CN112624797A - 一种石墨表面梯度碳化硅涂层及其制备方法 - Google Patents
一种石墨表面梯度碳化硅涂层及其制备方法 Download PDFInfo
- Publication number
- CN112624797A CN112624797A CN202011480093.4A CN202011480093A CN112624797A CN 112624797 A CN112624797 A CN 112624797A CN 202011480093 A CN202011480093 A CN 202011480093A CN 112624797 A CN112624797 A CN 112624797A
- Authority
- CN
- China
- Prior art keywords
- silicon carbide
- graphite
- carbide coating
- coating
- surface gradient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 91
- 239000011248 coating agent Substances 0.000 title claims abstract description 88
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 88
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 88
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 78
- 239000010439 graphite Substances 0.000 title claims abstract description 78
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 28
- 229920003257 polycarbosilane Polymers 0.000 claims abstract description 25
- 239000007788 liquid Substances 0.000 claims abstract description 15
- 239000011863 silicon-based powder Substances 0.000 claims abstract description 15
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 239000005543 nano-size silicon particle Substances 0.000 claims abstract description 10
- 238000007598 dipping method Methods 0.000 claims abstract description 7
- 230000008569 process Effects 0.000 claims abstract description 7
- 238000005336 cracking Methods 0.000 claims abstract description 6
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 230000010355 oscillation Effects 0.000 claims abstract description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 6
- 238000005470 impregnation Methods 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 6
- 239000012159 carrier gas Substances 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000003085 diluting agent Substances 0.000 claims description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 4
- 239000005052 trichlorosilane Substances 0.000 claims description 4
- DWAWYEUJUWLESO-UHFFFAOYSA-N trichloromethylsilane Chemical compound [SiH3]C(Cl)(Cl)Cl DWAWYEUJUWLESO-UHFFFAOYSA-N 0.000 claims 1
- 239000011159 matrix material Substances 0.000 abstract description 7
- 238000010438 heat treatment Methods 0.000 description 15
- 235000012431 wafers Nutrition 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 5
- 239000003575 carbonaceous material Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000007770 graphite material Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000010678 Paulownia tomentosa Nutrition 0.000 description 1
- 240000002834 Paulownia tomentosa Species 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000011204 carbon fibre-reinforced silicon carbide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000002737 fuel gas Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5053—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials non-oxide ceramics
- C04B41/5057—Carbides
- C04B41/5059—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/56—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
- C04B35/565—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62222—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/87—Ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/60—Aspects relating to the preparation, properties or mechanical treatment of green bodies or pre-forms
- C04B2235/614—Gas infiltration of green bodies or pre-forms
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/77—Density
- C04B2235/775—Products showing a density-gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
本发明公开了一种石墨表面梯度碳化硅涂层及其制备方法,方法包括以下步骤:S1:将纳米硅粉加入液态聚碳硅烷中,超声震荡混合均匀,得到含有硅粉的液态聚碳硅烷;将石墨试样加压浸渍于含有硅粉的液态聚碳硅烷中,取出后固化、裂解,从而在石墨表面形成初级碳化硅涂层。S2:采用化学气相沉积法在步骤S1的初级碳化硅涂层表面沉积次级碳化硅涂层,从而初级碳化硅涂层和次级碳化硅涂层形成石墨表面的梯度碳化硅涂层。本发明通过在聚碳硅烷中加入硅粉,硅粉随着聚碳硅烷固化分布在石墨表面,在1650℃‑1800℃与表面石墨反应生成碳化硅,既增强了涂层与石墨基体的结合强度,又避免影响后续CVD SiC的生长。
Description
技术领域
本发明涉及涂层制备技术领域,尤其涉及一种石墨表面梯度碳化硅涂层的制备方法。
背景技术
石墨具有优良的导电、导热性能,高温强度好,在特种工业炉中常用石墨作为发热体。随着半导体工业的全面发展,提炼单晶硅,单晶错,呻化嫁、磷化锢等材料的加热炉选择特种石墨作发热体,一些特殊的工业炉和实验炉用炭布或石墨布作发热体。除了石墨发热体以外,石墨甜桐,炭素保温材料等碳素材料在特种工业炉中大量使用,尤其是在半导体工业中的晶圆生长炉中。碳素材料核心部件损耗占用晶圆制造成本很高比例,碳石墨材料部件用量极大,且属于易耗件,这也是晶圆制造成本很难降低的原因之一。石墨材料的缺点是碳原子在高温下持续挥发,带来两个负面影响:一是碳原子扩散进晶圆,造成晶圆品质下降:二是石墨表面产生大量腐蚀坑,服役寿命减小。目前,随着晶圆产业规模急剧扩大,在太阳能光伏行业中,提高品质、降低成本己成为产业发展的关键,迫切要求延长石墨热场材料服役时间。作为一种航空航天涂层材料,纳米碳化硅涂层新材料导热系数高、热膨胀系数小、碳扩散系数小、化学性能稳定、耐磨损性能好,具有耐高温、抗热震、抗蠕变、抗氧化的优点。在航空航天领域,碳化硅涂层已经被用作碳材料和炭/炭复合材料的高温涂层,抵抗2500-3000的燃气流,表现出优良的抗氧化、抗烧蚀特征。将SiC涂层应用到半导体工业中晶圆生长炉内的石墨发热体等碳素材料,有望将晶圆品质提高3~5倍,石墨核心部件的寿命提高6~10倍,企业经济效益能显著提升。
申请号201510986408.5的中国专利公开了一种石墨热场表面制备SiC涂层的方法,该方法为:(1)以石墨发热体加热炉体作为沉积炉,将其抽真空,真空度达到100Pa以下;(2)将石墨发热体加热炉内温度升高至900~1200℃;(3)将甲院通入石墨发热体加热炉腔内,气体流量根据炉体尺寸调节,同时通入氢气,氩气,反应时间为1-10h;(4)通入四氧化硅气体,其流量与甲院气体流量比从1∶4逐渐升高到1∶1,依次形成25%碳化硅-75%碳复合涂层、50%碳化硅-50%碳复合涂层、75%碳化硅-25%碳复合涂层、100%碳化硅涂层,继续沉积10~30h,随后降温冷却,石墨热场材料表面出现SiC涂层。该方法制备SiC涂层质量好,涂层制备过程不需要专用化学气相沉积设备,成本低,涂层均匀且厚度灵活可控。
申请号为CN201910491081.2的中国专利公开了一种采用化学气相沉积工艺在硅基体上制备超厚碳化硅梯度涂层的方法,采用热激发式化学气相沉积系统,选择SiH4(硅烷)、CH3SiCl3(甲基三氯硅烷)、CH4(甲烷)和H2(氢气)气体体系并控制各组分气体流量线性变化,在工作压强100~1000Pa和温度为1050~1350℃条件下,沉积出结构致密、超厚的碳化硅梯度涂层。根据成分,由Si基材开始该涂层由Si/SiC梯度涂层、纯SiC涂层、SiC/C梯度涂层、纯C涂层、C/SiC梯度涂层以及纯SiC涂层组成。该方法沉积的SiC梯度涂层具有结构致密、无明显裂纹和与基材结合良好等优点。
虽然两种方式制备的梯度涂层虽然改善了涂层与基体的结合强度,但改善效果有限。
发明内容
本发明要解决的技术问题是克服现有技术的不足,提供一种提高涂层与基体结合强度、提高涂层综合性能的石墨表面梯度碳化硅涂层的制备方法。
为解决上述技术问题,本发明采用以下技术方案:
一种石墨表面梯度碳化硅涂层的制备方法,包括以下步骤:
S1:将纳米硅粉加入液态聚碳硅烷中,超声震荡混合均匀,得到含有硅粉的液态聚碳硅烷;将石墨试样加压浸渍于含有硅粉的液态聚碳硅烷中,取出后固化、裂解,从而在石墨表面形成初级碳化硅涂层。
S2:采用化学气相沉积法在步骤S1的初级碳化硅涂层表面沉积次级碳化硅涂层,从而初级碳化硅涂层和次级碳化硅涂层形成石墨表面的梯度碳化硅涂层。
聚碳硅烷浸渍裂解可以实现深入基体表面以下碳化硅涂层的制备,但制备出的碳化硅为分散的粉末状态,尤其是分布在表面的碳化硅,与石墨基体结合力差,还会影响后续CVD SiC涂层的生长,使其生长不均匀。本发明通过加入硅粉,硅粉随着聚碳硅烷固化分布在石墨表面,在1650℃-1800℃与表面石墨反应生成碳化硅,这样既增强了涂层与石墨基体的结合强度,又避免影响后续CVD SiC的生长。
上述的石墨表面梯度碳化硅涂层的制备方法,优选地,所述含有硅粉的液态聚碳硅烷中,所述纳米硅粉的质量分数为10%-20%。
上述的石墨表面梯度碳化硅涂层的制备方法,优选地,所述加压浸渍的压力为5-8MPa,浸渍时间为3-5h。
上述的石墨表面梯度碳化硅涂层的制备方法,优选地,所述固化的温度为150-200℃。
上述的石墨表面梯度碳化硅涂层的制备方法,优选地,所述裂解的具体过程为:在真空条件下,以0.5-2℃/min升温到1000-1200℃,保温2-4h,随后升温到1650-1800℃,保温3-5h。
上述的石墨表面梯度碳化硅涂层的制备方法,优选地,固化后裂解前,还包括:打磨石墨试样表面,以保留石墨试样表面0.5-1mm厚的固化的含硅聚碳硅烷。
上述的石墨表面梯度碳化硅涂层的制备方法,优选地,所述化学气相沉积法的具体过程为:以三氯甲基硅烷为碳化硅气源,氢气作为载气,氩气作为稀释气体,反应温度为1000-1300℃,三氯甲硅烷流量为60-100sccm,氢气流量为600-1000sccm,氩气流量为600-1000sccm,沉积时间为3-15h。
作为一个总的发明构思,本发明还提供一种由上述的石墨表面梯度碳化硅涂层的制备方法所制得的石墨表面梯度碳化硅涂层。
与现有技术相比,本发明的优点在于:
1、本发明的石墨表面梯度碳化硅涂层的制备方法,先通过PIP方法在石墨表面孔隙内形成碳化硅,再采用CVD方法制备一层致密碳化硅涂层,既增强了涂层与基体的结合强度,又缓解了碳化硅与石墨的热膨胀系数不匹配,大大增强了其使用寿命。
2、本发明的石墨表面梯度碳化硅涂层的制备方法,通过在PIP浸渍源——聚碳硅烷中加入硅粉,硅粉随着聚碳硅烷固化分布在石墨表面,在1650℃-1800℃与表面石墨反应生成碳化硅,这样既增强了涂层与石墨基体的结合强度,又避免影响后续CVD SiC的生长。
附图说明
图1为实施例1在石墨表面制备的梯度碳化硅涂层的截面SEM图。
具体实施方式
以下结合具体优选的实施例对本发明作进一步描述,但并不因此而限制本发明的保护范围。
实施例1:
本实施例的石墨表面梯度碳化硅涂层的制备方法,包括以下步骤:
(1)将石墨试样放在去离子水中超声清洗,清洗完成后烘干;
(2)将纳米级硅粉加入液态聚碳硅烷中,纳米硅粉的质量分数为10%,超声震荡混合均匀;
(3)烘干后的试样放进含有硅粉的液态聚碳硅烷中,加压浸渍,浸渍压力在5MPa,随后150℃固化;
(4)打磨样品表面,保留1mm厚表面固化的聚碳硅烷;
(5)样品放入真空炉内,以0.5℃/min升温到1100℃,保温3h;随后升温到1700℃,保温5h;
(6)取出样品,将样品表面打磨平整,采用化学气相沉积法在表面制备碳化硅涂层,以三氯甲基硅烷为碳化硅气源,氢气作为载气,氩气作为稀释气体,反应温度为1100℃,三氯甲硅烷流量为100sccm,氢气流量为1000sccm,氩气流量为1000sccm,沉积时间为4h;
(7)最终在石墨表面得到梯度碳化硅涂层。
参见图1,在石墨表面制备的梯度碳化硅涂层的截面TEM图,可见,PIP方法制备的碳化硅形成于石墨表面孔隙内,CVD方法制备的碳化硅涂层致密,PIP方法制备的碳化硅和CVD方法制备的碳化硅涂层之间通过硅粉与石墨原位生成的碳化硅结合,所得梯度碳化硅涂层既增强了涂层与基体的结合强度,又缓解了碳化硅与石墨的热膨胀系数不匹配,大大增强了其使用寿命。
实施例2:
(1)将石墨试样放在去离子水中超声清洗,清洗完成后烘干;
(2)将纳米级硅粉加入液态聚碳硅烷中,纳米硅粉的质量分数为20%,超声震荡混合均匀;
(3)烘干后的试样放进含有硅粉的液态聚碳硅烷中,加压浸渍,浸渍压力在7MPa,随后200℃固化;
(4)打磨样品表面,保留0.5mm厚表面固化的聚碳硅烷;
(5)样品放入真空炉内,以1℃/min升温到1200℃,保温2h;随后升温到1800℃,保温3h;
(6)取出样品,将样品表面打磨平整,采用化学气相沉积法在表面制备碳化硅涂层,以三氯甲基硅烷为碳化硅气源,氢气作为载气,氩气作为稀释气体,反应温度为1200℃,三氯甲硅烷流量为60sccm,氢气流量为600sccm,氩气流量为600sccm,沉积时间为5h;
(7)最终在石墨表面得到梯度碳化硅涂层。
以上所述,仅是本申请的较佳实施例,并非对本申请做任何形式的限制,虽然本申请以较佳实施例揭示如上,然而并非用以限制本申请,任何熟悉本专业的技术人员,在不脱离本申请技术方案的范围内,利用上述揭示的技术内容做出些许的变动或修饰均等同于等效实施案例,均属于技术方案范围内。
Claims (8)
1.一种石墨表面梯度碳化硅涂层的制备方法,其特征在于,包括以下步骤:
S1:将纳米硅粉加入液态聚碳硅烷中,超声震荡混合均匀,得到含有硅粉的液态聚碳硅烷;将石墨试样加压浸渍于含有硅粉的液态聚碳硅烷中,取出后固化、裂解,从而在石墨表面形成初级碳化硅涂层。
S2:采用化学气相沉积法在步骤S1的初级碳化硅涂层表面沉积次级碳化硅涂层,从而初级碳化硅涂层和次级碳化硅涂层形成石墨表面的梯度碳化硅涂层。
2.根据权利要求1所述的石墨表面梯度碳化硅涂层的制备方法,其特征在于,所述含有硅粉的液态聚碳硅烷中,所述纳米硅粉的质量分数为10%-20%。
3.根据权利要求1所述的石墨表面梯度碳化硅涂层的制备方法,其特征在于,所述加压浸渍的压力为5-8MPa,浸渍时间为3-5h。
4.根据权利要求1所述的石墨表面梯度碳化硅涂层的制备方法,其特征在于,所述固化的温度为150-200℃。
5.根据权利要求1所述的石墨表面梯度碳化硅涂层的制备方法,其特征在于,所述裂解的具体过程为:在真空条件下,以0.5-2℃/min升温到1000-1200℃,保温2-4h,随后升温到1650-1800℃,保温3-5h。
6.根据权利要求1所述的石墨表面梯度碳化硅涂层的制备方法,其特征在于,固化后裂解前,还包括:打磨石墨试样表面,以保留石墨试样表面0.5-1mm厚的固化的含硅聚碳硅烷。
7.根据权利要求1-6任一项所述的石墨表面梯度碳化硅涂层的制备方法,其特征在于,所述化学气相沉积法的具体过程为:以三氯甲基硅烷为碳化硅气源,氢气作为载气,氩气作为稀释气体,反应温度为1000-1300℃,三氯甲硅烷流量为60-100sccm,氢气流量为600-1000sccm,氩气流量为600-1000sccm,沉积时间为3-15h。
8.一种由权利要求1-7任一项所述的石墨表面梯度碳化硅涂层的制备方法所制得的石墨表面梯度碳化硅涂层。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011480093.4A CN112624797A (zh) | 2020-12-15 | 2020-12-15 | 一种石墨表面梯度碳化硅涂层及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202011480093.4A CN112624797A (zh) | 2020-12-15 | 2020-12-15 | 一种石墨表面梯度碳化硅涂层及其制备方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112624797A true CN112624797A (zh) | 2021-04-09 |
Family
ID=75313187
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202011480093.4A Pending CN112624797A (zh) | 2020-12-15 | 2020-12-15 | 一种石墨表面梯度碳化硅涂层及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112624797A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114150292A (zh) * | 2021-12-14 | 2022-03-08 | 武汉理工大学 | 一种抗热震碳化硅纳米多孔涂层材料及其制备方法与应用 |
CN114368982A (zh) * | 2022-01-21 | 2022-04-19 | 巩义市泛锐熠辉复合材料有限公司 | 一种碳化硅涂层石墨基座及其制备方法 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1554802A (zh) * | 2003-12-23 | 2004-12-15 | 清华大学 | 制备核反应堆用石墨表面抗氧化涂层材料碳化硅的方法 |
CN101775590A (zh) * | 2010-01-08 | 2010-07-14 | 刘锡潜 | 一种具有保护涂层的石墨基座及其制备方法 |
CN102850087A (zh) * | 2012-09-29 | 2013-01-02 | 西安超码科技有限公司 | 一种在石墨表面制备碳化硅涂层的方法 |
CN103435372A (zh) * | 2013-08-12 | 2013-12-11 | 江苏赛菲新材料有限公司 | 一种石墨碳套梯度抗氧化涂层及其制备方法 |
CN106083192A (zh) * | 2016-06-08 | 2016-11-09 | 中国人民解放军国防科学技术大学 | 具有SiC涂层的石墨材料及其制备方法 |
CN106431498A (zh) * | 2016-09-05 | 2017-02-22 | 江苏协鑫特种材料科技有限公司 | 一种制备石墨/碳化硅致密复合材料的方法 |
CN107540400A (zh) * | 2017-09-26 | 2018-01-05 | 苏州宏久航空防热材料科技有限公司 | 一种具有复合界面的SiCf/SiC陶瓷基复合材料 |
CN107814590A (zh) * | 2017-11-07 | 2018-03-20 | 中国科学院山西煤炭化学研究所 | 一种熔盐反应堆用石墨表面SiC涂层的制备方法 |
KR20190109912A (ko) * | 2018-03-19 | 2019-09-27 | 주식회사 카보넥스 | 하이브리드 코팅법을 이용한 그라파이트 모재의 코팅방법 |
CN110357665A (zh) * | 2018-10-08 | 2019-10-22 | 湖南德智新材料有限公司 | 一种用于蓝宝石衬底的碳化硅涂层及其制备方法 |
CN110760822A (zh) * | 2019-12-03 | 2020-02-07 | 中节能太阳能科技(镇江)有限公司 | 一种pecvd石墨舟载具的制造方法 |
-
2020
- 2020-12-15 CN CN202011480093.4A patent/CN112624797A/zh active Pending
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1554802A (zh) * | 2003-12-23 | 2004-12-15 | 清华大学 | 制备核反应堆用石墨表面抗氧化涂层材料碳化硅的方法 |
CN101775590A (zh) * | 2010-01-08 | 2010-07-14 | 刘锡潜 | 一种具有保护涂层的石墨基座及其制备方法 |
CN102850087A (zh) * | 2012-09-29 | 2013-01-02 | 西安超码科技有限公司 | 一种在石墨表面制备碳化硅涂层的方法 |
CN103435372A (zh) * | 2013-08-12 | 2013-12-11 | 江苏赛菲新材料有限公司 | 一种石墨碳套梯度抗氧化涂层及其制备方法 |
CN106083192A (zh) * | 2016-06-08 | 2016-11-09 | 中国人民解放军国防科学技术大学 | 具有SiC涂层的石墨材料及其制备方法 |
CN106431498A (zh) * | 2016-09-05 | 2017-02-22 | 江苏协鑫特种材料科技有限公司 | 一种制备石墨/碳化硅致密复合材料的方法 |
CN107540400A (zh) * | 2017-09-26 | 2018-01-05 | 苏州宏久航空防热材料科技有限公司 | 一种具有复合界面的SiCf/SiC陶瓷基复合材料 |
CN107814590A (zh) * | 2017-11-07 | 2018-03-20 | 中国科学院山西煤炭化学研究所 | 一种熔盐反应堆用石墨表面SiC涂层的制备方法 |
KR20190109912A (ko) * | 2018-03-19 | 2019-09-27 | 주식회사 카보넥스 | 하이브리드 코팅법을 이용한 그라파이트 모재의 코팅방법 |
CN110357665A (zh) * | 2018-10-08 | 2019-10-22 | 湖南德智新材料有限公司 | 一种用于蓝宝石衬底的碳化硅涂层及其制备方法 |
CN110760822A (zh) * | 2019-12-03 | 2020-02-07 | 中节能太阳能科技(镇江)有限公司 | 一种pecvd石墨舟载具的制造方法 |
Non-Patent Citations (4)
Title |
---|
成来飞等: "《复合材料原理及工艺》", 31 March 2018, 西北工业大学出版社 * |
李斌等: "以液态碳硅烷为先驱体制备CVD SiC涂层", 《材料科学与工艺》 * |
李贺军等: "《中国战略性新兴产业—新材料 碳/碳复合材料》", 31 December 2017, 中国铁道出版社 * |
林彬荫等: "《耐火材料原料》", 31 October 2015, 冶金工业出版社 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114150292A (zh) * | 2021-12-14 | 2022-03-08 | 武汉理工大学 | 一种抗热震碳化硅纳米多孔涂层材料及其制备方法与应用 |
CN114150292B (zh) * | 2021-12-14 | 2023-03-10 | 武汉理工大学 | 一种抗热震碳化硅纳米多孔涂层材料及其制备方法与应用 |
CN114368982A (zh) * | 2022-01-21 | 2022-04-19 | 巩义市泛锐熠辉复合材料有限公司 | 一种碳化硅涂层石墨基座及其制备方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107814591B (zh) | 一种碳材料表面硼化物改性硅基抗氧化涂层的制备方法 | |
JP6196246B2 (ja) | 炭化ケイ素−炭化タンタル複合材及びサセプタ | |
CN110144567B (zh) | 采用化学气相沉积工艺在硅基体上制备超厚碳化硅梯度涂层的方法 | |
JPWO2017082147A1 (ja) | 黒鉛基材上に形成された被膜及びその製造方法 | |
CN112624797A (zh) | 一种石墨表面梯度碳化硅涂层及其制备方法 | |
CN113716977B (zh) | 一种碳/碳复合材料表面宽温域复合抗氧化涂层及制备方法 | |
CN112374912A (zh) | 一种碳化硅涂层石墨基座的制备方法 | |
CN114807891B (zh) | 一种表面沉积TaC涂层的石墨基耐高温耐腐蚀热场材料的制备方法 | |
CN105503266A (zh) | 一种石墨热场表面制备SiC涂层的方法 | |
CN114368981A (zh) | 石墨类材料及工件抗氧化处理技术和应用 | |
KR100427118B1 (ko) | 열처리용지그및그제조방법 | |
KR20020011860A (ko) | SiC 성형체 및 그 제조 방법 | |
JPH1012692A (ja) | ダミーウエハ | |
JP2000302577A (ja) | 炭化珪素被覆黒鉛部材 | |
CN106631161A (zh) | 一种在碳基材料表面制备抗高温氧化复合涂层的方法 | |
CN105503265B (zh) | 一种石墨加热炉内石墨热场表面制备SiC涂层的方法 | |
CN115894085B (zh) | 一种复合陶瓷涂层材料及其制备方法和应用 | |
JP2000302576A (ja) | 炭化珪素被覆黒鉛材 | |
CN1304638C (zh) | 制备核反应堆用石墨表面抗氧化涂层材料碳化硅的方法 | |
CN115262218A (zh) | 耐高温抗氧化碳纤维的制备方法 | |
JPH01249679A (ja) | 黒鉛一炭化珪素複合体並びにその製造法 | |
CN103570377B (zh) | 一种石墨发热体加热炉内碳素材料表面制备SiC涂层的方法 | |
JP2004075493A (ja) | CVD−SiC被覆黒鉛材及びその製造方法 | |
CN115819119B (zh) | 一种等静压石墨坩埚的涂层成型方法 | |
JP2002097092A (ja) | SiC膜被覆ガラス状炭素材およびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210409 |
|
RJ01 | Rejection of invention patent application after publication |