DE102013108411B4 - Pass substrate treatment plant - Google Patents

Abstract

Continuous substrate treatment installation for coating plate-shaped substrates (1) in horizontal alignment, comprising at least one installation chamber delimited by chamber walls (5), a transport device extending through the at least one installation chamber and having a plurality of rotatably mounted transversely to the transport direction of the substrates (1) , cylindrical transport rollers (2), whose uppermost generatrices define a horizontal substrate transport plane and of which at least a part is drivable, and at least one above the transport means arranged steam distributor (7) of a coating device, characterized in that the steam distributor (7) of a, wherein the transport rollers (2) each have a central region (21) and end regions (22), wherein the diameter of the central region (21) is greater than the diameter of the En dbereiche (22), and the central region (21) is shorter than the width of the substrates (1), and wherein parallel to the substrate transport direction extending boundary walls (4) of the box frame in cross section have an L-profile with a horizontal and a vertical leg, wherein the respective horizontal leg is arranged below the substrate transport plane and at least partially overlaps the substrate (1).

Description

The invention relates to improvements in a horizontal continuous substrate treatment plant for the treatment, for example coating, of plate-shaped substrates, for example glass plates, the substrates, with or without a substrate holder lying on a transport device, i. in a horizontal orientation, through a chamber chamber bounded by chamber walls or an arrangement of a plurality of successively arranged plant chambers of a substrate treatment plant, the substrates being exposed to at least one substrate treatment device, such as coating devices, etching devices, etc. On the one hand, the substrate treatment often takes place at a lower pressure (process vacuum) than at atmospheric pressure and, on the other hand, often occurs in a selected, often controlled gas or gas mixture (process atmosphere).

In continuous substrate treatment plants are, in contrast to so-called batch substrate treatment plants of the plant chamber or an arrangement of several successively arranged plant chambers, which may be formed, for example, as process chambers, pumping chambers, transfer chambers, etc., generally at least one each formed as a lock chamber plant chamber upstream and downstream and a transport device is arranged in the interior of the substrate treatment plant so that it extends through the two lock chambers and all other system chambers arranged therebetween.

As a result, substrates can be moved in a transport direction through the substrate treatment plant by being introduced into the substrate treatment plant by means of a first lock chamber, transported through the entire arrangement of successively arranged plant chambers by means of the transport device and discharged from the substrate treatment plant by means of a second lock chamber. In this case, the substrates in at least one process chamber are also moved past a substrate treatment device arranged therein and are exposed to the desired substrate treatment.

For the treatment of plate-shaped substrates, transport devices have been proven which comprise a plurality of transversely mounted to the transport direction of the substrates, rotatably mounted, cylindrical transport rollers whose uppermost generatrices define a horizontal transport plane for the substrates and of which at least a portion is driven. If the desired substrate treatment takes place at elevated process temperatures, for example 400, 600 or 800 ° C., it has proven useful to produce the transport rollers from heat-resistant materials, for example ceramics, or to coat them with a heat-resistant material.

For the coating of, for example, plate-shaped substrates, various vapor sources are known. For example, in a plant of the type described above, the vapor source or a vapor distributor connected to a vapor source may be arranged transversely to the substrate transport direction such that vapor is applied to an approximately 5 cm wide region of the substrate across the width of the substrate.

The coating material can be brought to the place of evaporation, for example in powder form by means of a carrier gas. The crucible of the vapor source, which realizes the melting and evaporation of the coating material, may be formed, for example, from heated ceramic tubes. The crucible may, for example, even have steam outlet openings and thus simultaneously serve as a steam distributor. Alternatively, additional steam vents connected to the crucible or vents may cause the coating material to exit the vapor source toward the substrate. This leads to a distribution of the steam in the entire coating area of the plant. The result is a kind of fog, which spreads in the coating area of the plant, for example, in a so-called compartment.

An exemplary compartment may, for example, have 12 transport rollers, while the vapor source including suction tubes takes up the space of four transport rollers. There are suction pipes on both sides of the steam source. These predominantly remove the carrier gas from the compartment, but can not develop a sufficient suction effect on the fog.

One problem is the unwanted coating resulting from the mist of all components that are somewhat colder (e.g., below 600 ° C) because the coating material condenses there (primarily transport rollers and chamber walls). The so-called "Dogbones" growing transport rollers are less suitable for substrate transport over time. They too must be cleaned or replaced.

In DE 10 2013 206 598 A1 Known coater and vacuum coater are improved in that the contamination and damage of the generated layers on the surface of the substrate to be coated are prevented.

For this purpose, in a coating device for a vacuum coating system which comprises a heatable steam source for receiving and evaporating a coating material and at least one steam outlet, which is designed to give the evaporated coating material an average steam outlet direction, it is proposed that the mean steam outlet direction be unequal to the gravitational direction , In order to prevent falling flakes of condensed coating material from striking the substrate, it can be provided that a collecting means for falling condensate is arranged below the at least one steam outlet opening. This collecting means, which is preferably designed as a well arranged far away from the outlet opening, for example directly above the substrate, or a transport element movable transversely to the transport direction, ensures that the flakes neither damage nor contaminate the layer of condensed coating material deposited on the substrate can.

In DE 10 2010 052 761 A1 It was proposed to mount protective sheets for collecting stray steam parallel to the transport direction of the substrates on the chamber walls. Out DE 198 34 592 A1 are known transversely to the transport direction of the substrates and arranged above the substrates aperture to limit the evaporation zone. A box-shaped panel arranged above the substrate surface is suitable for a coil coater in FIG DE 2235673 A1 shown.

Another problem is the still to improve layer quality on the substrate. The focus is on the uniform distribution of the coating material, in particular transversely to the substrate transport direction (so-called transverse distribution).

The object of solving the above-mentioned problems is solved by a continuous substrate treatment apparatus having the features of independent claim 1. Embodiments and further developments are the subject of the dependent claims.

The proposal is for a continuous substrate treatment installation for coating plate-shaped substrates in a horizontal orientation, comprising at least one chamber chamber bounded by chamber walls, a transport device extending through the at least one installation chamber and comprising a plurality of rotatably mounted cylindrical transport rollers arranged transversely to the transport direction of the substrates uppermost generatrices define a horizontal substrate transport plane and of which at least a part is drivable, and at least one disposed above the transport device steam distributor of a coating device, wherein the steam distributor is enclosed by a, formed at least by vertical boundary walls, box frame, wherein the transport rollers each have a central region and Have end portions, wherein the diameter of the central region is greater than the diameter of the end portions, and the central region is shorter t as the width of the substrates, and wherein running parallel to the Substrattransportrichtung boundary walls of the box frame in cross-section an L-profile with a horizontal and a vertical leg, wherein the respective horizontal leg is disposed below the substrate transport plane and the substrate at least partially overlaps.

The problems indicated are inventively remedied by the spread of the coating material around the steam source is limited by the steam source including suction is housed so that the substrate transport is not hindered that the enclosure as close as possible against other installations and that the enclosure itself as long as possible remains free of unwanted coatings. Advantageously, the box frame made of plates and / or profiles made of CFC. This material is very heat-resistant and has the further advantage that it has little or no outgassing, so that the coating quality is not affected.

The transport rollers each have a central region and end regions, wherein the diameter of the central region is greater than the diameter of the end regions, and the central region is shorter than the width of the substrates. On the one hand, this protects the central regions of the transport rollers against undesired coating. On the other hand, this configuration makes it possible, for example, when using L-profiles as boundary walls extending parallel to the substrate transport direction, whose horizontal limbs overlap the substrate edges, so that undesired coating of the substrate edges on the substrate back side is made considerably more difficult.

The boundary walls of the box frame running parallel to the substrate transport direction have an L-profile in cross-section with a horizontal and a vertical leg, wherein the respective horizontal leg is arranged below the substrate transport plane and at least partially overlaps the substrate. L-profiles form by their vertical legs a closed box frame, while the inner edges of their horizontal legs at the same time grip under the substrate edges in order to prevent the spread of scattered vapor to the substrate back as possible.

Advantageously, a suction port of suction lines is arranged on both sides of the steam distributor, in order to be able to remove excess coating material from the system chamber. If these are arranged within the box frame, so are the Absaugmündungen enclosed by the box frame.

In one embodiment, the box frame is bounded above by a horizontal upper chamber wall of the installation chamber. For example, the box frame may be attached directly to a chamber lid of the plant chamber. As a result, an almost completely enclosed space is provided in the interaction of upper chamber wall, box frame and transport rollers or substrate, in which the coating of the substrate takes place with great constancy of temperature, vapor distribution and concentration.

In another embodiment, provision is made for the boundary walls of the box frame extending transversely to the substrate transport direction to extend onto the substrate transport plane with the formation of a gap, the gap being kept so small that the substrates can still be transported through them without collision. This makes it possible to achieve a very good delimitation of the coating area from surrounding areas of the installation chamber, so that the coating takes place with high constancy of temperature, vapor distribution and concentration.

It can further be provided that are attached to the gap bounding bottom of the transverse to the substrate transport boundary walls of the box frame elastic fibers that extend into the gap. Thus, a possible exchange of gas and vaporous coating material between the coating area and surrounding areas of the installation chamber can be further reduced. Advantageously, the boundary walls are heated. This ensures that the box frame, at least in the areas that are not directly exposed to the emerging from the steam distributor steam jet, self-cleans by the deposited thereon coating material is immediately evaporated again.

For example, it can be provided that heating elements extending parallel to the boundary walls are arranged outside the box frame. In this case, so-called quartz tube heaters can be used in a particularly advantageous manner, which are arranged close to the boundary walls and thereby directly open the boundary walls, i. heat quickly and constantly. In a rectangular box frame four heating elements can be used, which are each arranged parallel to a boundary wall. Alternatively, two heating elements can be angled and arranged so that each heating element heats two sides of the box frame. Further alternatively, a single heating element may be angled so that it encloses the entire box frame.

According to a further embodiment, a diaphragm or / and a heating element are arranged below the substrate transport plane between each two transport rollers and the box frame is supported on the diaphragms and / or heating rods. Such diaphragms can also be integrated, for example, in heating rods, or heating elements can have integrated diaphragms in order to close the space between two adjacent transport rollers as well as possible and to create an area as closed as possible below the substrate transport plane.

The solution according to the invention comprises a box frame, which encloses the steam source and which can be made, for example, from CFC. This is outside (as far as possible) heated, preferably with quartz glass heaters. In the box frame is at least the steam distributor of a vapor source for providing vaporized coating material and optionally suction mouths of suction lines to carry away excess coating material and thereby prevent its unwanted deposition on plant components.

If such Absaugmündungen provided, it is recommended to leave the suction lines after leaving the "hot zone" in a condenser to bind the transported steam. This embodiment is described in detail in a further parallel patent application.

The edges of the boundary walls of the box frame at the substrate passage can be sealed, for example, by means of flexible bristles or fibers, for example of CFC or ceramic.

The device can be mounted in its entirety on a chamber lid of the system chamber. Flexible CFC or a provided spring effect can ensure that the box frame with closed chamber lid on the internals, for example, arranged between the transport rollers, transversely to the substrate transport direction extending aperture and / or heating rods, parked and pressed there.

The edge region can be designed such that the transport rollers are externally tapered, ie that their end regions have a smaller diameter than the central region, that the substrate protrudes on both sides in each case about 2 cm beyond the central region of the transport rollers. Thus, starting from this edge up to the chamber wall, a closed area or to the side just above the transport rollers on which the box frame is then turned off. This leaves only small gaps or openings, which are seen from the steam source behind the substrate edge.

A fundamental advantage of the proposed solution is that the spreading of the coating material through the box frame is minimized. The first problem (unwanted coating of the internals) would thus obviously resolved and also solved so that the box frame itself ensures that no coating material accumulates in it. The heaters on the box frame are designed so that the box frame is internally tempered at least to 600 ° C, more to about 700 ° C to 800 ° C.

Consequently, process conditions are created at the location of the substrate coating, which are reproducible and better adjustable. Long-term effects, which are caused by gradually growing unwanted coatings on the internals, should be much less important. The concentration of the coating material immediately above the substrate is thus easier to control. In addition, the proposed solution can reduce the consumption of coating material, which can be very expensive depending on the desired layer.

The invention will be explained in more detail with reference to an embodiment and associated drawings. Show

1 exemplary embodiments of heating elements with integrated diaphragms which are arranged between transport rollers,

2 a schematic cross section through a coating system, and

3 a schematic plan view of the coating area in a plant chamber.

In 1 are between each two adjacent transport rollers 2 a transport device for plate-shaped substrates 1 heaters 3 arranged on the one hand the substrate 1 to heat evenly, on the other unwanted layers of the transport rollers 2 to evaporate again. The heating elements 3 include quartz tube heaters 31 wherein the heating element is formed from a tungsten filament embedded in a quartz tube. The rightmost heating element 3 represents a simple embodiment in which a double quartz tube heater 31 with an 8-shaped cross-section in a protective tube 32 is arranged so that the remaining space between transport roller 2 and heating element 3 still pretty big.

In contrast, have the protective tubes 32 the left and middle representation each laterally extended aperture 33 on, which are wedge-shaped in the middle representation in the form of simple plate strips and in the left view in cross-section, and to reduce the distance to adjacent transport rollers 2 serve. The irises 33 can be made of a ceramic, such as SiC, or CFC, because the aperture 33 high temperatures, for example 700 ° C to 800 ° C, must withstand.

In 2 is a cross section through the plant chamber of a coating system in the coating area shown.

The transport rollers 2 each have a central area 21 on top of which the substrates 1 rest, as well as end areas 22 whose diameter is less than the diameter of the central region 21 , In addition, the middle area 21 shorter than the width of the substrates 1 so that the substrates 1 the middle area 21 completely cover so that it is protected from unwanted coating.

Just below the substrate transport plane is between two adjacent transport rollers 2 one heating element each 3 arranged, one in a protective tube 32 arranged quartz tube heater 31 includes, wherein the heating rods 3 For example, as may be designed with respect to 1 has already been explained.

On the heating rods 3 a rectangular box frame is supported, consisting of boundary walls running parallel to the substrate transport direction 4 and (not shown) transverse to the Substrattransportrichtung extending boundary walls is formed.

The boundary walls running parallel to the substrate transport direction 4 have in cross section an L-profile with a horizontal and a vertical leg, wherein the respective horizontal leg is disposed below the substrate transport plane and overlaps the respective substrate edge. The boundary walls, not shown here, extending transversely to the substrate transport direction 4 in contrast, form a gap with the substrate transport plane, so that the plate-shaped substrates 1 can be moved through it without collision.

Transverse to the transport direction extends to an upper chamber wall 5 , the chamber lid, attached steam distributor 7 a steam source, being between the steam distributor 7 and the chamber lid 5 a thermal insulation 9 is arranged. In addition, the chamber lid 5 a sealing lip 6 on, with the chamber lid closed 5 interacts with the box frame.

Outside the box frame are, parallel to its boundary walls 4 , Heating rods 8th arranged so that the boundary walls 4 can be heated. In the exemplary embodiment, these comprise double quartz tube heaters 81 , each in a protective tube 82 are arranged.

How out 3 it can be seen, the box frame by two such heating elements 8th enclosed, which are angled so that they each have two boundary walls 4 cover the box frame.

LIST OF REFERENCE NUMBERS

1

substratum

2

transport roller

21

middle area

22

end

3

heater

31

Quartz tube heater

32

thermowell

33

cover

4

boundary wall

5

chamber wall

6

sealing lip

7

steam distribution

8th

heater

81

Quartz tube heater

82

thermowell

9

thermal insulation

Claims (7)

Continuous substrate treatment system for coating plate-shaped substrates ( 1 ) in a horizontal orientation, comprising at least one of chamber walls ( 5 ) limited installation chamber, a transport device which extends through the at least one installation chamber and which has a plurality of transversely to the transport direction of the substrates ( 1 ), rotatably mounted, cylindrical transport rollers ( 2 ), whose uppermost generatrices define a horizontal substrate transport plane and of which at least a part is drivable, and at least one steam distributor arranged above the transport device (US Pat. 7 ) of a coating device, characterized in that the steam distributor ( 7 ) of one, at least by vertical boundary walls ( 4 ) is enclosed, box frame, wherein the transport rollers ( 2 ) each have a central area ( 21 ) and end regions ( 22 ), wherein the diameter of the middle region ( 21 ) is greater than the diameter of the end regions ( 22 ), and the middle range ( 21 ) is shorter than the width of the substrates ( 1 ), and wherein parallel to the Substrattransportrichtung extending boundary walls ( 4 ) of the box frame in cross-section have an L-profile with a horizontal and a vertical leg, wherein the respective horizontal leg is arranged below the substrate transport plane and the substrate ( 1 ) at least partially overlapped. Continuous substrate treatment plant according to claim 1, characterized in that the box frame is upwardly through a horizontal upper chamber wall ( 5 ) of the installation chamber is limited. Continuous substrate treatment plant according to claim 1 or 2, characterized in that running transversely to the Substrattransportrichtung boundary walls ( 4 ) of the box frame to extend to form a gap on the substrate transport plane, wherein the gap is kept so small that the substrates ( 1 ) can be transported through it without collision. Continuous substrate treatment system according to claim 3, characterized in that at the gap bounding bottom of the transverse to the substrate transport direction boundary walls ( 4 ) of the box frame elastic fibers are attached, which extend into the gap. Continuous substrate treatment installation according to one of claims 1 to 4, characterized in that the boundary walls ( 4 ) are heated. Continuous substrate treatment plant according to claim 5, characterized in that outside the box frame parallel to the boundary walls ( 4 ) extending heating rods ( 8th ) are arranged. Continuous substrate treatment plant according to one of claims 1 to 6, characterized in that below the substrate transport plane between each two transport rollers ( 2 ) an orifice plate and / or a heating rod ( 3 ) is arranged and the box frame on the panels or / and heating rods ( 3 ) is supported.

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