Optical filter and touch-control display module with the touch-control effect
Technical field
The utility model relates to the touch-control field, particularly relates to a kind of optical filter with the touch-control effect and uses the touch-control display module of this optical filter.
Background technology
At present, touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
For the touch-control display device, the display device element that is absolutely necessary, but the element (as optical filter) that forms display device itself does not possess the touch-control sensing effect.Therefore as shown in Figure 1, the touch-control display device is mainly obtained by the mode that use cementing agent 130 is fitted entirely or the frame subsides are combined by touch control induction device 110 and display device 120 at present, therefore, during production, need a step by the technique of touch control induction device 110 and display device 120 laminatings, but the touch control display apparatus thickness obtained like this is thicker.
The utility model content
Based on this, be necessary to propose a kind of optical filter with the touch-control effect, make the display device of using this optical filter possess the touch-control effect and thickness less; A kind of touch-control display module that uses this optical filter also is provided simultaneously.
A kind of optical filter with the touch-control effect, comprise that transparent substrates, interval are covered in conductive layer and the R/G/B colorama resistance layer on described transparent substrates, wherein said conductive layer also is covered with the black light resistance layer away from a side of described transparent substrates, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space arrange the formation induction structure.
Therein in embodiment, described the first conductive pattern and the second conductive pattern obtain by the conductive layer etching be arranged on described transparent substrates, the conductive material of described conductive layer is selected from metal, metal alloy, conducting polymer, at least one in Graphene, carbon nano-tube, ITO and conductive ink.
Therein in embodiment, described conductive layer comprises a plurality of conductive grids unit, described conductive grid unit is intersected and is formed by conductive thread, described black light resistance layer is attached on the conductive thread of described conductive grid unit and forms lattice structure, and the elementary cell of described R/G/B colorama resistance layer is positioned at the zone that described grid limits.
Therein in embodiment, 80%~120% of the live width of the gridline that the live width of described conductive grid unit conductive thread is described black light resistance layer.
In embodiment, described conductive grid unit is corresponding one by one with the elementary cell of described R/G/B colorama resistance layer therein.
Therein in embodiment, described conductive layer extends on mutually orthogonal first direction and on above in the of second, wherein on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers is held in the projection of conductive grid unit on described black light resistance layer.
Therein in embodiment, described conductive grid unit is the multiple lines and multiple rows setting, wherein said conductive unit grid do whole interrupt or local interrupt to process be formed with the continuous conductive thread of multirow, multirow conductive thread compartment of terrain on the direction of row is connected simultaneously, forms described the first conductive pattern and described the second conductive pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.
In embodiment, the distance of two broken string nodes of the conductive thread of conductive grid unit is 0.5~50 μ m therein.
In embodiment, the thickness of described R/G/B colorama resistance layer is more than or equal to the integral thickness of black light resistance layer and conductive layer therein.
In embodiment, comprise the aforesaid optical filter with the touch-control effect therein.
In embodiment, described touch-control display module comprises the upper polaroid stacked gradually, the described optical filter with the touch-control effect, upper alignment film, liquid crystal, lower alignment film and transistor electrodes therein.
In embodiment, described conductive layer is towards a side at described liquid crystal place therein.
The above-mentioned optical filter with the touch-control effect, be provided with for producing the conductive pattern of touch-control effect, while being applied to display module, without other sticking touch control induction installation, can guarantee that display module possesses the touch-control effect and thickness is little.
The optical filter of above-mentioned touch-control display module is with the touch-control effect, therefore possess the touch-control effect and thickness little.
The accompanying drawing explanation
The structural representation that Fig. 1 is traditional touch-control display device;
The perspective view of the optical filter that Fig. 2 is an embodiment;
The cross-sectional view of the optical filter that Fig. 3 is an embodiment;
The structural representation of the conductive layer of the optical filter that Fig. 4 is an embodiment;
The schematic diagram of the first conductive pattern of the optical filter that Fig. 5 is an embodiment and the first generation type of the second conductive pattern;
The schematic diagram of the first conductive pattern of the optical filter that Fig. 6 is an embodiment and the second generation type of the second conductive pattern;
Four kinds of different corresponding situations of the conductive grid unit that Fig. 7 to Figure 10 is conductive layer and the elementary cell of the colorama resistance layer R/G/G of optical filter;
Figure 11 is the exploded view of use with the touch-control display module of the optical filter of touch-control effect.
Embodiment
Please refer to Fig. 2 to Figure 10, is the structural representation of the optical filter 200 of an embodiment.Optical filter 200 comprises transparent substrates 210, is arranged on conductive layer 220 and R/G/B colorama resistance layer 230 on transparent substrates 210, and is covered in the black light resistance layer 240 on conductive layer 220.
Transparent substrates 210 can be sillico aluminate glass or calcium soda-lime glass.Conductive layer 220 comprises a plurality of conductive grids unit 222 that array arranges, and wherein conductive grid unit 222 is to be intersected and formed by conductive thread.Black light resistance layer 240 is attached on the conductive thread of conductive grid unit 222 and forms lattice structure, 80%~120% of the live width of the gridline that the live width of conductive grid unit 222 conductive threads is described black light resistance layer 240.In other words, black light resistance layer 240 is consistent with the shape of conductive layer 220.230 of R/G/B colorama resistance layers are plated/are coated in the zone of grid restriction.Like this, R/G/B colorama resistance layer 230 and black light resistance layer 240 present spaced effect.
Conductive layer 220 is divided into again the first conductive pattern 224 and the second conductive pattern 226 spaced and the formation induction structure, possesses the touch-control effect while making optical filter 200 application.The first conductive pattern 224 can be connected lead-in wire separately with the second conductive pattern 226, to communicate with control chip.After conductive layer 220 forms, the thickness of R/G/B colorama resistance layer 230 can be more than or equal to the integral thickness of conductive layer 220 and black light resistance layer 240, the light emission rate in R/G/B chromatic photoresist zone can be increased like this, the situation of the light send less than R/G/B chromatic photoresist zone from the side can be avoided occurring.
Please refer to Fig. 4, in the present embodiment, the first conductive pattern 224 and the second conductive pattern 226 are individual layer multipoint configurations, they are to obtain by conductive layer 220 after etchings are set on transparent substrates 210, and in this process, are to use broken string to process to obtain the first conductive pattern 224 and the second conductive pattern 226 independent of one another and insulation.
Please in conjunction with reference to figure 5 and Fig. 6, conductive layer 220 extends on mutually orthogonal first direction X and second direction Y, and the conductive grid unit 222 of conductive layer 220 is the multiple lines and multiple rows setting, each corresponding R/G/B unit, conductive grid unit 222.Herein, be respectively the direction of row and column with first direction X and second direction Y, the mode that broken string is processed is: conductive unit grid 222 is interrupted to (as shown in Figure 5) as integral body or processing (as shown in Figure 6) is interrupted in part, form the continuous conductive thread of multirow, multirow conductive thread compartment of terrain on second direction Y is connected simultaneously, form thus the first conductive pattern 224 and the second conductive pattern 226 that independent of one another and shape complementarity is semi-surrounding or entirely surrounds shape, the distance of two broken string nodes of the conductive thread of conductive grid unit 342 is generally 0.5~50 μ m.Herein, compartment of terrain is connected can comprise multiple situation, in the present embodiment, clips the conductive thread of a line the second conductive pattern 226 in two row conductive threads of the first conductive pattern 224, can certainly be the conductive thread that clips two row the second conductive patterns.
As shown in Figure 7, in above-described embodiment, it is in the situation that each corresponding R/G/B unit, conductive grid unit 222 carries out that broken string is processed.But it may be noted that also can there be other corresponding situation conductive grid unit 222 and R/G/B unit.Please refer to Fig. 8, on first direction X, the projection of conductive grid unit 222 on black light resistance layer 240 comprises the elementary cell of a plurality of R/G/B colorama resistance layers 230.Please refer to Fig. 9, on second direction Y, the projection of conductive grid unit 222 on black light resistance layer 240 comprises the elementary cell of a plurality of R/G/B colorama resistance layers 230.Please refer to Figure 10, on first direction X and second direction Y, the elementary cell of a plurality of R/G/B colorama resistance layers 230 is held in the projection of conductive grid unit 222 on black light resistance layer 240 simultaneously.
Optical filter 200 preparation methods of the present embodiment are as follows:
Step 1, on the surface of transparent substrates, cover conductive layer.At glass baseplate, at first use beam-plasma to carry out bombardment processing on as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and colorama resistance layer and conductive layer.Then, at plated surface one deck conductive layer of transparent substrates or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can be metal (as silver), metal alloy, conducting polymer, Graphene, carbon nano-tube or ITO.
Step 2, cover again the black light resistance layer on described conductive layer.Be coated with last layer with the photoresist of black dyes as the black light resistance layer.
Step 3, by exposure-developing obtains the lattice structure of black light resistance layer, and make the pattern form of residual black light resistance layer consistent with the conductive pattern shape of needs.In this step, can be at first by exposure-developing makes the black light resistance layer form the lattice structure that array arranges, then the black photoresistance at the conductive pattern broken string place of corresponding conductive layer is removed, can be obtained the conductive layer through the effect of broken string processing while so that follow-up, conductive layer being carried out to etching.
Step 4, to utilize described black light resistance layer be mask layer, and described conductive layer is carried out to etching, obtains separate, the first conductive pattern of insulation and the conductive thread of the second conductive pattern.Utilize etching technique to carry out etching to conductive layer, obtain separate, the first conductive unit of insulation and the grid silk thread of the second conductive unit, and it is consistent with residual black light resistance layer pattern form to obtain the pattern of conductive layer.
Step 5, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.Plate successively or coat the R/G/B chromatic photoresist in corresponding region, just obtained possessing the optical filter of touch-control effect.
In the preparation method of above-mentioned optical filter 200, the conduction series of strata utilize the black light resistance layer to carry out etching as mask layer, so the conductive grid unit of conductive layer do not need to be aimed at the grid of black light resistance layer, reduce task difficulty.
Please refer to Figure 11; the application also provides a kind of touch-control display module 300, comprises the upper polaroid 310, the optical filter 320 with the touch-control effect, diaphragm 330, public electrode 340, upper alignment film 350, liquid crystal 360, lower alignment film 370, transistor electrodes 380 and the lower polaroid 390 that stack gradually.Optical filter 320 can be selected aforesaid optical filter 200, make touch-control display module 300 possess the touch-control display effect and thickness less.The conductive layer of optical filter 320 is towards a side at liquid crystal 360 places.
It may be noted that if it is polarized light source that touch-control display module 300 is used backlight, as OLED Organic Light Emitting Diode (Organic Light-Emitting Diode) polarized light source, without lower polaroid 390, only have upper polaroid 310 to get final product.In certain embodiments, when thin film transistor (TFT) that transistor electrodes 380 is the wide-angle liquid crystal structure, without public electrode 340 and diaphragm 330.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.