JP2004165654A - Light-emitting device and method of manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a light-emitting device which uses an ITO electrode layer as an electrode for light emission drive and achieves a uniform and high radiation intensity according to an area of the device on the assumption that the device is applied to a light-emitting device with a large surface of 400 μm or larger. <P>SOLUTION: In a light-emitting device 100, at least one of the major surfaces of a light-emitting layer 24, which is composed of a compound semiconductor, is covered with an ITO electrode layer 20 serving as a light extracting surface electrode. When the major surface of the light-emitting layer 24 is converted into a square, a side L is 400 μm or longer. Further, a thickness t of the ITO electrode 20 is 400 nm or larger. <P>COPYRIGHT: (C)2004,JPO

Description

  The present invention relates to a light emitting device and a method for manufacturing the same.

JP-A-1-225178 JP-A-6-188455 JP-A-8-83927 JP 2001-7399 A JP 2002-43621 A

  Among semiconductor light-emitting elements in which a light-emitting layer portion is formed of a compound semiconductor, those used as light-emitting diode light sources for display and illumination use a metal electrode for applying a driving voltage to the light extraction surface side of the light-emitting layer portion. Form. Since the metal electrode functions as a light shielding body, for example, it is formed so as to cover only the central portion of the main surface of the light emitting layer portion, and light is extracted from the surrounding electrode non-formation region. However, there is no change in that the metal electrode is a light shield, and if the electrode area is made extremely small, current diffusion in the element surface is hindered, and there is a problem that the amount of light extraction is restricted. Therefore, the entire surface of the light emitting layer is covered with a transparent and highly conductive ITO (Indium Tin Oxide) electrode layer, and the light extraction efficiency through the ITO electrode layer is improved, and the current diffusion effect is improved. The proposal which aims at simultaneously is disclosed by patent documents 1-5 etc., for example.

  By the way, the conventional semiconductor light emitting device has been mainly used for small devices such as display, but the semiconductor device has high light conversion efficiency, generates little heat, and uses mercury like a fluorescent lamp. Therefore, since it is desirable from the viewpoint of environmental protection, development of a large surface light emitting element having a dimension of one side of the element of 400 μm or more is being promoted for use in lighting or large display devices. In a large-sized surface light emitting device, it is important in order to obtain a light emission intensity corresponding to the size of the light emitting layer portion in such a manner that a current as large as possible flows uniformly.

  The ITO electrode layer is overwhelmingly superior in both light transmission and electrical conductivity as compared with GaP or the like conventionally used as a current diffusion layer, and it is possible to uniformly supply a large current as described above. It is thought that it is self-evident from the disclosure contents of Patent Documents 1 to 5. However, as a result of the study by the present inventors, regarding the application to a large element having a side of 400 μm or more, the light emission intensity corresponding to the enlargement cannot be obtained in spite of using the ITO electrode layer. It has been found.

  Patent Document 2 discloses an example in which an experimental measurement is performed using a 40 mm square substrate sample. However, this is thought to be due to the problem of measurement of the current-voltage characteristics, and it is considered that a large sample was intentionally used. In this publication, characteristics other than the current-voltage characteristics, particularly the most important characteristics as a light emitting element. Since no measurement results are shown for the emission intensity or the like, it is considered that the use as a large-area light-emitting element as described above is not assumed. In other publications, even if the element dimensions are not disclosed or disclosed, Patent Document 3 has a maximum of 300 μm square, and there is no suggestion of application to a large element of 400 μm square or more. On the other hand, Patent Document 5 suggests the application of the ITO electrode layer to a large element exceeding 400 μm square, but due to the lack of sufficient consideration for the formation form of the ITO electrode layer, the size is increased. There is a problem that it is not possible to achieve a suitable emission intensity.

  An object of the present invention is to use an ITO electrode layer as an electrode for driving light emission, and on the premise that it is applied to a large surface light emitting element having a side dimension of 400 μm or more, uniform and high emission intensity corresponding to the element size. It is providing the light emitting element which can implement | achieve, and its manufacturing method.

Means for Solving the Problems and Effects of the Invention

In order to solve the above problems, the light emitting device of the present invention is
At least one main surface of the light emitting layer portion made of a compound semiconductor is covered with an ITO electrode layer which is a light extraction surface side electrode,
The dimension of one side of the main surface of the light emitting layer portion in terms of square is 400 μm or more,
In addition, the thickness of the ITO electrode layer is 400 nm or more.

  The shape of the main surface of the light emitting layer portion can be a square shape, but may be other shapes such as a rectangular shape. In the present invention, the dimension of one side of the element (also referred to as the element dimension) is defined by the length of one side of the square when converted into a square (that is, when a square having the same area is considered). .

ITO is indium oxide film doped with tin oxide, the content of tin oxide by a 1-9% by weight, sufficiently low value of the resistivity of 5 × 10 ^-4 Ω · cm or less of the electrode layer can do. ITO has good transparency to visible light (that is, it is transparent), and when used as an electrode for applying a voltage to the light emitting layer portion, it hardly disturbs light extraction. The ITO electrode layer also plays a role of making the light emission uniform and highly efficient by diffusing current in the surface when a voltage for driving the element is applied through a metal electrode such as a bonding pad. When ITO is formed by sputtering, it is easy to obtain a homogeneous and highly conductive material.

  When the present inventors examined by experiment, the following things were found. That is, when an ITO electrode layer is used, the light emission intensity Iv of the element is almost independent of the thickness of the ITO electrode layer in a normal size element whose element size on the main surface of the light emitting layer is 300 μm or less. When the layer is formed as a thin film of about 200 nm, and conversely, when it is formed as a thick film of about 1000 nm, there is no significant difference in emission intensity (see FIG. 22). In this case, the ITO electrode layer is wasted as much as it is formed, and therefore, the ITO electrode layer is formed as thin as possible within a range in which a necessary light emission intensity can be obtained.

  However, when the element size is increased to 400 μm or more, the situation changes. If the thickness of the ITO electrode layer is set to a necessary and sufficient level for a normal size element, sufficient light emission intensity cannot be obtained. Therefore, if the ITO electrode layer is formed to a thickness of 400 nm or more, the emission intensity is remarkably improved, and good emission characteristics commensurate with the increase in size of the element can be obtained. More specifically, by setting the ITO electrode layer thickness to 400 nm or more, for example, even if the total amount of current during energization is set to be the same, a large surface light emitting element having an element size of 400 μm or more is, for example, Compared with a normal light emitting device having an element size of 300 μm or less, the emission intensity is higher. That is, even if the same current is applied, it can be extracted as light more efficiently.

  For example, when it is desired to obtain a large amount of light necessary for illumination or the like, it is conceivable to form a surface light emitting device by arranging a number of conventional small area light emitting elements in an array type. In this case, when the drive voltage is controlled to be constant, the current increases substantially in proportion to the number of elements, that is, the total area of the elements, and the emission intensity increases. However, on each ITO electrode layer, it is indispensable to form metal electrodes (bonding pads) for wire bonding for each element. As the number of elements increases, the total area of the metal electrodes that serve as light blocking parts also increases. It is difficult to avoid a decrease in efficiency. Therefore, if the area of each element is increased and the relative area ratio of the metal electrode to the ITO electrode layer can be reduced, the light extraction efficiency can be improved, and the effect of increasing the area of the element can be achieved. Become prominent. However, for this purpose, when a driving voltage is applied to the ITO electrode layer with a metal electrode, it must be possible to apply a voltage uniformly to the entire ITO electrode layer. In other words, it is important that the sheet resistance of the ITO electrode layer is sufficiently low and the current diffusion effect is high, that is, it is possible to supply sufficient current to the layer portion located far from the metal electrode in the surface of the ITO electrode layer.

  According to the experiments conducted by the present inventors, in the case of a large surface light emitting device having an element size of 400 μm or more, if the ITO electrode layer thickness is small, the sheet resistance increases and current diffusion is difficult to proceed, and the forward voltage is also reduced. Since it becomes higher, the emission intensity Iv does not increase so much (see FIG. 21). Further, if the area of the metal electrode for wire bonding is increased in order to compensate for current diffusion, it is difficult to avoid a decrease in light extraction efficiency.

  However, in the present invention, the current spreading effect is dramatically enhanced by forming the ITO electrode layer thickness of the large surface light emitting element of 400 μm or more in a thick film of 400 nm or more. As a result, the emission intensity Iv can be significantly increased (see FIG. 21). At first glance, this seems to be the effect of simply increasing the cross-sectional area in the thickness direction of the ITO electrode layer, but in reality, a more remarkable effect that cannot be explained only by the contribution of the increase in thickness is achieved. The This is also clear from the measurement result of the forward voltage, as shown in FIG. 25, that the ITO electrode layer thickness is discontinuously and greatly decreased in the vicinity of 400 nm. By reducing the forward voltage in this way, current can be injected into the entire light emitting layer portion having a large area without waste, and the light emission intensity is improved. Moreover, even if the metal electrode for wire bonding has a small area, the current can be sufficiently diffused in the ITO electrode layer, and the light extraction efficiency is improved. As a result, the emission intensity of the entire device is further increased.

  The present inventors consider the factors that cause the above effects as follows. Since ITO is a mixed oxide in which tin oxide is dissolved in indium oxide, in order to obtain an ITO electrode layer having a uniform resistivity distribution, it is formed by lowering the film formation temperature (substrate temperature) ( For example, 300 ° C. or less) is advantageous. When the substrate temperature is lowered, as shown in FIGS. 2 (a) and 2 (b), high energy particles exist in the gas phase atmosphere during the sputtering film formation, and this is injected into the substrate surface. Many point defects are formed. As a result of this point defect acting as a non-uniform nucleus when solid-phase ITO is deposited from the gas phase, the ITO electrode layer 20 is formed on the substrate side (between the light emitting layer portion 24 or the light emitting layer portion 24 and the ITO electrode layer). On the side of the contact interface BI with a layer (not shown) interposed between the layers, the high resistance layer 20a made of a microcrystalline grain layer or an amorphous layer having a very small crystal grain size is likely to be formed. On the other hand, as the growth of the ITO electrode layer proceeds, among the heterogeneous nuclei formed at a high density in the initial stage of growth or microcrystal grains derived therefrom, those in the <100> direction, which is the preferential growth direction of ITO, As a result of the selective growth, the low resistance layer 20b having a large crystal grain size is likely to be formed.

  As shown in FIG. 2A, when the thickness of the final ITO electrode layer is large, the low-resistance layer 20b is also easily formed relatively thick, and a sufficient amount of current is generated in the low-resistance layer 20b. It can be diffused and the forward voltage is also reduced. On the other hand, as shown in FIG. 2B, when the final ITO electrode layer is small, the thickness of the low resistance layer 20b is reduced (or the growth is finished before the low resistance layer 20b is formed). Current diffusion in the high resistance layer 20a is unavoidable, and in the case of a light emitting device having an element size of 400 μm or more, the current diffusion effect is impaired and the forward voltage is also increased. .

  The effect of the present invention becomes more remarkable when the ITO electrode layer is heat-treated at a temperature higher than the film formation temperature after film formation by sputtering. Further, in the method for manufacturing a light emitting device of the present invention, ITO, which is a light extraction surface side electrode, is formed on at least one main surface of the light emitting layer portion made of a compound semiconductor having a side dimension of 400 μm or more in terms of a square of the main surface. The electrode layer is formed by sputtering, and then the light emitting layer portion on which the ITO electrode layer is formed is heat-treated at a temperature higher than the film formation temperature of the ITO electrode layer. Sputtering has the advantage that the film forming temperature can be easily lowered and it is easy to obtain an ITO electrode layer having a uniform resistivity distribution. However, as described above, the high resistance layer (in which crystal grains are made finer or amorphous) ( 20a: There is also a side surface on which FIGS. 2A and 2B are easily formed. However, as described above, when the ITO electrode layer is heat-treated at a temperature higher than the film formation temperature, as shown in FIG. 2A, the recrystallization of the fine crystal grains or amorphized portions forming the high resistance layer is performed. It is considered that the current diffusion effect is improved and the forward voltage can be further reduced by increasing the thickness of the low resistance layer 20b in which the amount of crystal grain boundary that causes the increase in resistivity is reduced.

  However, such a heat treatment does not exhibit a remarkable effect when the ITO electrode layer thickness is a thin film smaller than 400 nm. Although the recrystallized ITO is formed in the vicinity of the contact interface BI with the substrate side, the orientation growth in the layer thickness direction is not remarkable, and the resistivity is not lowered so much. Therefore, when the ITO electrode layer thickness is thin, it is considered that the influence of the layer in the vicinity of the contact interface BI that remains with a relatively high resistivity appears greatly. As shown in FIG. 2A, if the ITO electrode layer 20 is thick, there is no problem because the low resistance layer 20b can be sufficiently thick even if the high resistance layer 20a of a certain thickness remains. However, if the ITO electrode layer thickness is small, the thickness ratio of the high resistance layer 20a increases, and an improvement in the current spreading effect is not expected.

  The above heat treatment is preferably performed at a temperature of 300 ° C. or higher and 750 ° C. or lower. When the heat treatment temperature is less than 300 ° C., the improvement of the current diffusion effect or the improvement of the forward voltage reduction effect may not always be significant. Further, it is not desirable to increase the heat treatment temperature beyond 750 ° C., because an improvement in the current diffusion effect or a further improvement in the forward voltage reduction cannot be expected or worsened.

  According to the light emitting device of the present invention, the current spreading effect in the ITO electrode layer can be sufficiently increased despite the large element size. As a result, as described above, the metal electrode (bonding pad) for applying a voltage to the light emitting layer portion is formed on the main surface of the ITO electrode layer so as to cover a partial region of the main surface. In some cases, the area can be reduced to improve the light extraction efficiency. Specifically, the coverage area ratio of the ITO electrode layer by the metal electrode (defined as a value obtained by dividing the formation area of the metal electrode by the total area of the ITO electrode layer) is set to 0.1% or more and 10% or less. It is good. When the covering area ratio by the metal electrode is 1% or less, it may not be possible to apply a voltage uniformly to the entire ITO electrode layer. When it exceeds 10%, the effect of improving the light extraction efficiency is not significant. The coverage area ratio of the ITO electrode layer is preferably 0.1% to 5%, more preferably 0.2% to 5%.

  Further, as a result of the remarkable improvement in the current diffusion performance of the ITO electrode layer, even if the geometric center of gravity of the formation region of the metal electrode is shifted from the geometric center of gravity of the main surface of the ITO electrode layer, (In other words, even if the metal electrode is arranged so as to be deviated from the center of the ITO electrode layer), it is possible to apply a voltage uniformly to the entire ITO electrode layer, and it is sufficient for the ITO electrode layer region away from the metal electrode. Current can be supplied. By doing in this way, it can prevent effectively that a bonding wire crosses the light extraction surface of a light emitting layer part long, and also the freedom degree of a design improves significantly also regarding the drawing form etc. of a wire. For example, when the main surface of the light emitting layer is square, the metal electrode is disposed on the periphery of the ITO electrode layer with respect to the ITO electrode layer covering the entire surface, or the metal electrode is disposed at the corner of the ITO electrode layer. Can be arranged. As a result, there is no inconvenience that the bonding wire crosses the light extraction surface for a long time, and the degree of freedom in design is greatly increased.

The ITO electrode layer does not necessarily form a good ohmic junction when attempting to directly join the compound semiconductor layer forming the light emitting layer portion or the current diffusion layer, and the luminous efficiency may decrease due to the increase in series resistance based on the contact resistance. is there. Therefore, it is desirable that a contact layer for reducing the junction resistance of the ITO electrode layer is disposed between the light emitting layer portion and the ITO electrode layer so as to be in contact with the ITO electrode layer. Specifically, a contact layer made of a compound semiconductor that does not contain Al and has a relatively small band gap energy (for example, less than 1.42 eV) can be preferably used. By using such a contact layer, a good ohmic contact can be obtained, and resistance increase due to Al component oxidation hardly occurs. Specifically, GaAs containing In can be used as the contact layer. Compound constituting the contact layer semiconductors, if made at the junction interface between the ITO electrode layer and the _{In x Ga 1-x As (} 0 <x ≦ 1), intended contact resistance reducing effect is obtained. In particular, the light emitting layer portion is (Al _x Ga _1-x ) _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1: in this specification, it may be simply referred to as “AlGaInP”). ), The compound semiconductor composing the contact layer is In _x Ga _1-x As (0 <x ≦ 1) at the junction interface with the ITO electrode layer, so that the lattice of the contact layer and the light emitting layer portion is obtained. Consistency is also good, and the emission intensity can be further improved. In addition, even when the light emitting layer portion is made of Al _z Ga _1-z As (where 0 ≦ z ≦ 1: may be simply referred to as “AlGaAs” in this specification), the compound semiconductor constituting the contact layer the, in the bonding interface between the ITO electrode layer _in x _Ga 1-x as can be (0 <x ≦ 1), with the desired contact resistance reducing effect is obtained, the contact layer and the light emitting layer portion The lattice matching is also good, and the emission intensity can be further improved.

When the light emitting layer is formed by (Al _x Ga _1-x ) _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1), the ITO electrode layer and (Al _x Ga _1-x ) _A GaAs layer is formed so as to be in contact with the ITO electrode layer between the light emitting layer portion made of _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1), and then heat treatment is performed. Thus, In can be diffused from the ITO electrode layer to the GaAs layer to form a contact layer made of GaAs containing In. In this case, the In concentration distribution in the thickness direction of the contact layer continuously decreases as the distance from the ITO electrode layer increases in the thickness direction. Further, the contact layer is always made of In _x Ga _1-x As at the bonding interface with the ITO electrode layer. In addition, this heat processing can serve as the above-mentioned heat processing performed at higher temperature than film-forming temperature after film-forming of the ITO electrode layer by sputtering. _{Also, Al z Ga 1-z As} ( however, 0 ≦ z ≦ 1) Similarly, when forming the light-emitting layer by, ITO electrode layer and the _Al z _{Ga 1-z} As (however, 0 ≦ z ≦ 1) from A contact layer made of GaAs containing In can be formed by forming a GaAs layer in contact with the ITO electrode layer between the light emitting layer and forming a GaAs layer containing In.

  For the contact layer, a method of directly epitaxially growing InGaAs may be adopted. However, the use of the above method has the following advantages. That is, the GaAs layer is extremely easy to lattice match with, for example, a light emitting layer portion made of AlGaInP or AlGaAs or a transparent conductive semiconductor substrate made of GaP, and is more homogeneous and continuous than the case where InGaAs is directly epitaxially grown. A film can be formed.

Then, after forming an ITO electrode layer on the GaAs layer, heat treatment is performed to diffuse In from the ITO electrode layer to the GaAs layer to form a contact layer. The contact layer made of GaAs containing In obtained by heat treatment in this way does not have an excessive In content, and effectively prevents quality deterioration such as emission intensity reduction due to lattice mismatch with the light emitting layer. can do. The lattice matching between the GaAs layer and the light emitting layer is such that the light emitting layer is (Al _x Ga _1-x ) _y In _1-y P (where 0 ≦ x ≦ 1, 0.45 ≦ y ≦ 0.55). Therefore, it can be said that it is desirable to form the light emitting layer portion (cladding layer or active layer) by setting the mixed crystal ratio y in the above range. Further, when the light emitting layer portion is Al _z Ga _1-z As (0 ≦ z ≦ 1), the lattice matching with the GaAs layer can be kept good for almost any Al mixed crystal ratio z.

  As shown in FIG. 8 (1), the In concentration distribution in the thickness direction of the contact layer continuously decreases as the distance from the ITO electrode layer increases in the thickness direction (that is, the light emitting layer portion). It is desirable to incline the In concentration distribution so that the In concentration becomes smaller on the side. Such a structure is formed by diffusing In from the ITO side to the contact layer side by heat treatment. When the light emitting layer portion is formed of AlGaInP, if the In concentration distribution of the contact layer is smaller on the light emitting layer portion side, the lattice constant difference between the light emitting layer portion and the light emitting layer portion becomes closer to the contact layer. Consistency can be further increased. When the heat treatment temperature becomes excessively high or the heat treatment time is lengthened, the In diffusion from the ITO electrode layer proceeds excessively, and the In concentration distribution in the contact layer becomes as shown in FIG. 8 (3). The above-described effect cannot be obtained because the film shows a substantially constant high value in the thickness direction (Note that if the heat treatment temperature is excessively lowered or the heat treatment time is excessively shortened, (2 in FIG. (This leads to insufficient In concentration in the contact layer).

In this case, in FIG. 8, when the In concentration at the boundary position of the contact layer with the ITO electrode layer is C _A and the In concentration in the vicinity of the opposite side boundary is C _B , C _B / C _A is 0. It is desirable to adjust so that it may become less than 0.8, and it is desirable to perform the above-mentioned heat treatment so that the In concentration distribution of the form can be obtained. When C _B / C _A exceeds 0.8, the effect of improving the lattice matching with the light emitting layer portion due to the In concentration distribution gradient cannot be sufficiently obtained. Note that the composition distribution (In or Ga concentration distribution) in the thickness direction of the contact layer is determined by secondary ion mass spectrometry (SIMS), Auger electron spectroscopy analysis while gradually etching the layer in the thickness direction. It can be measured by a known surface analysis method such as (Auger Electron Spectroscopy) or X-ray photoelectron spectroscopy (XPS).

The In concentration in the vicinity of the boundary between the contact layer and the ITO electrode layer is preferably 0.1 or more and 0.6 or less in terms of the atomic ratio of In to the total concentration of In and Ga. It is desirable to carry out so that such an In concentration can be obtained. If the In concentration by the above definition is less than 0.1, the effect of reducing the contact resistance of the contact layer becomes insufficient, and if it exceeds 0.6, the quality of the emission intensity decreases due to lattice mismatch between the contact layer and the light emitting layer. Deterioration becomes severe. In addition, the In concentration in the vicinity of the boundary between the contact layer and the ITO electrode layer can ensure, for example, the above-described desirable value (0.1 or more and 0.6 or less) in the atomic ratio of In to the total concentration of In and Ga. if the, the contact layer, that the in concentration C _B of the other side near the boundary as facing the ITO electrode layer is zero, that is, as shown in FIG. 9, ITO contact layer There may be a structure in which an InGaAs layer is formed on the electrode layer side and the opposite side portion is a GaAs layer.

  ITO is an indium oxide film doped with tin oxide as described above, and an ITO electrode layer is formed on the GaAs layer, and further subjected to heat treatment in an appropriate temperature range, so that the contact having the above desired In concentration is obtained. Layers can be easily formed. Moreover, the electrical resistivity of the ITO electrode layer can be further reduced by this heat treatment. This heat treatment is desirably performed in a short time at a temperature as low as possible so that the In concentration in the contact layer does not become excessive.

  The In diffusion heat treatment is desirably performed at 600 ° C. or higher and 750 ° C. or lower. When the heat treatment temperature exceeds 750 ° C., the In diffusion rate into the GaAs layer becomes too high, and the In concentration in the contact layer tends to become excessive. In addition, the In concentration is saturated, and it is difficult to obtain an In concentration distribution inclined in the thickness direction of the contact layer. In either case, the lattice matching between the contact layer and the light emitting layer is deteriorated. If the In diffusion to the GaAs layer proceeds excessively, the ITO electrode layer In is depleted in the vicinity of the contact portion with the contact layer, making it difficult to avoid an increase in the electrical resistance value of the electrode. Furthermore, if the heat treatment temperature becomes too high as described above, the oxygen of ITO diffuses into the GaAs layer and the oxidation is promoted, and the series resistance of the device tends to increase. In either case, the light emitting element cannot be driven with an appropriate voltage. Moreover, when the heat treatment temperature becomes extremely high, the conductivity of the ITO electrode layer may be lost. On the other hand, if the heat treatment temperature is less than 600 ° C., the diffusion rate of In to the GaAs layer becomes too small, and it takes a very long time to obtain a contact layer with sufficiently reduced contact resistance. The decline in efficiency becomes significant.

  The heat treatment time is desirably set to a short time of 5 seconds to 120 seconds. When the heat treatment time is 120 seconds or more, especially when the heat treatment temperature is close to the upper limit value, the amount of In diffused into the GaAs layer tends to be excessive (however, if the heat treatment temperature is kept low, a heat treatment longer than this will be performed). It is also possible to employ time (for example, up to about 300 seconds). On the other hand, if the heat treatment time is less than 5 seconds, the amount of In diffused into the GaAs layer is insufficient, and it becomes difficult to obtain a contact layer with sufficiently reduced contact resistance.

The contact layer is preferably formed by mixing a contact layer forming region and a non-forming region at the bonding interface with the ITO electrode layer. When the contact layer is formed so as to cover the entire bonding surface of the ITO electrode layer to the element side, the following problem may occur.
(1) It is necessary to form a small metal electrode for wire bonding on the ITO electrode layer. If the contact resistance between the ITO electrode layer and the light emitting layer is significantly reduced even in the region immediately below the metal electrode, the drive current and thus the light emission tends to concentrate on the region, and much of the generated light is shielded by the metal electrode. The light extraction efficiency is reduced.
(2) Depending on the material of the compound semiconductor employed as the contact layer, the contact layer acts as a light absorber, which similarly leads to a decrease in light extraction efficiency.

  Therefore, in the light emitting device of the present invention, the bonding interface of the ITO electrode layer has a first region consisting of a region immediately below the metal electrode and the remaining second region, and the second region has a light extraction amount from the first region. In many cases, the contact layer has a larger area ratio in the second region than in the first region. Note that the formation area ratio of the contact layer in each region refers to a ratio obtained by dividing the total area of the contact layers in the region by the total area of the region. According to this configuration, the contact layer formed at the bonding interface of the ITO electrode layer in the region immediately below the metal electrode (first region) where the light extraction amount is small is larger than the remaining region (second region) where the light extraction amount is large. Since the formation area ratio is reduced, the contact resistance of the ITO electrode layer in the first region increases. As a result, the drive current of the light emitting element has a larger component that flows around the first region and flows into the second region, so that the light extraction efficiency can be greatly increased. Note that it is desirable from the viewpoint of improving the light extraction efficiency that the light emission drive current does not flow as much as possible in the first region where the light extraction amount is small. Therefore, it is desirable that the contact layer is not formed as much as possible in the first region.

  In addition, the light emitting element of the present invention can be configured such that at least the contact layer forming region and the non-forming region are mixed in the second region. The contact layer formation region is preferably formed in a dispersed manner. Of the bonding interface of the ITO electrode layer, the amount of light extracted from the light emitting layer portion to the outside increases in the second region not covered with the metal electrode. In this second region, when the contact layer formation region and the non-formation region are mixed, the contact layer formed to reduce the contact resistance of the ITO electrode layer has the property of easily absorbing light from the light emitting layer portion. Even in the case where it is present, the light generated immediately below the contact layer formation region leaks from the non-formation region adjacent thereto, whereby absorption by the contact layer can be suppressed. As a result, the light extraction efficiency of the entire element can be increased.

  The light emitting layer portion can be bonded to the main surface of the contact layer opposite to the ITO electrode layer through an intermediate layer. The intermediate layer is composed of a compound semiconductor having an intermediate band gap energy between the light emitting layer portion and the contact layer. In the light emitting layer portion having a double hetero structure, it is necessary to increase the barrier height between the cladding layer and the active layer to a certain level or more in order to enhance the carrier confinement effect in the active layer and improve the internal quantum efficiency. As shown in the schematic band diagram of FIG. 10 (Ec indicates the energy level at the bottom of the conduction band and Ev indicates the energy level at the top of the valence band), a contact layer (for example, InGaAs) is provided on such a cladding layer (for example, AlGaInP or AlGaAs). When direct bonding is performed, a relatively high hetero barrier may be formed between the cladding layer and the contact layer due to bending of the band due to bonding. This barrier height ΔE increases as the band edge discontinuity between the cladding layer and the contact layer increases, and tends to hinder the movement of carriers, particularly the movement of holes having a larger effective mass. For example, in the case of using a metal electrode, light cannot be extracted when the entire surface of the cladding layer is covered with the metal electrode, so that the electrode must be formed so as to be partially covered. In this case, in order to improve the light extraction efficiency, current diffusion to the outside in the in-plane direction of the electrode must be promoted in some form. For example, in the case of a metal electrode, a contact layer such as GaAs is often formed between the light emitting layer portion, but in the case of a metal electrode, a somewhat high barrier is provided between the contact layer and the light emitting layer portion. The formation is advantageous in that the current diffusion in the in-plane direction can be promoted by the effect of blocking the carriers by the barrier. However, an increase in series resistance is unavoidable due to the formation of a high barrier.

  On the other hand, when the ITO transparent electrode layer is used, since the ITO electrode layer itself has a very high current diffusion capability, the effect of blocking the carriers due to the barrier hardly needs to be considered. In addition, the use of the ITO electrode layer greatly increases the area of the light extraction region compared to when using the metal electrode. Therefore, as shown in FIG. 11, when an intermediate layer having an intermediate band gap energy between the contact layer and the cladding layer is inserted between the contact layer and the cladding layer, the contact layer, the intermediate layer, and the intermediate layer Since each of the cladding layers has a small band edge discontinuity value, the formed barrier height ΔE is also small. As a result, the series resistance is reduced, and a sufficiently high light emission intensity can be achieved with a low driving voltage.

Effect obtained by employing the intermediate layer, among the light emitting layer portion of a double heterostructure, relatively good especially lattice matching with the In-containing GaAs forming the contact layer (Al x _{Ga 1-x) This} is remarkable when the light emitting layer portion is formed with _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1) or Al _z Ga _1-z As (where 0 ≦ z ≦ 1). is there. In this case, as an intermediate layer having an intermediate band gap energy between the light emitting layer portion and the contact layer, specifically, an AlGaAs layer, a GaInP layer, and an AlGaInP layer (composition adjustment so that the band gap energy is smaller than that of the cladding layer) Can be suitably employed, for example, can be formed as an AlGaAs layer (when the clad layer is AlGaAs, AlGaAs having a smaller Al mixed crystal ratio). ). In addition, the present invention can also be applied to other light emitting layer portions, for example, a light emitting layer portion having a double hetero structure made of In _x Ga _y Al _1-xy N. In this case, as the intermediate layer, for example, a layer including an InGaAlN layer (having a composition adjusted so that the band gap energy is smaller than that of the cladding layer) can be employed.

Embodiments of the present invention will be described below with reference to the accompanying drawings.
FIG. 1 is a conceptual diagram of a light emitting device 100 according to an embodiment of the present invention. In the light emitting device 100, a light emitting layer portion 24 is formed on a first main surface of an n type GaAs single crystal substrate (hereinafter simply referred to as a substrate) 1 with an n type GaAs buffer layer 2 interposed therebetween. An intermediate layer 31 to be described later, a contact layer 30 made of GaAs containing In, and an ITO electrode layer 20 are formed in this order on the first main surface side of the light emitting layer portion 24. Further, an ITO electrode A metal electrode 9 (bonding pad) made of Au or the like for bonding an electrode wire is disposed at a substantially central portion of the layer 20. A region around the metal electrode 9 of the ITO electrode layer 20 forms a light extraction region from the light emitting layer portion 24. On the other hand, on the second main surface side of the substrate 1, a back electrode layer 15 that also serves as a reflective layer made of a metal such as an Au—Ge—Ni alloy is formed on the entire surface.

  The ITO electrode layer 20 is formed so as to cover the entire main surface of the light emitting layer 24 on the light extraction surface side. The dimension L of one side of the main surface of the light emitting layer portion 24 in terms of square is 400 μm or more (upper limit is 40 mm, for example), and the thickness of the ITO electrode layer 20 is 400 nm or more (upper limit is 3 μm, for example). The coverage area ratio of the ITO electrode layer by the metal electrode 9 is 0.1% or more and 10% or less.

Emitting layer 24, a non-doped _{(Al x Ga 1-x)} y In 1-y P ( However, 0 ≦ x ≦ 0.55,0.45 ≦ y ≦ 0.55) active layer 5 consisting of a mixed crystal , p-type _{(Al z Ga 1-z)} y In 1-y P ( except x <z ≦ 1) p-type cladding layer 6 and the n-type composed of _{(Al z Ga 1-z)} y In 1-y P ( However, it has a structure sandwiched by an n-type cladding layer 4 made of x <z ≦ 1), and the emission wavelength is changed from green to red (the emission wavelength (center wavelength) is 550 nm or more depending on the composition of the active layer 5). 650 nm or less). In the light emitting device 100 of FIG. 1, the p-type AlGaInP clad layer 6 is disposed on the metal electrode 9 side, and the n-type AlGaInP clad layer 4 is disposed on the substrate 1 side. Therefore, the conduction polarity is positive on the metal electrode 9 side. The term “non-doped” as used herein means “does not actively add dopant”, and contains a dopant component inevitably mixed in a normal manufacturing process (for example, 10 ¹³ to 10 ¹⁶ / cm 3). It is not excluded that the upper limit is about ³ ).

Contact layer 30 is made of GaAs containing a In, in FIG. 8 (1), In concentration _{C A} in the vicinity of the interface with the ITO electrode layer is at an atomic ratio of In to the total concentration of In and Ga, 0 .1 or more and 0.6 or less. Further, in the In concentration, as distance in the thickness direction from the ITO electrode layer has become shall reduce continuously, the In concentration in the vicinity of the interface with the ITO electrode layer and C _A, in the opposite side of the boundary position When the In concentration is C _B , C _B / C _A is adjusted to 0.8 or less. The contact layer 30 has a thickness of 1 nm to 20 nm (preferably 5 nm to 10 nm) in order to reduce the influence of light absorption.

  Further, the contact layer 30 is not formed in the first region with a small light extraction amount that forms the region immediately below the metal electrode 9, but is selectively formed only in the second region with a large light extraction amount around it. Further, in the second region, the contact layer 30 has a mixed form region and non-formed region. Therefore, the ITO electrode layer 20 is in direct contact with the light emitting layer portion 24 in the region where the contact layer 30 is not formed.

  As shown in FIGS. 3A to 3C, the formation region SA of the contact layer 30 is dispersedly formed at the bonding interface of the ITO electrode layer 20, thereby making the light emission in the light emitting layer portion 24 more uniform and making contact. Light can be extracted more uniformly from the non-formation area PA of the layer 30. FIG. 3A shows an example in which the formation regions SA of the contact layers 30 are scattered, and FIG. 3B shows the formation regions SA of the elongated strip-shaped contact layers 30 and the non-formation regions PA of the same shape alternately. This is an example of formation. Further, (c) is an example in which, in contrast to (a), the non-formation area PA in the form of dots is dispersedly formed with the formation area SA of the contact layer 30 as the background. Here, the formation region SA of the contact layer 30 is formed in a lattice shape.

  When the contact layer 30 and the light emitting layer portion 24 are directly bonded, a slightly higher hetero barrier is formed at the bonding interface, which may increase the series resistance component. Therefore, in order to reduce this, an intermediate layer 31 having a band gap energy between the contact layer 30 in contact with the ITO electrode layer 20 and the light emitting layer portion 24 (here, the AlGaInP clad layer 6). Has been inserted. The intermediate layer 31 can be configured to include, for example, at least one of AlGaAs, GaInP, and AlGaInP. For example, the entire intermediate layer can be configured as a single AlGaAs layer. Since the thickness of each intermediate layer can be about 0.1 μm or less (however, 0.01 μm or more: if it becomes thinner than this, the bulk band structure is lost and the desired bonded structure cannot be obtained). Since the epitaxial growth time can be shortened by thinning, productivity can be improved, and the increase in series resistance due to the formation of the intermediate layer can be reduced, so that the light emission efficiency is hardly impaired. In particular, when the contact layer 30 is formed only in a partial region of the ITO electrode layer 20, the current density during light-emission energization tends to be selectively increased in the region where the contact layer 30 is formed. If the hetero barrier formed between the contact layer 30 and the AlGaInP clad layer 6 is high, a voltage drop when passing through the junction interface between the contact layer 30 and the AlGaInP clad layer 6 is caused by the influence of current concentration. There is a problem that it becomes more serious and the apparent series resistance tends to be larger. Therefore, it can be said that the effect of reducing the height of the hetero barrier by forming the intermediate layer 31 is more remarkable than when the contact layer 30 is formed on the entire surface of the ITO electrode layer 20.

Hereinafter, a method for manufacturing the light emitting device 100 of FIG. 1 will be described.
First, as shown in FIG. 1, an n-type GaAs buffer layer 2, an n-type AlGaInP cladding layer 4, a first main surface 1 a of a GaAs single crystal substrate 1 that is a compound semiconductor single crystal substrate lattice-matched with an AlGaInP mixed crystal, An AlGaInP active layer (non-doped) 5, a p-type AlGaInP clad layer 6, an intermediate layer 31, and a GaAs layer 30 ′ (FIG. 4A) serving as a contact layer are epitaxially grown in this order, and FIG. ) State. The epitaxial growth of each of these layers can be performed by a known metalorganic vapor phase epitaxy (MOVPE) method.

  Next, as shown in FIGS. 4B and 4C, the GaAs layer 30 ′ and the intermediate layer 31 are patterned using a known photolithography technique, so that FIGS. 3A to 3C are performed. A formation pattern of the formation region SA and non-formation region PA of the contact layer 30 as illustrated is formed for each region to be a light emitting element chip. Specifically, as shown in FIG. 4B, a photoresist layer 130 is formed on the GaAs layer 30 ', and the substrate 1 is fixed on a glass substrate using wax or the like. Next, a mask pattern is transferred to the photoresist layer 130 so that the GaAs layer 30 ′ is exposed in a region where the contact layer 30 is not formed by covering and exposing the photoresist layer 130 with a mask. Thereafter, the exposed portion of the GaAs layer 30 'is etched, and the photoresist layer 130 is removed to obtain a patterned GaAs layer 30' and an intermediate layer 31.

  The intermediate layer 31 can be formed so as to cover the entire surface of the light emitting layer portion 24 as shown in FIG. 15 when there is no concern of having a bad influence on light absorption, such as when the thickness is very small. In this case, since only the GaAs layer 30 'needs to be patterned, for example, in the case of chemical etching, even if the intermediate layer 31 cannot be etched sufficiently with an etchant for the GaAs layer 30', the manufacture is easy. On the other hand, as shown in FIG. 6, the intermediate layer 31 can be formed only in the region where the GaAs layer 30 ′ is formed, and the influence of light absorption by the intermediate layer 31 can be further reduced. In this case, the GaAs layer 30 ′ and the intermediate layer 31 may be formed so as to cover the entire surface of the light emitting layer portion 24, and both may be patterned by the above-described photolithography. In this case, the GaAs layer 30 ′ and the intermediate layer 31 may be etched simultaneously by vapor phase etching. In the case of chemical etching, the etchant is exchanged between the GaAs layer 30 ′ and the intermediate layer 31 and etching is performed sequentially. It is also possible to do this. Further, when the GaAs layer 30 ′ is patterned by chemical etching, the intermediate layer 31 may be used as a stop layer that stops the progress of corrosion toward the light emitting layer portion 24. For example, when the GaAs layer 30 ′ is made of In-containing GaAs, if the intermediate layer 31 is made of AlGaAs, the intermediate layer 31 is made to be a stop layer by using ammonia / hydrogen peroxide as an etchant. As a result, only the GaAs layer 30 'can be selectively etched.

  Next, as shown in FIG. 4D, the ITO electrode layer 20 is formed to a thickness of 400 nm or more on the GaAs layer 30 'by high frequency sputtering. The ITO electrode layer 20 functions as a transparent electrode having both a light extraction function and a current diffusion function. In order to enhance the current spreading function, it is important to reduce the sheet resistance (or electrical specific resistance) of the ITO electrode layer 20, and in order to enhance the light extraction function, the ITO electrode layer 20 is thickened as necessary. Even when formed, it is important to ensure sufficient light transmission. When the ITO electrode layer 20 is formed by sputtering, it is desirable to set the sputtering voltage as low as possible in order to reduce the sheet resistance. This is because when negative ions (mainly oxygen ions) contained in the sputtering plasma are incident on the ITO electrode layer being deposited at a high speed, insulating InO is easily formed. This is because the formation of InO is suppressed. In order to reduce the sputtering voltage, it is necessary to increase the magnetic field strength during sputtering to a certain level or more (for example, 0.8 kG or more: it is desirable to set it to 2 kG or less because the voltage reduction effect is saturated). It is valid. The effect of reducing the sheet resistance becomes conspicuous when, for example, the absolute value of the cathode voltage is set to 350 V or less, preferably 250 V or less. If the magnetic field strength is set to 1000 G or more, for example, the sputtering voltage can be easily adjusted to 250 V or less in terms of the absolute value of the cathode voltage.

In order to obtain a homogeneous ITO electrode layer, it is advantageous to form the ITO electrode layer as an amorphous layer. In order to obtain an amorphous ITO electrode layer, it is necessary to form a film at a low temperature of 200 ° C. or lower in order to prevent crystallization of ITO. In this case, it is effective to introduce water vapor into the sputtering atmosphere (for example, 3 × 10 ⁻³ Pa to 15 × 10 ⁻³ Pa). If the water vapor partial pressure in the sputtering atmosphere is excessively low, microcrystallization of the obtained ITO electrode layer is likely to proceed, and an adverse effect due to degranulation occurs during the smoothing etching process described later, but a water vapor partial pressure above a certain level should be ensured. Thus, this microcrystallization can be effectively suppressed. As a result, finally, an ITO electrode layer having a light transmittance of 90% or more (preferably 95% or more) and a specific resistance of 1000 μΩ · cm or less (preferably 800 μΩ · cm or less) can be realized.

  Further, it is important for the ITO electrode layer 20 to have a uniform and large current diffusion effect in order to achieve uniform and high luminous efficiency. For this purpose, it is necessary to improve the smoothness of the surface of the ITO electrode layer 20 in addition to the configuration of the ITO electrode layer 20 having a uniform and low resistivity. When the smoothness of the surface is lowered, a large number of protrusions that tend to concentrate an electric field are easily formed, and a local dark place is likely to be generated due to non-uniformity of the voltage applied to the light emitting layer portion 24, or leakage current is generated. This leads to a decrease in luminous efficiency itself. In order to prevent these problems, the surface roughness of the ITO electrode layer 20 is, specifically, Rmax when the evaluation area is 0.2 μm square by three-dimensional surface topography using an atomic force microscope (AFM). It is desirable to set it to 10 nm or less (for example, 4 nm or more and 7 nm or less).

  In order to smooth the surface of the ITO electrode layer 20 as described above, it is effective to polish the surface after the ITO electrode layer 20 is formed. However, since mechanical polishing is expensive, chemical polishing is adopted. Is desirable. As a chemical polishing liquid for ITO, for example, a mixed liquid of hydrochloric acid and nitric acid or an aqueous oxalic acid solution can be employed. In this case, when the microcrystallization of the ITO electrode layer 20 as described above proceeds, etching is likely to proceed at the crystal grain boundary, so that surface roughening due to grain boundary erosion and degranulation is likely to occur. Therefore, in order to obtain a homogeneous amorphous layer, the introduction of water vapor into the sputtering atmosphere can be an effective method for reducing the surface roughness of the ITO electrode layer after chemical polishing as described above. .

  Next, the laminated wafer 13 (see FIG. 6) on which the ITO electrode layer 20 is formed as described above and the surface chemical polishing is finished is placed in the furnace F as shown in FIG. In the atmosphere or an inert gas atmosphere such as Ar, heat treatment is performed at a low temperature of 600 ° C. to 750 ° C. (eg, 700 ° C.) for a short time of 5 seconds to 120 seconds (eg, 30 seconds). Thereby, In diffuses from the ITO electrode layer 20 to the GaAs layer 30 ′, and the contact layer 30 (FIG. 1) made of GaAs containing In is obtained. In addition, this heat treatment dramatically reduces the sheet resistance of the ITO electrode layer 20 and significantly reduces the forward voltage of the device. One of the factors is considered to be caused by the crystallization of the ITO electrode layer 20 already described with reference to FIG. In addition, when the chemical polishing for smoothing the ITO electrode layer 20 is performed after the heat treatment, it becomes difficult to obtain good smoothness due to dropping of the grown ITO crystal grains. Therefore, it is desirable to finish the chemical polishing before the heat treatment as described above.

Contact layer 30 by heat treatment, in FIG. 8 (1), In concentration _{C A} in the vicinity of the interface with the ITO electrode layer is at an atomic ratio of In to the total concentration of In and Ga, 0.1 or 0. 6 or less. Further, In concentration becomes shall continuously decreases as the distance in the thickness direction from the ITO electrode layer, the In concentration in the vicinity of the interface with the ITO electrode layer and C _A, the In concentration at the boundary position opposite thereto When C _B is set, C _B / C _A is adjusted to 0.8 or less. As described above, the GaAs layer 30 ′ having good lattice matching is first formed on the light emitting layer portion 24 made of AlGaInP, and then heat treatment is performed at a relatively low temperature for a short time. In addition, the contact layer 30 that is homogeneous and has good continuity is obtained. As a result, it is possible to effectively prevent quality degradation such as reduction in emission intensity due to lattice mismatch with the light emitting layer portion 24.

The contact layer 30 may be formed as having the same conductivity type as the cladding layer 6 by adding an appropriate dopant. However, when the contact layer 30 is formed as a thin layer as described above, the dopant concentration is low. Even if it is formed as a lightly doped layer (for example, 10 ¹⁷ pieces / cm ³ or less; or a non-doped layer (10 ¹³ pieces / cm ³ to 10 ¹⁶ pieces / cm ³ )), it does not cause an excessive increase in series resistance. It can be adopted. On the other hand, when the lightly doped layer is used, the following effects can be achieved depending on the driving voltage of the light emitting element. That is, by making the contact layer 30 a lightly doped layer, the electrical resistivity of the layer itself is increased. Therefore, the layer thickness of the contact layer 30 with respect to the cladding layer or the ITO electrode layer 20 having a small electrical resistivity sandwiching the contact layer 30 The electric field applied in the direction (that is, the voltage per unit distance) is relatively high. At this time, if the contact layer 30 is formed of GaAs containing In having a relatively small band gap, an appropriate bending occurs in the band structure of the contact layer by the application of the electric field, and a better ohmic contact can be obtained. Can be formed. And as shown in FIG. 8, this effect becomes more remarkable because the In concentration of the contact layer 30 is increased on the contact side with the ITO electrode layer 20.

  Returning to FIG. 4, as shown in FIG. 4E, a back electrode layer 15 is formed on the back surface side of the substrate 1 by vacuum deposition, and each light emission is formed on the ITO electrode layer 20 on the first main surface side. A metal electrode 9 is arranged in each region corresponding to the element chip and subjected to electrode fixing baking at an appropriate temperature, whereby a light emitting element wafer 50 shown in FIG. 4F is obtained. The light emitting element wafer 50 is half-diced as shown in FIG. 5 (a) to separate each light emitting element chip region, and after the processing strain on the dicing surface is removed by mesa etching as shown in (b). , (C), the light emitting element chip 51 is separated by scribing. And as shown in (d), while attaching the back surface electrode layer 15 (refer FIG. 4) to the terminal electrode 9a which served also as the support body using electroconductive pastes, such as Ag paste, it is different from the metal electrode 9 and another terminal. The light emitting element 100 is obtained by bonding the Au wire 47 in a form extending over the electrode 9b and forming the resin mold 52 as shown in FIG.

  In the light emitting element, the entire surface of the p-type AlGaInP clad layer 6 is covered with the ITO electrode layer 20, and a driving voltage is applied through the ITO electrode layer 20. As described above, the light emitting element 100 (element chip 51) has a square side dimension of 400 μm or more, and the ITO electrode layer 20 has a thickness of 400 nm or more. Thereby, the sheet resistance of the ITO electrode layer 20 is greatly reduced, and the forward voltage of the entire device 100 is also reduced. As a result, by applying a driving voltage through the metal electrode 9, current is uniformly diffused over the entire surface of the ITO electrode layer 20, and uniform light emission is obtained over the entire light extraction surface. Further, even when the covering area ratio of the metal electrode 9 is 0.1% or more and 10% or less, the current can be sufficiently diffused with respect to the ITO electrode layer 20, and the light emitting layer portion 24 is increased in area. The influence of shielding is reduced and the light extraction efficiency can be greatly improved. As a result, in combination with the decrease in the forward voltage, a large light emission intensity can be realized with a low driving voltage.

  Further, as shown in FIG. 12, the metal electrode 9 is arranged in the center of the ITO electrode layer 20, that is, with respect to the geometric gravity center position G of the main surface of the ITO electrode layer 20. However, since the current diffusion characteristics of the ITO electrode layer 20 are good, both the center of gravity positions G and G ′ are shifted, that is, the metal electrode 9 is formed. It is also possible to arrange it eccentrically from the center position of the ITO electrode layer 20. For example, when the main surface of the light emitting layer portion 24 is square, the metal electrode 9 may be disposed on the peripheral portion of the ITO electrode layer 2 as shown in FIG. 14 with respect to the ITO electrode layer 20 covering the entire surface. Alternatively, as shown in FIG. 13, it can be arranged at the corner.

  Hereinafter, various modifications of the light emitting element 100 will be described (the same parts as those of the light emitting element in FIG. 1 are denoted by the same reference numerals and detailed description thereof will be omitted). The light emitting element 200 of FIG. 16 has an element size of 400 μm or more, and an ITO electrode layer 20 whose film thickness is adjusted in the same manner as the element of FIG. A transparent conductive semiconductor substrate 23 (in this embodiment, an n-type GaP single crystal substrate) is bonded to the main surface on the opposite side. On the back side of the transparent conductive semiconductor substrate 23, a metal electrode that covers a part of the transparent conductive semiconductor substrate 23 can be provided to provide a light extraction surface. However, as shown in FIG. 16, the entire surface is covered with the back surface metal electrode 15 which also serves as a reflective layer, and the reflected light is superimposed on the light extraction surface side where the ITO electrode layer 20 is formed and taken out. Then, combined with the adoption of an appropriate ITO layer film thickness commensurate with the increase in area of the element, the emission intensity can be further increased.

  In this case, the transparent conductive semiconductor substrate 23 can be bonded to the light emitting layer portion 24 through the bonding transparent conductive oxide layer 10 (for example, ITO layer). Thereby, conduction between the light emitting layer portion 24 and the transparent conductive semiconductor substrate 23 can be ensured better, and it is not necessary to consider the lattice matching between the light emitting layer portion 24 and the transparent conductive semiconductor substrate 23. Easy to manufacture. In this case, as shown in FIG. 16, between the bonding transparent conductive oxide layer 10 and the transparent conductive semiconductor substrate 23, or between the bonding transparent conductive oxide layer 10 and the light emitting layer portion 24. The same contact layer 30 and intermediate layer 31 as in the case of the ITO electrode layer 20 can be provided.

  FIG. 17 shows an example of a method for manufacturing the light emitting device of FIG. First, as shown in Step 1, an n-type GaAs buffer layer 2 and a release layer made of AlAs (not shown) are epitaxially grown on a GaAs single crystal substrate 1 which is a light emitting layer growth substrate. Next, GaAs 30 ′ and intermediate layer 31 to be contact layers 30 later are epitaxially grown in this order, the light emitting layer portion 24 is further epitaxially grown, and finally the intermediate layer 31 and GaAs 30 ′ are epitaxially grown in this order.

  Next, as shown in Step 2, an ITO layer 10a is formed as a transparent conductive oxide layer on the GaAs 30 ′ on the light emitting layer portion 24 side by sputtering, and on the other hand, as shown in Step 3, a separately prepared n The same ITO layer 10b is also formed on the -GaP single crystal substrate 23. Then, the ITO layer 10b of the n-GaP single crystal substrate 23 is overlaid and pressed on the ITO layer 10a of the light emitting layer portion 24, and as shown in step 3, under predetermined conditions (for example, at 450 ° C. for 30 minutes). The substrate bonded body 60 ′ is made by heat treatment. The ITO layer 10a and the ITO layer 10b are integrated into a transparent conductive oxide layer 10 for bonding.

  Next, proceeding to Step 4, the bonded body is immersed in an etching solution made of, for example, a 10% hydrofluoric acid aqueous solution, and the AlAs release layer formed between the buffer layer 2 and the light emitting layer 24 is selectively etched. Thus, the GaAs single crystal substrate 1 (which is opaque to the light from the light emitting layer 24) is peeled from the stacked body 60a of the light emitting layer portion 24 and the p-GaP single crystal substrate 7 bonded thereto. It should be noted that an etch stop layer made of AlInP is formed in place of the AlAs release layer 3, and a GaAs single crystal is used by using a first etching solution (for example, ammonia / hydrogen peroxide mixed solution) having selective etching properties with respect to GaAs. Etch and remove the substrate 1 together with the GaAs buffer layer 2 and then etch stop using a second etchant that has selective etching properties with respect to AlInP (for example, hydrochloric acid: hydrofluoric acid may be added to remove the Al oxide layer) A step of etching away the layer can also be employed. Further, as shown in step 5, the intermediate layer 31 exposed by peeling off the GaAs single crystal substrate 1 and the GaAs layer 30 'that becomes the contact layer 30 are patterned.

  Then, as shown in Step 6, the ITO layer 20 is formed so as to cover the intermediate layer 31 and the GaAs layer 30 'formed on the light emitting layer 24 exposed by the peeling of the GaAs single crystal substrate 1. The thus obtained laminated wafer 60 (which may be either before or after the electrode 9 is formed) is placed in a furnace, and is placed in, for example, a nitrogen atmosphere or an inert gas atmosphere such as Ar. Then, heat treatment is performed at a low temperature of 600 ° C. to 750 ° C. (for example, 700 ° C.) for a short time of 5 seconds to 120 seconds (for example, 30 seconds). If the electrodes 9 and 15 are formed, the following steps are the same as those in FIG.

  The light emitting element 300 shown in FIG. 18 has an element size of 400 μm or more, the main surface on one side of the light emitting layer portion 24, the ITO electrode layer 20 whose film thickness is adjusted in the same manner as the element of FIG. Conductive substrate 7 is bonded to the main surface. The conductive substrate 7 can be bonded to the light emitting layer portion 24 through the metal layer 11. When the light emitting element 300 is configured in this manner, light emitted toward the back surface side can be superimposed on the light extraction surface side on which the ITO electrode layer 20 is formed by reflection on the metal layer 11, thereby improving light extraction efficiency. be able to. Thereby, combined with the adoption of an appropriate ITO layer film thickness commensurate with the increase in the area of the element, the emission intensity can be further increased.

  In this case, a metal substrate such as Al can be used as the conductive substrate, but in FIG. 18, an inexpensive Si substrate (polycrystalline substrate or single crystal substrate: the former is particularly inexpensive) is used. Yes. The metal layer 11 interposed in the bonding surface is an Au-based metal layer (having Au as a main component (50% by mass or more)) in FIG. 18 and is preferable because high reflectivity can be realized.

  FIG. 19 shows an example of the manufacturing method. First, as shown in Step 1, a GaAs buffer layer 2, a release layer made of AlAs (not shown), and a GaAs layer 30 ′ to be a contact layer 30 are formed on a p-type GaAs single crystal substrate 1 which is a light emitting layer growth substrate. The intermediate layer 31 is epitaxially grown. Then, the light emitting layer portion 24 is epitaxially grown on the p-type cladding layer 6 side. Next, as shown in step 2, a metal layer bonding layer 32 made of AuGeNi is dispersedly formed on the light emitting layer portion 24 by sputtering or vacuum deposition. In this state, by performing heat treatment at 350 ° C. or more and 500 ° C. or less, an alloy layer is formed between the light emitting layer portion 24 and the metal layer bonding layer 32, and the series resistance reduction is greatly reduced. Thereafter, the Au layer 11a is formed so as to cover the metal layer bonding layer 32 that has been alloyed. On the other hand, as shown in Step 3, an Al layer 11b is formed on the main back surface MP2 of the separately prepared Si single crystal substrate 7. Then, the Al layer 11b of the Si single crystal substrate 7 is superposed on the Au layer 11a of the light emitting layer portion 24 and pressed, and heat-treated as shown in Step 4, thereby making a substrate bonded body 70 '. The Au layer 11a and the Al layer 11b are alloyed to form a metal layer 11 made of an Au-based metal containing Al.

  Next, the process proceeds to step 5, and the substrate bonding body 70 ′ is immersed in an etching solution made of, for example, a 10% hydrofluoric acid aqueous solution, and the AlAs release layer formed between the buffer layer 2 and the light emitting layer 24 is selected. By etching, the GaAs single crystal substrate 1 (which is opaque to the light from the light emitting layer 24) is peeled from the stacked body 70a of the light emitting layer portion 24 and the Si single crystal substrate 7 bonded thereto. Then, as shown in step 6, the intermediate layer 31 exposed by peeling off the GaAs single crystal substrate 1 and the GaAs layer 30 ′ serving as the contact layer 30 are patterned, and the ITO layer 20 is further covered so as to cover the entire surface of the light emitting layer 24. Form.

  Then, the laminated wafer 70 on which the ITO layer 20 is formed is placed in a furnace, and at a low temperature of 600 ° C. to 750 ° C. (eg, 700 ° C.) in a nitrogen atmosphere or an inert gas atmosphere such as Ar. A short-time heat treatment of 5 seconds to 120 seconds (for example, 30 seconds) is performed. Thereby, In diffuses from the ITO layer 20 to the GaAs layer 30 ′, and the contact layer 30 made of GaAs containing In is obtained.

  In the light emitting element 100 of FIG. 18, the conductive substrate 7 and the light emitting layer portion 24 are bonded together via the metal layer 11, but as shown in FIG. 20, the metal layer on the conductive substrate 7 side. The conductive substrate 7 and the light emitting layer portion 24 can be bonded together via the bonding transparent conductive oxide layer (for example, ITO layer) 10 on the light emitting layer portion 24 side. Thereby, alloying with the metal layer 40 and the compound semiconductor which comprises the light emitting layer part 24 is suppressed, and the reflectance of a metal layer can be raised. A contact layer 30 or an intermediate layer 31 similar to the case of the ITO electrode layer 20 can be provided between the transparent conductive oxide layer 10 for bonding and the light emitting layer portion 24.

Hereinafter, experimental results performed to confirm the effects of the present invention will be described.
First, in the light emitting device 100 of FIG. 1, each layer was formed with the following thickness. The element shape was a square shape, and the element dimensions were 300 μm square (comparative example), 500 μm square, and 1000 μm square.
Contact layer 30: about 10 nm
Intermediate layer 31 (AlGaAs layer): about 0.3 μm
ITO electrode layer 20: 200 nm to 1000 nm (tin oxide content = 7% by mass (the balance is indium oxide))
P-type AlGaInP cladding layer 6 = 1 μm;
AlGaInP active layer 5 = 0.6 μm (emission wavelength 650 nm);
N-type AlGaInP cladding layer 4 = 1 μm;

The ITO electrode layer 20 was performed by high frequency sputtering under the following conditions:
Target composition: _In 2 _{O 3} = about 90 wt%, SnO ₂ = about 10 wt%;
-Film formation temperature: 20 ° C;
・ Rf frequency about 14MHz
・ Ar pressure 0.6Pa
・ Spatter power 30W
Further, the heat treatment after forming the ITO electrode layer was performed at 700 ° C. for 30 seconds. Further, the metal electrode 9 is an Au electrode and has a circular shape with a diameter of 100 μm.

Each obtained element was measured for each of the following characteristics by a well-known method:
-Luminous intensity (Iv: Current value of energization was set to various values of 40 to 200 mA / pulse (Duty 10%));
-IV characteristics;
-Forward voltage (V _F : When the conduction current value is 20 mA);

  FIG. 21 shows the light emission intensity characteristics when the element size is 1000 μm. It can be seen that when the thickness of the ITO electrode layer is 400 nm or more, the emission intensity is significantly increased as compared with a case where the thickness is thinner (specifically, 200 nm). On the other hand, FIG. 22 shows the result of the comparative example in which the element size is 300 μm. However, even if the thickness of the ITO electrode layer is 400 nm or more, the emission intensity is not improved so much. FIG. 23 shows a comparison of light emission intensities when the thickness of the ITO electrode layer is fixed at 800 nm and the element dimensions are changed. It can be seen that when the element size is 400 μm or more (specifically, 500 μm and 1000 μm), the emission intensity is greatly increased as compared to the case where the element size is smaller (specifically, 300 μm).

  That is, the following can be understood from the above results. In an element having an element size of 300 μm or less on the main surface of the light emitting layer portion, as shown in FIG. 22, the light emission intensity Iv of the element does not depend much on the thickness of the ITO electrode layer. When formed into a thin film (“×” plot point) or conversely formed into a thick film of about 1000 nm (“●” plot point), there is no significant difference in emission intensity. However, when the element size is increased to 400 μm or more, as shown in FIG. 21, the emission intensity is remarkably improved only when the ITO electrode layer is formed to have a thickness of 400 nm or more. It can be seen that excellent light emission characteristics can be obtained. In other words, by setting the ITO electrode layer thickness to 400 nm or more, even if the total current amount during energization is set to be the same, the large surface light emitting element having an element size of 400 μm or more has an element size of 300 μm. It shows that the emission intensity is higher than that of the following ordinary light emitting devices.

FIG. 25 is a device dimensions and 1000 .mu.m, in which a forward voltage V _F when fixing the forward current 20 mA, and the results of measurement for various ITO electrode layer thickness on a graph. As is clear from this result, the forward voltage decreases as the ITO electrode layer is thicker. Particularly, when the ITO electrode layer thickness is around 400 nm, the forward voltage decreases greatly discontinuously. If the forward voltage is reduced, the current spreading effect in the element surface is enhanced, and current can be injected into the entire light emitting layer portion having a large area without waste. That is, as a result, when the ITO electrode layer thickness is formed to a thickness of 400 nm or more, the forward voltage is drastically reduced, and the current spreading effect is dramatically enhanced correspondingly, resulting in a remarkable improvement in the emission intensity. That is what we do.

In the light emitting device 100 of FIG. 1, the light emitting layer portion 24 made of AlGaInP can be replaced with the light emitting layer portion 124 made of AlGaAs, like the light emitting device 1100 of FIG. The light emitting layer portion 124 includes an active layer 105 made of a non-doped Al _z Ga _1-z As (where 0 ≦ z ≦ 0.4) mixed crystal and a p-type Al _{z ′} Ga _{1-z ′} As (where z < a structure sandwiched between a p-type cladding layer 106 made of z ′ ≦ 1) and an n-type cladding layer 104 made of n-type Al _{z ′} Ga _{1−z ′} As (where z <z ′ ≦ 1) Depending on the composition of the layer 5, the emission wavelength can be adjusted in the red to infrared region (the emission wavelength (center wavelength) is not less than 630 nm and not more than 940 nm).

  Similarly, the light-emitting element 1100 in FIG. 27 is an example in which the light-emitting layer part 24 of the light-emitting element 100 in FIG. 15 is replaced with the same light-emitting layer part 124 made of AlGaAs as in FIG. A light emitting element 1200 of FIG. 28 is an example in which the light emitting layer part 24 of the light emitting element 200 of FIG. 16 is replaced with the same light emitting layer part 124 made of AlGaAs as FIG. A light emitting element 1300 in FIG. 29 is an example in which the light emitting layer part 24 of the light emitting element 300 in FIG. 18 is replaced with the light emitting layer part 124 made of AlGaAs as in FIG. A light emitting element 1100 in FIG. 30 is an example in which the light emitting layer part 24 of the light emitting element 100 in FIG. 20 is replaced with the same light emitting layer part 124 made of AlGaAs as in FIG.

In each configuration of FIGS. 26 to 30, the portions given the same reference numerals as the configurations of the corresponding diagrams (FIGS. 1, 15, 16, 18, and 20) represent the same elements. . However, the intermediate layer 31 is made of AlGaAs having an Al mixed crystal ratio smaller than that of the cladding layer 106 in contact with the intermediate layer 31 (that is, Al _{z ″} Ga _{1-z ″} As (where 0 <z ″ <z ′). Since the contact layer 30 is made of In-containing GaAs, the intermediate layer 31 may be GaAs, and also in the explanation made with reference to FIGS. 26 is replaced with the light emitting layer portion 124, the p-type cladding layer 6 with the p-type cladding layer 106, the active layer 5 with the active layer 105, and the n-type cladding layer 4 with the n-type cladding layer 104, respectively. The same applies to FIG.

  The manufacturing method of each configuration shown in FIGS. 26 to 30 is the same as the basic configuration shown in FIGS. 1, 15, 16, 18, and 20. For example, the light emitting layer portion 124 made of AlGaAs is used. Although it can be grown by the MOVPE method, in the case of AlGaAs, it is grown by a cheaper and more efficient liquid phase epitaxial growth method (Luquid Phase Epitaxy: LPE, the method itself is well known and detailed description is omitted). Is also possible. In this case, the entire light emitting layer portion 124 including the buffer layer 2 can be grown by the LPE method. However, since the intermediate layer 31 or the contact layer 30 has a small layer thickness, it is desirable that the intermediate layer 31 or the contact layer 30 is grown by the MOVPE method that can easily control the layer thickness. Specifically, the light emitting layer portion 124 is grown on the GaAs substrate by the LPE method, and then the contact layer 30, or the intermediate layer 31 and the contact layer 30 are grown on the light emitting layer portion 124 by the MOVPE method. The method of doing can be illustrated.

BRIEF DESCRIPTION OF THE DRAWINGS Sectional drawing and top view which show typically 1st embodiment of the light emitting element of this invention. The schematic diagram which estimates and shows the effect of the thickness of an ITO electrode layer. The figure which illustrates and illustrates the various patterning form of a contact layer. FIG. 2 is a first diagram illustrating a manufacturing process of the light emitting element of FIG. 1. The second figure. The third figure. The fourth figure. The figure which shows typically an example of In concentration distribution in a contact layer. The figure which shows typically another example of In concentration distribution in a contact layer. The schematic diagram which shows the example of the band structure of a contact layer when not forming an intermediate | middle layer. The schematic diagram which shows the example of the band structure of a contact layer in the case of forming an intermediate | middle layer. The figure which shows the 1st example of the metal electrode formation position with respect to an ITO electrode layer. The figure which shows the 2nd example of the metal electrode formation position with respect to an ITO electrode layer. The figure which shows the 3rd example of the metal electrode formation position with respect to an ITO electrode layer. The figure which shows the modification of the formation form of an intermediate | middle layer. Sectional drawing which shows typically 2nd embodiment of the light emitting element of this invention. Explanatory drawing which shows an example of the manufacturing process of the light emitting element of FIG. Sectional drawing which shows typically 3rd embodiment of the light emitting element of this invention. Explanatory drawing which shows an example of the manufacturing process of the light emitting element of FIG. Sectional drawing which shows the modification of the light emitting element of FIG. 18 typically. The 1st graph which shows the experimental result done for the effect confirmation of the light emitting element of this invention. The second graph. The third graph. The fourth graph. The fifth graph. The figure which shows the example which replaced the AlGaInP light emitting layer part of the light emitting element of FIG. 1 with the AlGaAs light emitting layer part. The figure which shows the example which replaced the AlGaInP light emitting layer part of the light emitting element of FIG. 15 with the AlGaAs light emitting layer part. The figure which shows the example which replaced the AlGaInP light emitting layer part of the light emitting element of FIG. 16 with the AlGaAs light emitting layer part. The figure which shows the example which replaced the AlGaInP light emitting layer part of the light emitting element of FIG. 18 with the AlGaAs light emitting layer part. The figure which shows the example which replaced the AlGaInP light emitting layer part of the light emitting element of FIG. 20 with the AlGaAs light emitting layer part.

Explanation of symbols

4,104 n-type cladding layer 5,105 active layer 6,106 p-type cladding layer 7 Si single crystal substrate (conductive substrate)
DESCRIPTION OF SYMBOLS 9 Metal electrode 20 ITO electrode layer 24,124 Light emitting layer part 30 Contact layer 30 'GaAs layer 31 Intermediate layer 100,200,300,1100,1200,1300 Light emitting element

Claims (20)

At least one main surface of the light emitting layer portion made of a compound semiconductor is covered with an ITO electrode layer which is a light extraction surface side electrode,
The dimension of one side in square conversion of the main surface of the light emitting layer portion is 400 μm or more,
And the thickness of the said ITO electrode layer is 400 nm or more, The light emitting element characterized by the above-mentioned. The light emitting device according to claim 1, wherein the ITO electrode layer is heat-treated at a temperature higher than a film formation temperature after film formation by sputtering. On the main surface of the ITO electrode layer, a metal electrode for applying a voltage to the light emitting layer portion is formed so as to cover a partial region of the main surface,
The light emitting device according to claim 1, wherein a coverage area ratio of the ITO electrode layer by the metal electrode is 0.1% or more and 10% or less. The said metal electrode is arrange | positioned with respect to the geometric gravity center position of the main surface of the said ITO electrode layer, and the geometric gravity center position of the formation area of this metal electrode has shifted | deviated, and is arrange | positioned. Light emitting element. The main surface of the light emitting layer portion is square, the ITO electrode layer covers the entire main surface of the light emitting layer portion, and the metal electrode is disposed at the peripheral edge or corner portion of the ITO electrode layer. The light-emitting element according to claim 4. The contact layer for reducing the junction resistance of the ITO electrode layer is disposed between the light emitting layer portion and the ITO electrode layer so as to be in contact with the ITO electrode layer. Item 6. The light-emitting element according to any one of Items 5. The light emitting device according to claim 6, wherein the contact layer is made of a compound semiconductor that does not contain Al at a bonding interface with the ITO electrode layer and has a band gap energy smaller than 1.42 eV. The light emitting layer portion is made of (Al _x Ga _1-x ) _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1), and the compound semiconductor constituting the contact layer is the ITO electrode The light-emitting element according to claim 7, wherein In _x Ga _1-x As (0 <x ≦ 1) at a junction interface with the layer. The light emitting layer portion is made of Al _z Ga _1-z As (where 0 ≦ z ≦ 1), and the compound semiconductor constituting the contact layer is In _x Ga _1-x As at the junction interface with the ITO electrode layer. The light-emitting element according to claim 7, wherein 0 <x ≦ 1. 10. The light emitting device according to claim 8, wherein the In concentration distribution in the thickness direction of the contact layer continuously decreases as the contact layer moves away from the ITO electrode layer in the thickness direction. . On the main surface of the ITO electrode layer, a metal electrode for applying a voltage to the light emitting layer portion is formed so as to cover a partial region of the main surface,
The ITO electrode layer has a first region composed of a region immediately below the metal electrode and a remaining second region, and the contact layer has a larger area ratio than the first region in the second region. The light-emitting element according to claim 1. The light emitting device according to claim 11, wherein the contact layer is not formed in the first region. 13. The light emitting device according to claim 11, wherein at least the contact layer forming region and the non-forming region are mixed in the second region. The main surface of the contact layer opposite to the ITO electrode layer is in contact with the light emitting layer portion via an intermediate layer, and the intermediate layer is connected to the light emitting layer portion and the light emitting layer portion. The light-emitting element according to claim 6, wherein the light-emitting element is made of a compound semiconductor having a band gap energy intermediate to that of the contact layer. The light emitting layer portion is made of (Al _x Ga _1-x ) _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1), and the intermediate layer is composed of an AlGaAs layer, a GaInP layer, and an AlGaInP The light-emitting element according to claim 14, wherein the light-emitting element includes at least one of the layers. An ITO electrode layer that is a light extraction surface side electrode is formed by sputtering on at least one main surface of a light emitting layer portion made of a compound semiconductor having a side dimension of 400 μm or more in terms of square of the main surface, and then the ITO A method of manufacturing a light-emitting element, wherein the light-emitting layer portion on which the electrode layer is formed is heat-treated at a temperature higher than a film forming temperature of the ITO electrode layer. The method for manufacturing a light-emitting element according to claim 16, wherein the heat treatment is performed at a temperature of 300 ° C. to 750 ° C. A GaAs layer between the ITO electrode layer and the light emitting layer portion made of (Al _x Ga _1-x ) _y In _1-y P (where 0 ≦ x ≦ 1, 0 ≦ y ≦ 1), It is formed so as to be in contact with the ITO electrode layer, and then the heat treatment is performed to diffuse In from the ITO electrode layer to the GaAs layer, thereby forming a contact layer made of GaAs containing In. The manufacturing method of the light emitting element of Claim 16 or Claim 17. Wherein the ITO electrode _{layer, Al z Ga 1-z As} ( however, 0 ≦ z ≦ 1) of the GaAs layer between the light emitting layer portion made of, is formed so as to be in contact with the ITO electrode layer, then, the The light emitting device according to claim 16 or 17, wherein heat treatment is performed to diffuse In from the ITO electrode layer to the GaAs layer to form a contact layer made of GaAs containing In. Production method. The method for manufacturing a light-emitting element according to claim 19, wherein the heat treatment is performed at a temperature of 600 ° C. to 750 ° C. for 5 seconds to 120 seconds.

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