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GB1516511A - Curable epoxide compositions - Google Patents

Curable epoxide compositions

Info

Publication number
GB1516511A
GB1516511A GB1570175A GB1570175A GB1516511A GB 1516511 A GB1516511 A GB 1516511A GB 1570175 A GB1570175 A GB 1570175A GB 1570175 A GB1570175 A GB 1570175A GB 1516511 A GB1516511 A GB 1516511A
Authority
GB
United Kingdom
Prior art keywords
epoxy
fluoroborate
photo
resin
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1570175A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1516511A publication Critical patent/GB1516511A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/68—Arsenic compounds without As—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90—Antimony compounds
    • C07F9/902—Compounds without antimony-carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Reinforced Plastic Materials (AREA)

Abstract

1516511 Photo-sensitive resists GENERAL ELECTRIC CO 16 April 1975 [2 May 1974] 15701/75 Heading G2C [Also in Divisions B5 and C3] A photo-resist is prepared by exposing a coating comprising an epoxy resin and an aromatic onium salt of S, Se, or Te capable of curing the resin by release of a Lewis acid when exposed to radiation e.g. U.V. or an electron beam. Examples of the salt are triphenylsulphonium tetrafluoroborate, triphenylselenonium hexafluoroarsenate, S-phenyldibenzothiophenium fluoroborate, and S-phenylthioxanthene fluoroborate. The epoxy resin is one or more of an epoxy monomer, dimer, oligomer of polymer, e.g. the reaction products of epichlorohydrin with either bisphenol-A or novolak resins, epoxy-siloxanes, epoxy-polyurethanes and epoxy-polyesters, and vinyl copolymers derived from glycidyl (meth)acrylate.
GB1570175A 1974-05-02 1975-04-16 Curable epoxide compositions Expired GB1516511A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (1)

Publication Number Publication Date
GB1516511A true GB1516511A (en) 1978-07-05

Family

ID=23851510

Family Applications (2)

Application Number Title Priority Date Filing Date
GB49978A Expired GB1516512A (en) 1974-05-02 1975-04-16 Chalcogenium salts
GB1570175A Expired GB1516511A (en) 1974-05-02 1975-04-16 Curable epoxide compositions

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB49978A Expired GB1516512A (en) 1974-05-02 1975-04-16 Chalcogenium salts

Country Status (5)

Country Link
JP (1) JPS5214278B2 (en)
BE (1) BE828670A (en)
DE (3) DE2559718C2 (en)
FR (1) FR2269551B1 (en)
GB (2) GB1516512A (en)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0022081A1 (en) * 1979-06-19 1981-01-07 Ciba-Geigy Ag Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation
DE3115241A1 (en) 1980-04-21 1982-04-15 General Electric Co., Schenectady, N.Y. "TEMPERABLE PREPARATIONS AND USE THEREFOR"
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US5101053A (en) * 1989-01-25 1992-03-31 Basf Aktiengesellschaft Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their preparation
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
US5335004A (en) * 1989-12-15 1994-08-02 Canon Kabushiki Kaisha Active energy-ray-curable resin composition, ink jet head having ink path wall formed by use of the composition, process for preparing the head, and ink jet apparatus provided with the head
US5356698A (en) * 1990-03-27 1994-10-18 Hitachi, Ltd. Adhesive agent for substrate of electroless plating, printed circuit board using same, and method of producing same
US5713835A (en) * 1993-05-05 1998-02-03 Smith & Nephew Plc Orthopaedic material
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
WO2003074509A1 (en) * 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Heterocycle-bearing onium salts
EP1348727A2 (en) 2002-03-29 2003-10-01 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
EP1826206A1 (en) * 2006-02-23 2007-08-29 Fujifilm Corporation Sulfonium salt, curable composition, ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
US9416220B2 (en) 2012-05-18 2016-08-16 Cmet Inc. Resin composition for optical stereolithography
US10450266B2 (en) 2014-11-07 2019-10-22 San-Apro Limited Sulfonate compound, photoacid generator, and resin composition for photolithography
CN113286781A (en) * 2019-01-10 2021-08-20 三亚普罗股份有限公司 Sulfonium salt, photoacid generator, curable composition, and resist composition

Families Citing this family (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604954A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1596000A (en) * 1977-09-14 1981-08-19 Gen Electric Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
DE3135636A1 (en) 1981-09-09 1983-03-17 Basf Ag, 6700 Ludwigshafen CURABLE EPOXY RESINS
JPS61242615A (en) * 1985-04-18 1986-10-28 Nippon Air Filter Kk Process and device for collecting dust
JPS61261365A (en) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd Photo-curable coating composition
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
US4871786A (en) * 1988-10-03 1989-10-03 Minnesota Mining And Manufacturing Company Organic fluoride sources
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
JPH0347573A (en) * 1989-07-12 1991-02-28 Ishigaki Kiko Kk Method and apparatus for classifying fine powder
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
DE3933420C1 (en) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
EP0503774B1 (en) * 1991-02-16 1997-05-14 Canon Kabushiki Kaisha Optical recording medium
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5466845A (en) * 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JP3442176B2 (en) 1995-02-10 2003-09-02 富士写真フイルム株式会社 Photopolymerizable composition
JPH1087963A (en) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd Resin composition and mold for forming fibrous material
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JP3626302B2 (en) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 Photocurable resin composition
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Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0022081A1 (en) * 1979-06-19 1981-01-07 Ciba-Geigy Ag Polymerisable compositions containing sulphoxonium salts and process for the production of high molecular weight products from these compositions by irradiation
DE3115241A1 (en) 1980-04-21 1982-04-15 General Electric Co., Schenectady, N.Y. "TEMPERABLE PREPARATIONS AND USE THEREFOR"
DE3153680A1 (en) * 1980-04-21 1989-11-30
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure
US4684671A (en) * 1985-01-25 1987-08-04 Asahi Denka Kogyo K.K. Energy beam curable composition
US4734444A (en) * 1986-02-14 1988-03-29 Basf Aktiengesellschaft Curable mixtures containing N-sulfonylaminosulfonium salts as cationically active catalysts
US5101053A (en) * 1989-01-25 1992-03-31 Basf Aktiengesellschaft Radiation-sensitive, ethylenically unsaturated, copolymerizable sulfonium salts and their preparation
US5335004A (en) * 1989-12-15 1994-08-02 Canon Kabushiki Kaisha Active energy-ray-curable resin composition, ink jet head having ink path wall formed by use of the composition, process for preparing the head, and ink jet apparatus provided with the head
US5356698A (en) * 1990-03-27 1994-10-18 Hitachi, Ltd. Adhesive agent for substrate of electroless plating, printed circuit board using same, and method of producing same
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
US5713835A (en) * 1993-05-05 1998-02-03 Smith & Nephew Plc Orthopaedic material
US6313188B1 (en) 1996-09-19 2001-11-06 Nippon Soda Co., Ltd. Photocationically polymerizable composition comprising a polycyclic aromatic compound
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
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Also Published As

Publication number Publication date
FR2269551A1 (en) 1975-11-28
DE2518652A1 (en) 1975-11-06
BE828670A (en) 1975-09-01
DE2518652C2 (en) 1983-05-11
DE2559718C2 (en) 1983-08-04
JPS50151997A (en) 1975-12-06
DE2559833C2 (en) 1983-12-22
GB1516512A (en) 1978-07-05
JPS5214278B2 (en) 1977-04-20
DE2559718A1 (en) 1977-08-18
FR2269551B1 (en) 1978-09-01

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429H Application (made) for amendment of specification now open to opposition (sect. 29/1949)
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SP Amendment (slips) printed
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Effective date: 19940416