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DE68925142D1 - Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten - Google Patents

Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten

Info

Publication number
DE68925142D1
DE68925142D1 DE68925142T DE68925142T DE68925142D1 DE 68925142 D1 DE68925142 D1 DE 68925142D1 DE 68925142 T DE68925142 T DE 68925142T DE 68925142 T DE68925142 T DE 68925142T DE 68925142 D1 DE68925142 D1 DE 68925142D1
Authority
DE
Germany
Prior art keywords
proving
objects
local relationship
local
relationship
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68925142T
Other languages
English (en)
Other versions
DE68925142T2 (de
Inventor
Kenji Saitoh
Masakazu Matsugu
Shigeyuki Suda
Yukichi Niwa
Ryo Kuroda
Noriyuki Nose
Minoru Yoshii
Naoto Abe
Mitsutoshi Ohwada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63221536A external-priority patent/JP2623757B2/ja
Priority claimed from JP63226004A external-priority patent/JP2556559B2/ja
Priority claimed from JP63226003A external-priority patent/JP2698388B2/ja
Priority claimed from JP63226005A external-priority patent/JP2698389B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68925142D1 publication Critical patent/DE68925142D1/de
Application granted granted Critical
Publication of DE68925142T2 publication Critical patent/DE68925142T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE1989625142 1988-02-16 1989-02-16 Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten Expired - Fee Related DE68925142T2 (de)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP3320888 1988-02-16
JP3320288 1988-02-16
JP3320588 1988-02-16
JP3320988 1988-02-16
JP3320688 1988-02-16
JP63221536A JP2623757B2 (ja) 1988-09-05 1988-09-05 位置合わせ装置
JP22153588 1988-09-05
JP63226004A JP2556559B2 (ja) 1988-09-09 1988-09-09 間隔測定装置
JP63226003A JP2698388B2 (ja) 1988-09-09 1988-09-09 位置検出装置
JP22600788 1988-09-09
JP63226005A JP2698389B2 (ja) 1988-09-09 1988-09-09 位置検出装置

Publications (2)

Publication Number Publication Date
DE68925142D1 true DE68925142D1 (de) 1996-02-01
DE68925142T2 DE68925142T2 (de) 1996-06-13

Family

ID=27581944

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989625142 Expired - Fee Related DE68925142T2 (de) 1988-02-16 1989-02-16 Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten

Country Status (2)

Country Link
EP (1) EP0336537B1 (de)
DE (1) DE68925142T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5319444A (en) * 1988-02-16 1994-06-07 Canon Kabushiki Kaisha Position detecting method and apparatus
US5294980A (en) * 1988-03-24 1994-03-15 Canon Kabushiki Kaisha Positioning detecting method and apparatus
JP2676933B2 (ja) * 1988-09-05 1997-11-17 キヤノン株式会社 位置検出装置
JP2756331B2 (ja) * 1990-01-23 1998-05-25 キヤノン株式会社 間隔測定装置
US5225892A (en) * 1990-02-05 1993-07-06 Canon Kabushiki Kaisha Positional deviation detecting method
DE69128655T2 (de) * 1990-03-02 1998-05-07 Canon K.K., Tokio/Tokyo Belichtungsgerät
JP2860578B2 (ja) * 1990-03-02 1999-02-24 キヤノン株式会社 露光装置
US5200800A (en) * 1990-05-01 1993-04-06 Canon Kabushiki Kaisha Position detecting method and apparatus
JP2890943B2 (ja) * 1990-11-30 1999-05-17 キヤノン株式会社 位置検出方法及びそれを用いた位置検出装置
JP3008633B2 (ja) * 1991-01-11 2000-02-14 キヤノン株式会社 位置検出装置
US7247843B1 (en) * 2006-05-11 2007-07-24 Massachusetts Institute Of Technology Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2445512A1 (en) * 1978-12-27 1980-07-25 Thomson Csf Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置
US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
US4699515A (en) * 1984-02-28 1987-10-13 Nippon Kogaku K. K. Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween

Also Published As

Publication number Publication date
EP0336537A1 (de) 1989-10-11
EP0336537B1 (de) 1995-12-20
DE68925142T2 (de) 1996-06-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee