GB1259165A - - Google Patents
Info
- Publication number
- GB1259165A GB1259165A GB1259165DA GB1259165A GB 1259165 A GB1259165 A GB 1259165A GB 1259165D A GB1259165D A GB 1259165DA GB 1259165 A GB1259165 A GB 1259165A
- Authority
- GB
- United Kingdom
- Prior art keywords
- passages
- mask
- hole structure
- images
- jan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 abstract 2
- 239000002131 composite material Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
Abstract
1,259,165. Optical apparatus. BRUNSWICK CORP. Jan.29, 1969 [Jan.30, 1968], No.5016/69. Heading G2J. A method of producing high resolution images comprises forming a collimated hole structure 10 defined by a body having a plurality of substantially rectilinear, parallel through passages 12 extending between spaced surfaces of the body, the passages having a maximum transverse dimension of under 500 microns and having an aspect ratio of at least 5:1, providing on one of said surfaces a mask 16, Fig. 5, defining an opening 15 of pre-selected shape, said opening exposing a plurality of the passages, and passing radiation through the exposed passages to form a plurality of images corresponding accurately to the cross-sections of said passages. The mask 16 may be plated on to the body or may be formed by exposing and developing a photoresist material. The method may be used in micro-circuitry wherein the images are formed on a radiation-resist layer which is then developed and etched. Desirably the maximum transverse dimension of the passages is under 10 microns. Alternatively the mask may be another collimated hole structure. Also if desired the body 10 may have corresponding masks over body end surfaces. The hole structure comprises a composite formed of a metal matrix and a plurality of substantially rectilinear, parallel filaments formed of a different metal which is leached out to form the passages.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US70176068A | 1968-01-30 | 1968-01-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1259165A true GB1259165A (en) | 1972-01-05 |
Family
ID=24818564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1259165D Expired GB1259165A (en) | 1968-01-30 | 1969-01-29 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3556636A (en) |
| BE (1) | BE727671A (en) |
| BR (1) | BR6906012D0 (en) |
| CH (1) | CH496259A (en) |
| DE (1) | DE1904172B2 (en) |
| FR (1) | FR2000965A1 (en) |
| GB (1) | GB1259165A (en) |
| NL (1) | NL6901353A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112255715A (en) * | 2020-10-23 | 2021-01-22 | 江南大学 | Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3678564A (en) * | 1968-01-30 | 1972-07-25 | Brunswick Corp | Method of producing high resolution images and structure for use therein |
| US3771592A (en) * | 1971-08-16 | 1973-11-13 | Owens Illinois Inc | Matrix and method of making same |
| US5879425A (en) * | 1971-09-20 | 1999-03-09 | Litton Systems, Inc. | Method for fabrication of microchannel multiplier plates |
| US4116655A (en) * | 1975-07-09 | 1978-09-26 | Elliott Brothers (London) Limited | Method for making optical-fibre cables |
| US4410394A (en) * | 1980-12-23 | 1983-10-18 | United Technologies Corporation | Methods of making cooled, thermally stable composite mirrors |
| FR2517835A1 (en) * | 1981-12-03 | 1983-06-10 | Fort Francois | IMPROVEMENTS TO IMAGE CONDUCTORS |
| US4516832A (en) * | 1982-06-23 | 1985-05-14 | International Business Machines Corporation | Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture |
| US4590492A (en) * | 1983-06-07 | 1986-05-20 | The United States Of America As Represented By The Secretary Of The Air Force | High resolution optical fiber print head |
| US5028112A (en) * | 1990-06-27 | 1991-07-02 | The United States Of America As Represented By The Secretary Of The Navy | Precision multi-channel fiber optic interface and method |
| WO1995004264A1 (en) | 1993-07-29 | 1995-02-09 | Wesley-Jessen Corporation | Inspection system for optical components |
| DE29901791U1 (en) * | 1999-02-02 | 2000-07-06 | Novartis Ag, Basel | Lens measuring device |
| US6765661B2 (en) | 2001-03-09 | 2004-07-20 | Novartis Ag | Lens inspection |
-
1968
- 1968-01-30 US US701760*A patent/US3556636A/en not_active Expired - Lifetime
-
1969
- 1969-01-24 DE DE19691904172 patent/DE1904172B2/en active Pending
- 1969-01-28 NL NL6901353A patent/NL6901353A/xx unknown
- 1969-01-29 GB GB1259165D patent/GB1259165A/en not_active Expired
- 1969-01-29 CH CH137869A patent/CH496259A/en not_active IP Right Cessation
- 1969-01-29 FR FR6901781A patent/FR2000965A1/fr not_active Withdrawn
- 1969-01-30 BE BE727671D patent/BE727671A/xx unknown
- 1969-01-30 BR BR206012/69A patent/BR6906012D0/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112255715A (en) * | 2020-10-23 | 2021-01-22 | 江南大学 | Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device |
| CN112255715B (en) * | 2020-10-23 | 2021-12-03 | 江南大学 | Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device |
Also Published As
| Publication number | Publication date |
|---|---|
| NL6901353A (en) | 1969-08-01 |
| BE727671A (en) | 1969-07-30 |
| FR2000965A1 (en) | 1969-09-19 |
| US3556636A (en) | 1971-01-19 |
| DE1904172B2 (en) | 1972-04-20 |
| CH496259A (en) | 1970-09-15 |
| DE1904172A1 (en) | 1969-09-11 |
| BR6906012D0 (en) | 1973-01-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |