JP2007500760A - 吸水性を低減したポリホルマールおよびコポリホルマール、その製造およびその使用 - Google Patents
吸水性を低減したポリホルマールおよびコポリホルマール、その製造およびその使用 Download PDFInfo
- Publication number
- JP2007500760A JP2007500760A JP2006521435A JP2006521435A JP2007500760A JP 2007500760 A JP2007500760 A JP 2007500760A JP 2006521435 A JP2006521435 A JP 2006521435A JP 2006521435 A JP2006521435 A JP 2006521435A JP 2007500760 A JP2007500760 A JP 2007500760A
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- JP
- Japan
- Prior art keywords
- polyformal
- residue
- hydroxyphenyl
- bis
- copolyformal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 238000010521 absorption reaction Methods 0.000 title abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 16
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 70
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 42
- 125000003118 aryl group Chemical group 0.000 claims description 19
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
- C08G2650/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group
- C08G2650/44—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group containing acetal or formal groups
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- Organic Chemistry (AREA)
- Polyesters Or Polycarbonates (AREA)
- Materials For Medical Uses (AREA)
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Abstract
Description
ここで、n1は1〜10、好ましくは1〜5、特に好ましくは1〜3、非常に特に好ましくは3を表し、記号Rは互いに独立していずれか所望の置換基、好ましくはアルキル、アルケニル、アリールまたはハロゲン残基、好ましくはアルキル残基、特に好ましくは1〜10個の炭素原子を有するアルキル残基、非常に特に好ましくは1〜5個の炭素原子を有するアルキル残基、特に1〜3個の炭素原子を有するアルキル残基を表し、式Bの特に好適なこのような残基は、Rがメチルを表す場合のものであり、最も特別には記号Rが同じ残基を表す場合のものであり、かつ
kは1〜4000、好ましくは2〜2000、特に好ましくは2〜1000および非常に特に好ましくは2〜500および特に好ましくは2〜300の整数を表し、oは1〜4000、好ましくは1〜2000、特に好ましくは1〜1000および非常に特に好ましくは1〜500および特に好ましくは1〜300の数を表し、mはz/oの分数を表し、nは(o−z)/oの分数を表し、zは1〜oの数を表す。
Xは、単結合または−SO2−、−CO−、−S−、−O−、C1〜C6アルキレン、好ましくはC1〜C3アルキレンおよび特に好ましくはメチレン残基;C2〜C5アルキリデン、好ましくはC2〜C3アルキリデン残基;C5〜C6シクロアルキリデン、好ましくはシクロヘキシル残基を示し、これらはC1〜C6アルキル、好ましくはメチルまたはエチル残基、またはC6〜C12アリーレン残基で置換されてもよく、さらに複素原子を含有する芳香族環と任意に縮環してもよく、pは1〜4000、好ましくは2〜2000、特に好ましくは2〜1000および非常に特に好ましくは2〜500および特に2〜300の整数を表し、qはz/pの分数を表し、rは(p−z)/pの分数を表し、zは1〜pの数を表す。
公知のように安全パネルは、建築、自動車および飛行機の多くの領域において、およびヘルメットのバイザーとして求められている。
1.フィルム、例えばスキーフィルムの製造。
2.例えば駅や温室のルーフィング建物用、および照明システム用の透光性シート、特にセル形シート。
3.光データ記憶媒体の製造。
4.信号機の外被または交通標識の製造用。
5.発泡体製造用(例えばDE−B 1031507号公報参照)
6.糸および繊維の製造用(例えばDE−B 1137167号公報およびDE−A 1785137号公報参照)
7.照明用途用のガラスファイバを含有する半透明のプラスチックとして(例えばDE−A1554020号公報参照)。
8.透光性および光散乱性成形体の製造用の硫酸バリウム、二酸化チタンおよび/または酸化ジルコニウムまたは有機ポリマー状アクリレートゴムを含有する半透明のプラスチックとして(EP−A634445号公報、EP−A269324号公報)。
9.精密射出成形、例えばレンズ取り付け具の製造用。この目的のために使用されるポリホルマールは、ガラスファイバおよび任意にさらに全重量に関して約1〜10重量%のMoS2を含有する。
10.光学装置部品、特にスチールおよびビデオカメラ用レンズの製造用(例えばDE−A2701173号公報参照)。
11.透光性物質、特に光ファイバケーブルとして(例えば、EP−A0089801号公報参照)。
12.導電体用およびプラグソケットおよびコネクタ用の絶縁材料として。
13.香水、アフターシェーブローションおよび汗に対する耐性を改良した携帯電話ケースの製造。
14.ネットワークインターフェイス装置。
15.有機光伝導体用基材。
16.トーチおよびランプ、例えばストリップライトまたはヘッドライト/スポットライトランプ、ディフューザディスクまたは内部レンズの製造用。
17.医療用途、例えば酸素供給器、透析装置用。
18.食品用途、例えばボトル、陶器類およびチョコレート型用。
19.燃料や潤滑剤との接触が起こりうる自動車用途、例えばバンパー用、任意にABSまたは好適なゴムとの好適な混合物の形態である。
20.スポーツ用品、例えばスラロームのポール、スキーブーツの留め具用。
21.家庭用品、例えば台所シンクおよび郵便ボックス用。
22.外被、例えば配電キャビネット用。
23.電動歯ブラシ用外被およびヘアードライヤー外被。
24.洗浄液に対する耐性を改良した透明な洗浄装置の窓。
25.安全眼鏡、視力矯正眼鏡。
26.調理中の蒸気、特に油の蒸気に対する耐性を改良した調理施設用ランプカバー。
27.薬剤配合用包装フィルム。
28.チップボックスおよびチップキャリア。
29.他の用途、例えば牛舎の給飼扉または動物のケージ用。
・GPCによれば、分子量Mw=38345、Mn=20138、D=1.90
(ポリカーボネートに対するキャリブレーション)
・ガラス転移温度Tg=170℃
・塩化メチレン中での相対溶液粘度(0.5g/100mlの溶液)=1.234
・GPCによれば、分子量Mw=31732、Mn=3465(ポリカーボネートに対するキャリブレーション)。環状不純物を今回分離しなかった。材料をアセトンと混練することができず、したがって同様の環状不純物の分離は不可能である。
・ガラス転移温度Tg=89℃
・塩化メチレン中での相対溶液粘度(0.5g/100mlの溶液)=1.237
・GPCによれば、分子量Mw=39901、Mn=19538、D=2.04
(ポリカーボネートに対するキャリブレーション)
・ガラス転移温度Tg=148℃
・塩化メチレン中での相対溶液粘度(0.5g/100mlの溶液)=1.246
・CDCl3における1NMRは予想通りの導入比x/yを示す。
(ビスフェノールTMCおよびビスフェノールAからの各種組成を有するコポリホルマールの合成)
さらに、コポリホルマールを実施例3の合成と同様の方法で製造する(表1参照)。
(ポリホルマールおよびコポリホルマールの水含有量の同定)
(95%r.H.の湿潤条件および30℃の貯蔵温度下での貯蔵後の、実施例1〜10からのポリホルマールの吸水性および水含有量の同定)
各種貯蔵期間の後に、水含有量を定量カールフィッシャー滴定(電量滴定)によって同定する。
貯蔵期間:7日および14日
天候:95%r.H.の湿潤条件および30℃
再現:貯蔵条件毎に4測定
・GPCによれば、分子量Mw=111.62、Mn=7146、D=1.56
(ポリカーボネートに対するキャリブレーション)。
・ガラス転移温度Tg=115℃
・GPCによれば、分子量Mw=10644、Mn=7400、D=1.44
(ポリカーボネートに対するキャリブレーション)。
・ガラス転移温度Tg=158℃
Claims (9)
- 一般式(Ia)および(Ib)
ここで、nは1〜10を意味し、記号Rは互いに独立していずれか所望の置換基を表し、kおよびoは1〜4000の整数を表し、oは1〜4000の数を表し、mはz/oの分数を表し、nは(o−z)/oの分数を表し、zは1〜oの数を表す)
の線形ポリホルマールまたはコポリホルマール。 - Aは水素を表す請求項1による線形ポリホルマールおよびコポリホルマール。
- 射出成形または押出し法によって製品を製造するための請求項1によるポリホルマールおよびコポリホルマールの使用。
- 製品は光データ記憶媒体であることを特徴とする請求項3による使用。
- 請求項1によるポリホルマールおよび/またはコポリホルマールを含有する光データ記憶媒体。
- 製品は医療物品であることを特徴とする請求項3による使用。
- 請求項1によるポリホルマールおよび/またはコポリホルマールを含有する医療物品。
- 1,1−ビス(4−ヒドロキシフェニル)−3,3,5−トリメチルシクロヘキサン(ビスフェノールTMC)に基づくホモポリホルマールを含有することを特徴とする請求項1による線形ポリホルマール。
- ビスフェノールと塩化メチレンとを、好適な高沸点溶媒の均一溶液において、塩基の存在中で、30〜160℃の温度で反応させることによる、請求項1による線形ポリホルマールおよびコポリホルマールの製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE10333928A DE10333928A1 (de) | 2003-07-25 | 2003-07-25 | Polyformale und Copolyformale mit reduzierter Wasseraufnahme, ihre Herstellung und Verwendung |
PCT/EP2004/007711 WO2005012379A2 (de) | 2003-07-25 | 2004-07-13 | Polyformale und copolyformale mit reduzierter wasseraufnahme, ihre herstellung und verwendung |
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JP2007500760A true JP2007500760A (ja) | 2007-01-18 |
JP2007500760A5 JP2007500760A5 (ja) | 2007-09-06 |
JP4637100B2 JP4637100B2 (ja) | 2011-02-23 |
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US (1) | US7199208B2 (ja) |
EP (1) | EP1651702B1 (ja) |
JP (1) | JP4637100B2 (ja) |
KR (1) | KR101106408B1 (ja) |
CN (1) | CN100471894C (ja) |
AT (1) | ATE422511T1 (ja) |
DE (2) | DE10333928A1 (ja) |
ES (1) | ES2320893T3 (ja) |
WO (1) | WO2005012379A2 (ja) |
Cited By (2)
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JP2006528566A (ja) * | 2003-07-25 | 2006-12-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | ポリカーボネート上の共押出保護層としてのポリホルマール |
JP2012514280A (ja) * | 2008-12-25 | 2012-06-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | 高速光ディスク用基板材料 |
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DE102004054498A1 (de) * | 2004-11-11 | 2006-05-24 | Bayer Materialscience Ag | Polycarbonat/Polyformal-Blend als Material für optische Datenspeicher mit verminderter Wasseraufnahme |
US7521119B2 (en) * | 2005-07-07 | 2009-04-21 | Sabic Innovative Plastics Ip B.V. | Windows and other articles made from DMBPC polycarbonate homopolymer and copolymer |
DE102008036406A1 (de) * | 2008-08-05 | 2010-02-11 | Bayer Materialscience Ag | Modifizierte Polycarbonate mit verbesserten Oberflächeneigenschaften |
CN107208049A (zh) * | 2014-09-18 | 2017-09-26 | 财团法人卫生研究院 | 祖细胞、其制备方法及其应用 |
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2003
- 2003-07-25 DE DE10333928A patent/DE10333928A1/de not_active Withdrawn
-
2004
- 2004-07-13 WO PCT/EP2004/007711 patent/WO2005012379A2/de active Application Filing
- 2004-07-13 JP JP2006521435A patent/JP4637100B2/ja not_active Expired - Fee Related
- 2004-07-13 DE DE502004008976T patent/DE502004008976D1/de not_active Expired - Lifetime
- 2004-07-13 AT AT04763183T patent/ATE422511T1/de not_active IP Right Cessation
- 2004-07-13 ES ES04763183T patent/ES2320893T3/es not_active Expired - Lifetime
- 2004-07-13 KR KR1020067001616A patent/KR101106408B1/ko not_active IP Right Cessation
- 2004-07-13 CN CNB2004800214842A patent/CN100471894C/zh not_active Expired - Fee Related
- 2004-07-13 EP EP04763183A patent/EP1651702B1/de not_active Expired - Lifetime
- 2004-07-20 US US10/894,973 patent/US7199208B2/en not_active Expired - Fee Related
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JPS60188426A (ja) * | 1984-03-09 | 1985-09-25 | Idemitsu Kosan Co Ltd | 光学機器用の素材 |
JPH02304742A (ja) * | 1989-05-19 | 1990-12-18 | Hitachi Ltd | 光ディスクおよびその製造方法 |
JPH03237130A (ja) * | 1990-02-15 | 1991-10-23 | Idemitsu Kosan Co Ltd | ポリエーテル樹脂とその製法及びそれよりなる光学材料 |
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JP2006528566A (ja) * | 2003-07-25 | 2006-12-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | ポリカーボネート上の共押出保護層としてのポリホルマール |
JP2012514280A (ja) * | 2008-12-25 | 2012-06-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | 高速光ディスク用基板材料 |
KR101604156B1 (ko) * | 2008-12-25 | 2016-03-16 | 바이엘 머티리얼사이언스 아게 | 고속 광학 디스크용 기판 물질 |
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Publication number | Publication date |
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EP1651702A2 (de) | 2006-05-03 |
CN1829760A (zh) | 2006-09-06 |
WO2005012379A2 (de) | 2005-02-10 |
DE10333928A1 (de) | 2005-02-24 |
DE502004008976D1 (de) | 2009-03-26 |
CN100471894C (zh) | 2009-03-25 |
ES2320893T3 (es) | 2009-05-29 |
ATE422511T1 (de) | 2009-02-15 |
WO2005012379A3 (de) | 2005-04-21 |
KR20060066062A (ko) | 2006-06-15 |
JP4637100B2 (ja) | 2011-02-23 |
US7199208B2 (en) | 2007-04-03 |
KR101106408B1 (ko) | 2012-01-17 |
EP1651702B1 (de) | 2009-02-11 |
US20050020802A1 (en) | 2005-01-27 |
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