IT1169682B - Composizione per fotoriproduzioni - Google Patents

Composizione per fotoriproduzioni

Info

Publication number: IT1169682B
Authority: IT; Italy
Prior art keywords: reproductions; photos; composition; photos reproductions
Prior art date: 1983-11-08

Application number

IT23634/83A

Other languages

English (en)

Other versions

IT8323634A0 (it

Inventor

Alberto Guzzi

Original Assignee

I M G Ind Materiali Grafici Sp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1983-11-08

Filing date

1983-11-08

Publication date

1987-06-03

1983-11-08 Application filed by I M G Ind Materiali Grafici Sp filed Critical I M G Ind Materiali Grafici Sp

1983-11-08 Priority to IT23634/83A priority Critical patent/IT1169682B/it

1983-11-08 Publication of IT8323634A0 publication Critical patent/IT8323634A0/it

1984-10-30 Priority to EP84113094A priority patent/EP0141400B1/de

1984-10-30 Priority to DE8484113094T priority patent/DE3482934D1/de

1984-11-05 Priority to CA000467032A priority patent/CA1267317A/en

1984-11-07 Priority to ZA848695A priority patent/ZA848695B/xx

1984-11-07 Priority to JP59233423A priority patent/JPS60173545A/ja

1986-08-01 Priority to US06/892,893 priority patent/US4696891A/en

1987-06-03 Application granted granted Critical

1987-06-03 Publication of IT1169682B publication Critical patent/IT1169682B/it

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

IT23634/83A 1983-11-08 1983-11-08 Composizione per fotoriproduzioni IT1169682B (it)

Priority Applications (7)

Application Number	Priority Date	Filing Date	Title
IT23634/83A IT1169682B (it)	1983-11-08	1983-11-08	Composizione per fotoriproduzioni
EP84113094A EP0141400B1 (de)	1983-11-08	1984-10-30	Lichtempfindliches Gemisch und Verfahren zur Herstellung von negativen Reliefkopien
DE8484113094T DE3482934D1 (de)	1983-11-08	1984-10-30	Lichtempfindliches gemisch und verfahren zur herstellung von negativen reliefkopien.
CA000467032A CA1267317A (en)	1983-11-08	1984-11-05	Photosensitive composition and process for the production of negative relief copies
ZA848695A ZA848695B (en)	1983-11-08	1984-11-07	Photosensitive composition and process for the production of negative relief copies
JP59233423A JPS60173545A (ja)	1983-11-08	1984-11-07	感光性組成物及びネガチブレリ−フコピ−の製法
US06/892,893 US4696891A (en)	1983-11-08	1986-08-01	Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
IT23634/83A IT1169682B (it)	1983-11-08	1983-11-08	Composizione per fotoriproduzioni

Publications (2)

Publication Number	Publication Date
IT8323634A0 IT8323634A0 (it)	1983-11-08
IT1169682B true IT1169682B (it)	1987-06-03

Family

ID=11208748

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IT23634/83A IT1169682B (it)	1983-11-08	1983-11-08	Composizione per fotoriproduzioni

Country Status (7)

Country	Link
US (1)	US4696891A (it)
EP (1)	EP0141400B1 (it)
JP (1)	JPS60173545A (it)
CA (1)	CA1267317A (it)
DE (1)	DE3482934D1 (it)
IT (1)	IT1169682B (it)
ZA (1)	ZA848695B (it)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3437687A1 (de) *	1984-10-15	1986-04-17	Hoechst Ag, 6230 Frankfurt	Verfahren zum herstellen negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
GB2171530B (en) *	1985-02-27	1989-06-28	Imtec Products Inc	Method of producing reversed photoresist images by vapour diffusion
JPS62160441A (ja) *	1986-01-09	1987-07-16	Hitachi Chem Co Ltd	ホトレジスト用感光性組成物
GB8708747D0 (en) *	1987-04-11	1987-05-20	Ciba Geigy Ag	Formation of image
JPS6435545A (en) *	1987-07-31	1989-02-06	Japan Synthetic Rubber Co Ltd	Resist composition used for processing with charged particle beam
WO1989005475A1 (en) *	1987-12-10	1989-06-15	Macdermid, Incorporated	Image-reversible dry-film photoresists
JPH01210944A (ja) *	1988-02-18	1989-08-24	Japan Synthetic Rubber Co Ltd	感放射線性樹脂組成物
US5019488A (en) *	1988-09-29	1991-05-28	Hoechst Celanese Corporation	Method of producing an image reversal negative photoresist having a photo-labile blocked imide
US5286609A (en) *	1988-11-01	1994-02-15	Yamatoya & Co., Ltd.	Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
US5202217A (en) *	1989-08-08	1993-04-13	Tosoh Corporation	Solubilization-inhibitor and positive resist composition
DE3940911A1 (de) *	1989-12-12	1991-06-13	Hoechst Ag	Verfahren zur herstellung negativer kopien
DE4004719A1 (de) *	1990-02-15	1991-08-22	Hoechst Ag	Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4013575C2 (de) *	1990-04-27	1994-08-11	Basf Ag	Verfahren zur Herstellung negativer Reliefkopien
US5145763A (en) *	1990-06-29	1992-09-08	Ocg Microelectronic Materials, Inc.	Positive photoresist composition
WO1993023793A1 (en) *	1992-05-12	1993-11-25	Eastman Kodak Company	Addenda for an aqueous photographic stabilizing solution
DE4306069A1 (de) *	1993-03-01	1994-09-08	Basf Ag	Strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen mit verbessertem Kontrast
ATE420767T1 (de) *	2000-11-30	2009-01-15	Fujifilm Corp	Lithographische druckplattenvorläufer
JP3917422B2 (ja) *	2001-07-26	2007-05-23	富士フイルム株式会社	画像形成材料
US20040067435A1 (en) *	2002-09-17	2004-04-08	Fuji Photo Film Co., Ltd.	Image forming material
US7160667B2 (en) *	2003-01-24	2007-01-09	Fuji Photo Film Co., Ltd.	Image forming material
US7544462B2 (en) *	2007-02-22	2009-06-09	Eastman Kodak Company	Radiation-sensitive composition and elements with basic development enhancers
US7399576B1 (en) *	2007-02-28	2008-07-15	Eastman Kodak Company	Positive-working radiation-sensitive composition and elements

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
BE510151A (it) *	1949-07-23
DE938233C (de) *	1953-03-11	1956-01-26	Kalle & Co Ag	Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
US3046114A (en) *	1955-03-01	1962-07-24	Azoplate Corp	Diazo compounds and printing plates manufactured therefrom
NL247299A (it) *	1959-01-14
NL247405A (it) *	1959-01-15
NL247406A (it) *	1959-01-17
NL130248C (it) *	1959-01-21
DE1114705C2 (de) *	1959-04-16	1962-04-12	Kalle Ag	Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
NL7007827A (it) *	1970-05-29	1971-12-01
US4196003A (en) *	1974-02-01	1980-04-01	Fuji Photo Film Co., Ltd.	Light-sensitive o-quinone diazide copying composition
DE2529054C2 (de) *	1975-06-30	1982-04-29	Ibm Deutschland Gmbh, 7000 Stuttgart	Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
JPS569740A (en) *	1979-07-05	1981-01-31	Fuji Photo Film Co Ltd	Image forming method
GB2082339B (en) *	1980-08-05	1985-06-12	Horsell Graphic Ind Ltd	Lithographic printing plates and method for processing
JPS57150844A (en) *	1981-03-13	1982-09-17	Konishiroku Photo Ind Co Ltd	Photosensitive composition
JPS57178242A (en) *	1981-04-27	1982-11-02	Konishiroku Photo Ind Co Ltd	Photosensitive lithographic plate
US4546066A (en) *	1983-09-27	1985-10-08	International Business Machines Corporation	Method for forming narrow images on semiconductor substrates

1983
- 1983-11-08 IT IT23634/83A patent/IT1169682B/it active
1984
- 1984-10-30 DE DE8484113094T patent/DE3482934D1/de not_active Expired - Fee Related
- 1984-10-30 EP EP84113094A patent/EP0141400B1/de not_active Expired - Lifetime
- 1984-11-05 CA CA000467032A patent/CA1267317A/en not_active Expired - Fee Related
- 1984-11-07 ZA ZA848695A patent/ZA848695B/xx unknown
- 1984-11-07 JP JP59233423A patent/JPS60173545A/ja active Granted
1986
- 1986-08-01 US US06/892,893 patent/US4696891A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
EP0141400A2 (de)	1985-05-15
EP0141400B1 (de)	1990-08-08
ZA848695B (en)	1985-09-25
JPH0431381B2 (it)	1992-05-26
IT8323634A0 (it)	1983-11-08
US4696891A (en)	1987-09-29
DE3482934D1 (de)	1990-09-13
CA1267317A (en)	1990-04-03
EP0141400A3 (en)	1987-05-06
JPS60173545A (ja)	1985-09-06

Publication	Publication Date	Title
RO92510A (ro)	1987-11-30	Compozitie erbicida
BR8402750A (pt)	1985-05-14	Composicao
IT1169682B (it)	1987-06-03	Composizione per fotoriproduzioni
DE3481348D1 (de)	1990-03-15	Entwicklungzusammensetzung fuer lichtempfindliche chinondiazide.
FI832536A0 (fi)	1983-07-12	Lokala anti-inflammatoriska kompositioner
DE3472567D1 (de)	1988-08-11	Bitumenous compositions
NO840997L (no)	1984-11-27	Skumfortrengende silisiumforbindelser
RO89518A (ro)	1986-06-30	Compozitie erbicida lichida
DK356684A (da)	1985-01-22	Tripamidinklusionsforbindelser
FR2551561B1 (fr)	1988-09-16	Cliches electrophotographiques
IT1176133B (it)	1987-08-12	Composizione di inchiostro
DE3465325D1 (de)	1987-09-17	Bitumenous compositions
RO92723A (ro)	1987-11-30	Compozitie erbicida lichida
RO90387A (ro)	1986-10-30	Compozitie aditiva
ATA29284A (de)	1991-01-15	Bildaufnahmeanordnung
IT1206696B (it)	1989-04-27	Tensioattivo per composizioni diresine fotosensibili e relative composizioni.
IT1177262B (it)	1987-08-26	Composizioni antielmintiche
RO88950A (ro)	1986-04-30	Compozitie fungicida umectabila
RO89784A (ro)	1986-07-30	Compozitie erbicida sinergica
RO89342A (ro)	1986-03-15	Compozitie aditiva
BR8405763A (pt)	1985-09-17	Composicao desfolhante
DK186484D0 (da)	1984-04-11	Digital styreindretning for en vekselretter
DK127383A (da)	1984-09-22	Pude
KR850002623U (ko)	1985-05-30	온 장 고
IT1163038B (it)	1987-04-08	Composti amidici n-glicidil-sostituiti

Legal Events

Date	Code	Title	Description
1999-10-27	TA	Fee payment date (situation as of event date), data collected since 19931001	Effective date: 19961129