CN114415408A - Display substrate, preparation method thereof and display device - Google Patents
Display substrate, preparation method thereof and display device Download PDFInfo
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- CN114415408A CN114415408A CN202210074900.5A CN202210074900A CN114415408A CN 114415408 A CN114415408 A CN 114415408A CN 202210074900 A CN202210074900 A CN 202210074900A CN 114415408 A CN114415408 A CN 114415408A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
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Abstract
The embodiment of the disclosure provides a display substrate, a preparation method thereof and a display device. A display substrate comprising a pixel region, the display substrate comprising: a substrate base plate; the passivation layer is positioned on one side of the substrate base plate; the plurality of strip electrodes are positioned on one side of the passivation layer, which is far away from the substrate base plate, and are positioned in the pixel area, and the plurality of strip electrodes are sequentially arranged at intervals; the compensation layer comprises a filling part positioned between two adjacent strip electrodes, and at least in the pixel area, the surface of one side of each strip electrode, which is far away from the substrate base plate, is flush with the surface of one side of the filling part, which is far away from the substrate base plate, and a flat surface is formed; and the alignment layer is positioned on one side of the filling part and the strip-shaped electrodes, which is deviated from the substrate base plate. According to the technical scheme, the alignment layer in the pixel region is formed on the flat surface, so that the alignment uniformity in the pixel region is improved, the brightness of the display panel in a dark state is reduced, and the contrast of the display panel is improved.
Description
Technical Field
The disclosure relates to the technical field of display, and in particular relates to a display substrate, a preparation method thereof and a display device.
Background
The contrast of the display panel is an important display index, and the high contrast can display more image details, so that richer display experience is brought.
The liquid crystal display panel structurally comprises a lower substrate, an upper substrate and liquid crystal filled between the lower substrate and the upper substrate, wherein the lower substrate and the upper substrate are oppositely arranged, the rotation of the liquid crystal is controlled by an electric field, and the control of light is realized by combining the optical characteristics of the liquid crystal. In the prior art, when the liquid crystal display panel is in a dark state, certain light penetrates through the liquid crystal display panel, so that the brightness of the dark state is higher, and the contrast of the display screen is difficult to improve.
Disclosure of Invention
The embodiment of the disclosure provides a display substrate, a preparation method thereof and a display device, so as to solve or alleviate one or more technical problems in the prior art.
As a first aspect of the embodiments of the present disclosure, embodiments of the present disclosure provide a display substrate including a pixel region, the display substrate including:
a substrate base plate;
the passivation layer is positioned on one side of the substrate base plate;
the plurality of strip electrodes are positioned on one side of the passivation layer, which is far away from the substrate base plate, and are positioned in the pixel area, and the plurality of strip electrodes are sequentially arranged at intervals;
the compensation layer comprises a filling part positioned between two adjacent strip electrodes, and at least in the pixel area, the surface of one side of each strip electrode, which is far away from the substrate base plate, is flush with the surface of one side of the filling part, which is far away from the substrate base plate, and a flat surface is formed;
and the alignment layer is positioned on one side of the filling part and the strip-shaped electrodes, which is deviated from the substrate base plate.
In some possible implementation manners, a plurality of first grooves are formed in the surface of the passivation layer on one side facing the strip-shaped electrodes, the first grooves correspond to the strip-shaped electrodes one to one, each strip-shaped electrode is located in the corresponding first groove, and the passivation layer between every two adjacent first grooves forms a filling portion.
In some possible implementations, the compensation layer is located on a side of the passivation layer facing the strip-shaped electrode, and the compensation layer and the passivation layer are formed by two processes.
In some possible implementations, the thickness of the compensation layer is the same as the thickness of the strip-shaped electrode.
In some possible implementation manners, the thickness of the compensation layer is greater than the thickness of the strip-shaped electrodes, a plurality of second grooves are formed in the surface of the compensation layer, which faces one side of the strip-shaped electrodes, the second grooves correspond to the strip-shaped electrodes one to one, each strip-shaped electrode is located in the corresponding second groove, a filling portion is formed in the compensation layer between every two adjacent second grooves, and the compensation layer further comprises a spacing portion located between the second grooves and the passivation layer.
In some possible implementations, the material of the compensation layer includes a resin.
In some possible implementations, the material of the compensation layer is a positive photoresist.
As a second aspect of the embodiments of the present disclosure, embodiments of the present disclosure provide a method of manufacturing a display substrate, the display substrate including a pixel region, the method including:
providing a substrate base plate;
forming a passivation layer on one side of the substrate by using a second mask, wherein a plurality of first grooves are formed in the surface of the passivation layer, which is away from one side of the substrate, and the first grooves are located in the pixel region;
forming strip-shaped electrodes in the first grooves by using a first mask, wherein the surfaces of the strip-shaped electrodes are flush with the surface of the passivation layer and form a flat surface;
and forming an alignment layer on one side of the strip-shaped electrode and the passivation layer, which is far away from the substrate base plate.
In some of the possible implementations of the present invention,
the second mask is the same as the first mask, and a passivation layer is formed on one side of the substrate by adopting negative photoresist and the second mask; or,
and the pattern of the second mask is opposite to that of the first mask, and a passivation layer is formed on one side of the substrate by adopting the positive photoresist and the second mask.
As a third aspect of the embodiments of the present disclosure, an embodiment of the present disclosure provides a method of manufacturing a display substrate, the display substrate including a pixel region, the method including:
providing a substrate base plate;
forming a passivation layer on one side of the substrate base plate;
forming a filling part and a plurality of strip electrodes on one side of the passivation layer, which is far away from the substrate base plate, wherein the strip electrodes are formed by adopting a first mask plate, the filling part is formed by adopting a third mask plate, the strip electrodes are positioned in a pixel area, the strip electrodes are sequentially arranged at intervals, the filling part is positioned between two adjacent strip electrodes, at least in the pixel area, the surface of one side of each strip electrode, which is far away from the substrate base plate, is flush with the surface of one side of the filling part, which is far away from the substrate base plate, and forms a flat surface, and the pattern of the third mask plate is opposite to the pattern of the first mask plate;
and forming an alignment layer on one side of the strip-shaped electrode and the filling part, which is far away from the substrate base plate.
In some possible implementations, forming the filling portion and the plurality of stripe electrodes on a side of the passivation layer facing away from the substrate base plate includes:
coating a positive photoresist on one side of the passivation layer, which is far away from the substrate base plate;
exposing and developing the positive photoresist by adopting a third mask to form a plurality of second strip-shaped through holes positioned in the pixel region, and forming a filling part by using the reserved positive photoresist positioned in the pixel region;
and forming each strip electrode in each second strip through hole by using a first mask.
As a fourth aspect of the embodiments of the present disclosure, there is provided a method of manufacturing a display substrate, the display substrate including a pixel region, the method including:
providing a substrate base plate;
forming a passivation layer on one side of the substrate base plate;
forming a compensation layer on one side of the passivation layer, which is far away from the substrate base plate, by using a half-tone mask, wherein the surface of the compensation layer, which is far away from the substrate base plate, is provided with a plurality of second grooves, the plurality of second grooves are at least positioned in a pixel region, and the depth of each second groove is smaller than the thickness of the compensation layer;
forming a plurality of strip electrodes on one side of the compensation layer, which is far away from the substrate base plate, by adopting a first mask, wherein the strip electrodes correspond to the second grooves one by one, and are positioned in the second grooves, at least in a pixel area, the surfaces of the strip electrodes are flush with the surface of the compensation layer, and a flat surface is formed;
and forming an alignment layer on one side of the strip-shaped electrode and the compensation layer, which is far away from the substrate base plate.
As a fifth aspect of the embodiments of the present disclosure, an embodiment of the present disclosure provides a display device, including a first substrate and a second substrate that are oppositely disposed, and a liquid crystal located between the first substrate and the second substrate, where the first substrate is the display substrate in any embodiment of the present disclosure, and an alignment layer of the display substrate faces the second substrate.
According to the technical scheme of the embodiment of the disclosure, the alignment layer located in the pixel region is formed on the flat surface, so that the alignment layer located in the pixel region has the flat surface, the influence of unevenness of the surface of the alignment layer on an alignment process is avoided, the alignment uniformity in the pixel region is improved, the alignment uniformity of liquid crystals in the pixel region is improved, the brightness of the display panel in a dark state is favorably reduced, and the contrast of the display panel is improved.
The foregoing summary is provided for the purpose of description only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features of the present disclosure will be readily apparent by reference to the drawings and following detailed description.
Drawings
In the drawings, like reference numerals refer to the same or similar parts or elements throughout the several views unless otherwise specified. The figures are not necessarily to scale. It is appreciated that these drawings depict only some embodiments in accordance with the disclosure and are not to be considered limiting of its scope.
FIG. 1 is a schematic view of a liquid crystal display panel;
FIG. 2 is a schematic diagram illustrating the analysis of the alignment unevenness in the pixel region;
FIG. 3 is a schematic diagram illustrating a relationship between an alignment angle and a pixel electrode of a pixel region of a liquid crystal display panel;
FIG. 4 is a schematic cross-sectional view illustrating a display substrate according to an embodiment of the present disclosure;
FIG. 5a is a schematic cross-sectional view of a display substrate according to another embodiment of the present disclosure;
FIG. 5b is a schematic cross-sectional view of a display substrate according to another embodiment of the present disclosure
FIG. 6a is a schematic cross-sectional view of a display substrate according to another embodiment of the present disclosure;
FIG. 6b is a schematic cross-sectional view of a display substrate according to another embodiment of the present disclosure;
FIG. 7 is a schematic view of a substrate in a display substrate according to an embodiment of the present disclosure;
FIG. 8a is a schematic view of a negative photoresist being exposed in a substrate according to an embodiment of the disclosure;
FIG. 8b is a schematic view showing a substrate after a negative photoresist layer is formed thereon according to an embodiment of the present disclosure;
FIG. 8c is a schematic view of a display substrate after a passivation layer is formed thereon according to an embodiment of the present disclosure;
FIG. 9a is a schematic view showing exposure of a positive photoresist in a substrate according to another embodiment of the present disclosure;
fig. 9b is a schematic diagram illustrating a filling portion formed in a display substrate according to another embodiment of the disclosure.
Description of reference numerals:
14. a pixel electrode; 15. an alignment film; 21. a substrate base plate; 22. a passivation layer; 221. a first portion; 222. a second portion; 223. a first groove; 23. a strip electrode; 24. a filling section; 241. a second strip via hole; 25. an alignment layer; 26. a plate-like electrode; 211. a substrate; 212. a thin film transistor; 213. a planarization layer; 32. a second mask; 33. a third mask; 41. a negative photoresist; 411. and a first strip via.
Detailed Description
In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, and different embodiments may be combined arbitrarily without departing from the spirit or scope of the disclosure. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive.
The liquid crystal display panel mainly controls the rotation of liquid crystal through an electric field and realizes the control of light by combining the optical characteristics of the liquid crystal. For example, In IPS (In Plane switching) type liquid crystal display panels and ADS (Advanced Super Dimension switching) type liquid crystal display panels, when a dark state is displayed, an electric field is minimized, and an initial alignment force, which is a liquid crystal alignment film, plays a major role.
The initial alignment direction differs depending on the type of liquid crystal, for example, the initial alignment of positive liquid crystal is horizontal alignment and the initial alignment of negative liquid crystal is vertical alignment. Both rubbing alignment and photo-alignment cause a problem of alignment unevenness.
Fig. 1 is a schematic structural view of a liquid crystal display panel, fig. 2 is a schematic view of analyzing alignment unevenness of a pixel region, and fig. 3 is a schematic view of a corresponding relationship between an alignment angle and a pixel electrode of a pixel region of a liquid crystal display panel. As shown in fig. 1, there is a problem of non-uniform alignment on both sides of the metal line and in the pixel region. The uneven alignment on the two sides of the metal wire can be avoided by shielding the Black Matrix (BM) arranged on the upper substrate, so that light rays are prevented from penetrating through the two sides of the metal wire in a dark state. However, in the pixel region, as shown in fig. 2, the thickness of the alignment film 15 is not uniform due to the presence of the pixel electrode 14, the surface of the alignment film 15 is uneven, and the height difference between the highest position and the lowest position of the upper surface of the alignment film 15 is about Δ THK, so that the alignment process is affected, and the generated alignment Angle (Twist Angle) fluctuates, as shown in fig. 3. The fluctuation of the alignment angle in the pixel region causes a certain light to penetrate through the pixel region in a dark state, so that the brightness of the display panel is higher in the dark state, and the contrast of the display panel is difficult to improve.
Fig. 4 is a schematic cross-sectional structure diagram of a display substrate according to an embodiment of the disclosure. In one embodiment, the display substrate may include a pixel region, and as shown in fig. 4, the display substrate may include a base substrate 21, a passivation layer 22, a plurality of stripe electrodes 23, a compensation layer, and an alignment layer 25. The passivation layer 22 may be located on one side of the substrate 21, the plurality of strip electrodes 23 are located on one side of the passivation layer 22 away from the substrate 21, the plurality of strip electrodes 23 are located in the pixel region, and the plurality of strip electrodes 23 are sequentially arranged at intervals. The compensation layer comprises a filling part 24, the filling part 24 is at least positioned in the pixel region and positioned between two adjacent strip-shaped electrodes 23, and at least in the pixel region, the surface of one side of each strip-shaped electrode 23, which is far away from the substrate base plate 21, is flush with the surface of one side of the filling part 24, which is far away from the substrate base plate 21, and forms a flat surface. The alignment layer 25 is located on the side of the filling portion 24 and the strip-shaped electrodes 23 facing away from the substrate base 21.
In the display substrate in the embodiment of the present disclosure, the filling portion 24 at least located in the pixel region is disposed, and the surface of one side of each strip electrode 23 facing away from the substrate 21 is flush with the surface of one side of the filling portion 24 facing away from the substrate 21, and forms a flat surface, so that the alignment layer 25 located in the pixel region is formed on the flat surface, and the alignment layer 25 located in the pixel region has a flat surface, thereby avoiding the influence of the unevenness of the surface of the alignment layer 25 on the alignment process, improving the uniformity of alignment in the pixel region, improving the uniformity of liquid crystal alignment in the pixel region, being beneficial to reducing the brightness of the display panel in a dark state, and improving the contrast of the display panel.
In one embodiment, as shown in fig. 4, a surface of the passivation layer 22 facing the strip-shaped electrodes 23 is provided with a plurality of first grooves 223, the plurality of first grooves 223 correspond to the plurality of strip-shaped electrodes 23 one by one, and each strip-shaped electrode 23 is located in the corresponding first groove 223. The passivation layer 22 may include a first portion 221 positioned under the first grooves 223 and a second portion 222 positioned between adjacent two first grooves 223, the second portion 222 forming the filling part 24. That is, in this embodiment, the material of the filling portion 24 is the same as the material of the passivation layer 22, the filling portion 24 and the passivation layer 22 are formed through one process, and the filling portion 24 is a portion of the passivation layer 22. The passivation layer 22 may be at least one of silicon nitride, silicon oxide, and silicon oxynitride.
Fig. 5a is a schematic cross-sectional structure view of a display substrate according to another embodiment of the disclosure. In another embodiment, the compensation layer may be located on a side of the passivation layer 22 facing the strip electrode 23, and the compensation layer and the passivation layer 22 are formed by two processes. In this embodiment, the material of the compensation layer and the material of the passivation layer 22 may be the same or different. The compensation layer and the passivation layer 22 are not formed simultaneously, but are formed separately using two processes.
In one embodiment, as shown in fig. 5a, the thickness of the compensation layer is the same as the thickness of the strip-shaped electrode 23. In such an embodiment, the compensation layer is the filling portion 24.
Fig. 5b is a schematic cross-sectional structure diagram of a display substrate according to another embodiment of the disclosure. In one embodiment, as shown in fig. 5b, the thickness of the compensation layer 50 may be greater than the thickness of the strip-shaped electrodes 23. The surface of the compensation layer 50 facing one side of the strip-shaped electrodes 23 is provided with a plurality of second grooves 51, the plurality of second grooves 51 correspond to the plurality of strip-shaped electrodes 23 one by one, each strip-shaped electrode 23 is located in the corresponding second groove 51, the compensation layer between two adjacent second grooves 51 forms a filling portion 24, and the compensation layer 50 further comprises a spacing portion 52 located between the second grooves 51 and the passivation layer 22. In this embodiment, the spacing portion 52 is disposed between the strip electrode 23 and the passivation layer 22, and the spacing portion 52 can increase the distance between the strip electrode 23 and the peripheral metal line, reduce the capacitance between the strip electrode 23 and the peripheral metal line, and reduce the power consumption of the display device.
In one embodiment, the material of the filling portion 24 may include resin. By using resin to form the filling portion 24, the etching step can be eliminated, and the process of forming the filling portion 24 can be simplified. Illustratively, the material of the filling portion 24 may be a positive photoresist.
In one embodiment, as shown in fig. 4 and 5, the plurality of bar electrodes 23 may be first bar electrodes and second bar electrodes alternately arranged, the first bar electrodes may be pixel electrodes, and the second bar electrodes may be common electrodes. The first strip-shaped electrodes and the second strip-shaped electrodes can form an electric field for driving the liquid crystal to rotate. Such a display substrate can be applied to an IPS mode liquid crystal display panel.
Fig. 6a is a schematic cross-sectional structure diagram of a display substrate according to another embodiment of the disclosure, and fig. 6b is a schematic cross-sectional structure diagram of a display substrate according to another embodiment of the disclosure. In one embodiment, as shown in fig. 6a and 6b, the plurality of bar electrodes 23 may be connected to each other, the display substrate may further include a plate electrode 26, the plate electrode 26 may be located between the substrate base 21 and the passivation layer 22, and the plate electrode 26 is located in the pixel region. One of the bar-shaped electrodes 23 and the plate-shaped electrodes 26 may be a pixel electrode, and the other may be a common electrode. The plate electrodes 26 and the strip electrodes 23 may form an electric field for driving the liquid crystal to rotate. Such a display substrate can be applied to an ADS type liquid crystal display panel.
In other embodiments, the strip-shaped electrodes 23 may be pixel electrodes, a common electrode may be formed on a color filter substrate disposed opposite to the display substrate, and the strip-shaped electrodes 23 may form an electric field for driving the liquid crystal to rotate with the common electrode on the color filter substrate.
In one embodiment, the material of the strip-shaped electrodes may include at least one of Indium Tin Oxide (ITO) and Indium Zinc Oxide (IZO).
Fig. 7 is a schematic structural diagram of a substrate base plate in a display base plate according to an embodiment of the present disclosure, as shown in fig. 7, the substrate base plate 21 may include a base 211, a thin film transistor 212, and a planarization layer 213, the thin film transistor 212 is located on one side of the base 211, the planarization layer 213 is located on one side of the thin film transistor 212 facing away from the base 211, and the passivation layer 22 is located on one side of the planarization layer 213 facing away from the base 211. By providing the planarization layer 213, the substrate 21 can be ensured to have a flat surface in the pixel region, so that the passivation layer 22 in the pixel region can be formed on the flat surface, and further, the strip-shaped electrodes 23 can be formed on the flat surface, and the upper surfaces of the strip-shaped electrodes 23 can be ensured to be flush. It should be noted that fig. 7 only schematically illustrates the thin film transistor 212, and it is understood that the thin film transistor 212 may include a gate electrode, a source electrode, a drain electrode, and an active layer, and a specific structure of the thin film transistor 212 is a conventional technology in the art and is not described herein again.
The embodiment of the present disclosure further provides a method for manufacturing a display substrate, where the display substrate includes a pixel region, and the method for manufacturing a display substrate may include:
s11: providing a substrate base plate;
s12: forming a passivation layer on one side of the substrate by using a second mask, wherein a plurality of first grooves are formed in the surface of the passivation layer, which is away from one side of the substrate, and the first grooves are located in the pixel region;
s13: forming strip-shaped electrodes in the first grooves by using a first mask, wherein the surfaces of the strip-shaped electrodes are flush with the surface of the passivation layer at least in the pixel region and form a flat surface;
s14: and forming an alignment layer on one side of the strip-shaped electrode and the passivation layer, which is far away from the substrate base plate.
In one embodiment, the second mask is the same as the first mask, and a passivation layer is formed on one side of the substrate by using a negative photoresist and the second mask; or, the pattern of the second mask is opposite to that of the first mask, and a passivation layer is formed on one side of the substrate by adopting the positive photoresist and the second mask.
In one embodiment, the second mask is the same as the first mask, and a passivation layer is formed on one side of the substrate by using a negative photoresist and the second mask, and the step may include: depositing a passivation film on one side of the substrate base plate; forming a negative photoresist layer on one side of the passivation film, which is far away from the substrate base plate, by using a second mask, wherein the negative photoresist layer is provided with a plurality of first strip-shaped through holes positioned in a pixel region, the first strip-shaped through holes correspond to the first grooves one to one, and the passivation film is exposed through the strip-shaped through holes; and etching the passivation film exposed through the first strip-shaped through holes by using the negative photoresist layer as a mask, forming first grooves at the positions of the first strip-shaped through holes, and stripping the negative photoresist layer to form a passivation layer.
The technical scheme of the method for manufacturing a display substrate according to the embodiment of the present disclosure is further described below through the manufacturing process of the display substrate according to the embodiment of the present disclosure. It is to be understood that "patterning" as used herein includes processes of coating photoresist, mask exposure, development, etching, stripping photoresist, etc. when the material to be patterned is an inorganic material or a metal, and processes of mask exposure, development, etc. when the material to be patterned is an organic material, and evaporation, deposition, coating, etc. as used herein are well-known preparation processes in the related art.
S11: a base substrate 21 is provided.
S12: a passivation layer 22 is formed on one side of the substrate 21 by using a second mask, a plurality of first grooves 223 are formed on the surface of the passivation layer 22 facing away from the substrate 21, and the plurality of first grooves 223 are located in the pixel region. This step may include:
depositing a passivation film 22' on one side of the base substrate 21; coating a negative photoresist 41 ' on the side of the passivation film 22 ' away from the substrate 21, and exposing the negative photoresist 41 by using a second mask 32, wherein the second mask 32 is the same as the first mask, and during the exposure process, the position corresponding to each first groove 223 cannot be irradiated by light due to the existence of the first mask and is soluble in a developing solution, and the negative photoresist 41 ' outside the first groove 223 receives the light and is cured, as shown in fig. 8a, fig. 8a is a schematic diagram showing that the negative photoresist is exposed in the substrate according to an embodiment of the disclosure; the exposed negative photoresist is developed, the negative photoresist at the position corresponding to each first groove 223 is removed to form a first strip-shaped via 411 located in the pixel region, and the negative photoresist at the position outside the first groove 223 is remained to form a negative photoresist layer 41, as shown in fig. 8b, where fig. 8b is a schematic diagram showing the substrate after the negative photoresist layer is formed, and the passivation film 22' is exposed through the first strip-shaped via 411.
Etching the passivation film 22' exposed through the first strip-shaped via holes 411 by using the negative photoresist layer 41 as a mask, forming first grooves 223 at the positions of the first strip-shaped via holes 411, and controlling the depth of the first grooves 223 by controlling the etching time so that the depth of the first grooves 223 is the same as the thickness of the strip-shaped electrodes 23; the remaining negative photoresist layer is stripped to form a passivation layer 22, as shown in fig. 8c, which is a schematic diagram of the substrate after the passivation layer is formed according to the embodiment of the disclosure.
As shown in fig. 8c, the passivation layer 22 may include a first portion 221 positioned under the first groove 223 and a second portion 222 positioned between two adjacent first grooves 223, the second portion 222 forming the filling part 24.
S13: a first mask is used to form the strip-shaped electrodes 23 in the respective first grooves 223, and the surfaces of the strip-shaped electrodes 23 are flush with the surface of the second portion 222 of the passivation layer 22 and form a flat surface, as shown in fig. 4. This step may include: depositing a transparent conductive film on the side of the passivation layer 22 facing away from the substrate base plate 21; coating a positive photoresist on one side of the transparent conductive film, which is far away from the substrate base plate 21; the positive photoresist is exposed by adopting a first mask plate, in the exposure process, the position corresponding to each first groove 223 cannot irradiate light due to the existence of the first mask plate, and the positive photoresist outside the first groove 223 can be dissolved in a developing solution after receiving the light; developing the exposed positive photoresist, removing the positive photoresist at the position outside the first groove 223, and reserving the positive photoresist at the position of the first groove 223 to form a positive photoresist layer; etching the transparent conductive film by using the positive photoresist layer as a mask to remove the transparent conductive film outside the first groove 223; the remaining positive photoresist is stripped off and the transparent conductive film remaining at the position of the first groove 223 forms a strip electrode 23, and at least in the pixel region, the upper surface of the strip electrode 23 is flush with the upper surface of the second portion 222 of the passivation layer 22 and forms a flat surface, as shown in fig. 4. In the process of forming the stripe electrodes 23, the thickness of the transparent conductive film may be controlled such that the thickness of the stripe electrodes 23 formed in the first groove 223 is the same as the depth of the first groove 223, so that the upper surfaces of the stripe electrodes 23 are flush with the upper surface of the second portion 222 of the passivation layer 22.
S14: an alignment layer 25 is formed on the side of the strip-like electrodes 23 and the passivation layer 22 facing away from the base substrate 21. The alignment layer 25 may be made of Polyimide (PI).
In the preparation method of the display substrate in the embodiment of the disclosure, the second mask 32 for forming the passivation layer 22 is the same as the first mask for forming the strip-shaped electrode 23, so that the number of masks is reduced, and the cost is reduced.
Under the condition that the pattern of the second mask is opposite to the pattern of the first mask, the specific process for forming the passivation layer on one side of the substrate by using the positive photoresist and the second mask can adopt a conventional process in the field, and is not described herein again.
The embodiment of the present disclosure further provides a method for manufacturing a display substrate, where the display substrate includes a pixel region, and the method includes:
s21: providing a substrate base plate;
s22: forming a passivation layer on one side of the substrate base plate;
s23: forming a filling part and a plurality of strip electrodes on one side of the passivation layer, which is far away from the substrate base plate, wherein the strip electrodes are formed by adopting a first mask plate, the filling part is formed by adopting a third mask plate, the strip electrodes are positioned in a pixel area, the strip electrodes are sequentially arranged at intervals, the filling part is positioned between two adjacent strip electrodes, at least in the pixel area, the surface of one side of each strip electrode, which is far away from the substrate base plate, is flush with the surface of one side of the filling part, which is far away from the substrate base plate, and forms a flat surface, and the pattern of the third mask plate is opposite to the pattern of the first mask plate;
s24: and forming an alignment layer on one side of the strip-shaped electrode and the filling part, which is far away from the substrate base plate.
In one embodiment, forming a filling portion and a plurality of strip-shaped electrodes on a side of the passivation layer facing away from the substrate base plate includes: coating a positive photoresist on one side of the passivation layer, which is far away from the substrate base plate; exposing and developing the positive photoresist by adopting a third mask to form a plurality of second strip-shaped through holes positioned in the pixel region, and forming a filling part by using the reserved positive photoresist positioned in the pixel region; and forming each strip electrode in each second strip through hole by using a first mask.
The technical scheme of the method for manufacturing a display substrate according to the embodiment of the present disclosure is further described below through the manufacturing process of the display substrate according to the embodiment of the present disclosure. It is to be understood that "patterning" as used herein includes processes of coating photoresist, mask exposure, development, etching, stripping photoresist, etc. when the material to be patterned is an inorganic material or a metal, and processes of mask exposure, development, etc. when the material to be patterned is an organic material, and evaporation, deposition, coating, etc. as used herein are well-known preparation processes in the related art.
S21: a base substrate 21 is provided.
S22: a passivation layer 22 is formed on one side of the base substrate 21.
S23: a filling portion 24 and a plurality of strip-shaped electrodes 23 are formed on the side of the passivation layer 22 facing away from the substrate base plate 21, wherein the strip-shaped electrodes are formed using a first mask and the filling portion is formed using a third mask. This step may include:
coating a positive photoresist on the side of the passivation layer 22 facing away from the base substrate 21; exposing the positive photoresist by using a third mask plate 33, wherein the pattern of the third mask plate 33 is opposite to the pattern of the first mask plate, the positive photoresist at the position of the strip-shaped electrode 23 receives light which is soluble in a developing solution, and the positive photoresist at the position outside the strip-shaped electrode 23 does not receive light, as shown in fig. 9a, which is a schematic diagram showing that the positive photoresist in the substrate is exposed according to another embodiment of the disclosure; the exposed positive photoresist is developed, the positive photoresist at the position of the strip electrode 23 is removed to form a plurality of second strip-shaped via holes 241 in the pixel region, the positive photoresist at the position outside the strip electrode 23 is remained, and the remained positive photoresist in the pixel region forms a filling portion 24, as shown in fig. 9b, which is a schematic diagram showing a substrate after the filling portion is formed according to another embodiment of the present disclosure.
A transparent conductive film is formed on the side of the filling portion 24 away from the substrate 21, and the transparent conductive film is patterned to form strip-shaped electrodes in the second strip-shaped via holes 241. The process may include:
depositing a transparent conductive film on the side of the filling part 24 away from the substrate base plate 21; coating a positive photoresist on one side of the transparent conductive film, which is far away from the substrate base plate 21; exposing the positive photoresist by using a first mask, wherein in the exposure process, the position corresponding to each second strip-shaped via hole 241 cannot be irradiated with light due to the existence of the first mask, and the positive photoresist at the position outside the second strip-shaped via holes 241 can be dissolved in a developing solution after receiving the light; developing the exposed positive photoresist, removing the positive photoresist at the position outside the second strip-shaped via hole 241, and reserving the positive photoresist at the position of the second strip-shaped via hole 241 to form a positive photoresist layer; etching the transparent conductive film by using the positive photoresist layer as a mask to remove the transparent conductive film at the position outside the second strip-shaped via hole 241; the remaining positive photoresist is stripped, the transparent conductive film remaining at the position of the second strip via 241 forms a strip electrode 23, and at least in the pixel region, the upper surface of the strip electrode 23 is flush with the upper surface of the filling portion 24 and forms a flat surface, as shown in fig. 5. In the process of forming the strip-shaped electrode 23, the thickness of the transparent conductive film may be controlled such that the thickness of the strip-shaped electrode 23 formed in the strip-shaped via 241 is the same as the depth of the strip-shaped via 241, so that the upper surface of the strip-shaped electrode 23 is flush with the upper surface of the filling portion 24.
S24: an alignment layer 25 is formed on the side of the strip-shaped electrodes 23 and the filling portions 24 facing away from the substrate base 21. The alignment layer 25 may be made of Polyimide (PI).
Illustratively, the patterns of the first mask and the third mask are opposite, the pattern of the first mask corresponds to the strip-shaped electrode, that is, a metal film is present at the position of the strip-shaped electrode, and the position outside the strip-shaped electrode is hollowed.
In the preparation method of the display substrate in the embodiment of the disclosure, the third mask plate 33 is adopted in the process of forming the filling part, and the first mask plate is adopted in the process of forming the strip-shaped electrode, but the adopted photoresists are all positive photoresists, so that the precision of patterns of each film layer can be improved.
In another embodiment, forming the filling portion and the plurality of stripe electrodes on the side of the passivation layer facing away from the substrate base plate may include: forming strip-shaped electrodes 23 on one side of the passivation layer 22, which is far away from the substrate base plate 21, by using a first mask; and forming a filling part 24 on one side of the strip-shaped electrode 23, which is far away from the substrate base plate 21, by using a third mask, wherein the filling part 24 is positioned in the pixel region, the filling part 24 is positioned between two adjacent strip-shaped electrodes 23, and the material of the filling part 24 can be positive photoresist.
The embodiment of the present disclosure further provides a method for manufacturing a display substrate, where the display substrate includes a pixel region, and the method includes:
s31: providing a substrate base plate;
s32: forming a passivation layer on one side of the substrate base plate;
s33: forming a compensation layer on one side of the passivation layer, which is far away from the substrate base plate, by using a half-tone mask, wherein the surface of the compensation layer, which is far away from the substrate base plate, is provided with a plurality of second grooves, the plurality of second grooves are at least positioned in a pixel region, and the depth of each second groove is smaller than the thickness of the compensation layer;
s34: forming a plurality of strip electrodes on one side of the compensation layer, which is far away from the substrate base plate, by adopting a first mask, wherein the strip electrodes correspond to the second grooves one by one, and are positioned in the second grooves, at least in a pixel area, the surfaces of the strip electrodes are flush with the surface of the compensation layer, and a flat surface is formed;
s35: and forming an alignment layer on one side of the strip-shaped electrode and the compensation layer, which is far away from the substrate base plate.
The display substrate formed by the manufacturing method of this embodiment is shown in fig. 5 b.
The embodiment of the present disclosure further provides a display device, which may include a first substrate and a second substrate that are disposed opposite to each other, and a liquid crystal located between the first substrate and the second substrate, where the first substrate may be a display substrate in any embodiment of the present disclosure, and an alignment layer of the display substrate faces the second substrate.
The display device may be: any product or component with a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like.
In the description of the present specification, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present disclosure and to simplify the description, but are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the present disclosure.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present disclosure, "a plurality" means two or more unless specifically limited otherwise.
In the present disclosure, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integral; the connection can be mechanical connection, electrical connection or communication; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present disclosure can be understood by those of ordinary skill in the art as appropriate.
In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise the first and second features being in direct contact, or may comprise the first and second features being in contact, not directly, but via another feature in between. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly above and obliquely above the second feature, or simply meaning that the first feature is at a lesser level than the second feature.
The above disclosure provides many different embodiments or examples for implementing different features of the disclosure. The components and arrangements of specific examples are described above to simplify the present disclosure. Of course, they are merely examples and are not intended to limit the present disclosure. Moreover, the present disclosure may repeat reference numerals and/or reference letters in the various examples, which have been repeated for purposes of simplicity and clarity and do not in themselves dictate a relationship between the various embodiments and/or arrangements discussed.
While the present disclosure has been described with reference to specific embodiments, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.
Claims (13)
1. A display substrate comprising a pixel region, the display substrate comprising:
a substrate base plate;
the passivation layer is positioned on one side of the substrate base plate;
the plurality of strip electrodes are positioned on one side of the passivation layer, which is far away from the substrate base plate, and are positioned in the pixel area, and the plurality of strip electrodes are sequentially arranged at intervals;
the compensation layer comprises a filling part positioned between two adjacent strip electrodes, at least in the pixel area, the surface of one side of each strip electrode, which is far away from the substrate base plate, is flush with the surface of one side of the filling part, which is far away from the substrate base plate, and a flat surface is formed;
and the alignment layer is positioned on one side of the filling part and the strip-shaped electrodes, which is deviated from the substrate base plate.
2. The display substrate according to claim 1, wherein a plurality of first grooves are formed in a surface of the passivation layer facing one side of the strip-shaped electrodes, the first grooves correspond to the strip-shaped electrodes one to one, each strip-shaped electrode is located in the corresponding first groove, and the passivation layer between two adjacent first grooves forms the filling portion.
3. The display substrate of claim 1, wherein the compensation layer is located on a side of the passivation layer facing the strip electrode, and the compensation layer and the passivation layer are formed by two processes.
4. The display substrate of claim 3, wherein the thickness of the compensation layer is the same as the thickness of the strip-shaped electrode.
5. The display substrate according to claim 3, wherein the thickness of the compensation layer is greater than the thickness of the strip-shaped electrodes, a plurality of second grooves are formed in a surface of the compensation layer facing one side of the strip-shaped electrodes, the plurality of second grooves correspond to the plurality of strip-shaped electrodes one to one, each strip-shaped electrode is located in the corresponding second groove, the compensation layer between two adjacent second grooves forms the filling portion, and the compensation layer further comprises a spacing portion located between the second groove and the passivation layer.
6. The display substrate of claim 3, wherein the material of the compensation layer comprises a resin.
7. The display substrate of claim 6, wherein the material of the compensation layer is a positive photoresist.
8. A method of manufacturing a display substrate, the display substrate including a pixel region, the method comprising:
providing a substrate base plate;
forming a passivation layer on one side of the substrate by using a second mask, wherein a plurality of first grooves are formed in the surface of the passivation layer on the side away from the substrate, and the first grooves are located in the pixel region;
forming a strip electrode in each first groove by using the first mask, wherein the surface of the strip electrode is flush with the surface of the passivation layer at least in the pixel region and forms a flat surface;
and forming an alignment layer on one side of the strip-shaped electrode and the passivation layer, which is far away from the substrate base plate.
9. The method according to claim 8,
the second mask is the same as the first mask, and a passivation layer is formed on one side of the substrate by adopting a negative photoresist and the second mask; or,
and the pattern of the second mask is opposite to that of the first mask, and the passivation layer is formed on one side of the substrate by adopting positive photoresist and the second mask.
10. A method of manufacturing a display substrate, the display substrate including a pixel region, the method comprising:
providing a substrate base plate;
forming a passivation layer on one side of the substrate base plate;
forming a filling part and a plurality of strip electrodes on one side of the passivation layer, which is far away from the substrate base plate, wherein the strip electrodes are formed by adopting a first mask plate, the filling part is formed by adopting a third mask plate, the strip electrodes are positioned in the pixel area, the strip electrodes are sequentially arranged at intervals, the filling part is positioned between two adjacent strip electrodes, at least in the pixel area, the surface of one side of each strip electrode, which is far away from the substrate base plate, is flush with the surface of one side of the filling part, which is far away from the substrate base plate, and forms a flat surface, and the pattern of the third mask plate is opposite to the pattern of the first mask plate;
and forming an alignment layer on one side of the strip-shaped electrode and the filling part, which is far away from the substrate base plate.
11. The method according to claim 10, wherein forming a filling portion and a plurality of stripe-shaped electrodes on a side of the passivation layer facing away from the substrate base plate comprises:
coating a positive photoresist on one side of the passivation layer, which is far away from the substrate base plate;
exposing and developing the positive photoresist by using the third mask to form a plurality of second strip-shaped through holes in the pixel region, wherein the remaining positive photoresist in the pixel region forms the filling part;
and forming each strip electrode in each second strip through hole by using the first mask.
12. A method of manufacturing a display substrate, the display substrate including a pixel region, the method comprising:
providing a substrate base plate;
forming a passivation layer on one side of the substrate base plate;
forming a compensation layer on one side of the passivation layer, which is far away from the substrate base plate, by using a half-tone mask, wherein a plurality of second grooves are formed in the surface of the compensation layer, which is far away from the substrate base plate, and are at least located in the pixel region, and the depth of each second groove is smaller than the thickness of the compensation layer;
forming a plurality of strip electrodes on one side of the compensation layer, which is far away from the substrate base plate, by using a first mask, wherein the strip electrodes correspond to the second grooves one to one, each strip electrode is positioned in each second groove and at least in the pixel area, and the surfaces of the strip electrodes are flush with the surface of the compensation layer and form a flat surface;
and forming an alignment layer on one side of the strip-shaped electrode and the compensation layer, which is far away from the substrate base plate.
13. A display device comprising a first substrate and a second substrate disposed opposite to each other, and liquid crystal disposed between the first substrate and the second substrate, wherein the first substrate is the display substrate according to any one of claims 1 to 7, and an alignment layer of the display substrate faces the second substrate.
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