CN111722476B - Flexible connecting piece, flexible adsorption device and photoetching system - Google Patents
Flexible connecting piece, flexible adsorption device and photoetching system Download PDFInfo
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- CN111722476B CN111722476B CN201910223890.5A CN201910223890A CN111722476B CN 111722476 B CN111722476 B CN 111722476B CN 201910223890 A CN201910223890 A CN 201910223890A CN 111722476 B CN111722476 B CN 111722476B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention provides a flexible connecting piece, a flexible adsorption device and a photoetching system, wherein a plurality of adsorption units are connected with a supporting unit through the flexible connecting piece, the bottom of each flexible connecting piece is positioned on the same horizontal plane, the bottom of each adsorption unit is positioned on the same horizontal plane, a vacuum unit is connected with each adsorption unit to realize vacuum adsorption on a mask plate, as the flexible connecting piece comprises a connecting piece body and an X-direction groove and a Y-direction groove which are arranged on the connecting piece body, the connecting piece body can deform when adsorbing the mask plate, self-adaptive adjustment in Rx and Ry directions is realized, complete fit of the bottom of the adsorption unit and the surface of the mask plate is ensured, the deformation of the mask plate is reduced, the handover precision is improved, and rigid contact between the adsorption units and the mask plate is effectively avoided, the function of protecting the mask plate is achieved.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to a flexible connecting piece, a flexible adsorption device and a photoetching system.
Background
In the photoetching process, the transmission of the mask plate is an indispensable process, wherein the handover precision of the mask plate in the handover process is a key index. In the prior art, a mask plate adsorption device in a photoetching machine is usually adopted to carry out vacuum adsorption on the mask plate during handover of the mask plate, so that the mask plate can reach a certain handover precision in the handover process, the adsorption surface for adsorbing the mask plate must be effectively attached to the surface of the mask plate, and the deformation of the mask plate can be greatly reduced.
At present, a mask plate adsorption device in a photoetching machine generally adopts a rigid structure, such as ceramic or aluminum, and is limited by part processing precision, the coplanarity of the mask plate adsorption device of the rigid structure can be 0.25um (3-level precision) at most, and the planeness of a mask plate in an adsorption area is 1um at most, when the mask plate adsorption device of the rigid structure is adopted, the deformation amount possibly generated by the mask plate can reach 1.25um, so that the mask plate and the mask plate adsorption device can not be completely attached, the mask plate is easy to move in the process of moving the mask plate, the handover precision of the mask plate is greatly reduced, in addition, for the mask plate adsorption device of the rigid structure, if the coplanarity of an adsorption surface is 0.25um (3-level precision), the processing cost is very high.
Disclosure of Invention
The invention aims to provide a flexible connecting piece, a flexible adsorption device and a photoetching system, which can ensure that an adsorption surface of the flexible adsorption device can be completely attached to a mask plate, so that the deformation of the mask plate is greatly reduced, and the handover precision of the mask plate is improved.
In order to achieve the purpose, the invention provides a flexible connecting piece which comprises a connecting piece body, and an X-direction groove and a Y-direction groove which are arranged on the connecting piece body, wherein the X-direction groove splits the connecting piece body along the X direction and extends into the connecting piece body, and the Y-direction groove splits the connecting piece body along the Y direction and extends into the connecting piece body.
Optionally, the number of the X-direction grooves and the number of the Y-direction grooves are two, the two X-direction grooves are symmetrically arranged along the body central axis of the connector body, and the two Y-direction grooves are symmetrically arranged along the body central axis of the connector body.
Optionally, the X-direction groove and the Y-direction groove both have an extension groove, and the extension groove extends from one end of the X-direction groove or the Y-direction groove extending into the connector body along the Z-direction, so that the X-direction groove and the Y-direction groove are L-shaped.
Optionally, the length of the X-direction groove along the X-direction is greater than 0mm and less than or equal to 8mm, the length of the Y-direction groove along the Y-direction is greater than 0mm and less than or equal to 8mm, and the length of the extension groove along the Z-direction is greater than 0mm and less than or equal to 7 mm.
Optionally, the gap widths of the X-direction groove and the Y-direction groove are both greater than 0mm and less than or equal to 0.1 mm.
Optionally, the damping coefficient generated by the X-direction groove and the Y-direction groove together is greater than 1.
Optionally, the two ends of the connecting piece body in the Z direction are both provided with mounting holes.
The invention also provides a flexible adsorption device for adsorbing a mask plate, which comprises:
a support unit;
a plurality of adsorption units, each adsorption unit is connected with the support unit through a flexible connector according to any one of claims 1-7, one side of each flexible connector, which is connected with the adsorption unit, is positioned on the same horizontal plane, and one side of each adsorption unit, which is used for adsorbing the mask plate, is positioned on the same horizontal plane;
and the vacuum units are connected with each adsorption unit to realize vacuum adsorption on the mask plate.
Optionally, the rigidity ratio of the mask plate to the flexible connecting pieces is K, the ratio of the coplanarity of the surfaces of the flexible connecting pieces connected with the adsorption unit to the deformation of the mask plate is G, and K is greater than or equal to G.
Optionally, the adsorption unit including adsorb the piece and set up in adsorb the piece and keep away from the absorption contact piece of flexonics spare one side, be formed with the absorption chamber in the absorption piece, be formed with in the absorption contact piece with the absorption hole that adsorbs the chamber intercommunication, the vacuum unit with adsorb the chamber intercommunication.
Optionally, the adsorption contact block is made of an antistatic material.
Optionally, the vacuum unit includes a suction pump and a gas pipeline, and the suction pump is communicated with the adsorption cavities in each adsorption block through the gas pipeline, so that the adsorption cavities form vacuum.
Optionally, each of the adsorption blocks has two adsorption cavities therein, the vacuum unit has two gas pipelines, and the two gas pipelines are respectively communicated with the two adsorption cavities in each of the adsorption blocks to form two independent vacuum channels.
The invention also provides a photoetching system comprising the flexible adsorption device.
In the flexible connecting piece, the flexible adsorption device and the photoetching system provided by the invention, a plurality of adsorption units are connected with the supporting unit through the flexible connecting piece, the bottom of each flexible connecting piece is positioned on the same horizontal plane, the bottom of each adsorption unit is positioned on the same horizontal plane, the vacuum unit is connected with each adsorption unit to realize vacuum adsorption on the mask plate, as the flexible connecting piece comprises a connecting piece body and an X-direction groove and a Y-direction groove which are arranged on the connecting piece body, the connecting piece body can deform when adsorbing the mask plate, self-adaptive adjustment in Rx and Ry directions is realized, the complete fit between the bottom of the adsorption unit and the surface of the mask plate is ensured, the deformation of the mask plate is reduced, the handover precision is improved, and the rigid contact between the adsorption units and the mask plate is effectively avoided, the function of protecting the mask plate is achieved.
Drawings
FIG. 1 is a schematic structural diagram of a flexible connector according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view of a flexible connector according to an embodiment of the present invention in the X direction;
FIG. 3 is a schematic view of the view Q of FIG. 2 according to an embodiment of the present invention;
FIG. 4 is a schematic cross-sectional view of a flexible connector according to an embodiment of the present invention in the Y-direction;
FIG. 5 is a schematic diagram of an embodiment of the present invention providing damping equivalent to the X-direction groove or the Y-direction groove;
FIG. 6 is a schematic structural diagram of a flexible adsorption device provided in an embodiment of the present invention;
fig. 7 is a schematic structural diagram of an adsorption block according to an embodiment of the present invention;
wherein the reference numerals are:
10-a support unit; 20-a flexible connection; 21-the connector body; a 22-X direction groove; a 23-Y direction groove; 30-an adsorption unit; 31-an adsorption block; 311 a-first adsorption chamber; 311 b-a second adsorption chamber; 32-a suction contact block; 321 a-first adsorption holes; 321 b-a second adsorption well; 41 a-a first gas conduit; 41 b-a second gas conduit; 42-a main gas pipe joint; 43 a-first vacuum port; 43 b-second vacuum port; 50-a mask plate;
Q-View Q.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. Advantages and features of the present invention will become apparent from the following description and claims. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
As shown in fig. 1 to 4, the present embodiment provides a flexible connector 20, which includes a connector body 21, and an X-direction groove 22 and a Y-direction groove 23 that are disposed on the connector body 21, where the X-direction groove 22 splits the connector body 21 along the X-direction and extends into the connector body 21, and the Y-direction groove 23 splits the connector body 21 along the Y-direction and extends into the connector body 21.
Specifically, as shown in fig. 1, the connector body 21 is integrally formed by a metal material, and has a relatively firm structure, two ends of the connector body 21 in the Z direction are respectively provided with a mounting hole, the connection and the fixation are performed through the mounting holes, the mounting holes may be screw holes, and the mounting holes at two ends of the connector body 21 may be one or more.
Further, the connector body 21 is further provided with an X-direction groove 22 and a Y-direction groove 23, it can be understood that the X-direction groove 22 is a gap formed by cutting the connector body 21 along the X-direction, the Y-direction groove 23 is a gap formed by cutting the connector body 21 along the Y-direction, and the X-direction groove 22 and the Y-direction groove 23 both extend into the connector body 21, so that the connector body 21 cannot be cut into two parts, that is, the X-direction groove 22 and the Y-direction groove 23 cannot penetrate through the connector body 21. Optionally, the X-direction groove 22 and the Y-direction groove 23 both extend into the vicinity of the central axis of the connector body 21.
It can be understood that the X-direction groove 22 and the Y-direction groove 23 are located on different planes in the Z direction (different positions in the Z direction), as shown in fig. 5, when the connector body 21 is stressed, the X-direction groove 22 or the Y-direction groove 23 can be equivalent to an elastic structure of a damper and a spring (where the stiffness of the spring is K, and the damping coefficient of the damper is C), so as to play a role in buffering deformation. Due to the existence of the X-direction groove 22, the connector body 21 can rotate back and forth by an angle (adjustment Ry) around the Y direction, and due to the existence of the Y-direction groove 23, the connector body 21 can rotate left and right by an angle (adjustment Rx) around the X direction. Therefore, the connector body 21 is made of metal material to ensure stability and firmness, and flexible connection is realized through position self-adaptation in the Rx and Ry directions.
As shown in fig. 2 and 4, in this embodiment, the number of the X-direction grooves 22 and the number of the Y-direction grooves 23 are two, the two X-direction grooves 22 are symmetrically arranged along the body central axis of the connector body 21, and the two Y-direction grooves 23 are symmetrically arranged along the body central axis of the connector body 21, so that the angles of the connector body 21 rotating around the X-direction and the X-direction are approximately equal, and the angles of the connector body rotating around the Y-direction and the back-and-forth direction are also approximately equal, so that the connector body 21 can be stably deformed when being stressed, and the flexible connector 20 is prevented from being damaged.
Optionally, the X-direction groove 22 and the Y-direction groove 23 both have an extension groove communicated therewith, that is, the X-direction groove 22 and the Y-direction groove may not only be in a shape of a straight line, but also extend in the Z-direction after extending into the connector body 21 to form the extension groove, so that the X-direction groove 22 and the Y-direction groove 23 are in an L shape, and the X-direction groove 22 and the Y-direction groove 23 in the L shape can make the flexible connector 20 more easily deform.
Based on this, as shown in fig. 6, the present embodiment further provides a flexible adsorption device for adsorbing a mask plate 50, including:
a supporting unit 10, in this embodiment, the supporting unit 10 is a "Y" shaped support, and provides a support for the whole flexible adsorption device, and the top of the supporting unit can be connected to a robot, so that the flexible adsorption device can move to transfer the mask plate 50 after adsorbing the mask plate 50;
a plurality of suction units 30, for example, in this embodiment, there are 4 suction units 30, each suction unit 30 is connected to the bottom of the support unit 10 through the flexible connector 20, each of the 4 suction units 30 includes a suction block 31, the bottom of each suction block 31 is a suction surface for contacting with the mask plate 50 to achieve suction, alternatively, the mask plate 50 may be a square plate-shaped structure, and the 4 suction blocks 31 may respectively fix 4 corners of the mask plate 50, so that the mask plate 50 is more stable when being sucked, and the mask plate 50 may be prevented from sliding relative to the suction units 30 during movement. Furthermore, the bottom of each flexible connector 20 is located on the same horizontal plane, and the bottom of each adsorption unit 30 (or adsorption block 31) is located on the same horizontal plane, so that the adsorption surface of the adsorption block 31 can be attached to the mask plate 50 as much as possible;
and a vacuum unit connected to each of the adsorption units 30 to vacuum-adsorb the mask plate 50. Specifically, as shown in fig. 6 and 7, in this embodiment, the vacuum unit includes a suction pump (not shown) and two independent gas pipelines (a first gas pipeline 41a and a second gas pipeline 41b), each of the adsorption blocks 31 has two independent adsorption cavities (a first adsorption cavity 311a and a second adsorption cavity 311b), the first gas pipeline 41a and the second gas pipeline 41b are installed on the support unit 10, the support unit 10 is provided with a main gas pipe joint 42, the suction pump is communicated with the first gas pipeline 41a and the second gas pipeline 41b through the main gas pipe joint 42, the first gas pipeline 41a is communicated with the first adsorption cavity 311a in each of the adsorption blocks 31 through a first vacuum interface 43a, the second gas pipeline 41b is communicated with the second adsorption cavity 311b in each of the adsorption blocks 31 through a second vacuum interface 43b, so as to form two independent vacuum channels, vacuum adsorption to the mask plate 50 is realized, the two vacuum channels do not interfere with each other, and the risk that the mask plate 50 falls off due to air leakage or failure of one vacuum channel is prevented.
As shown in fig. 7, the adsorption unit 30 further includes an adsorption contact block 32, the adsorption contact block 32 is adhered to the bottom of the adsorption block 31 and is used for directly contacting with the mask plate 50, in this embodiment, the adsorption contact block 32 is made of an anti-static material, such as peek (esd) material, which has a static electricity dissipation effect, static electricity generated when the adsorption unit 30 adsorbs the mask plate 50 can be transmitted to the support unit 10 through the adsorption contact block 32 and then transmitted to a ground line on the support unit 10, so as to lead out the static electricity, and effectively prevent the static electricity from damaging the mask plate 50. It is understood that the suction contact block 32 also has two independent suction holes (a first suction hole 321a and a second suction hole 321b), and the first suction hole 321a and the second suction hole 321b are respectively communicated with the first suction cavity 311a and the second suction cavity 311b for sucking the mask plate 50.
Further, as shown in fig. 5, when the flexible adsorption device provided by this embodiment adsorbs the mask plate 50, position self-adaptation of the adsorption mask plate in Rx and Ry directions can be realized, flexible contact and adsorption can be realized for the mask plate 50 placed at a certain small inclination angle, rigid contact is effectively avoided, an effect of protecting the mask plate 50 is played, and the adsorption surface is ensured to be completely attached to the mask plate 50. Optionally, the rigidity ratio of the mask plate 50 to the flexible connectors 20 is K, the ratio of the coplanarity of the bottoms of the 4 flexible connectors 20 to the deformation of the mask plate 50 is G, in this embodiment, K is greater than or equal to G, so as to greatly reduce the deformation of the mask plate 50, and meanwhile, the damping coefficient generated by the X-direction grooves and the Y-direction grooves is greater than 1, so as to effectively suppress vibration of the adsorption unit 30 when contacting the mask plate 50.
Optionally, in order to obtain the dimensions of the X-direction groove 22 and the Y-direction groove 23, when the X-direction groove 22 and the Y-direction groove 23 are in an "L" shape as shown in fig. 1, the following calculation is performed:
when the flatness of the adsorption surface of the flexible unit relative to the surface of the mask plate 50 is large, under the action of the adsorption force, 4 flexible connectors 20 and the mask plate 50 can be subjected to a torsional moment to generate torsional deformation, and the deformation amount of the two flexible connectors 20 and the mask plate 50 is determined by the torsional rigidity ratio thereof, namely the rigidity ratio K of the mask plate 50 to the flexible connectors 20 is the torsional rigidity ratio K thereofr/κm:
Wherein, as shown in FIGS. 2-4, BrThe length of the mask plate; erThe elastic modulus of the mask plate (the mask plate material is quartz); t is trIs the thickness of the mask plate; l isrHalf the width of the mask plate; b ismThe length dimension of the extension groove along the Z direction; emIs the modulus of elasticity of the adsorption unit; t is tmThe gap width of the X-direction groove (or the gap width of the Y-direction groove, wherein the gap widths of the X-direction groove and the Y-direction groove are equal by default); l ismThe length dimension of the Y-direction groove along the X direction (the length dimension of the flexible connecting piece along the X direction).
After the rigidity ratio K of the mask plate 50 to the flexible connectors 20 is obtained, the deformation of the mask plate 50 at the moment can be determined according to the rigidity ratio K which is larger than or equal to G and the flatness values of 4 flexible connectors 20, the deformation of the mask plate 50 caused by the dead weight is obtained through statics analysis, and the total deformation of the mask plate 50 can be obtained by combining the sum of the rigidity ratio K and the flatness value. Through the trial and error, it can be calculated that when the length dimension of X to recess 22 along Y to be greater than 0mm and be less than or equal to 8mm, Y to recess 23 along X to be greater than 0mm and be less than or equal to 8mm, the length dimension of extension groove along Z to be greater than 0mm and be less than or equal to 7mm, X to recess 22 with Y to recess 23 the gap width all be greater than 0mm and be less than or equal to 0.1mm, can reach the great deformation volume purpose that reduces the mask plate of amplitude, and at this moment under different impact frequency, X to recess 22 with the damping coefficient that Y produced to recess 23 jointly is greater than 1 in the whole vibration cycle, can satisfy the operation requirement.
Based on this, this embodiment also provides a lithography system, lithography system adopts flexible adsorption equipment carries out handing-over and the transmission of mask plate, can reduce the deflection of mask plate, and the handing-over precision is higher.
In summary, in the flexible connector, the flexible adsorption device and the lithography system provided in the embodiments of the present invention, the plurality of adsorption units are connected to the support unit through the flexible connector, and the bottom of each flexible connector is located on the same horizontal plane, and the bottom of each adsorption unit is located on the same horizontal plane, and the vacuum unit is connected to each adsorption unit to achieve vacuum adsorption of the mask plate, because the flexible connector includes the connector body and the X-direction groove and the Y-direction groove provided on the connector body, the connector body can deform when adsorbing the mask plate, so as to achieve adaptive adjustment in the Rx and Ry directions, ensure complete adhesion of the bottom of the adsorption unit to the surface of the mask plate, reduce the deformation of the mask plate, thereby improving the handover accuracy, and effectively avoiding rigid contact between the adsorption unit and the mask plate, the function of protecting the mask plate is achieved.
The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. A flexible connecting piece is characterized by comprising a connecting piece body, and an X-direction groove and a Y-direction groove which are arranged on the connecting piece body, wherein the X-direction groove cuts the connecting piece body along the X direction and extends into the connecting piece body;
the flexible connecting piece is applied to a flexible adsorption device for adsorbing a mask plate, the damping coefficient generated by the X-direction groove and the Y-direction groove is larger than 1, the rigidity ratio of the mask plate to the flexible connecting piece is K, the ratio of the coplanarity of one surface of the flexible connecting piece, which is connected with adsorption units in the flexible adsorption device, to the deformation of the mask plate is G, and K is larger than or equal to G.
2. The flexible connection unit of claim 1 wherein said X-direction grooves and said Y-direction grooves are two in number, two of said X-direction grooves being symmetrically disposed along said body central axis of said connection unit body, and two of said Y-direction grooves being symmetrically disposed along said body central axis of said connection unit body.
3. The flexible connection unit of claim 1 wherein said X-direction groove and said Y-direction groove each have a gap width greater than 0mm and less than or equal to 0.1 mm.
4. The flexible connection unit according to claim 1 or 2, wherein both ends of said connection unit body in the Z direction are provided with mounting holes.
5. The utility model provides a flexible adsorption equipment for adsorb mask plate, its characterized in that includes:
a support unit;
a plurality of adsorption units, each adsorption unit is connected with the support unit through a flexible connector according to any one of claims 1-4, one side of each flexible connector, which is connected with the adsorption unit, is positioned on the same horizontal plane, and one side of each adsorption unit, which is used for adsorbing the mask plate, is positioned on the same horizontal plane;
and the vacuum units are connected with each adsorption unit to realize vacuum adsorption on the mask plate.
6. The flexible adsorption device of claim 5, wherein the adsorption unit comprises an adsorption block and an adsorption contact block disposed on a surface of the adsorption block away from the flexible connection member, the adsorption block has an adsorption cavity formed therein, the adsorption contact block has an adsorption hole formed therein and communicated with the adsorption cavity, and the vacuum unit is communicated with the adsorption cavity.
7. The flexible adsorbent device of claim 6 in which said adsorbent contact block is made of an antistatic material.
8. The flexible adsorption device of claim 6, wherein said vacuum unit comprises a suction pump and a gas pipe, said suction pump is communicated with the adsorption cavity in each of said adsorption blocks through said gas pipe to make said adsorption cavity form vacuum.
9. The flexible adsorption device of claim 8, wherein each adsorption block has two adsorption cavities therein, and the vacuum unit has two gas conduits, and the two gas conduits are respectively in communication with the two adsorption cavities in each adsorption block to form two independent vacuum channels.
10. A lithography system comprising a flexible adsorption device according to any one of claims 5 to 9.
Priority Applications (2)
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CN201910223890.5A CN111722476B (en) | 2019-03-22 | 2019-03-22 | Flexible connecting piece, flexible adsorption device and photoetching system |
TW109108649A TWI733374B (en) | 2019-03-22 | 2020-03-16 | Flexible connector, flexible adsorption device and photoetching system |
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CN201910223890.5A CN111722476B (en) | 2019-03-22 | 2019-03-22 | Flexible connecting piece, flexible adsorption device and photoetching system |
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CN111722476B true CN111722476B (en) | 2022-04-26 |
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JP3244894B2 (en) * | 1993-11-30 | 2002-01-07 | キヤノン株式会社 | Mask holding method, mask and mask chuck, and exposure apparatus and device manufacturing method using the same |
JP2008021995A (en) * | 2006-07-12 | 2008-01-31 | Asml Holding Nv | Lithographic apparatus and device manufacturing method |
CN101382739A (en) * | 2008-10-27 | 2009-03-11 | 上海微电子装备有限公司 | Mini platform device |
CN105467544A (en) * | 2015-12-21 | 2016-04-06 | 中国科学院长春光学精密机械与物理研究所 | Multi-point flexible supporting device used for high-precision optical component |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2009125867A1 (en) * | 2008-04-11 | 2009-10-15 | 株式会社ニコン | Stage device, exposure apparatus, and method for manufacturing device |
CN102540400B (en) * | 2012-02-29 | 2013-09-25 | 中国科学院西安光学精密机械研究所 | Flexible support device for primary mirror |
WO2014013733A1 (en) * | 2012-07-18 | 2014-01-23 | 株式会社ニコン | Supporting apparatus, movable body apparatus, exposure apparatus, and device manufacturing method |
US10090188B2 (en) * | 2016-05-05 | 2018-10-02 | Applied Materials, Inc. | Robot subassemblies, end effector assemblies, and methods with reduced cracking |
-
2019
- 2019-03-22 CN CN201910223890.5A patent/CN111722476B/en active Active
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2020
- 2020-03-16 TW TW109108649A patent/TWI733374B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3244894B2 (en) * | 1993-11-30 | 2002-01-07 | キヤノン株式会社 | Mask holding method, mask and mask chuck, and exposure apparatus and device manufacturing method using the same |
JP2008021995A (en) * | 2006-07-12 | 2008-01-31 | Asml Holding Nv | Lithographic apparatus and device manufacturing method |
CN101382739A (en) * | 2008-10-27 | 2009-03-11 | 上海微电子装备有限公司 | Mini platform device |
CN105467544A (en) * | 2015-12-21 | 2016-04-06 | 中国科学院长春光学精密机械与物理研究所 | Multi-point flexible supporting device used for high-precision optical component |
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TW202102947A (en) | 2021-01-16 |
CN111722476A (en) | 2020-09-29 |
TWI733374B (en) | 2021-07-11 |
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