to FIG. 3C, the number of glass substrates 28 is reduced for the sake of simplicity. In FIG. 3A, for example, 25 glass substrates 28 conveyed to the adhesion layer forming unit 16 are taken out from the cassette 24 by the transfer jig 26. Then, the glass substrate 28 together with the transfer jig 26 is immersed in the bathtub 30. The bath 30 is filled with an adhesion liquid 32 made of a polymer using, for example, propylene glycol monomethyl ether acetate (PGMEA) as a solvent. In FIG. 3B, after the glass substrate 28 is completely immersed in the contact liquid 32 for 4 seconds, for example, the liquid surface of the contact liquid 32 is lowered and the glass substrate 28 is gradually taken out from the contact liquid 32. At this time, the descending speed of the liquid level is, for example, 3 mm / second. In FIG. 3C, the liquid level of the close contact liquid 32 is completely lowered to form the close contact layer 34 on both surfaces of the glass substrate 28. Thereafter, the glass substrate 28 together with the transfer jig 26 is moved to a baking furnace, and the glass substrate 28 is baked, for example, in a nitrogen atmosphere at 150 ° C. for 100 seconds to cure the adhesion layer 34. The adhesion layer 34 is preferably made as thin as possible in consideration of the adhesion between the glass substrate 28 and the resin. Further, depending on the type of resin used, the step of forming the adhesion layer 34 may be omitted.

図1および図2に戻り、密着層34が形成されたガラス基板28を収納したカセット24は樹脂部形成部18に搬送される。樹脂部形成部18では、ガラス基板28の両面に樹脂部の形成を行う(ステップS20)。なお、実施例1では、紫外線硬化型の樹脂を用いて樹脂部を形成する。樹脂部の形成方法は、図3(a)から図3(c)で示した、密着層34の形成方法と同様の方法を用いることができる。図4(a)から図4(c)を用いて、樹脂部の形成方法を詳細に説明する。なお、図4(a)から図4(c)において、簡明化のためにガラス基板28の枚数を少なく図示している。図4(a)において、移送冶具26を用いて取り出した例えば25枚のガラス基板28を、例えば光重合樹脂からなる液状の樹脂36で満たされた浴槽30に浸漬させる。図4(b)において、ガラス基板28を例えば5秒間完全に液状の樹脂36に浸漬させた後、液面を例えば速度10mm/秒で降下させる。図4(c)において、液面を完全に降下させ、ガラス基板28の両面に樹脂部38を形成する。その後、移送冶具26をベーク炉に移動し、ガラス基板28を例えば60℃の窒素雰囲気中で20秒間ベークして、樹脂部38を硬化させる。この処置は、樹脂部38を完全に硬化させるのではなく、液だれを防止する目的で行う。   Returning to FIG. 1 and FIG. 2, the cassette 24 containing the glass substrate 28 on which the adhesion layer 34 is formed is conveyed to the resin portion forming unit 18. In the resin part forming part 18, the resin part is formed on both surfaces of the glass substrate 28 (step S20). In Example 1, the resin portion is formed using an ultraviolet curable resin. As a method for forming the resin portion, the same method as the method for forming the adhesion layer 34 shown in FIGS. 3A to 3C can be used. A method for forming the resin portion will be described in detail with reference to FIGS. In FIG. 4A to FIG. 4C, the number of glass substrates 28 is reduced for the sake of simplicity. 4A, for example, 25 glass substrates 28 taken out using the transfer jig 26 are immersed in a bath 30 filled with a liquid resin 36 made of, for example, a photopolymerization resin. In FIG. 4B, after the glass substrate 28 is completely immersed in the liquid resin 36 for 5 seconds, for example, the liquid level is lowered at a speed of 10 mm / second, for example. In FIG. 4 (c), the liquid level is completely lowered to form resin portions 38 on both sides of the glass substrate 28. Thereafter, the transfer jig 26 is moved to a baking furnace, and the glass substrate 28 is baked in, for example, a nitrogen atmosphere at 60 ° C. for 20 seconds to cure the resin portion 38. This treatment is performed for the purpose of preventing dripping rather than completely curing the resin portion 38.

図1および図2に戻り、次にガラス基板28を収納したカセット24は、インプリント部20に搬送される。インプリント部20では、ガラス基板28の両面に形成された樹脂部38にパターン形成を行う(ステップS22)。ここで、図5(a)から図6(c)を用いて、樹脂部38にパターン形成を行う方法を詳細に説明する。なお、図5(a)から図6(c)において、簡明化のため密着層34の図示を省略している。図5(a)において、カセット24は基板保持機構40上に搬送される。そして、基板保持機構40が上昇して、ガラス基板28の下部を基板保持機構40で保持することにより、カセット24に収納されているガラス基板28を1枚、縦にして保持する。また、基板保持機構40には、溝部(ガイド)42が設けられていて、溝部42にガラス基板28をはめ込むことで、ガラス基板28が倒れることなく保持することができる。   Returning to FIG. 1 and FIG. 2, the cassette 24 in which the glass substrate 28 is accommodated next is conveyed to the imprint unit 20. In the imprint part 20, pattern formation is performed on the resin part 38 formed on both surfaces of the glass substrate 28 (step S22). Here, a method for forming a pattern on the resin portion 38 will be described in detail with reference to FIGS. In FIGS. 5A to 6C, the adhesion layer 34 is not shown for the sake of simplicity. In FIG. 5A, the cassette 24 is conveyed onto the substrate holding mechanism 40. Then, the substrate holding mechanism 40 is raised and the lower part of the glass substrate 28 is held by the substrate holding mechanism 40, whereby one glass substrate 28 stored in the cassette 24 is held vertically. In addition, the substrate holding mechanism 40 is provided with a groove portion (guide) 42, and the glass substrate 28 can be held without falling by fitting the glass substrate 28 into the groove portion 42.

図5(b)において、円筒状のピエゾ素子からなる型部動作機構44の先端部に、型部固定用リング46により固定された型部48を、縦にして保持されたガラス基板28の両面に押し当てる。型部48は紫外線を透過する材料からなり、例えば厚さ200μmのガラスを用いることができる。型部48には、予め凹凸パターンが形成されている。例えば、ディスクリートトラックメディア型の磁気記録媒体を製造する場合は円状の凹凸パターンが形成されていて、パターンドメディア型の磁気記録媒体を製造する場合はドット状の凹凸パターンが形成されている。また、型部動作機構44の内部径Lは例えば70mm程度であり、型部固定用リング46の厚さWは例えば0.3mm程度である。   In FIG. 5B, the mold part 48 fixed by the mold part fixing ring 46 is vertically held on the front end part of the mold part operation mechanism 44 made of a cylindrical piezo element. Press against. The mold part 48 is made of a material that transmits ultraviolet rays, and for example, glass having a thickness of 200 μm can be used. A concave / convex pattern is formed in the mold portion 48 in advance. For example, a circular concavo-convex pattern is formed when a discrete track media type magnetic recording medium is manufactured, and a dot concavo-convex pattern is formed when a patterned media type magnetic recording medium is manufactured. Further, the inner diameter L of the mold part operating mechanism 44 is, for example, about 70 mm, and the thickness W of the mold part fixing ring 46 is, for example, about 0.3 mm.

ガラス基板28の両面に型部48を押し当てる際は、ピエゾ素子の伸縮を利用する。型部動作機構44は、ピエゾ素子の伸縮により、Z方向(ガラス基板28の両面の垂線に平行な方向)に例えば±0.4mm程度の稼動範囲を有する。Z方向に垂直な方向であるXY方向には例えば±0.6mm程度の稼動範囲を有する。また、型部48には予めアライメントマーク(不図示)が設けられている。ガラス基板28の両面に型部48を押し当てる前に、このアライメントマークの位置とガラス基板28の内径および外径の位置とを合せる。具体的には、例えばレーザーを用いてガラス基板28の内径および外径の端面を検出し、端面を検出した位置におけるレーザーをアライメントマークに合せることで行う。この位置合せは、ピエゾ素子の伸縮を利用して型部動作機構44をXY方向に動作させることにより行う。これにより、ガラス基板28の中心と型部48の中心との位置ずれが、例えば1μm以下になるような精度で位置合せを行うことができる。   When the mold part 48 is pressed against both surfaces of the glass substrate 28, the expansion and contraction of the piezo element is used. The mold part operation mechanism 44 has an operating range of, for example, about ± 0.4 mm in the Z direction (direction parallel to the perpendicular to both surfaces of the glass substrate 28) due to expansion and contraction of the piezo element. The XY direction, which is a direction perpendicular to the Z direction, has an operating range of about ± 0.6 mm, for example. The mold part 48 is provided with an alignment mark (not shown) in advance. Before the mold part 48 is pressed against both surfaces of the glass substrate 28, the position of the alignment mark is matched with the positions of the inner and outer diameters of the glass substrate 28. Specifically, for example, the end surfaces of the inner and outer diameters of the glass substrate 28 are detected using a laser, and the laser at the position where the end surface is detected is aligned with the alignment mark. This alignment is performed by operating the mold part operation mechanism 44 in the XY directions by using expansion and contraction of the piezo element. Thereby, it is possible to perform alignment with such an accuracy that the positional deviation between the center of the glass substrate 28 and the center of the mold part 48 is, for example, 1 μm or less.

ガラス基板28と型部48との位置合せが終了した後、ピエゾ素子の伸縮を利用して型部動作機構44をZ方向に動作させ、例えば1秒間かけて、型部48をガラス基板28の上部から下部に向かって押し当てていく。そして、型部48をガラス基板28に押し当てていきながら、基板保持機構40を下降させる。これにより、ガラス基板28は型部48で挟まれるようにして保持される。   After the alignment between the glass substrate 28 and the mold part 48 is completed, the mold part operating mechanism 44 is operated in the Z direction by utilizing the expansion and contraction of the piezo element. Push from top to bottom. Then, the substrate holding mechanism 40 is lowered while pressing the mold portion 48 against the glass substrate 28. Thereby, the glass substrate 28 is held so as to be sandwiched between the mold parts 48.

図6(a)において、型部48が押し当てられているガラス基板28の両面の側方に、型部48に形成されている凹凸パターンを樹脂部38に転写するための紫外線照射部50が設けられている。紫外線照射部50は、出射する紫外線(UV光)が型部動作機構44の内部を通過するように配置されている。紫外線(UV光)を樹脂部38に例えば5秒間照射させ、樹脂部38を硬化させる。これにより、型部48に形成された凹凸パターンがガラス基板28の両面に形成された樹脂部38に転写される。   In FIG. 6A, an ultraviolet irradiation unit 50 for transferring the concavo-convex pattern formed on the mold part 48 to the resin part 38 is formed on both sides of the glass substrate 28 against which the mold part 48 is pressed. Is provided. The ultraviolet irradiation unit 50 is arranged so that the emitted ultraviolet light (UV light) passes through the inside of the mold unit operation mechanism 44. The resin part 38 is irradiated with ultraviolet rays (UV light) for 5 seconds, for example, and the resin part 38 is cured. Thereby, the concavo-convex pattern formed on the mold part 48 is transferred to the resin part 38 formed on both surfaces of the glass substrate 28.

図6(b)において、凹凸パターンを樹脂部38に転写させた後、型部48をガラス基板28から引き離す。このときは、型部48をガラス基板28に押し当てる場合と反対の動作を行う。具体的には、ピエゾ素子の伸縮を利用して型部動作機構44をZ方向に動作させ、ガラス基板28の下部から上部に向かって型部48を引き離していく。そして、型部48をガラス基板28の両面から引き離していきながら、基板保持機構40を上昇させる。これにより、ガラス基板28は基板保持機構40で再度保持される。   In FIG. 6B, after transferring the uneven pattern to the resin portion 38, the mold portion 48 is pulled away from the glass substrate 28. At this time, an operation opposite to the case of pressing the mold portion 48 against the glass substrate 28 is performed. Specifically, the mold part operation mechanism 44 is operated in the Z direction by utilizing expansion and contraction of the piezo element, and the mold part 48 is pulled away from the lower part of the glass substrate 28 toward the upper part. Then, the substrate holding mechanism 40 is raised while separating the mold part 48 from both surfaces of the glass substrate 28. As a result, the glass substrate 28 is held again by the substrate holding mechanism 40.

図6(c)において、基板保持機構40を下降させて、ガラス基板28を元のカセット24に収納する。その後、ガラス基板28一枚分カセット24を移動させ、次のガラス基板28に対して図5(a)から図6(c)で示した工程を実行する。このようにして、カセット24に収納されているガラス基板28全てに対して、図5(a)から図6(c)で示した工程を実行する。   In FIG. 6C, the substrate holding mechanism 40 is lowered and the glass substrate 28 is stored in the original cassette 24. Thereafter, the cassette 24 for one glass substrate 28 is moved, and the steps shown in FIGS. 5A to 6C are performed on the next glass substrate 28. In this way, the steps shown in FIGS. 5A to 6C are performed on all the glass substrates 28 accommodated in the cassette 24.

図1および図2に戻り、カセット24に収納されているガラス基板28の全てに対して、樹脂部38へのパターン形成が終了した後、カセット24は磁気記録媒体の製造装置10から搬出される。その後、樹脂部38に形成したパターンに問題がないかどうかパターン検査を行う。パターン検査に合格したガラス基板28は、次にエッチング工程に進む。エッチング工程では、樹脂部38をマスクにして、磁性層をエッチングする。これにより、磁性層にディスクリートトラックメディアやパターンドメディアに対応するパターンが形成される。   Returning to FIGS. 1 and 2, after the pattern formation on the resin portion 38 is completed for all the glass substrates 28 stored in the cassette 24, the cassette 24 is unloaded from the magnetic recording medium manufacturing apparatus 10. . Thereafter, a pattern inspection is performed to check whether there is a problem with the pattern formed on the resin portion 38. The glass substrate 28 that has passed the pattern inspection then proceeds to the etching process. In the etching step, the magnetic layer is etched using the resin portion 38 as a mask. Thereby, a pattern corresponding to a discrete track medium or a patterned medium is formed on the magnetic layer.

実施例1の磁気記録媒体の製造方法によれば、図5(a)のように、樹脂部38が両面に形成されたガラス基板28を基板保持機構40で縦にして保持する。図5(b)のように、縦にして保持されたガラス基板28の両面に凹凸パターンを有する型部48を、型部動作機構44を用いて押し当てる。そして、図6(a)のように、ガラス基板28に型部48を押し当てながらガラス基板28の両面に形成された樹脂部38に紫外線を照射して、樹脂部38に凹凸パターンを転写する。   According to the method of manufacturing the magnetic recording medium of the first embodiment, as shown in FIG. 5A, the glass substrate 28 on which the resin portions 38 are formed on both sides is held vertically by the substrate holding mechanism 40. As shown in FIG. 5B, a mold part 48 having a concavo-convex pattern on both surfaces of a glass substrate 28 held vertically is pressed using a mold part operation mechanism 44. Then, as shown in FIG. 6A, the resin portion 38 formed on both surfaces of the glass substrate 28 is irradiated with ultraviolet rays while pressing the mold portion 48 against the glass substrate 28, and the uneven pattern is transferred to the resin portion 38. .

このように、ガラス基板28を縦にして保持した状態でガラス基板28の両面に型部48を押し当てる場合は、ガラス基板28を地面に平行にした状態で両面に型部48を押し当てる場合に比べて、重力の影響が小さくなる。このため、ガラス基板28の両面に均一な力で型部48を押し当てることが容易となる。これにより、例えば10nm程度の微細なパターンを高精度で形成することが可能となる。よって、ディスクリートトラックメディア型の磁気記録媒体やパターンドメディア型の磁気記録媒体のパターン形成を容易に行うことができ、小型化、大容量化に対応した磁気記録媒体の製造が容易に実行できる。なお、実施例1では、図5(a)のように、ガラス基板28を地面に垂直な状態で縦にしている場合を図示しているがこれに限られない。重力の影響をあまり受けずに、ガラス基板28の両面に均一な力で型部48を押し当てることができる範囲で、ガラス基板28は傾きを有していてもよい。   Thus, when pressing the mold part 48 on both surfaces of the glass substrate 28 with the glass substrate 28 held vertically, the mold part 48 is pressed on both surfaces with the glass substrate 28 parallel to the ground. The effect of gravity is smaller than For this reason, it becomes easy to press the mold part 48 to both surfaces of the glass substrate 28 with a uniform force. Thereby, for example, a fine pattern of about 10 nm can be formed with high accuracy. Accordingly, it is possible to easily form a pattern of a discrete track media type magnetic recording medium or a patterned media type magnetic recording medium, and it is possible to easily manufacture a magnetic recording medium corresponding to downsizing and large capacity. In addition, in Example 1, although the case where the glass substrate 28 is made vertical in the state perpendicular | vertical to the ground like FIG. 5A is illustrated, it is not restricted to this. The glass substrate 28 may have an inclination as long as the mold part 48 can be pressed against the both surfaces of the glass substrate 28 with a uniform force without being affected by the gravity.

また、図6(a)のように、ガラス基板28を型部48で挟むように保持することで、ガラス基板28の両面に同時に紫外線を照射することができる。このため、ガラス基板28の両面に形成された樹脂部38にパターン形成を同時に行うことができる。これにより、磁気記録媒体を量産性に優れて製造することが可能となる。   Further, as shown in FIG. 6A, by holding the glass substrate 28 so as to be sandwiched between the mold portions 48, both surfaces of the glass substrate 28 can be irradiated with ultraviolet rays simultaneously. For this reason, pattern formation can be performed simultaneously on the resin portions 38 formed on both surfaces of the glass substrate 28. This makes it possible to manufacture a magnetic recording medium with excellent mass productivity.

さらに、図5(b)のように、ガラス基板28の両面に型部48を押し当てる際に、型部動作機構44を動作させて、ガラス基板28の上部から下部に向かって型部48を押し当てている。これにより、ガラス基板28と型部48との間に気泡が入り込むことを抑制することができる。よって、ガラス基板28の両面に形成された樹脂部38に、精度良くパターン形成を行うことができる。   Further, as shown in FIG. 5B, when the mold part 48 is pressed against both surfaces of the glass substrate 28, the mold part operating mechanism 44 is operated to move the mold part 48 from the upper part to the lower part of the glass substrate 28. It is pressed. Thereby, bubbles can be prevented from entering between the glass substrate 28 and the mold part 48. Therefore, it is possible to form a pattern with high accuracy on the resin portions 38 formed on both surfaces of the glass substrate 28.

さらに、図5(a)のように、基板保持機構40でガラス基板28の下部を保持することで、ガラス基板28を縦に保持している。そして、図5(b)のように、型部動作機構44を動作させて、ガラス基板28の上部から下部に向かって型部48を押し当てていきながら、基板保持機構40を下降させていくことにより、型部48でガラス基板28を挟むように保持する。この際、基板保持機構40と型部48および型部動作機構44とが接触しないように留意する。これにより、ガラス基板28や型部48の破損を抑制しつつ、ガラス基板28を落下させることなく、型部48でガラス基板28を挟むように保持することが容易にできる。   Further, as shown in FIG. 5A, the glass substrate 28 is held vertically by holding the lower portion of the glass substrate 28 by the substrate holding mechanism 40. Then, as shown in FIG. 5B, the mold holding mechanism 40 is lowered while operating the mold part operating mechanism 44 to press the mold part 48 from the upper part to the lower part of the glass substrate 28. Thus, the glass substrate 28 is held by the mold part 48. At this time, attention should be paid so that the substrate holding mechanism 40 does not contact the mold part 48 and the mold part operation mechanism 44. Thereby, it is possible to easily hold the glass substrate 28 between the mold parts 48 without dropping the glass substrate 28 while suppressing damage to the glass substrate 28 and the mold part 48.

さらに、図6(b)のように、ガラス基板28から型部48を引き離す際、ガラス基板28の下部から上部に向かって型部48を引き離している。そして、型部動作機構44を動作させて、型部48を引き離していきながら、基板保持機構40を上昇させていくことにより、基板保持機構40でガラス基板28を再度保持する。この際、基板保持機構40と型部48および型部動作機構44とが接触しないように留意する。これにより、ガラス基板28や型部48の破損を抑制しつつ、ガラス基板28を落下させることなく、基板保持機構40でガラス基板28を再度保持することが容易にできる。   Further, as shown in FIG. 6B, when the mold part 48 is pulled away from the glass substrate 28, the mold part 48 is pulled away from the lower part of the glass substrate 28 toward the upper part. Then, the glass substrate 28 is held again by the substrate holding mechanism 40 by moving the substrate holding mechanism 40 while operating the mold part operating mechanism 44 and pulling the mold part 48 apart. At this time, attention should be paid so that the substrate holding mechanism 40 does not contact the mold part 48 and the mold part operation mechanism 44. Thereby, it is possible to easily hold the glass substrate 28 again by the substrate holding mechanism 40 without dropping the glass substrate 28 while suppressing damage to the glass substrate 28 and the mold part 48.

さらに、図5(b)のように、型部動作機構44はピエゾ素子からなり、ピエゾ素子の伸縮を利用して型部動作機構44を動作させることにより、ガラス基板28に型部48を押し当てている。このように、ピエゾ素子の伸縮を利用して型部動作機構44を動作させることで、型部動作機構44を高精度に制御することが可能となる。したがって、型部48をガラス基板28の両面に押し当てる力を高精度に制御することが可能となる。このため、ガラス基板28の両面に形成された樹脂部38に微細なパターンを高精度で形成することが可能となる。   Further, as shown in FIG. 5B, the mold part operation mechanism 44 is composed of a piezo element, and the mold part operation mechanism 44 is operated by using the expansion and contraction of the piezo element to push the mold part 48 against the glass substrate 28. I guess. In this way, by operating the mold part operation mechanism 44 using expansion and contraction of the piezo element, the mold part operation mechanism 44 can be controlled with high accuracy. Therefore, the force for pressing the mold part 48 against both surfaces of the glass substrate 28 can be controlled with high accuracy. For this reason, it becomes possible to form a fine pattern with high accuracy on the resin portion 38 formed on both surfaces of the glass substrate 28.

なお、実施例1では、型部動作機構44はピエゾ素子からなり、ピエゾ素子の伸縮を利用して型部動作機構44を動作させる場合を例に示したが、これに限られるわけではない。例えば、ステッピングモーター等のような機械的な制御により型部動作機構44の動作を制御する場合でもよい。例えば、ガス圧等を利用して型部動作機構44の動作を制御する場合でもよい。つまり、型部動作機構44の動作を高精度で制御することができれば、種々の方法で型部動作機構44を動作させる場合でもよい。この場合、型部動作機構44には、使用する方法に最も適した材料を用いることが好ましい。   In the first embodiment, the mold part operation mechanism 44 includes a piezo element, and the case where the mold part operation mechanism 44 is operated using expansion and contraction of the piezo element is described as an example. However, the present invention is not limited thereto. For example, the operation of the mold part operation mechanism 44 may be controlled by mechanical control such as a stepping motor. For example, the operation of the mold part operation mechanism 44 may be controlled using gas pressure or the like. In other words, the mold part operation mechanism 44 may be operated by various methods as long as the operation of the mold part operation mechanism 44 can be controlled with high accuracy. In this case, it is preferable to use a material most suitable for the method to be used for the mold part operation mechanism 44.

さらに、図5(b)のように、型部48には予めアライメントマークが設けられていて、型部48をガラス基板28に押し当てる前に、アライメントマークを用いて、型部48とガラス基板28との位置合せを行っている。これにより、樹脂部38に位置精度良く、パターン形成を行うことができる。特に、実施例1では、ピエゾ素子の伸縮を利用して型部動作機構44を動作させることで、型部48とガラス基板28との位置合せをしている。このため、型部動作機構44の動作を高精度で制御することができ、型部48とガラス基板28との微細な位置調整が可能となる。したがって、樹脂部38に更に高精度にパターン形成を行うことが可能となる。   Further, as shown in FIG. 5B, the mold part 48 is provided with an alignment mark in advance, and before the mold part 48 is pressed against the glass substrate 28, the alignment part is used to form the mold part 48 and the glass substrate. Alignment with 28 is performed. Thereby, pattern formation can be performed on the resin portion 38 with high positional accuracy. In particular, in the first embodiment, the mold part 48 and the glass substrate 28 are aligned by operating the mold part operation mechanism 44 by using expansion and contraction of the piezoelectric element. Therefore, the operation of the mold part operation mechanism 44 can be controlled with high accuracy, and fine position adjustment between the mold part 48 and the glass substrate 28 can be performed. Therefore, it is possible to form a pattern on the resin portion 38 with higher accuracy.

樹脂部38の形成は、図4(a)のように、移送冶具26を用いて、例えば25枚のガラス基板28を液状の樹脂36で満たされた浴槽30に浸漬させる。図4(b)のように、液状の樹脂36の液面を降下させて、ガラス基板28を徐々に液状の樹脂36から取り出す。そして、図4(c)のように、ガラス基板28を液状の樹脂36から完全に取り出して、ガラス基板28の両面に樹脂部38を形成する。この方法により、複数のガラス基板28の両面に一括して樹脂部38を形成することができる。つまり、量産性に優れて樹脂部38を形成することができる。また、複数のガラス基板28の両面に形成される樹脂部38の膜厚を均一に形成することができる。ガラス基板28の両面に形成された樹脂部38の膜厚が均一である場合は、型部48をガラス基板28の両面により均一な力で押し当てることができる。したがって、微細なパターンを高精度に形成することがより容易にできる。   As shown in FIG. 4A, the resin portion 38 is formed by immersing, for example, 25 glass substrates 28 in a bath 30 filled with a liquid resin 36 using the transfer jig 26. As shown in FIG. 4B, the liquid level of the liquid resin 36 is lowered, and the glass substrate 28 is gradually taken out from the liquid resin 36. Then, as shown in FIG. 4C, the glass substrate 28 is completely removed from the liquid resin 36, and the resin portions 38 are formed on both surfaces of the glass substrate 28. By this method, the resin portions 38 can be formed collectively on both surfaces of the plurality of glass substrates 28. That is, the resin part 38 can be formed with excellent mass productivity. Moreover, the film thickness of the resin part 38 formed in both surfaces of the some glass substrate 28 can be formed uniformly. When the film thickness of the resin portion 38 formed on both surfaces of the glass substrate 28 is uniform, the mold portion 48 can be pressed against the both surfaces of the glass substrate 28 with a uniform force. Therefore, a fine pattern can be more easily formed with high accuracy.

なお、実施例1では、液状の樹脂36の液面を降下させて、ガラス基板28を液状の樹脂36から徐々に取り出していく方法を例に示したがこの方法に限られない。例えば、移送冶具26を上昇させることで、ガラス基板28を液状の樹脂36から徐々に取り出していく場合でもよい。   In the first embodiment, the method of lowering the liquid level of the liquid resin 36 and gradually taking out the glass substrate 28 from the liquid resin 36 is described as an example, but the present invention is not limited to this method. For example, the glass substrate 28 may be gradually removed from the liquid resin 36 by raising the transfer jig 26.

さらに、実施例1において、樹脂部38は紫外線硬化型の樹脂を用いた場合を例に示したがこれに限らず、例えば熱硬化型の樹脂を用いる場合でもよい。この場合でも、図5(b)のように、ガラス基板28を縦にした状態で、型部48をガラス基板28の両面に押し当てることで、押し当てる力を均一にすることができる。よって、ガラス基板28の両面に形成された樹脂部38に、微細なパターンを精度良く形成することが可能となる。また、樹脂部38に熱硬化型の樹脂を用いた場合は、図6(a)で示す紫外線照射部50の代わりに、樹脂部38を加熱して、型部48に形成された凹凸パターンを樹脂部38に転写するための加熱装置が必要となる。   Further, in the first embodiment, the resin portion 38 has been described as an example using an ultraviolet curable resin, but the present invention is not limited thereto, and for example, a thermosetting resin may be used. Even in this case, the pressing force can be made uniform by pressing the mold portion 48 against both surfaces of the glass substrate 28 in a state where the glass substrate 28 is vertical as shown in FIG. Therefore, a fine pattern can be accurately formed on the resin portions 38 formed on both surfaces of the glass substrate 28. When a thermosetting resin is used for the resin part 38, the resin part 38 is heated instead of the ultraviolet irradiation part 50 shown in FIG. A heating device for transferring to the resin part 38 is required.

さらに、図1のように、磁気記録媒体の製造装置10は、洗浄部12、検査部14、密着層形成部16、樹脂部形成部18、インプリント部20、制御部22と、を有している。そして、制御部22の指示により、洗浄部12、検査部14、密着層形成部16、樹脂部形成部18、インプリント部20との間を、ガラス基板28はカセット・トュ・カセットで搬送され、それぞれの工程を連続で処理している。これにより、ガラス基板28へのパーティクルの付着を抑制することができ、歩留まりの向上を図ることができる。   Further, as shown in FIG. 1, the magnetic recording medium manufacturing apparatus 10 includes a cleaning unit 12, an inspection unit 14, an adhesion layer forming unit 16, a resin unit forming unit 18, an imprint unit 20, and a control unit 22. ing. Then, the glass substrate 28 is transported in a cassette-to-cassette between the cleaning unit 12, the inspection unit 14, the adhesion layer forming unit 16, the resin unit forming unit 18, and the imprint unit 20 according to an instruction from the control unit 22. , Each process is processed continuously. Thereby, the adhesion of particles to the glass substrate 28 can be suppressed, and the yield can be improved.

さらに、図5(b)に示す、型部固定用リング46の厚さWはガラス基板28の厚さの半分以下である場合が好ましい。型部動作機構44の内部径Lはガラス基板28の外径より大きい場合が好ましい。これらにより、ガラス基板28の両面に型部48を押し当てることが可能となる。また、型部動作機構44のZ方向の稼動範囲は型部48の厚さの倍程度である場合が好ましい。   Furthermore, it is preferable that the thickness W of the mold portion fixing ring 46 shown in FIG. 5B is not more than half the thickness of the glass substrate 28. The inner diameter L of the mold part operation mechanism 44 is preferably larger than the outer diameter of the glass substrate 28. Thus, the mold part 48 can be pressed against both surfaces of the glass substrate 28. Further, it is preferable that the working range in the Z direction of the mold part operation mechanism 44 is about twice the thickness of the mold part 48.

以上、本発明の実施例について詳述したが、本発明は係る特定の実施例に限定されるものではなく、特許請求の範囲に記載された本発明の要旨の範囲内において、種々の変形・変更が可能である。   Although the embodiments of the present invention have been described in detail above, the present invention is not limited to such specific embodiments, and various modifications and changes can be made within the scope of the gist of the present invention described in the claims. It can be changed.

最後に、本明細書開示の磁気記録媒体の製造方法及び磁気記録媒体の製造装置をまとめると、以下の通りとなる。   Finally, the magnetic recording medium manufacturing method and the magnetic recording medium manufacturing apparatus disclosed in this specification are summarized as follows.

(付記1) 表面と裏面とに樹脂部が形成された基板を縦にして保持する工程と、縦にして保持された前記基板の表面と裏面とに凹凸パターンを有する型部を押し当てる工程と、前記基板に前記型部を押し当てながら前記基板の表面と裏面とに形成された前記樹脂部に凹凸パターンを転写する工程と、を有することを特徴とする磁気記録媒体の製造方法である。   (Additional remark 1) The process of hold | maintaining the board | substrate with which the resin part was formed vertically on the surface and the back surface, and the process of pressing the type | mold part which has an uneven | corrugated pattern on the surface and back surface of the said board | substrate held vertically. And a step of transferring a concavo-convex pattern to the resin portion formed on the front surface and the back surface of the substrate while pressing the mold portion against the substrate.

(付記2) 前記型部を押し当てる工程は、前記基板の上部から下部に向かって前記型部を押し当てる工程を含むことを特徴とする付記1記載の磁気記録媒体の製造方法。   (Supplementary note 2) The method of manufacturing a magnetic recording medium according to supplementary note 1, wherein the step of pressing the mold part includes a step of pressing the mold part from an upper part to a lower part of the substrate.

(付記3) 前記基板を縦にして保持する工程は、前記基板の下部を基板保持機構で保持することにより、前記基板を縦にして保持する工程を含み、前記型部を押し当てる工程を行いながら、前記基板保持機構を下降させていくことにより、前記型部で前記基板を保持する工程を有することを特徴とする付記2記載の磁性記録媒体の製造方法。   (Supplementary Note 3) The step of holding the substrate vertically includes the step of holding the substrate vertically by holding the lower portion of the substrate with a substrate holding mechanism, and performing the step of pressing the mold part However, the method for manufacturing a magnetic recording medium according to claim 2, further comprising a step of holding the substrate by the mold part by lowering the substrate holding mechanism.

(付記4) 前記凹凸パターンを転写する工程の後、前記基板の下部から上部に向かって前記基板から前記型部を引き離す工程と、前記型部を引き離す工程を行いながら、前記基板保持機構を上昇させていくことにより、前記基板保持機構で前記基板を再度保持する工程と、を有することを特徴とする付記3記載の磁気記録媒体の製造方法。   (Supplementary Note 4) After the step of transferring the concavo-convex pattern, the substrate holding mechanism is raised while performing the step of separating the mold part from the substrate from the bottom to the top of the substrate and the step of separating the mold part. The method for producing a magnetic recording medium according to appendix 3, further comprising: holding the substrate again by the substrate holding mechanism.

(付記5) 前記型部を押し当てる工程は、ピエゾ素子の伸縮を利用して、前記基板に前記型部を押し当てる工程を含むことを特徴とする付記1から4のいずれかに記載の磁気記録媒体の製造方法。   (Additional remark 5) The process of pressing the said mold part includes the process of pressing the said mold part on the said board | substrate using the expansion-contraction of a piezoelectric element, The magnetic in any one of Additional remark 1 to 4 characterized by the above-mentioned. A method for manufacturing a recording medium.

(付記6) 前記型部を押し当てる工程の前に、縦にして保持された前記基板と前記型部との位置合せを行う工程を有することを特徴とする付記1から5のいずれかに記載の磁気記録媒体の製造方法。   (Additional remark 6) Before the process of pressing the said mold part, it has the process of aligning the said board | substrate hold | maintained vertically and the said mold part, The additional statement 1 to 5 characterized by the above-mentioned. Manufacturing method of magnetic recording medium.

(付記7) 前記基板を洗浄する工程と、洗浄後の前記基板に付着したパーティクルを検査する工程と、前記パーティクル検査に合格した前記基板の表面と裏面とに前記樹脂部を形成する工程と、を有することを特徴とする付記1から6のいずれかに記載の磁気記録媒体の製造方法。   (Appendix 7) A step of cleaning the substrate, a step of inspecting particles adhering to the substrate after cleaning, a step of forming the resin portion on the front and back surfaces of the substrate that have passed the particle inspection, The method for manufacturing a magnetic recording medium according to any one of appendices 1 to 6, wherein:

(付記8) 前記樹脂部を形成する工程は、液状の樹脂で満たされた浴槽に前記基板を浸漬させた後、前記液状の樹脂から前記基板を取り出すことにより、前記樹脂部を形成する工程を含むことを特徴とする付記7記載の磁気記録媒体の製造方法。   (Appendix 8) The step of forming the resin portion includes the step of forming the resin portion by immersing the substrate in a bath filled with a liquid resin and then removing the substrate from the liquid resin. The method for manufacturing a magnetic recording medium according to appendix 7, wherein the method includes:

(付記9) 表面と裏面とに樹脂部が形成された基板を縦にして保持する基板保持機構と、縦にして保持された前記基板の表面と裏面とに凹凸パターンを有する型部を押し当てる型部動作機構と、前記基板に前記型部を押し当てながら前記基板の表面と裏面とに形成された前記樹脂部に前記凹凸パターンを転写する転写手段と、を具備することを特徴とする磁気記録媒体の製造装置。   (Supplementary Note 9) A substrate holding mechanism that holds a substrate having a resin portion formed on the front surface and the back surface in a vertical direction, and a mold portion having an uneven pattern is pressed against the front surface and the back surface of the substrate held in the vertical direction. A magnetic part comprising: a mold part operating mechanism; and a transfer means for transferring the concavo-convex pattern to the resin part formed on the front and back surfaces of the substrate while pressing the mold part against the substrate. Recording medium manufacturing equipment.

(付記10) 前記型部動作機構は、前記基板の上部から下部に向かって前記型部を押し当てていくことを特徴とする付記9記載の磁気記録媒体の製造装置。   (Additional remark 10) The said mold part operation | movement mechanism presses the said mold part toward the lower part from the upper part of the said board | substrate, The manufacturing apparatus of the magnetic recording medium of Additional remark 9 characterized by the above-mentioned.

(付記11) 前記型部動作機構が前記基板に前記型部を押し当てていく際に、前記基板保持機構は下降していくことにより、前記型部で前記基板を保持することを特徴とする付記10記載の磁気記録媒体の製造装置。   (Additional remark 11) When the said mold part operation | movement mechanism presses the said mold part against the said board | substrate, the said board | substrate holding mechanism descend | falls, The said mold part hold | maintains the said board | substrate. The apparatus for manufacturing a magnetic recording medium according to appendix 10.

(付記12) 前記型部動作機構は前記基板の下部から上部に向かって前記基板から前記型部を引き離していき、前記型部動作機構が前記基板から前記型部を引き離していく際に、前記基板保持機構が上昇していくことにより、前記基板保持機構で前記基板を再度保持することを特徴とする付記11記載の磁気記録媒体の製造装置。   (Additional remark 12) The said mold part operation | movement mechanism pulls the said mold part away from the said board | substrate toward the upper part from the lower part of the said board | substrate, and when the said mold part operation | movement mechanism pulls the said mold part away from the said board | substrate, 12. The apparatus for manufacturing a magnetic recording medium according to claim 11, wherein the substrate holding mechanism is moved upward to hold the substrate again by the substrate holding mechanism.

(付記13) 前記型部動作機構はピエゾ素子で形成されていて、前記ピエゾ素子の伸縮を利用して、前記基板に前記型部を押し当てることを特徴とする付記9から12のいずれかに記載の磁気記録媒体の製造装置。   (Additional remark 13) The said mold part operation | movement mechanism is formed with the piezo element, The expansion / contraction of the said piezo element is utilized, The said mold part is pressed against the said board | substrate, The any one of Additional remarks 9-12 characterized by the above-mentioned. The manufacturing apparatus of a magnetic recording medium as described.

(付記14) 前記型部動作機構は、縦にして保持された前記基板と前記型部との位置合せを行うことを特徴とする付記9から13のいずれかに記載の磁気記録媒体の製造装置。   (Supplementary note 14) The apparatus for manufacturing a magnetic recording medium according to any one of Supplementary notes 9 to 13, wherein the mold part operating mechanism performs alignment between the mold part and the substrate held vertically. .

(付記15) 前記基板を洗浄する洗浄部と、洗浄後の前記基板に付着したパーティクルを検査する検査部と、前記パーティクル検査に合格した前記基板の表面と裏面とに前記樹脂部を形成する樹脂部形成部と、前記洗浄部と前記検査部と前記樹脂部形成部との処理を連続して実行させる制御部と、を具備することを特徴とする付記9から14のいずれかに記載の磁気記録媒体の製造装置。   (Additional remark 15) The resin which forms the said resin part in the washing | cleaning part which wash | cleans the said board | substrate, the test | inspection part which test | inspects the particle adhering to the said board | substrate after washing | cleaning, and the surface and back surface of the said board | substrate which passed the said particle test | inspection A magnetic part according to any one of appendices 9 to 14, further comprising: a part forming part; and a control part that continuously executes the processing of the cleaning part, the inspection part, and the resin part forming part. Recording medium manufacturing equipment.

図1は実施例1に係る磁性記録媒体の製造装置のブロック図である。FIG. 1 is a block diagram of a magnetic recording medium manufacturing apparatus according to the first embodiment. 図2は実施例1に係る磁性記録媒体の製造方法を示すフローチャート図である。FIG. 2 is a flowchart illustrating the method for manufacturing the magnetic recording medium according to the first embodiment. 図3(a)から図3(c)は、密着層を形成する工程を示す断面模式図である。FIG. 3A to FIG. 3C are schematic cross-sectional views showing a process for forming an adhesion layer. 図4(a)から図4(c)は、樹脂部を形成する工程を示す断面模式図である。FIG. 4A to FIG. 4C are schematic cross-sectional views showing a process for forming a resin portion. 図5(a)および図5(b)は、インプリントにより樹脂部にパターン形成する工程を示す断面模式図(その1)である。FIG. 5A and FIG. 5B are schematic cross-sectional views (No. 1) showing a process of forming a pattern on a resin portion by imprinting. 図6(a)から図6(c)は、インプリントにより樹脂部にパターン形成する工程を示す断面模式図(その2)である。FIG. 6A to FIG. 6C are schematic cross-sectional views (part 2) showing the process of forming a pattern on the resin portion by imprinting.

符号の説明Explanation of symbols

10 磁気記録媒体の製造装置
12 洗浄部
14 検査部
16 密着層形成部
18 樹脂部形成部
20 インプリント部
22 制御部
24 カセット
26 移送冶具
28 ガラス基板
30 浴槽
32 密着液
34 密着層
36 液状の樹脂
38 樹脂部
40 基板保持機構
42 溝部
44 型部動作機構
46 型部固定用リング
48 型部
50 紫外線照射部
DESCRIPTION OF SYMBOLS 10 Magnetic recording medium manufacturing apparatus 12 Cleaning part 14 Inspection part 16 Adhesion layer formation part 18 Resin part formation part 20 Imprint part 22 Control part 24 Cassette 26 Transfer jig 28 Glass substrate 30 Bathtub 32 Adhesion liquid 34 Adhesion layer 36 Liquid resin 38 Resin part 40 Substrate holding mechanism 42 Groove part 44 Mold part operation mechanism 46 Mold part fixing ring 48 Mold part 50 Ultraviolet irradiation part

Claims (10)

表面と裏面とに樹脂部が形成された基板を縦にして保持する工程と、
縦にして保持された前記基板の表面と裏面とに凹凸パターンを有する型部を押し当てる工程と、
前記基板に前記型部を押し当てながら前記基板の表面と裏面とに形成された前記樹脂部に前記凹凸パターンを転写する工程と、を有することを特徴とする磁気記録媒体の製造方法。
A step of vertically holding a substrate having a resin portion formed on the front surface and the back surface;
Pressing the mold part having a concavo-convex pattern on the front and back surfaces of the substrate held vertically; and
And a step of transferring the concavo-convex pattern to the resin portion formed on the front surface and the back surface of the substrate while pressing the mold portion against the substrate.
前記型部を押し当てる工程は、前記基板の上部から下部に向かって前記型部を押し当てる工程を含むことを特徴とする請求項1記載の磁気記録媒体の製造方法。   The method of manufacturing a magnetic recording medium according to claim 1, wherein the step of pressing the mold portion includes a step of pressing the mold portion from an upper part to a lower part of the substrate. 前記基板を縦にして保持する工程は、前記基板の下部を基板保持機構で保持することにより、前記基板を縦にして保持する工程を含み、
前記型部を押し当てる工程を行いながら、前記基板保持機構を下降させていくことにより、前記型部で前記基板を保持する工程を有することを特徴とする請求項2記載の磁性記録媒体の製造方法。
The step of holding the substrate vertically includes the step of holding the substrate vertically by holding the lower portion of the substrate with a substrate holding mechanism,
3. The method of manufacturing a magnetic recording medium according to claim 2, further comprising a step of holding the substrate by the mold part by lowering the substrate holding mechanism while performing the step of pressing the mold part. Method.
前記凹凸パターンを転写する工程の後、前記基板の下部から上部に向かって前記基板から前記型部を引き離す工程と、
前記型部を引き離す工程を行いながら、前記基板保持機構を上昇させていくことにより、前記基板保持機構で前記基板を再度保持する工程と、を有することを特徴とする請求項3記載の磁気記録媒体の製造方法。
After the step of transferring the concavo-convex pattern, the step of pulling the mold part away from the substrate from the bottom to the top of the substrate;
4. The magnetic recording method according to claim 3, further comprising the step of holding the substrate again by the substrate holding mechanism by raising the substrate holding mechanism while performing the step of separating the mold part. A method for manufacturing a medium.
前記型部を押し当てる工程は、ピエゾ素子の伸縮を利用して、前記基板に前記型部を押し当てる工程を含むことを特徴とする請求項1から4のいずれか一項記載の磁気記録媒体の製造方法。   5. The magnetic recording medium according to claim 1, wherein the step of pressing the mold portion includes a step of pressing the mold portion against the substrate by using expansion and contraction of a piezo element. Manufacturing method. 表面と裏面とに樹脂部が形成された基板を縦にして保持する基板保持機構と、
縦にして保持された前記基板の表面と裏面とに凹凸パターンを有する型部を押し当てる型部動作機構と、
前記基板に前記型部を押し当てながら前記基板の表面と裏面とに形成された前記樹脂部に前記凹凸パターンを転写する転写手段と、を具備することを特徴とする磁気記録媒体の製造装置。
A substrate holding mechanism for vertically holding a substrate having a resin portion formed on the front surface and the back surface;
A mold part operating mechanism for pressing a mold part having a concavo-convex pattern on the front and back surfaces of the substrate held vertically;
An apparatus for manufacturing a magnetic recording medium, comprising: transfer means for transferring the concavo-convex pattern to the resin portion formed on the front surface and the back surface of the substrate while pressing the mold portion against the substrate.
前記型部動作機構は、前記基板の上部から下部に向かって前記型部を押し当てていくことを特徴とする請求項6記載の磁気記録媒体の製造装置。   7. The apparatus for manufacturing a magnetic recording medium according to claim 6, wherein the mold part operating mechanism presses the mold part from the upper part to the lower part of the substrate. 前記型部動作機構が前記基板に前記型部を押し当てていく際に、前記基板保持機構は下降していくことにより、前記型部で前記基板を保持することを特徴とする請求項7記載の磁気記録媒体の製造装置。   8. The substrate holding mechanism holds the substrate by the mold portion when the mold portion operating mechanism presses the mold portion against the substrate, and the substrate portion is held by the mold portion. Manufacturing apparatus for magnetic recording media. 前記型部動作機構は前記基板の下部から上部に向かって前記基板から前記型部を引き離していき、前記型部動作機構が前記基板から前記型部を引き離していく際に、前記基板保持機構が上昇していくことにより、前記基板保持機構で前記基板を再度保持することを特徴とする請求項8記載の磁気記録媒体の製造装置。   The mold part operating mechanism pulls the mold part away from the substrate from the bottom to the top of the substrate. When the mold part operating mechanism pulls the mold part away from the substrate, the substrate holding mechanism 9. The apparatus for manufacturing a magnetic recording medium according to claim 8, wherein the substrate is held again by the substrate holding mechanism by being raised. 前記型部動作機構はピエゾ素子で形成されていて、前記ピエゾ素子の伸縮を利用して、前記基板に前記型部を押し当てることを特徴とする請求項6から9のいずれか一項記載の磁気記録媒体の製造装置。   The said mold part operation | movement mechanism is formed with the piezo element, The said mold part is pressed on the said board | substrate using the expansion / contraction of the said piezo element, The Claim 6 characterized by the above-mentioned. Magnetic recording medium manufacturing equipment.
JP2008069878A 2008-03-18 2008-03-18 Method and apparatus for manufacturing magnetic recording medium Expired - Fee Related JP5003545B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008069878A JP5003545B2 (en) 2008-03-18 2008-03-18 Method and apparatus for manufacturing magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008069878A JP5003545B2 (en) 2008-03-18 2008-03-18 Method and apparatus for manufacturing magnetic recording medium

Publications (2)

Publication Number Publication Date
JP2009223998A true JP2009223998A (en) 2009-10-01
JP5003545B2 JP5003545B2 (en) 2012-08-15

Family

ID=41240600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008069878A Expired - Fee Related JP5003545B2 (en) 2008-03-18 2008-03-18 Method and apparatus for manufacturing magnetic recording medium

Country Status (1)

Country Link
JP (1) JP5003545B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102820A (en) * 2008-09-29 2010-05-06 Fujifilm Corp Mold structure, and imprint method and magnetic transfer method using the same
JP2014022378A (en) * 2012-07-12 2014-02-03 Canon Inc Imprint device and method of manufacturing article using the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005056535A (en) * 2003-08-07 2005-03-03 Tdk Corp Method and device for manufacturing magnetic recording medium
JP2005276265A (en) * 2004-03-23 2005-10-06 Fuji Photo Film Co Ltd Magnetic transfer method and magnetic recording medium
JP2006185545A (en) * 2004-12-28 2006-07-13 Toshiba Corp Magnetic disk and magnetic disk apparatus provided with the same
JP2008251141A (en) * 2007-03-30 2008-10-16 Fujifilm Corp Mold structural and its manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005056535A (en) * 2003-08-07 2005-03-03 Tdk Corp Method and device for manufacturing magnetic recording medium
JP2005276265A (en) * 2004-03-23 2005-10-06 Fuji Photo Film Co Ltd Magnetic transfer method and magnetic recording medium
JP2006185545A (en) * 2004-12-28 2006-07-13 Toshiba Corp Magnetic disk and magnetic disk apparatus provided with the same
JP2008251141A (en) * 2007-03-30 2008-10-16 Fujifilm Corp Mold structural and its manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010102820A (en) * 2008-09-29 2010-05-06 Fujifilm Corp Mold structure, and imprint method and magnetic transfer method using the same
JP2014022378A (en) * 2012-07-12 2014-02-03 Canon Inc Imprint device and method of manufacturing article using the same

Also Published As

Publication number Publication date
JP5003545B2 (en) 2012-08-15

Similar Documents

Publication Publication Date Title
JP5232077B2 (en) Microstructure transfer device
JP4478164B2 (en) MICROSTRUCTURE TRANSFER APPARATUS, STAMPER, AND MICROSTRUCTURE MANUFACTURING METHOD
JP4939134B2 (en) Imprint apparatus and imprint method
JP5875250B2 (en) Imprint apparatus, imprint method, and device manufacturing method
JP2009241330A (en) Fine structure transferring stamper and fine structure transferring apparatus
JP5427389B2 (en) Manufacturing method and manufacturing apparatus of resin stamper and imprint method
JP2008012858A (en) Imprinting device and imprinting method
JPWO2008142784A1 (en) Imprint device
JP2010049745A (en) Mold for nano-imprint, and magnetic recording medium fabricated by using the same
JP4482047B2 (en) Imprint method
JP5492369B2 (en) Transfer mold and transfer method
JP5416420B2 (en) Microstructure transfer device
JP4220282B2 (en) Nanoprint apparatus and fine structure transfer method
WO2012060375A1 (en) Imprint mold for manufacturing bit-patterned media, and method for manufacturing same
JP2008119870A (en) Imprinting mold
JP5003545B2 (en) Method and apparatus for manufacturing magnetic recording medium
JP6384023B2 (en) Imprint mold and method for producing imprint mold
KR102059758B1 (en) Imprint apparatus and article manufacturing method
WO2015141604A1 (en) Imprint apparatus and method of manufacturing article
JP2010023360A (en) Imprinting method, preimprinting mold, method of manufacturing preimprinting mold and imprinting device
JP2012064878A (en) Pattern formation method and imprint mold manufacturing method
JP6314609B2 (en) Imprint replica mold and manufacturing method of imprint replica mold
JP2021052074A (en) Flattening device, method for manufacturing article, flattening method, and imprint device
JP5477562B2 (en) Imprint method and assembly imprint mold
JP5052660B2 (en) MOLD, MOLD MANUFACTURING METHOD, AND MOLD TRANSFER METHOD

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101018

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110920

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120313

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120405

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120424

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120507

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150601

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees