CN117878043B - Vacuum chamber and semiconductor processing equipment using same - Google Patents
Vacuum chamber and semiconductor processing equipment using same Download PDFInfo
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- CN117878043B CN117878043B CN202410272377.6A CN202410272377A CN117878043B CN 117878043 B CN117878043 B CN 117878043B CN 202410272377 A CN202410272377 A CN 202410272377A CN 117878043 B CN117878043 B CN 117878043B
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- chamber
- inner chamber
- sealing door
- sealing plate
- sealing
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 15
- 238000007789 sealing Methods 0.000 claims abstract description 204
- 238000007599 discharging Methods 0.000 claims description 52
- 230000005540 biological transmission Effects 0.000 claims description 48
- 230000007246 mechanism Effects 0.000 claims description 12
- 238000000034 method Methods 0.000 abstract description 10
- 230000001360 synchronised effect Effects 0.000 abstract description 3
- 230000002349 favourable effect Effects 0.000 abstract description 2
- 230000003245 working effect Effects 0.000 abstract description 2
- 239000011797 cavity material Substances 0.000 description 60
- 239000000463 material Substances 0.000 description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000008569 process Effects 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 239000010453 quartz Substances 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000010431 corundum Substances 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Chemical compound O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 210000001503 joint Anatomy 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Pressure Vessels And Lids Thereof (AREA)
Abstract
The invention discloses a vacuum chamber and semiconductor processing equipment using the same, and relates to the field of semiconductor processing equipment. When the outer chamber sealing door is rotated to be opened and closed, the inner chamber sealing door can be driven to slide along the circumferential direction on the outer surface of the inner chamber, so that the inner chamber sealing door and the outer chamber sealing door are synchronously opened and closed; through remove switching with the circumferencial direction of inner chamber sealing door along the inner chamber outdoor surface for the inner chamber sealing door is opened the in-process and is hugged closely in the surface of inner chamber all the time, has reduced the space that needs occupy when inner chamber sealing door opens, and outer cavity can not cause the hindrance to opening of inner chamber sealing door simultaneously, thereby can reduce outer cavity volume and outer cavity opening size, and then increase outer cavity's compressive property and sealing performance, be favorable to improving vacuum chamber's life and working property, synchronous drive inner chamber sealing door removes switching when outer chamber sealing door is opened and closed, make inner chamber sealing door's switching more convenient.
Description
Technical Field
The invention belongs to the field of semiconductor processing equipment, and particularly relates to a vacuum chamber and semiconductor processing equipment using the same.
Background
In the semiconductor processing process, the process gases with strong oxidizing property or strong corrosiveness such as chlorine, hydrogen chloride, oxygen, sulfur trioxide, sulfur dioxide, hydrogen fluoride, nitrogen dioxide, hydrogen sulfide, ammonia, ozone and the like are required to be used in a high-temperature environment, so that the selected cavity materials are only inert materials such as quartz, corundum and the like which are mainly composed of silicon dioxide and aluminum oxide. In addition, in the prior art, a vacuum environment is usually needed in the semiconductor processing process, that is, the pressure in the cavity is lower than one atmosphere, and materials such as quartz, corundum and the like are fragile and not pressure-resistant, so that the larger the size of the cavity is, the more likely to be crushed by the atmosphere in use, so that the maximum diameter of the quartz cavity is about 500-600mm currently, and the quartz cavity cannot be used in a positive pressure environment, that is, the pressure in the cavity is higher than one atmosphere.
Chinese patent CN113035748B discloses a vacuum chamber, a pressure control method of the vacuum chamber and a semiconductor processing apparatus, the vacuum chamber comprising: the inner cavity is provided with at least one inner cavity air inlet pipe and at least one inner cavity air outlet pipe; the outer cavity is sleeved in the inner cavity and is provided with at least one outer cavity air inlet pipe and at least one outer cavity air outlet pipe; the cavity door assembly is arranged on the same side surface of the outer cavity and the inner cavity and used for controlling the inner cavity to be communicated or isolated from the outside; the first air supply assembly is connected with the inner cavity air inlet pipe and is used for supplying reaction gas to the inner cavity; the second air supply assembly is connected with the outer cavity air inlet pipe and is used for providing protective gas for the outer cavity; the exhaust assembly comprises a negative pressure supply system, and the negative pressure supply system is connected with the inner cavity air outlet pipe and the outer cavity air outlet pipe; the sealing assembly is arranged between the outer cavity and the inner cavity; and the pressure control assembly is used for controlling the pressure difference between the outer cavity and the inner cavity within a safe pressure difference range by controlling the first air supply assembly, the second air supply assembly and the air exhaust assembly.
The patent performs pressure balance by arranging the inner cavity and the outer cavity so as to protect the fragile or non-pressure-resistant inner cavity from being influenced by the use environment, thereby being beneficial to the manufacture and the application of large-size corrosion-resistant high-temperature vacuum treatment equipment. However, as the outer chamber is nested on the surface of the reaction chamber and the clearance space between the two chambers is limited, the outer chamber can prevent the opening and closing of the sealing door of the reaction chamber, so that the vacuum chamber is inconvenient to use; if the size of the opening of the outer cavity is increased so as to conveniently open and close the sealing door of the reaction cavity, the compression resistance and the sealing performance of the outer cavity are reduced due to the increase of the opening of the outer cavity, and therefore the service life and the working performance of the vacuum cavity are reduced.
Disclosure of Invention
The present invention provides a vacuum chamber and a semiconductor processing apparatus using the same, which solve the above-mentioned problems of the prior art.
In order to solve the technical problems, the invention is realized by the following technical scheme:
The invention relates to a vacuum chamber, which comprises an outer chamber and an inner chamber which are nested, wherein the side wall of the outer chamber is provided with an outer chamber feeding and discharging port, and an outer chamber sealing door capable of being opened in a rotating way is arranged in the outer chamber feeding and discharging port;
An inner chamber feeding and discharging port positioned at the inner side of the outer chamber feeding and discharging port is formed in the side wall of the inner chamber, an inner chamber sealing door is arranged in the inner chamber feeding and discharging port, and the inner chamber sealing door is in transmission connection with the outer chamber sealing door, so that when the outer chamber sealing door is rotated to be opened and closed, the inner chamber sealing door can be driven to slide along the circumferential direction on the outer surface of the inner chamber, and the inner chamber sealing door and the outer chamber sealing door are synchronously opened and closed;
the device also comprises a pressure control mechanism, wherein the pressure control mechanism can simultaneously vacuumize or inject pressure into the outer cavity and the inner cavity.
Further, the outer chamber sealing door comprises an outer sealing plate and a hinge, the outer sealing plate is rotatably arranged at the outer side end of the outer chamber feeding and discharging hole through the hinge, a plurality of locks which are circumferentially distributed are arranged between the outer sealing plate and the outer chamber feeding and discharging hole, and a handle is fixedly arranged at one end, far away from the hinge, of the outer surface of the outer sealing plate.
Further, the inner chamber sealing door comprises a sliding seat, two arc-shaped rails and a transmission assembly, wherein the two arc-shaped rails are fixedly installed on the surface of the inner chamber, the two arc-shaped rails are respectively arranged at the upper end and the lower end of the inner chamber material inlet and outlet, the sliding seat is slidably installed between the two arc-shaped rails and is in transmission connection with the outer sealing plate through the transmission assembly, and the sliding seat is provided with an inner sealing plate capable of sealing the inner chamber material inlet and outlet in a butt joint mode.
Further, the transmission assembly comprises a transmission shaft, a straight rack, a side opening and an arc rack, wherein the side opening is formed in the outer side face of the arc track, the arc rack is fixedly arranged on the outer side of the end part of the sliding seat and is slidably clamped in a track groove of the arc track, and the arc rack extends to the outer part of the arc track through the side opening;
The transmission shaft is rotatably arranged in the outer cavity and positioned at one side of the feeding and discharging port of the outer cavity, the end part of the transmission shaft is fixedly provided with a transmission gear which is in meshed transmission connection with the arc-shaped rack, and the middle part of the transmission shaft is fixedly provided with a driven gear;
the straight rack is arranged at one end of the inner side surface of the outer sealing plate, which is far away from the hinge, and can be in meshed transmission connection with the driven gear.
Further, a connecting rod is rotatably arranged on the inner side surface of the outer sealing plate, and one end of the connecting rod is rotatably connected with one end of the straight rack;
The inner wall of the feeding and discharging hole of the outer chamber is provided with a chute which can be in sliding clamping connection with the straight rack, the upper and lower chute walls of the chute are provided with limiting guide grooves, and the upper and lower sides of the straight rack are fixedly provided with limiting slide bars which are in sliding clamping connection with the limiting guide grooves.
Further, a sliding hole is formed in the sliding seat, and the inner sealing plate is slidably arranged in the sliding hole;
the inner side surface of the outer sealing plate is fixedly provided with a sealing abutting block which can enable the inner sealing plate to abut and slide towards the feeding and discharging holes of the inner cavity.
Further, the inner sealing plate comprises a telescopic sliding plate and a telescopic guide groove, the telescopic guide groove is arranged in the sliding seat and is positioned on the outer ring of the sliding hole, the telescopic sliding plate is slidably clamped in the telescopic guide groove, the inner side surface of the telescopic sliding plate is fixedly provided with a sealing convex block which is slidably clamped in the sliding hole, and the inner side end of the telescopic guide groove is fixedly provided with a plurality of reset springs which are abutted to the inner side surface of the telescopic sliding plate.
Further, the pressure control mechanism comprises an outer chamber vacuumizing pipe, an outer chamber air inlet pipe, an inner chamber vacuumizing pipe and an inner chamber air inlet pipe which are fixedly arranged at the top of the outer chamber, the outer chamber vacuumizing pipe and the outer chamber air inlet pipe are communicated with the inside of the outer chamber, and the inner chamber vacuumizing pipe and the inner chamber air inlet pipe are communicated with the inner chamber.
The invention has the following beneficial effects:
1. When the outer chamber sealing door is rotated to be opened and closed, the inner chamber sealing door can be driven to slide along the circumferential direction on the outer surface of the inner chamber, so that the inner chamber sealing door and the outer chamber sealing door are synchronously opened and closed; through remove switching with the circumferencial direction of inner chamber sealing door along the inner chamber outdoor surface for the inner chamber sealing door is opened the in-process and is hugged closely in the surface of inner chamber all the time, has reduced the space that needs to occupy when inner chamber sealing door opens, and outer cavity can not cause the hindrance to opening of inner chamber sealing door simultaneously, thereby can reduce outer cavity volume and outer cavity opening size, and then increase outer cavity's compressive property and sealing performance, be favorable to improving vacuum chamber's life and working property, synchronous drive inner chamber sealing door removes switching when outer chamber sealing door switching, and need not the staff with the inside switching that carries out inner chamber sealing door of hand stretch into outer cavity, make inner chamber sealing door's switching more convenient, thereby vacuum chamber's use of being convenient for.
2. According to the invention, the inner sealing plate capable of sealing the inner cavity feeding and discharging hole in an abutting mode is arranged on the sliding seat, meanwhile, the sealing abutting block capable of enabling the inner sealing plate to slide in an abutting mode towards the inner cavity feeding and discharging hole is fixedly arranged on the inner side face of the outer sealing plate, when the outer sealing plate rotates to seal the outer cavity feeding and discharging hole in a closing mode, the outer sealing plate can enable the inner sealing plate to move in an abutting mode towards the inner cavity feeding and discharging hole through the sealing abutting block, so that the inner sealing plate can enable the inner cavity feeding and discharging hole to be in abutting sealing mode, and when the outer sealing plate is locked and fastened through the lock catch, the outer sealing plate enables the inner sealing plate to be in synchronous abutting and locking mode through the sealing abutting block, and therefore sealing performance of the inner sealing plate on the inner cavity feeding and discharging hole can be improved.
3. According to the invention, the outer chamber is arranged to balance the internal pressure and the external pressure of the inner chamber serving as the reaction chamber, so that the fragile and non-pressure-resistant inner chamber cavity is protected from the influence of the use environment, and the manufacturing and the application of the large-size corrosion-resistant vacuum chamber are facilitated.
Of course, it is not necessary for any one product to practice the invention to achieve all of the advantages set forth above at the same time.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the invention, the drawings that are needed for the description of the embodiments will be briefly introduced below, it being obvious that the drawings in the following description are only some embodiments of the invention, and that it is also possible for a person skilled in the art to obtain the drawings from these drawings without inventive effort.
FIG. 1 is a schematic view of a vacuum chamber of the present invention in perspective cut-away;
FIG. 2 is a schematic view of the structure of the present invention shown in FIG. 1 at a partially enlarged scale;
FIG. 3 is a schematic perspective view of a vacuum chamber according to the present invention;
FIG. 4 is a second perspective view of the vacuum chamber of the present invention;
FIG. 5 is a third perspective view of the vacuum chamber of the present invention;
FIG. 6 is a schematic view of a partially enlarged structure of the present invention at B of FIG. 5;
FIG. 7 is a second schematic perspective view of a vacuum chamber of the present invention;
FIG. 8 is a schematic view of the structure of the present invention shown in FIG. 7 at C in an enlarged partial view;
FIG. 9 is a schematic view of the inner seal door of the present invention in perspective cut-away configuration;
fig. 10 is a schematic view of a partially enlarged structure of fig. 9D according to the present invention.
In the figure: 1. an outer chamber; 2. a material inlet and a material outlet of the outer chamber; 3. an outer chamber seal door; 31. an outer sealing plate; 32. a hinge; 33. a handle; 34. locking; 4. an inner chamber; 5. an inner chamber sealing door; 51. a sliding seat; 52. an inner sealing plate; 53. a transmission shaft; 54. a driven gear; 55. a transmission gear; 56. a straight rack; 57. a connecting rod; 58. a chute; 59. a limiting guide groove; 510. a limit slide bar; 511. an arc-shaped track; 512. a slide hole; 513. a side opening; 514. an arc-shaped rack; 5201. a telescopic slide plate; 5202. a sealing bump; 5203. a telescopic guide slot; 5204. a return spring; 6. a pressure control mechanism; 61. an outer chamber evacuation tube; 62. an outer chamber air inlet pipe; 63. the inner chamber is evacuated; 64. an inner chamber air inlet pipe; 7. a material inlet and a material outlet of the inner chamber; 8. and sealing the abutting blocks.
Detailed Description
The following description of the technical solutions in the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, based on the embodiments in the invention, which a person of ordinary skill in the art would obtain without inventive faculty, are within the scope of the invention.
In the description of the present invention, it should be understood that the terms "open," "upper," "lower," "top," "middle," "inner," and the like indicate an orientation or positional relationship, merely for convenience of description and to simplify the description, and do not indicate or imply that the components or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention.
Referring to fig. 1-3, the invention discloses a vacuum chamber, which comprises an outer chamber 1 and an inner chamber 4 which are nested, wherein an outer chamber material inlet and outlet port 2 is arranged on the side wall of the outer chamber 1, and an outer chamber sealing door 3 which can be opened in a rotating way is arranged in the outer chamber material inlet and outlet port 2;
An inner chamber feeding and discharging hole 7 positioned at the inner side of the outer chamber feeding and discharging hole 2 is formed in the side wall of the inner chamber 4, an inner chamber sealing door 5 is arranged in the inner chamber feeding and discharging hole 7, and the inner chamber sealing door 5 is in transmission connection with the outer chamber sealing door 3, so that when the outer chamber sealing door 3 is rotated to be opened and closed, the inner chamber sealing door 5 can be driven to slide along the circumferential direction on the outer surface of the inner chamber 4, and the inner chamber sealing door 5 and the outer chamber sealing door 3 are synchronously opened and closed;
The device also comprises a pressure control mechanism 6, wherein the pressure control mechanism 6 can simultaneously vacuumize or inject pressure into the outer chamber 1 and the inner chamber 4;
The outer chamber 1 is made of a high-hardness and non-deformable metal material, the inner chamber 4 is made of an inert material such as quartz, corundum and the like which mainly contains silicon dioxide and aluminum oxide, when the semiconductor processing equipment works, a semiconductor element to be processed is fed into the inner chamber 4 through the outer chamber feeding and discharging port 2 and the inner chamber feeding and discharging port 7, then the outer chamber sealing door 3 is rotated to seal the outer chamber feeding and discharging port 2, and meanwhile the outer chamber sealing door 3 drives the inner chamber sealing door 5 to slide towards the inner chamber feeding and discharging port 7 along the circumferential direction on the outer surface of the inner chamber 4, so that the inner chamber sealing door 5 seals the inner chamber feeding and discharging port 7 in a closed mode, and then the outer chamber 1 and the inner chamber 4 are vacuumized through the pressure control mechanism 6 at the same time, so that the inner pressure and the outer pressure of the inner chamber 4 are always balanced, and the inner chamber 4 is prevented from being deformed and damaged by pressure;
After the semiconductor element is processed in the inner chamber 4, the pressure control mechanism 6 is used for injecting pressure into the outer chamber 1 and the inner chamber 4 to enable the inner parts of the outer chamber 1 and the inner chamber 4 to recover normal pressure, the outer chamber sealing door 3 is rotated and opened, meanwhile, the outer chamber sealing door 3 drives the inner chamber sealing door 5 to slide at a position far away from the inner chamber feeding and discharging port 7 along the circumferential direction on the outer surface of the inner chamber 4, so that the outer chamber feeding and discharging port 2 and the inner chamber feeding and discharging port 7 are simultaneously opened, and then the processed semiconductor element can be taken out;
according to the invention, the inner chamber sealing door 5 is moved to be opened and closed along the circumferential direction of the outer surface of the inner chamber 4, so that the inner chamber sealing door 5 is always clung to the outer surface of the inner chamber 4 in the opening process, the space occupied by the inner chamber sealing door 5 in the opening process is reduced, and meanwhile, the outer chamber 1 does not interfere the opening of the inner chamber sealing door 5, so that the volume of the outer chamber 1 and the opening size of the outer chamber material inlet and outlet 2 can be reduced, the compression resistance and sealing performance of the outer chamber 1 are further improved, the service life and the working performance of a vacuum chamber are improved, the inner chamber sealing door 5 is synchronously driven to be moved to be opened and closed when the outer chamber sealing door 3 is opened and closed, and a worker does not need to stretch hands into the outer chamber 1 to open and close the inner chamber sealing door 5, so that the inner chamber sealing door 5 is more convenient to open and close, and the vacuum chamber is convenient to use; the outer chamber 1 is arranged to balance the internal pressure and the external pressure of the inner chamber 4 serving as a reaction chamber, so that the fragile and non-pressure-resistant inner chamber 4 cavity is protected from the influence of the use environment, and the manufacture and the application of the large-size corrosion-resistant vacuum chamber are facilitated.
Referring to fig. 1 and 3, in one embodiment, the pressure control mechanism 6 includes an outer chamber evacuation tube 61, an outer chamber air inlet tube 62, an inner chamber evacuation tube 63 and an inner chamber air inlet tube 64 fixedly mounted on top of the outer chamber 1, wherein the outer chamber evacuation tube 61 and the outer chamber air inlet tube 62 are both communicated with the interior of the outer chamber 1, and the inner chamber evacuation tube 63 and the inner chamber air inlet tube 64 are both communicated with the inner chamber 4;
Wherein, the outer chamber vacuumizing pipe 61 and the inner chamber vacuumizing pipe 63 are communicated with vacuumizing equipment, and the outer chamber air inlet pipe 62 and the inner chamber air inlet pipe 64 are communicated with air inlet valves, when vacuumizing is carried out, the vacuumizing equipment respectively vacuumizes the outer chamber 1 and the inner chamber 4 through the outer chamber vacuumizing pipe 61 and the inner chamber vacuumizing pipe 63, so that the air pressure in the outer chamber 1 and the inner chamber 4 is gradually reduced; and in the injection process, the air inlet valve is opened, so that external air respectively enters the outer chamber 1 and the inner chamber 4 through the outer chamber air inlet pipe 62 and the inner chamber air inlet pipe 64 until the air pressure inside the outer chamber 1 and the inner chamber 4 is balanced with the external air pressure.
Referring to fig. 1 and 4, in one embodiment, the outer chamber sealing door 3 includes an outer sealing plate 31 and a hinge 32, the outer sealing plate 31 is rotatably mounted at an outer side end of the outer chamber feeding and discharging port 2 through the hinge 32, a plurality of circumferentially distributed lock catches 34 are mounted between the outer sealing plate 31 and the outer chamber feeding and discharging port 2, and a handle 33 is fixedly mounted at an end, far away from the hinge 32, of an outer surface of the outer sealing plate 31;
When the outer chamber feed/discharge port 2 is opened and closed, the handle 33 is held, the outer sealing plate 31 is rotated by taking the hinge 32 as a fulcrum, so that the outer sealing plate 31 is closed on the outer chamber feed/discharge port 2 or is rotated to be opened, and when the outer sealing plate 31 seals the outer chamber feed/discharge port 2 in a closed manner, the outer sealing plate 31 is further locked and fixed through the lock catch 34, so that the sealing performance of the outer sealing plate 31 to the outer chamber feed/discharge port 2 is improved.
Referring to fig. 1-3, 5 and 6, in one embodiment, the inner chamber sealing door 5 includes a sliding seat 51, two arc rails 511 and a transmission assembly, the two arc rails 511 are fixedly installed on the surface of the inner chamber 4, the two arc rails 511 are respectively disposed at the upper and lower ends of the inner chamber material inlet and outlet 7, the sliding seat 51 is slidably installed between the two arc rails 511 and is in transmission connection with the outer sealing plate 31 through the transmission assembly, and an inner sealing plate 52 capable of sealing the inner chamber material inlet and outlet 7 in an abutting manner is installed on the sliding seat 51;
The transmission assembly comprises a transmission shaft 53, a straight rack 56, a side opening 513 and an arc-shaped rack 514, the side opening 513 is formed in the outer side surface of the arc-shaped track 511, the arc-shaped rack 514 is fixedly arranged on the outer side of the end part of the sliding seat 51 and is slidably clamped in a track groove of the arc-shaped track 511, and the arc-shaped rack 514 extends to the outer part of the arc-shaped track 511 through the side opening 513;
the transmission shaft 53 is rotatably arranged in the outer chamber 1 and is positioned at one side of the feed and discharge port 2 of the outer chamber, a transmission gear 55 in meshed transmission connection with the arc-shaped rack 514 is fixedly arranged at the end part of the transmission shaft 53, and a driven gear 54 is fixedly arranged at the middle part of the transmission shaft 53;
The straight rack 56 is arranged at one end of the inner side surface of the outer sealing plate 31 far away from the hinge 32 and can be in meshed transmission connection with the driven gear 54;
When the outer chamber feeding and discharging port 2 and the inner chamber feeding and discharging port 7 are in an open state, the sliding seat 51 is positioned at the left side of the inner chamber feeding and discharging port 7, when the outer sealing plate 31 is rotated and closed, the outer sealing plate 31 drives the straight rack 56 to synchronously move, so that the straight rack 56 is meshed with the driven gear 54 to rotate clockwise, thereby driving the transmission shaft 53 and the transmission gear 55 to rotate clockwise, at the moment, the transmission gear 55 is meshed with the arc-shaped rack 514 to move rightwards along the arc-shaped track 511, thereby driving the sliding seat 51 and the inner sealing plate 52 to move rightwards, so that the inner sealing plate 52 moves to the outer side of the inner chamber feeding and discharging port 7, and the inner chamber feeding and discharging port 7 is abutted and sealed;
When the outer sealing plate 31 rotates to be opened, the outer sealing plate 31 drives the straight rack 56 to move outwards, so that the straight rack 56 is meshed with the driven gear 54 to drive the driven gear 54 to rotate anticlockwise, thereby driving the transmission shaft 53 and the transmission gear 55 to rotate anticlockwise, at the moment, the transmission gear 55 is meshed with the arc-shaped rack 514 to drive the sliding seat 51 and the inner sealing plate 52 to move leftwards along the arc-shaped track 511, and the inner sealing plate 52 is enabled to move to one side of the inner chamber inlet and outlet 7, so that the inner chamber inlet and outlet 7 is not abutted and sealed any more.
Referring to fig. 1, 5, 7 and 8, in one embodiment, a connecting rod 57 is rotatably installed on an inner side surface of the outer sealing plate 31, and one end of the connecting rod 57 is rotatably connected with one end of the straight rack 56;
A chute 58 which can be in sliding clamping connection with the straight rack 56 is arranged on the inner wall of the material inlet and outlet 2 of the outer chamber, a limiting guide groove 59 is arranged on the upper and lower groove walls of the chute 58, and a limiting slide bar 510 which is in sliding clamping connection with the limiting guide groove 59 is fixedly arranged on the upper and lower sides of the straight rack 56;
When the outer sealing plate 31 is gradually closed, the outer sealing plate 31 drives the straight rack 56 to move towards the inside of the outer cavity feeding and discharging hole 2 through the connecting rod 57, so that the straight rack 56 is clamped into the sliding groove 58 in a sliding way, then along with the gradual closing of the outer sealing plate 31, the outer sealing plate 31 pushes the straight rack 56 inwards along the sliding groove 58 through the connecting rod 57, so that the straight rack 56 is meshed with the driven gear 54 to drive the inner sealing plate 52 to move towards the closing way, and correspondingly, when the outer sealing plate 31 rotates to be opened, the outer sealing plate 31 pulls the straight rack 56 outwards along the sliding groove 58 through the connecting rod 57, so that the straight rack 56 is meshed with the driven gear 54 to drive the inner sealing plate 52 to move towards the opening way, and when the outer sealing plate 31 is completely opened, the outer sealing plate 31 drives the straight rack 56 to move out of the outer cavity feeding and discharging hole 2 through the connecting rod 57, so that the normal feeding and discharging of the outer cavity feeding and discharging hole 2 is not influenced;
further, in the sliding process of the straight rack 56 in the sliding slot 58, the limiting sliding strips 510 on the upper and lower sides of the straight rack 56 are respectively and slidably clamped in the limiting guide slots 59 in the upper and lower slot walls of the sliding slot 58, so that the straight rack 56 is limited by matching the limiting guide slots 59 with the limiting sliding strips 510, so that the straight rack 56 is more stable in sliding operation in the sliding slot 58, and stable meshing transmission of the straight rack 56 and the driven gear 54 is ensured.
Referring to fig. 3-8, in one embodiment, a sliding hole 512 is formed on the sliding seat 51, and the inner sealing plate 52 is slidably mounted in the sliding hole 512; the inner side surface of the outer sealing plate 31 is fixedly provided with a sealing abutting block 8 which can enable the inner sealing plate 52 to abut and slide towards the inner cavity feeding and discharging hole 7;
The sliding seat 51 and the inner side surface of the inner sealing plate 52 are kept with a gap with the outer surface of the inner chamber 4, so that friction resistance when the sliding seat 51 and the inner sealing plate 52 slide is reduced, the inner chamber inlet and outlet port 7 is more labor-saving when the outer sealing plate 31 rotates to be closed to seal the outer chamber inlet and outlet port 2, the outer sealing plate 31 can move the inner sealing plate 52 in the direction of the inner chamber inlet and outlet port 7 in an abutting manner through the sealing abutting block 8, the inner side surface of the inner sealing plate 52 is enabled to seal the inner chamber inlet and outlet port 7 in an abutting manner, and when the outer sealing plate 31 is locked and fixed through the lock catch 34, the outer sealing plate 31 synchronously abuts and locks the inner sealing plate 52 through the sealing abutting block 8, so that the sealing performance of the inner sealing plate 52 to the inner chamber inlet and outlet port 7 can be improved;
Further, a smooth surface without transmission teeth is arranged at the outer side end of the straight rack 56, and when the straight rack 56 is meshed with the driven gear 54 to drive the inner sealing plate 52 to move to the surface of the inner chamber feed and discharge port 7, the transmission teeth on the straight rack 56 just completely pass through the driven gear 54, then the outer sealing plate 31 continues to rotate and close, the straight rack 56 does not drive the driven gear 54 to rotate any more, so that the sliding seat 51 and the inner sealing plate 52 are not driven to move continuously, but only the outer sealing plate 31 drives the sealing abutting block 8 to push the inner sealing plate 52 inwards, so that the inner sealing plate 52 can be aligned and closely attached to the surface of the inner chamber feed and discharge port 7, and the inner chamber feed and discharge port 7 is just abutted and sealed; correspondingly, when the outer sealing plate 31 is rotated and opened, the part of the outer end of the straight rack 56, which is not provided with the transmission teeth, is driven to move past the driven gear 54, so that the driven gear 54 is not driven to rotate, and the sliding seat 51 is kept still, but the sealing support block 8 is driven by the outer sealing plate 31 to move and separate from the inner sealing plate 52, and after the locking of the inner sealing plate 52 is released, the straight rack 56 starts to drive the driven gear 54 again, so as to drive the sliding seat 51 and the inner sealing plate 52 to move, and further open the inner chamber feed and discharge port 7.
Referring to fig. 3-10, in one embodiment, the inner sealing plate 52 includes a telescopic sliding plate 5201 and a telescopic guiding groove 5203, the telescopic guiding groove 5203 is opened in the sliding seat 51 and is located on the outer ring of the sliding hole 512, the telescopic sliding plate 5201 is slidably clamped in the telescopic guiding groove 5203, the inner side surface of the telescopic sliding plate 5201 is fixedly provided with a sealing protruding block 5202 slidably clamped in the sliding hole 512, and the inner side end of the telescopic guiding groove 5203 is fixedly provided with a plurality of return springs 5204 abutted against the inner side surface of the telescopic sliding plate 5201;
when the outer sealing plate 31 is rotated to be closed to drive the sealing abutting block 8 to move inwards, the sealing abutting block 8 abuts against the outer side face of the telescopic sliding plate 5201, the telescopic sliding plate 5201 and the sealing lug 5202 abut against and move towards the direction of the inner chamber material inlet and outlet 7 until the outer sealing plate 31 is completely closed, the sealing lug 5202 abuts against the surface of the inner chamber material inlet and outlet 7 to seal the inner chamber material inlet and outlet 7; when the outer sealing plate 31 rotates to open and drive the sealing abutting block 8 to move outwards, the sealing abutting block 8 is not abutted against the outer side face of the telescopic sliding plate 5201, at the moment, the telescopic sliding plate 5201 moves outwards to reset under the reset action of the reset spring 5204, and the sealing protruding block 5202 is driven to move in the direction away from the inner cavity feeding and discharging port 7, so that the sealing protruding block 5202 is not abutted against the outer surface of the inner cavity 4 any more, and the follow-up sliding seat 51 and the inner sealing plate 52 can slide and open along the surface of the inner cavity 4 conveniently.
In the description of the present specification, the descriptions of the terms "one embodiment," "example," "specific example," and the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above disclosed preferred embodiments of the invention are merely intended to help illustrate the invention. The preferred embodiments are not exhaustive or to limit the invention to the precise form disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best understand and utilize the invention.
Claims (4)
1. A vacuum chamber comprising an outer chamber (1) and an inner chamber (4) arranged in a nested manner, characterized in that: an outer chamber feeding and discharging port (2) is formed in the side wall of the outer chamber (1), and an outer chamber sealing door (3) capable of being opened in a rotating mode is arranged in the outer chamber feeding and discharging port (2);
An inner chamber feeding and discharging hole (7) positioned at the inner side of the outer chamber feeding and discharging hole (2) is formed in the side wall of the inner chamber (4), an inner chamber sealing door (5) is arranged in the inner chamber feeding and discharging hole (7), and the inner chamber sealing door (5) is in transmission connection with the outer chamber sealing door (3), so that when the outer chamber sealing door (3) is rotated to be opened and closed, the inner chamber sealing door (5) can be driven to slide along the circumferential direction on the outer surface of the inner chamber (4), and the inner chamber sealing door (5) and the outer chamber sealing door (3) can be synchronously opened and closed;
the device also comprises a pressure control mechanism (6), wherein the pressure control mechanism (6) can simultaneously vacuumize or inject pressure into the outer chamber (1) and the inner chamber (4);
the outer chamber sealing door (3) comprises an outer sealing plate (31) and a hinge (32), the outer sealing plate (31) is rotatably arranged at the outer side end of the outer chamber feeding and discharging port (2) through the hinge (32), a plurality of locks (34) which are circumferentially distributed are arranged between the outer sealing plate (31) and the outer chamber feeding and discharging port (2), and a handle (34) is fixedly arranged at one end, far away from the hinge (32), of the outer surface of the outer sealing plate (31);
The inner chamber sealing door (5) comprises a sliding seat (51), two arc-shaped rails (511) and a transmission assembly, wherein the two arc-shaped rails (511) are fixedly arranged on the surface of the inner chamber (4), the two arc-shaped rails (511) are respectively arranged at the upper end and the lower end of the inner chamber feeding and discharging hole (7), the sliding seat (51) is slidably arranged between the two arc-shaped rails (511) and is in transmission connection with the outer sealing plate (31) through the transmission assembly, and the sliding seat (51) is provided with an inner sealing plate (52) which can be used for sealing the inner chamber feeding and discharging hole (7) in an abutting mode;
The transmission assembly comprises a transmission shaft (53), a straight rack (56), a side opening (513) and an arc-shaped rack (514), wherein the side opening (513) is formed in the outer side face of the arc-shaped track (511), the arc-shaped rack (514) is fixedly arranged on the outer side of the end part of the sliding seat (51) and is slidably clamped in a track groove of the arc-shaped track (511), and the arc-shaped rack (514) extends to the outer part of the arc-shaped track (511) through the side opening (513);
the transmission shaft (53) is rotatably arranged in the outer chamber (1) and is positioned at one side of the outer chamber feeding and discharging hole (2), a transmission gear (55) in meshed transmission connection with the arc-shaped rack (514) is fixedly arranged at the end part of the transmission shaft (53), and a driven gear (54) is fixedly arranged in the middle of the transmission shaft (53);
The straight rack (56) is arranged at one end of the inner side surface of the outer sealing plate (31) far away from the hinge (32) and can be in meshed transmission connection with the driven gear (54);
A connecting rod (57) is rotatably arranged on the inner side surface of the outer sealing plate (31), and one end of the connecting rod (57) is rotatably connected with one end of the straight rack (56);
A chute (58) which can be in sliding clamping connection with the straight rack (56) is formed in the inner wall of the outer chamber feeding and discharging hole (2), limiting guide grooves (59) are formed in the upper and lower groove walls of the chute (58), and limiting slide bars (510) which are in sliding clamping connection with the limiting guide grooves (59) are fixedly arranged on the upper and lower sides of the straight rack (56);
The sliding seat (51) is provided with a sliding hole (512), and the inner sealing plate (52) is slidably arranged in the sliding hole (512);
The inner side surface of the outer sealing plate (31) is fixedly provided with a sealing abutting block (8) which can enable the inner sealing plate (52) to abut and slide towards the inner cavity feeding and discharging hole (7).
2. A vacuum chamber according to claim 1, wherein: the inner sealing plate (52) comprises a telescopic sliding plate (5201) and a telescopic guide groove (5203), the telescopic guide groove (5203) is formed in the sliding seat (51) and located on the outer ring of the sliding hole (512), the telescopic sliding plate (5201) is slidably clamped in the telescopic guide groove (5203), the inner side surface of the telescopic sliding plate (5201) is fixedly provided with a sealing lug (5202) which is slidably clamped in the sliding hole (512), and the inner side end of the telescopic guide groove (5203) is fixedly provided with a plurality of reset springs (5204) which are abutted to the inner side surface of the telescopic sliding plate (5201).
3. A vacuum chamber according to claim 1, wherein: the pressure control mechanism (6) comprises an outer chamber vacuumizing pipe (61), an outer chamber air inlet pipe (62), an inner chamber vacuumizing pipe (63) and an inner chamber air inlet pipe (64) which are fixedly arranged at the top of the outer chamber (1), the outer chamber vacuumizing pipe (61) and the outer chamber air inlet pipe (62) are communicated with the inside of the outer chamber (1), and the inner chamber vacuumizing pipe (63) and the inner chamber air inlet pipe (64) are communicated with the inner chamber (4).
4. A semiconductor processing apparatus, characterized by: a vacuum chamber comprising any one of claims 1-3.
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| CN202410272377.6A CN117878043B (en) | 2024-03-11 | 2024-03-11 | Vacuum chamber and semiconductor processing equipment using same |
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| CN202410272377.6A CN117878043B (en) | 2024-03-11 | 2024-03-11 | Vacuum chamber and semiconductor processing equipment using same |
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| CN117878043B true CN117878043B (en) | 2024-05-17 |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130134626A (en) * | 2012-05-31 | 2013-12-10 | (주)에스더블유피 | Vacuum gate valve |
| TW201727800A (en) * | 2015-10-20 | 2017-08-01 | 蘭姆研究公司 | Wafer transport assembly with integrated buffers |
| US10600617B1 (en) * | 2018-11-08 | 2020-03-24 | Hitachi High-Technologies Corporation | Plasma processing apparatus |
| CN112281140A (en) * | 2019-07-25 | 2021-01-29 | 无锡科硅电子技术有限公司 | Atomic layer deposition system with double chambers and process |
| CN115083965A (en) * | 2022-06-30 | 2022-09-20 | 北京北方华创微电子装备有限公司 | Process chamber of semiconductor equipment |
| CN115621108A (en) * | 2021-07-16 | 2023-01-17 | 长鑫存储技术有限公司 | Semiconductor manufacturing equipment and method for cleaning deposits in chamber of semiconductor manufacturing equipment |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4426343B2 (en) * | 2004-03-08 | 2010-03-03 | 株式会社日立ハイテクノロジーズ | Plasma processing equipment |
-
2024
- 2024-03-11 CN CN202410272377.6A patent/CN117878043B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130134626A (en) * | 2012-05-31 | 2013-12-10 | (주)에스더블유피 | Vacuum gate valve |
| TW201727800A (en) * | 2015-10-20 | 2017-08-01 | 蘭姆研究公司 | Wafer transport assembly with integrated buffers |
| US10600617B1 (en) * | 2018-11-08 | 2020-03-24 | Hitachi High-Technologies Corporation | Plasma processing apparatus |
| CN112281140A (en) * | 2019-07-25 | 2021-01-29 | 无锡科硅电子技术有限公司 | Atomic layer deposition system with double chambers and process |
| CN115621108A (en) * | 2021-07-16 | 2023-01-17 | 长鑫存储技术有限公司 | Semiconductor manufacturing equipment and method for cleaning deposits in chamber of semiconductor manufacturing equipment |
| CN115083965A (en) * | 2022-06-30 | 2022-09-20 | 北京北方华创微电子装备有限公司 | Process chamber of semiconductor equipment |
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| CN117878043A (en) | 2024-04-12 |
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