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JP2002131163A - Package for pressure detection device - Google Patents

Package for pressure detection device

Info

Publication number
JP2002131163A
JP2002131163A JP2000327443A JP2000327443A JP2002131163A JP 2002131163 A JP2002131163 A JP 2002131163A JP 2000327443 A JP2000327443 A JP 2000327443A JP 2000327443 A JP2000327443 A JP 2000327443A JP 2002131163 A JP2002131163 A JP 2002131163A
Authority
JP
Japan
Prior art keywords
electrode
insulating plate
metallization layer
semiconductor element
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000327443A
Other languages
Japanese (ja)
Other versions
JP4557405B2 (en
Inventor
Koji Kinomura
浩司 木野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000327443A priority Critical patent/JP4557405B2/en
Publication of JP2002131163A publication Critical patent/JP2002131163A/en
Application granted granted Critical
Publication of JP4557405B2 publication Critical patent/JP4557405B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15174Fan-out arrangement of the internal vias in different layers of the multilayer substrate

Landscapes

  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a pressure detection device small in size, highly sensible and capable of accurately detecting an external pressure without the variation. SOLUTION: In a package for the pressure detection device, a semiconductor element 3 is mounted on one side of a main plane of an insulating substrate 1, and a first electrode 7 for generating the electrostatic capacity and a first metallized bounding layer 8 that surrounds the first electrode 7 are disposed on the other side of the main plane. A second electrode 9 opposing to the first electrode 7 and a second metallized bonding layer 10 electrically connected to the second electrode 9 through a connecting metallized layer 11 that surrounds the second electrode 9 and is disposed in the section on outside plane of an insulating plate 2, are disposed on inside plane of the insulating plate 2. The first metallized bonding layer 8 and the second metallized bounding layer 10 are brazed to each other, thereby the insulating plate 2 is bonded on another side of the main plane of the insulating substrate 1 so flexible that a sealed space is formed between the insulating substrate 1 and the insulating plate 2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、圧力を検出するた
めの圧力検出装置に使用される圧力検出装置用パッケー
ジに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pressure detecting device package used for a pressure detecting device for detecting pressure.

【0002】[0002]

【従来の技術】従来、圧力を検出するための圧力検出装
置として静電容量型の圧力検出装置が知られている。こ
の静電容量型の圧力検出装置は、例えば図3に断面図で
示すように、セラミックス材料や樹脂材料から成る配線
基板21上に、静電容量型の感圧素子22と、パッケージ28
に収容された演算用の半導体素子29とを備えている。感
圧素子22は、例えばセラミックス材料等の電気絶縁材料
から成り、上面中央部に静電容量形成用の一方の電極23
が被着された凹部を有する絶縁基体24と、この絶縁基体
24の上面に絶縁基体24との間に密閉空間を形成するよう
にして可撓な状態で接合され、下面に静電容量形成用の
他方の電極25が被着された絶縁板26と、各静電容量形成
用の電極23・25をそれぞれ外部に電気的に接続するため
の外部リード端子27とから構成されており、外部の圧力
に応じて絶縁板26が撓むことにより各静電容量形成用の
電極23・25間に形成される静電容量が変化する。そし
て、この静電容量の変化を演算用の半導体素子29により
演算処理することにより外部の圧力を検出することがで
きる。
2. Description of the Related Art Conventionally, a capacitance type pressure detecting device has been known as a pressure detecting device for detecting pressure. As shown in a sectional view of FIG. 3, for example, a capacitance type pressure sensing device 22 and a package 28 are provided on a wiring board 21 made of a ceramic material or a resin material.
And a semiconductor element 29 for arithmetic operation accommodated in the computer. The pressure-sensitive element 22 is made of, for example, an electrically insulating material such as a ceramic material.
An insulating substrate 24 having a concave portion with
An insulating plate 26 which is joined in a flexible state on the upper surface of the insulating substrate 24 so as to form a sealed space between the insulating substrate 24 and the other electrode 25 for forming a capacitance on the lower surface; Each of the electrodes 23 and 25 for forming a capacitance includes an external lead terminal 27 for electrically connecting the electrode to the outside, and each of the capacitances is formed by bending the insulating plate 26 in response to an external pressure. The capacitance formed between the forming electrodes 23 and 25 changes. An external pressure can be detected by subjecting the change in capacitance to arithmetic processing by the arithmetic semiconductor element 29.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この従
来の圧力検出装置によると、感圧素子22と半導体素子29
とを配線基板21上に個別に実装していることから、圧力
検出装置が大型化してしまうとともに圧力検出用の電極
23・25と半導体素子29との間の配線が長いものとなり、
この長い配線間に不要な静電容量が形成されるため感度
が低いという問題点を有していた。
However, according to the conventional pressure detecting device, the pressure-sensitive element 22 and the semiconductor element 29 are not provided.
Are individually mounted on the wiring board 21, which increases the size of the pressure detecting device and the pressure detecting electrode.
The wiring between 23 and 25 and the semiconductor element 29 becomes longer,
There is a problem that the sensitivity is low because an unnecessary capacitance is formed between the long wires.

【0004】そこで、本願出願人は、先に特願2000-178
618号において、一方の主面に半導体素子が搭載される
搭載部を有する絶縁基体と、この絶縁基体の表面および
内部に配設され、半導体素子の各電極が電気的に接続さ
れる複数の配線導体と、絶縁基体の他方の主面の中央部
に被着され、配線導体の一つに電気的に接続された静電
容量形成用の第一電極と、絶縁基体の他方の主面に、こ
の主面の中央部との間に密閉空間を形成するように可撓
な状態で接合された絶縁板と、この絶縁板の内側主面に
第一電極に対向して被着され、配線導体の他の一つに電
気的に接続された静電容量形成用の第二電極とを具備す
る圧力検出装置用パッケージを提案した。この圧力検出
装置用パッケージによると、一方の主面に半導体素子が
搭載される搭載部を有する絶縁基体の他方の主面に静電
容量形成用の第一電極を設けるとともに、この第一電極
に対向する静電容量形成用の第二電極を内側面に有する
絶縁板を、絶縁基体の他方の主面との間に密閉空間を形
成するようにして可撓な状態で接合させたことから、半
導体素子を収容するパッケージに感圧素子が一体に形成
され、その結果、圧力検出装置を小型とすることができ
るとともに圧力検出用の電極と半導体素子とを接続する
配線を短いものとして、これらの配線間に発生する不要
な静電容量を小さなものとすることができる。なお、こ
の特願2000-178618号で提案した圧力検出装置用パッケ
ージにおいては、絶縁基体の他方の主面の外周部にセラ
ミックスや金属から成る枠体を第一電極を取り囲むよう
にして設けておき、この枠体上に第二電極の外周部を銀
−銅ろう等のろう材を介してろう付けすることにより絶
縁板が絶縁基体に接合されていた。
Accordingly, the applicant of the present application has previously filed Japanese Patent Application No. 2000-178.
No. 618, an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and a plurality of wirings disposed on and inside the insulating base and electrically connected to respective electrodes of the semiconductor element. A conductor, a first electrode for forming a capacitance, which is attached to a central portion of the other main surface of the insulating base and is electrically connected to one of the wiring conductors, and on the other main surface of the insulating base, An insulating plate joined in a flexible state so as to form a sealed space with the central portion of the main surface; and a wiring conductor attached to the inner main surface of the insulating plate so as to face the first electrode, and And a package for a pressure detection device comprising a second electrode for forming a capacitance which is electrically connected to the other one. According to this pressure detecting device package, a first electrode for forming a capacitance is provided on the other main surface of the insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and the first electrode is provided on the first electrode. Since the insulating plate having the opposing second electrode for capacitance formation on the inner surface is joined in a flexible state so as to form a sealed space with the other main surface of the insulating base, The pressure-sensitive element is formed integrally with the package containing the semiconductor element, and as a result, the pressure detection device can be reduced in size, and the wiring for connecting the electrode for pressure detection and the semiconductor element is shortened. Unnecessary capacitance generated between the wirings can be reduced. In the package for a pressure detecting device proposed in Japanese Patent Application No. 2000-178618, a frame made of ceramics or metal is provided on the outer peripheral portion of the other main surface of the insulating base so as to surround the first electrode. The insulating plate was joined to the insulating base by brazing the outer peripheral portion of the second electrode on the frame via a brazing material such as silver-copper brazing material.

【0005】しかしながら、この特願2000-178618号で
提案した圧力検出装置用パッケージによると、セラミッ
クスや金属から成る枠体上に絶縁板の第二電極の外周部
を銀−銅ろう等のろう材を介してろう付けする際に、ろ
う材の一部が第二電極の中央部に多量に流れ出してしま
いやすく、このように多量に流れ出したろう材により第
一電極と第二電極との間に形成される静電容量が大きく
ばらついてしまい、そのため外部の圧力を正確に検出す
ることが困難であるという問題点を有していた。
However, according to the pressure sensing device package proposed in Japanese Patent Application No. 2000-178618, the outer peripheral portion of the second electrode of the insulating plate is formed on a frame made of ceramics or metal by a brazing material such as silver-copper brazing material. When brazing through, a large amount of the brazing material easily flows out to the center of the second electrode, and is formed between the first electrode and the second electrode by the brazing material that has flowed in such a large amount. However, there is a problem that it is difficult to accurately detect an external pressure.

【0006】本発明は、かかる上述の問題点に鑑み完成
されたものであり、その目的は、小型でかつ感度が高
く、しかも外部の圧力をばらつきなく正確に検出するこ
とが可能な圧力検出装置を提供することにある。
The present invention has been completed in view of the above-mentioned problems, and has as its object to provide a pressure detecting device which is small in size, has high sensitivity, and is capable of accurately detecting external pressure without variation. Is to provide.

【0007】[0007]

【課題を解決するための手段】本発明の圧力検出装置用
パッケージは、一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、この絶縁基体の表面および内
部に配設され、半導体素子の各電極が電気的に接続され
る複数の配線導体と、絶縁基体の他方の主面の中央部に
被着され、配線導体の一つに電気的に接続された静電容
量形成用の第一電極と、この他方の主面の外周部に第一
電極を取り囲むようにして被着され、配線導体の他の一
つに電気的に接続された枠状の第一接合用メタライズ層
と、前記中央部との間に密閉空間を形成するように可撓
な状態で絶縁基体に接合された絶縁板と、この絶縁板の
内側主面に第一電極に対向して被着された第二電極と、
この内側主面に第二電極を取り囲むようにして被着さ
れ、第一接合用メタライズ層にろう材を介して接合され
た枠状の第二接合用メタライズ層と、絶縁板の内部およ
び外側主面に被着され、第二電極を第二接合用メタライ
ズ層に電気的に接続する接続用メタライズ導体とを具備
することを特徴とするものである。
A package for a pressure detecting device according to the present invention is provided on an insulating base having a mounting portion on one side of which a semiconductor element is mounted, and on the surface and inside of the insulating base. A plurality of wiring conductors to which each electrode of the semiconductor element is electrically connected; and a capacitance forming electrode attached to the center of the other main surface of the insulating base and electrically connected to one of the wiring conductors. And a frame-shaped first bonding metallization layer which is attached to the outer periphery of the other main surface so as to surround the first electrode and is electrically connected to another one of the wiring conductors And an insulating plate joined to the insulating base in a flexible state so as to form a sealed space between the central portion and the insulating plate. The insulating plate is attached to the inner main surface of the insulating plate so as to face the first electrode. A second electrode;
A frame-shaped second bonding metallization layer attached to the inner main surface so as to surround the second electrode and bonded to the first bonding metallization layer via a brazing material; A connection metallization conductor that is attached to the surface and electrically connects the second electrode to the second bonding metallization layer.

【0008】本発明の圧力検出装置用パッケージによれ
ば、一方の主面に半導体素子が搭載される搭載部を有す
る絶縁基体の他方の主面の中央部に静電容量形成用の第
一電極を設けるとともに、この第一電極に対向する静電
容量形成用の第二電極を有する絶縁板を、絶縁基体との
間に密閉空間を形成するようにして可撓な状態で接合さ
せたことから、半導体素子を収容するパッケージに感圧
素子が一体に形成され、その結果、圧力検出装置を小型
とすることができるとともに圧力検出用の電極と半導体
素子とを接続する配線を短いものとして、これらの配線
間に発生する不要な静電容量を小さなものとすることが
できる。さらに、第一接合用メタライズ層にろう付けさ
れる枠状の第二接合用メタライズ層を絶縁板の内側面に
第二電極を取り囲むように設けるとともに、この第二接
合用メタライズ層と第二電極とを絶縁板の内部および表
面に設けた接続用メタライズ導体を介して電気的に接続
したことから、第一接合用メタライズ層と第二接合用メ
タライズ層とを接合するろう材が第二電極に流出するこ
とはなく、その結果、第一電極と第二電極との間に形成
される静電容量にろう材流出によるばらつきが発生する
ことがない。
According to the pressure detecting device package of the present invention, the first electrode for forming the capacitance is formed at the center of the other main surface of the insulating base having the mounting portion on which the semiconductor element is mounted on one main surface. And an insulating plate having a second electrode for forming a capacitance opposed to the first electrode is bonded in a flexible state so as to form a closed space between the insulating plate and the insulating base. The pressure-sensitive element is formed integrally with the package containing the semiconductor element. As a result, the pressure detecting device can be reduced in size and the wiring for connecting the pressure detecting electrode and the semiconductor element can be shortened. Unnecessary capacitance generated between the wirings can be reduced. Further, a frame-shaped second bonding metallization layer brazed to the first bonding metallization layer is provided on the inner surface of the insulating plate so as to surround the second electrode, and the second bonding metallization layer and the second electrode Are electrically connected to each other through the metallization conductor for connection provided inside and on the surface of the insulating plate, so that the brazing material for bonding the first metallization layer for bonding and the second metallization layer for bonding is used for the second electrode. There is no outflow, and as a result, the capacitance formed between the first electrode and the second electrode does not vary due to the outflow of the brazing material.

【0009】[0009]

【発明の実施の形態】次に、本発明を添付の図面を基に
詳細に説明する。図1は、本発明の圧力検出装置用パッ
ケージの実施の形態の一例を示す断面図であり、図中、
1は絶縁基体、2は絶縁板、3は半導体素子である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view illustrating an example of an embodiment of a pressure detection device package according to the present invention.
1 is an insulating base, 2 is an insulating plate, and 3 is a semiconductor element.

【0010】絶縁基体1は、酸化アルミニウム質焼結体
や窒化アルミニウム質焼結体・ムライト質焼結体・炭化
珪素質焼結体・窒化珪素質焼結体・ガラス−セラミック
ス等のセラミックス材料から成る積層体であり、例えば
酸化アルミニウム質焼結体から成る場合であれば、酸化
アルミニウム・酸化珪素・酸化マグネシウム・酸化カル
シウム等のセラミック原料粉末に適当な有機バインダ・
溶剤・可塑剤・分散剤を添加混合して泥漿状となすとと
もにこれを従来周知のドクタブレード法を採用してシー
ト状に成形することにより複数枚のセラミックグリーン
シートを得、しかる後、これらのセラミックグリーンシ
ートに適当な打ち抜き加工・積層加工・切断加工を施す
ことにより絶縁基体1用の生セラミック成形体を得ると
ともにこの生セラミック成形体を約1600℃の温度で焼成
することにより製作される。
The insulating substrate 1 is made of a ceramic material such as a sintered body of aluminum oxide, a sintered body of aluminum nitride, a sintered body of mullite, a sintered body of silicon carbide, a sintered body of silicon nitride, and glass-ceramics. For example, in the case of an aluminum oxide sintered body, an organic binder suitable for ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, calcium oxide, etc.
A solvent, a plasticizer, and a dispersant are added and mixed to form a slurry, and this is formed into a sheet by employing a conventionally known doctor blade method to obtain a plurality of ceramic green sheets. The green ceramic sheet is subjected to appropriate punching, laminating, and cutting to obtain a green ceramic molded body for the insulating substrate 1 and is fired at a temperature of about 1600 ° C. to produce the green ceramic molded body.

【0011】絶縁基体1は、その下面中央部に半導体素
子3を収容するための凹部1aが形成されており、これ
により半導体素子3を収容する容器として機能する。そ
して、この凹部1aの底面中央部が半導体素子3が搭載
される搭載部1bとなっており、この搭載部1bに半導
体素子3を搭載するとともに凹部1a内に例えばエポキ
シ樹脂等の樹脂製封止材4を充填することにより半導体
素子3が封止される。なお、この例では半導体素子3は
樹脂製封止材4を凹部1a内に充填することにより封止
されるが、半導体素子3は絶縁基体1の下面に金属やセ
ラミックスから成る蓋体を凹部1aを塞ぐように接合さ
せることにより封止されてもよい。
The insulating substrate 1 has a concave portion 1a for accommodating the semiconductor element 3 in the center of the lower surface thereof, and thereby functions as a container for accommodating the semiconductor element 3. The central portion of the bottom surface of the concave portion 1a is a mounting portion 1b on which the semiconductor element 3 is mounted. The semiconductor element 3 is mounted on the mounting portion 1b and a resin sealing such as an epoxy resin is formed in the concave portion 1a. The semiconductor element 3 is sealed by filling the material 4. In this example, the semiconductor element 3 is sealed by filling a resin sealing material 4 into the concave portion 1a. However, the semiconductor element 3 is provided with a lid made of metal or ceramic on the lower surface of the insulating base 1 in the concave portion 1a. It may be sealed by joining so as to close.

【0012】また、搭載部1bには半導体素子3の各電
極に接続される複数のメタライズ配線導体5が導出して
おり、このメタライズ配線導体5と半導体素子3の各電
極を半田バンプ6等の導電性材料から成る導電性接合部
材を介して接合することにより半導体素子3の各電極と
各メタライズ配線導体5とが電気的に接続されるととも
に半導体素子3が搭載部1bに固定される。なお、この
例では、半導体素子3の電極とメタライズ配線導体5と
は半田バンプ6を介して接続されるが、半導体素子3の
電極とメタライズ配線導体5とはボンディングワイヤ等
の他の種類の電気的接続手段により接続されてもよい。
A plurality of metallized wiring conductors 5 connected to the respective electrodes of the semiconductor element 3 are led out from the mounting portion 1b, and the metallized wiring conductor 5 and the respective electrodes of the semiconductor element 3 are connected to the solder bumps 6 and the like. By bonding via a conductive bonding member made of a conductive material, each electrode of the semiconductor element 3 is electrically connected to each metallized wiring conductor 5, and the semiconductor element 3 is fixed to the mounting portion 1b. In this example, the electrodes of the semiconductor element 3 and the metallized wiring conductors 5 are connected via the solder bumps 6, but the electrodes of the semiconductor element 3 and the metallized wiring conductors 5 are connected to another type of electric wire such as a bonding wire. May be connected by a dynamic connection means.

【0013】メタライズ配線導体5は、半導体素子3の
各電極を外部電気回路および後述する第一電極7・第二
電極9に電気的に接続するための導電路として機能し、
その一部は絶縁基体1の外周下面に導出し、別の一部は
第一電極7・第二電極9に電気的に接続されている。そ
して、半導体素子3の各電極をこれらのメタライズ配線
導体5に導電性接合材を介して電気的に接続するととも
に半導体素子3を樹脂製封止材4で封止した後、メタラ
イズ配線導体5の絶縁基体1外周下面に導出した部位を
外部電気回路基板の配線導体に半田等の導電性接合材を
介して接合することにより、内部に収容する半導体素子
3が外部電気回路に電気的に接続されることとなる。
The metallized wiring conductor 5 functions as a conductive path for electrically connecting each electrode of the semiconductor element 3 to an external electric circuit and a first electrode 7 and a second electrode 9, which will be described later.
A part thereof is led out to the lower surface of the outer periphery of the insulating base 1, and another part is electrically connected to the first electrode 7 and the second electrode 9. Then, each electrode of the semiconductor element 3 is electrically connected to these metallized wiring conductors 5 via a conductive bonding material, and the semiconductor element 3 is sealed with a resin sealing material 4. The semiconductor element 3 housed therein is electrically connected to the external electric circuit by joining the portion led out to the lower surface of the outer periphery of the insulating base 1 to the wiring conductor of the external electric circuit board via a conductive bonding material such as solder. The Rukoto.

【0014】このようなメタライズ配線導体5は、タン
グステンやモリブデン・銅・銀等の金属粉末メタライズ
から成り、タングステン等の金属粉末に適当な有機バイ
ンダ・溶剤・可塑剤・分散剤等を添加混合して得たメタ
ライズペーストを従来周知のスクリーン印刷法を採用し
て絶縁基体1用のセラミックグリーンシートに所定のパ
ターンに印刷塗布し、これを絶縁基体1用の生セラミッ
ク成形体とともに焼成することによって絶縁基体1の内
部および表面に所定のパターンに形成される。なお、メ
タライズ配線導体5の露出表面には、メタライズ配線導
体5が酸化腐食するのを防止するとともにメタライズ配
線導体5と半田等の導電性接合材との接合を良好なもの
とするために、通常であれば、厚みが1〜10μm程度の
ニッケルめっき層と厚みが0.1〜3μm程度の金めっき
層とが順次被着されている。
The metallized wiring conductor 5 is made of metallized metal powder such as tungsten, molybdenum, copper, silver, etc., and is mixed with a metal powder such as tungsten by adding an appropriate organic binder, solvent, plasticizer, dispersant and the like. The metallized paste obtained as described above is applied to a ceramic green sheet for the insulating substrate 1 in a predetermined pattern by employing a conventionally known screen printing method, and is fired together with the green ceramic molded body for the insulating substrate 1 for insulation. A predetermined pattern is formed inside and on the surface of the base 1. In addition, in order to prevent the metallized wiring conductor 5 from being oxidized and corroded and to make the metallized wiring conductor 5 and a conductive bonding material such as solder good, the exposed surface of the metallized wiring conductor 5 is usually formed on the exposed surface. In this case, a nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially applied.

【0015】また、絶縁基体1の上面外周部には絶縁基
体1と同一材料から成る高さが0.01〜5mm程度の枠体
1cが設けられており、それにより上面中央部に底面が
略平坦な凹部1dが形成されている。この凹部1dは、
後述するように、絶縁板2との間に密閉空間を形成する
ためのものであり、この凹部1dの底面には静電容量形
成用の第一電極7が被着されている。
A frame 1c made of the same material as the insulating substrate 1 and having a height of about 0.01 to 5 mm is provided on the outer peripheral portion of the upper surface of the insulating substrate 1, so that the bottom surface is substantially flat at the center of the upper surface. A recess 1d is formed. This recess 1d
As will be described later, this is for forming a closed space between the insulating plate 2 and the first electrode 7 for forming a capacitance is attached to the bottom surface of the concave portion 1d.

【0016】この第一電極7は、後述する第二電極9と
ともに感圧素子用の静電容量を形成するためのものであ
り、例えば略円形のパターンに形成されている。そし
て、この第一電極7にはメタライズ配線導体5の一つ5
aが接続されており、それによりこのメタライズ配線導
体5aに半導体素子3の電極を半田バンプ6等の導電性
接合材を介して接続すると半導体素子3の電極と第一電
極7とが電気的に接続されるようになっている。
The first electrode 7 is for forming a capacitance for a pressure-sensitive element together with a second electrode 9 to be described later, and is formed, for example, in a substantially circular pattern. The first electrode 7 is provided with one of the metallized wiring conductors 5.
When the electrode of the semiconductor element 3 is connected to the metallized wiring conductor 5a via a conductive bonding material such as a solder bump 6, the electrode of the semiconductor element 3 and the first electrode 7 are electrically connected. It is to be connected.

【0017】このような第一電極7は、タングステンや
モリブデン・銅・銀等の金属粉末メタライズから成り、
タングステン等の金属粉末に適当な有機バインダ・溶剤
・可塑剤・分散剤を添加混合して得たメタライズペース
トを従来周知のスクリーン印刷法を採用して絶縁基体1
用のセラミックグリーンシートに印刷塗布し、これを絶
縁基体1用の生セラミック成形体とともに焼成すること
によって絶縁基体1の凹部1d底面に所定のパターンに
形成される。なお、第一電極7の露出表面には、第一電
極7が酸化腐食するのを防止するために、通常であれ
ば、厚みが1〜10μm程度のニッケルめっき層が被着さ
れている。
The first electrode 7 is made of a metal powder of tungsten, molybdenum, copper, silver, or the like.
A metallized paste obtained by adding a suitable organic binder, a solvent, a plasticizer, and a dispersant to a metal powder such as tungsten is mixed with an insulating substrate 1 by using a conventionally known screen printing method.
A ceramic green sheet for printing is applied and baked together with a green ceramic molded body for the insulating substrate 1 to form a predetermined pattern on the bottom surface of the concave portion 1d of the insulating substrate 1. The exposed surface of the first electrode 7 is usually coated with a nickel plating layer having a thickness of about 1 to 10 μm in order to prevent the first electrode 7 from being oxidized and corroded.

【0018】また、絶縁基体1の枠体1cの上面にはそ
の全周にわたり枠状の第一接合用メタライズ層8が被着
されており、この接合用メタライズ層8には、下面に第
二電極9およびこの第二電極9に電気的に接続された第
二接合用メタライズ層10を有する絶縁板2が第二接合用
メタライズ層10と第一接合用メタライズ層8とを銀−銅
ろう材等のろう材を介してろう付けすることにより取着
されている。
A frame-shaped first metallizing layer 8 having a frame shape is attached to the entire upper surface of the frame 1c of the insulating base 1, and a second metallizing layer 8 is formed on the lower surface thereof. An insulating plate 2 having an electrode 9 and a second bonding metallization layer 10 electrically connected to the second electrode 9 forms a second bonding metallization layer 10 and a first bonding metallization layer 8 with a silver-copper brazing material. It is attached by brazing through a brazing material such as.

【0019】この第一接合用メタライズ層8にはメタラ
イズ配線導体5の一つ5bが接続されており、それによ
りこのメタライズ配線導体5bに半導体素子3の電極を
半田バンプ6等の導電性接合材を介して電気的に接続す
ると、半導体素子3の電極と第二電極9とが電気的に接
続されるようになっている。
One of the metallized wiring conductors 5b is connected to the first bonding metallized layer 8, so that the electrodes of the semiconductor element 3 are connected to the metallized wiring conductor 5b by a conductive bonding material such as a solder bump 6. And the second electrode 9 is electrically connected to the electrode of the semiconductor element 3.

【0020】第一接合用メタライズ層8は、タングステ
ンやモリブデン・銅・銀等の金属粉末メタライズから成
り、タングステン等の金属粉末に適当な有機バインダ・
溶剤・可塑剤・分散剤を添加混合して得たメタライズペ
ーストを従来周知のスクリーン印刷法を採用して絶縁基
体1用のセラミックグリーンシートに印刷塗布し、これ
を絶縁基体1用の生セラミック成形体とともに焼成する
ことによって絶縁基体1の枠体1c上面に枠状の所定の
パターンに形成される。なお、第一接合用メタライズ層
8の露出表面には、第一接合用メタライズ層8が酸化腐
食するのを防止するとともに第一接合用メタライズ層8
とろう材との接合を強固なものとするために、通常であ
れば、厚みが1〜10μm程度のニッケルめっき層が被着
されている。
The first bonding metallization layer 8 is made of metal powder of metal such as tungsten, molybdenum, copper, silver or the like.
A metallized paste obtained by adding and mixing a solvent, a plasticizer, and a dispersant is printed and applied on a ceramic green sheet for the insulating substrate 1 by employing a conventionally known screen printing method, and is formed into a green ceramic for the insulating substrate 1. By firing together with the body, a predetermined frame-like pattern is formed on the upper surface of the frame 1c of the insulating base 1. In addition, on the exposed surface of the first bonding metallization layer 8, the first bonding metallization layer 8 is prevented from being oxidized and corroded, and the first bonding metallization layer 8 is protected.
In order to strengthen the bonding with the brazing material, a nickel plating layer having a thickness of about 1 to 10 μm is usually applied.

【0021】また、絶縁基体1の上面に取着された絶縁
板2は、酸化アルミニウム質焼結体や窒化アルミニウム
質焼結体・ムライト質焼結体・窒化珪素質焼結体・炭化
珪素質焼結体・ガラス−セラミックス等のセラミックス
材料から成る厚みが0.01〜5mmの略平板であり、外部
の圧力に応じて絶縁基体1側に撓むいわゆる圧力検出用
のダイアフラムとして機能する。
The insulating plate 2 attached to the upper surface of the insulating base 1 is made of a sintered body of aluminum oxide, sintered body of aluminum nitride, sintered body of mullite, sintered body of silicon nitride, sintered body of silicon carbide. A substantially flat plate made of a ceramic material such as a sintered body or glass-ceramic and having a thickness of 0.01 to 5 mm, and functions as a so-called pressure detecting diaphragm that bends toward the insulating base 1 in response to external pressure.

【0022】なお、絶縁板2は、その厚みが0.01mm未
満では、その機械的強度が小さいものとなってしまうた
め、これに大きな外部圧力が印加された場合に破壊され
てしまう危険性が大きなものとなり、他方、5mmを超
えると、小さな圧力では撓みにくくなり、圧力検出用の
ダイアフラムとしては不適となってしまう。したがっ
て、絶縁板2の厚みは0.01〜5mmの範囲が好ましい。
If the thickness of the insulating plate 2 is less than 0.01 mm, the mechanical strength of the insulating plate 2 is small, and there is a great risk that the insulating plate 2 will be broken when a large external pressure is applied thereto. On the other hand, if it exceeds 5 mm, it becomes difficult to bend under a small pressure, and it becomes unsuitable as a diaphragm for pressure detection. Therefore, the thickness of the insulating plate 2 is preferably in the range of 0.01 to 5 mm.

【0023】このような絶縁板2は、例えば酸化アルミ
ニウム質焼結体から成る場合であれば、酸化アルミニウ
ム・酸化珪素・酸化マグネシウム・酸化カルシウム等の
セラミック原料粉末に適当な有機バインダ・溶剤・可塑
剤・分散剤を添加混合して泥漿状となすとともにこれを
従来周知のドクタブレード法を採用してシート状に成形
することによりセラミックグリーンシートを得、しかる
後、このセラミックグリーンシートに適当な打ち抜き加
工や切断加工を施すことにより絶縁板2用の生セラミッ
ク成形体を得るとともにこの生セラミック成形体を約16
00℃の温度で焼成することにより製作される。
If the insulating plate 2 is made of, for example, an aluminum oxide sintered body, an organic binder, a solvent, and a plastic suitable for ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. A ceramic green sheet is obtained by adding and mixing a dispersing agent and a dispersing agent to form a slurry, and forming this into a sheet by employing a well-known doctor blade method. Thereafter, the ceramic green sheet is appropriately punched. By processing and cutting, a green ceramic molded body for the insulating plate 2 is obtained, and this green ceramic molded body is
It is manufactured by firing at a temperature of 00 ° C.

【0024】また、絶縁板2の下面には静電容量形成用
の略円形の第二電極9およびこの第二電極9を取り囲む
略円形枠状の第二接合用メタライズ層10が被着されてお
り、上面および内部には第二電極9と第二接合用メタラ
イズ層10とを電気的に接続する接続用メタライズ導体11
が被着されている。
On the lower surface of the insulating plate 2, a substantially circular second electrode 9 for forming a capacitance and a substantially circular frame-shaped second metallizing layer 10 surrounding the second electrode 9 are adhered. The metallization conductor 11 for connection electrically connects the second electrode 9 and the second metallization layer 10 for bonding on the upper surface and inside.
Is attached.

【0025】第二電極9は、前述の第一電極7とともに
感圧素子用の静電容量を形成するための電極として機能
し、第二接合用メタライズ層10は、絶縁板2を絶縁基体
1に接合するための接合用下地金属層として機能する。
そして、第二接合用メタライズ層10を第一接合用メタラ
イズ層8に銀−銅ろう材等のろう材を介して接合するこ
とにより、絶縁基体1上面と絶縁板2下面との間に密閉
空間が形成されるとともに第一接合用メタライズ層8と
第二電極9とが電気的に接続される。
The second electrode 9 functions as an electrode for forming a capacitance for a pressure-sensitive element together with the above-mentioned first electrode 7, and the second bonding metallization layer 10 serves to connect the insulating plate 2 to the insulating base 1. It functions as a bonding base metal layer for bonding to the substrate.
Then, by joining the second joining metallization layer 10 to the first joining metallization layer 8 via a brazing material such as a silver-copper brazing material, a closed space is formed between the upper surface of the insulating base 1 and the lower surface of the insulating plate 2. Is formed and the first bonding metallization layer 8 and the second electrode 9 are electrically connected.

【0026】このとき、第一電極7と第二電極9とは、
絶縁基体1と絶縁板2との間に形成された空間を挟んで
対向しており、これらの間には、第一電極7や第二電極
9の面積および第一電極7と第二電極9との間隔に応じ
て所定の静電容量が形成される。そして、絶縁板2の上
面に外部の圧力が印加されると、その圧力に応じて絶縁
板2が絶縁基体1側に撓んで第一電極7と第二電極9と
の間隔が変わり、それにより第一電極7と第二電極9と
の間の静電容量が変化するので、外部の圧力の変化を静
電容量の変化として感知する感圧素子として機能する。
そして、この静電容量の変化を凹部1a内に収容した半
導体素子3にメタライズ配線導体5a・5bを介して伝
達し、これを半導体素子3で演算処理することによって
外部の圧力の大きさを知ることができる。
At this time, the first electrode 7 and the second electrode 9
The space between the insulating base 1 and the insulating plate 2 is opposed to each other with a space formed therebetween. The areas of the first electrode 7 and the second electrode 9 and the first electrode 7 and the second electrode 9 A predetermined capacitance is formed in accordance with the distance between. When an external pressure is applied to the upper surface of the insulating plate 2, the insulating plate 2 bends toward the insulating base 1 according to the pressure, and the distance between the first electrode 7 and the second electrode 9 changes. Since the capacitance between the first electrode 7 and the second electrode 9 changes, it functions as a pressure-sensitive element that detects a change in external pressure as a change in capacitance.
Then, the change of the capacitance is transmitted to the semiconductor element 3 housed in the recess 1a via the metallized wiring conductors 5a and 5b, and the magnitude of the external pressure is known by performing arithmetic processing on the semiconductor element 3. be able to.

【0027】このように、本発明の圧力検出装置用パッ
ケージによれば、一方の主面に半導体素子3が搭載され
る絶縁基体1の他方の主面に、静電容量形成用の第一電
極7を設けるとともにこの第一電極7に対向する静電容
量形成用の第二電極9を内側面に有する絶縁板2を絶縁
基体1との間に密閉空間を形成するように可撓な状態で
接合させたことから、半導体素子3を収容する容器と感
圧素子とが一体となり、その結果、圧力検出装置を小型
化することができる。また、静電容量形成用の第一電極
7および第二電極9を、絶縁基体1に設けたメタライズ
配線導体5a・5bを介して半導体素子3に接続するこ
とから、第一電極7および第二電極9を短い距離で半導
体素子3に接続することができ、その結果、これらのメ
タライズ配線導体5a・5b間に発生する不要な静電容
量を小さなものとして感度の高い圧力検出装置を提供す
ることができる。
As described above, according to the pressure detecting device package of the present invention, the first electrode for forming the capacitance is provided on the other main surface of the insulating base 1 on which the semiconductor element 3 is mounted on one main surface. 7 and an insulating plate 2 having an inner surface facing the first electrode 7 and having a second electrode 9 for forming a capacitance is formed in a flexible state so as to form a closed space between the insulating plate 2 and the insulating base 1. Because of the joining, the container accommodating the semiconductor element 3 and the pressure-sensitive element are integrated, and as a result, the size of the pressure detection device can be reduced. Further, since the first electrode 7 and the second electrode 9 for forming the capacitance are connected to the semiconductor element 3 via the metallized wiring conductors 5a and 5b provided on the insulating base 1, the first electrode 7 and the second electrode 9 are formed. The electrode 9 can be connected to the semiconductor element 3 over a short distance, and as a result, an unnecessary capacitance generated between these metallized wiring conductors 5a and 5b is reduced to provide a highly sensitive pressure detecting device. Can be.

【0028】なお、第一電極7と第二電極9との間隔が
1気圧中において0.01mm未満の場合、絶縁板2に大き
な圧力が印加された際に、第一電極7と第二電極9とが
接触して圧力を検出することができなくなってしまう危
険性があり、他方、5mmを超えると、第一電極7と第
二電極9との間に形成される静電容量が小さなものとな
り、圧力を検出する感度が低いものとなる傾向にある。
したがって、第一電極7と第二電極9との間隔は、1気
圧中において0.01〜5mmの範囲が好ましい。
When the distance between the first electrode 7 and the second electrode 9 is less than 0.01 mm at 1 atm, when a large pressure is applied to the insulating plate 2, the first electrode 7 and the second electrode 9 There is a danger that the pressure cannot be detected due to contact with the electrode. On the other hand, if the distance exceeds 5 mm, the capacitance formed between the first electrode 7 and the second electrode 9 becomes small. , The sensitivity of detecting pressure tends to be low.
Therefore, the distance between the first electrode 7 and the second electrode 9 is preferably in the range of 0.01 to 5 mm at 1 atm.

【0029】さらに、第二接合用メタライズ層10は、第
二電極9を取り囲む枠状であり、絶縁板2の上面および
内部に設けた接続用メタライズ層11によって第二電極9
に接続されていることから、第二電極9から離間してお
り、そのため第一接合用メタライズ層8に第二接合用メ
タライズ層10をろう付けする際、第一接合用メタライズ
層8と第二接合用メタライズ層10とを接合するろう材が
第二電極9に流出することが有効に防止される。したが
って、本発明の圧力検出装置用パッケージにおいては、
第二電極9にろう材が流出することはなく、第一電極7
と第二電極9との間の静電容量がろう材の流出に起因し
て大きくばらつくことはない。
Further, the second bonding metallization layer 10 has a frame shape surrounding the second electrode 9, and is formed by the connection metallization layer 11 provided on the upper surface and inside of the insulating plate 2.
Is connected to the second metallization layer 10, so that when the second metallization layer 10 is brazed to the first metallization layer 8, the first metallization layer 8 and the second metallization layer 8 It is possible to effectively prevent the brazing material joining the joining metallized layer 10 from flowing out to the second electrode 9. Therefore, in the pressure detection device package of the present invention,
No brazing material flows out to the second electrode 9 and the first electrode 7
The capacitance between the first electrode 9 and the second electrode 9 does not vary greatly due to the outflow of the brazing material.

【0030】なお、第二電極9と第二接合用メタライズ
層10との間隔wが0.1mm未満では、第一接合用メタラ
イズ層8に第二接合用メタライズ層10をろう付けする
際、ろう材が第二電極9に流出する危険性があり、他
方、2mmを超えると、第二電極9における第一電極7
と対向する領域が狭いものとなり、圧力を検出する感度
が低いものとなる傾向にある。したがって、第二電極9
と第二接合用メタライズ層10との間隔wは、0.1〜2m
mの範囲が好ましい。
If the distance w between the second electrode 9 and the second bonding metallization layer 10 is less than 0.1 mm, when the second bonding metallization layer 10 is brazed to the first bonding metallization layer 8, May flow out to the second electrode 9, while if it exceeds 2 mm, the first electrode 7 in the second electrode 9
And the area opposed to is narrow, and the sensitivity for detecting pressure tends to be low. Therefore, the second electrode 9
And the distance w between the second bonding metallization layer 10 is 0.1 to 2 m.
The range of m is preferred.

【0031】このような第二電極9および第二接合用メ
タライズ層10および接続用メタライズ導体11は、タング
ステンやモリブデン・銅・銀等の金属粉末メタライズか
ら成り、タングステン等の金属粉末に適当な有機バイン
ダ・溶剤・可塑剤・分散剤を添加混合して得たメタライ
ズペーストを従来周知のスクリーン印刷法を採用して絶
縁板2用のセラミックグリーンシートに印刷塗布し、こ
れを絶縁板2用の生セラミック成形体とともに焼成する
ことによって絶縁板2の上下面および内部に所定のパタ
ーンに形成される。なお、第二電極9および第二接合用
メタライズ層10および接続用メタライズ導体11の露出表
面には、第二電極9および第二接合用メタライズ層10お
よび接続用メタライズ導体11が酸化腐食するのを防止す
るとともに第二接合用メタライズ層10とろう材との接合
を良好とするために、通常であれば、厚みが1〜10μm
程度のニッケルめっき層が被着されており、さらに接続
用メタライズ導体11の表面には0.1〜3μm程度の厚み
の金めっき層が被着されている。
The second electrode 9, the second bonding metallization layer 10, and the connection metallization conductor 11 are made of metal powder such as tungsten or molybdenum / copper / silver. A metallized paste obtained by adding and mixing a binder, a solvent, a plasticizer, and a dispersant is applied by printing onto a ceramic green sheet for the insulating plate 2 by using a conventionally known screen printing method, and the green paste for the insulating plate 2 is formed. By firing together with the ceramic molded body, a predetermined pattern is formed on the upper and lower surfaces and inside of the insulating plate 2. The exposed surfaces of the second electrode 9, the second bonding metallization layer 10, and the connection metallization conductor 11 are oxidized and corroded by the second electrode 9, the second bonding metallization layer 10, and the connection metallization conductor 11. In order to prevent and improve the bonding between the second bonding metallization layer 10 and the brazing material, the thickness is usually 1 to 10 μm.
A nickel plating layer having a thickness of about 0.1 to 3 μm is further deposited on the surface of the metallized conductor 11 for connection.

【0032】なお、絶縁基体1に絶縁板2を接合するに
は、第一接合用メタライズ層8および第二接合用メタラ
イズ層10の表面に予め1〜10μmの厚みのニッケルめっ
き層をそれぞれ被着させておくとともに、第一接合用メ
タライズ層8と第二接合用メタライズ層10との間に厚み
が10〜200μm程度の銀−銅ろうから成るろう材箔を挟
んで絶縁基体1と絶縁板2とを重ね合わせ、これらを還
元雰囲気中、約850℃の温度に加熱してろう材箔を溶融
させて第一接合用メタライズ層8と第二接合用メタライ
ズ層10とをろう付けする方法が採用される。このとき、
第二接合用メタライズ層10は第二電極9を取り囲む枠状
に形成され、絶縁板2の上面および内部に設けられた接
続用メタライズ導体11により第二電極9に電気的に接続
されていることから、第二電極から離間しており、その
ためろう材が第二電極9に流出することが良好に防止さ
れる。
In order to bond the insulating plate 2 to the insulating substrate 1, a nickel plating layer having a thickness of 1 to 10 μm is previously applied to the surfaces of the first bonding metallization layer 8 and the second bonding metallization layer 10, respectively. The insulating base 1 and the insulating plate 2 are sandwiched between a first joining metallization layer 8 and a second joining metallization layer 10 with a brazing material foil made of silver-copper brazing having a thickness of about 10 to 200 μm. And heating them to a temperature of about 850 ° C. in a reducing atmosphere to melt the brazing material foil and braze the first bonding metallization layer 8 and the second bonding metallization layer 10. Is done. At this time,
The second bonding metallization layer 10 is formed in a frame shape surrounding the second electrode 9 and is electrically connected to the second electrode 9 by the connection metallization conductor 11 provided on the upper surface of the insulating plate 2 and inside. Therefore, the brazing material is separated from the second electrode 9, so that the brazing material is prevented from flowing out to the second electrode 9.

【0033】かくして、上述の圧力検出装置用パッケー
ジによれば、搭載部1bに半導体素子3を搭載するとと
もに半導体素子3の各電極とメタライズ配線導体5とを
電気的に接続し、しかる後、半導体素子3を封止するこ
とによって小型でかつ感度が高く、しかも外部の圧力を
ばらつきなく正確に検出することが可能な圧力検出装置
となる。
Thus, according to the above-described package for a pressure detecting device, the semiconductor element 3 is mounted on the mounting portion 1b, and each electrode of the semiconductor element 3 is electrically connected to the metallized wiring conductor 5. By sealing the element 3, a pressure detecting device which is small in size, has high sensitivity, and is capable of accurately detecting external pressure without variation.

【0034】なお、本発明は、上述の実施の形態の一例
に限定されるものではなく、本発明の要旨を逸脱しない
範囲であれば種々の変更は可能である。例えば上述の実
施の形態の一例では、第二電極9と第二接合用メタライ
ズ層10とを電気的に接続するための接続用メタライズ導
体11を絶縁板2上面の一部に設けたが、図2に断面図で
示すように、接続用メタライズ導体11は、絶縁板2の上
面の全面に設けてもよい。この場合、絶縁板2上面の全
面に設けた接続用メタライズ導体11がクラック防止用の
障壁として有効に機能し、それにより、絶縁板2に外力
等に起因するクラックや割れが発生することを極めて有
効に防止することができる。
The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention. For example, in one example of the above-described embodiment, the connection metallization conductor 11 for electrically connecting the second electrode 9 and the second bonding metallization layer 10 is provided on a part of the upper surface of the insulating plate 2. 2, the connection metallized conductor 11 may be provided on the entire upper surface of the insulating plate 2. In this case, the metallizing conductor 11 for connection provided on the entire upper surface of the insulating plate 2 effectively functions as a barrier for preventing cracks, and it is extremely possible to prevent the insulating plate 2 from being cracked or broken due to external force or the like. It can be effectively prevented.

【0035】[0035]

【発明の効果】以上、説明したように、本発明の圧力検
出装置用パッケージによれば、一方の主面に半導体素子
が搭載される絶縁基体の他方の主面に静電容量形成用の
第一電極を設けるとともに、この第一電極に対向する静
電容量形成用の第二電極を有する絶縁板を絶縁基体との
間に密閉空間を形成するように可撓な状態で接合させた
ことから、半導体素子を収容する容器と感圧素子とが一
体となり、その結果、圧力検出装置を小型とすることが
できるとともに圧力検出用の電極と半導体素子とを接続
する配線を短いものとして、これらの配線間に発生する
不要な静電容量を小さなものとして感度の高い圧力検出
装置を提供することができる。さらに、第一接合用メタ
ライズ層にろう付けされた枠状の第二接合用メタライズ
層を絶縁板の内側面に第二電極を取り囲むように設ける
とともに、この第二接合用メタライズ層と第二電極とを
絶縁板の内部および表面に設けた接続用メタライズ導体
を介して電気的に接続したことから、第一接合用メタラ
イズ層と第二接合用メタライズ層とを接合するろう材が
第二電極に流出することはなく、その結果、第一電極と
第二電極との間に形成される静電容量にろう材流出によ
るばらつきが発生することがなく、外部の圧力をばらつ
きなく正確に検出することが可能な圧力検出装置を提供
することができる。
As described above, according to the pressure detecting device package of the present invention, the first main surface of the insulating base on which the semiconductor element is mounted is provided with the second main surface for forming the capacitance. Since one electrode was provided and the insulating plate having the second electrode for forming the capacitance opposed to the first electrode was joined in a flexible state so as to form a closed space between the insulating plate and the insulating base. The container for accommodating the semiconductor element and the pressure-sensitive element are integrated, and as a result, the pressure detection device can be reduced in size and the wiring for connecting the electrode for pressure detection and the semiconductor element is shortened. An unnecessary capacitance generated between the wirings can be reduced to provide a highly sensitive pressure detection device. Further, a frame-shaped second bonding metallization layer brazed to the first bonding metallization layer is provided on the inner surface of the insulating plate so as to surround the second electrode, and the second bonding metallization layer and the second electrode Are electrically connected to each other through the metallizing conductor for connection provided inside and on the surface of the insulating plate, so that the brazing material for bonding the first metallizing layer for bonding and the second metallizing layer for bonding is formed on the second electrode. As a result, the capacitance formed between the first electrode and the second electrode does not vary due to the brazing material leakage, and the external pressure is accurately detected without variation. Can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の圧力検出装置用パッケージの実施の形
態の一例を示す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a package for a pressure detecting device according to the present invention.

【図2】本発明の圧力検出装置用パッケージの実施の形
態の他の例を示す断面図である。
FIG. 2 is a cross-sectional view showing another example of the embodiment of the pressure detection device package according to the present invention.

【図3】従来の圧力検出装置を示す断面図である。FIG. 3 is a sectional view showing a conventional pressure detecting device.

【符号の説明】[Explanation of symbols]

1・・・・・絶縁基体 2・・・・・絶縁板 3・・・・・半導体素子 7・・・・・第一電極 8・・・・・第一接合用メタライズ層 9・・・・・第二電極 10・・・・・第二接合用メタライズ層 11・・・・・接続用メタライズ導体 1. Insulating substrate 2. Insulating plate 3. Semiconductor element 7. First electrode 8. First metallizing layer 9 for first bonding 9.・ Second electrode 10 ・ ・ ・ ・ ・ ・ ・ Second bonding metallization layer 11 ・ ・ ・ ・ ・ ・ ・ Connection metallization conductor

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一方の主面に半導体素子が搭載される搭
載部を有する絶縁基体と、該絶縁基体の表面および内部
に配設され、前記半導体素子の各電極が電気的に接続さ
れる複数の配線導体と、前記絶縁基体の他方の主面の中
央部に被着され、前記配線導体の一つに電気的に接続さ
れた静電容量形成用の第一電極と、前記他方の主面の外
周部に前記第一電極を取り囲むようにして被着され、前
記配線導体の他の一つに電気的に接続された枠状の第一
接合用メタライズ層と、前記中央部との間に密閉空間を
形成するように可撓な状態で前記絶縁基体に接合された
絶縁板と、該絶縁板の内側主面に前記第一電極に対向し
て被着された第二電極と、前記内側主面に前記第二電極
を取り囲むようにして被着され、前記第一接合用メタラ
イズ層にろう材を介して接合された枠状の第二接合用メ
タライズ層と、前記絶縁板の内部および外側主面に被着
され、前記第二電極を前記第二接合用メタライズ層に電
気的に接続する接続用メタライズ導体とを具備すること
を特徴とする圧力検出装置用パッケージ。
1. An insulating base having a mounting portion on one main surface on which a semiconductor element is mounted, and a plurality of insulating bases disposed on and inside the insulating base and electrically connected to respective electrodes of the semiconductor element. A wiring conductor, a first electrode for forming a capacitance, which is attached to the center of the other main surface of the insulating base, and is electrically connected to one of the wiring conductors, and the other main surface A frame-shaped first bonding metallization layer, which is attached to the outer periphery of the first electrode so as to surround the first electrode and is electrically connected to another one of the wiring conductors, between the central portion. An insulating plate joined to the insulating base in a flexible state so as to form an enclosed space; a second electrode attached to an inner main surface of the insulating plate so as to face the first electrode; The first electrode is attached to the main surface so as to surround the second electrode, and a brazing material is interposed on the first bonding metallization layer. And a frame-shaped second bonding metallization layer, which is bonded to the inner and outer main surfaces of the insulating plate, and electrically connects the second electrode to the second bonding metallization layer. A package for a pressure detecting device, comprising a metallized conductor.
JP2000327443A 2000-10-26 2000-10-26 Package for pressure detection device Expired - Fee Related JP4557405B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000327443A JP4557405B2 (en) 2000-10-26 2000-10-26 Package for pressure detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000327443A JP4557405B2 (en) 2000-10-26 2000-10-26 Package for pressure detection device

Publications (2)

Publication Number Publication Date
JP2002131163A true JP2002131163A (en) 2002-05-09
JP4557405B2 JP4557405B2 (en) 2010-10-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4557405B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102183335A (en) * 2011-03-15 2011-09-14 迈尔森电子(天津)有限公司 Mems pressure sensor and manufacturing method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249609A (en) * 1999-03-01 2000-09-14 Wakoo:Kk Capacitance-type sensor

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Publication number Priority date Publication date Assignee Title
US5050034A (en) * 1990-01-22 1991-09-17 Endress U. Hauser Gmbh U. Co. Pressure sensor and method of manufacturing same
JP2871381B2 (en) * 1993-03-30 1999-03-17 本田技研工業株式会社 pressure sensor
JPH08204047A (en) * 1995-01-23 1996-08-09 Kyocera Corp Package for housing of electronic component

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249609A (en) * 1999-03-01 2000-09-14 Wakoo:Kk Capacitance-type sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102183335A (en) * 2011-03-15 2011-09-14 迈尔森电子(天津)有限公司 Mems pressure sensor and manufacturing method thereof

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