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CN110176410B - Processing device - Google Patents

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CN110176410B
CN110176410B CN201910117577.3A CN201910117577A CN110176410B CN 110176410 B CN110176410 B CN 110176410B CN 201910117577 A CN201910117577 A CN 201910117577A CN 110176410 B CN110176410 B CN 110176410B
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unit
processing
groove
movable
reference line
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CN110176410A (en
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宫田谕
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Disco Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

提供加工装置,不会弄错间隔道的偏移校正和包含切削槽、分割槽在内的加工槽的偏移校正。加工装置(12)至少具有保持单元(14)、加工单元(16)、X轴进给单元、Y轴进给单元、拍摄单元(18)以及显示单元(20)。在显示单元(20)上显示有图像显示部(38)、间隔道校正按钮(40)、加工槽校正按钮(42)、Y轴动作部(46)、一对可动线(48)以及可动线动作部(50)。当在一对可动线(48)的间隔未被设定成识别为间隔道(4)的宽度的间隔的情况下触摸间隔道校正按钮(40)时,报知错误。当在一对可动线(48)的间隔未被设定成识别为加工槽(54)的宽度的间隔的情况下触摸加工槽校正按钮(42)时,报知错误。

Provides a processing device that does not make mistakes in the offset correction of the interval track and the offset correction of the machining groove including the cutting groove and the dividing groove. The processing device (12) has at least a holding unit (14), a processing unit (16), an X-axis feed unit, a Y-axis feed unit, an imaging unit (18), and a display unit (20). Displayed on the display unit (20) are an image display portion (38), an interval track correction button (40), a machining groove correction button (42), a Y-axis action portion (46), a pair of movable lines (48) and a movable A moving line action part (50). When the distance between the pair of movable lines (48) is not set to the distance recognized as the width of the distance lane (4), when the distance correction button (40) is touched, an error is reported. When the machining tank correction button (42) is touched when the distance between the pair of movable lines (48) is not set to be recognized as the width of the machining tank (54), an error is reported.

Description

加工装置Processing device

技术领域technical field

本发明涉及加工装置,该加工装置形成将通过间隔道划分而在正面上形成有多个器件的晶片分割成各个器件的加工槽。The present invention relates to a processing device that forms processing slots for dividing a wafer having a plurality of devices formed on the front surface divided by lanes into individual devices.

背景技术Background technique

通过间隔道(分割预定线)划分而在正面上形成有IC、LSI等器件的晶片通过切削装置对间隔道进行切削而分割成各个器件,分割得到的各器件被用于移动电话、个人计算机等电子设备。A wafer divided by streets (segmentation planning lines) and formed with devices such as ICs and LSIs on the front surface is cut by a cutting device on the streets to be divided into individual devices, and the divided devices are used in mobile phones, personal computers, etc. Electronic equipment.

切削装置至少具有:保持单元,其对晶片进行保持;切削单元,其具有对保持单元所保持的晶片的间隔道进行切削的切削刀具并且该切削刀具能够旋转;X轴进给单元,其使保持单元和切削单元在X轴方向上相对地进行切削进给;Y轴进给单元,其使保持单元和切削单元在与X轴方向垂直的Y轴方向上相对地进行分度进给;拍摄单元,其具备具有基准线的显微镜,该显微镜对保持单元所保持的晶片进行拍摄,从而检测间隔道和切削槽;以及显示单元,该切削装置能够高精度地对晶片的间隔道进行切削(例如,参照专利文献1)。The cutting device has at least: a holding unit, which holds the wafer; a cutting unit, which has a cutting tool capable of cutting the interval lanes of the wafer held by the holding unit; and an X-axis feed unit, which makes the holding unit The unit and the cutting unit perform cutting feed relatively in the X-axis direction; the Y-axis feed unit makes the holding unit and the cutting unit perform index feed relatively in the Y-axis direction perpendicular to the X-axis direction; the photographing unit , which is equipped with a microscope with a reference line, the microscope photographs the wafer held by the holding unit, thereby detecting the spacer and the cutting groove; and a display unit, the cutting device can cut the spacer of the wafer with high precision (for example, Refer to Patent Document 1).

即,在显示单元上显示有:图像显示部,其显示拍摄单元所拍摄的图像;间隔道校正按钮,其用于将间隔道与基准线的偏移量作为校正值来进行存储;切削槽校正按钮,其用于将切削槽与基准线的偏移量作为校正值来进行存储;X轴动作部,使X轴进给单元进行动作;Y轴动作部,其使Y轴进给单元进行动作;一对可动线,它们隔着基准线保持线对称,与基准线接近和远离;以及可动线动作部,其使一对可动线进行动作,当在使Y轴动作部动作而将间隔道的中央定位于基准线并且将一对可动线的间隔定位成间隔道的宽度的情况下触摸间隔道校正按钮时,将间隔道的移动距离存储为Y轴方向的校正值并在下一个间隔道的分度进给中进行校正,以使得基准线与间隔道的中央一致。That is, displayed on the display unit are: an image display section, which displays an image captured by the photographing unit; a gap correction button, which is used to store the offset between the gap and the reference line as a correction value; The button is used to store the offset between the cutting groove and the reference line as a correction value; the X-axis operation part is used to operate the X-axis feed unit; the Y-axis operation part is used to operate the Y-axis feed unit ; a pair of movable wires, which maintain line symmetry across the reference line, and approach and distance from the reference line; When the center of the interval lane is positioned on the reference line and the interval between a pair of movable lines is positioned as the width of the interval lane, when the interval lane correction button is touched, the movement distance of the interval lane is stored as a correction value in the Y-axis direction and is displayed on the next Calibration is performed in the index feed of the interval so that the reference line coincides with the center of the interval.

另外,当在使Y轴动作部动作而将切削槽的中央定位于基准线并且将一对可动线的间隔定位成切削槽的宽度的情况下触摸切削槽校正按钮时,将切削槽的Y轴方向的移动距离存储为Y轴方向的校正值并在下一个间隔道的分度进给中进行校正,以使得基准线与切削槽的中央一致,并且在间隔道的中央形成切削槽。In addition, when the Y-axis operating part is operated to position the center of the cut groove on the reference line and the distance between a pair of movable lines is positioned to the width of the cut groove, when the cut groove correction button is touched, the Y axis of the cut groove is adjusted. The moving distance in the axial direction is stored as a correction value in the Y-axis direction and corrected in the index feed of the next track so that the reference line coincides with the center of the cutting groove and the cutting groove is formed in the center of the track.

专利文献1:日本特开2014-113669号公报Patent Document 1: Japanese Patent Laid-Open No. 2014-113669

但是,存在如下的问题:当在使Y轴动作部动作而将间隔道的中央定位于基准线并且将一对可动线的间隔定位成间隔道的宽度的情况下触摸切削槽校正按钮时,会将间隔道的校正值存储为切削槽的校正值,从而无法进行高精度的分度进给,无法高精度地对间隔道进行切削。However, there is a problem that when the cut groove correction button is touched while the center of the lane is positioned on the reference line and the distance between the pair of movable lines is set to the width of the lane by operating the Y-axis operating unit, The correction value of the interval track is stored as the correction value of the cutting groove, so high-precision index feeding cannot be performed, and the interval track cannot be cut with high precision.

另外,存在如下的问题:当在使Y轴动作部动作而将切削槽的中央定位于基准线并且将一对可动线的间隔定位成切削槽的宽度的情况下触摸间隔道校正按钮时,会将切削槽的校正值存储为间隔道的校正值,从而无法高精度地对间隔道的中央进行切削。In addition, there is a problem that when the gap correction button is touched while the center of the cutting groove is positioned on the reference line and the distance between a pair of movable lines is set to the width of the cutting groove by operating the Y-axis operating unit, The correction value of the cutting groove is stored as the correction value of the spacer, so the center of the spacer cannot be cut with high precision.

上述的问题在对间隔道照射激光光线而形成分割槽的激光加工装置中也会发生。The above-mentioned problems also occur in a laser processing apparatus that forms division grooves by irradiating laser beams to the lanes.

发明内容Contents of the invention

鉴于上述事实而完成的本发明的课题在于提供加工装置,不会弄错间隔道的偏移校正和包含切削槽、分割槽在内的加工槽的偏移校正。The subject of this invention made|formed in view of the above-mentioned fact is to provide a processing apparatus which does not make a mistake|misalignment correction of the offset of a spacer, and the offset correction of the processing groove|channel including a cutting groove and a division|segmentation groove.

为了解决上述课题,本发明提供以下的加工装置。即,该加工装置形成将通过间隔道划分而在正面上形成有多个器件的晶片分割成各个器件的加工槽,其中,该加工装置至少具有:保持单元,其对晶片进行保持;加工单元,其在该保持单元所保持的晶片的间隔道形成加工槽;X轴进给单元,其使该保持单元和该加工单元在X轴方向上相对地进行加工进给;Y轴进给单元,其使该保持单元和该加工单元在与X轴方向垂直的Y轴方向上相对地进行分度进给;拍摄单元,其具备具有基准线的显微镜,该显微镜对该保持单元所保持的晶片进行拍摄,从而检测间隔道和加工槽;以及显示单元,在该显示单元上显示有:图像显示部,其显示该拍摄单元所拍摄的图像;间隔道校正按钮,其用于将间隔道与该基准线的偏移量作为校正值来进行存储;加工槽校正按钮,其用于将加工槽与该基准线的偏移量作为校正值来进行存储;Y轴动作部,其使该Y轴进给单元进行动作;一对可动线,它们隔着该基准线保持线对称,与该基准线接近和远离;以及可动线动作部,其使该一对可动线进行动作,当在该一对可动线的间隔未被设定成识别为间隔道的宽度的间隔的情况下触摸该间隔道校正按钮时,报知错误,当在该一对可动线的间隔未被设定成识别为加工槽的宽度的间隔的情况下触摸该加工槽校正按钮时,报知错误。In order to solve the above-mentioned problems, the present invention provides the following processing apparatus. That is, the processing device forms a processing slot for dividing a wafer having a plurality of devices formed on the front surface by dividing by the spacer into individual devices, wherein the processing device at least has: a holding unit that holds the wafer; a processing unit that It forms processing grooves at intervals of the wafers held by the holding unit; the X-axis feeding unit makes the holding unit and the processing unit relatively perform processing feeding in the X-axis direction; the Y-axis feeding unit, which The holding unit and the processing unit are indexed and fed relative to each other in the Y-axis direction perpendicular to the X-axis direction; the photographing unit is provided with a microscope with a reference line, and the microscope photographs the wafer held by the holding unit , so as to detect the interval road and the processing groove; and the display unit, which is displayed on the display unit: an image display part, which displays the image taken by the shooting unit; an interval road correction button, which is used to align the interval road with the reference line The offset of the processing groove is stored as a correction value; the processing groove correction button is used to store the offset between the processing groove and the reference line as a correction value; the Y-axis action part makes the Y-axis feed unit action; a pair of movable wires, which maintain line symmetry across the reference line, approach and distance from the reference line; and a movable wire action part, which makes the pair of movable wires move, When the gap between the movable lines is not set to be recognized as the gap of the width of the gap, when the gap correction button is touched, an error is reported. When the gap between the pair of movable lines is not set to be recognized as When the gap between the width of the machining groove is touched, an error will be reported when the machining groove correction button is touched.

优选为,当在使该Y轴动作部进行动作而使显示于该图像显示部的间隔道的位置移动至该基准线并且使该可动线动作部进行动作而使该一对可动线与间隔道的宽度一致的情况下触摸该间隔道校正按钮时,将间隔道的移动距离作为间隔道的校正值来进行存储,当在使该Y轴动作部进行动作而使显示于该图像显示部的加工槽的位置移动至该基准线并且使该可动线动作部进行动作而使该一对可动线与加工槽的宽度一致的情况下触摸该加工槽校正按钮时,将加工槽的移动距离作为加工槽的校正值来进行存储。优选为,该加工单元是具有切削刀具的切削单元并且该切削刀具能够旋转,该加工槽是切削槽。Preferably, the pair of movable lines and the pair of movable lines and When the gap correction button is touched when the width of the gap is the same, the moving distance of the gap is stored as a correction value of the gap, and when the Y-axis operation part is operated to display on the image display part When the position of the processing tank is moved to the reference line and the movable line action part is operated to make the pair of movable lines coincide with the width of the processing tank, when the processing tank correction button is touched, the movement of the processing tank The distance is stored as a correction value for machining grooves. Preferably, the machining unit is a cutting unit with a cutting tool and the cutting tool is rotatable, and the machining groove is a cutting groove.

本发明所提供的加工装置至少具有:保持单元,其对晶片进行保持;加工单元,其在该保持单元所保持的晶片的间隔道形成加工槽;X轴进给单元,其使该保持单元和该加工单元在X轴方向上相对地进行加工进给;Y轴进给单元,其使该保持单元和该加工单元在与X轴方向垂直的Y轴方向上相对地进行分度进给;拍摄单元,其具备具有基准线的显微镜,该显微镜对该保持单元所保持的晶片进行拍摄,从而检测间隔道和加工槽;以及显示单元,在该显示单元上显示有:图像显示部,其显示该拍摄单元所拍摄的图像;间隔道校正按钮,其用于将间隔道与该基准线的偏移量作为校正值来进行存储;加工槽校正按钮,其用于将加工槽与该基准线的偏移量作为校正值来进行存储;Y轴动作部,其使该Y轴进给单元动作;一对可动线,它们隔着该基准线保持线对称,与该基准线接近和远离;以及可动线动作部,其使该一对可动线动作,当在该一对可动线的间隔未被设定成识别为间隔道的宽度的情况下触摸该间隔道校正按钮时,报知错误,当在该一对可动线的间隔未被设定成识别为加工槽的宽度的间隔的情况下触摸该加工槽校正按钮时,报知错误,因此,不会将间隔道与基准线的偏移量作为加工槽的校正值来进行存储,并且不会将加工槽与基准线的偏移量作为间隔道的校正值来进行存储,能够高精度地进行分度进给而在间隔道形成高精度的加工槽。The processing device provided by the present invention at least has: a holding unit, which holds the wafer; a processing unit, which forms a processing groove at the interval of the wafer held by the holding unit; an X-axis feed unit, which makes the holding unit and The processing unit performs processing feed relatively in the X-axis direction; the Y-axis feed unit makes the holding unit and the processing unit perform indexing feed relatively in the Y-axis direction perpendicular to the X-axis direction; photographing A unit, which has a microscope with a reference line, the microscope photographs the wafer held by the holding unit, thereby detecting the spacer and the processing groove; The image taken by the shooting unit; the interval track correction button, which is used to store the offset between the interval track and the reference line as a correction value; The amount of movement is stored as a correction value; the Y-axis action unit moves the Y-axis feed unit; a pair of movable wires maintains line symmetry across the reference line, approaches and moves away from the reference line; and The moving line action unit moves the pair of movable lines, and when the gap correction button is touched when the gap between the pair of movable lines is not set to be recognized as the width of the gap, an error is reported. , when the gap between the pair of movable lines is not set to be recognized as the gap of the width of the processing groove, when the processing groove correction button is touched, an error will be reported, so the distance between the interval track and the reference line will not be The offset is stored as the correction value of the machining groove, and the offset between the machining groove and the reference line is not stored as the correction value of the interval track, and it is possible to perform index feeding with high precision and form in the interval lane High-precision processing slots.

附图说明Description of drawings

图1是晶片的立体图。FIG. 1 is a perspective view of a wafer.

图2是根据本发明而构成的加工装置的立体图。Fig. 2 is a perspective view of a processing device constructed according to the present invention.

图3是进行校正时的拍摄单元和晶片的立体图。Fig. 3 is a perspective view of an imaging unit and a wafer during calibration.

图4是显示于图2所示的显示单元的图像的示意图。FIG. 4 is a schematic diagram of an image displayed on the display unit shown in FIG. 2 .

图5是进行校正之前的图像的示意图。Fig. 5 is a schematic diagram of an image before correction.

图6是从图5所示的状态起使间隔道的位置移动至基准线的状态下的图像的示意图。FIG. 6 is a schematic diagram of an image in a state where the position of the lane is moved to the reference line from the state shown in FIG. 5 .

图7是从图6所示的状态起使一对可动线与间隔道的宽度一致的状态下的图像的示意图。FIG. 7 is a schematic diagram of an image in a state where a pair of movable wires are made to match the width of a spacer track from the state shown in FIG. 6 .

图8是从图7所示的状态起使加工槽的位置移动至基准线的状态下的图像的示意图。Fig. 8 is a schematic diagram of an image in a state where the position of the processing tank has been moved to the reference line from the state shown in Fig. 7 .

图9是从图8所示的状态起使一对可动线与加工槽的宽度一致的状态下的图像的示意图。Fig. 9 is a schematic diagram of an image in a state where a pair of movable wires are made to match the width of a processing groove from the state shown in Fig. 8 .

标号说明Label description

2:晶片;4:间隔道;12:切削装置(加工装置);14:保持单元;16:切削单元(加工单元);18:拍摄单元;20:显示单元;34:切削刀具;36:显微镜;38:图像显示部;40:间隔道校正按钮;42:加工槽校正按钮;46:Y轴动作部;48:可动线;50:可动线动作部;54:切削槽(加工槽);L:基准线。2: wafer; 4: spacer; 12: cutting device (processing device); 14: holding unit; 16: cutting unit (processing unit); 18: photographing unit; 20: display unit; 34: cutting tool; 36: microscope ;38: Image display section; 40: Interval track correction button; 42: Processing slot correction button; 46: Y-axis action section; 48: Movable line; 50: Movable line action section; 54: Cutting slot (processing slot) ; L: baseline.

具体实施方式Detailed ways

以下,参照附图对根据本发明而构成的加工装置的实施方式进行说明。Hereinafter, an embodiment of a processing apparatus configured according to the present invention will be described with reference to the drawings.

在图1中示出了能够通过根据本发明而构成的加工装置实施加工的圆盘状的晶片2。该晶片2的正面2a通过呈格子状形成的多个间隔道4划分成多个矩形区域,在多个矩形区域中分别形成有IC、LSI等多个器件6。图示的实施方式中的晶片2粘贴于周缘固定在环状框架8的粘接带10上。FIG. 1 shows a disk-shaped wafer 2 that can be processed by a processing device configured according to the present invention. The front surface 2a of the wafer 2 is divided into a plurality of rectangular areas by a plurality of partitions 4 formed in a lattice shape, and a plurality of devices 6 such as ICs and LSIs are formed in the plurality of rectangular areas. In the illustrated embodiment, the wafer 2 is stuck on the adhesive tape 10 whose peripheral edge is fixed to the ring frame 8 .

图2所示的切削装置12是根据本发明而构成的加工装置的一例,该切削装置12至少具有:保持单元14,其对晶片2进行保持;作为加工单元的切削单元16,其在保持单元14所保持的晶片2的间隔道4形成加工槽;X轴进给单元(未图示),其使保持单元14和切削单元16在X轴方向(图1中箭头X所示的方向)上相对地进行加工进给;Y轴进给单元(未图示),其使保持单元14和切削单元16在与X轴方向垂直的Y轴方向(图1中箭头Y所示的方向)上相对地进行分度进给;拍摄单元18;以及显示单元20。另外,由X轴方向和Y轴方向所限定的平面实质上是水平的。另外,图1中箭头Z所示的Z轴方向是与X轴方向和Y轴方向垂直的上下方向。Cutting device 12 shown in Fig. 2 is an example of the processing device that constitutes according to the present invention, and this cutting device 12 has at least: holding unit 14, and it holds wafer 2; The spacer 4 of the wafer 2 held by 14 forms a processing groove; the X-axis feed unit (not shown), which makes the holding unit 14 and the cutting unit 16 in the X-axis direction (direction shown by arrow X in FIG. 1 ) Machining feed is carried out relatively; Y-axis feed unit (not shown), which makes the holding unit 14 and the cutting unit 16 face each other in the Y-axis direction (direction shown by arrow Y in FIG. 1 ) perpendicular to the X-axis direction Carry out index feeding; photographing unit 18; and display unit 20. In addition, the plane defined by the X-axis direction and the Y-axis direction is substantially horizontal. In addition, the Z-axis direction indicated by the arrow Z in FIG. 1 is an up-down direction perpendicular to the X-axis direction and the Y-axis direction.

保持单元14包含圆形状的卡盘工作台24,该卡盘工作台24以旋转自如且在X轴方向上移动自如的方式安装于装置壳体22。该卡盘工作台24通过内置于装置壳体22的卡盘工作台用电动机(未图示)以沿Z轴方向延伸的轴线为中心进行旋转。图示的实施方式中的上述X轴进给单元包含:滚珠丝杠(未图示),其与卡盘工作台24连结,沿X轴方向延伸;以及电动机(未图示),其使该滚珠丝杠旋转,上述X轴进给单元使卡盘工作台24相对于切削单元16在X轴方向上相对地进行加工进给。在卡盘工作台24的上端部分配置有与吸引单元(未图示)连接的多孔质的圆形状吸附卡盘26,在卡盘工作台24中,利用吸引单元在吸附卡盘26上生成吸引力,从而对载置于上表面的晶片2进行吸引保持。另外,在卡盘工作台24的周缘,在周向上隔开间隔地配置有用于固定环状框架8的多个夹具28。The holding unit 14 includes a circular chuck table 24 , and the chuck table 24 is attached to the device case 22 so as to be rotatable and movable in the X-axis direction. The chuck table 24 is rotated around an axis extending in the Z-axis direction by a chuck table motor (not shown) built in the device case 22 . The above-mentioned X-axis feed unit in the illustrated embodiment includes: a ball screw (not shown), which is connected to the chuck table 24 and extends in the X-axis direction; and a motor (not shown), which makes the The ball screw rotates, and the X-axis feed unit causes the chuck table 24 to perform processing feed in the X-axis direction relative to the cutting unit 16 . A porous circular suction chuck 26 connected to a suction unit (not shown) is disposed on the upper end portion of the chuck workbench 24. In the chuck workbench 24, suction is generated on the suction chuck 26 by the suction unit. force, thereby attracting and holding the wafer 2 placed on the upper surface. In addition, a plurality of jigs 28 for fixing the ring frame 8 are arranged at intervals in the circumferential direction on the peripheral edge of the chuck table 24 .

切削单元16包含:主轴壳体30,其以在Y轴方向上移动自如且在Z轴方向上移动自如(升降自如)的方式支承于装置壳体22;主轴32,其按照能够以Y轴方向为轴心进行旋转的方式支承于主轴壳体30;电动机(未图示),其使主轴32进行旋转;以及切削刀具34,其固定于主轴32的前端。这样,作为在晶片2的间隔道4形成加工槽的加工单元的切削单元16具有切削刀具34并且该切削刀具34能够旋转,在图示的实施方式中,形成于晶片2的加工槽是通过切削刀具34形成的切削槽。上述Y轴进给单元包含:滚珠丝杠(未图示),其与主轴壳体30连结,沿Y轴方向延伸;以及电动机(未图示),其使该滚珠丝杠旋转,上述Y轴进给单元使主轴壳体30相对于保持单元14在Y轴方向上相对地进行分度进给。另外,主轴壳体30通过Z轴进给单元在Z轴方向上进行切入进给(升降),该Z轴进给单元可以包含:滚珠丝杠(未图示),其沿Z轴方向延伸;以及电动机(未图示),其使该滚珠丝杠旋转。The cutting unit 16 includes: a spindle housing 30 supported on the device housing 22 in a manner that can move freely in the Y-axis direction and in the Z-axis direction (lifting freely); and a spindle 32 that can move in the Y-axis direction The spindle housing 30 is supported to rotate about its axis; a motor (not shown) rotates the spindle 32 ; and a cutting tool 34 is fixed to the front end of the spindle 32 . In this way, the cutting unit 16 as a machining unit for forming machining grooves in the streets 4 of the wafer 2 has a cutting tool 34 and the cutting knife 34 is rotatable. In the illustrated embodiment, the machining grooves formed in the wafer 2 are formed by cutting Cutting flutes formed by cutter 34 . The above-mentioned Y-axis feed unit includes: a ball screw (not shown), which is connected to the main shaft housing 30, and extends along the Y-axis direction; and a motor (not shown), which rotates the ball screw, and the above-mentioned Y-axis The feeding unit makes the spindle housing 30 index-feed relative to the holding unit 14 in the Y-axis direction. In addition, the spindle housing 30 is fed (lifted) in the Z-axis direction through the Z-axis feed unit, and the Z-axis feed unit may include: a ball screw (not shown), which extends along the Z-axis direction; and an electric motor (not shown), which rotates the ball screw.

如图2所示,拍摄单元18设置于卡盘工作台24的移动路径的上方。参照图3和图4进行说明,拍摄单元18具备具有基准线L的显微镜36,该显微镜36对保持单元14所保持的晶片2进行拍摄,从而检测间隔道4和加工槽(在图示的实施方式中为切削槽)(参照图4)。沿X轴方向延伸的基准线L形成于显微镜36的透镜或CCD等拍摄元件(未图示)。另外,显微镜36被支承于主轴壳体30,与主轴壳体30一起通过Y轴进给单元在Y轴方向上移动,且通过Z轴进给单元在Z轴方向上移动。As shown in FIG. 2 , the photographing unit 18 is disposed above the moving path of the chuck table 24 . 3 and 4, the photographing unit 18 is provided with a microscope 36 having a reference line L, and the microscope 36 photographs the wafer 2 held by the holding unit 14 to detect the spacer 4 and the processing groove (in the illustrated embodiment). In the way, it is cutting groove) (refer to Figure 4). A reference line L extending in the X-axis direction is formed on a lens of the microscope 36 or an imaging element (not shown) such as a CCD. In addition, the microscope 36 is supported by the spindle housing 30 , moves in the Y-axis direction by the Y-axis feed unit together with the spindle housing 30 , and moves in the Z-axis direction by the Z-axis feed unit.

图示的实施方式中的显示单元20由设置于装置壳体22的前表面上部的触摸面板构成。如图4所示,在显示单元20上显示有:图像显示部38,其显示拍摄单元18所拍摄的图像;间隔道校正按钮40,其用于将间隔道4与基准线L的偏移量作为校正值来进行存储;加工槽校正按钮42,其用于将加工槽与基准线L的偏移量作为校正值来进行存储;X轴动作部44,使X轴进给单元进行动作;Y轴动作部46,其使Y轴进给单元进行动作;一对可动线48,它们隔着基准线L保持线对称,与基准线L接近和远离;可动线动作部50,其使一对可动线48进行动作;以及校正值显示部52。The display unit 20 in the illustrated embodiment is constituted by a touch panel provided on the upper front surface of the device case 22 . As shown in Figure 4, on the display unit 20 are displayed: an image display part 38, which displays the image taken by the photographing unit 18; Store as a correction value; the processing groove correction button 42 is used to store the offset between the processing groove and the reference line L as a correction value; the X-axis action part 44 makes the X-axis feed unit operate; Y Axis operating part 46, which makes the Y-axis feed unit move; a pair of movable wires 48, which maintain line symmetry across the reference line L, approach and distance from the reference line L; movable wire operating part 50, which makes a Operate the movable wire 48; and the correction value display unit 52.

图像显示部38以横轴为X轴方向、纵轴为Y轴方向的方式显示拍摄单元18所拍摄的图像,将以基准线L为对称轴的线对称的一对可动线48与拍摄单元18的基准线L一起显示为与X轴方向平行。间隔道校正按钮40是用于将间隔道4与基准线L的偏移量作为校正值来存储于切削装置12的存储单元(未图示)的按钮,当在使Y轴动作部46进行动作而使显示于图像显示部38的间隔道4的位置移动至基准线L并且使可动线动作部50进行动作而使一对可动线48与间隔道4的宽度一致的情况下触摸间隔道校正按钮40时,将间隔道4的移动距离作为间隔道4的校正值来存储于上述存储单元。另外,加工槽校正按钮42是用于将加工槽与基准线L的偏移量作为校正值来存储于上述存储单元的按钮,当在使Y轴动作部46进行动作而使显示于图像显示部38的加工槽的位置移动至基准线L并且使可动线动作部50进行动作而使一对可动线48与加工槽的宽度一致的情况下触摸加工槽校正按钮42时,将加工槽的移动距离作为加工槽的校正值来存储于上述存储单元。并且,在图示的实施方式中,当在一对可动线48的间隔未被设定成识别为间隔道4的宽度(例如50μm~60μm)的间隔(例如45μm以上)的情况下触摸间隔道校正按钮40时,报知错误,当在一对可动线48的间隔未被设定成识别为加工槽的宽度(例如25μm~35μm)的间隔(例如小于45μm)的情况下触摸加工槽校正按钮42时,报知错误。因此,在将间隔道4与基准线L的偏移量作为校正值来进行存储时,即使作业员错误地触摸加工槽校正按钮42,也不会将间隔道4的校正值作为加工槽的校正值来存储于上述存储单元。另外,在将加工槽与基准线L的偏移量作为校正值来进行存储时,即使作业员错误地触摸间隔道校正按钮40,也不会将加工槽的校正值作为间隔道4的校正值来存储于上述存储单元。另外,作为错误的报知,可以举出显示单元20上的错误显示、警告灯(未图示)的熄灭或点亮、警告声的报知等。The image display part 38 displays the image captured by the imaging unit 18 with the horizontal axis being the X-axis direction and the vertical axis being the Y-axis direction. The reference lines L of 18 are shown together parallel to the X-axis direction. The gap correction button 40 is a button for storing the offset amount between the gap 4 and the reference line L as a correction value in a storage unit (not shown) of the cutting device 12. When the position of the lane 4 displayed on the image display unit 38 is moved to the reference line L and the movable line operating unit 50 is operated so that the width of the pair of movable lines 48 is consistent with the width of the lane 4, touch the lane. When the correction button 40 is pressed, the moving distance of the interval track 4 is stored in the storage unit as the correction value of the interval track 4 . In addition, the processing groove correction button 42 is a button for storing the deviation amount between the processing groove and the reference line L as a correction value in the above-mentioned storage unit, and when the Y-axis operation part 46 is operated to display it on the image display part When the position of the machining groove at 38 is moved to the reference line L and the movable wire actuating part 50 is operated to make the pair of movable wires 48 coincide with the width of the machining groove, when the processing groove correction button 42 is touched, the processing groove will be adjusted. The moving distance is stored in the storage means as a correction value of the machining tank. In addition, in the illustrated embodiment, when the distance between a pair of movable wires 48 is not set to be recognized as the distance (for example, 45 μm or more) of the width of the lane 4 (for example, 50 μm to 60 μm), touch the distance When the track correction button 40 is pressed, an error is reported. When the interval between a pair of movable lines 48 is not set to the interval (for example, less than 45 μm) recognized as the width of the processing groove (for example, 25 μm to 35 μm), the processing tank is touched. When the calibration button 42 is pressed, an error is reported. Therefore, when storing the offset amount between the lane 4 and the reference line L as a correction value, even if the operator touches the machining tank correction button 42 by mistake, the correction value of the lane 4 will not be used as the calibration of the machining tank. The value is stored in the above storage unit. In addition, when storing the offset amount between the machining tank and the reference line L as a correction value, even if the operator touches the lane correction button 40 by mistake, the correction value of the machining tank will not be used as the correction value of the lane 4 to be stored in the above storage unit. In addition, examples of an error notification include an error display on the display unit 20 , extinguishing or lighting of a warning lamp (not shown), notification of a warning sound, and the like.

X轴动作部44具有:右方向动作部44a,其使X轴进给单元动作而使拍摄单元18的拍摄区域向图4中的右方向移动;以及左方向动作部44b,其使X轴进给单元动作而使拍摄单元18的拍摄区域向图4中的左方向移动。另外,Y轴动作部46具有:上方向动作部46a,其使Y轴进给单元动作而使拍摄单元18向图4中的上方向移动;以及下方向动作部46b,其使Y轴进给单元动作而使拍摄单元18向图4中的下方向移动。另外,可动线动作部50具有:可动线接近部50a,其一边保持以基准线L为对称轴的线对称的关系,一边使一对可动线48朝向基准线L接近;以及可动线远离部50b,其一边保持以基准线L为对称轴的线对称的关系,一边使一对可动线48远离基准线L。The X-axis operation part 44 has: a right direction operation part 44a, which moves the X-axis feed unit to move the imaging area of the imaging unit 18 to the right in FIG. 4; The action of the feed unit moves the imaging area of the imaging unit 18 to the left in FIG. 4 . In addition, the Y-axis operation part 46 has: the upward direction operation part 46a which operates the Y-axis feed unit to move the imaging unit 18 upward in FIG. The unit operates to move the imaging unit 18 downward in FIG. 4 . In addition, the movable wire operating part 50 has: a movable wire approaching part 50a which makes the pair of movable wires 48 approach toward the reference line L while maintaining a line-symmetrical relationship with the reference line L as the axis of symmetry; The wire distance part 50b moves the pair of movable wires 48 away from the reference line L while maintaining the relationship of line symmetry with the reference line L as the axis of symmetry.

当使用如上所述的切削装置12在晶片2的间隔道4形成切削槽时,首先使晶片2的正面2a朝上而将晶片2吸引保持于卡盘工作台24的上表面。另外,利用多个夹具28对环状框架8进行固定。接着,利用拍摄单元18从上方对晶片2进行拍摄,根据拍摄单元18所拍摄的晶片2的图像,使X轴进给单元、Y轴进给单元以及卡盘工作台用电动机动作而使间隔道4与X轴方向一致,并且将切削刀具34定位于与X轴方向一致的间隔道4的上方。接着,利用电动机使切削刀具34与主轴32一起旋转。接着,实施如下的切削加工:利用Z轴进给单元使主轴壳体30下降,使切削刀具34的刃尖切入到与X轴方向一致的间隔道4,并且使X轴进给单元动作而使卡盘工作台24相对于切削单元16相对地在X轴方向上进行加工进给,从而沿着间隔道4形成用于将晶片2分割成各个器件6的切削槽。接着,按照预先设定的分度进给量(实施切削加工前的状态下的间隔道4的Y轴方向的间隔)利用Y轴进给单元使切削单元16相对于卡盘工作台24在Y轴方向上进行分度进给。并且,交替地反复进行切削加工和分度进给,从而对与X轴方向一致的所有间隔道4实施切削加工,此时,当如上述那样通过切削装置12形成切削槽时,会产生伴随着切削加工的间隔道4的Y轴方向的偏移、因主轴32的热膨胀而导致的切削刀具34的Y轴方向的偏移。在产生这样的偏移的状态下,当一边按照预先设定的分度进给量进行分度进给一边反复进行切削加工时,有可能切削到偏离间隔道4的位置而使器件6损伤。因此,当通过切削装置12形成切削槽时,在进行数次切削加工之后,进行加工位置的校正(即,间隔道4与切削槽的偏移的校正)。在加工位置的校正中,首先实施间隔道校正,求出间隔道4与基准线L的Y轴方向上的偏移量,并作为间隔道4的校正值来进行存储,接着实施加工槽校正,求出切削槽与基准线L的Y轴方向的偏移量,并作为切削槽的校正值来进行存储。另外,在图3中用标号54来表示沿着间隔道4形成的切削槽。When cutting grooves are formed on the streets 4 of the wafer 2 using the cutting device 12 as described above, the wafer 2 is sucked and held on the upper surface of the chuck table 24 with the front surface 2 a of the wafer 2 facing upward. In addition, the annular frame 8 is fixed by a plurality of clamps 28 . Next, the wafer 2 is photographed from above by the photographing unit 18, and the X-axis feed unit, the Y-axis feed unit, and the motor for the chuck table are operated according to the image of the wafer 2 photographed by the photographing unit 18 to move the spacer. 4 coincides with the X-axis direction, and the cutting tool 34 is positioned above the spacer 4 coincident with the X-axis direction. Next, the cutting tool 34 is rotated together with the main shaft 32 by the motor. Next, the following cutting process is implemented: the main shaft housing 30 is lowered by the Z-axis feed unit, the edge of the cutting tool 34 is cut into the spacer 4 consistent with the X-axis direction, and the X-axis feed unit is operated to make the The chuck table 24 is processed in the X-axis direction relative to the cutting unit 16 , thereby forming cutting grooves for dividing the wafer 2 into individual devices 6 along the lanes 4 . Then, according to the preset indexing feed amount (the interval in the Y-axis direction of the interval road 4 under the state before the cutting process), utilize the Y-axis feed unit to make the cutting unit 16 relative to the chuck table 24 in the Y direction. Index feed is performed in the axis direction. In addition, cutting and indexing are repeated alternately to perform cutting on all the partitions 4 that coincide with the X-axis direction. At this time, when cutting grooves are formed by the cutting device 12 as described above, accompanying The deviation in the Y-axis direction of the spacer 4 during the cutting process, and the deviation in the Y-axis direction of the cutting tool 34 due to the thermal expansion of the main shaft 32 . In such a state where such a deviation occurs, when the cutting process is repeated while performing index feed according to a preset index feed amount, the device 6 may be damaged by cutting to a position deviated from the street 4 . Therefore, when cutting grooves are formed by the cutting device 12 , correction of the machining position (that is, correction of offset between the streets 4 and the cutting grooves) is performed after several cutting operations. In the correction of the machining position, the gap correction is first carried out, the offset in the Y-axis direction between the gap 4 and the reference line L is obtained, and stored as the correction value of the gap 4, and then the machining groove correction is performed, The amount of deviation between the cutting groove and the reference line L in the Y-axis direction is obtained and stored as a correction value of the cutting groove. In addition, in FIG. 3, reference numeral 54 indicates the cutting groove formed along the partition road 4. As shown in FIG.

在间隔道校正中,首先如图3所示,使X轴进给单元和Y轴进给单元动作而进行晶片2与拍摄单元18的对位,利用拍摄单元18对最新形成有切削槽54的间隔道4进行拍摄。拍摄单元18所拍摄到的图像例如如图5所示的那样显示于显示单元20的图像显示部38。另外,当在间隔道4中周期性地设置有被称为TEG(Test Element Group:测试元件组)的金属图案的情况下,在将TEG切断后的部位的切削槽中产生金属飞边等,当对该部位的切削槽进行拍摄时,有可能将金属飞边等误认作切削槽,因此在这样的情况下,使X轴动作部44动作而进行拍摄单元18所拍摄的间隔道4的位置的调整,对未设置TEG的部位的切削槽进行拍摄。接着,根据所拍摄的图像,如图6所示,使Y轴动作部46动作而使显示于图像显示部38的间隔道4的Y轴方向中央位置朝向基准线L移动。此时,作业者观察所拍摄的图像,通过目视测量来调整间隔道4的位置,以使间隔道4的Y轴方向中央位置与基准线L一致,因此难以利用Y轴动作部46的一次动作将间隔道4的Y轴方向中央位置准确地定位于基准线L。因此,使可动线动作部50进行动作以使一对可动线48的间隔与间隔道4的宽度一致,从而确认间隔道4的Y轴方向的中央位置是否与基准线L一致。如上所述,一对可动线48一边保持以基准线L为对称轴的线对称的关系,一边进行接近和远离,因此当一对可动线48的间隔与间隔道4的宽度一致时,间隔道4的Y轴方向的中央位置与基准线L一致。并且,适当地反复进行Y轴动作部46的动作与可动线动作部50的动作,当如图7所示那样一对可动线48的间隔与间隔道4的宽度一致时,触摸间隔道校正按钮40。于是,将从校正前的位置起的间隔道4的Y轴方向的移动距离(间隔道4与基准线L的偏移量)作为间隔道4的Y轴方向的校正值来存储于切削装置12的上述存储单元。该间隔道4的校正值显示于显示单元20的校正值显示部52(在图示的实施方式中为-5.5μm)。在图示的实施方式中,在进行这样的间隔道校正时,即使作业员错误地触摸加工槽校正按钮42,由于在一对可动线48的间隔未被设定成识别为切削槽54的宽度的间隔的情况下会报知错误,因此不会将间隔道4的校正值作为切削槽54的校正值来进行存储。另外,在图7中,为了便于说明,按照比间隔道4的宽度略宽的间隔记载了一对可动线48。In the gap correction, first, as shown in FIG. 3 , the X-axis feed unit and the Y-axis feed unit are operated to align the wafer 2 and the imaging unit 18, and the imaging unit 18 is used to perform alignment on the newly formed cutting groove 54. Shots were taken at intervals of lane 4. The image captured by the imaging unit 18 is displayed on the image display unit 38 of the display unit 20 as shown in FIG. 5 , for example. In addition, when a metal pattern called TEG (Test Element Group: Test Element Group) is periodically provided in the street 4, metal burrs or the like are generated in the cutting groove of the part where the TEG is cut. When photographing the cutting groove of this part, there is a possibility that metal burrs and the like may be mistaken for the cutting groove. Therefore, in such a case, the X-axis operation part 44 is operated to perform imaging of the partition road 4 photographed by the imaging unit 18. Adjust the position and take pictures of the cutting grooves in the parts where the TEG is not installed. Next, based on the captured image, the Y-axis operation unit 46 is operated to move the center position in the Y-axis direction of the lane 4 displayed on the image display unit 38 toward the reference line L as shown in FIG. 6 . At this time, the operator observes the captured image and adjusts the position of the partition road 4 by visual measurement so that the center position of the partition road 4 in the Y-axis direction coincides with the reference line L. The action locates the central position of the partition lane 4 in the Y-axis direction on the reference line L accurately. Therefore, the movable wire operating unit 50 is operated so that the distance between the pair of movable wires 48 matches the width of the lane 4, and it is checked whether the center position of the lane 4 in the Y-axis direction coincides with the reference line L. As described above, the pair of movable wires 48 approaches and moves away while maintaining a line-symmetrical relationship with the reference line L as the axis of symmetry. The center position in the Y-axis direction of the partition road 4 coincides with the reference line L. As shown in FIG. And, suitably repeat the action of the Y-axis operating part 46 and the action of the movable line operating part 50, when the interval of a pair of movable lines 48 is consistent with the width of the spaced road 4 as shown in Figure 7, touch the spaced road. Calibration button 40 . Then, the movement distance of the lane 4 in the Y-axis direction from the position before correction (the amount of deviation between the lane 4 and the reference line L) is stored in the cutting device 12 as the correction value of the Y-axis direction of the lane 4 the above storage unit. The correction value of the interval track 4 is displayed on the correction value display portion 52 of the display unit 20 (-5.5 μm in the illustrated embodiment). In the illustrated embodiment, even if the operator accidentally touches the processing groove correction button 42 when performing such gap correction, since the distance between the pair of movable lines 48 is not set so as to be recognized as the cutting groove 54 In the case of a gap with a wider width, an error is reported, so the correction value of the gap track 4 is not stored as the correction value of the cutting groove 54 . In addition, in FIG. 7 , for convenience of description, a pair of movable wires 48 are shown at intervals slightly wider than the width of the partition lane 4 .

接着,对加工槽校正进行说明。从使间隔道4的Y轴方向中央位置与基准线L一致后的状态开始加工槽校正,首先如图8所示,使Y轴动作部46动作而使显示于图像显示部38的切削槽54的Y轴方向的中央位置朝向基准线L移动。接着,使可动线动作部50进行动作以使一对可动线48的间隔与切削槽54的宽度一致,从而确认切削槽54的Y轴方向的中央位置是否与基准线L一致。并且,适当地反复进行Y轴动作部46的动作与可动线动作部50的动作,当如图9所示那样一对可动线48的间隔与切削槽54的宽度一致时,触摸加工槽校正按钮42。于是,将从使间隔道4的Y轴方向的中央位置与基准线L一致后的状态起的切削槽54的Y轴方向的移动距离作为切削槽54的Y轴方向的校正值来存储于切削装置12的上述存储单元。该切削槽54的校正值显示于显示单元20的校正值显示部52(在图示的实施方式中为+1.2μm)。在图示的实施方式中,在进行这样的加工槽校正时,即使作业员错误地触摸间隔道校正按钮40,由于在一对可动线48的间隔未被设定成识别为间隔道4的宽度的间隔的情况下会报知错误,因此不会将切削槽54的校正值作为间隔道4的校正值来进行存储。另外,在图9中,为了便于说明,按照比切削槽54的宽度略宽的间隔记载了一对可动线48。Next, machining groove correction will be described. Starting from the state where the central position of the partition road 4 in the Y-axis direction coincides with the reference line L, first, as shown in FIG. The central position in the Y-axis direction moves toward the reference line L. Next, the movable wire operating unit 50 is operated so that the distance between the pair of movable wires 48 matches the width of the cutting groove 54, and it is checked whether the center position of the cutting groove 54 in the Y-axis direction coincides with the reference line L. And, the operation of the Y-axis operation part 46 and the operation of the movable wire operation part 50 are repeated appropriately, and when the distance between the pair of movable wires 48 is consistent with the width of the cutting groove 54 as shown in FIG. Correction button 42 . Then, the movement distance of the cutting groove 54 in the Y-axis direction from the state in which the center position of the partition road 4 in the Y-axis direction coincides with the reference line L is stored in the cutting machine as a correction value of the cutting groove 54 in the Y-axis direction. The aforementioned storage unit of device 12 . The correction value of the cutting groove 54 is displayed on the correction value display part 52 of the display unit 20 (+1.2 μm in the illustrated embodiment). In the illustrated embodiment, even if the operator touches the lane correction button 40 by mistake when performing such machining tank correction, since the distance between the pair of movable lines 48 is not set so as to be recognized as the lane 4 In the case of a gap of the width, an error is reported, so the correction value of the cut groove 54 is not stored as the correction value of the gap track 4 . In addition, in FIG. 9 , for convenience of description, a pair of movable wires 48 are shown at intervals slightly wider than the width of the cutting groove 54 .

如上所述,关于加工位置的校正,首先,在间隔道校正中,求出从校正前的位置起的间隔道4的Y轴方向的移动距离(间隔道4与基准线L的偏移量),接着在加工槽校正中,求出从使间隔道4的Y轴方向的中央位置与基准线L一致后的状态起的切削槽54的Y轴方向的移动距离(切削槽54与基准线L的偏移量),从而能够使用基准线L准确地求出间隔道4与切削槽54的偏移量。并且,按照在预先设定的分度进给量上加上切削槽54的校正值的校正后的分度进给量来进行分度进给,从而能够在间隔道4的Y轴方向的中央位置形成切削槽54。As described above, regarding the correction of the machining position, first, in the track correction, the movement distance of the track 4 in the Y-axis direction from the position before correction (the amount of deviation between the track 4 and the reference line L) is obtained. Next, in the machined groove calibration, the movement distance of the cut groove 54 in the Y-axis direction from the state where the center position of the partition road 4 in the Y-axis direction coincides with the reference line L (the distance between the cut groove 54 and the reference line L) is obtained. The offset amount of the spacer 4 and the cutting groove 54 can be accurately calculated using the reference line L. And, the index feed is performed according to the corrected index feed amount obtained by adding the correction value of the cutting groove 54 to the preset index feed amount, so that the center of the Y-axis direction of the interval road 4 can The position forms a cutting groove 54 .

如以上那样,在图示的实施方式中,当在一对可动线48的间隔未被设定成识别为间隔道4的宽度的间隔的情况下触摸间隔道校正按钮40时,报知错误,当在一对可动线48的间隔未被设定成识别为切削槽54的宽度的间隔的情况下触摸加工槽校正按钮42时,报知错误,因此不会将间隔道4与基准线L的偏移量作为切削槽54的校正值来进行存储,并且不会将切削槽54与基准线L的偏移量作为间隔道4的校正值来进行存储,能够高精度地进行分度进给而在间隔道4形成高精度的切削槽54。As described above, in the illustrated embodiment, when the interval between the pair of movable wires 48 is not set to be recognized as the interval of the width of the interval lane 4, when the interval lane correction button 40 is touched, an error is reported. , when the interval between a pair of movable lines 48 is not set to be recognized as the interval of the width of the cutting groove 54, when the processing groove correction button 42 is touched, an error will be reported, so the interval road 4 will not be aligned with the reference line. The offset amount of L is stored as the correction value of the cutting groove 54, and the offset amount of the cutting groove 54 and the reference line L is not stored as the correction value of the interval track 4, and the indexing can be performed with high precision. Thus, high-precision cutting grooves 54 are formed in the streets 4 .

另外,在图示的实施方式中,对具有切削单元16的切削装置12进行了说明,该切削单元16具有对保持单元14所保持的晶片2的间隔道4进行切削的切削刀具34并且该切削刀具34能够旋转,但也可以是具有对保持单元所保持的晶片2的间隔道4照射激光光线而形成分割槽的激光光线照射单元的激光加工装置。In addition, in the illustrated embodiment, the cutting device 12 having the cutting unit 16 having the cutting blade 34 for cutting the streets 4 of the wafer 2 held by the holding unit 14 has been described, and the cutting unit 16 has The cutter 34 is rotatable, but may be a laser processing device having a laser beam irradiation unit that irradiates laser beams to the lanes 4 of the wafer 2 held by the holding unit to form dividing grooves.

Claims (3)

1. A processing apparatus for forming a processing groove for dividing a wafer having a plurality of devices formed on a front surface thereof by dividing a street into the devices, the processing apparatus comprising at least:
a holding unit that holds a wafer;
a processing unit that forms a processing groove in the spacer of the wafer held by the holding unit;
an X-axis feeding unit that causes the holding unit and the processing unit to perform processing feeding relatively in an X-axis direction;
a Y-axis feeding unit that causes the holding unit and the processing unit to perform indexing feeding relatively in a Y-axis direction perpendicular to the X-axis direction;
a photographing unit having a microscope with a reference line, the microscope photographing the wafer held by the holding unit to detect the streets and the processing grooves; and
the display unit is provided with a display unit,
the display unit displays:
an image display unit that displays the image captured by the capturing unit;
a spacer correction button for storing an offset between the spacer and the reference line as a correction value;
a processing groove correction button for storing an offset between the processing groove and the reference line as a correction value;
a Y-axis operation unit for operating the Y-axis feeding unit;
a pair of movable lines which are located near to and far from the reference line and maintain line symmetry across the reference line; and
a movable wire operating unit for operating the pair of movable wires,
when the inter-track correction button is touched with the interval of the pair of movable wires not set to an interval recognized as the width of the inter-track, an error is notified,
when the processing groove correction button is touched with the interval of the pair of movable lines not set to be recognized as the interval of the width of the processing groove, an error is notified.
2. The processing apparatus according to claim 1, wherein,
when the Y-axis operation part is operated to move the position of the spacer displayed on the image display part to the reference line and the movable line operation part is operated to match the width of the pair of movable lines with the width of the spacer, the movement distance of the spacer is stored as a correction value of the spacer,
when the Y-axis operation unit is operated to move the position of the processing groove displayed on the image display unit to the reference line and the movable line operation unit is operated to match the pair of movable lines with the width of the processing groove, the movement distance of the processing groove is stored as a correction value of the processing groove.
3. The processing apparatus according to claim 1, wherein,
the machining unit is a cutting unit having a cutting tool and the cutting tool is rotatable, and the machining groove is a cutting groove.
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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0569437A (en) * 1991-05-14 1993-03-23 Tokyo Seimitsu Co Ltd Grooving control device of dicing apparatus
JPH11260763A (en) * 1998-03-16 1999-09-24 Tokyo Seimitsu Co Ltd Method and device for controlling dicing of dicing machine
JPH11283938A (en) * 1998-03-31 1999-10-15 Disco Abrasive Syst Ltd Dicing method
JP2001297999A (en) * 2000-04-12 2001-10-26 Disco Abrasive Syst Ltd Cutting device
CN101714498A (en) * 2008-09-30 2010-05-26 株式会社迪思科 A machining device
JP2015093304A (en) * 2013-11-13 2015-05-18 株式会社ディスコ Laser processing machine
JP2016025224A (en) * 2014-07-22 2016-02-08 株式会社ディスコ Processing method of package wafer
CN105414744A (en) * 2014-09-12 2016-03-23 株式会社迪思科 Laser processing apparatus

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4462717B2 (en) 2000-05-22 2010-05-12 株式会社ディスコ Rotating blade position detection device
JP2002141310A (en) 2000-11-06 2002-05-17 Tokyo Seimitsu Co Ltd Dicing apparatus
JP5060762B2 (en) * 2006-10-19 2012-10-31 株式会社ディスコ Laser processing equipment
JP5389580B2 (en) * 2009-09-17 2014-01-15 株式会社ディスコ Cutting equipment
JP5762005B2 (en) 2011-01-13 2015-08-12 株式会社ディスコ Processing position adjustment method and processing apparatus
JP2012256794A (en) 2011-06-10 2012-12-27 Disco Abrasive Syst Ltd Processing device
JP6013166B2 (en) 2012-12-11 2016-10-25 株式会社ディスコ Cutting equipment
JP6125377B2 (en) * 2013-08-29 2017-05-10 株式会社ディスコ Cutting groove detection method
JP6498073B2 (en) 2015-08-14 2019-04-10 株式会社ディスコ Method for detecting misalignment of cutting blade
JP6559074B2 (en) 2016-01-28 2019-08-14 株式会社ディスコ Package wafer processing method
JP6935168B2 (en) 2016-02-12 2021-09-15 株式会社ディスコ Processing equipment
JP6600267B2 (en) * 2016-03-15 2019-10-30 株式会社ディスコ Workpiece cutting method

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0569437A (en) * 1991-05-14 1993-03-23 Tokyo Seimitsu Co Ltd Grooving control device of dicing apparatus
JPH11260763A (en) * 1998-03-16 1999-09-24 Tokyo Seimitsu Co Ltd Method and device for controlling dicing of dicing machine
JPH11283938A (en) * 1998-03-31 1999-10-15 Disco Abrasive Syst Ltd Dicing method
JP2001297999A (en) * 2000-04-12 2001-10-26 Disco Abrasive Syst Ltd Cutting device
CN101714498A (en) * 2008-09-30 2010-05-26 株式会社迪思科 A machining device
JP2015093304A (en) * 2013-11-13 2015-05-18 株式会社ディスコ Laser processing machine
JP2016025224A (en) * 2014-07-22 2016-02-08 株式会社ディスコ Processing method of package wafer
CN105414744A (en) * 2014-09-12 2016-03-23 株式会社迪思科 Laser processing apparatus

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